TWI863241B - Drawing apparatus and drawing method - Google Patents

Abstract

On the stage 21 of the drawing apparatus 1, a substrate holding part 25 is provided to hold a substrate 9. The drawing head 41 irradiates modulated light onto the substrate 9. The scale part 52 is provided adjacent to the substrate holding part 25 in the main scanning direction on the stage 21. The calibration camera 53 captures images of the predetermined calibration pattern projected from the drawing head 41 onto the scale part 52 while the scale part 52 is positioned at the calibration position below the drawing head 41. In the drawing apparatus 1, the scale part 52 is positioned at the calibration position while the stage 21 is positioned at the loading/unloading position where the substrate 9 is loaded/unloaded to/from the substrate holding part 25. This allows the calibration of the drawing head 41 to be performed while suppressing the increase in tact time.

Description

Drawing device and drawing method

The present invention relates to a technique for irradiating a substrate with light and drawing a pattern. [Reference to related applications] This application claims priority to Japanese patent application JP2022-148502 filed on September 16, 2022, and all disclosures of Japanese patent application JP2022-148502 are incorporated herein.

In the past, a drawing device was used to draw patterns on a printed circuit board or a semiconductor substrate (hereinafter referred to as a "substrate"). The drawing device irradiates a photosensitive material formed on the substrate with modulated light and scans the irradiated area of the light, thereby directly drawing the pattern.

In such a drawing device, there is a problem that the irradiation position of the light from the drawing head on the substrate changes due to the increase in the temperature of the drawing head and the temperature change around the device as time passes from the start of drawing, thereby causing the position of the pattern drawn on the substrate to deviate. Therefore, in Japanese Patent Publication No. 2014-197136 (Document 1), a calibration method is proposed, which is to obtain the change data of the irradiation position caused by the temperature change in advance, and correct the irradiation position in accordance with the measured temperature. However, in the indirect calibration using temperature as an indicator, there is a situation where the calibration precision is insufficient.

On the other hand, there is also a known calibration method, which is different from the case in which the change of the irradiation position is indirectly obtained from the temperature as in the literature 1, and the change of the irradiation position is directly obtained by observing the light from the drawing head with a camera. In this case, the stage on which the substrate is mounted is moved and the camera is placed directly below the lead of the drawing head to perform calibration. After the calibration is completed, the stage is moved directly below the lead of the drawing head to draw the substrate. Therefore, a long time is required for one calibration. Therefore, from the perspective of shortening the tact time (i.e., the time spent on the drawing operation for a substrate, also called the cycle time), it is difficult to perform calibration every time the drawing of a substrate is completed. Instead, calibration is performed every time a predetermined drawing time has passed, or every time the drawing of a predetermined number of substrates or more is completed.

In addition, in the above-described drawing device, it is desired to further improve the drawing position accuracy, which requires increasing the frequency of calibration and suppressing the reduction of productivity. Therefore, it is required to calibrate the drawing head while suppressing the increase of the production time.

The present invention is directed to a drawing device for irradiating a substrate with light and drawing a pattern, and aims to calibrate a drawing head while suppressing an increase in the production time.

The first aspect of the present invention is a drawing device for irradiating light onto a substrate and drawing a pattern, and comprises: a stage provided with a substrate holding portion for holding the substrate; a drawing head for irradiating modulated light onto the substrate; a main scanning mechanism for relatively moving the stage in a main scanning direction parallel to the upper surface of the substrate relative to the drawing head; a scale portion provided on the stage adjacent to the substrate holding portion in the main scanning direction; and a calibration camera. A camera is used to photograph a predetermined calibration pattern irradiated from the drawing head to the scale portion when the scale portion is at a calibration position below the drawing head; a correction information acquisition unit is used to obtain correction information based on an inspection image, wherein the inspection image includes the scale portion and the calibration pattern acquired by the calibration camera, and the correction information is used to correct the irradiation position of the light from the drawing head; and a drawing control unit is used to control the drawing head and the main scanning mechanism based on the drawing data and the correction information, thereby causing the drawing head to perform drawing on the substrate while moving the substrate relatively to the drawing head in the main scanning direction. When the stage is located at the carrying-in and carrying-out position, the scale portion is located at the calibration position. The carrying-in and carrying-out position is a position for carrying the substrate in and out relative to the substrate holding portion.

According to the present invention, the drawing head can be calibrated while suppressing the increase of the production time.

The second aspect of the present invention is a drawing device as described in the first aspect, wherein the drawing device further comprises: an alignment camera for photographing the alignment mark on the substrate; and an alignment information acquisition unit for obtaining alignment information based on the image of the alignment mark acquired by the alignment camera, and the alignment information is used to correct the relative position of the substrate with respect to the drawing head. The alignment camera is located on the side of the stage opposite to the substrate holding portion across the drawing head in the main scanning direction, and the stage is located at the carrying-in and carrying-out position.

The third aspect of the present invention is the drawing device as described in the second aspect, wherein the drawing device further comprises: a support portion for supporting the drawing head above the table. The alignment camera is also supported by the support portion.

The fourth aspect of the present invention is a drawing device as described in the first aspect (or any aspect from the first aspect to the third aspect), wherein the scale portion is a translucent scale member disposed on the upper surface of the table. The calibration camera is mounted on the table below the translucent scale member to photograph the calibration pattern that has passed through the translucent scale member. The upper end of the calibration camera is subjected to low reflection processing.

The fifth aspect of the present invention is a drawing device as described in the first aspect (or any aspect from the first aspect to the fourth aspect), wherein the position of the calibration pattern on the scale portion in the main scanning direction can be changed by the drawing head when the stage is stationary.

The sixth aspect of the present invention is a drawing device as described in the first aspect (or any aspect from the first aspect to the fifth aspect), wherein the drawing head comprises: a plurality of light sources emitting light of different wavelengths. When drawing the substrate, two or more of the plurality of light sources are used. When irradiating the calibration pattern toward the scale portion, only one of the plurality of light sources is used.

The seventh aspect of the present invention is a drawing device as described in the first aspect (or any aspect from the first aspect to the sixth aspect), wherein the plurality of drawing heads including the drawing heads and used to irradiate the modulated light to the substrate are arranged in an arrangement direction parallel to the upper surface of the substrate and inclined relative to the main scanning direction. The calibration camera moves in the arrangement direction while sequentially photographing the plurality of calibration patterns irradiated to the scale portion from the plurality of drawing heads when the scale portion is at the calibration position.

The eighth aspect of the present invention is a drawing device as described in any one of the first to seventh aspects, wherein the time required for obtaining the inspection image by the calibration camera is shorter than the time required for moving a substrate out of the substrate holding portion and moving a new substrate into the substrate holding portion.

The ninth aspect of the present invention is a drawing device as described in any one of the first to seventh aspects (or any one of the first to eighth aspects), wherein the inspection image obtained by the calibration camera is performed each time a substrate is moved into the substrate holding portion.

