WO2014051050A1 - ポリイミド樹脂組成物 - Google Patents
ポリイミド樹脂組成物 Download PDFInfo
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- WO2014051050A1 WO2014051050A1 PCT/JP2013/076262 JP2013076262W WO2014051050A1 WO 2014051050 A1 WO2014051050 A1 WO 2014051050A1 JP 2013076262 W JP2013076262 W JP 2013076262W WO 2014051050 A1 WO2014051050 A1 WO 2014051050A1
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- Prior art keywords
- polyimide resin
- diamine
- resin composition
- mol
- polyimide
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/088—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyamides
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- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
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- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
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- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1075—Partially aromatic polyimides
- C08G73/1078—Partially aromatic polyimides wholly aromatic in the diamino moiety
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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- C08K3/36—Silica
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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- H—ELECTRICITY
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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Definitions
- the present invention relates to a polyimide resin composition. More specifically, the present invention relates to a polyimide resin composition that is excellent in transparency and heat resistance and can form a polyimide film having a low coefficient of thermal expansion.
- polyimide In addition to its excellent heat resistance, polyimide has excellent properties in terms of mechanical properties, chemical resistance, electrical properties, etc., so films made from polyimide can be used as molding materials, composite materials, and electrical / electronic components. And widely used in the field of display devices and the like.
- the film is required to have transparency and dimensional stability more than ever.
- Various structures have been proposed for both dianhydrides and diamines.
- Patent Document 1 discloses a polyimide film containing a specific repeating unit and excellent in heat resistance and linear expansion coefficient.
- the polyimide film disclosed in Patent Document 1 has a thickness of 50 ⁇ m and a YI value of about 15 and has a strong yellow tint. In order to obtain sufficient transparency, it is desirable to further reduce coloring.
- Patent Document 2 discloses a polyamic acid resin composition containing 0.3 to 15% by weight of nanolayer silica sheet and / or nanometer silica powder, and low water absorption, high transparency and A polyimide film having characteristics such as high dimensional stability is disclosed.
- the polyimide film disclosed in Patent Document 2 has a transmittance of about 30 to 40% at a thickness of 25 ⁇ m, and it is necessary to further improve the transparency depending on the application.
- the content of silica is increased in order to improve heat resistance and dimensional stability, it is expected that the transparency of the film is lowered.
- Patent Document 3 discloses a polyimide resin obtained by reacting a 1,2,4,5-cyclohexanetetracarboxylic acid derivative component and a diamine component having a specific skeleton, and a polyimide containing the polyamide resin and silica fine particles.
- a varnish and a polyimide molded body excellent in transparency, flexibility and the like obtained by molding the varnish are disclosed.
- Patent Document 4 discloses a silicon dioxide fine particle having a specific particle size and a polyimide film mainly composed of polyimide.
- the film disclosed in the example of Patent Document 4 has a light transmittance of 90% at a thickness of about 13 ⁇ m and an average coefficient of thermal expansion exceeding 50 ppm, transparency and thermal expansion. Improvement in both rates is desired.
- An object of the present invention is to provide a polyimide resin composition that can form a polyimide film having excellent transparency and heat resistance and a low coefficient of thermal expansion.
- the present inventors have developed a polyimide resin composition containing a polyimide resin obtained by reacting a tetracarboxylic dianhydride with a diamine containing a specific amount of a phenolic hydroxyl group-containing diamine, and silica fine particles in a specific mass ratio.
- the inventors have found that the above problems can be solved by using a product, and have completed the invention.
- the present invention relates to the following [1] to [13].
- the diamine (B) comprises 10 to 95 mol% of a phenolic hydroxyl group-containing diamine represented by the general formula (1), 5 to 90 mol% of 2,2′-bis (trifluoromethyl) benzidine.
- the polyimide resin composition according to [6] above comprising: [8] The polyimide resin composition according to any one of [1] to [7], wherein the silica fine particles have an average particle diameter of 1 to 100 nm. [9] The polyimide resin composition according to any one of [1] to [8] above, wherein the silica fine particles are surface-treated with an amino group-containing silane coupling agent. [10] A polyimide film comprising the polyimide resin composition according to any one of [1] to [9]. [11] The polyimide film according to [10], wherein the total light transmittance at a thickness of 50 ⁇ m is 85% or more.
- the base material is a copper foil.
- the polyimide resin composition of the present invention contains a polyimide resin having a specific structure with high affinity with silica fine particles that are inorganic, the dispersibility of the silica fine particles in the composition becomes good, The content of silica fine particles can be increased. Therefore, the polyimide film using the polyimide resin composition of the present invention is excellent in transparency and heat resistance, and has a low coefficient of thermal expansion, so that there is little dimensional change due to heat, and it is suitably used as a film for various members. Specifically, it is expected to be used for color filters, flexible displays, semiconductor parts, optical members, and the like.
- the polyimide resin composition of the present invention comprises a polyimide resin obtained by reacting tetracarboxylic dianhydride (A) with a diamine (B) containing a phenolic hydroxyl group-containing diamine in an amount of 5 to 100 mol% of the total diamine; And silica fine particles in a mass ratio of 25/75 to 60/40.
- Polyimide resin The polyimide resin contained in the polyimide resin composition of the present invention is obtained by reacting a tetracarboxylic dianhydride (A) with a diamine (B) containing a phenolic hydroxyl group-containing diamine in an amount of 5 to 100 mol% of the total diamine. Is obtained.
- tetracarboxylic dianhydride (A) examples include aromatic tetracarboxylic dianhydrides and aliphatic tetracarboxylic dianhydrides.
- aromatic tetracarboxylic dianhydride examples include 3,3 ′, 4,4′-diphenylsulfone tetracarboxylic dianhydride, 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride 4,4'-oxydiphthalic dianhydride, pyromellitic dianhydride, 2,2 ', 3,3'-benzophenone tetracarboxylic dianhydride, 3,3', 4,4'-biphenyltetracarboxylic Acid dianhydride, 2,2 ′, 3,3′-biphenyltetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2, 3-dicarboxyphenyl) propane dianhydride, 2,2-bis (3,4-dicarboxyphenoxyphenyl) propane dianhydride, 1,1-bis (2,3-dicarboxyphenyl)
- Examples of the aliphatic tetracarboxylic dianhydride include a cyclic or acyclic aliphatic tetracarboxylic dianhydride.
- the cycloaliphatic tetracarboxylic dianhydride is a tetracarboxylic dianhydride having an alicyclic hydrocarbon structure, and specific examples thereof include 1,2,4,5-cyclohexanetetracarboxylic dianhydride.
- Cycloalkanetetracarboxylic dianhydrides such as 1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1,2,4,5-cyclopentanetetracarboxylic dianhydride; bicyclo [2.2 .2] octa-7-ene-2,3,5,6-tetracarboxylic dianhydride, dicyclohexyltetracarboxylic dianhydride, or their positional isomers. These can be used alone or in combination of two or more.
- acyclic aliphatic tetracarboxylic dianhydride examples include 1,2,3,4-butanetetracarboxylic dianhydride, 1,2,3,4-pentanetetracarboxylic dianhydride and the like. These may be used alone or in combination of two or more.
- aliphatic tetracarboxylic dianhydrides are used from the viewpoint of transparency, heat resistance, low linear expansion coefficient, low coloring, and easy to obtain high molecular weight polyimide. It is preferable to use a cycloalkanetetracarboxylic dianhydride, more preferably a cycloalkanetetracarboxylic dianhydride having 4 to 6 ring carbon atoms, still more preferably 1, 2, 4, It is even more preferable to use 5-cyclohexanetetracarboxylic dianhydride.
- the polyimide resin used in the present invention is a tetracarboxylic acid or a tetracarboxylic acid derivative other than tetracarboxylic dianhydride (A), for example, pyromellitic acid, as long as various physical properties of the obtained polyimide film are not impaired.
- the amount of tetracarboxylic acid or a tetracarboxylic acid derivative other than tetracarboxylic dianhydride (A) is preferably 10 mol% or less, more preferably 5%, based on the total tetracarboxylic dianhydride (A). The mol% or less, more preferably 1 mol% or less.
- the diamine (B) used in the present invention contains a phenolic hydroxyl group-containing diamine in an amount of 5 to 100 mol% of the total diamine.
- a phenolic hydroxyl group-containing diamine By using the phenolic hydroxyl group-containing diamine, hydroxyl groups are introduced into the structure of the polyimide resin used in the present invention, and the affinity with silica fine particles, which are inorganic substances, is improved. Therefore, the dispersibility of the silica fine particles in the polyimide resin composition is improved, and the content of the silica fine particles in the composition can be increased, so that the polyimide is excellent in transparency and heat resistance and has a small coefficient of thermal linear expansion. A film can be obtained.
