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TWM659479U - Wafer identification device - Google Patents

Wafer identification device Download PDF

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Publication number
TWM659479U
TWM659479U TW113206028U TW113206028U TWM659479U TW M659479 U TWM659479 U TW M659479U TW 113206028 U TW113206028 U TW 113206028U TW 113206028 U TW113206028 U TW 113206028U TW M659479 U TWM659479 U TW M659479U
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Taiwan
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wafer
identification device
wafers
carrier
wafer identification
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TW113206028U
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Chinese (zh)
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曹如德
姚哲文
邱崇傑
吳駿翔
林盛煌
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鏵友益科技股份有限公司
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Priority to TW113206028U priority Critical patent/TWM659479U/en
Publication of TWM659479U publication Critical patent/TWM659479U/en

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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

一種晶圓辨識裝置,包含一支撐單元及一工作單元。該支撐單元包括一支架,及一可沿一縱方向移動地設置於該支架的載台。該工作單元包括一設置於該載台的雷射模組,及一與該雷射模組相間隔地設置於該載台的偵測模組。該雷射模組具有一適用於朝晶圓片發出一沿該縱方向延伸之線形光的光源。該偵測模組具有一用以拍攝該線形光照射於晶圓片之範圍的影像擷取器,及一連接於該影像擷取器的處理器。該處理器用以根據該線形光分別在該等晶圓片形成的多個光點,判斷該等光點的數量是否符合預期數量,並確認該等光點的間距。A wafer identification device includes a supporting unit and a working unit. The supporting unit includes a support, and a stage movably disposed on the support along a longitudinal direction. The working unit includes a laser module disposed on the stage, and a detection module disposed on the stage spaced apart from the laser module. The laser module has a light source suitable for emitting a linear light extending along the longitudinal direction toward a wafer. The detection module has an image capturer for capturing the range of the linear light irradiating the wafer, and a processor connected to the image capturer. The processor is used to determine whether the number of the plurality of light spots formed by the linear light on the wafers meets the expected number, and to confirm the distances between the light spots.

Description

晶圓辨識裝置Wafer identification device

本新型是有關於一種半導體產線的輔助裝置,特別是指一種晶圓辨識裝置。The invention relates to an auxiliary device for a semiconductor production line, and in particular to a wafer identification device.

參閱圖1,為一用以盛裝多片目前常用於半導體製程之晶圓片W的晶圓盒1,該晶圓盒1界定出一容置空間10,並具有多個在該容置空間10之中自左右兩側朝向彼此延伸,且適用於兩兩相互配合而承載所述晶圓片W的承載板11(圖1中因視角關係只能見其中一側)。而該等承載板11將該容置空間10區分為多個分別供多片所述晶圓片W放置的容槽S。在目前成熟的半導體產線中,會由自動化的設備將所述晶圓片W自該容置空間10取中,進而導入產線而執行各站點的製程。Referring to FIG. 1 , a wafer box 1 is shown for containing multiple wafers W currently commonly used in semiconductor processes. The wafer box 1 defines a containing space 10 and has multiple supporting plates 11 extending from the left and right sides of the containing space 10 toward each other and suitable for supporting the wafers W in pairs (only one side can be seen in FIG. 1 due to the viewing angle). The supporting plates 11 divide the containing space 10 into multiple containing slots S for placing multiple wafers W. In the current mature semiconductor production line, the wafer W is taken from the containing space 10 by automated equipment and then introduced into the production line to execute the process of each station.

然而,所述晶圓片W是否能由自動化的設備確實導入產線,有一部分取決於該等晶圓片W是否確實如預期地分別放置於該等容槽S。因此,若是發生有某一該容槽S未放置有該晶圓片W、一個該容槽S中放置了複數之該等晶圓片W,或者某一片該晶圓片W未平放在相互對位之該等承載板11的”斜插”情況,都有可能會影響自動化設備正確導入所述晶圓片W的相關作業。同樣地,即使是完成特定流程步驟而要將所述晶圓片W放回該晶圓盒1時,也有可能發生類似情況而影響到後續製程甚至是成品出貨。However, whether the wafer W can be introduced into the production line by the automated equipment depends in part on whether the wafers W are placed in the slots S as expected. Therefore, if a slot S does not contain the wafer W, a plurality of wafers W are placed in a slot S, or a wafer W is not placed flat on the mutually aligned carrier plates 11, it may affect the automated equipment's related operations of correctly introducing the wafer W. Similarly, even when the wafer W is placed back into the wafer box 1 after completing a specific process step, similar situations may occur and affect subsequent processes or even the shipment of finished products.