The present invention also focuses on a drawing method for irradiating light onto a substrate and drawing a pattern. The tenth aspect of the present invention is a drawing method for irradiating light onto a substrate and drawing a pattern, and has the following steps: Step a is to photograph a predetermined calibration pattern of the scale portion that has been irradiated from the drawing head to the calibration position located below the drawing head, with a stage provided with a substrate holding portion and a scale portion located at a carry-in/carry-out position, wherein the substrate holding portion is used to hold the substrate, the scale portion is adjacent to the substrate holding portion in a main scanning direction parallel to the upper surface of the substrate, and the carry-in/carry-out position is used to carry out The process comprises: a) checking the position of the substrate being moved in and out relative to the substrate holding portion; b) obtaining correction information based on an inspection image, wherein the inspection image includes the scale portion and the calibration pattern obtained in the process a, and the correction information is used to correct the irradiation position of the light from the scanning head; and c) irradiating the substrate with modulated light and scanning the substrate based on the scanning data and the correction information after the scanning head is relatively moved relative to the scanning head in the main scanning direction.

The above objects and other objects, features, aspects and advantages will become more apparent from the following detailed description of the present invention with reference to the accompanying drawings.

FIG. 1 is a three-dimensional diagram showing a drawing device 1 of one embodiment of the present invention. The drawing device 1 is a direct drawing device, which is used to irradiate the photosensitive material on the substrate 9 with a slightly beamed light that has been spatially modulated and scan the irradiated area of the light on the substrate 9, thereby drawing a pattern. In FIG. 1, three directions orthogonal to each other are shown by arrows as the X direction, the Y direction, and the Z direction. In the example shown in FIG. 1, the X direction and the Y direction are horizontal directions perpendicular to each other, and the Z direction is a vertical direction (i.e., the up-down direction). The same is true in other figures.

The substrate 9 is, for example, a printed circuit board in a substantially rectangular flat plate shape. A resist film formed of a photosensitive material is provided on a copper layer on the main surface on the +Z side of the substrate 9 (hereinafter also referred to as "upper surface 91"). In the drawing device 1, a circuit pattern is drawn (i.e., formed) on the resist film of the substrate 9. In addition, the type and shape of the substrate 9 can also be changed in various ways.

As shown in Fig. 1, the drawing device 1 includes a stage 21, a stage moving mechanism 22, an alignment unit 3, a drawing unit 4, a calibration unit 5, and a control unit 10. The control unit 10 controls the stage moving mechanism 22, the alignment unit 3, the drawing unit 4, the calibration unit 5, and the like.

The stage 21 is a roughly rectangular flat plate-shaped member, which is arranged below the alignment section 3 and the drawing section 4 (i.e., the -Z side). The stage 21 is equipped with a substrate holding section 25, which holds the substrate 9 in a horizontal state from the bottom. The substrate holding section 25 is, for example, a vacuum chuck, which is used to absorb and hold the lower surface of the substrate 9. The substrate holding section 25 may also have a structure other than a vacuum chuck, for example, it may also be a mechanical chuck. The upper surface 91 of the substrate 9 placed on the substrate holding section 25 is slightly perpendicular to the Z direction and slightly parallel to the X direction and the Y direction.

The stage moving mechanism 22 is a moving mechanism for relatively moving the stage 21 in the horizontal direction (i.e., a direction slightly parallel to the upper surface 91 of the substrate 9) relative to the alignment portion 3 and the drawing portion 4. The stage moving mechanism 22 has a first moving mechanism 23 and a second moving mechanism 24. The second moving mechanism 24 moves the stage 21 linearly in the X direction along the guide rail. The first moving mechanism 23 moves the stage 21 linearly in the Y direction along the guide rail together with the second moving mechanism 24. The driving source of the first moving mechanism 23 and the second moving mechanism 24 is, for example, a linear servo motor or a structure in which a motor is installed on a ball screw. The structures of the first moving mechanism 23 and the second moving mechanism 24 can also be modified in various ways.

The drawing device 1 may also be provided with a stage rotating mechanism that rotates the stage 21 around a rotation axis extending in the Z direction. In addition, the drawing device 1 may also be provided with a stage lifting mechanism that moves the stage 21 in the Z direction. For example, a servo motor may be used as the stage rotating mechanism. For example, a linear servo motor may be used as the stage lifting mechanism. The structures of the stage rotating mechanism and the stage lifting mechanism may also be modified in various ways.

The alignment section 3 includes: a plurality of (two in the example shown in FIG. 1 ) alignment cameras 31 arranged in the X direction. Each alignment camera 31 is supported above the stage 21 and the stage moving mechanism 22 by a support section 40 provided across the stage 21 and the stage moving mechanism 22. The support section 40 is a single member provided at one position in the Y direction. In the example shown in FIG. 1 , the support section 40 is a door-shaped member (so-called gantry) and extends across the stage 21 and the stage moving mechanism 22.

In the example shown in FIG. 1 , two alignment cameras 31 are mounted on the side surface of the +Y side of the support portion 40. For example, one of the two alignment cameras 31 is fixed to the support portion 40, and the other alignment camera 31 can be moved in the X direction on the support portion 40. In this way, the distance between the two alignment cameras 31 in the X direction can be changed. In addition, the number of alignment cameras 31 of the alignment portion 3 may be one, or may be three or more.

Each alignment camera 31 is provided with a photographing element and an optical system which are not shown in the figure. Each alignment camera 31 is, for example, an area camera for obtaining a two-dimensional image. In each alignment camera 31, the reflected light of the illumination light which is guided to the upper surface 91 of the substrate 9 from the illumination light source which is not shown in the figure is guided to the photographing element via the optical system. The photographing element receives the reflected light from the upper surface 91 of the substrate 9, thereby obtaining an image of a roughly rectangular photographing area. The alignment camera 31 photographs an alignment mark (not shown in the figure) which is pre-set on the upper surface 91 of the substrate 9. As the illumination light source described above, various light sources such as LED (Light Emitting Diode) can be used. In addition, each alignment camera 31 may also be a line camera or other types of cameras.

The image obtained by the alignment camera 31 and including the alignment mark (hereinafter also referred to as "alignment image") is transmitted to the control unit 10 shown in Fig. 1. In the control unit 10, the substrate 9 is aligned based on the alignment image (i.e., the relative position of the substrate 9 with respect to the later described drawing head 41 is corrected).

The drawing section 4 includes: a plurality of (six in the example shown in FIG. 1 ) drawing heads 41 arranged in the X direction. The plurality of drawing heads 41 have a substantially identical structure. Each drawing head 41 includes: a spatial light modulator that irradiates modulated (i.e., spatially modulated) light downward. Each drawing head 41 is supported above the stage 21 and the stage moving mechanism 22 by the supporting portion 40 described above. In the example shown in FIG. 1 , the six drawing heads 41 are mounted on the side surface of the -Y side of the supporting portion 40. In other words, the six drawing heads 41 are arranged on the side opposite to the two alignment cameras 31 described above through the supporting portion 40 in the Y direction. In other words, the two alignment cameras 31 are located on the side of the stage 21 opposite to the substrate holding portion 25 with six drawing heads 41 therebetween in the Y direction, wherein the stage 21 is located at the loading and unloading position described later.