- the phenolic hydroxyl group-containing diamine contained in the diamine (B) is not particularly limited as long as it is a diamine having a phenol skeleton in the molecule, and the phenolic hydroxyl group-containing diamine is represented by the following general formula (1). It is preferable to contain a diamine.
- the diamine represented by the following general formula (1) is preferably used from the viewpoint of obtaining the effects of the present invention and the point of availability.
- X 1 represents a direct bond, —CH 2 —, —O—, —S—, —SO 2 —, —CONH—, —CO—, or —C (CH 3 ) 2 —).
- X 1 is at least one selected from a direct bond, —CH 2 —, —O—, —SO 2 —, —CO—, and —C (CH 3 ) 2 —.
- the diamine represented by the general formula (1) is preferably at least one selected from diamines represented by the following general formulas (2) to (6), from the viewpoint of a low thermal expansion coefficient.
- a diamine (3,3′-dihydroxybenzidine) represented by the following general formula (2) is more preferable.
- the said phenolic hydroxyl group containing diamine can be used individually or in combination of 2 or more types.
- the content of the phenolic hydroxyl group-containing diamine in the diamine (B) is 5 to 100 mol% of the total diamine from the viewpoint of the transparency, heat resistance, and low thermal expansion coefficient of the resulting polyimide resin composition and polyimide film. 5 to 90 mol%, preferably 10 to 70 mol%, more preferably 10 to 50 mol%, still more preferably 15 to 50 mol%, More preferably, it is 15 to 40 mol%.
- the diamine (B) used in the present invention contains a diamine other than the phenolic hydroxyl group-containing diamine from the viewpoint of the transparency, heat resistance, and low thermal linear expansion coefficient of the resulting polyimide resin composition and polyimide film. It may be. There is no restriction
- the “aromatic diamine” represents a diamine in which an amino group is directly bonded to an aromatic ring, and an aliphatic group or other substituent may be included in a part of the structure.
- the aromatic ring may be a single ring or a condensed ring, and examples thereof include, but are not limited to, a benzene ring, a naphthalene ring, an anthracene ring, a fluorene ring, and a tetracene ring. Among these, Preferably it is at least 1 sort (s) chosen from a benzene ring, a naphthalene ring, and a fluorene ring, More preferably, it is a benzene ring.
- the “aliphatic diamine” refers to a diamine in which an amino group is directly bonded to an aliphatic group, and an aromatic ring or other substituent may be included in a part of the structure.
- aliphatic diamine examples include acyclic aliphatic diamines such as ethylene diamine, hexamethylene diamine, polyethylene glycol bis (3-aminopropyl) ether, and polypropylene glycol bis (3-aminopropyl) ether; 1,3-bis ( And cycloaliphatic diamines such as aminomethyl) cyclohexane, 1,4-bis (aminomethyl) cyclohexane, isophoronediamine, norbornanediamine, 4,4′-diaminodicyclohexylmethane; and siloxane diamines. Or two or more types can be used in combination.
- acyclic aliphatic diamines such as ethylene diamine, hexamethylene diamine, polyethylene glycol bis (3-aminopropyl) ether, and polypropylene glycol bis (3-aminopropyl) ether
- 1,3-bis ( And cycloaliphatic diamines such as amino
- aromatic diamines examples include m-xylylenediamine, p-xylylenediamine, 1,4-phenylenediamine, 1,3-phenylenediamine, 2,4-toluenediamine, 2,6-diaminonaphthalene, 1, Aromatic diamines having one aromatic ring, such as 5-diaminonaphthalene; 2,2′-bis (trifluoromethyl) benzidine, 4,4′-bis (4-aminophenoxy) biphenyl, 4,4′-diamino Diphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane, 1,4-bis (4-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 4,4'-diamino Diphenylsulfone, bis [4- (4-aminophenoxy) phenyl] sulfone,
- aromatic diamines are preferably used from the viewpoint of heat resistance and a low coefficient of thermal expansion, more preferably aromatic diamines having two or more aromatic rings, and 2,2′-bis (tri It is more preferable to use one or more selected from fluoromethyl) benzidine, 4,4′-bis (4-aminophenoxy) biphenyl, and 4,4′-diaminodiphenyl ether. From the viewpoint of transparency, 2,2′- More preferably, bis (trifluoromethyl) benzidine is used.
- the diamine (B) used in the present invention is 10 to 95 mol% of a phenolic hydroxyl group-containing diamine and 2,2′-bis (trifluoromethyl) benzidine 5 to 90. It is preferable to contain mol%. Preferred types of the phenolic hydroxyl group-containing diamine are the same as described above. In this case, the content of the phenolic hydroxyl group-containing diamine in the diamine (B) is more preferably 10 to 70 mol%, further preferably 10 to 50 mol%, and more preferably 15 to 50 mol%. More preferably, it is more preferably 15 to 40 mol%.
- the content of 2,2′-bis (trifluoromethyl) benzidine in the diamine (B) is more preferably 30 to 90 mol%, further preferably 50 to 90 mol%, and more preferably 50 to 85 mol%. More preferably, it is mol%, and still more preferably 60 to 85 mol%. Further, from the viewpoint of colorless transparency and a low coefficient of thermal expansion, the diamine (B) used in the present invention is 10 to 95 mol% of the phenolic hydroxyl group-containing diamine represented by the general formula (1), and 2, 2 It is particularly preferable that it comprises 5 to 90 mol% of '-bis (trifluoromethyl) benzidine.
- the content of the phenolic hydroxyl group-containing diamine represented by the general formula (1) in the diamine (B) is more preferably 10 to 70 mol%, and 10 to 50 mol%. More preferably, it is more preferably 15 to 50 mol%, still more preferably 15 to 40 mol%.
- the content of 2,2′-bis (trifluoromethyl) benzidine in the diamine (B) is more preferably 30 to 90 mol%, further preferably 50 to 90 mol%, and more preferably 50 to 85 mol%. More preferably, it is mol%, and still more preferably 60 to 85 mol%.
- Tetracarboxylic dianhydride (A), diamine (B), and a reaction solvent are charged into a reactor, and immediately The method etc. which temperature-rise and perform imidation reaction are mentioned.
- the charge ratio of the tetracarboxylic dianhydride (A) to the diamine (B) is such that the diamine (B) is 0.9 to 1 mole of the tetracarboxylic dianhydride (A). It is preferable that it is 1.1 mol.
- the reaction solvent used for the production of the polyimide resin used in the present invention may be any solvent that does not inhibit the imidization reaction and can dissolve the produced polyimide resin.
- an aprotic solvent, a phenol solvent, an ether solvent, a carbonate solvent, and the like can be given.
- aprotic solvents include N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methylcaprolactam, 1,3-dimethylimidazolidinone, tetramethylurea, etc.
- Amide solvents lactone solvents such as ⁇ -butyrolactone and ⁇ -valerolactone, phosphorus-containing amide solvents such as hexamethylphosphoric amide and hexamethylphosphine triamide, sulfur-containing dimethylsulfone, dimethylsulfoxide, sulfolane and the like
- solvents such as ketone solvents such as acetone, cyclohexane and methylcyclohexane, amine solvents such as picoline and pyridine, and ester solvents such as acetic acid (2-methoxy-1-methylethyl).
- phenol solvent examples include phenol, o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4 -Xylenol, 3,5-xylenol and the like.
- ether solvents include 1,2-dimethoxyethane, bis (2-methoxyethyl) ether, 1,2-bis (2-methoxyethoxy) ethane, bis [2- (2-methoxyethoxy) ethyl].
- examples include ether, tetrahydrofuran, 1,4-dioxane and the like.
- carbonate solvents include diethyl carbonate, methyl ethyl carbonate, ethylene carbonate, propylene carbonate, and the like.
- reaction solvents amide solvents or lactone solvents are preferable. Moreover, you may use said reaction solvent individually or in mixture of 2 or more types.
- the imidization reaction it is preferable to carry out the reaction using a Dean Stark apparatus or the like while removing water generated during production. By performing such an operation, the degree of polymerization and the imidization rate can be further increased.
- a known imidation catalyst can be used.
- the imidization catalyst include a base catalyst and an acid catalyst.
- Base catalysts include pyridine, quinoline, isoquinoline, ⁇ -picoline, ⁇ -picoline, 2,4-lutidine, 2,6-lutidine, trimethylamine, triethylamine, tripropylamine, tributylamine, imidazole, N, N-dimethylaniline
- organic base catalysts such as N, N-diethylaniline and inorganic base catalysts such as potassium hydroxide, sodium hydroxide, potassium carbonate, sodium carbonate, potassium bicarbonate, sodium bicarbonate.
