TWI900052B - Wafer identification device - Google Patents
Wafer identification deviceInfo
- Publication number
- TWI900052B TWI900052B TW113121280A TW113121280A TWI900052B TW I900052 B TWI900052 B TW I900052B TW 113121280 A TW113121280 A TW 113121280A TW 113121280 A TW113121280 A TW 113121280A TW I900052 B TWI900052 B TW I900052B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafers
- identification device
- wafer
- carrier
- wafer identification
- Prior art date
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
一種晶圓辨識裝置,包含一支撐單元及一工作單元。該支撐單元包括一支架,及一可沿一縱方向移動地設置於該支架的載台。該工作單元包括一設置於該載台的雷射模組,及一與該雷射模組相間隔地設置於該載台的偵測模組。該雷射模組具有一適用於朝晶圓片發出一沿該縱方向延伸之線形光的光源。該偵測模組具有一用以拍攝該線形光照射於晶圓片之範圍的影像擷取器,及一連接於該影像擷取器的處理器。該處理器用以根據該線形光分別在該等晶圓片形成的多個光點,判斷該等光點的數量是否符合預期數量,並確認該等光點的間距。A wafer identification device includes a support unit and a working unit. The support unit includes a support and a carrier that can be movably arranged on the support along a longitudinal direction. The working unit includes a laser module arranged on the carrier, and a detection module arranged on the carrier spaced apart from the laser module. The laser module has a light source suitable for emitting a linear light extending along the longitudinal direction toward the wafer. The detection module has an image capturer for capturing the range of the linear light irradiating the wafer, and a processor connected to the image capturer. The processor is used to determine whether the number of the multiple light spots formed by the linear light on the wafers meets the expected number and confirm the distance between the light spots.
Description
本發明是有關於一種半導體產線的輔助裝置,特別是指一種晶圓辨識裝置。 The present invention relates to an auxiliary device for a semiconductor production line, and more particularly to a wafer identification device.
參閱圖1,為一用以盛裝多片目前常用於半導體製程之晶圓片W的晶圓盒1,該晶圓盒1界定出一容置空間10,並具有多個在該容置空間10之中自左右兩側朝向彼此延伸,且適用於兩兩相互配合而承載所述晶圓片W的承載板11(圖1中因視角關係只能見其中一側)。而該等承載板11將該容置空間10區分為多個分別供多片所述晶圓片W放置的容槽S。在目前成熟的半導體產線中,會由自動化的設備將所述晶圓片W自該容置空間10取中,進而導入產線而執行各站點的製程。 Referring to Figure 1, a wafer cassette 1 is used to hold multiple wafers W commonly used in semiconductor manufacturing. The cassette 1 defines a storage space 10 and has multiple carrier plates 11 extending from the left and right sides of the storage space 10 toward each other, each pairing together to support the wafers W (only one side is visible in Figure 1 due to the viewing angle). The carrier plates 11 divide the storage space 10 into multiple slots S, each for each wafer W. In a mature semiconductor production line, automated equipment removes the wafers W from the storage space 10 and then loads them into the production line for processing at each station.
然而,所述晶圓片W是否能由自動化的設備確實導入產線,有一部分取決於該等晶圓片W是否確實如預期地分別放置於該等容槽S。因此,若是發生有某一該容槽S未放置有該晶圓片W、一個該容槽S中放置了複數之該等晶圓片W,或者某一片該晶圓片W 未平放在相互對位之該等承載板11的”斜插”情況,都有可能會影響自動化設備正確導入所述晶圓片W的相關作業。同樣地,即使是完成特定流程步驟而要將所述晶圓片W放回該晶圓盒1時,也有可能發生類似情況而影響到後續製程甚至是成品出貨。 However, whether the wafers W can be accurately introduced into the production line by the automated equipment depends in part on whether the wafers W are placed in the respective slots S as expected. Therefore, if a slot S is missing a wafer W, if multiple wafers W are placed in a slot S, or if a wafer W is tilted and not positioned flat on the aligned carrier plates 11, the automated equipment's ability to correctly introduce the wafers W may be affected. Similarly, even when returning the wafers W to the wafer cassette 1 after completing a specific process step, similar issues can occur, impacting subsequent processing and even the shipment of finished products.
因此,本發明之目的,即在提供一種能針對晶圓片放置於晶圓盒之情況進行專門檢測的晶圓辨識裝置。 Therefore, the purpose of the present invention is to provide a wafer identification device that can specifically detect the condition of wafers placed in a wafer cassette.