In the example shown in FIG. 1 , the six drawing heads 41 are arranged in a substantially straight line substantially parallel to the X direction. In addition, the distances in the Z direction between the six drawing heads 41 and the upper surface 91 of the substrate 9 on the stage 21 are substantially the same. In other words, the arrangement direction of the six drawing heads 41 is substantially parallel to the upper surface 91 of the substrate 9 and substantially perpendicular to the Y direction. In other words, the positions of the six drawing heads 41 in the Y direction and the Z direction are substantially the same.

In addition, the arrangement direction of the drawing heads 41 described above only needs to be a direction inclined relative to the Y direction, and does not necessarily need to be parallel to the X direction. In the drawing section 4, the plurality of drawing heads 41 do not necessarily need to be arranged on a straight line, and can also be arranged in a staggered manner, for example. In addition, in the drawing section 4, the number of drawing heads 41 can be one or more than two.

In the drawing device 1, the pattern drawing on the substrate 9 is performed by the so-called multi-pass method. Specifically, while the modulated light is irradiated from the plurality of drawing heads 41 of the drawing unit 4 onto the upper surface 91 of the substrate 9, the substrate 9 is moved in the Y direction and passes under the drawing heads 41 by the first moving mechanism 23 of the stage moving mechanism 22. In this way, the irradiation area of the light from the plurality of drawing heads 41 is scanned on the substrate 9 in the Y direction, thereby drawing the substrate 9. Then, the substrate 9 is step-shifted in the X direction to a predetermined distance by the second moving mechanism 24. Next, the first moving mechanism 23 is again used to move the substrate 9 in the Y direction, and the drawing head 41 irradiates light toward the substrate 9 in parallel with the movement of the substrate 9 in the Y direction, thereby drawing the substrate 9. In the drawing device 1, the substrate 9 moving in the Y direction is alternately irradiated with light and the substrate 9 is step-moved in the X direction, thereby drawing a pattern on the substrate 9.

In the following description, the Y direction is also referred to as the "main scanning direction", and the X direction is also referred to as the "sub-scanning direction". The main scanning direction and the sub-scanning direction are directions that are substantially parallel to the upper surface 91 of the substrate 9. In the stage moving mechanism 22, the first moving mechanism 23 is a main scanning mechanism for moving the stage 21 relatively to the drawing head 41 in the main scanning direction. In addition, the second moving mechanism 24 is a sub-scanning mechanism for moving the stage 21 relatively to the drawing head 41 in the sub-scanning direction. In addition, in the drawing device 1, the substrate 9 can also be drawn by a single pass method (also called a one-way method); the one-way method is: the substrate 9 is relatively moved only once in the Y direction relative to the drawing head 41, thereby completing the drawing of the pattern on the substrate 9. In this case, when drawing the pattern, the second moving mechanism 24 does not perform a secondary scan of the substrate 9 (i.e., a step movement in the X direction).

The calibration unit 5 is provided on the stage 21 at the +Y side of the substrate holding unit 25. The calibration unit 5 is used for calibration of the image pickup head 41 (that is, measurement and correction of the irradiation position of the light from the image pickup head 41).

Fig. 2 is an enlarged top view showing the vicinity of the calibration section 5 of the drawing device 1. Fig. 3 is a front view showing the structure of the calibration section 5 and the drawing head 41. Fig. 3 shows a state where the drawing head 41 is located directly above the calibration section 5. Fig. 3 shows the internal structure of the stage 21 and the internal structure of one drawing head 41. The structure of the other drawing heads 41 is roughly the same as that of the one drawing head 41.

As shown in FIG3 , the drawing head 41 includes a light source unit 42, an illumination optical system 43, a spatial light modulator 44 (hereinafter also referred to as “light modulator 44”), and a projection optical system 45. Light emitted from the light source unit 42 is guided to the light modulator 44 by the illumination optical system 43 and modulated in the light modulator 44 before being guided to the bottom of the drawing head 41 (i.e., in the −Z direction) by the projection optical system 45.

The light source section 42 has: a plurality of light sources that emit light of different wavelengths. In the example shown in FIG. 3 , the light source section 42 has three light sources 421 to 423. As the light sources 421 to 423, various light sources such as LD (Laser Diode) can be used. When drawing a pattern on the substrate 9, two or more light sources such as the light sources 421 to 423 are used in accordance with the type of photosensitive material on the substrate 9. In addition, the number of light sources provided in the light source section 42 may be one or two, or may be four or more. The light source provided in the light source section 42 is not limited to LD, and various types of light sources can be used.

The illumination optical system 43 and the projection optical system 45 each include a plurality of optical elements such as lenses not shown. As the light modulator 44, various light modulators such as DMD (Digital Micro Mirror Device) or GLV (Grating Light Valve) (registered trademark of Silicon Light Machines, Sunnyvale, California) can be used. The light modulator 44 is not limited to the examples described above, and various types of light modulators can be used.

The calibration section 5 includes a photographing section 51 and a scale section 52. The scale section 52 is a slightly flat member, which is disposed on the table 21. The scale section 52 is arranged on the upper surface of the table 21, and is adjacent to (i.e., closely disposed) the +Y side of the substrate holding section 25. In the example shown in FIG. 2 , the scale section 52 is a slightly rectangular band-shaped member extending slightly parallel to the X direction, and is light-transmissive. A large number of scales are provided on the main surface on the +Z side of the scale section 52, and the large number of scales are used to display the position in the X direction on the main surface on the +Z side of the scale section 52. In other words, the scale section 52 is a light-transmissive scale member, such as a slightly transparent glass scale. The scale of the scale section 52 is, for example, a cross pattern or a pattern of other shapes. In addition, the scale portion 52 may also be a translucent component.

The camera unit 51 is installed inside the table 21 below the scale unit 52. The camera unit 51 includes a calibration camera 53 and a camera moving mechanism 54. The calibration camera 53 is arranged directly below the scale unit 52 so as to face upward. The calibration camera 53 is, for example, a digital camera and has a CCD (Charge Coupled Device) or a CMOS (Complementary Metal-Oxide Semiconductor) as a camera element. In addition, the type and performance of the calibration camera 53 can also be appropriately set.

The upper end of the calibration camera 53 (i.e., the portion facing the drawing head 41 via the scale portion 52) is subjected to low reflection processing. Specifically, for example, an anti-reflection film for reducing reflectivity is attached to the frame of the objective lens of the calibration camera 53. This can prevent the reflected light from the calibration camera 53 from being accidentally photographed when shooting with the calibration camera 31. In addition, the low reflection processing described above can also be performed by various structures and methods other than the anti-reflection film.