- the acid catalyst examples include crotonic acid, acrylic acid, trans-3-hexenoic acid, cinnamic acid, benzoic acid, methylbenzoic acid, oxybenzoic acid, terephthalic acid, benzenesulfonic acid, p-toluenesulfonic acid, naphthalenesulfonic acid, etc. Is mentioned.
- a base catalyst more preferably an organic base catalyst, and still more preferably triethylamine.
- the temperature of the imidization reaction is preferably 120 to 250 ° C., more preferably 160 to 190 ° C., from the viewpoint of suppressing the reaction rate and gelation.
- the reaction time is preferably 0.5 to 10 hours after the start of distillation of the produced water.
- the polyimide resin used in the present invention is obtained by reacting tetracarboxylic dianhydride (A) and diamine (B) by the above method.
- the number average molecular weight of the polyimide resin used in the present invention is preferably 5,000 to 500,000 from the viewpoint of the strength of the obtained polyimide film.
- the number average molecular weight of the polyimide resin can be measured by gel filtration chromatography or the like.
- the polyimide resin composition of the present invention contains the polyimide resin and silica fine particles.
- the silica used for the silica fine particles is silicon dioxide (SiO 2 ), and the form (crystalline form, amorphous form, etc.) is not limited.
- the shape of the silica fine particles is not particularly limited, and examples thereof include a spherical shape, an elliptical shape, a flat shape, a rod shape, and a fiber shape.
- the silica fine particles used in the present invention preferably have a small particle diameter from the viewpoint of maintaining high light transmittance in the polyimide resin composition and the polyimide film, and the average particle diameter is preferably 1 to 100 nm, more preferably The range is 1 to 50 nm, more preferably 2 to 25 nm, and still more preferably 5 to 20 nm.
- the average particle diameter of the silica fine particles can be measured by, for example, the BET method.
- the silica fine particles may be surface-treated with a surface treatment agent such as a silane coupling agent from the viewpoint of dispersibility in a polyimide resin.
- a surface treatment agent such as a silane coupling agent
- Amino group containing silane coupling agent is preferable from an affinity viewpoint with a polyimide resin.
- amino group-containing silane coupling agents include 3- (2-aminoethylamino) propyldimethoxymethylsilane, 3- (2-aminoethylamino) propyltrimethoxysilane, and 3- (2-aminoethylamino) propyl.
- the surface treatment method of the silica fine particles with the silane coupling agent is not particularly limited, and a known method can be used. For example, it can be carried out by preparing a dispersion in which silica fine particles are dispersed in an organic solvent and the like, adding the above-mentioned silane coupling agent thereto, and stirring for several hours at a temperature of about room temperature to 80 ° C. . At this time, a small amount of water may be added to accelerate the treatment reaction.
- the polyimide resin composition of the present invention contains the polyimide resin and silica fine particles in a mass ratio of 25/75 to 60/40.
- the mass ratio of the polyimide resin is less than 25, the flexibility of the obtained polyimide film tends to decrease.
- the mass ratio of the polyimide resin exceeds 60, the heat resistance of the obtained polyimide resin composition and the polyimide film is high. It decreases and the coefficient of thermal linear expansion increases.
- the mass ratio of the polyimide resin and the silica fine particles is preferably 30/70 to 60/40, more preferably 30/70 to 50/50, and more preferably 30/70 to 50/50, from the viewpoint of transparency, heat resistance, and low thermal linear expansion coefficient. It is preferably 40/60 to 50/50.
- the polyimide resin composition of the present invention may contain additives other than the polyimide resin and silica fine particles as long as the effects of the present invention are not impaired.
- additives include antioxidants, light stabilizers, surfactants, flame retardants, plasticizers, ultraviolet absorbers, and polymer compounds other than the polyimide resin.
- the method for preparing the polyimide resin composition of the present invention is not particularly limited.
- the silica fine particles may be a dispersion obtained by dispersing silica fine particles in an organic solvent or the like, or silica fine particle powder produced by a vapor phase method as colloidal silica may be used.
- Examples of the organic solvent used in the dispersion of silica fine particles include methanol, isopropanol, ethylene glycol, methyl ethyl ketone, N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, and the like. From the viewpoint of solubility, at least one selected from N-methyl-2-pyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide is preferable.
- the solid content concentration of the polyimide resin composition of the present invention can be appropriately selected according to workability and the like when forming a polyimide film or a laminate described later, and the solid content of the composition can be added by adding an organic solvent.
- the partial concentration and viscosity may be adjusted.
- the organic solvent is not particularly limited as long as it can dissolve the polyimide resin. From the viewpoint of the solubility of the polyimide resin, N-methyl-2-pyrrolidone, 1,3-dimethylimidazolidinone, N , N-dimethylformamide and at least one selected from N, N-dimethylacetamide are preferred.
- the polyimide film of the present invention is characterized by using the polyimide resin composition, thereby having transparency, heat resistance, and a low coefficient of thermal expansion.
- limiting in particular in the preparation method of the polyimide film of this invention Although a well-known method can be used, for example, after apply
- an organic solvent the thing similar to the reaction solvent used for manufacture of the polyimide resin mentioned above is used preferably.
- the thickness of the polyimide film of the present invention can be appropriately selected depending on the application and the like, but is preferably in the range of 0.1 to 500 ⁇ m, more preferably 1 to 250 ⁇ m.
- the polyimide film of the present invention preferably has a total light transmittance of 85% or more at a thickness of 50 ⁇ m, more preferably 90% or more.
- the polyimide film of the present invention preferably has a coefficient of thermal expansion of 50 ppm / ° C. or less, more preferably 40 ppm / ° C. or less, still more preferably 35 ppm / ° C. or less, and the glass transition temperature is preferably from the viewpoint of heat resistance. It is 300 degreeC or more, More preferably, it is 320 degreeC or more.
- the total light transmittance, the thermal expansion coefficient, and the glass transition temperature of the polyimide film can be measured by the methods described in the examples.
- the present invention also provides a laminate having a substrate selected from a plastic film, a silicon wafer, a metal foil and glass, and a polyimide resin layer using the polyimide resin composition of the present invention.
- the base material used for the laminate of the present invention is selected from a plastic film, a silicon wafer, a metal foil, and glass.
- the resin constituting the plastic film include polyolefins such as homopolymers or copolymers such as ethylene, propylene and isobutene, amorphous polyolefins such as cyclic polyolefins, polyethylene terephthalate, polyethylene-2,6-naphthalate and the like.
- Polyester nylon 6, nylon 66, nylon 12, polyamide such as copolymer nylon, polyvinyl alcohol, ethylene-vinyl acetate copolymer partial hydrolyzate (EVOH), polyimide, polyetherimide, polysulfone, polyethersulfone, poly Examples thereof include biodegradable resins such as ether ether ketone, polycarbonate, polyarylate, fluororesin, acrylic resin, and polylactic acid.
- biodegradable resins such as ether ether ketone, polycarbonate, polyarylate, fluororesin, acrylic resin, and polylactic acid.
- polyethylene-2,6-naphthalate, polyimide, polyetherimide, polysulfone, polyethersulfone, and polycarbonate are preferable from the viewpoints of heat resistance and dimensional stability.
- the base material is preferably a metal foil, and more preferably a copper foil.
- the thickness of the substrate can be appropriately selected according to the use of the laminate, but is preferably in the range of 0.1 to 500 ⁇ m, more preferably 1 to 250 ⁇ m.
- the polyimide resin layer used in the laminate of the present invention uses the polyimide resin composition of the present invention, and the polyimide resin composition is as described above.
- the thickness of the polyimide resin layer can be appropriately selected according to the use of the laminate, but is preferably in the range of 0.5 to 50 ⁇ m, more preferably 1 to 10 ⁇ m.
- the method for producing the laminate of the present invention is not particularly limited, and a known method can be used.
- a method of removing the organic solvent after applying the polyimide resin composition of the present invention containing the organic solvent to the base material can be mentioned.
- the polyimide resin composition and the polyimide film of the present invention are suitably used as films for various members. Specific examples include a color filter, a flexible display, a semiconductor component, and an optical member. Moreover, the laminated body of this invention is used suitably as a printed wiring board.
- thermomechanical analyzer (TMA / SS6100) manufactured by SII NanoTechnology Co., Ltd.
- TMA measurement was performed at a temperature increase rate of 10 ° C / min, and thermal linear expansion at 100 to 200 ° C was performed. The coefficient was obtained.
- the hydrogen gas in the reactor was replaced with nitrogen gas, the reaction solution was extracted from the autoclave, and the reaction solution was filtered while hot to separate the catalyst.
- the filtrate was concentrated by evaporating water under reduced pressure using a rotary evaporator to precipitate crystals.
- the precipitated crystals were separated into solid and liquid at room temperature and dried to obtain 481 g of 1,2,4,5-cyclohexanetetracarboxylic acid (yield 85.0%).