因此,本新型之目的,即在提供一種能針對晶圓片放置於晶圓盒之情況進行專門檢測的晶圓辨識裝置。Therefore, the purpose of the present invention is to provide a wafer identification device that can specifically detect the condition of wafers placed in a wafer box.

於是,本新型晶圓辨識裝置,適用於與一晶圓盒相鄰設置,該晶圓盒界定出一適用於供多片晶圓片沿一縱方向放置的內空間,該晶圓辨識裝置包含一支撐單元,及一安裝於該支撐單元的工作單元。Therefore, the novel wafer identification device is suitable for being arranged adjacent to a wafer box, and the wafer box defines an inner space suitable for placing multiple wafers along a longitudinal direction. The wafer identification device includes a supporting unit and a working unit installed on the supporting unit.

該支撐單元包括一支架,及一可沿該縱方向移動地設置於該支架上的載台。The supporting unit includes a bracket and a carrier which is movably arranged on the bracket along the longitudinal direction.

該工作單元包括一設置於該載台的雷射模組,及一與該雷射模組相間隔地設置於該載台的偵測模組。該雷射模組具有一適用於對該等晶圓片發出一沿該縱方向延伸之線形光的光源。該偵測模組具有一用以拍攝該線形光照射於該等晶圓片之一拍攝範圍的影像擷取器,及一資訊連接於該影像擷取器的處理器。該處理器用以根據該拍攝範圍之該線形光分別在該等晶圓片上形成的多個光點,判斷該等光點的一計算數量是否符合對應該拍攝範圍的一預期數量,並確認相鄰之該等光點相鄰的一測量間距是否符合一規格間距。The working unit includes a laser module disposed on the carrier, and a detection module disposed on the carrier spaced apart from the laser module. The laser module has a light source suitable for emitting a linear light extending along the longitudinal direction to the wafers. The detection module has an image capturer for capturing a shooting range in which the linear light irradiates the wafers, and a processor informationally connected to the image capturer. The processor is used to determine whether a calculated number of the light spots meets an expected number corresponding to the shooting range based on a plurality of light spots formed on the wafers by the linear light in the shooting range, and to confirm whether a measured distance between adjacent light spots meets a specification distance.

本新型之功效在於:利用該偵測模組之該影像擷取器固定的該拍攝範圍,則應該對應特定片數之該等晶圓片的原則,即可妥善設定該預期數量。後續只要透過該支撐單元使該工作單元移動至相對於待確認之該晶圓盒的適當位置,在該光源照射該等晶圓片而形成該等光點時,以該影像擷取器進行拍攝,則該處理器所判斷之該等光點的該計算數量,即為該拍攝範圍中所實際放置之該等晶圓片的數量,故能比對該計算數量與該預期數量,同時確認代表相鄰之該等晶圓片之間距離的測量間距是否正確,藉此得知該拍攝範圍中的該等晶圓片是否正確放置。The effect of the present invention is that the expected quantity can be properly set by using the principle that the shooting range fixed by the image capturer of the detection module should correspond to a specific number of wafers. Subsequently, the working unit is moved to an appropriate position relative to the wafer box to be confirmed by the supporting unit, and when the light source irradiates the wafers to form the light spots, the image capture device is used to take pictures. The calculated number of the light spots determined by the processor is the number of the wafers actually placed in the shooting range. Therefore, the calculated number can be compared with the expected number, and at the same time, it can be confirmed whether the measured distance representing the distance between the adjacent wafers is correct, thereby knowing whether the wafers in the shooting range are correctly placed.

