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ES8103397A1 - Photosensitive compositions and articles - Google Patents

Photosensitive compositions and articles

Info

Publication number
ES8103397A1
ES8103397A1 ES488890A ES488890A ES8103397A1 ES 8103397 A1 ES8103397 A1 ES 8103397A1 ES 488890 A ES488890 A ES 488890A ES 488890 A ES488890 A ES 488890A ES 8103397 A1 ES8103397 A1 ES 8103397A1
Authority
ES
Spain
Prior art keywords
weight
organic solvent
compositions
solvent soluble
free radical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES488890A
Other languages
Spanish (es)
Other versions
ES488890A0 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of ES488890A0 publication Critical patent/ES488890A0/en
Publication of ES8103397A1 publication Critical patent/ES8103397A1/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

The compositions comprise a homogeneous mixture of: A. 1 to 75% by weight of organic solvent soluble film forming resin, B. 10 to 65% by weight of free radical polymerizable polyethylenically unsaturated compounds having at least two ethylenically unsaturated groups, C. 0.5 to 15% by weight of a free radical photo-initiator or photoinitiator system, D. 5 to 40% by weight of a water- softenable organic solvent soluble polymer, and E. 1 to 20% by weight of organic solvent soluble diazo resin. The compositions are useful as imageable layers for photoimageable printing systems and as imageable layers in printing plates. The compositions are water developable and can be processed without the use of organic solvents.
ES488890A 1979-02-27 1980-02-25 Photosensitive compositions and articles Expired ES8103397A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US1558479A 1979-02-27 1979-02-27

Publications (2)

Publication Number Publication Date
ES488890A0 ES488890A0 (en) 1981-02-16
ES8103397A1 true ES8103397A1 (en) 1981-02-16

Family

ID=21772291

Family Applications (1)

Application Number Title Priority Date Filing Date
ES488890A Expired ES8103397A1 (en) 1979-02-27 1980-02-25 Photosensitive compositions and articles

Country Status (10)