- 450 g of the obtained 1,2,4,5-cyclohexanetetracarboxylic acid and 4000 g of acetic anhydride were charged into a 5-liter glass separable flask (with a Dimroth condenser), and the inside of the reactor was stirred.
- Example 1 In a 500 mL five-necked flask equipped with a thermometer, stirrer, nitrogen inlet tube, dropping funnel with side tube, Dean Stark apparatus, and condenser tube, 2,2′-bis (trifluoromethyl) benzidine 20 as a diamine under a nitrogen stream , 697 g (0.065 mol), 5.998 g (0.028 mol) of 3,3′-dihydroxybenzidine as a phenolic hydroxyl group-containing diamine, and 62.73 g of ⁇ -butyrolactone as an organic solvent were dissolved.
- Example 2 In a 500 mL five-necked flask equipped with a thermometer, stirrer, nitrogen inlet tube, dropping funnel with side tube, Dean-Stark device, and condenser tube, 4,4'-bis (4-aminophenoxy) biphenyl as a diamine under a nitrogen stream 18.515 g (0.050 mol), 2,719 g (0.013 mol) of 3,3′-dihydroxybenzidine as a phenolic hydroxyl group-containing diamine, 42.31 g of ⁇ -butyrolactone and N, N-dimethylacetamide as organic solvents 10.58 g was charged and dissolved.
- Example 3 In a 500 mL five-necked flask equipped with a thermometer, stirrer, nitrogen inlet tube, dropping funnel with side tube, Dean-Stark device, and condenser tube, 4,4'-bis (4-aminophenoxy) biphenyl as a diamine under a nitrogen stream 20.244 g (0.055 mol), 1,321 g (0.006 mol) of 3,3′-dihydroxybenzidine as a phenolic hydroxyl group-containing diamine, 42.24 g of ⁇ -butyrolactone and N, N-dimethylacetamide as organic solvents 10.56 g was charged and dissolved.
- Example 4 In a 500 mL five-necked flask equipped with a thermometer, stirrer, nitrogen inlet tube, dropping funnel with side tube, Dean-Stark device, and condenser tube, 2,2′-bis (trifluoromethyl) benzidine 15 as a diamine under a nitrogen stream 523 g (0.048 mol), 4,498 g (0.021 mol) of 3,3′-dihydroxybenzidine as a phenolic hydroxyl group-containing diamine, and 65.91 g of ⁇ -butyrolactone as an organic solvent were dissolved.
- Example 5 2,2′-bis (trifluoromethyl) benzidine 13 as a diamine under a nitrogen stream in a 500 mL five-necked flask equipped with a thermometer, stirrer, nitrogen inlet tube, dropping funnel with side tube, Dean Stark apparatus, and condenser tube .696 g (0.043 mol) and 4,4′-diaminodiphenyl ether 2.851 g (0.014 mol), 3.087 g (0.014 mol) of 3,3′-dihydroxybenzidine as a phenol hydroxyl group-containing diamine, As an organic solvent, 66.05 g of ⁇ -butyrolactone was charged and dissolved.
- Example 6> After obtaining a polyimide resin solution in the same manner as in Example 2, “DMAC-ST” (average particle size 11 nm, silica content 20 mass%, N, N-dimethylacetamide solution: manufactured by Nissan Chemical Industries, Ltd.) as silica fine particles ) was added and stirred and mixed for 2 hours to obtain a polyimide resin composition. A polyimide film having a thickness of 50 ⁇ m was obtained in the same manner as in Example 2 using the obtained polyimide resin composition. The results are shown in Table 1.
- HPMDA 1,2,4,5-cyclohexanetetracarboxylic dianhydride
- HAB 3,3′-dihydroxybenzidine
- TFMB 2,2′-bis (trifluoromethyl) benzidine
- BAPB 4,4′-bis (4 -Aminophenoxy) biphenyl
- MBAA 3,3'-dicarboxy-4,4'-diaminodiphenylmethane
- ODA 4,4'-diaminodiphenyl ether
- the polyimide film using the polyimide resin composition of the present invention is excellent in transparency and heat resistance, and has a low coefficient of thermal expansion, so that there is little dimensional change due to heat, and is suitably used as a film for various members. Specifically, it is expected to be used for color filters, flexible displays, semiconductor parts, optical members, and the like. Moreover, the laminated body of this invention is used suitably as a printed wiring board etc.
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Description
表示装置分野では、軽量でフレキシブル性に優れたプラスチック基板へのガラス基板代替検討や、曲げたり丸めたりすることが可能なディスプレイの開発が行われている。しかし、例えば無機材料からなる電子素子をフィルム上に形成した場合、無機材料とフィルムの線膨張係数が大きく異なるために、無機素子を形成したフィルムが曲がったり、更には、無機素子がフィルムから剥がれたりする場合があった。そこで、透明性と耐熱性に加え、熱線膨張係数が低いフィルム用の樹脂材料の開発が望まれている。