The camera moving mechanism 54 is a moving mechanism for linearly moving the calibration camera 53 along the guide rail in the X direction inside the stage 21. The driving source of the camera moving mechanism 54 is, for example, a linear servo motor or a driving source in which a motor is mounted on a ball screw. The structure of the camera moving mechanism 54 can also be modified in various ways.

In the drawing device 1, when a plurality of drawing heads 41 are located directly above the scale portion 52 of the calibration portion 5, the calibration camera 53 is moved by the camera moving mechanism 54 and arranged directly below one drawing head 41 that is the calibration object. A predetermined calibration pattern (i.e., a pattern used for calibration of the drawing head 41) is emitted from the one drawing head 41 toward the scale portion 52. The calibration pattern is, for example, a cross-shaped pattern. The shape of the calibration pattern can be changed in various ways as long as it is a shape that can calculate the center of gravity position.

The calibration camera 53 photographs the irradiation area of the light from the drawing head 41 on the scale portion 52 (i.e., the calibration pattern) and the scale formed in advance on the scale portion 52 from below through the scale portion 52. In other words, the calibration camera 53 photographs the calibration pattern and the scale passing through the scale portion 52. The image obtained by the calibration camera 53 (hereinafter also referred to as the "inspection image") is transmitted to the control unit 10 shown in FIG. 1. In the control unit 10, the calibration of one drawing head 41 described above is performed based on the inspection pattern. When calibrating another drawing head 41, the calibration camera 53 is moved in the X direction by the camera moving mechanism 54 and is positioned directly below the other drawing head 41, and then the calibration is performed in the same procedure.

FIG4 is a diagram showing the structure of a computer 100 serving as the control unit 10. The computer 100 is a general computer having a processor 101, a memory 102, an input/output unit 103, and a bus 104. The bus 104 is a signal circuit for connecting the processor 101, the memory 102, and the input/output unit 103. The memory 102 stores programs and various information. The processor 101 executes various processing (e.g., numerical calculation, image processing) while using the memory 102, etc., in accordance with the program, etc. stored in the memory 102. The input/output unit 103 includes a keyboard 105 and a mouse 106 for receiving input from an operator, and a display 107 for displaying output from the processor 101. In addition, the control unit 10 may be a programmable logic controller (PLC) or a circuit board, or a combination of these components and one or more computers.

FIG5 is a block diagram showing the functions of the control unit 10 realized by the computer 100. FIG5 also shows the components other than the control unit 10. The control unit 10 includes a memory unit 111, a shooting control unit 112, a position detection unit 113, a correction information acquisition unit 114, an alignment information acquisition unit 115, and a drawing control unit 116. The memory unit 111 is mainly realized by the memory 102, and pre-stores various information such as data of a predetermined pattern to be drawn on the substrate 9 (i.e., drawing data). The shooting control unit 112, the position detection unit 113, the correction information acquisition unit 114, the alignment information acquisition unit 115, and the drawing control unit 116 are mainly realized by the processor 101.

The imaging control unit 112 controls the drawing head 41 and the imaging unit 51, thereby irradiating the calibration pattern pre-stored in the memory unit 111 from the drawing head 41 to the scale unit 52 (see FIGS. 2 and 3 ), and causing the imaging unit 51 to obtain the calibration inspection image described above. The inspection image is transmitted from the imaging unit 51 to the control unit 10 and stored in the memory unit 111.

The position detection unit 113 obtains the irradiation position of the light from the drawing head 41 on the scale portion 52 (hereinafter also referred to as "measured position") based on the inspection image including the scale portion 52 and the calibration pattern. As described above, since the scale portion 52 is fixed on the stage 21, the relative position of the scale portion 52 with respect to the substrate holding portion 25 is also fixed. Therefore, by detecting the irradiation position of the calibration pattern on the scale portion 52 described above, the relative position of the irradiation position of the light irradiated from the drawing head 41 with respect to the substrate holding portion 25 is obtained.

The correction information acquisition unit 114 obtains correction information based on the measured position obtained by the position detection unit 113, and the correction information is used to correct the irradiation position of the light from the drawing head 41 on the substrate 9. Specifically, the measured position is compared with the designed irradiation position of the calibration pattern irradiated from the drawing head 41 on the scale portion 52 (hereinafter also referred to as the "design position"), and the distance between the measured position and the design position in the X direction and the Y direction (that is, the deviation from the design position) is obtained. The correction information acquisition unit 114 obtains correction information based on the deviation, and the correction information is corrected in a manner that the irradiation position of the light from the drawing head 41 is consistent with the design position. The correction information is, for example, information for correcting the drawing data of the pattern drawn on the substrate 9 in accordance with the deviation. Alternatively, the correction information may also be information for correcting the movement of the stage moving mechanism 22 with respect to the substrate 9 when drawing a pattern on the substrate 9.

The alignment information acquisition unit 115 acquires alignment information based on the image of the alignment mark described above acquired by the alignment camera 31 of the alignment unit 3 (hereinafter also referred to as the "alignment image"), and the alignment information is used for the alignment of the substrate 9 (i.e., the correction of the relative position of the substrate 9 with respect to the drawing head 41). Specifically, the position of the substrate 9 on the substrate holding unit 25 is obtained based on the position of the alignment mark in the alignment image, and the deviation of the substrate 9 on the substrate holding unit 25 from the designed position is obtained. In other words, the deviation of the relative position of the substrate 9 with respect to the drawing head 41 from the designed position is obtained. The alignment information acquisition unit 115 obtains alignment information based on the deviation, and the alignment information is corrected in such a way that the relative position of the substrate 9 with respect to the drawing head 41 is consistent with the designed position. The alignment information is, for example, information for correcting the movement of the stage moving mechanism 22 with respect to the substrate 9 when drawing a pattern on the substrate 9. Alternatively, the alignment information may also be information for correcting the drawing data of the pattern drawn on the substrate 9 in accordance with the deviation amount described above.

The drawing control unit 116 controls the drawing head 41 and the stage moving mechanism 22 based on the drawing data stored in the memory unit 111, the correction information obtained by the correction information acquisition unit 114, and the alignment information obtained by the alignment information acquisition unit 115, thereby causing the drawing head 41 to draw on the substrate 9 while moving the substrate 9 relatively with respect to the drawing head 41.

Next, the drawing of a pattern by the drawing device 1 is described with reference to FIG. 6 and FIG. 7A to FIG. 7E. FIG. 6 is a diagram showing an example of the process of drawing a pattern on the substrate 9. FIG. 7A to FIG. 7E are schematic front views of the main components of the drawing device 1 to illustrate the operation of the drawing device 1. FIG. 7A to FIG. 7E also show the internal structure of the table 21 with solid lines.