參閱圖2,為本新型晶圓辨識裝置之一實施例,本實施例適用於與一晶圓盒9相鄰設置,該晶圓盒9界定出一適用於供多片晶圓片80(見圖5)沿一縱方向H放置的內空間90。本實施例包含一支撐單元2、一安裝於該支撐單元2的工作單元3,及一與該支撐單元2相鄰間隔並適用於固定該晶圓盒9的固定單元4。具體而言,在本實施例中使用的該晶圓盒9為前開式出貨盒(Front Opening Shipping Box , FOSB),且是以透明材質所製成。Referring to FIG. 2 , an embodiment of the novel wafer identification device is shown. The embodiment is suitable for being arranged adjacent to a wafer box 9, and the wafer box 9 defines an inner space 90 suitable for placing a plurality of wafers 80 (see FIG. 5 ) along a longitudinal direction H. The embodiment comprises a supporting unit 2, a working unit 3 mounted on the supporting unit 2, and a fixing unit 4 adjacent to the supporting unit 2 and suitable for fixing the wafer box 9. Specifically, the wafer box 9 used in the embodiment is a front opening shipping box (FOSB) and is made of a transparent material.

同時參閱圖2與圖3,該支撐單元2包括一支架21、一可沿該縱方向H移動地設置於該支架21上的載台22、一安裝於該支架21且連接於該載台22的減速機構23,及一連接於該減速機構23的伺服馬達24。其中,該支架21的形式並無具體限制,概可依照產線環境,或者是固定各部件之需求而自由設計,只要得以穩定支撐並且具有足夠的結構強度即可。而該載台22能由該伺服馬達24提供動力,在該減速機構23控制速度而優化調整精度的情況下,在該支架21上調整沿該縱方向H的適當位置。Referring to FIG. 2 and FIG. 3 , the support unit 2 includes a support 21, a carrier 22 movably disposed on the support 21 along the longitudinal direction H, a deceleration mechanism 23 mounted on the support 21 and connected to the carrier 22, and a servo motor 24 connected to the deceleration mechanism 23. The form of the support 21 is not specifically limited and can be freely designed according to the production line environment or the need to fix various components, as long as it can be stably supported and has sufficient structural strength. The carrier 22 can be powered by the servo motor 24, and the appropriate position along the longitudinal direction H on the support 21 can be adjusted under the condition that the deceleration mechanism 23 controls the speed and optimizes the adjustment accuracy.

該工作單元3包括一設置於該載台22的雷射模組31,及一與該雷射模組31間隔設置於該載台22的偵測模組32。該雷射模組31具有一適用於對該等晶圓片80發出一沿該縱方向H延伸之線形光的光源311,及一安裝於該載台22上且能調整該線形光之照射方向的第一調整座312。該偵測模組32具有一用以拍攝該線形光照射於該等晶圓片80之一拍攝範圍的影像擷取器321、一安裝於該載台22上且能調整該影像擷取器321之拍攝方向的第二調整座322,及一資訊連接於該影像擷取器321的處理器323(標示於圖4)。其中,該影像擷取器321為一電荷耦合感光元件(CCD),該光源311產生的該線形光,較佳是配合該影像擷取器321所能拍攝的範圍,在定位的情況下照射4至6片所述晶圓片80。另外,該第一調整座312及該第二調整座322的具體形式亦不限制,以能自由調整該光源311及該影像擷取器321的方向為主。The working unit 3 includes a laser module 31 disposed on the carrier 22, and a detection module 32 disposed on the carrier 22 at a distance from the laser module 31. The laser module 31 has a light source 311 suitable for emitting a linear light extending along the longitudinal direction H to the wafers 80, and a first adjustment seat 312 mounted on the carrier 22 and capable of adjusting the irradiation direction of the linear light. The detection module 32 has an image capturer 321 for photographing a photographing range of the linear light irradiating the wafers 80, a second adjustment seat 322 mounted on the carrier 22 and capable of adjusting the photographing direction of the image capturer 321, and a processor 323 (shown in FIG. 4 ) informationally connected to the image capturer 321. The image capturer 321 is a charge coupled device (CCD), and the linear light generated by the light source 311 preferably matches the range that the image capturer 321 can capture, and irradiates 4 to 6 wafers 80 in a positioned state. In addition, the specific forms of the first adjustment seat 312 and the second adjustment seat 322 are not limited, and the directions of the light source 311 and the image capturer 321 can be freely adjusted.

