GB1141544A - Polymer compositions - Google Patents
Polymer compositionsInfo
- Publication number
- GB1141544A GB1141544A GB3145966A GB3145966A GB1141544A GB 1141544 A GB1141544 A GB 1141544A GB 3145966 A GB3145966 A GB 3145966A GB 3145966 A GB3145966 A GB 3145966A GB 1141544 A GB1141544 A GB 1141544A
- Authority
- GB
- United Kingdom
- Prior art keywords
- dabp
- diallyl
- allyl
- methyl
- benzil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title abstract 4
- 229920000642 polymer Polymers 0.000 title abstract 2
- GFUCMNMXYOVTDJ-UHFFFAOYSA-N 2,4-diamino-6-butan-2-ylphenol Chemical compound CCC(C)C1=CC(N)=CC(N)=C1O GFUCMNMXYOVTDJ-UHFFFAOYSA-N 0.000 abstract 7
- 102100035915 D site-binding protein Human genes 0.000 abstract 7
- 101000873522 Homo sapiens D site-binding protein Proteins 0.000 abstract 7
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 abstract 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 4
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 abstract 4
- SATCULPHIDQDRE-UHFFFAOYSA-N piperonal Chemical compound O=CC1=CC=C2OCOC2=C1 SATCULPHIDQDRE-UHFFFAOYSA-N 0.000 abstract 4
- ROLAGNYPWIVYTG-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanamine;hydrochloride Chemical compound Cl.C1=CC(OC)=CC=C1CC(N)C1=CC=C(OC)C=C1 ROLAGNYPWIVYTG-UHFFFAOYSA-N 0.000 abstract 3
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 abstract 3
- 244000028419 Styrax benzoin Species 0.000 abstract 3
- 235000000126 Styrax benzoin Nutrition 0.000 abstract 3
- 235000008411 Sumatra benzointree Nutrition 0.000 abstract 3
- 229960002130 benzoin Drugs 0.000 abstract 3
- 235000019382 gum benzoic Nutrition 0.000 abstract 3
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 abstract 3
- HEKQWIORQJRILW-UHFFFAOYSA-N tetrakis(prop-2-enyl) benzene-1,2,4,5-tetracarboxylate Chemical compound C=CCOC(=O)C1=CC(C(=O)OCC=C)=C(C(=O)OCC=C)C=C1C(=O)OCC=C HEKQWIORQJRILW-UHFFFAOYSA-N 0.000 abstract 3
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 abstract 2
- KCMITHMNVLRGJU-CMDGGOBGSA-N Allyl cinnamate Chemical compound C=CCOC(=O)\C=C\C1=CC=CC=C1 KCMITHMNVLRGJU-CMDGGOBGSA-N 0.000 abstract 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 2
- 239000012965 benzophenone Substances 0.000 abstract 2
- ZPOLOEWJWXZUSP-WAYWQWQTSA-N bis(prop-2-enyl) (z)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C/C(=O)OCC=C ZPOLOEWJWXZUSP-WAYWQWQTSA-N 0.000 abstract 2
- ZDNFTNPFYCKVTB-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,4-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C=C1 ZDNFTNPFYCKVTB-UHFFFAOYSA-N 0.000 abstract 2
- HABAXTXIECRCKH-UHFFFAOYSA-N bis(prop-2-enyl) butanedioate Chemical compound C=CCOC(=O)CCC(=O)OCC=C HABAXTXIECRCKH-UHFFFAOYSA-N 0.000 abstract 2
- 229910052799 carbon Inorganic materials 0.000 abstract 2
- 150000001733 carboxylic acid esters Chemical class 0.000 abstract 2
- 229940081310 piperonal Drugs 0.000 abstract 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 abstract 1
- VOTUEBINSRDNLW-UHFFFAOYSA-N 3-methylbenzo[e]perimidine-2,7-dione Chemical compound O=C1C2=CC=CC=C2C2=NC(=O)N(C)C3=CC=CC1=C32 VOTUEBINSRDNLW-UHFFFAOYSA-N 0.000 abstract 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 229930194542 Keto Natural products 0.000 abstract 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 1
- LHMRXAIRPKSGDE-UHFFFAOYSA-N benzo[a]anthracene-7,12-dione Chemical compound C1=CC2=CC=CC=C2C2=C1C(=O)C1=CC=CC=C1C2=O LHMRXAIRPKSGDE-UHFFFAOYSA-N 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 238000004132 cross linking Methods 0.000 abstract 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 abstract 1
- 125000004185 ester group Chemical group 0.000 abstract 1