於是,本發明晶圓辨識裝置,適用於與一晶圓盒相鄰設置,該晶圓盒界定出一適用於供多片晶圓片沿一縱方向放置的內空間,該晶圓辨識裝置包含一支撐單元,及一安裝於該支撐單元的工作單元。 Therefore, the wafer identification device of the present invention is suitable for installation adjacent to a wafer cassette. The wafer cassette defines an internal space suitable for placing multiple wafers along a longitudinal direction. The wafer identification device includes a support unit and a working unit mounted on the support unit.
該支撐單元包括一支架,及一可沿該縱方向移動地設置於該支架上的載台。 The support unit includes a bracket and a carrier movably mounted on the bracket along the longitudinal direction.
該工作單元包括一設置於該載台的雷射模組,及一與該雷射模組相間隔地設置於該載台的偵測模組。該雷射模組具有一適用於朝向該等晶圓片發出一線形光的光源,所述線形光照射於該等晶圓片的外側緣時是沿該縱方向延伸。該偵測模組具有一用以拍攝該線形光照射於該等晶圓片之一拍攝範圍的影像擷取器,及一資訊連接於該影像擷取器的處理器。該處理器用以根據該拍攝範圍之該 線形光分別在該等晶圓片上形成的多個光點,判斷該等光點的一計算數量是否符合對應該拍攝範圍的一預期數量,並確認相鄰之該等光點相鄰的一測量間距是否符合一規格間距。 The working unit includes a laser module mounted on the stage and a detection module mounted on the stage spaced apart from the laser module. The laser module includes a light source adapted to emit a linear beam toward the wafers. The linear beam extends along the longitudinal direction when irradiated on the outer edges of the wafers. The detection module includes an image capturer for capturing a capture range of the linear beam irradiated on the wafers, and a processor connected to the image capturer. The processor is configured to determine, based on a plurality of light spots formed on the wafers by the linear light within the imaging range, whether a calculated number of the light spots meets an expected number corresponding to the imaging range, and to confirm whether a measured distance between adjacent light spots meets a specified distance.
本發明之功效在於:利用該偵測模組之該影像擷取器固定的該拍攝範圍,則應該對應特定片數之該等晶圓片的原則,即可妥善設定該預期數量。後續只要透過該支撐單元使該工作單元移動至相對於待確認之該晶圓盒的適當位置,在該光源照射該等晶圓片而形成該等光點時,以該影像擷取器進行拍攝,則該處理器所判斷之該等光點的該計算數量,即為該拍攝範圍中所實際放置之該等晶圓片的數量,故能比對該計算數量與該預期數量,同時確認代表相鄰之該等晶圓片之間距離的測量間距是否正確,藉此得知該拍攝範圍中的該等晶圓片是否正確放置。 The effect of the present invention is that the expected quantity can be properly set by utilizing the principle that the shooting range fixed by the image capture device of the detection module should correspond to a specific number of wafers. Subsequently, the support unit is used to move the work unit to an appropriate position relative to the wafer cassette to be verified. When the light source illuminates the wafers, forming the light spots, the image capturer is used to capture the image. The calculated number of light spots determined by the processor represents the number of wafers actually placed within the captured area. Therefore, the calculated number can be compared with the expected number, and the accuracy of the measured distance between adjacent wafers can be confirmed, thereby determining whether the wafers within the captured area are correctly placed.
