NL8001085A - Fotogevoelige materialen en voorwerpen. - Google Patents
Fotogevoelige materialen en voorwerpen. Download PDFInfo
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- NL8001085A NL8001085A NL8001085A NL8001085A NL8001085A NL 8001085 A NL8001085 A NL 8001085A NL 8001085 A NL8001085 A NL 8001085A NL 8001085 A NL8001085 A NL 8001085A NL 8001085 A NL8001085 A NL 8001085A
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- Netherlands
- Prior art keywords
- water
- resin
- soluble
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- 239000003999 initiator Substances 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- MVBJSQCJPSRKSW-UHFFFAOYSA-N n-[1,3-dihydroxy-2-(hydroxymethyl)propan-2-yl]prop-2-enamide Chemical compound OCC(CO)(CO)NC(=O)C=C MVBJSQCJPSRKSW-UHFFFAOYSA-N 0.000 description 1
- YQCFXPARMSSRRK-UHFFFAOYSA-N n-[6-(prop-2-enoylamino)hexyl]prop-2-enamide Chemical compound C=CC(=O)NCCCCCCNC(=O)C=C YQCFXPARMSSRRK-UHFFFAOYSA-N 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-M naphthalene-2-sulfonate Chemical compound C1=CC=CC2=CC(S(=O)(=O)[O-])=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-M 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000193 polymethacrylate Chemical class 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- 238000003303 reheating Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 150000003900 succinic acid esters Chemical class 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Substances SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N toluene Substances CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 229940096522 trimethylolpropane triacrylate Drugs 0.000 description 1
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 1
- HVYVMSPIJIWUNA-UHFFFAOYSA-N triphenylstibine Chemical compound C1=CC=CC=C1[Sb](C=1C=CC=CC=1)C1=CC=CC=C1 HVYVMSPIJIWUNA-UHFFFAOYSA-N 0.000 description 1
- SOBHUZYZLFQYFK-UHFFFAOYSA-K trisodium;hydroxy-[[phosphonatomethyl(phosphonomethyl)amino]methyl]phosphinate Chemical compound [Na+].[Na+].[Na+].OP(O)(=O)CN(CP(O)([O-])=O)CP([O-])([O-])=O SOBHUZYZLFQYFK-UHFFFAOYSA-K 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US1558479A | 1979-02-27 | 1979-02-27 | |
| US1558479 | 1979-02-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8001085A true NL8001085A (nl) | 1980-08-29 |
Family
ID=21772291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8001085A NL8001085A (nl) | 1979-02-27 | 1980-02-22 | Fotogevoelige materialen en voorwerpen. |
Country Status (10)
| Country | Link |
|---|---|
| JP (1) | JPS55120028A (es) |
| BE (1) | BE881956A (es) |
| BR (1) | BR8001128A (es) |
| CA (1) | CA1144804A (es) |
| DE (1) | DE3007212A1 (es) |
| ES (1) | ES8103397A1 (es) |
| FR (1) | FR2450473A1 (es) |
| GB (1) | GB2044788B (es) |
| NL (1) | NL8001085A (es) |
| ZA (1) | ZA801085B (es) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57141640A (en) * | 1981-02-03 | 1982-09-02 | Konishiroku Photo Ind Co Ltd | Photosensitive image forming material |
| JPS57197537A (en) * | 1981-05-29 | 1982-12-03 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JPS582847A (ja) * | 1981-06-30 | 1983-01-08 | Konishiroku Photo Ind Co Ltd | 平版印刷版 |
| JPS58199341A (ja) * | 1982-05-17 | 1983-11-19 | Tokyo Ohka Kogyo Co Ltd | 耐熱性感光性樹脂組成物 |
| JPS5953836A (ja) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JPS59101644A (ja) * | 1982-12-01 | 1984-06-12 | Fuji Photo Film Co Ltd | 感光性組成物 |
| US4600679A (en) * | 1984-05-25 | 1986-07-15 | W. R. Grace & Co. | Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer |
| DE3425328A1 (de) * | 1984-07-10 | 1986-01-16 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
| DE3567294D1 (en) * | 1984-12-06 | 1989-02-09 | Hoechst Celanese Corp | Light-sensitive composition |
| DE3504658A1 (de) * | 1985-02-12 | 1986-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial |
| US4851319A (en) * | 1985-02-28 | 1989-07-25 | Hoechst Celanese Corporation | Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers |
| DE3605717A1 (de) * | 1985-02-28 | 1986-08-28 | Hoechst Celanese Corp., Somerville, N.J. | Durch strahlung polymerisierbares gemisch |
| US5080999A (en) * | 1985-06-10 | 1992-01-14 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide |
| US4822720A (en) * | 1985-08-02 | 1989-04-18 | Hoechst Celanese Corporation | Water developable screen printing composition |
