DE3007212A1 - Lichtempfindliche masse - Google Patents

Lichtempfindliche masse

Info

Publication number: DE3007212A1
Authority: DE; Germany
Prior art keywords: polymer; percent; weight; mass; water
Prior art date: 1979-02-27
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Ceased

Application number

DE19803007212

Other languages

German (de)

English (en)

Inventor

Paul M Fuchs

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

3M Co

Original Assignee

Minnesota Mining and Manufacturing Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1979-02-27

Filing date

1980-02-26

Publication date

1980-08-28

1980-02-26 Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co

1980-08-28 Publication of DE3007212A1 publication Critical patent/DE3007212A1/de

Status Ceased legal-status Critical Current

Links

229920000642 polymer Polymers 0.000 claims description 91
239000000203 mixture Substances 0.000 claims description 53
150000001875 compounds Chemical class 0.000 claims description 37
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 32
239000000758 substrate Substances 0.000 claims description 28
239000003960 organic solvent Substances 0.000 claims description 26
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims description 24
239000002904 solvent Substances 0.000 claims description 20
-1 polyoxyethylene Polymers 0.000 claims description 17
229910052782 aluminium Inorganic materials 0.000 claims description 15
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 15
229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 9
239000001267 polyvinylpyrrolidone Substances 0.000 claims description 9
235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 9
239000004372 Polyvinyl alcohol Substances 0.000 claims description 8
229920006217 cellulose acetate butyrate Polymers 0.000 claims description 8
239000007859 condensation product Substances 0.000 claims description 8
229920002451 polyvinyl alcohol Polymers 0.000 claims description 8
150000003254 radicals Chemical class 0.000 claims description 8
229920002554 vinyl polymer Polymers 0.000 claims description 6
NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 5
CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 5
229920008347 Cellulose acetate propionate Polymers 0.000 claims description 4
239000012461 cellulose resin Substances 0.000 claims description 4
239000008240 homogeneous mixture Substances 0.000 claims description 4
229920013821 hydroxy alkyl cellulose Polymers 0.000 claims description 4
238000004519 manufacturing process Methods 0.000 claims description 4
150000001298 alcohols Chemical class 0.000 claims description 3
239000003822 epoxy resin Substances 0.000 claims description 3
LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 3
238000003384 imaging method Methods 0.000 claims description 3
239000003999 initiator Substances 0.000 claims description 3
QQVIHTHCMHWDBS-UHFFFAOYSA-L isophthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC(C([O-])=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-L 0.000 claims description 3
229920000647 polyepoxide Polymers 0.000 claims description 3
229920002635 polyurethane Polymers 0.000 claims description 3
239000004814 polyurethane Substances 0.000 claims description 3
229920002689 polyvinyl acetate Polymers 0.000 claims description 3
239000011118 polyvinyl acetate Substances 0.000 claims description 3
229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 2
150000001242 acetic acid derivatives Chemical class 0.000 claims description 2
229920002301 cellulose acetate Polymers 0.000 claims description 2
239000003795 chemical substances by application Substances 0.000 claims description 2
WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims description 2
229920000058 polyacrylate Polymers 0.000 claims description 2
229920000728 polyester Polymers 0.000 claims description 2
229920000193 polymethacrylate Polymers 0.000 claims description 2
125000002485 formyl group Chemical class [H]C(*)=O 0.000 claims 1