First, when the substrate 9 is to be drawn, the table 21 is located at the position shown in FIG. 7A. In the following description, the position of the table 21 in the Y direction shown in FIG. 7A is also referred to as the "carry-in and carry-out position". In the drawing device 1, when the table 21 is located at the carry-in and carry-out position, the substrate 9 that has been drawn in the drawing device 1 is carried out from the table 21 to the outside of the drawing device 1 as shown by the two-point chain. In addition, a new substrate 9 (that is, a substrate 9 that is predetermined for drawing by the drawing device 1) is brought into the drawing device 1 and is held on the table 21 of the substrate holding portion 25 (step S11). That is, in step S11, when the table 21 is located at the carry-in and carry-out position, the substrate 9 is carried in and out of the substrate holding portion 25. The substrate 9 is carried in and out by, for example, a carrying-in and carrying-out device (not shown) or by manual operation of an operator. When the stage 21 is located at the carrying-in and carrying-out position, the substrate holding portion 25 is located on the -Y side of the plurality of drawing heads 41 and the plurality of alignment cameras 31 of the drawing portion 4 mounted on the support portion 40 (see FIG. 1 ).

In the state shown in FIG. 7A , the scale portion 52 of the calibration portion 5 is located directly below the drawing head 41. In the following description, the position of the scale portion 52 in the Y direction shown in FIG. 7A is also referred to as the "calibration position." In the drawing device 1, when the stage 21 is located at the loading and unloading position and the scale portion 52 is located at the calibration position, the calibration of the plurality of drawing heads 41 is performed in parallel with the loading and unloading of the substrate 9 in step S11.

Specifically, the calibration camera 53 is moved by the camera moving mechanism 54 (see FIG. 2 and FIG. 3 ) and arranged directly below a drawing head 41 that is a calibration object. Then, the control unit 10 controls the light source unit 42 and the light modulator 44 (see FIG. 3 ) of the drawing head 41, so that the calibration pattern described above is irradiated from the drawing head 41 to the scale portion 52. In the light source unit 42, when irradiating the calibration pattern, only one light source predetermined among the light sources 421 to 423 described above (see FIG. 3 ) is used. In this way, the calibration pattern on the scale portion 52 is formed by light of a single wavelength.

The calibration camera 53 captures the calibration pattern and the scale of the scale 52 irradiated at the calibration position to obtain a test image. The obtained test image is transmitted to the control unit 10 and stored in the memory unit 111 (see FIG. 5 ).

When acquiring the inspection image, there may be a case where the calibration pattern deviates greatly in the Y direction and leaves the field of view of the calibration camera 53. In this case, the Y direction position of the calibration pattern on the scale portion 52 is corrected so that the calibration pattern converges within the field of view of the calibration camera 53, and then the inspection image is acquired. The correction of the Y direction position of the calibration pattern is performed by the drawing head 41 when the stage 21 is stationary (i.e., the stage 21 does not need to be moved in the Y direction).

Specifically, for example, when the memory unit 111 stores data of a plurality of calibration patterns at different positions in the Y direction and the position of the calibration pattern on the scale unit 52 is deviated to the +Y side, the data of the calibration pattern located further to the -Y side than the current data is exchanged with the current data. Then, the drawing head 41 is controlled based on the exchanged data, whereby the position of the calibration pattern on the scale unit 52 is moved to the -Y side.

Thus, since the calibration pattern can be properly photographed without moving the stage 21 (that is, without moving the scale portion 52), the time required for calibration of the drawing head 41 can be shortened. In addition, as described above, since the calibration of the drawing head 41 is performed in parallel with the loading and unloading of the substrate 9, it is prevented that the loading and unloading of the substrate 9 is adversely affected by the movement of the stage 21 (for example, the interruption of the loading and unloading operation during the movement of the stage 21). In addition, the position change of the calibration pattern by the drawing head 41 is not limited to the method described above, and can also be performed by other methods.

Next, the calibration camera 53 is moved in the X direction by the camera moving mechanism 54 and arranged directly below the next drawing head 41, which is adjacent to the drawing head 41 that has completed the inspection image acquisition in the X direction. Next, as described above, the calibration pattern irradiated from the next drawing head 41 to the scale portion 52 is photographed, and the inspection image of the next drawing head 41 is acquired. In the drawing device 1, the inspection image acquired by the calibration camera 53 is sequentially performed for all the drawing heads 41 of the drawing unit 4 (step S12). In other words, the calibration camera 53 moves in the X direction (i.e., the arrangement direction of the plurality of drawing heads 41) while sequentially photographing the plurality of calibration patterns irradiated from the plurality of drawing heads 41 to the scale portion 52.

In the drawing device 1, the time required for step S12 (i.e., the time required for obtaining all the inspection images of the plurality of drawing heads 41) is preferably shorter than the time required for carrying out one substrate 9 from the substrate holding portion 25 and carrying a new substrate 9 into the substrate holding portion 25 in step S11. In addition, in the drawing device 1, when obtaining the inspection image of one drawing head 41, the irradiation of the calibration pattern from the other drawing heads 41 may be stopped, and the calibration pattern may be irradiated to the scale portion 52 from the other drawing heads 41.

In the drawing device 1, when a check image of a drawing head 41 is obtained, the position detection unit 113 (see FIG. 5) obtains the irradiation position of the light from the drawing head 41 on the scale unit 52 (i.e., the measured position of the calibration pattern) based on the check image. Then, the correction information acquisition unit 114 (see FIG. 5) obtains the correction information related to the irradiation position of the light from the one drawing head 41 described above based on the measured position of the calibration pattern (step S13). In this way, it is preferable to perform the acquisition of the check images of a plurality of drawing heads 41 and the acquisition of the correction information based on the check images in parallel in the drawing device 1.

When the loading and unloading of the substrate 9 (step S11) and the acquisition of the inspection images for all the drawing heads 41 (step S12) are completed, the stage 21 is moved in the +Y direction by the first moving mechanism 23 of the stage moving mechanism 22. The movement of the stage 21 in the +Y direction is started, for example, before the correction information described above is acquired for all the drawing heads 41 (that is, before the completion of step S13). In this case, step S13 is also continuously performed during the movement of the substrate 9. In addition, the movement of step S21 may also be started after the completion of step S13.

The stage 21 moves in the +Y direction, passes under the alignment camera 31 as shown in FIG. 7B , and stops after moving to the standby position shown in FIG. 7C . As shown in FIG. 7B , when the stage 21 passes under the alignment camera 31, the alignment mark (not shown) of the substrate 9 pre-set on the substrate holding portion 25 is photographed by the alignment camera 31. When photographing the alignment mark, the illumination light source described above of the alignment portion 3 irradiates a pulsed illumination light (i.e., a flash) toward the photographing area of the alignment camera 31. In this way, the alignment mark on the moving substrate 9 is photographed with high precision. As described above, in the calibration section 5 passing below the alignment camera 31 , since low-reflection processing is applied to the upper end of the alignment camera 53 , the illumination light described above is suppressed or prevented from being reflected by the alignment camera 53 and entering the alignment camera 31 .

