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EP1628329A4 - Dispositif d'exposition et procede de fabrication dudit dispositif - Google Patents

Dispositif d'exposition et procede de fabrication dudit dispositif

Info

Publication number
EP1628329A4
EP1628329A4 EP04734624A EP04734624A EP1628329A4 EP 1628329 A4 EP1628329 A4 EP 1628329A4 EP 04734624 A EP04734624 A EP 04734624A EP 04734624 A EP04734624 A EP 04734624A EP 1628329 A4 EP1628329 A4 EP 1628329A4
Authority
EP
European Patent Office
Prior art keywords
manufacturing
same
exposure device
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP04734624A
Other languages
German (de)
English (en)
Other versions
EP1628329A1 (fr
Inventor
Naoyuki Kobayashi
Akikazu Tanimoto
Yasushi Mizuno
Kenichi Shiraishi
Katsushi Nakano
Soichi Owa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to EP12155100A priority Critical patent/EP2466620A3/fr
Priority to EP12155093.3A priority patent/EP2498131B1/fr
Priority to EP15199243.5A priority patent/EP3032572A1/fr
Priority to EP12155114A priority patent/EP2535769A3/fr
Priority to EP12155099A priority patent/EP2466619A3/fr
Priority to EP12155095A priority patent/EP2466615A3/fr
Priority to EP12155097A priority patent/EP2466617A3/fr
Priority to EP12155096A priority patent/EP2466616A3/fr
Priority to EP12155098A priority patent/EP2466618A3/fr
Publication of EP1628329A1 publication Critical patent/EP1628329A1/fr
Publication of EP1628329A4 publication Critical patent/EP1628329A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
    • H10P76/2041—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Multimedia (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
EP04734624A 2003-05-23 2004-05-24 Dispositif d'exposition et procede de fabrication dudit dispositif Withdrawn EP1628329A4 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
EP12155100A EP2466620A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155093.3A EP2498131B1 (fr) 2003-05-23 2004-05-24 Appareil et méthode d'exposition par immersion dans un liquide, et procédé de production d'un dispositif
EP15199243.5A EP3032572A1 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155114A EP2535769A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155099A EP2466619A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155095A EP2466615A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155097A EP2466617A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155096A EP2466616A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155098A EP2466618A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003146423 2003-05-23
JP2003305280 2003-08-28
JP2004049231 2004-02-25
PCT/JP2004/007417 WO2004105107A1 (fr) 2003-05-23 2004-05-24 Dispositif d'exposition et procede de fabrication dudit dispositif

Related Child Applications (2)

Application Number Title Priority Date Filing Date
EP12155093.3A Division EP2498131B1 (fr) 2003-05-23 2004-05-24 Appareil et méthode d'exposition par immersion dans un liquide, et procédé de production d'un dispositif
EP15199243.5A Division EP3032572A1 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif

Publications (2)

Publication Number Publication Date
EP1628329A1 EP1628329A1 (fr) 2006-02-22
EP1628329A4 true EP1628329A4 (fr) 2009-09-16

Family

ID=33479649

Family Applications (10)

Application Number Title Priority Date Filing Date
EP12155097A Withdrawn EP2466617A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP04734624A Withdrawn EP1628329A4 (fr) 2003-05-23 2004-05-24 Dispositif d'exposition et procede de fabrication dudit dispositif
EP12155099A Withdrawn EP2466619A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155098A Withdrawn EP2466618A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155093.3A Expired - Lifetime EP2498131B1 (fr) 2003-05-23 2004-05-24 Appareil et méthode d'exposition par immersion dans un liquide, et procédé de production d'un dispositif
EP12155114A Withdrawn EP2535769A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP15199243.5A Withdrawn EP3032572A1 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155100A Withdrawn EP2466620A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155095A Withdrawn EP2466615A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155096A Withdrawn EP2466616A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif

Family Applications Before (1)