2:支撐單元 2: Support unit
21:支架 21: Bracket
22:載台 22: Carrier
23:減速機構 23: Deceleration mechanism
24:伺服馬達 24: Servo Motor
3:工作單元 3: Work Unit
31:雷射模組 31: Laser Module
311:光源 311: Light Source
312:第一調整座 312: First Adjustment Seat
32:偵測模組 32: Detection Module
321:影像擷取器 321: Image Capture
322:第二調整座 322: Second Adjustment Seat
323:處理器 323:Processor
4:固定單元 4: Fixed unit
80:晶圓片 80: Wafer
9:晶圓盒 9: Wafer Box
90:內空間 90: Inner Space
H:縱方向 H: Vertical direction
本發明之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中:圖1是一不完整的立體圖,說明多片晶圓放置於一晶圓盒的情況;圖2是一立體圖,說明本發明晶圓辨識裝置之一實施例;圖3是一局部放大的立體圖,說明該實施例之一支撐單元及一 工作單元;圖4是一示意圖,說明該工作單元之一雷射模組及一偵測模組運作的情況;圖5是一示意圖,說明該雷射模組發出之一線形光照射至多片晶圓片的情況;及圖6是一局部放大圖,配合圖5說明該線形光在該等晶圓片上形成5個光點的情況。 Other features and functions of the present invention are clearly illustrated in the embodiments with reference to the accompanying drawings, including: Figure 1 is a fragmentary perspective view illustrating multiple wafers placed in a wafer cassette; Figure 2 is a perspective view illustrating an embodiment of the wafer identification device of the present invention; Figure 3 is a partially enlarged perspective view illustrating a support unit and a working unit of the embodiment; Figure 4 is a schematic diagram illustrating the operation of a laser module and a detection module of the working unit; Figure 5 is a schematic diagram illustrating a linear beam emitted by the laser module irradiating multiple wafers; and Figure 6 is a partially enlarged view, used in conjunction with Figure 5, illustrating the linear beam forming five light spots on the wafers.
參閱圖2,為本發明晶圓辨識裝置之一實施例,本實施例適用於與一晶圓盒9相鄰設置,該晶圓盒9界定出一適用於供多片晶圓片80(見圖5)沿一縱方向H放置的內空間90。本實施例包含一支撐單元2、一安裝於該支撐單元2的工作單元3,及一與該支撐單元2相鄰間隔並適用於固定該晶圓盒9的固定單元4。具體而言,在本實施例中使用的該晶圓盒9為前開式出貨盒(Front Opening Shipping Box,FOSB),且是以透明材質所製成。 Referring to Figure 2, an embodiment of the wafer identification device of the present invention is shown. This embodiment is suitable for installation adjacent to a wafer cassette 9. The wafer cassette 9 defines an interior space 90 suitable for accommodating multiple wafers 80 (see Figure 5) along a longitudinal direction H. This embodiment includes a support unit 2, a working unit 3 mounted on the support unit 2, and a fixing unit 4 spaced adjacent to the support unit 2 and suitable for fixing the wafer cassette 9. Specifically, the wafer cassette 9 used in this embodiment is a front-opening shipping box (FOSB) made of a transparent material.
同時參閱圖2與圖3,該支撐單元2包括一支架21、一可沿該縱方向H移動地設置於該支架21上的載台22、一安裝於該支架21且連接於該載台22的減速機構23,及一連接於該減速機構23的伺服馬達24。其中,該支架21的形式並無具體限制,概可依照產線環 境,或者是固定各部件之需求而自由設計,只要得以穩定支撐並且具有足夠的結構強度即可。而該載台22能由該伺服馬達24提供動力,在該減速機構23控制速度而優化調整精度的情況下,在該支架21上調整沿該縱方向H的適當位置。 Referring to Figures 2 and 3 , the support unit 2 comprises a bracket 21, a carrier 22 movably mounted on the bracket 21 along the longitudinal direction H, a deceleration mechanism 23 mounted on the bracket 21 and connected to the carrier 22, and a servo motor 24 connected to the deceleration mechanism 23. The form of the bracket 21 is not particularly limited and can be freely designed based on the production line environment or the need to secure various components, as long as it provides stable support and possesses sufficient structural strength. The carrier 22 is powered by the servo motor 24 and can be adjusted to its proper position along the longitudinal direction H on the bracket 21, while the deceleration mechanism 23 controls speed to optimize adjustment accuracy.