參閱圖4並配合圖2,該處理器323具體而言為一可預先寫入邏輯,或者配合安裝一影像處理軟體,並且得以執行所需運算而輸出結果的計算晶片。該處理器323會接收該影像擷取器321所拍攝之圖像的資訊,透過影像辨識的方式得知該拍攝範圍之該線形光分別在該等晶圓片80上形成的多個光點之數量,判斷該等光點的一計算數量,也能得知相鄰之該等光點相鄰的一測量間距,以及該拍攝範圍中的每一該光點的一測量面積。Referring to FIG. 4 and FIG. 2 , the processor 323 is specifically a computing chip that can be pre-written with logic or installed with an image processing software, and can execute the required calculations and output the results. The processor 323 receives the information of the image captured by the image capturer 321, and obtains the number of multiple light spots formed by the linear light in the shooting range on the wafers 80 through image recognition, determines a calculated number of the light spots, and can also obtain a measurement distance between the adjacent light spots and a measurement area of each of the light spots in the shooting range.

參閱圖4至圖6並配合圖2與圖3,使用本實施例針對該晶圓盒9中擺放之所述晶圓片80進行檢測時,在該晶圓盒9穩定放置於該固定單元4的情況下,可預先透過該第一調整座312及該第二調整座322,調整該雷射模組31之該光源311及該偵測模組32之該影像擷取器321的方向。由於該晶圓盒9是以透明材質製成,於是該雷射模組31所發出的該線形光,得以穿透而直接照射該等晶圓片80。在此要先說明的是,在針對已製作完成之所述晶圓片80進行檢測確認的情況下,由於製作的結構面通常是向上擺放,為了避免製作的結構造成意外的反射,該光源311在執行檢測時,較佳是如圖4呈現,以採用由下而上呈傾斜的方向朝向該等晶圓片80之背面照射為原則。Referring to FIGS. 4 to 6 in conjunction with FIGS. 2 and 3 , when the present embodiment is used to detect the wafers 80 placed in the wafer box 9, the directions of the light source 311 of the laser module 31 and the image capturer 321 of the detection module 32 can be adjusted in advance through the first adjustment seat 312 and the second adjustment seat 322 when the wafer box 9 is stably placed on the fixing unit 4. Since the wafer box 9 is made of a transparent material, the linear light emitted by the laser module 31 can penetrate and directly illuminate the wafers 80. It should be noted here that when the wafer 80 that has been manufactured is inspected and confirmed, since the manufactured structure surface is usually placed upward, in order to avoid unexpected reflection caused by the manufactured structure, the light source 311 is preferably as shown in Figure 4 when performing the inspection, with the principle of irradiating from the bottom to the top in an inclined direction toward the back of the wafer 80.

接著,配合該影像擷取器321的拍攝範圍,若以單一畫面設定拍攝5片所述晶圓片80為例,則用來發出該線形光的該雷射模組31,以及負責解讀形成該等光點後之影像的該偵測模組32,就可以在相對位置固定的情況下,藉由該載台22能沿該縱方向H移動的功能,逐步移動而以每次5片的進度執行檢測作業。Next, in conjunction with the shooting range of the image capture device 321, if a single frame is set to shoot 5 wafers 80, for example, the laser module 31 used to emit the linear light and the detection module 32 responsible for interpreting the image formed by the light spots can be fixed in relative position and gradually move along the longitudinal direction H to perform the inspection operation at a rate of 5 wafers at a time through the function of the carrier 22 to move along the longitudinal direction H.

針對該影像擷取器321配合該光源311的照射而拍攝的每一個含有所述光點的畫面,該處理器323能判斷該等光點的該計算數量,也就是所述晶圓片80的數量是否符合對應該拍攝範圍的一預期數量(在本例中即為如圖6所呈現之5片)。確認該計算數量與該預期數量符合後,則概能判斷在該拍攝範圍中確實有5片所述晶圓片80,反之若數量不相符,則可直接得知數量的增多或減少。更進一步地,針對該等晶圓片80可能相互重疊放置的情況,考量到相互重疊的複數該等晶圓片80,共同反射該線形光所形成的光點理應有較大的面積,於是該處理器323還能偵測每一該光點的該測量面積是否在一預設之合理範圍內,藉此達成確保該等晶圓片80沒有”疊片”的目的。除此之外,在預先設定好兩片所述晶圓片80正常擺放情況所應有之一規格間距後,同樣採用影像辨識的方式,確認相鄰之該等光點相鄰的該測量間距是否符合該規格間距,即可檢測出是否有所述晶圓片80未確實水平放置而有”斜插”的情況。For each frame containing the light spots captured by the image capturer 321 in cooperation with the illumination of the light source 311, the processor 323 can determine whether the calculated number of the light spots, that is, the number of the wafers 80, meets an expected number corresponding to the shooting range (in this example, 5 wafers as shown in FIG. 6). After confirming that the calculated number matches the expected number, it can be generally determined that there are indeed 5 wafers 80 in the shooting range. On the contrary, if the number does not match, it can be directly known whether the number has increased or decreased. Furthermore, in view of the possibility that the wafers 80 may be placed overlapping each other, considering that the light spots formed by the multiple overlapping wafers 80 reflecting the linear light together should have a larger area, the processor 323 can also detect whether the measurement area of each light spot is within a preset reasonable range, thereby achieving the purpose of ensuring that the wafers 80 are not "overlapped". In addition, after presetting a specification spacing for the normal placement of the two wafers 80, the image recognition method is also used to confirm whether the measurement spacing of the adjacent light spots meets the specification spacing, so as to detect whether the wafer 80 is not placed horizontally but "slanted".