XNGIFLGASWRNHJ-UHFFFAOYSA-M phthalate(1-) Chemical compound OC(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-M 0.000 claims 1
229920000915 polyvinyl chloride Polymers 0.000 claims 1
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 30
ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 27
239000000243 solution Substances 0.000 description 24
239000011230 binding agent Substances 0.000 description 17
229920005989 resin Polymers 0.000 description 12
239000011347 resin Substances 0.000 description 12
239000011248 coating agent Substances 0.000 description 11
238000000576 coating method Methods 0.000 description 11
239000000976 ink Substances 0.000 description 11
238000006116 polymerization reaction Methods 0.000 description 10
239000000470 constituent Substances 0.000 description 9
239000000975 dye Substances 0.000 description 9
239000000049 pigment Substances 0.000 description 9
239000004593 Epoxy Substances 0.000 description 7
239000000463 material Substances 0.000 description 7
239000007787 solid Substances 0.000 description 7
XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 6
IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
239000006185 dispersion Substances 0.000 description 6
WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
239000000178 monomer Substances 0.000 description 6
230000005855 radiation Effects 0.000 description 6
239000000126 substance Substances 0.000 description 6
239000000654 additive Substances 0.000 description 5
150000003839 salts Chemical class 0.000 description 5
239000002841 Lewis acid Substances 0.000 description 4
229920001577 copolymer Polymers 0.000 description 4
238000004132 cross linking Methods 0.000 description 4
GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 4
150000007517 lewis acids Chemical class 0.000 description 4
239000008399 tap water Substances 0.000 description 4
235000020679 tap water Nutrition 0.000 description 4
MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 3
FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 3
229920002153 Hydroxypropyl cellulose Polymers 0.000 description 3
BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
229930040373 Paraformaldehyde Natural products 0.000 description 3
XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 3
BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
150000001450 anions Chemical class 0.000 description 3
239000007864 aqueous solution Substances 0.000 description 3
230000009286 beneficial effect Effects 0.000 description 3
238000006243 chemical reaction Methods 0.000 description 3
238000010438 heat treatment Methods 0.000 description 3
PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 3
239000001863 hydroxypropyl cellulose Substances 0.000 description 3
235000010977 hydroxypropyl cellulose Nutrition 0.000 description 3
239000004615 ingredient Substances 0.000 description 3
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
229920002866 paraformaldehyde Polymers 0.000 description 3
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 2
FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
229940090898 Desensitizer Drugs 0.000 description 2
239000004641 Diallyl-phthalate Substances 0.000 description 2
QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
229920001730 Moisture cure polyurethane Polymers 0.000 description 2
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
239000004480 active ingredient Substances 0.000 description 2
150000001408 amides Chemical class 0.000 description 2
239000012965 benzophenone Substances 0.000 description 2
QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 2
229920002678 cellulose Polymers 0.000 description 2
239000001913 cellulose Substances 0.000 description 2
JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
150000002148 esters Chemical class 0.000 description 2
RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
230000002349 favourable effect Effects 0.000 description 2
239000011521 glass Substances 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
238000000034 method Methods 0.000 description 2
238000002156 mixing Methods 0.000 description 2