Application Number Title Priority Date Filing Date
EP12155097A Withdrawn EP2466617A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif

Family Applications After (8)

Application Number Title Priority Date Filing Date
EP12155099A Withdrawn EP2466619A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155098A Withdrawn EP2466618A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155093.3A Expired - Lifetime EP2498131B1 (fr) 2003-05-23 2004-05-24 Appareil et méthode d'exposition par immersion dans un liquide, et procédé de production d'un dispositif
EP12155114A Withdrawn EP2535769A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP15199243.5A Withdrawn EP3032572A1 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155100A Withdrawn EP2466620A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155095A Withdrawn EP2466615A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif
EP12155096A Withdrawn EP2466616A3 (fr) 2003-05-23 2004-05-24 Appareil d'exposition et procédé de production d'un dispositif

Country Status (7)

Country Link
US (14) US7388649B2 (fr)
EP (10) EP2466617A3 (fr)
JP (13) JP5440228B2 (fr)
KR (10) KR101536033B1 (fr)
HK (1) HK1221072A1 (fr)
TW (8) TWI612556B (fr)
WO (1) WO2004105107A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8941810B2 (en) 2005-12-30 2015-01-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Families Citing this family (174)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7110081B2 (en) 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1420300B1 (fr) * 2002-11-12 2015-07-29 ASML Netherlands B.V. Appareil lithographique et méthode de fabrication d'un dispositif
CN101713932B (zh) 2002-11-12 2012-09-26 Asml荷兰有限公司 光刻装置和器件制造方法
KR100585476B1 (ko) 2002-11-12 2006-06-07 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조방법
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101085372B1 (ko) * 2002-12-10 2011-11-21 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101187612B1 (ko) 2003-04-09 2012-10-08 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
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TWI353624B (fr) 2011-12-01
KR20170126020A (ko) 2017-11-15
EP1628329A1 (fr) 2006-02-22
JP5252025B2 (ja) 2013-07-31
KR20120115591A (ko) 2012-10-18
US20080030695A1 (en) 2008-02-07
KR101796849B1 (ko) 2017-11-10
EP2466619A2 (fr) 2012-06-20
JP5440542B2 (ja) 2014-03-12
JP2012248903A (ja) 2012-12-13
US8384877B2 (en) 2013-02-26
JP2011159995A (ja) 2011-08-18
KR20150015003A (ko) 2015-02-09
TW200509205A (en) 2005-03-01
US9304392B2 (en) 2016-04-05
TWI474380B (zh) 2015-02-21
JP2011139106A (ja) 2011-07-14
JP2018077518A (ja) 2018-05-17
KR20110126733A (ko) 2011-11-23
KR20150115948A (ko) 2015-10-14
EP2466618A3 (fr) 2012-11-14
US8134682B2 (en) 2012-03-13
US8760617B2 (en) 2014-06-24
TW201137939A (en) 2011-11-01
JP5794291B2 (ja) 2015-10-14
US8125612B2 (en) 2012-02-28
US20070247600A1 (en) 2007-10-25
JP6278015B2 (ja) 2018-02-14
JP5590083B2 (ja) 2014-09-17
TWI424470B (zh) 2014-01-21
US7388649B2 (en) 2008-06-17
KR101536033B1 (ko) 2015-07-13
TW201230147A (en) 2012-07-16
EP2466617A2 (fr) 2012-06-20
US20070132968A1 (en) 2007-06-14
US20140293249A1 (en) 2014-10-02
TW201806001A (zh) 2018-02-16
KR101327697B1 (ko) 2013-11-11
US20060077367A1 (en) 2006-04-13
US20180196352A1 (en) 2018-07-12
EP2498131A2 (fr) 2012-09-12
KR20120005562A (ko) 2012-01-16
EP3032572A1 (fr) 2016-06-15
JP5700011B2 (ja) 2015-04-15
JP2011139107A (ja) 2011-07-14
JP2015222451A (ja) 2015-12-10

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