一般に、ポリイミドの高分子鎖が剛直で直線性が高いほど熱線膨張率が下がることが知られており、ポリイミドの熱線膨張率を下げて寸法安定性を向上させるために、ポリイミドの原料である酸二無水物、ジアミンの双方で種々の構造が提案されてきた。
特許文献4には、特定の粒径の二酸化ケイ素微粒子と、ポリイミドを主成分とするポリイミドフィルムが開示されている。しかしながら、特許文献4の実施例に開示された該フィルムは厚さ約13μmでの光透過率が90%であり、また平均熱膨張率が50ppmを超えるものであることから、透明性及び熱膨張率のいずれにおいても改善が望まれる。
[1]テトラカルボン酸二無水物(A)と、フェノール性水酸基含有ジアミンをジアミン全体の5~100モル%含有するジアミン(B)とを反応させて得られるポリイミド樹脂と、シリカ微粒子とを質量比で25/75~60/40の割合で含有することを特徴とするポリイミド樹脂組成物。
[2]前記テトラカルボン酸二無水物(A)が、シクロアルカンテトラカルボン酸二無水物である、上記[1]に記載のポリイミド樹脂組成物。
[3]前記シクロアルカンテトラカルボン酸二無水物が、1,2,4,5-シクロへキサンテトラカルボン酸二無水物である、上記[2]に記載のポリイミド樹脂組成物。
[4]前記フェノール性水酸基含有ジアミンが、下記一般式(1)で表されるジアミンを含む、上記[1]~[3]のいずれかに記載のポリイミド樹脂組成物。
[5]前記一般式(1)で表されるジアミンが、下記一般式(2)で表されるジアミンである、上記[4]に記載のポリイミド樹脂組成物。
[7]前記ジアミン(B)が、前記一般式(1)で表されるフェノール性水酸基含有ジアミン10~95モル%と、2,2’-ビス(トリフルオロメチル)ベンジジン5~90モル%とからなる、上記[6]に記載のポリイミド樹脂組成物。
[8]前記シリカ微粒子が、平均粒子径1~100nmである、上記[1]~[7]のいずれかに記載のポリイミド樹脂組成物。
[9]前記シリカ微粒子が、アミノ基含有シランカップリング剤で表面処理されたものである、上記[1]~[8]のいずれかに記載のポリイミド樹脂組成物。
[10]上記[1]~[9]のいずれかに記載のポリイミド樹脂組成物を用いてなる、ポリイミドフィルム。
[11]厚み50μmにおける全光線透過率が85%以上である、上記[10]に記載のポリイミドフィルム。
[12]プラスチックフィルム、シリコンウェハー、金属箔及びガラスから選ばれる基材と、上記[1]~[9]のいずれかに記載のポリイミド樹脂組成物を用いてなるポリイミド樹脂層とを有する積層体。
[13]前記基材が銅箔である、上記[12]に記載の積層体。
本発明のポリイミド樹脂組成物は、テトラカルボン酸二無水物(A)と、フェノール性水酸基含有ジアミンをジアミン全体の5~100モル%含有するジアミン(B)とを反応させて得られるポリイミド樹脂と、シリカ微粒子とを質量比で25/75~60/40の割合で含有することを特徴とする。
本発明のポリイミド樹脂組成物に含有されるポリイミド樹脂は、テトラカルボン酸二無水物(A)と、フェノール性水酸基含有ジアミンをジアミン全体の5~100モル%含有するジアミン(B)とを反応させて得られるものである。
本発明に用いられるテトラカルボン酸二無水物(A)としては、芳香族テトラカルボン酸二無水物及び脂肪族テトラカルボン酸二無水物が挙げられる。
芳香族テトラカルボン酸二無水物の具体例としては、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸二無水物、3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物、4,4’-オキシジフタル酸二無水物、ピロメリット酸二無水物、2,2’,3,3’-ベンゾフェノンテトラカルボン酸二無水物、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、2,2’,3,3’-ビフェニルテトラカルボン酸二無水物、2,2-ビス(3,4-ジカルボキシフェニル)プロパン二無水物、2,2-ビス(2,3-ジカルボキシフェニル)プロパン二無水物、2,2-ビス(3,4-ジカルボキシフェノキシフェニル)プロパン二無水物、1,1-ビス(2,3-ジカルボキシフェニル)エタン二無水物、1,2-ビス(2,3-ジカルボキシフェニル)エタン二無水物、1,1-ビス(3,4-ジカルボキシフェニル)エタン二無水物、1,2-ビス(3,4-ジカルボキシフェニル)エタン二無水物、ビス(2,3-ジカルボキシフェニル)メタン二無水物、ビス(3,4-ジカルボキシフェニル)メタン二無水物、4,4’-(p-フェニレンジオキシ)ジフタル酸二無水物、4,4’-(m-フェニレンジオキシ)ジフタル酸二無水物、2,3,6,7-ナフタレンテトラカルボン酸二無水物、1,4,5,8-ナフタレンテトラカルボン酸二無水物等が挙げられる。これらは単独で又は2種以上を組み合わせて用いることができる。
非環式脂肪族テトラカルボン酸二無水物の具体例としては、1,2,3,4-ブタンテトラカルボン酸二無水物、1,2,3,4-ペンタンテトラカルボン酸二無水物等が挙げられ、これらは単独で又は2種以上を組み合わせて用いることができる。
一般に、ポリイミド樹脂の原料として、後述するジアミン(B)として脂肪族ジアミンを用いると、中間生成物であるポリアミド酸と脂肪族ジアミンが強固な錯体を形成するために、高分子量ポリイミドが得られにくい。しかし、1,2,4,5-シクロへキサンテトラカルボン酸二無水物と脂肪族ジアミンを用いると、ポリアミド酸と脂肪族ジアミンの結合が比較的弱い錯体が形成されるので、ポリイミドを容易に高分子量化できる。
テトラカルボン酸、又はテトラカルボン酸二無水物(A)以外のテトラカルボン酸誘導体の使用量は、全テトラカルボン酸二無水物(A)に対して、好ましくは10モル%以下、より好ましくは5モル%以下、更に好ましくは1モル%以下である。
本発明に用いられるジアミン(B)は、フェノール性水酸基含有ジアミンをジアミン全体の5~100モル%含有する。
フェノール性水酸基含有ジアミンを用いることにより、本発明に用いられるポリイミド樹脂の構造中に水酸基が導入され、無機物であるシリカ微粒子との親和性が向上する。そのため、ポリイミド樹脂組成物中のシリカ微粒子の分散性が良好になり、該組成物中のシリカ微粒子の含有量を多くすることができるので、透明性及び耐熱性に優れ、熱線膨張係数が小さいポリイミドフィルムを得ることができる。
ジアミン(B)に含有されるフェノール性水酸基含有ジアミンとしては、分子中にフェノール骨格を有するジアミンであれば特に制限なく用いられるが、該フェノール性水酸基含有ジアミンが下記一般式(1)で表されるジアミンを含むことが好ましい。下記一般式(1)で表されるジアミンは、本発明の効果を得る観点、及び入手容易な点で好ましく用いられる。
上記一般式(1)において、X1は直接結合、-CH2-、-O-、-SO2-、-CO-、及び-C(CH3)2-から選ばれる少なくとも1種であることが好ましい。
また、上記一般式(1)で表されるジアミンは、下記一般式(2)~(6)で表されるジアミンから選ばれる少なくとも1種であることが好ましく、低熱線膨張係数の観点から、下記一般式(2)で表されるジアミン(3,3’-ジヒドロキシベンジジン)であることがより好ましい。
ジアミン(B)中の前記フェノール性水酸基含有ジアミンの含有量は、得られるポリイミド樹脂組成物及びポリイミドフィルムの透明性、耐熱性、及び低熱線膨張係数の観点から、ジアミン全体の5~100モル%であり、5~90モル%であることが好ましく、10~70モル%であることがより好ましく、10~50モル%であることが更に好ましく、15~50モル%であることが更に好ましく、15~40モル%であることがより更に好ましい。
本発明に用いられるジアミン(B)は、得られるポリイミド樹脂組成物及びポリイミドフィルムの透明性、耐熱性、及び低熱線膨張係数の観点から、前記フェノール性水酸基含有ジアミン以外の他のジアミンを含有していてもよい。
上記その他のジアミンとしては特に制限はなく、脂肪族ジアミン、芳香族ジアミン又はそれらの混合物でもよい。なお、本発明において「芳香族ジアミン」とは、アミノ基が芳香環に直接結合しているジアミンを表し、その構造の一部に脂肪族基又はその他の置換基を含んでいてもよい。芳香環は単環でも縮合環でもよく、ベンゼン環、ナフタレン環、アントラセン環、フルオレン環及びテトラセン環等が例示されるが、これらに限定されるわけではない。これらの中でも、好ましくはベンゼン環、ナフタレン環及びフルオレン環から選ばれる少なくとも1種であり、より好ましくはベンゼン環である。また「脂肪族ジアミン」とは、アミノ基が脂肪族基に直接結合しているジアミンを表し、その構造の一部に芳香環やその他の置換基を含んでいてもよい。
また、無色透明性及び低熱線膨張係数の観点から、本発明に用いられるジアミン(B)が、前記一般式(1)で表されるフェノール性水酸基含有ジアミン10~95モル%と、2,2’-ビス(トリフルオロメチル)ベンジジン5~90モル%とからなることが特に好ましい。