GJYCVCVHRSWLNY-UHFFFAOYSA-N ortho-butylphenol Natural products CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
239000002245 particle Substances 0.000 description 2
XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical class OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
229920005749 polyurethane resin Polymers 0.000 description 2
238000002360 preparation method Methods 0.000 description 2
230000035945 sensitivity Effects 0.000 description 2
239000003381 stabilizer Substances 0.000 description 2
239000004094 surface-active agent Substances 0.000 description 2
229920001897 terpolymer Polymers 0.000 description 2
229910052725 zinc Inorganic materials 0.000 description 2
239000011701 zinc Substances 0.000 description 2
OAKFFVBGTSPYEG-UHFFFAOYSA-N (4-prop-2-enoyloxycyclohexyl) prop-2-enoate Chemical compound C=CC(=O)OC1CCC(OC(=O)C=C)CC1 OAKFFVBGTSPYEG-UHFFFAOYSA-N 0.000 description 1
JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical compound C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
BPXVHIRIPLPOPT-UHFFFAOYSA-N 1,3,5-tris(2-hydroxyethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound OCCN1C(=O)N(CCO)C(=O)N(CCO)C1=O BPXVHIRIPLPOPT-UHFFFAOYSA-N 0.000 description 1
FHDQFPCQZMLBFE-UHFFFAOYSA-N 1-[(4e)-4-diazo-2-methylcyclohexa-1,5-dien-1-yl]pyrrolidine Chemical compound C1=CC(=[N+]=[N-])CC(C)=C1N1CCCC1 FHDQFPCQZMLBFE-UHFFFAOYSA-N 0.000 description 1
KXCVWFIROSGRRF-UHFFFAOYSA-N 1-methyl-2-phenylsulfanylbenzene Chemical compound CC1=CC=CC=C1SC1=CC=CC=C1 KXCVWFIROSGRRF-UHFFFAOYSA-N 0.000 description 1
PUGOMSLRUSTQGV-UHFFFAOYSA-N 2,3-di(prop-2-enoyloxy)propyl prop-2-enoate Chemical compound C=CC(=O)OCC(OC(=O)C=C)COC(=O)C=C PUGOMSLRUSTQGV-UHFFFAOYSA-N 0.000 description 1
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
JJBFVQSGPLGDNX-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)COC(=O)C(C)=C JJBFVQSGPLGDNX-UHFFFAOYSA-N 0.000 description 1
FEXBEKLLSUWSIM-UHFFFAOYSA-N 2-Butyl-4-methylphenol Chemical compound CCCCC1=CC(C)=CC=C1O FEXBEKLLSUWSIM-UHFFFAOYSA-N 0.000 description 1
ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
NACPTFCBIGBTSJ-UHFFFAOYSA-N 2-hydroxy-2-phenyl-1-(2-propan-2-ylphenyl)ethanone Chemical compound CC(C)C1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 NACPTFCBIGBTSJ-UHFFFAOYSA-N 0.000 description 1
TURITJIWSQEMDB-UHFFFAOYSA-N 2-methyl-n-[(2-methylprop-2-enoylamino)methyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCNC(=O)C(C)=C TURITJIWSQEMDB-UHFFFAOYSA-N 0.000 description 1
229940080296 2-naphthalenesulfonate Drugs 0.000 description 1
125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
GGRBZHPJKWFAFZ-UHFFFAOYSA-N 3,4-bis(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC(OC(=O)C(C)=C)COC(=O)C(C)=C GGRBZHPJKWFAFZ-UHFFFAOYSA-N 0.000 description 1
HTWRFCRQSLVESJ-UHFFFAOYSA-N 3-(2-methylprop-2-enoyloxy)propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCOC(=O)C(C)=C HTWRFCRQSLVESJ-UHFFFAOYSA-N 0.000 description 1
WKXBVXXBNGSEPS-UHFFFAOYSA-N 4-[(4z)-3,6-dibutoxy-4-diazocyclohexa-1,5-dien-1-yl]morpholine Chemical compound CCCCOC1=CC(=[N+]=[N-])C(OCCCC)C=C1N1CCOCC1 WKXBVXXBNGSEPS-UHFFFAOYSA-N 0.000 description 1
DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
LAXPFHMCFLHGKK-UHFFFAOYSA-N 4-diazo-n,n-dimethylcyclohexa-1,5-dien-1-amine Chemical compound CN(C)C1=CCC(=[N+]=[N-])C=C1 LAXPFHMCFLHGKK-UHFFFAOYSA-N 0.000 description 1
FHQRDEDZJIFJAL-UHFFFAOYSA-N 4-phenylmorpholine Chemical compound C1COCCN1C1=CC=CC=C1 FHQRDEDZJIFJAL-UHFFFAOYSA-N 0.000 description 1
GEGJJEQPYVHPRG-UHFFFAOYSA-N 6-diazo-2,5-dimethoxy-3-(4-methylphenyl)sulfanylcyclohexa-1,3-diene Chemical compound COC1=CC(=[N+]=[N-])C(OC)C=C1SC1=CC=C(C)C=C1 GEGJJEQPYVHPRG-UHFFFAOYSA-N 0.000 description 1
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical group NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
LRYAPECLTRYCTR-UHFFFAOYSA-N NC(=O)C=C.NC(=O)C=C.NC(=O)C=C.NCCNCCN Chemical compound NC(=O)C=C.NC(=O)C=C.NC(=O)C=C.NCCNCCN LRYAPECLTRYCTR-UHFFFAOYSA-N 0.000 description 1
229930192627 Naphthoquinone Natural products 0.000 description 1