The image (i.e., alignment image) acquired by the alignment camera 31 and including the alignment mark is transmitted to the control unit 10 and stored in the memory unit 111 (see FIG. 5 ). In the alignment information acquisition unit 115, alignment information is obtained based on the alignment image. Next, the drawing control unit 116 performs alignment processing of the substrate 9 based on the alignment information (step S14). In the alignment processing, in order to make the position of the substrate 9 consistent with the predetermined design position, for example, the stage 21 is shifted (i.e., moved a small distance) and rotated in the X direction and the Y direction, or the drawing data of the pattern drawn on the substrate 9 is corrected.

When the alignment process described above is completed, the stage 21 located at the standby position starts to move in the -Y direction. In the calibration section 5, before the stage 21 starts to move in the -Y direction, the calibration camera 53 moves in the X direction and retreats from directly below the scale section 52 to a retreat position located on the +X side or the -X side. That is, the retreat position is located on the +X side or the -X side of the position where the scale section 52 is provided in the stage 21. In this way, it is possible to suppress or prevent the high-intensity light used for drawing the pattern from entering the calibration camera 53.

As shown in FIG. 7D , in the drawing device 1, the substrate 9 held by the substrate holding portion 25 passes under the drawing head 41. Next, the drawing control portion 116 (see FIG. 5 ) controls the drawing head 41 and the stage moving mechanism 22 based on the drawing data and correction information described above, thereby irradiating the substrate 9 on the stage 21 moving in the Y direction under the drawing head 41 with modulated light and drawing a pattern (step S15).

In the present embodiment, as described above, since the pattern is drawn on the substrate 9 in a multi-pass manner, the substrate 9 reciprocating in the Y direction below the drawing head 41 is irradiated with modulated light from the drawing head 41 to draw the pattern. In addition, it is preferable that two or more light sources of the three light sources 421 to 423 (see FIG. 3 ) of the light source unit 42 are used in each drawing head 41 when drawing the pattern on the substrate 9. In this way, it is possible to draw a suitable pattern in accordance with the type of photosensitive material on the substrate 9.

When the pattern drawing on the substrate 9 is completed, the stage 21 moves to the loading and unloading position shown in FIG. 7E (step S16). At this time, the calibration camera 53 moves from the retreat position in the X direction and returns to directly below the scale portion 52. Thus, the pattern drawing on one substrate 9 is completed.

In the actual drawing device 1, the process returns from step S16 to step S11, and steps S11 to S16 are repeated to sequentially draw patterns on a plurality of substrates 9. In this way, in the drawing device 1, the calibration camera 53 acquires the inspection image (step S12) each time the substrate 9 is loaded into the substrate holding portion 25 (step S11), thereby maintaining the pattern drawing on the substrate 9 in a high-precision state even when the pattern drawing is continuously performed on a plurality of substrates 9.

In the drawing device 1, the acquisition of correction information for all drawing heads 41 (step S13) and the alignment processing of the substrate 9 (step S14) only need to be completed until the pattern drawing on the substrate 9 begins. In addition, the completion of step S13 can be before or after the completion of step S14, or can be almost simultaneous.

As described above, the drawing device 1 for drawing a pattern by irradiating light to the substrate 9 comprises a stage 21, a drawing head 41, a main scanning mechanism (i.e., a first moving mechanism 23), a scale unit 52, a calibration camera 53, a correction information acquisition unit 114, and a drawing control unit 116. The stage 21 is provided with a substrate holding unit 25 for holding the substrate 9. The drawing head 41 irradiates the substrate 9 with modulated light. The first moving mechanism 23 moves the stage 21 relative to the drawing head 41 in the main scanning direction (in the above example, the Y direction) parallel to the upper surface 91 of the substrate 9. The scale unit 52 is provided on the stage 21 adjacent to the substrate holding unit 25 in the main scanning direction. The calibration camera 53 captures a predetermined calibration pattern irradiated from the drawing head 41 to the scale portion 52 when the scale portion 52 is located at a calibration position below the drawing head 41. The correction information acquisition unit 114 obtains correction information based on the inspection image including the scale portion 52 and the calibration pattern acquired by the calibration camera 53, and the correction information is used to correct the irradiation position of the light from the drawing head 41. The drawing control unit 116 controls the drawing head 41 and the first moving mechanism 23 based on the drawing data and the correction information, thereby causing the drawing head 41 to perform drawing on the substrate 9 while relatively moving the substrate 9 in the main scanning direction relative to the drawing head 41. In the drawing device 1, when the stage 21 is located at the loading and unloading position, which is a position for loading and unloading the substrate 9 relative to the substrate holding portion 25, the scale portion 52 is located at the calibration position. This allows the drawing head 41 to be calibrated in parallel with the loading and unloading of the substrate 9 relative to the drawing device 1. Therefore, the drawing head 41 can be calibrated while suppressing an increase in the production time.

As described above, it is preferable that the drawing device 1 further includes an alignment camera 31 and an alignment information acquisition unit 115. The alignment camera 31 captures the alignment mark on the substrate 9. The alignment information acquisition unit 115 obtains alignment information based on the image of the alignment mark acquired by the alignment camera 31 (i.e., the alignment image), and the alignment information is used to correct the relative position of the substrate 9 with respect to the drawing head 41. The alignment camera 31 is located on the side of the stage 21 opposite to the substrate holding unit 25 across the drawing head 41 in the main scanning direction, and the stage 21 is located at the loading and unloading position. Thus, compared with the case where the alignment camera 31 is located between the imaging head 41 and the substrate holding portion 25 of the stage 21 and the stage 21 is located at the loading/unloading position, the stage 21 can be miniaturized in the main scanning direction. As a result, the imaging device 1 can be miniaturized in the main scanning direction.

As described above, it is preferable that the drawing device 1 further comprises a support portion 40 for supporting the drawing head 41 above the stage 21. In addition, the aiming camera 31 is also supported by the support portion 40. Thus, compared with the case where a support portion for the drawing head 41 and a support portion for the aiming camera 31 are provided separately, the structure of the drawing device 1 can be simplified, and the drawing device 1 can be miniaturized in the main scanning direction. In addition, in the case where a support portion for the drawing head 41 and a support portion for the alignment camera 31 are separately provided, although there is a possibility that the relative position deviation of the drawing head 41 and the alignment camera 31 may become larger due to thermal deformation of the two support portions, as described above, by using the support portion 40 of a single component in common for supporting the drawing head 41 and the alignment camera 31, the relative position deviation of the drawing head 41 and the alignment camera 31 can be suppressed.

