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WO2008104160A3 - Vorrichtung und ein verfahren zur plasmagestützten beschichtung und oberflächenbehandlung grossvolumiger bauteile - Google Patents

Vorrichtung und ein verfahren zur plasmagestützten beschichtung und oberflächenbehandlung grossvolumiger bauteile Download PDF

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Publication number
WO2008104160A3
WO2008104160A3 PCT/DE2008/000330 DE2008000330W WO2008104160A3 WO 2008104160 A3 WO2008104160 A3 WO 2008104160A3 DE 2008000330 W DE2008000330 W DE 2008000330W WO 2008104160 A3 WO2008104160 A3 WO 2008104160A3
Authority
WO
WIPO (PCT)
Prior art keywords
resonant circuit
plasma
surface treatment
assisted coating
adjustable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2008/000330
Other languages
English (en)
French (fr)
Other versions
WO2008104160A2 (de
Inventor
Stefan Laure
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dr Laure Plasmatechnologie GmnH
Original Assignee
Dr Laure Plasmatechnologie GmnH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dr Laure Plasmatechnologie GmnH filed Critical Dr Laure Plasmatechnologie GmnH
Priority to EP08715522A priority Critical patent/EP2127503B1/de
Priority to US12/528,591 priority patent/US20100323126A1/en
Priority to JP2009550206A priority patent/JP5847381B2/ja
Priority to DE112008000490T priority patent/DE112008000490A5/de
Priority to AT08715522T priority patent/ATE509507T1/de
Publication of WO2008104160A2 publication Critical patent/WO2008104160A2/de
Publication of WO2008104160A3 publication Critical patent/WO2008104160A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Es werden eine Vorrichtung und ein Verfahren zur plasmagestützten Beschichtung und Oberflächenbehandlung großvolumiger Bauteile vorgeschlagen. Die Vorrichtung ist ausgestattet mit einer Vakuumkammer (3, 20, 32) mit einer oder mehreren Pumpen, mit einem ersten Schwingkreis mit einem ersten Hochfrequenzgenerator (5, 17, 28, 40), mit einer einstellbaren Kapazität und einer einstellbaren Induktivität des ersten Schwingkreises, mit einem ersten Anschluss zur Einbindung des Bauteils (1, 21, 32, 39) in den ersten Schwingkreis, mit mindestens einem zweiten Schwingkreis mit einem zweiten Hochfrequenzgenerator (18, 29, 40), mit einem zweiten Anschluss zur Einbindung des Bauteils (1, 21, 32, 39) in den zweiten Schwingkreis und mit einer einstellbaren Kapazität und einer einstellbaren Induktivität des zweiten Schwingkreises. Gemäß dem Verfahren werden die Induktivität und/ oder die Kapazität des ersten und zweiten Schwingkreises auf das Bauteil (1, 21, 31, 39) abgestimmt.
PCT/DE2008/000330 2007-02-26 2008-02-26 Vorrichtung und ein verfahren zur plasmagestützten beschichtung und oberflächenbehandlung grossvolumiger bauteile Ceased WO2008104160A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP08715522A EP2127503B1 (de) 2007-02-26 2008-02-26 Vorrichtung und ein verfahren zur plasmagestützten beschichtung und oberflächenbehandlung grossvolumiger bauteile
US12/528,591 US20100323126A1 (en) 2007-02-26 2008-02-26 Apparatus and Method for Plasma-Assisted Coating and Surface Treatment of Voluminous Parts
JP2009550206A JP5847381B2 (ja) 2007-02-26 2008-02-26 体積の大きな構成部品にプラズマ支援によるコーティングおよび表面処理を施す装置および方法
DE112008000490T DE112008000490A5 (de) 2007-02-26 2008-02-26 Vorrichtung und ein Verfahren zur plasmagestützten Beschichtung und Oberflächenbehandlung grossvolumiger Bauteile
AT08715522T ATE509507T1 (de) 2007-02-26 2008-02-26 Vorrichtung und ein verfahren zur plasmagestützten beschichtung und oberflächenbehandlung grossvolumiger bauteile

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007009581 2007-02-26
DE102007009581.5 2007-02-26

Publications (2)

Publication Number Publication Date
WO2008104160A2 WO2008104160A2 (de) 2008-09-04
WO2008104160A3 true WO2008104160A3 (de) 2008-11-13

Family

ID=39595690

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2008/000330 Ceased WO2008104160A2 (de) 2007-02-26 2008-02-26 Vorrichtung und ein verfahren zur plasmagestützten beschichtung und oberflächenbehandlung grossvolumiger bauteile

Country Status (7)