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
239000004902 Softening Agent Substances 0.000 description 1
235000000126 Styrax benzoin Nutrition 0.000 description 1
244000028419 Styrax benzoin Species 0.000 description 1
235000008411 Sumatra benzointree Nutrition 0.000 description 1
239000004433 Thermoplastic polyurethane Substances 0.000 description 1
DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
238000005299 abrasion Methods 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
150000008062 acetophenones Chemical class 0.000 description 1
150000001252 acrylic acid derivatives Chemical class 0.000 description 1
230000001154 acute effect Effects 0.000 description 1
230000000996 additive effect Effects 0.000 description 1
125000001931 aliphatic group Chemical group 0.000 description 1
125000005907 alkyl ester group Chemical group 0.000 description 1
125000002947 alkylene group Chemical group 0.000 description 1
239000000956 alloy Substances 0.000 description 1
229910045601 alloy Inorganic materials 0.000 description 1
125000003277 amino group Chemical group 0.000 description 1
125000003118 aryl group Chemical group 0.000 description 1
239000000440 bentonite Substances 0.000 description 1
229910000278 bentonite Inorganic materials 0.000 description 1
SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
150000008366 benzophenones Chemical class 0.000 description 1
230000005540 biological transmission Effects 0.000 description 1
PIPBVABVQJZSAB-UHFFFAOYSA-N bis(ethenyl) benzene-1,2-dicarboxylate Chemical compound C=COC(=O)C1=CC=CC=C1C(=O)OC=C PIPBVABVQJZSAB-UHFFFAOYSA-N 0.000 description 1
AJCHRUXIDGEWDK-UHFFFAOYSA-N bis(ethenyl) butanedioate Chemical compound C=COC(=O)CCC(=O)OC=C AJCHRUXIDGEWDK-UHFFFAOYSA-N 0.000 description 1
JZQAAQZDDMEFGZ-UHFFFAOYSA-N bis(ethenyl) hexanedioate Chemical compound C=COC(=O)CCCCC(=O)OC=C JZQAAQZDDMEFGZ-UHFFFAOYSA-N 0.000 description 1
HABAXTXIECRCKH-UHFFFAOYSA-N bis(prop-2-enyl) butanedioate Chemical compound C=CCOC(=O)CCC(=O)OCC=C HABAXTXIECRCKH-UHFFFAOYSA-N 0.000 description 1
FPODCVUTIPDRTE-UHFFFAOYSA-N bis(prop-2-enyl) hexanedioate Chemical compound C=CCOC(=O)CCCCC(=O)OCC=C FPODCVUTIPDRTE-UHFFFAOYSA-N 0.000 description 1
229910052799 carbon Inorganic materials 0.000 description 1
125000004432 carbon atom Chemical group C* 0.000 description 1
150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
230000001427 coherent effect Effects 0.000 description 1
238000004040 coloring Methods 0.000 description 1
238000000586 desensitisation Methods 0.000 description 1
125000004386 diacrylate group Chemical group 0.000 description 1
150000008049 diazo compounds Chemical class 0.000 description 1
239000012954 diazonium Substances 0.000 description 1
150000001989 diazonium salts Chemical class 0.000 description 1
IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical group [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 description 1
239000000539 dimer Substances 0.000 description 1
125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
238000004090 dissolution Methods 0.000 description 1
MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 description 1
229940043264 dodecyl sulfate Drugs 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000010894 electron beam technology Methods 0.000 description 1
239000003974 emollient agent Substances 0.000 description 1
238000003912 environmental pollution Methods 0.000 description 1
125000003700 epoxy group Chemical group 0.000 description 1
STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
230000008020 evaporation Effects 0.000 description 1
239000004744 fabric Substances 0.000 description 1
239000000945 filler Substances 0.000 description 1
239000012949 free radical photoinitiator Substances 0.000 description 1
239000013538 functional additive Substances 0.000 description 1
235000019382 gum benzoic Nutrition 0.000 description 1
RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
229910052739 hydrogen Inorganic materials 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