前記一般式(1)で表されるフェノール性水酸基含有ジアミンの好ましい種類は、前記と同様である。また、この場合、ジアミン(B)中の前記一般式(1)で表されるフェノール性水酸基含有ジアミンの含有量は、10~70モル%であることがより好ましく、10~50モル%であることが更に好ましく、15~50モル%であることが更に好ましく、15~40モル%であることがより更に好ましい。ジアミン(B)中の2,2’-ビス(トリフルオロメチル)ベンジジンの含有量は、30~90モル%であることがより好ましく、50~90モル%であることが更に好ましく、50~85モル%であることが更に好ましく、60~85モル%であることがより更に好ましい。
前述のテトラカルボン酸二無水物(A)とジアミン(B)とを反応させて、本発明に用いられるポリイミド樹脂を製造する方法には特に制限はなく、公知の方法を用いることができる。
具体的な反応方法としては、(1)テトラカルボン酸二無水物(A)とジアミン(B)、及び反応溶剤を反応器に仕込み、室温~80℃で0.5~30時間撹拌し、その後に昇温してイミド化反応を行う方法、(2)ジアミン(B)及び反応溶剤を反応器に仕込んで溶解させた後、テトラカルボン酸二無水物(A)を仕込み、室温~80℃で0.5~30時間撹拌し、その後に昇温してイミド化反応を行う方法、(3)テトラカルボン酸二無水物(A)とジアミン(B)、及び反応溶剤を反応器に仕込み、直ちに昇温してイミド化反応を行う方法等が挙げられる。
ポリイミド樹脂を製造する際、テトラカルボン酸二無水物(A)とジアミン(B)の仕込み量比は、テトラカルボン酸二無水物(A)1モルに対してジアミン(B)が0.9~1.1モルであることが好ましい。
本発明に用いられるポリイミド樹脂の製造に用いられる反応溶剤は、イミド化反応を阻害せず、生成するポリイミド樹脂を溶解できるものであればよい。例えば、非プロトン性溶剤、フェノール系溶剤、エーテル系溶剤、カーボネート系溶剤等が挙げられる。
塩基触媒としては、ピリジン、キノリン、イソキノリン、α-ピコリン、β-ピコリン、2,4-ルチジン、2,6-ルチジン、トリメチルアミン、トリエチルアミン、トリプロピルアミン、トリブチルアミン、イミダゾール、N,N-ジメチルアニリン、N,N-ジエチルアニリン等の有機塩基触媒、水酸化カリウムや水酸化ナトリウム、炭酸カリウム、炭酸ナトリウム、炭酸水素カリウム、炭酸水素ナトリウム等の無機塩基触媒が挙げられる。
また、酸触媒としては、クロトン酸、アクリル酸、トランス-3-ヘキセノイック酸、桂皮酸、安息香酸、メチル安息香酸、オキシ安息香酸、テレフタル酸、ベンゼンスルホン酸、パラトルエンスルホン酸、ナフタレンスルホン酸等が挙げられる。
本発明のポリイミド樹脂組成物は、前記ポリイミド樹脂と、シリカ微粒子とを含有する。
シリカ微粒子に使用されるシリカとは、二酸化ケイ素(SiO2)のことであり、その形態(結晶形態、無定形など)については限定されない。また、シリカ微粒子の形状も特に限定されず、球状、楕円形状、扁平状、ロッド状、繊維状などが挙げられる。
シリカ微粒子の平均粒子径は、例えばBET法により測定することができる。
シランカップリング剤としては公知のものを用いることができるが、ポリイミド樹脂との親和性の観点から、アミノ基含有シランカップリング剤が好ましい。アミノ基含有シランカップリング剤としては、例えば、3-(2-アミノエチルアミノ)プロピルジメトキシメチルシラン、3-(2-アミノエチルアミノ)プロピルトリメトキシシラン、3-(2-アミノエチルアミノ)プロピルトリエトキシシラン、3-(3-アミノプロピルアミノ)プロピルトリエトキシシラン、3-(3-アミノプロピルアミノ)プロピルトリメトキシシラン、3-アミノプロピルジエトキシメチルシラン、3-アミノプロピルトリエトキシシラン、3-アミノプロピルトリメトキシラン等が挙げられる。これらは単独で又は2種以上を組み合わせて用いることができる。
ポリイミド樹脂とシリカ微粒子との質量比は、透明性、耐熱性、及び低熱線膨張係数の観点から、好ましくは30/70~60/40であり、より好ましくは30/70~50/50、更に好ましくは40/60~50/50である。
本発明のポリイミド樹脂組成物は、本発明の効果を損なわない範囲で、前記ポリイミド樹脂及びシリカ微粒子以外の添加剤を含有していてもよい。例えば、酸化防止剤、光安定剤、界面活性剤、難燃剤、可塑剤、紫外線吸収剤、前記ポリイミド樹脂以外の高分子化合物等が挙げられる。
本発明のポリイミド樹脂組成物の調製方法としては、特に制限はなく、例えば、前述のようにしてテトラカルボン酸二無水物(A)とジアミン(B)とを反応させて得られたポリイミド樹脂の反応液と、シリカ微粒子、及び必要に応じて用いられるその他の成分とを混合、攪拌することにより調製することができる。
ポリイミド樹脂組成物の調製において、シリカ微粒子は、有機溶剤等にシリカ微粒子を分散させた分散液を用いてもよく、コロイダルシリカとして気相法で製造したシリカ微粒子粉末を用いてもよい。
シリカ微粒子の分散液に用いられる有機溶剤としては、メタノール、イソプロパノール、エチレングリコール、メチルエチルケトン、N-メチル-2-ピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等が挙げられ、ポリイミド樹脂の溶解性の観点から、N-メチル-2-ピロリドン、N,N-ジメチルホルムアミド及びN,N-ジメチルアセトアミドから選ばれる少なくとも1種が好ましい。
該有機溶剤としては、ポリイミド樹脂を溶解させることができるものであれば特に限定されないが、ポリイミド樹脂の溶解性の観点から、N-メチル-2-ピロリドン、1,3-ジメチルイミダゾリジノン、N,N-ジメチルホルムアミド及びN,N-ジメチルアセトアミドから選ばれる少なくとも1種が好ましい。
本発明のポリイミドフィルムは、前記ポリイミド樹脂組成物を用いてなることを特徴とし、これにより透明性及び耐熱性、低熱線膨張係数を有する。
本発明のポリイミドフィルムの作製方法には特に制限はなく、公知の方法を用いることができるが、例えば、有機溶剤を含有する本発明のポリイミド樹脂組成物をフィルム状に塗布又は成形した後、該有機溶剤を除去する方法等が挙げられる。有機溶剤としては、前述したポリイミド樹脂の製造に用いられる反応溶剤と同様のものが好ましく用いられる。
本発明のポリイミドフィルムは、厚み50μmにおける全光線透過率が85%以上であることが好ましく、90%以上であることがより好ましい。
また、本発明のポリイミドフィルムは、熱線膨張係数が好ましくは50ppm/℃以下、より好ましくは40ppm/℃以下、更に好ましくは35ppm/℃以下であり、ガラス転移温度は、耐熱性の観点から好ましくは300℃以上、より好ましくは320℃以上である。
ポリイミドフィルムの全光線透過率、熱線膨張係数、及びガラス転移温度は、具体的には実施例に記載の方法で測定することができる。
本発明はまた、プラスチックフィルム、シリコンウェハー、金属箔及びガラスから選ばれる基材と、本発明のポリイミド樹脂組成物を用いてなるポリイミド樹脂層とを有する積層体を提供する。
本発明の積層体に用いられる基材は、プラスチックフィルム、シリコンウェハー、金属箔及びガラスから選ばれる。
プラスチックフィルムを構成する樹脂としては、例えば、エチレン、プロピレン、イソブテン等の単独重合体又は共重合体等のポリオレフィン、環状ポリオレフィン等の非晶質ポリオレフィン、ポリエチレンテレフタレート、ポリエチレン-2,6-ナフタレート等のポリエステル、ナイロン6、ナイロン66、ナイロン12、共重合ナイロン等のポリアミド、ポリビニルアルコール、エチレン-酢酸ビニル共重合体部分加水分解物(EVOH)、ポリイミド、ポリエーテルイミド、ポリサルホン、ポリエーテルサルホン、ポリエーテルエーテルケトン、ポリカーボネート、ポリアリレート、フッ素樹脂、アクリル樹脂、ポリ乳酸等の生分解性樹脂等が挙げられる。これらのうち、耐熱性及び寸法安定性の観点から、ポリエチレン-2,6-ナフタレート、ポリイミド、ポリエーテルイミド、ポリサルホン、ポリエーテルサルホン、ポリカーボネートが好ましい。
金属箔を構成する金属としては、導電性を有するものであれば特に制限はなく、例えば、金、銀、銅、鉄、ニッケルが挙げられる。これらのうち、銀又は銅が好ましく、銅がより好ましい。
本発明の積層体に用いられるポリイミド樹脂層は、本発明のポリイミド樹脂組成物を用いてなり、ポリイミド樹脂組成物については前述のとおりである。また、ポリイミド樹脂層の厚みは、積層体の用途等に応じて適宜選択することができるが、好ましくは0.5~50μm、より好ましくは1~10μmの範囲である。
実施例及び比較例で得られたポリイミドフィルムの評価は以下のように行った。
エスアイアイ・ナノテクノロジー株式会社製の示差走査熱量計装置(DSC6200)を用い、昇温速度10℃/minの条件でDSC測定を行い、ガラス転移温度を求めた。
エスアイアイ・ナノテクノロジー株式会社製の熱機械的分析装置(TMA/SS6100)を用い、昇温速度10℃/minの条件でTMA測定を行い、100~200℃における熱線膨張係数を求めた。
日本電色工業株式会社製の色彩・濁度同時測定器(COH400)を用いて測定した。
ポリイミド樹脂の数平均分子量は、株式会社島津製作所製のゲルろ過クロマトグラフィー装置(送液ユニット;LC-20AD、オートサンプラ;SIL-10AXL)を用いて、下記条件で測定した。
<測定条件>
検出器;示差屈折率検出器RI:RI-8020型(東ソー株式会社製)
カラム;TSKgel α-M(東ソー株式会社製)
カラム温度;23℃
流速;0.8mL/分
標準試料;単分散ポリスチレン(東ソー株式会社製)
