[go: up one dir, main page]

ES8103397A1 - Un procedimiento para producir un elemento capaz de formar imagenes. - Google Patents

Un procedimiento para producir un elemento capaz de formar imagenes.

Info

Publication number
ES8103397A1
ES8103397A1 ES488890A ES488890A ES8103397A1 ES 8103397 A1 ES8103397 A1 ES 8103397A1 ES 488890 A ES488890 A ES 488890A ES 488890 A ES488890 A ES 488890A ES 8103397 A1 ES8103397 A1 ES 8103397A1
Authority
ES
Spain
Prior art keywords
weight
organic solvent
compositions
solvent soluble
free radical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES488890A
Other languages
English (en)
Other versions
ES488890A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of ES488890A0 publication Critical patent/ES488890A0/es
Publication of ES8103397A1 publication Critical patent/ES8103397A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

COMPOSICION DEL REVESTIMIENTO DE PLACAS DE IMPRESION, Y PLACAS DE IMPRESION QUE SON REVELABLES CON DISOLVENTES O CON AGUA. LA COMPOSICION ESTA FORMADA POR UNA MEZLCA HOMOGENEA DE RESINA OLIGOMERA FOTORREACTIVA EN UN 1-75 POR 100 EN PESO, SOLUBLE EN DISOLVENTES INORGANICOS; UNA DIAZORRESINA OLEOFILA AGLUTINANTE EN UN 17-20 POR 100 EN PESO SOLUBLE EN DISOLVENTES ORGANICO; UN SISTEMA FOTOINICIADOR DE RADICALES LIBRES EN UN 0,5-15 POR 100 EN PESO; UN 10-65 POR 100 EN PESO DE COMPUESTOS INSATURADOS POLIETILENICAMENTE, POLIMERIZABLES POR RADICALES LIBRES, Y CON DOS GRUPOS ETILENICAMENTE INSATURADOS AL MENOS, Y UN 5-40 POR 100 EN PESO DE UN POLIMERO SOLUBLE EN DISOLVENTES ORGANICOS Y ABLANDABLE CON AGUA. LA PLACA DE IMPRESION ES DE UN SUSTRATO OLEOFOBO DE ALUMINIO SOBRE EL QUE SE APLICA EL REVESTIMIENTO. DE APLICACION EN PLACAS SENSIBLES A LA LUZ PARA SISTEMAS DE IMPRESION.
ES488890A 1979-02-27 1980-02-25 Un procedimiento para producir un elemento capaz de formar imagenes. Expired ES8103397A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US1558479A 1979-02-27 1979-02-27

Publications (2)

Publication Number Publication Date
ES488890A0 ES488890A0 (es) 1981-02-16
ES8103397A1 true ES8103397A1 (es) 1981-02-16

Family

ID=21772291

Family Applications (1)

Application Number Title Priority Date Filing Date
ES488890A Expired ES8103397A1 (es) 1979-02-27 1980-02-25 Un procedimiento para producir un elemento capaz de formar imagenes.

Country Status (10)

Country Link
JP (1) JPS55120028A (es)
BE (1) BE881956A (es)
BR (1) BR8001128A (es)
CA (1) CA1144804A (es)
DE (1) DE3007212A1 (es)
ES (1) ES8103397A1 (es)
FR (1) FR2450473A1 (es)
GB (1) GB2044788B (es)
NL (1) NL8001085A (es)
ZA (1) ZA801085B (es)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141640A (en) * 1981-02-03 1982-09-02 Konishiroku Photo Ind Co Ltd Photosensitive image forming material
JPS57197537A (en) * 1981-05-29 1982-12-03 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS582847A (ja) * 1981-06-30 1983-01-08 Konishiroku Photo Ind Co Ltd 平版印刷版
JPS58199341A (ja) * 1982-05-17 1983-11-19 Tokyo Ohka Kogyo Co Ltd 耐熱性感光性樹脂組成物
JPS5953836A (ja) * 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS59101644A (ja) * 1982-12-01 1984-06-12 Fuji Photo Film Co Ltd 感光性組成物
US4600679A (en) * 1984-05-25 1986-07-15 W. R. Grace & Co. Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer
DE3425328A1 (de) * 1984-07-10 1986-01-16 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
EP0184725B1 (de) * 1984-12-06 1989-01-04 Hoechst Celanese Corporation Lichtempfindliches Gemisch
DE3504658A1 (de) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
DE3605717A1 (de) * 1985-02-28 1986-08-28 Hoechst Celanese Corp., Somerville, N.J. Durch strahlung polymerisierbares gemisch
US4851319A (en) * 1985-02-28 1989-07-25 Hoechst Celanese Corporation Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers
US5080999A (en) * 1985-06-10 1992-01-14 Fuji Photo Film Co., Ltd. Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide
US4772538A (en) * 1985-08-02 1988-09-20 American Hoechst Corporation Water developable lithographic composition
US5120772A (en) * 1985-08-02 1992-06-09 Walls John E Radiation-polymerizable composition and element containing a photopolymerizable mixture
US4780392A (en) * 1985-08-02 1988-10-25 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
US4822720A (en) * 1985-08-02 1989-04-18 Hoechst Celanese Corporation Water developable screen printing composition
US4652604A (en) * 1985-08-02 1987-03-24 American Hoechst Corporation Radiation-polymerizable composition and element containing a photopolymer composition
US4707437A (en) * 1985-08-02 1987-11-17 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymer composition
DE3528309A1 (de) * 1985-08-07 1987-02-12 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
JPS6278544A (ja) * 1985-10-01 1987-04-10 Fuji Photo Film Co Ltd 感光性組成物
JPS62238553A (ja) * 1986-04-10 1987-10-19 Nippon Foil Mfg Co Ltd 感光性樹脂組成物
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3644160A1 (de) * 1986-12-23 1988-07-14 Hoechst Ag Lichtempfindliches aufzeichnungsmaterial mit einer lichtempfindlichen zwischenschicht
US4886731A (en) * 1987-01-05 1989-12-12 Cookson Graphics Inc. Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions
JPH0727208B2 (ja) * 1987-04-20 1995-03-29 富士写真フイルム株式会社 感光性組成物
DE3738863A1 (de) * 1987-11-16 1989-05-24 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck
US5286594A (en) * 1988-01-29 1994-02-15 International Paper Company Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles
US5340681A (en) * 1988-01-29 1994-08-23 International Paper Company Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process
CA2000712A1 (en) * 1988-10-21 1990-04-21 Thomas Dunder Negative-working, photopolymerizable color proofing film without triplet oxygen quenching
DE3903001A1 (de) * 1989-02-02 1990-08-16 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
JP6962216B2 (ja) * 2018-01-24 2021-11-05 日本製鉄株式会社 溶接鋼管用防錆処理液、溶接鋼管の化成処理方法、溶接鋼管および溶接鋼管の成形加工品
CN113105570B (zh) * 2021-04-12 2022-05-03 之江实验室 一种液体双光子引发剂及其制备方法与应用