239000000852 hydrogen donor Substances 0.000 description 1
230000002209 hydrophobic effect Effects 0.000 description 1
ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
150000002576 ketones Chemical class 0.000 description 1
CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
239000011976 maleic acid Substances 0.000 description 1
125000005395 methacrylic acid group Chemical group 0.000 description 1
UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
AJDUTMFFZHIJEM-UHFFFAOYSA-N n-(9,10-dioxoanthracen-1-yl)-4-[4-[[4-[4-[(9,10-dioxoanthracen-1-yl)carbamoyl]phenyl]phenyl]diazenyl]phenyl]benzamide Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2NC(=O)C(C=C1)=CC=C1C(C=C1)=CC=C1N=NC(C=C1)=CC=C1C(C=C1)=CC=C1C(=O)NC1=CC=CC2=C1C(=O)C1=CC=CC=C1C2=O AJDUTMFFZHIJEM-UHFFFAOYSA-N 0.000 description 1
ZBOFNBUHQGGQPT-UHFFFAOYSA-N n-[(4z)-4-diazo-3,6-diethoxycyclohexa-1,5-dien-1-yl]benzamide Chemical compound CCOC1=CC(=[N+]=[N-])C(OCC)C=C1NC(=O)C1=CC=CC=C1 ZBOFNBUHQGGQPT-UHFFFAOYSA-N 0.000 description 1
YQCFXPARMSSRRK-UHFFFAOYSA-N n-[6-(prop-2-enoylamino)hexyl]prop-2-enamide Chemical compound C=CC(=O)NCCCCCCNC(=O)C=C YQCFXPARMSSRRK-UHFFFAOYSA-N 0.000 description 1
150000002791 naphthoquinones Chemical class 0.000 description 1
229910017604 nitric acid Inorganic materials 0.000 description 1
239000012454 non-polar solvent Substances 0.000 description 1
FSAJWMJJORKPKS-UHFFFAOYSA-N octadecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C=C FSAJWMJJORKPKS-UHFFFAOYSA-N 0.000 description 1
238000013021 overheating Methods 0.000 description 1
NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
239000003973 paint Substances 0.000 description 1
WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
150000002989 phenols Chemical class 0.000 description 1
230000002186 photoactivation Effects 0.000 description 1
239000003495 polar organic solvent Substances 0.000 description 1
229920001515 polyalkylene glycol Polymers 0.000 description 1
229920001610 polycaprolactone Polymers 0.000 description 1
239000004632 polycaprolactone Substances 0.000 description 1
229920001223 polyethylene glycol Polymers 0.000 description 1
230000002028 premature Effects 0.000 description 1
QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
FAIDIRVMPHBRLT-UHFFFAOYSA-N propane-1,2,3-triol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OCC(O)CO FAIDIRVMPHBRLT-UHFFFAOYSA-N 0.000 description 1
238000005096 rolling process Methods 0.000 description 1
239000000565 sealant Substances 0.000 description 1
230000001235 sensitizing effect Effects 0.000 description 1
239000001488 sodium phosphate Substances 0.000 description 1
210000004872 soft tissue Anatomy 0.000 description 1
239000000600 sorbitol Substances 0.000 description 1
230000003595 spectral effect Effects 0.000 description 1
238000003860 storage Methods 0.000 description 1
BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
239000000725 suspension Substances 0.000 description 1
229920002803 thermoplastic polyurethane Polymers 0.000 description 1
JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
230000001131 transforming effect Effects 0.000 description 1
239000013638 trimer Substances 0.000 description 1
RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 1
HVYVMSPIJIWUNA-UHFFFAOYSA-N triphenylstibine Chemical compound C1=CC=CC=C1[Sb](C=1C=CC=CC=1)C1=CC=CC=C1 HVYVMSPIJIWUNA-UHFFFAOYSA-N 0.000 description 1
RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
229910000406 trisodium phosphate Inorganic materials 0.000 description 1
235000019801 trisodium phosphate Nutrition 0.000 description 1
HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
229920001567 vinyl ester resin Polymers 0.000 description 1
238000005406 washing Methods 0.000 description 1
229920003169 water-soluble polymer Polymers 0.000 description 1
239000001043 yellow dye Substances 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Polymerisation Methods In General (AREA)
Materials For Photolithography (AREA)
Printing Plates And Materials Therefor (AREA)
Graft Or Block Polymers (AREA)