Country Link
US (1) US20100323126A1 (de)
EP (1) EP2127503B1 (de)
JP (1) JP5847381B2 (de)
AT (1) ATE509507T1 (de)
DE (1) DE112008000490A5 (de)
ES (1) ES2366350T3 (de)
WO (1) WO2008104160A2 (de)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5211995A (en) * 1991-09-30 1993-05-18 Manfred R. Kuehnle Method of protecting an organic surface by deposition of an inorganic refractory coating thereon
US20040101635A1 (en) * 2002-04-19 2004-05-27 Duerr Systems Gmbh Method and device for curing a coating
WO2005069703A2 (de) * 2004-01-15 2005-07-28 Dr. Laure Plasmatechnologie Gmbh Plasmabehandlung grossvolumiger bauteile
EP1593756A1 (de) * 2004-05-03 2005-11-09 Applied Materials, Inc. CVD Verfahren
WO2006108395A1 (de) * 2005-04-11 2006-10-19 Dr. Laure Plasmatechnologie Gmbh Vorrichtung und verfahren zur plasmabeschichtung

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Publication number Priority date Publication date Assignee Title
US568619A (en) * 1896-09-29 Railway tie and clamp
US4916273A (en) * 1987-03-11 1990-04-10 Browning James A High-velocity controlled-temperature plasma spray method
JPH04901A (ja) * 1990-04-18 1992-01-06 Mitsubishi Electric Corp プラズマ装置の高周波給電方法及び装置
US6001432A (en) * 1992-11-19 1999-12-14 Semiconductor Energy Laboratory Co., Ltd. Apparatus for forming films on a substrate
US5618619A (en) * 1994-03-03 1997-04-08 Monsanto Company Highly abrasion-resistant, flexible coatings for soft substrates
US6391147B2 (en) * 1994-04-28 2002-05-21 Tokyo Electron Limited Plasma treatment method and apparatus
JPH0982495A (ja) * 1995-09-18 1997-03-28 Toshiba Corp プラズマ生成装置およびプラズマ生成方法
US6312554B1 (en) * 1996-12-05 2001-11-06 Applied Materials, Inc. Apparatus and method for controlling the ratio of reactive to non-reactive ions in a semiconductor wafer processing chamber
US6158384A (en) * 1997-06-05 2000-12-12 Applied Materials, Inc. Plasma reactor with multiple small internal inductive antennas
US6197165B1 (en) * 1998-05-06 2001-03-06 Tokyo Electron Limited Method and apparatus for ionized physical vapor deposition
US6365016B1 (en) * 1999-03-17 2002-04-02 General Electric Company Method and apparatus for arc plasma deposition with evaporation of reagents
DE60043505D1 (de) * 1999-05-06 2010-01-21 Tokyo Electron Ltd Apparat für die plasma-behandlung
US7335199B2 (en) * 2000-02-22 2008-02-26 Rhytec Limited Tissue resurfacing
JP2002339063A (ja) * 2001-05-17 2002-11-27 Toshiba Tungaloy Co Ltd イオン注入装置
DE60329344D1 (de) * 2002-03-08 2009-11-05 Canon Anelva Corp Verfahren und Vorrichtung zum Herstellen von Metall-Schichten
JP4370789B2 (ja) * 2002-07-12 2009-11-25 東京エレクトロン株式会社 プラズマ処理装置及び可変インピーダンス手段の校正方法
JP3637913B2 (ja) * 2003-12-09 2005-04-13 日新電機株式会社 自動車用防振部材の製造方法
US7737382B2 (en) * 2004-04-01 2010-06-15 Lincoln Global, Inc. Device for processing welding wire
JP4769014B2 (ja) * 2005-04-28 2011-09-07 学校法人日本大学 同軸磁化プラズマ生成装置と同軸磁化プラズマ生成装置を用いた膜形成装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5211995A (en) * 1991-09-30 1993-05-18 Manfred R. Kuehnle Method of protecting an organic surface by deposition of an inorganic refractory coating thereon
US20040101635A1 (en) * 2002-04-19 2004-05-27 Duerr Systems Gmbh Method and device for curing a coating
WO2005069703A2 (de) * 2004-01-15 2005-07-28 Dr. Laure Plasmatechnologie Gmbh Plasmabehandlung grossvolumiger bauteile
EP1593756A1 (de) * 2004-05-03 2005-11-09 Applied Materials, Inc. CVD Verfahren
WO2006108395A1 (de) * 2005-04-11 2006-10-19 Dr. Laure Plasmatechnologie Gmbh Vorrichtung und verfahren zur plasmabeschichtung

Also Published As

Publication number Publication date
JP2010519693A (ja) 2010-06-03
US20100323126A1 (en) 2010-12-23
DE112008000490A5 (de) 2009-11-26
JP5847381B2 (ja) 2016-01-20
WO2008104160A2 (de) 2008-09-04
EP2127503B1 (de) 2011-05-11
ATE509507T1 (de) 2011-05-15
EP2127503A2 (de) 2009-12-02
ES2366350T3 (es) 2011-10-19

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