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TWI595013B - An adamantane type polymer, a resin composition, and a hard-coat film - Google Patents

An adamantane type polymer, a resin composition, and a hard-coat film Download PDF

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Publication number
TWI595013B
TWI595013B TW101128952A TW101128952A TWI595013B TW I595013 B TWI595013 B TW I595013B TW 101128952 A TW101128952 A TW 101128952A TW 101128952 A TW101128952 A TW 101128952A TW I595013 B TWI595013 B TW I595013B
Authority
TW
Taiwan
Prior art keywords
meth
group
acrylate
polymer
adamantyl
Prior art date
Application number
TW101128952A
Other languages
English (en)
Chinese (zh)
Other versions
TW201321422A (zh
Inventor
Yasunari Okada
Hidetoshi Ono
Original Assignee
Osaka Organic Chemical Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Organic Chemical Ind Ltd filed Critical Osaka Organic Chemical Ind Ltd
Publication of TW201321422A publication Critical patent/TW201321422A/zh
Application granted granted Critical
Publication of TWI595013B publication Critical patent/TWI595013B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/14Esterification
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1811C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/22Esters containing halogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/20Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00Chemical modification of a polymer
    • C08F2810/30Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00Chemical modification of a polymer
    • C08F2810/50Chemical modification of a polymer wherein the polymer is a copolymer and the modification is taking place only on one or more of the monomers present in minority

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Laminated Bodies (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
TW101128952A 2011-08-10 2012-08-10 An adamantane type polymer, a resin composition, and a hard-coat film TWI595013B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011175145 2011-08-10

Publications (2)

Publication Number Publication Date
TW201321422A TW201321422A (zh) 2013-06-01
TWI595013B true TWI595013B (zh) 2017-08-11

Family

ID=47668185

Family Applications (2)

Application Number Title Priority Date Filing Date
TW101128952A TWI595013B (zh) 2011-08-10 2012-08-10 An adamantane type polymer, a resin composition, and a hard-coat film
TW106117220A TWI616462B (zh) 2011-08-10 2012-08-10 金剛烷系聚合物、樹脂組成物、及硬塗薄膜

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW106117220A TWI616462B (zh) 2011-08-10 2012-08-10 金剛烷系聚合物、樹脂組成物、及硬塗薄膜

Country Status (5)

Country Link
JP (1) JP6099565B2 (ja)
KR (1) KR101959586B1 (ja)
CN (1) CN103717629B (ja)
TW (2) TWI595013B (ja)
WO (1) WO2013021650A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5939419B2 (ja) * 2012-01-27 2016-06-22 Dic株式会社 フッ素原子含有シリコーン系重合性樹脂、それを用いた活性エネルギー線硬化性組成物、その硬化物及び物品
TWI534005B (zh) * 2014-03-31 2016-05-21 可隆股份有限公司 聚酯膜及使用其的透明電極膜
WO2020095774A1 (ja) * 2018-11-08 2020-05-14 昭和電工株式会社 共重合体、およびその共重合体を含む樹脂組成物
WO2021085241A1 (ja) * 2019-10-29 2021-05-06 積水化学工業株式会社 電子デバイス用光硬化性樹脂組成物

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200949445A (en) * 2008-03-31 2009-12-01 Fujifilm Corp Photosensitive resin composition, photospacer and method of manufacturing the same, protective film, colored pattern, substrate for display device, and display apparatus
JP2010024447A (ja) * 2008-06-20 2010-02-04 Arakawa Chem Ind Co Ltd 活性エネルギー線硬化型賦型用樹脂組成物、賦型層が表面に設けられた成形体、表面に微細凹凸形状が設けられた成形体および光学部品

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JPH02116036A (ja) * 1988-10-25 1990-04-27 Seiko Epson Corp 光記録媒体
EP0696621B1 (en) * 1994-02-02 2000-10-11 Mitsubishi Rayon Co., Ltd. Coating composition and surface-coated molding produced therewith
JP4090292B2 (ja) * 2002-06-27 2008-05-28 富士フイルム株式会社 染料含有硬化性組成物、並びに、それを使用したカラーフィルターおよびその製造方法
JP2005053152A (ja) 2003-08-06 2005-03-03 Nippon Paper Industries Co Ltd ハードコートフィルム
JP2008069303A (ja) 2006-09-15 2008-03-27 Arakawa Chem Ind Co Ltd カール防止剤、活性エネルギー線硬化性樹脂組成物およびフィルム基材
JP2008105999A (ja) * 2006-10-25 2008-05-08 Idemitsu Kosan Co Ltd アダマンタン誘導体、その製造方法、樹脂組成物およびその硬化物
JP2009098606A (ja) * 2007-09-28 2009-05-07 Fujifilm Corp ネガ型レジスト組成物及びそれを用いたパターン形成方法
KR20090104670A (ko) * 2008-03-31 2009-10-06 후지필름 가부시키가이샤 감광성 수지 조성물, 포토 스페이서와 그 제조방법, 보호막, 착색 패턴, 표시장치용 기판, 및 표시장치
KR101553079B1 (ko) 2008-04-28 2015-09-14 미쓰비시 가가꾸 가부시키가이샤 활성 에너지선 경화성 수지 조성물, 경화막, 적층체, 광 기록 매체 및 경화막의 제조 방법
JP5713528B2 (ja) 2008-11-18 2015-05-07 三菱化学株式会社 活性エネルギー線硬化性樹脂組成物、ハードコート用硬化膜及び積層体
JP2012063728A (ja) * 2010-09-17 2012-03-29 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物、並びに、該組成物を用いたレジスト膜及びパターン形成方法
JP5386527B2 (ja) * 2011-02-18 2014-01-15 富士フイルム株式会社 パターン形成方法、感活性光線性又は感放射線性樹脂組成物、及びレジスト膜

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200949445A (en) * 2008-03-31 2009-12-01 Fujifilm Corp Photosensitive resin composition, photospacer and method of manufacturing the same, protective film, colored pattern, substrate for display device, and display apparatus
JP2010024447A (ja) * 2008-06-20 2010-02-04 Arakawa Chem Ind Co Ltd 活性エネルギー線硬化型賦型用樹脂組成物、賦型層が表面に設けられた成形体、表面に微細凹凸形状が設けられた成形体および光学部品

Also Published As

Publication number Publication date
CN103717629A (zh) 2014-04-09
TW201321422A (zh) 2013-06-01
CN103717629B (zh) 2016-05-18
KR101959586B1 (ko) 2019-03-18
KR20140044845A (ko) 2014-04-15
TWI616462B (zh) 2018-03-01
WO2013021650A1 (ja) 2013-02-14
JP6099565B2 (ja) 2017-03-22
TW201731887A (zh) 2017-09-16
JPWO2013021650A1 (ja) 2015-03-05

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