DE19803007212 1979-02-27 1980-02-26 Lichtempfindliche masse Ceased DE3007212A1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US1558479A	1979-02-27	1979-02-27

Publications (1)

Publication Number	Publication Date
DE3007212A1 true DE3007212A1 (de)	1980-08-28

Family

ID=21772291

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE19803007212 Ceased DE3007212A1 (de)	1979-02-27	1980-02-26	Lichtempfindliche masse

Country Status (10)

Country	Link
JP (1)	JPS55120028A (es)
BE (1)	BE881956A (es)
BR (1)	BR8001128A (es)
CA (1)	CA1144804A (es)
DE (1)	DE3007212A1 (es)
ES (1)	ES8103397A1 (es)
FR (1)	FR2450473A1 (es)
GB (1)	GB2044788B (es)
NL (1)	NL8001085A (es)
ZA (1)	ZA801085B (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3605717A1 (de) *	1985-02-28	1986-08-28	Hoechst Celanese Corp., Somerville, N.J.	Durch strahlung polymerisierbares gemisch

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS57141640A (en) *	1981-02-03	1982-09-02	Konishiroku Photo Ind Co Ltd	Photosensitive image forming material
JPS57197537A (en) *	1981-05-29	1982-12-03	Konishiroku Photo Ind Co Ltd	Photosensitive composition
JPS582847A (ja) *	1981-06-30	1983-01-08	Konishiroku Photo Ind Co Ltd	平版印刷版
JPS58199341A (ja) *	1982-05-17	1983-11-19	Tokyo Ohka Kogyo Co Ltd	耐熱性感光性樹脂組成物
JPS5953836A (ja) *	1982-09-21	1984-03-28	Fuji Photo Film Co Ltd	感光性平版印刷版
JPS59101644A (ja) *	1982-12-01	1984-06-12	Fuji Photo Film Co Ltd	感光性組成物
US4600679A (en) *	1984-05-25	1986-07-15	W. R. Grace & Co.	Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer
DE3425328A1 (de) *	1984-07-10	1986-01-16	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3567294D1 (en) *	1984-12-06	1989-02-09	Hoechst Celanese Corp	Light-sensitive composition
DE3504658A1 (de) *	1985-02-12	1986-08-14	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
US4851319A (en) *	1985-02-28	1989-07-25	Hoechst Celanese Corporation	Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers
US5080999A (en) *	1985-06-10	1992-01-14	Fuji Photo Film Co., Ltd.	Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide
US4822720A (en) *	1985-08-02	1989-04-18	Hoechst Celanese Corporation	Water developable screen printing composition
US4772538A (en) *	1985-08-02	1988-09-20	American Hoechst Corporation	Water developable lithographic composition
US5120772A (en) *	1985-08-02	1992-06-09	Walls John E	Radiation-polymerizable composition and element containing a photopolymerizable mixture
US4780392A (en) *	1985-08-02	1988-10-25	Hoechst Celanese Corporation	Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
US4707437A (en) *	1985-08-02	1987-11-17	Hoechst Celanese Corporation	Radiation-polymerizable composition and element containing a photopolymer composition
US4652604A (en) *	1985-08-02	1987-03-24	American Hoechst Corporation	Radiation-polymerizable composition and element containing a photopolymer composition
DE3528309A1 (de) *	1985-08-07	1987-02-12	Hoechst Ag	Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
JPS6278544A (ja) *	1985-10-01	1987-04-10	Fuji Photo Film Co Ltd	感光性組成物
JPS62238553A (ja) *	1986-04-10	1987-10-19	Nippon Foil Mfg Co Ltd	感光性樹脂組成物
US4877711A (en) *	1986-05-19	1989-10-31	Fuji Photo Film Co., Ltd.	Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3644160A1 (de) *	1986-12-23	1988-07-14	Hoechst Ag	Lichtempfindliches aufzeichnungsmaterial mit einer lichtempfindlichen zwischenschicht
US4886731A (en) *	1987-01-05	1989-12-12	Cookson Graphics Inc.	Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions
JPH0727208B2 (ja) *	1987-04-20	1995-03-29	富士写真フイルム株式会社	感光性組成物
DE3738863A1 (de) *	1987-11-16	1989-05-24	Hoechst Ag	Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck
US5286594A (en) *	1988-01-29	1994-02-15	International Paper Company	Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles
US5340681A (en) *	1988-01-29	1994-08-23	International Paper Company	Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process
CA2000712A1 (en) *	1988-10-21	1990-04-21	Thomas Dunder	Negative-working, photopolymerizable color proofing film without triplet oxygen quenching
DE3903001A1 (de) *	1989-02-02	1990-08-16	Hoechst Ag	Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
JP6962216B2 (ja) *	2018-01-24	2021-11-05	日本製鉄株式会社	溶接鋼管用防錆処理液、溶接鋼管の化成処理方法、溶接鋼管および溶接鋼管の成形加工品
CN113105570B (zh) *	2021-04-12	2022-05-03	之江实验室	一种液体双光子引发剂及其制备方法与应用