綜上所述,本新型晶圓辨識裝置之該實施例,該工作單元3之該雷射模組31及該偵測模組32能相互配合,利用影像辨識的方式判斷所述晶圓片80是否正確擺放,以及是否有疊片、斜插等等的異常放置情形,藉此針對所述晶圓片80放置於該晶圓盒9之情況進行專門檢測,確保後端製程正常運作,或者成品的穩定出貨。因此,確實能達成本新型之目的。In summary, in this embodiment of the novel wafer identification device, the laser module 31 and the detection module 32 of the working unit 3 can cooperate with each other to use image recognition to determine whether the wafer 80 is correctly placed, and whether there are abnormal placements such as overlapping, oblique insertion, etc., so as to perform special inspections on the placement of the wafer 80 in the wafer box 9 to ensure the normal operation of the back-end process or the stable shipment of the finished product. Therefore, the purpose of this novel device can be achieved.

惟以上所述者,僅為本新型之實施例而已,當不能以此限定本新型實施之範圍,凡是依本新型申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本新型專利涵蓋之範圍內。However, the above is only an example of the implementation of the present invention, and it cannot be used to limit the scope of the implementation of the present invention. All simple equivalent changes and modifications made according to the scope of the patent application of the present invention and the content of the patent specification are still within the scope of the present patent.

2:支撐單元 21:支架 22:載台 23:減速機構 24:伺服馬達 3:工作單元 31:雷射模組 311:光源 312:第一調整座 32:偵測模組 321:影像擷取器 322:第二調整座 323:處理器 4:固定單元 80:晶圓片 9:晶圓盒 90:內空間 H:縱方向 2: Support unit 21: Bracket 22: Carrier 23: Speed reduction mechanism 24: Servo motor 3: Working unit 31: Laser module 311: Light source 312: First adjustment seat 32: Detection module 321: Image capture device 322: Second adjustment seat 323: Processor 4: Fixing unit 80: Wafer 9: Wafer box 90: Inner space H: Vertical direction

本新型之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中: 圖1是一不完整的立體圖,說明多片晶圓放置於一晶圓盒的情況; 圖2是一立體圖,說明本新型晶圓辨識裝置之一實施例; 圖3是一局部放大的立體圖,說明該實施例之一支撐單元及一工作單元; 圖4是一示意圖,說明該工作單元之一雷射模組及一偵測模組運作的情況; 圖5是一示意圖,說明該雷射模組發出之一線形光照射至多片晶圓片的情況;及 圖6是一局部放大圖,配合圖5說明該線形光在該等晶圓片上形成5個光點的情況。 Other features and functions of the present invention will be clearly presented in the implementation method with reference to the drawings, in which: FIG. 1 is an incomplete three-dimensional diagram illustrating the situation where multiple wafers are placed in a wafer box; FIG. 2 is a three-dimensional diagram illustrating an implementation example of the present invention's wafer identification device; FIG. 3 is a partially enlarged three-dimensional diagram illustrating a support unit and a working unit of the implementation example; FIG. 4 is a schematic diagram illustrating the operation of a laser module and a detection module of the working unit; FIG. 5 is a schematic diagram illustrating the situation where a linear light emitted by the laser module is irradiated onto multiple wafers; and FIG. 6 is a partially enlarged diagram, which, in conjunction with FIG. 5, illustrates the situation where the linear light forms five light spots on the wafers.