As described above, the scale portion 52 is a translucent scale member, and is disposed on the upper surface of the table 21. The calibration camera 53 is mounted on the table 21 below the translucent scale member, and is used to photograph the calibration pattern that has passed through the translucent scale member. Preferably, a low-reflection process is applied to the upper end portion of the calibration camera 53. Thereby, when the alignment camera 31 is shooting, etc., it is possible to suppress the reflected light from the calibration camera 53 (for example, the reflected light from the frame of the objective lens) from entering the alignment camera 31. Therefore, since it is not necessary to retract the calibration camera 53 from the bottom of the scale portion 52 when the alignment camera 31 is shooting, the production time can be shortened.

As described above, it is preferred that the position of the calibration pattern on the scale portion 52 in the main scanning direction can be changed by the drawing head 41 while the stage 21 is stationary. In this way, when the calibration pattern deviates significantly from the predetermined position on the scale portion 52 in the main scanning direction, the calibration pattern can be photographed without moving the stage 21. Therefore, it is possible to prevent the increase in the tact time caused by the movement of the stage 21 during calibration.

As described above, it is preferable that the drawing head 41 has: a plurality of light sources (light sources 421 to 423 in the above example) that emit light of different wavelengths. In addition, when drawing the substrate 9, two or more of the plurality of light sources are used; when irradiating the calibration pattern toward the scale portion 52, only one of the plurality of light sources is used. Thereby, when drawing the pattern on the substrate 9, the light source and the light quantity ratio can be selected in accordance with the type of photosensitive material on the substrate 9, so that appropriate pattern drawing can be performed. In addition, the calibration camera 53 is set in accordance with the wavelength of the light from one light source, so that the calibration pattern can be photographed with high precision.

As described above, it is preferred that in the drawing device 1, the plurality of drawing heads 41 are arranged in an arrangement direction parallel to the upper surface 91 of the substrate 9 and inclined relative to the main scanning direction. The plurality of drawing heads 41 include the drawing heads 41 described above and irradiate the substrate 9 with modulated light respectively. In addition, the calibration camera 53 sequentially photographs the plurality of calibration patterns irradiated from the plurality of drawing heads 41 to the scale portion 52 while moving in the arrangement direction described above when the scale portion 52 is located at the calibration position. In this way, compared with the case where a plurality of calibration cameras are provided in the calibration portion 5, the structure of the drawing device 1 can be simplified and the manufacturing cost of the drawing device 1 can be reduced.

As described above, it is preferable that the time required for obtaining the inspection image (step S12) for calibrating the camera 53 is shorter than the time required for unloading a substrate 9 from the substrate holding portion 25 and loading a new substrate 9 into the substrate holding portion 25. Thus, the movement of the stage 21 can be started immediately after the loading and unloading of the substrate 9 are completed. Therefore, the increase in the production time due to calibration can be prevented.

As described above, it is preferable that the inspection image is obtained by the calibration camera 53 every time the substrate 9 is carried to the substrate holding portion 25. Thereby, high-precision drawing can be realized while suppressing the increase of the production time.

The above-described drawing method comprises the following steps: when the stage 21 provided with the substrate holding portion 25 and the scale portion 52 is located at the loading and unloading position, a predetermined calibration pattern of the scale portion 52 which has been irradiated from the drawing head 41 to the calibration position located below the drawing head 41 is photographed, wherein the substrate holding portion 25 is used to hold the substrate 9, and the scale portion 52 is adjacent to the substrate holding portion 25 in the main scanning direction parallel to the upper surface 91 of the substrate 9, and the loading and unloading position is used to perform the substrate 9 relative to the substrate holding portion. 25 is carried in and out (step S12); correction information is obtained based on the inspection image, the inspection image is composed of the scale portion 52 and the calibration pattern obtained in step S12, and the correction information is used to correct the irradiation position of the light from the drawing head 41 (step S13); and based on the drawing data and the correction information, the drawing head 41 irradiates the substrate 9 that moves relatively in the main scanning direction with respect to the drawing head 41 with modulated light and draws the substrate 9 (step S15). In this way, as described above, the drawing head 41 can be calibrated while suppressing the increase of the production time.

Various modifications can be made to the drawing device 1 and the drawing method described above.

For example, in the light source unit 42 of the drawing head 41, light may be emitted from two or more light sources when photographing the inspection image. In addition, the light source unit 42 does not necessarily need to have a plurality of light sources, and may only have one light source.

In the drawing device 1, the position of the calibration pattern on the scale portion 52 in the Y direction does not necessarily need to be changed by the drawing head 41, and can also be changed by moving the stage 21 in the Y direction.

In the drawing device 1, the time required for obtaining the inspection image by calibrating the camera 53 (step S12) may be longer than the time required for unloading a substrate 9 from the substrate holding portion 25 and loading a new substrate 9 into the substrate holding portion 25, or may be approximately the same. In either case, the loading and unloading of the substrate 9 and the calibration of the drawing head 41 are performed in parallel, thereby shortening the production time.

In the drawing device 1, in the shooting section 51 of the calibration section 5, a plurality of calibration cameras 53 (i.e., the same number as the drawing heads 41) corresponding to the plurality of drawing heads 41 are arranged in the X direction directly below the scale section 52, and inspection images of the plurality of drawing heads 41 are obtained approximately simultaneously.

In the drawing device 1, it is not necessary to perform low reflection processing on the upper end of the calibration camera 53. In this case, when the calibration camera 31 acquires the alignment image, the calibration camera 53 can also retreat to the retreat position on the +X side or -X side from directly below the scale portion 52 as needed.

In the drawing device 1, the retreat position of the calibration camera 53 does not necessarily need to be located on the +X side or -X side of the scale portion 52. For example, the retreat position may be set between two adjacent drawing heads 41 in the X direction. In this case, compared with the case where the retreat position is set on the +X side or -X side of the scale portion 52, the movement amount of the calibration camera 53 in the X direction during retreat can be reduced, so the production time can be further shortened.

In the drawing device 1, the drawing head 41 and the aiming camera 31 do not necessarily need to be supported by one supporting portion 40, and may be supported by two supporting portions which are separately arranged in the Y direction and are independent components.

In the image drawing apparatus 1, the alignment camera 31 may be provided between the image drawing head 41 and the substrate holding portion 25 of the stage 21 located at the loading/unloading position.

In the drawing device 1, the scale portion 52 does not necessarily need to be light-transmissive, and the calibration camera 53 does not necessarily need to be installed on the stage 21. For example, the scale portion 52 may also be a reflector for reflecting the light irradiated from the drawing head 41 in a predetermined direction. Alternatively, the calibration camera 53 may be fixed to a frame of the drawing device 1 at a position away from the stage 21, for example, to receive the reflected light from the scale portion 52, thereby capturing an inspection image, which includes the calibration pattern irradiated on the scale portion 52 and the scale on the scale portion 52.

The stage 21 can be moved relative to the drawing head 41 in the main scanning direction by the first moving mechanism 23. Therefore, for example, the stage 21 can be fixed, and the drawing head 41 can be moved in the main scanning direction by the first moving mechanism 23 above the stage 21. Similarly, the drawing head 41 can be moved in the sub-scanning direction by the second moving mechanism 24.