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1141544A (en) * 1966-07-13 1969-01-29 Gordon Owen Shipton Polymer compositions
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
IT1000315B (it) * 1972-12-14 1976-03-30 Polychrome Corp Perfezionamento nelle composizioni monomere diazoiche insature potosensibili
FI207474A7 (es) * 1973-08-16 1975-02-17 Hercules Inc
JPS50108003A (es) * 1974-02-01 1975-08-26
JPS50114122A (es) * 1974-02-16 1975-09-06
GB1523762A (en) * 1975-02-25 1978-09-06 Oce Van Der Grinten Nv Photocopying materials
US4042386A (en) * 1976-06-07 1977-08-16 Napp Systems Photosensitive compositions
JPS549619A (en) * 1977-06-23 1979-01-24 Oji Paper Co Photosensitive composition
AU526602B2 (en) * 1977-10-06 1983-01-20 Polychrome Corp. Lithographic printing plate

Also Published As

Publication number Publication date
FR2450473A1 (fr) 1980-09-26
ES488890A0 (es) 1981-02-16
GB2044788B (en) 1983-05-25
ZA801085B (en) 1981-07-29
JPS55120028A (en) 1980-09-16
NL8001085A (nl) 1980-08-29
CA1144804A (en) 1983-04-19
BE881956A (fr) 1980-08-27
BR8001128A (pt) 1980-11-04
GB2044788A (en) 1980-10-22
DE3007212A1 (de) 1980-08-28

Similar Documents

Publication Publication Date Title
ES8103397A1 (es) Un procedimiento para producir un elemento capaz de formar imagenes.
EP0284561A3 (de) Neue alpha-Aminoacetophenone als Photoinitiatoren
ES8705474A1 (es) Procedimiento de polimerizacion de composiciones fotopolimerizables.
DE1284293B (es)
ES475915A1 (es) Un procedimiento para fabricar un relieve para impresion.
GB1535200A (en) Light-sensitive material for forming relief polymer image
JPS5313692A (en) Polymerizable material by ultraviolet
ES8405165A1 (es) Procedimiento para la produccion de una imagen.
JPS5710605A (en) Photopolymerizable composition
GB1242727A (en) Production of printing plates
JPS6432255A (en) Image forming layer
ATE2288T1 (de) Photopolymerisierbares gemisch.
CA2058391A1 (en) Aqueous, developable photocurable composition, photosensitive articles having layers made therefrom and methods of improving those articles
ES338285A1 (es) Procedimiento para la fabricacion de moldes en relieve parala impresion.
DE3167493D1 (en) Photopolymerizable composition, photoinitiator mixture and curing process
JPS5651345A (en) Formation of cured rubber film
GB1147776A (en) Photomechanical production of printing plates
JPS5310648A (en) Photosensitive resin compositions
JPS5565947A (en) Photosensitive composition
JPS57151392A (en) Heat-sensitive recording material
JPS55127550A (en) Photosensitive resin composition
EP0266069A3 (en) Photopolymerizable composition useful for printing plates
ES8204182A1 (es) Procedimiento de obtencion de una composicion fotopolimeri- zable negativa,filmogena,oleofila y soluble en disolventes organicos
GB1530288A (en) Photopolymerisable copying materials
JPS5785869A (en) Ultraviolet-curing ink

Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19971201