該工作單元3包括一設置於該載台22的雷射模組31,及一與該雷射模組31間隔設置於該載台22的偵測模組32。該雷射模組31具有一適用於朝向該等晶圓片80發出一線形光的光源311,及一安裝於該載台22上且能調整該線形光之照射方向的第一調整座312。所述線形光照射於該等晶圓片80的外側緣時是沿該縱方向H延伸。該偵測模組32具有一用以拍攝該線形光照射於該等晶圓片80之一拍攝範圍的影像擷取器321、一安裝於該載台22上且能調整該影像擷取器321之拍攝方向的第二調整座322,及一資訊連接於該影像擷取器321的處理器323(標示於圖4)。其中,該影像擷取器321為一電荷耦合感光元件(CCD),該光源311產生的該線形光,較佳是配合該影像擷取器321所能拍攝的範圍,在定位的情況下照射4至6片所述晶圓片80。另外,該第一調整座312及該第二調整座322的具體形式亦不限制,以能自由調整該光源311及該影像擷取器321的方向為主。 The working unit 3 includes a laser module 31 mounted on the carrier 22, and a detection module 32 spaced apart from the laser module 31 on the carrier 22. The laser module 31 has a light source 311 adapted to emit a linear beam toward the wafers 80, and a first adjustment base 312 mounted on the carrier 22 and capable of adjusting the direction of the linear beam. The linear beam extends along the longitudinal direction H when irradiating the outer edges of the wafers 80. The detection module 32 includes an image capturer 321 for capturing the range of the linear light irradiating the wafers 80, a second adjustment base 322 mounted on the stage 22 and capable of adjusting the capturing direction of the image capturer 321, and a processor 323 (shown in FIG. 4 ) connected to the image capturer 321. The image capturer 321 is a charge-coupled device (CCD). The linear light generated by the light source 311 preferably irradiates four to six wafers 80 in a positioned manner, in accordance with the range captured by the image capturer 321. In addition, the specific forms of the first adjustment base 312 and the second adjustment base 322 are not limited, as long as they can freely adjust the directions of the light source 311 and the image capturer 321.
參閱圖4並配合圖2,該處理器323具體而言為一可預先寫入邏輯,或者配合安裝一影像處理軟體,並且得以執行所需運算 而輸出結果的計算晶片。該處理器323會接收該影像擷取器321所拍攝之圖像的資訊,透過影像辨識的方式得知該拍攝範圍之該線形光分別在該等晶圓片80上形成的多個光點之數量,判斷該等光點的一計算數量,也能得知相鄰之該等光點相鄰的一測量間距,以及該拍攝範圍中的每一該光點的一測量面積。 Referring to Figure 4 in conjunction with Figure 2, the processor 323 is specifically a computing chip that can be pre-programmed with logic or installed with image processing software, and is capable of performing the required calculations and outputting results. The processor 323 receives information from the image captured by the image capturer 321 and, through image recognition, determines the number of light spots formed on the wafers 80 by the linear light within the captured range. It then determines the calculated number of these light spots, the measured distance between adjacent light spots, and the measured area of each light spot within the captured range.
參閱圖4至圖6並配合圖2與圖3,使用本實施例針對該晶圓盒9中擺放之所述晶圓片80進行檢測時,在該晶圓盒9穩定放置於該固定單元4的情況下,可預先透過該第一調整座312及該第二調整座322,調整該雷射模組31之該光源311及該偵測模組32之該影像擷取器321的方向。由於該晶圓盒9是以透明材質製成,於是該雷射模組31所發出的該線形光,得以穿透而直接照射該等晶圓片80。在此要先說明的是,在針對已製作完成之所述晶圓片80進行檢測確認的情況下,由於製作的結構面通常是向上擺放,為了避免製作的結構造成意外的反射,該光源311在執行檢測時,較佳是如圖4呈現,以採用由下而上呈傾斜的方向朝向該等晶圓片80之背面照射為原則。 Referring to Figures 4 to 6 in conjunction with Figures 2 and 3 , when inspecting the wafers 80 placed in the wafer cassette 9 using this embodiment, with the wafer cassette 9 securely positioned within the fixing unit 4 , the orientation of the light source 311 of the laser module 31 and the image capturer 321 of the detection module 32 can be pre-adjusted using the first adjustment base 312 and the second adjustment base 322 Because the wafer cassette 9 is made of a transparent material, the linear light emitted by the laser module 31 is able to pass through and directly illuminate the wafers 80 . It should be noted that when inspecting and confirming the completed wafers 80, since the fabricated structure surface is typically facing upward, to avoid unexpected reflections from the fabricated structure, the light source 311 is preferably directed upwards, as shown in Figure 4, toward the backside of the wafers 80.
接著,配合該影像擷取器321的拍攝範圍,若以單一畫面設定拍攝5片所述晶圓片80為例,則用來發出該線形光的該雷射模組31,以及負責解讀形成該等光點後之影像的該偵測模組32,就可以在相對位置固定的情況下,藉由該載台22能沿該縱方向H移動的 功能,逐步移動而以每次5片的進度執行檢測作業。 Next, in conjunction with the image capture range of the image capturer 321, for example, if a single frame is set to capture five wafers 80, the laser module 31, which emits the linear light, and the detection module 32, which interprets the images formed by these light spots, can be fixed in relative position. By virtue of the stage 22's ability to move along the longitudinal direction H, they can gradually move and perform inspections on five wafers at a time.