- 239000003504 photosensitizing agent Substances 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 230000001235 sensitizing effect Effects 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- GRPURDFRFHUDSP-UHFFFAOYSA-N tris(prop-2-enyl) benzene-1,2,4-tricarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C(C(=O)OCC=C)=C1 GRPURDFRFHUDSP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F263/00—Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00
- C08F263/06—Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00 on to polymers of esters with polycarboxylic acids
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
1,141,544. Unsaturated carboxylic ester polymers in photosensitive compositions. G. O. SHIPTON (FMC Corp.). 13 July, 1966, No. 31459/66. Heading C3P. [Also in Division G2] A photosensitive composition comprises (a) a prepolymer of an unsaturated carboxylic ester having at least two carbon to carbon double bonds, at least one of which is an allyl ester group, and (b) a sensitizing agent which, upon absorbing actinic radiation at room temperature, accelerates cross-linking of said prepolymer. A wide variety of conventional photosensitizers may be used, while suitable prepolymers include those of allyl methacrylate, diallyl succinate, allyl cinnamate, diallyl isophthalate, diallyl terephthalate, triallyl mellitate and tetra-allyl pyromellitate. In the examples, photosensitive compositions comprising the following prepolymers and sensitizers in a variety of solvents are prepared: (1) allyl methacrylate, benzil, 4,41 - bis - (dimethylamino)-benzophenone, (2) allyl methacrylate/ styrene, methylether of benzoin, (3) diallyl succinate / piperonal / 4,4 - bis - (dimethylamino / benzophenone (DABP), (4) diallyl maleate / DABP, (5) diallyl maleate / methyl methacrylate, DABP, (6) allylcinnamate/styrene, 2 - keto - 3 - methyl - 1,3 - diazobenzanthrone, (7 , 8 and 9) diallyl isophthalate, methylether of benzoin or DABP, (10) triallyl trimellitate, DABP, (11) tetra-allyl pyromellitate, DABP, (12-18) diallyl isophthalate, benzil, methyl ether of benzoin, 1,2 - benzanthraquinone, 2- methylanthraquinone, piperonal, 2 - keto - 3 - methyl - 1,3 - diazabenzanthrone or 1 - methyl- 2 - benzoyl - methylene - # -naphthothiazoline, (21) triallyl mellitate, benzil, (22-23) diallyl terephthalate or tetra-allylpyromellitate, DABP, benzophenone and benzil.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB3145966A GB1141544A (en) | 1966-07-13 | 1966-07-13 | Polymer compositions |
| DE19661547849 DE1547849A1 (en) | 1966-07-13 | 1966-07-13 | Photosensitive mass |
| FR69943A FR1487028A (en) | 1966-07-13 | 1966-07-19 | Photo-sensitive compositions |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEF0049686 | 1966-07-13 | ||
| GB3145966A GB1141544A (en) | 1966-07-13 | 1966-07-13 | Polymer compositions |
| FR69943A FR1487028A (en) | 1966-07-13 | 1966-07-19 | Photo-sensitive compositions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1141544A true GB1141544A (en) | 1969-01-29 |
Family
ID=27210489
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3145966A Expired GB1141544A (en) | 1966-07-13 | 1966-07-13 | Polymer compositions |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE1547849A1 (en) |
| FR (1) | FR1487028A (en) |
| GB (1) | GB1141544A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2429818A1 (en) * | 1978-06-26 | 1980-01-25 | Lord Corp | LOW GLOSS FINISH LAYERS OBTAINED BY INTENSITY GRADIENT HARDENING |
| US4687727A (en) * | 1982-09-21 | 1987-08-18 | Fuji Photo Film Co., Ltd. | Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition |
