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NL1036273A1 - Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus. - Google Patents

Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus. Download PDF

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Publication number
NL1036273A1
NL1036273A1 NL1036273A NL1036273A NL1036273A1 NL 1036273 A1 NL1036273 A1 NL 1036273A1 NL 1036273 A NL1036273 A NL 1036273A NL 1036273 A NL1036273 A NL 1036273A NL 1036273 A1 NL1036273 A1 NL 1036273A1
Authority
NL
Netherlands
Prior art keywords
lithographic apparatus
cleaning
immersion
immersion lithographic
lithographic
Prior art date
Application number
NL1036273A
Other languages
English (en)
Inventor
Anthonius Martinus Cornelis Jong
Hans Jansen
Josephus Cornelius Johan Vugts
Jacques Cor Johan Van De Donck
Teunis Cornelis Van Den Dool
Gerrit Oosterhuis
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL1036273A1 publication Critical patent/NL1036273A1/nl

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL1036273A 2007-12-18 2008-12-03 Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus. NL1036273A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US609207P 2007-12-18 2007-12-18

Publications (1)

Publication Number Publication Date
NL1036273A1 true NL1036273A1 (nl) 2009-06-19

Family

ID=40844295

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1036273A NL1036273A1 (nl) 2007-12-18 2008-12-03 Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus.

Country Status (3)

Country Link
US (1) US9289802B2 (nl)
JP (1) JP5145206B2 (nl)
NL (1) NL1036273A1 (nl)

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Also Published As

Publication number Publication date
JP5145206B2 (ja) 2013-02-13
US9289802B2 (en) 2016-03-22
US20090174871A1 (en) 2009-07-09
JP2009188383A (ja) 2009-08-20

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