内容積5リットルのハステロイ製(HC22)オートクレーブにピロメリット酸552g、活性炭にロジウムを担持させた触媒(エヌ・イーケムキャット株式会社(N.E.Chemcat Corporation)製)200g、水1656gを仕込み、攪拌しながら反応器内を窒素ガスで置換した。次に水素ガスで反応器内を置換し、反応器の水素圧を5.0MPaとして60℃まで昇温した。水素圧を5.0MPaに保ちながら2時間反応させた。反応器内の水素ガスを窒素ガスで置換し、反応液をオートクレーブより抜き出し、この反応液を熱時濾過して触媒を分離した。濾過液をロータリーエバポレーターで減圧下に水を蒸発させて濃縮し、結晶を析出させた。析出した結晶を室温で固液分離し、乾燥して1,2,4,5-シクロヘキサンテトラカルボン酸481gを得た(収率85.0%)。
続いて、得られた1,2,4,5-シクロヘキサンテトラカルボン酸450gと無水酢酸4000gとを、5リットルのガラス製セパラブルフラスコ(ジムロート冷却管付)に仕込み、攪拌しながら反応器内を窒素ガスで置換した。窒素ガス雰囲気下で溶剤の還流温度まで昇温し、10分間溶剤を還流させた。攪拌しながら室温まで冷却し、結晶を析出させた。析出した結晶を固液分離し、乾燥して一次結晶を得た。更に分離母液をロータリーエバポレーターで減圧下に濃縮し、結晶を析出させた。この結晶を固液分離し、乾燥して二次結晶を得た。一次結晶、二次結晶を合わせて1,2,4,5-シクロヘキサンテトラカルボン酸二無水物375gを得た(無水化の収率96.6%)。
温度計、撹拌器、窒素導入管、側管付き滴下ロート、ディーンスターク装置、冷却管を備えた500mL5つ口フラスコに、窒素気流下、ジアミンとして2,2’-ビス(トリフルオロメチル)ベンジジン20.697g(0.065モル)と、フェノール水酸基含有ジアミンとして3,3’-ジヒドロキシベンジジン5.998g(0.028モル)と、有機溶剤としてγ-ブチロラクトン62.73gを仕込んで溶解させた。ここに、製造例1で合成した1,2,4,5-シクロヘキサンテトラカルボン酸二無水物20.688g(0.092モル)及びイミド化触媒としてトリエチルアミン4.67g(0.05モル)を滴下により一括で添加した。滴下終了後、180℃に昇温し、随時留出液を留去させながら2時間還流を行い、水の留出が終わったことを確認して60℃まで冷却して、ポリイミド樹脂溶液を得た。ポリイミド樹脂の数平均分子量は48,900であった。
冷却後、シリカ微粒子として「DMAC-ST」(平均粒子径11nm、シリカ含有量20質量%、N,N-ジメチルアセトアミド溶液:日産化学工業株式会社製)を220g添加し、2時間攪拌混合してポリイミド樹脂組成物を得た。
得られたポリイミド樹脂組成物をガラス板上に塗布し、ホットプレート上で100℃、60分間保持し、有機溶剤を揮発させることで自己支持性を有する無色透明な一次乾燥フィルムを得た。このフィルムをステンレス枠に固定し、熱風乾燥機中250℃で2時間加熱して有機溶剤を蒸発させ、厚み50μmのポリイミドフィルムを得た。結果を表1に示す。
温度計、撹拌器、窒素導入管、側管付き滴下ロート、ディーンスターク装置、冷却管を備えた500mL5つ口フラスコに、窒素気流下、ジアミンとして4,4’-ビス(4-アミノフェノキシ)ビフェニル18.515g(0.050モル)と、フェノール水酸基含有ジアミンとして3,3’-ジヒドロキシベンジジン2.719g(0.013モル)と、有機溶剤としてγ-ブチロラクトン42.31g及びN,N-ジメチルアセトアミド10.58gを仕込んで溶解させた。ここに、製造例1で合成した1,2,4,5-シクロヘキサンテトラカルボン酸二無水物14.072g(0.063モル)及びイミド化触媒としてトリエチルアミン0.3g(0.005モル)を滴下により一括で添加した。滴下終了後、180℃に昇温し、随時留出液を留去させながら1時間還流を行い、水の留出が終わったことを確認して60℃まで冷却して、ポリイミド樹脂溶液を得た。ポリイミド樹脂の数平均分子量は385,000であった。
60℃に冷却後、シリカ微粒子として「DMAC-ST」(平均粒子径11nm、シリカ含有量20質量%、N,N-ジメチルアセトアミド溶液:日産化学工業株式会社製)を165g添加し、2時間攪拌混合してポリイミド樹脂組成物を得た。
得られたポリイミド樹脂組成物を用いて、実施例1と同様にして厚み50μmのポリイミドフィルムを得た。結果を表1に示す。
温度計、撹拌器、窒素導入管、側管付き滴下ロート、ディーンスターク装置、冷却管を備えた500mL5つ口フラスコに、窒素気流下、ジアミンとして4,4’-ビス(4-アミノフェノキシ)ビフェニル20.244g(0.055モル)と、フェノール水酸基含有ジアミンとして3,3’-ジヒドロキシベンジジン1.321g(0.006モル)と、有機溶剤としてγ-ブチロラクトン42.24g及びN,N-ジメチルアセトアミド10.56gを仕込んで溶解させた。ここに、製造例1で合成した1,2,4,5-シクロヘキサンテトラカルボン酸二無水物13.676g(0.061モル)及びイミド化触媒としてトリエチルアミン0.3g(0.005モル)を滴下により一括で添加した。滴下終了後、180℃に昇温し、随時留出液を留去させながら1時間還流を行い、水の留出が終わったことを確認し、60℃まで冷却して、ポリイミド樹脂溶液を得た。ポリイミド樹脂の数平均分子量は423,000であった。
60℃に冷却後、シリカ微粒子として「DMAC-ST」(平均粒子径11nm、シリカ含有量20質量%、N,N-ジメチルアセトアミド溶液:日産化学工業株式会社製)を165g添加し、2時間攪拌混合してポリイミド樹脂組成物を得た。
得られたポリイミド樹脂組成物を用いて、実施例1と同様にして厚み50μmのポリイミドフィルムを得た。結果を表1に示す。
温度計、撹拌器、窒素導入管、側管付き滴下ロート、ディーンスターク装置、冷却管を備えた500mL5つ口フラスコに、窒素気流下、ジアミンとして2,2’-ビス(トリフルオロメチル)ベンジジン15.523g(0.048モル)と、フェノール水酸基含有ジアミンとして3,3’-ジヒドロキシベンジジン4.498g(0.021モル)と、有機溶剤としてγ-ブチロラクトン65.91gを仕込んで溶解させた。ここに、製造例1で合成した1,2,4,5-シクロヘキサンテトラカルボン酸二無水物15.516g(0.069モル)及びイミド化触媒としてトリエチルアミン3.50g(0.05モル)を滴下により一括で添加した。滴下終了後、170℃に昇温し、随時留出液を留去させながら5時間還流を行い、水の留出が終わったことを確認して60℃まで冷却して、ポリイミド樹脂溶液を得た。ポリイミド樹脂の数平均分子量は48,900であった。
60℃に冷却後、シリカ微粒子として「DMAC-ST」(平均粒子径11nm、シリカ含有量20質量%、N,N-ジメチルアセトアミド溶液:日産化学工業株式会社製)を110g添加し、2時間攪拌混合してポリイミド樹脂組成物を得た。
得られたポリイミド樹脂組成物を用いて、実施例1と同様にして厚み50μmのポリイミドフィルムを得た。結果を表1に示す。
温度計、撹拌器、窒素導入管、側管付き滴下ロート、ディーンスターク装置、冷却管を備えた500mL5つ口フラスコに、窒素気流下、ジアミンとして2,2’-ビス(トリフルオロメチル)ベンジジン13.696g(0.043モル)及び4,4’-ジアミノジフェニルエーテル2.851g(0.014モル)と、フェノール水酸基含有ジアミンとして3,3’-ジヒドロキシベンジジン3.087g(0.014モル)と、有機溶剤としてγ-ブチロラクトン66.05gを仕込んで溶解させた。ここに、製造例1で合成した1,2,4,5-シクロヘキサンテトラカルボン酸二無水物15.971g(0.071モル)及びイミド化触媒としてトリエチルアミン3.60g(0.05モル)を滴下により一括で添加した。滴下終了後、170℃に昇温し、随時留出液を留去させながら5時間還流を行い、水の留出が終わったことを確認して60℃まで冷却して、ポリイミド樹脂溶液を得た。
60℃に冷却後、シリカ微粒子として「DMAC-ST」(平均粒子径11nm、シリカ含有量20質量%、N,N-ジメチルアセトアミド溶液:日産化学工業株式会社製)を110g添加し、2時間攪拌混合してポリイミド樹脂組成物を得た。
得られたポリイミド樹脂組成物を用いて、実施例1と同様にして厚み50μmのポリイミドフィルムを得た。結果を表1に示す。
実施例2と同様にしてポリイミド樹脂溶液を得た後、シリカ微粒子として「DMAC-ST」(平均粒子径11nm、シリカ含有量20質量%、N,N-ジメチルアセトアミド溶液:日産化学工業株式会社製)を385g添加し、2時間攪拌混合してポリイミド樹脂組成物を得た。
得られたポリイミド樹脂組成物を用いて、実施例2と同様の方法で厚み50μmのポリイミドフィルムを得た。結果を表1に示す。
温度計、撹拌器、窒素導入管、側管付き滴下ロート、ディーンスターク装置、冷却管を備えた500mL5つ口フラスコに、窒素気流下、ジアミンとして4,4’-ビス(4-アミノフェノキシ)ビフェニル21.728g(0.059モル)と、有機溶剤としてγ-ブチロラクトン65.64g及びN,N-ジメチルアセトアミド16.41gを仕込んで溶解させた。ここに、製造例1で合成した1,2,4,5-シクロヘキサンテトラカルボン酸二無水物13.481g(0.060モル)及びイミド化触媒としてトリエチルアミン0.3g(0.005モル)を滴下により一括で添加した。滴下終了後、180℃に昇温し、随時留出液を留去させながら3時間還流を行い、水の留出が終わったことを確認して60℃まで冷却して、ポリイミド樹脂溶液を得た。