| US4956261A (en) * | 1986-12-23 | 1990-09-11 | Hoechst Aktiengesellschaft | Photosensitive diazo and photopolymerizable recording material with a photosensitive diazo intermediate layer |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA980163A (en) * | 1970-12-23 | 1975-12-23 | Jack R. Celeste | Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds |
| AU526602B2 (en) * | 1977-10-06 | 1983-01-20 | Polychrome Corp. | Lithographic printing plate |
| NL8001085A (en) * | 1979-02-27 | 1980-08-29 | Minnesota Mining & Mfg | PHOTOSENSITIVE MATERIALS AND OBJECTS. |
| EP0653682A1 (en) * | 1993-11-16 | 1995-05-17 | Agfa-Gevaert N.V. | Imaging element comprising a photopolymerizable composition and method for producing images therewith |
-
1966
- 1966-07-13 GB GB3145966A patent/GB1141544A/en not_active Expired
- 1966-07-13 DE DE19661547849 patent/DE1547849A1/en active Pending
- 1966-07-19 FR FR69943A patent/FR1487028A/en not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2429818A1 (en) * | 1978-06-26 | 1980-01-25 | Lord Corp | LOW GLOSS FINISH LAYERS OBTAINED BY INTENSITY GRADIENT HARDENING |
| US4687727A (en) * | 1982-09-21 | 1987-08-18 | Fuji Photo Film Co., Ltd. | Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition |
| US4956261A (en) * | 1986-12-23 | 1990-09-11 | Hoechst Aktiengesellschaft | Photosensitive diazo and photopolymerizable recording material with a photosensitive diazo intermediate layer |
Also Published As
| Publication number | Publication date |
|---|---|
| FR1487028A (en) | 1967-06-30 |
| DE1547849A1 (en) | 1969-12-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1415378A (en) | Photopolymerisable compositions and elements | |
| FR1313807A (en) | New monomers, polymers of unsaturated acids, varnishes and coated articles | |
| GB1141544A (en) | Polymer compositions | |
| CA1032288A (en) | Photosensitive resin composition consisting of an unsaturated polyester, a cross-linking agent and a photosensitizer | |
| ES399317A1 (en) | Photopolymerizable compositions and their use | |
| JPS51123140A (en) | Photosensitive compositions and processing method thereof | |
| GB1160810A (en) | Novel Esters and Polymers obtained therefrom | |
| GB1217949A (en) | Process for producing cured plastics articles | |
| ATE17128T1 (en) | CURING POLYESTER COMPOSITIONS. | |
| JPS5227455A (en) | Process for preparing a high polymer material having water absorption properties | |
| GB1440899A (en) | Photogpolymerization of ethylenically unsaturated organic compounds | |
| GB1164514A (en) | Photographic Hardening Agents and Their Use in Gelatin Compositions | |
| GB1058550A (en) | Compositions containing polyvinyl compounds | |
| GB974920A (en) | Improvements in and relating to the manufacture of suppositories | |
| KR830002816A (en) | Semi-esters and their compositions | |
| GB1137903A (en) | Polyester resin compositions | |
| JPS5258782A (en) | Photo-polymerizable composition | |
| JPS52108479A (en) | Photo-curable resin compositions | |
| JPS5228589A (en) | Unsaturated polyester resin composition | |
| CA667626A (en) | Self-extinguishing vinyl aromatic polymer compositions and method of making the same | |
| FR2345415A1 (en) | COMPOSITIONS OF THE GENRE AZEOTROPES, BASED ON TRICHLOROTRIFLUOROETHANE, ETHANOL, METHANOL, ISOPROPANOL AND NITROMETHANE | |
| JPS5379985A (en) | Production of polymeric polyol | |
| ES378932A1 (en) | 2-chloro-{66 1,4-steroids | |
| BE859901A (en) | DERIVATIVES OF PHOSPHONO-CARBOXYLIC ACIDS USED IN PARTICULAR AS HIGH POLYMER PLASTICIZERS | |
| FR1334978A (en) | New methods of obtaining unsaturated polyester resins devoid of bridging monomer and use thereof |