In the drawing device 1, it is not necessary to perform calibration every time a substrate 9 is loaded. For example, the drawing head 41 may be calibrated when the drawing of patterns on a predetermined number of substrates 9 of two or more sheets is completed.

The substrate 9 described above is not limited to a printed circuit board. In the drawing device 1, for example, patterns can be drawn on semiconductor substrates, semiconductor packaging substrates, glass substrates for flat panel display devices such as liquid crystal display devices or plasma display devices, glass substrates for photomasks, and substrates for solar cell panels.

The configurations in the above-mentioned embodiments and various modifications may be appropriately combined as long as they do not contradict each other.

Although the present invention has been described and illustrated in detail, the above description is for illustrative purposes only and is not intended to be limiting. Therefore, various changes and modifications can be made without departing from the scope of the present invention.

1: Drawing device 3: Alignment unit 4: Drawing unit 5: Calibration unit 9: Substrate 10: Control unit 21: Stage 22: Stage moving mechanism 23: First moving mechanism 24: Second moving mechanism 25: Substrate holding unit 31: Alignment camera 40: Support unit 41: Drawing head 42: Light source unit 43: Illumination optical system 44: Spatial light modulator (light modulator) 45: Projection optical system 51: Shooting unit 52: Scale unit 53: Calibration camera 54: Camera moving mechanism 91: Upper surface (of substrate) 100: Computer 101: Processor 102: Memory 103: Input/output unit 104: Bus 105: Keyboard 106: Mouse 107: Display 111: Memory unit 112: Shooting control unit 113: Position detection unit 114: Correction information acquisition unit 115: Alignment information acquisition unit 116: Drawing control unit 421 to 423: Light source S11 to S16: Steps

[Figure 1] is a three-dimensional diagram showing a drawing device of one embodiment. [Figure 2] is an enlarged top view showing the vicinity of the calibration unit. [Figure 3] is a diagram showing the internal structure of the calibration unit and the drawing head. [Figure 4] is a diagram showing the structure of the computer. [Figure 5] is a block diagram showing the functions of the control unit. [Figure 6] is a diagram showing the flow of pattern drawing. [Figure 7A] is a schematic front view showing the main structure of the drawing device. [Figure 7B] is a schematic front view showing the main structure of the drawing device. [Figure 7C] is a schematic front view showing the main structure of the drawing device. [Figure 7D] is a schematic front view showing the main structure of the drawing device. [Figure 7E] is a schematic front view showing the main structure of the drawing device.

1: Drawing device

4: Drawing Department

5: Calibration Department

9: Substrate

21: Taiwan

22: Mobile mechanism

23: First moving mechanism

25: Substrate holding part

41: Drawing head

52: Scale part

53: Calibrate the camera

Claims (10)

A drawing device is used to irradiate light onto a substrate and draw a pattern, and comprises: a stage, which is provided with a substrate holding portion for holding the substrate; a drawing head, which irradiates the substrate with modulated light; a main scanning mechanism, which moves the stage relatively to the drawing head in a main scanning direction parallel to the upper surface of the substrate; a scale portion, which is provided on the stage adjacent to the substrate holding portion in the main scanning direction; a calibration camera, which photographs a predetermined calibration pattern irradiated from the drawing head to the scale portion when the scale portion is at a calibration position below the drawing head; and a correction information acquisition portion, which obtains correction information based on an inspection image, wherein the inspection image includes the calibration image obtained by the calibration camera. The calibration part and the calibration pattern obtained by the imager are used to correct the irradiation position of the light from the imager; and the imager control part controls the imager head and the main scanning mechanism based on the imager data and the correction information, thereby causing the imager head to perform image drawing on the substrate while moving the substrate relative to the imager head in the main scanning direction; when the stage is located at the loading and unloading position, the calibration part is located at the calibration position, and the calibration pattern irradiated from the imager head to the calibration part is photographed by the calibration camera, and the loading and unloading position is a position for loading and unloading the substrate relative to the substrate holding part. The drawing device as described in claim 1 further comprises: an alignment camera for photographing the alignment mark on the substrate; and an alignment information acquisition unit for obtaining alignment information based on the image of the alignment mark acquired by the alignment camera, wherein the alignment information is used to correct the relative position of the substrate relative to the drawing head; the alignment camera is located on the side of the stage opposite to the substrate holding portion across the drawing head in the main scanning direction, and the stage is located at the carrying-in and carrying-out position. The drawing device as described in claim 2, wherein the drawing device further comprises: a support portion, which supports the drawing head above the platform; the alignment camera is also supported by the support portion. The drawing device described in claim 1, wherein the scale portion is a translucent scale member disposed on the upper surface of the table; the calibration camera is mounted on the table below the translucent scale member to photograph the calibration pattern that has passed through the translucent scale member; and a low-reflection process is applied to the upper end of the calibration camera. A drawing device as described in claim 1, wherein the position of the calibration pattern on the scale portion in the main scanning direction can be changed by the drawing head when the stage is stationary. The drawing device as described in claim 1, wherein the drawing head comprises: a plurality of light sources emitting light of different wavelengths; when drawing the substrate, two or more of the plurality of light sources are used; when irradiating the calibration pattern toward the scale portion, only one of the plurality of light sources is used. The drawing device as described in claim 1, wherein the drawing heads include the drawing heads and are used to irradiate the modulated light to the substrate respectively. The drawing heads are arranged in an arrangement direction parallel to the upper surface of the substrate and inclined relative to the main scanning direction; the calibration camera moves in the arrangement direction while the calibration portion is in the calibration position, and sequentially photographs the calibration patterns irradiated to the calibration portion by the drawing heads. A drawing device as recited in any one of claims 1 to 7, wherein the time required for the calibration camera to obtain the inspection image is shorter than the time required to remove a substrate from the substrate holding portion and to move a new substrate into the substrate holding portion. A drawing device as described in any one of claims 1 to 7, wherein the acquisition of the inspection image by the calibration camera is performed each time the substrate is moved into the substrate holding portion. A drawing method is used to irradiate light onto a substrate and draw a pattern, and has the following steps: Step a, when a stage provided with a substrate holding part and a scale part is located at a carry-in/carry-out position, photographing a predetermined calibration pattern of the scale part that has been irradiated from a drawing head to a calibration position located below the drawing head, wherein the substrate holding part is used to hold the substrate, the scale part is adjacent to the substrate holding part in a main scanning direction parallel to the upper surface of the substrate, and the carry-in/carry-out position is used to carry out relative scanning of the substrate. The process b is to obtain correction information based on the inspection image, the inspection image includes the scale part and the calibration pattern obtained in the process a, and the correction information is used to correct the irradiation position of the light from the drawing head; and the process c is to irradiate the substrate with the modulated light from the drawing head relative to the main scanning direction relative to the drawing head based on the drawing data and the correction information, and draw the substrate.

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