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1141544A (en) *	1966-07-13	1969-01-29	Gordon Owen Shipton	Polymer compositions
US3905815A (en) *	1971-12-17	1975-09-16	Minnesota Mining & Mfg	Photopolymerizable sheet material with diazo resin layer
IT1000315B (it) *	1972-12-14	1976-03-30	Polychrome Corp	Perfezionamento nelle composizioni monomere diazoiche insature potosensibili
FI207474A7 (es) *	1973-08-16	1975-02-17	Hercules Inc
JPS50108003A (es) *	1974-02-01	1975-08-26
JPS50114122A (es) *	1974-02-16	1975-09-06
GB1523762A (en) *	1975-02-25	1978-09-06	Oce Van Der Grinten Nv	Photocopying materials
US4042386A (en) *	1976-06-07	1977-08-16	Napp Systems	Photosensitive compositions
JPS549619A (en) *	1977-06-23	1979-01-24	Oji Paper Co	Photosensitive composition
AU526602B2 (en) *	1977-10-06	1983-01-20	Polychrome Corp.	Lithographic printing plate

1980
- 1980-02-22 NL NL8001085A patent/NL8001085A/nl not_active Application Discontinuation
- 1980-02-25 ES ES488890A patent/ES8103397A1/es not_active Expired
- 1980-02-26 GB GB8006481A patent/GB2044788B/en not_active Expired
- 1980-02-26 ZA ZA00801085A patent/ZA801085B/xx unknown
- 1980-02-26 DE DE19803007212 patent/DE3007212A1/de not_active Ceased
- 1980-02-26 BR BR8001128A patent/BR8001128A/pt unknown
- 1980-02-26 FR FR8004164A patent/FR2450473A1/fr not_active Withdrawn
- 1980-02-26 CA CA000346444A patent/CA1144804A/en not_active Expired
- 1980-02-27 BE BE0/199576A patent/BE881956A/fr not_active IP Right Cessation
- 1980-02-27 JP JP2394780A patent/JPS55120028A/ja active Pending

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3605717A1 (de) *	1985-02-28	1986-08-28	Hoechst Celanese Corp., Somerville, N.J.	Durch strahlung polymerisierbares gemisch

Also Published As

Publication number	Publication date
FR2450473A1 (fr)	1980-09-26
CA1144804A (en)	1983-04-19
GB2044788A (en)	1980-10-22
BE881956A (fr)	1980-08-27
ES488890A0 (es)	1981-02-16
BR8001128A (pt)	1980-11-04
ES8103397A1 (es)	1981-02-16
JPS55120028A (en)	1980-09-16
GB2044788B (en)	1983-05-25
NL8001085A (nl)	1980-08-29
ZA801085B (en)	1981-07-29