60℃に冷却後、シリカ微粒子として「DMAC-ST」(平均粒子径11nm、シリカ含有量20質量%、N,N-ジメチルアセトアミド溶液:日産化学工業株式会社製)を165g添加し、2時間攪拌混合してポリイミド樹脂組成物を得た。
得られたポリイミド樹脂組成物を用いて、実施例1と同様にして厚み50μmのポリイミドフィルムを得た。結果を表1に示す。
温度計、撹拌器、窒素導入管、側管付き滴下ロート、ディーンスターク装置、冷却管を備えた500mL5つ口フラスコに、窒素気流下、ジアミンとして4,4’-ビス(4-アミノフェノキシ)ビフェニル16.024g(0.043モル)及び3,3’-ジカルボキシ-4,4’-ジアミノジフェニルメタン5.343g(0.019モル)と、有機溶剤としてγ-ブチロラクトン52.35g及びN,N-ジメチルアセトアミド13.09gを仕込んで溶解させた。ここに、製造例1で合成した1,2,4,5-シクロヘキサンテトラカルボン酸二無水物13.919g(0.062モル)及びイミド化触媒としてトリエチルアミン0.3g(0.005モル)を滴下により一括で添加した。滴下終了後、180℃に昇温し、随時留出液を留去させながら1時間還流を行い、水の留出が終わったことを確認して60℃まで冷却して、ポリイミド樹脂溶液を得た。
60℃に冷却後、シリカ微粒子として「DMAC-ST」(平均粒子径11nm、シリカ含有量20質量%、N,N-ジメチルアセトアミド溶液:日産化学工業株式会社製)を165g添加し、2時間攪拌混合してポリイミド樹脂組成物を得た。
得られたポリイミド樹脂組成物を用いて、実施例1と同様にして厚み50μmのポリイミドフィルムを得た。結果を表1に示す。
温度計、撹拌器、窒素導入管、側管付き滴下ロート、ディーンスターク装置、冷却管を備えた500mL5つ口フラスコに、窒素気流下、ジアミンとして2,2’-ビス(トリフルオロメチル)ベンジジン18.816g(0.059モル)と、フェノール水酸基含有ジアミンとして3,3’-ジヒドロキシベンジジン5.452g(0.025モル)と、有機溶剤としてγ-ブチロラクトン64.53gを仕込んで溶解させた。ここに、製造例1で合成した1,2,4,5-シクロヘキサンテトラカルボン酸二無水物18.807g(0.084モル)及びイミド化触媒としてトリエチルアミン4.24g(0.05モル)を滴下により一括で添加した。滴下終了後、180℃に昇温し、随時留出液を留去させながら5時間還流を行い、水の留出が終わったことを確認して60℃まで冷却して、ポリイミド樹脂溶液を得た。
60℃に冷却後、N,N-ジメチルアセトアミド110gを添加し、2時間攪拌混合してポリイミド樹脂組成物を得た。
得られたポリイミド樹脂組成物を用いて、実施例1と同様にして厚み50μmのポリイミドフィルムを得た。結果を表1に示す。
HPMDA:1,2,4,5-シクロヘキサンテトラカルボン酸二無水物
HAB:3,3’-ジヒドロキシベンジジン
TFMB:2,2’-ビス(トリフルオロメチル)ベンジジン
BAPB:4,4’-ビス(4-アミノフェノキシ)ビフェニル
MBAA:3,3’-ジカルボキシ-4,4’-ジアミノジフェニルメタン
ODA:4,4’-ジアミノジフェニルエーテル
Claims (13)
- テトラカルボン酸二無水物(A)と、フェノール性水酸基含有ジアミンをジアミン全体の5~100モル%含有するジアミン(B)とを反応させて得られるポリイミド樹脂と、シリカ微粒子とを質量比で25/75~60/40の割合で含有することを特徴とするポリイミド樹脂組成物。
- 前記テトラカルボン酸二無水物(A)が、シクロアルカンテトラカルボン酸二無水物である、請求項1に記載のポリイミド樹脂組成物。
- 前記シクロアルカンテトラカルボン酸二無水物が、1,2,4,5-シクロへキサンテトラカルボン酸二無水物である、請求項2に記載のポリイミド樹脂組成物。
- 前記ジアミン(B)が、フェノール性水酸基含有ジアミン10~95モル%と、2,2’-ビス(トリフルオロメチル)ベンジジン5~90モル%とを含む、請求項1~5のいずれかに記載のポリイミド樹脂組成物。
- 前記ジアミン(B)が、前記一般式(1)で表されるフェノール性水酸基含有ジアミン10~95モル%と、2,2’-ビス(トリフルオロメチル)ベンジジン5~90モル%とからなる、請求項6に記載のポリイミド樹脂組成物。
- 前記シリカ微粒子が、平均粒子径1~100nmである、請求項1~7のいずれかに記載のポリイミド樹脂組成物。
- 前記シリカ微粒子が、アミノ基含有シランカップリング剤で表面処理されたものである、請求項1~8のいずれかに記載のポリイミド樹脂組成物。
- 請求項1~9のいずれかに記載のポリイミド樹脂組成物を用いてなる、ポリイミドフィルム。
- 厚み50μmにおける全光線透過率が85%以上である、請求項10に記載のポリイミドフィルム。
- プラスチックフィルム、シリコンウェハー、金属箔及びガラスから選ばれる基材と、請求項1~9のいずれかに記載のポリイミド樹脂組成物を用いてなるポリイミド樹脂層とを有する積層体。
- 前記基材が銅箔である、請求項12に記載の積層体。
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| WO2016060213A1 (ja) * | 2014-10-17 | 2016-04-21 | 三菱瓦斯化学株式会社 | ポリイミド樹脂組成物、ポリイミドフィルム及び積層体 |
| WO2016076243A1 (ja) * | 2014-11-10 | 2016-05-19 | 住友化学株式会社 | 樹脂フィルム、積層フィルム、光学部材、表示部材、前面板、及び積層フィルムの製造方法 |
| JP2016093992A (ja) * | 2014-11-10 | 2016-05-26 | 住友化学株式会社 | 樹脂フィルム、積層フィルム、光学部材、表示部材、前面板、及び積層フィルムの製造方法 |
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| WO2018080056A1 (ko) * | 2016-10-24 | 2018-05-03 | 주식회사 엘지화학 | 폴리이미드계 블록 공중합체 및 이를 포함하는 폴리이미드계 필름 |
| KR102067225B1 (ko) | 2016-12-15 | 2020-01-16 | 주식회사 엘지화학 | 폴리이미드계 블록 공중합체 및 이를 포함하는 폴리이미드계 필름 |
| KR20180069550A (ko) * | 2016-12-15 | 2018-06-25 | 주식회사 엘지화학 | 폴리이미드계 블록 공중합체 및 이를 포함하는 폴리이미드계 필름 |
| KR20180080524A (ko) * | 2017-01-04 | 2018-07-12 | 주식회사 엘지화학 | 폴리이미드계 블록 공중합체 필름 |
| KR102070943B1 (ko) | 2017-01-04 | 2020-04-01 | 주식회사 엘지화학 | 폴리이미드계 블록 공중합체 필름 |
| KR20210013188A (ko) | 2018-06-22 | 2021-02-03 | 미쯔비시 케미컬 주식회사 | 제올라이트 함유 폴리이미드 수지 복합재, 제올라이트 함유 폴리이미드 수지 전구체 조성물, 필름, 및 전자 디바이스 |
| WO2022102450A1 (ja) * | 2020-11-10 | 2022-05-19 | 東洋紡株式会社 | 無色多層ポリイミドフィルム、積層体、フレキシブル電子デバイスの製造方法 |
| CN114989605A (zh) * | 2022-04-27 | 2022-09-02 | 北京化工大学 | 低热膨胀系数聚酰亚胺树脂及其制备方法与应用 |
| CN114989605B (zh) * | 2022-04-27 | 2024-04-19 | 北京化工大学 | 低热膨胀系数聚酰亚胺树脂及其制备方法与应用 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2902446A1 (en) | 2015-08-05 |
| US10557003B2 (en) | 2020-02-11 |
| TW201422718A (zh) | 2014-06-16 |
| US20150225523A1 (en) | 2015-08-13 |
| CN104704057B (zh) | 2017-04-05 |
| TWI605092B (zh) | 2017-11-11 |
| JPWO2014051050A1 (ja) | 2016-08-22 |
| JP6274109B2 (ja) | 2018-02-07 |
| KR20150065681A (ko) | 2015-06-15 |
| EP2902446A4 (en) | 2016-05-18 |
| CN104704057A (zh) | 2015-06-10 |
| KR102091796B1 (ko) | 2020-03-20 |
| EP2902446B1 (en) | 2018-08-15 |
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