| US4772538A (en) * | 1985-08-02 | 1988-09-20 | American Hoechst Corporation | Water developable lithographic composition |
| US5120772A (en) * | 1985-08-02 | 1992-06-09 | Walls John E | Radiation-polymerizable composition and element containing a photopolymerizable mixture |
| US4780392A (en) * | 1985-08-02 | 1988-10-25 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer |
| US4707437A (en) * | 1985-08-02 | 1987-11-17 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
| US4652604A (en) * | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
| DE3528309A1 (de) * | 1985-08-07 | 1987-02-12 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
| JPS6278544A (ja) * | 1985-10-01 | 1987-04-10 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JPS62238553A (ja) * | 1986-04-10 | 1987-10-19 | Nippon Foil Mfg Co Ltd | 感光性樹脂組成物 |
| US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
| DE3644160A1 (de) * | 1986-12-23 | 1988-07-14 | Hoechst Ag | Lichtempfindliches aufzeichnungsmaterial mit einer lichtempfindlichen zwischenschicht |
| US4886731A (en) * | 1987-01-05 | 1989-12-12 | Cookson Graphics Inc. | Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions |
| JPH0727208B2 (ja) * | 1987-04-20 | 1995-03-29 | 富士写真フイルム株式会社 | 感光性組成物 |
| DE3738863A1 (de) * | 1987-11-16 | 1989-05-24 | Hoechst Ag | Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck |
| US5286594A (en) * | 1988-01-29 | 1994-02-15 | International Paper Company | Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles |
| US5340681A (en) * | 1988-01-29 | 1994-08-23 | International Paper Company | Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process |
| CA2000712A1 (en) * | 1988-10-21 | 1990-04-21 | Thomas Dunder | Negative-working, photopolymerizable color proofing film without triplet oxygen quenching |
| DE3903001A1 (de) * | 1989-02-02 | 1990-08-16 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
| JP6962216B2 (ja) * | 2018-01-24 | 2021-11-05 | 日本製鉄株式会社 | 溶接鋼管用防錆処理液、溶接鋼管の化成処理方法、溶接鋼管および溶接鋼管の成形加工品 |
| CN113105570B (zh) * | 2021-04-12 | 2022-05-03 | 之江实验室 | 一种液体双光子引发剂及其制备方法与应用 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1141544A (en) * | 1966-07-13 | 1969-01-29 | Gordon Owen Shipton | Polymer compositions |
| US3905815A (en) * | 1971-12-17 | 1975-09-16 | Minnesota Mining & Mfg | Photopolymerizable sheet material with diazo resin layer |
| IT1000315B (it) * | 1972-12-14 | 1976-03-30 | Polychrome Corp | Perfezionamento nelle composizioni monomere diazoiche insature potosensibili |
| FI207474A7 (es) * | 1973-08-16 | 1975-02-17 | Hercules Inc | |
| JPS50108003A (es) * | 1974-02-01 | 1975-08-26 | ||
| JPS50114122A (es) * | 1974-02-16 | 1975-09-06 | ||
| GB1523762A (en) * | 1975-02-25 | 1978-09-06 | Oce Van Der Grinten Nv | Photocopying materials |
| US4042386A (en) * | 1976-06-07 | 1977-08-16 | Napp Systems | Photosensitive compositions |
| JPS549619A (en) * | 1977-06-23 | 1979-01-24 | Oji Paper Co | Photosensitive composition |
| AU526602B2 (en) * | 1977-10-06 | 1983-01-20 | Polychrome Corp. | Lithographic printing plate |
-
1980
- 1980-02-22 NL NL8001085A patent/NL8001085A/nl not_active Application Discontinuation
- 1980-02-25 ES ES488890A patent/ES8103397A1/es not_active Expired
- 1980-02-26 GB GB8006481A patent/GB2044788B/en not_active Expired
- 1980-02-26 ZA ZA00801085A patent/ZA801085B/xx unknown
- 1980-02-26 DE DE19803007212 patent/DE3007212A1/de not_active Ceased
- 1980-02-26 BR BR8001128A patent/BR8001128A/pt unknown
- 1980-02-26 FR FR8004164A patent/FR2450473A1/fr not_active Withdrawn
- 1980-02-26 CA CA000346444A patent/CA1144804A/en not_active Expired
- 1980-02-27 BE BE0/199576A patent/BE881956A/fr not_active IP Right Cessation
- 1980-02-27 JP JP2394780A patent/JPS55120028A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2450473A1 (fr) | 1980-09-26 |
| CA1144804A (en) | 1983-04-19 |
| GB2044788A (en) | 1980-10-22 |
| BE881956A (fr) | 1980-08-27 |
| DE3007212A1 (de) | 1980-08-28 |
| ES488890A0 (es) | 1981-02-16 |
| BR8001128A (pt) | 1980-11-04 |
| ES8103397A1 (es) | 1981-02-16 |
| JPS55120028A (en) | 1980-09-16 |
| GB2044788B (en) | 1983-05-25 |
| ZA801085B (en) | 1981-07-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A1A | A request for search or an international-type search has been filed | ||
| BB | A search report has been drawn up | ||
| A85 | Still pending on 85-01-01 | ||
| BV | The patent application has lapsed |