2:支撐單元 2: Support unit

21:支架 21: Bracket

22:載台 22: Carrier

23:減速機構 23: Speed reduction mechanism

24:伺服馬達 24:Servo motor

3:工作單元 3: Work unit

31:雷射模組 31: Laser module

311:光源 311: Light source

32:偵測模組 32: Detection module

321:影像擷取器 321: Image Capture

4:固定單元 4: Fixed unit

9:晶圓盒 9: Wafer box

90:內空間 90: Inner space

H:縱方向 H: Longitudinal direction

Claims (7)

一種晶圓辨識裝置,適用於與一晶圓盒相鄰設置,該晶圓盒界定出一適用於供多片晶圓片沿一縱方向放置的內空間,該晶圓辨識裝置包含: 一支撐單元,包括一支架,及一可沿該縱方向移動地設置於該支架上的載台;及 一工作單元,安裝於該支撐單元,並包括一設置於該載台的雷射模組,及一與該雷射模組相間隔地設置於該載台的偵測模組,該雷射模組具有一適用於對該等晶圓片發出一沿該縱方向延伸之線形光的光源,該偵測模組具有一用以拍攝該線形光照射於該等晶圓片之一拍攝範圍的影像擷取器,及一資訊連接於該影像擷取器的處理器,該處理器用以根據該拍攝範圍之該線形光分別在該等晶圓片上形成的多個光點,判斷該等光點的一計算數量是否符合對應該拍攝範圍的一預期數量,並確認相鄰之該等光點相鄰的一測量間距是否符合一規格間距。 A wafer identification device is suitable for being arranged adjacent to a wafer box, the wafer box defining an inner space suitable for placing multiple wafers along a longitudinal direction, the wafer identification device comprising: A support unit, including a support, and a carrier movably arranged on the support along the longitudinal direction; and A working unit is installed on the supporting unit and includes a laser module disposed on the carrier and a detection module disposed on the carrier spaced apart from the laser module. The laser module has a light source suitable for emitting a linear light extending along the longitudinal direction to the wafers. The detection module has an image capturer for photographing a photographing range in which the linear light irradiates the wafers, and a processor connected to the image capturer. The processor is used to judge whether a calculated number of the light spots meets an expected number corresponding to the photographing range according to a plurality of light spots formed on the wafers by the linear light in the photographing range, and confirm whether a measured distance between the adjacent light spots meets a specified distance. 如請求項1所述的晶圓辨識裝置,其中,該支撐單元還包括一安裝於該支架且連接於該載台的減速機構,及一連接於該減速機構的伺服馬達。A wafer identification device as described in claim 1, wherein the support unit further includes a deceleration mechanism mounted on the bracket and connected to the carrier, and a servo motor connected to the deceleration mechanism. 如請求項1所述的晶圓辨識裝置,其中,該工作單元之該雷射模組還具有一安裝於該載台上且能調整該線形光之照射方向的第一調整座。The wafer identification device as described in claim 1, wherein the laser module of the working unit further has a first adjustment seat mounted on the carrier and capable of adjusting the irradiation direction of the linear light. 如請求項1所述的晶圓辨識裝置,其中,該工作單元之該偵測模組還具有一安裝於該載台上且能調整該影像擷取器之拍攝方向的第二調整座。The wafer identification device as described in claim 1, wherein the detection module of the working unit further has a second adjustment base mounted on the carrier and capable of adjusting the shooting direction of the image capture device. 如請求項1所述的晶圓辨識裝置,其中,該工作單元之該偵測模組的該影像擷取器為一電荷耦合感光元件。The wafer identification device as described in claim 1, wherein the image capturer of the detection module of the working unit is a charge-coupled photosensitive element. 如請求項1所述的晶圓辨識裝置,還包含一與該支撐單元相鄰間隔並適用於固定該晶圓盒的固定單元。The wafer identification device as described in claim 1 also includes a fixing unit spaced adjacent to the supporting unit and suitable for fixing the wafer box. 如請求項1所述的晶圓辨識裝置,該工作單元之該偵測模組的該處理器,還用以判斷該拍攝範圍中的每一該光點的一測量面積是否在一預設之合理範圍內。In the wafer identification device as described in claim 1, the processor of the detection module of the working unit is also used to determine whether a measurement area of each of the light spots in the shooting range is within a preset reasonable range.
TW113206028U 2024-06-07 2024-06-07 Wafer identification device TWM659479U (en)

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