Publication	Publication Date	Title
DE3007212A1 (de)	1980-08-28	Lichtempfindliche masse
DE2924294C2 (de)	1986-03-27	Lichtempfindliche lithographische Druckplatte
DE2039861C3 (de)	1973-12-13	Photopolymensierbare Kopier masse
EP0352630B1 (de)	1994-08-17	Photopolymerisierbares Aufzeichnungsmaterial
DE69703941T2 (de)	2001-08-09	Photopolymerisierbare Zusammensetzung für eine photoempfindliche lithographische Druckplatte und die Druckplatte, die diese Zusammensetzung verwendet
DE3738864A1 (de)	1989-05-24	Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch
EP0287818A2 (de)	1988-10-26	Polymerisierbare Verbindungen und diese enthaltendes durch Strahlung polymerisierbares Gemisch
EP0432450B1 (de)	1996-04-10	Entwicklerkonzentrat und daraus hergestellter Entwickler für belichtete negativ arbeitende Reproduktionsschichten mit Deckschicht sowie Verfahren zur Herstellung von Druckformen
DE69501865T2 (de)	1998-10-15	Fotopolymerisierbare Zusammensetzung und fotoempfindliche lithographische Druckplatte
DE3928825A1 (de)	1991-03-07	Pfropfpolymerisat mit ungesaettigten seitenketten, dieses enthaltendes lichtempfindliches gemisch sowie daraus hergestelltes aufzeichnungsmaterial
EP0354475A2 (de)	1990-02-14	Photopolymerisierbares Aufzeichnungsmaterial
EP0030001B1 (de)	1983-10-19	Lichtempfindliches Gemisch und damit hergestelltes lichtempfindliches Kopiermaterial
DE2414240A1 (de)	1974-10-10	Photopolymerisierbare masse und ihre verwendung in einem aufzeichnungsmaterial
EP0135026A2 (de)	1985-03-27	Lichthärtbares Gemisch und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial
DE19936331B4 (de)	2006-12-07	Copolymer zur Erhöhung der Chemikalien- und Entwicklerresistenz von positiv arbeitenden Druckplatten
EP0003804A1 (de)	1979-09-05	Photopolymerisierbares Gemisch, das einen Monoazofarbstoff enthält
DE69609136T2 (de)	2001-03-22	Schwer-flüchtige substituierte 2-phenyl-4,6-bis(halomethyl)-1,3,5-triazine für lithographische druckplatten
DE69621173T2 (de)	2003-01-02	Benzanthron als Polymerisierungsregler in fotopolymerisierbarer Zusammensetzung
DE2203732C2 (de)	1983-06-01	Mischpolymerisate und diese enthaltende lichtempfindliche Kopiermassen
DE3234045C2 (es)	1989-11-16
EP0244748A2 (de)	1987-11-11	Lichtempfindliches Gemisch und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial
EP0406600A1 (de)	1991-01-09	Lichthärtbares Gemisch und daraus hergestelltes lichthärtbares Aufzeichnungsmaterial
EP0220589B1 (de)	1992-07-22	Photopolymerisierbares Gemisch und dieses enthaltendes photopolymerisierbares Aufzeichnungsmaterial
DE3924811A1 (de)	1991-01-31	Pfropfpolymerisat mit ungesaettigten seitenketten, dieses enthaltendes lichtempfindliches gemisch sowie daraus hergestelltes aufzeichnungsmaterial
DE69130102T2 (de)	1999-05-20	Hochdruckplatte mit photovernetzbarem kunststoff

Legal Events

Date	Code	Title
1980-08-28	OAP	Request for examination filed
1980-10-02	OD	Request for examination
1985-11-14	8131	Rejection

DE3007212A1 - Lichtempfindliche masse - Google Patents

Info

Links

Classifications

Landscapes

Applications Claiming Priority (1)

Publications (1)

Family

ID=21772291

Family Applications (1)

Country Status (10)

Cited By (1)

Families Citing this family (32)

Family Cites Families (10)

Cited By (1)

Also Published As

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