Country Link
JP (1) JPS55120028A (en)
BE (1) BE881956A (en)
BR (1) BR8001128A (en)
CA (1) CA1144804A (en)
DE (1) DE3007212A1 (en)
ES (1) ES8103397A1 (en)
FR (1) FR2450473A1 (en)
GB (1) GB2044788B (en)
NL (1) NL8001085A (en)
ZA (1) ZA801085B (en)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141640A (en) * 1981-02-03 1982-09-02 Konishiroku Photo Ind Co Ltd Photosensitive image forming material
JPS57197537A (en) * 1981-05-29 1982-12-03 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS582847A (en) * 1981-06-30 1983-01-08 Konishiroku Photo Ind Co Ltd Lithographic plate
JPS58199341A (en) * 1982-05-17 1983-11-19 Tokyo Ohka Kogyo Co Ltd Heat resistant photosensitive resin composition
JPS5953836A (en) * 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd Photosensitive lithographic plate
JPS59101644A (en) * 1982-12-01 1984-06-12 Fuji Photo Film Co Ltd Photosensitive composition
US4600679A (en) * 1984-05-25 1986-07-15 W. R. Grace & Co. Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer
DE3425328A1 (en) * 1984-07-10 1986-01-16 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
EP0184725B1 (en) * 1984-12-06 1989-01-04 Hoechst Celanese Corporation Light-sensitive composition
DE3504658A1 (en) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt LIGHT-SENSITIVE MIXTURE AND RECORDING MATERIAL MADE THEREFOR
DE3605717A1 (en) * 1985-02-28 1986-08-28 Hoechst Celanese Corp., Somerville, N.J. POLYMERIZABLE MIXTURE BY RADIATION
US4851319A (en) * 1985-02-28 1989-07-25 Hoechst Celanese Corporation Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers
US5080999A (en) * 1985-06-10 1992-01-14 Fuji Photo Film Co., Ltd. Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide
US4772538A (en) * 1985-08-02 1988-09-20 American Hoechst Corporation Water developable lithographic composition
US5120772A (en) * 1985-08-02 1992-06-09 Walls John E Radiation-polymerizable composition and element containing a photopolymerizable mixture
US4780392A (en) * 1985-08-02 1988-10-25 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
US4822720A (en) * 1985-08-02 1989-04-18 Hoechst Celanese Corporation Water developable screen printing composition
US4652604A (en) * 1985-08-02 1987-03-24 American Hoechst Corporation Radiation-polymerizable composition and element containing a photopolymer composition
US4707437A (en) * 1985-08-02 1987-11-17 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymer composition
DE3528309A1 (en) * 1985-08-07 1987-02-12 Hoechst Ag LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
JPS6278544A (en) * 1985-10-01 1987-04-10 Fuji Photo Film Co Ltd Photosensitive composition
JPS62238553A (en) * 1986-04-10 1987-10-19 Nippon Foil Mfg Co Ltd Photosensitive resin composition
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3644160A1 (en) * 1986-12-23 1988-07-14 Hoechst Ag LIGHT-SENSITIVE RECORDING MATERIAL WITH A LIGHT-SENSITIVE INTERLAYER
US4886731A (en) * 1987-01-05 1989-12-12 Cookson Graphics Inc. Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions
JPH0727208B2 (en) * 1987-04-20 1995-03-29 富士写真フイルム株式会社 Photosensitive composition
DE3738863A1 (en) * 1987-11-16 1989-05-24 Hoechst Ag LIGHT-SENSITIVE PRINTING PLATE FOR WATERLESS OFFSET PRINTING
US5286594A (en) * 1988-01-29 1994-02-15 International Paper Company Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles
US5340681A (en) * 1988-01-29 1994-08-23 International Paper Company Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process
CA2000712A1 (en) * 1988-10-21 1990-04-21 Thomas Dunder Negative-working, photopolymerizable color proofing film without triplet oxygen quenching
DE3903001A1 (en) * 1989-02-02 1990-08-16 Hoechst Ag LIGHT-SENSITIVE MIXTURE AND LIGHT-SENSITIVE RECORDING MATERIAL MADE THEREOF
JP6962216B2 (en) * 2018-01-24 2021-11-05 日本製鉄株式会社 Anti-rust treatment liquid for welded steel pipes, chemical conversion treatment methods for welded steel pipes, molded products of welded steel pipes and welded steel pipes
CN113105570B (en) * 2021-04-12 2022-05-03 之江实验室 Liquid two-photon initiator and preparation method and application thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1141544A (en) * 1966-07-13 1969-01-29 Gordon Owen Shipton Polymer compositions
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
IT1000315B (en) * 1972-12-14 1976-03-30 Polychrome Corp IMPROVEMENT IN POTOSENSITIVE UNSATURATED DIAZOIC MONOMERE COMPOSITIONS
FI207474A7 (en) * 1973-08-16 1975-02-17 Hercules Inc
JPS50108003A (en) * 1974-02-01 1975-08-26
JPS50114122A (en) * 1974-02-16 1975-09-06
GB1523762A (en) * 1975-02-25 1978-09-06 Oce Van Der Grinten Nv Photocopying materials
US4042386A (en) * 1976-06-07 1977-08-16 Napp Systems Photosensitive compositions
JPS549619A (en) * 1977-06-23 1979-01-24 Oji Paper Co Photosensitive composition
AU526602B2 (en) * 1977-10-06 1983-01-20 Polychrome Corp. Lithographic printing plate

Also Published As

Publication number Publication date
FR2450473A1 (en) 1980-09-26
ES488890A0 (en) 1981-02-16
GB2044788B (en) 1983-05-25
ZA801085B (en) 1981-07-29
JPS55120028A (en) 1980-09-16
NL8001085A (en) 1980-08-29
CA1144804A (en) 1983-04-19
BE881956A (en) 1980-08-27
BR8001128A (en) 1980-11-04
GB2044788A (en) 1980-10-22
DE3007212A1 (en) 1980-08-28

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19971201