針對該影像擷取器321配合該光源311的照射而拍攝的每一個含有所述光點的畫面,該處理器323能判斷該等光點的該計算數量,也就是所述晶圓片80的數量是否符合對應該拍攝範圍的一預期數量(在本例中即為如圖6所呈現之5片)。確認該計算數量與該預期數量符合後,則概能判斷在該拍攝範圍中確實有5片所述晶圓片80,反之若數量不相符,則可直接得知數量的增多或減少。更進一步地,針對該等晶圓片80可能相互重疊放置的情況,考量到相互重疊的複數該等晶圓片80,共同反射該線形光所形成的光點理應有較大的面積,於是該處理器323還能偵測每一該光點的該測量面積是否在一預設之合理範圍內,藉此達成確保該等晶圓片80沒有”疊片”的目的。除此之外,在預先設定好兩片所述晶圓片80正常擺放情況所應有之一規格間距後,同樣採用影像辨識的方式,確認相鄰之該等光點相鄰的該測量間距是否符合該規格間距,即可檢測出是否有所述晶圓片80未確實水平放置而有”斜插”的情況。 For each frame containing the light spots captured by the image capturer 321 in conjunction with the illumination of the light source 311, the processor 323 can determine whether the calculated number of light spots, that is, the number of wafers 80, meets an expected number corresponding to the captured range (in this example, 5 wafers as shown in Figure 6). If the calculated number is confirmed to match the expected number, it can be generally determined that there are indeed 5 wafers 80 in the captured range. If the number does not match, it can be directly determined whether the number has increased or decreased. Furthermore, to address the possibility that the wafers 80 may overlap, and considering that the light spot formed by the combined reflection of the linear light from multiple overlapping wafers 80 should have a larger area, the processor 323 can also detect whether the measurement area of each light spot is within a preset reasonable range, thereby ensuring that the wafers 80 are not "overlapping." Furthermore, after presetting a standard spacing between two wafers 80 when properly positioned, image recognition is also used to confirm whether the measurement spacing between adjacent light spots meets the standard spacing, thereby detecting whether any wafers 80 are not properly positioned horizontally but are "tilted."
綜上所述,本發明晶圓辨識裝置之該實施例,該工作單元3之該雷射模組31及該偵測模組32能相互配合,利用影像辨識的方式判斷所述晶圓片80是否正確擺放,以及是否有疊片、斜插等等的異常放置情形,藉此針對所述晶圓片80放置於該晶圓盒9之情況進行專門檢測,確保後端製程正常運作,或者成品的穩定出貨。因 此,確實能達成本發明之目的。 In summary, in this embodiment of the wafer identification device of the present invention, the laser module 31 and the detection module 32 of the working unit 3 cooperate with each other to utilize image recognition to determine whether the wafer 80 is correctly placed, and whether there are any abnormal placement conditions such as overlap, tilting, etc. This allows for specialized inspection of the wafer 80 within the wafer cassette 9, ensuring the normal operation of the back-end process and the stable shipment of finished products. Therefore, the purpose of this invention is effectively achieved.
惟以上所述者,僅為本發明之實施例而已,當不能以此限定本發明實施之範圍,凡是依本發明申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。 However, the above descriptions are merely examples of the present invention and should not be construed to limit the scope of the present invention. Any simple equivalent variations and modifications made within the scope of the patent application and the contents of the patent specification are still covered by the present patent.
2:支撐單元 2: Support unit
21:支架 21: Bracket
22:載台 22: Carrier
23:減速機構 23: Deceleration mechanism
24:伺服馬達 24: Servo Motor
3:工作單元 3: Work Unit
31:雷射模組 31: Laser Module
311:光源 311: Light Source
32:偵測模組 32: Detection Module
321:影像擷取器 321: Image Capture
4:固定單元 4: Fixed unit
9:晶圓盒 9: Wafer Box
90:內空間 90: Inner Space
H:縱方向 H: Vertical direction
Claims (7)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW113121280A TWI900052B (en) | 2024-06-07 | 2024-06-07 | Wafer identification device |
| JP2024153559A JP2025184731A (en) | 2024-06-07 | 2024-09-06 | Wafer Detector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW113121280A TWI900052B (en) | 2024-06-07 | 2024-06-07 | Wafer identification device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TWI900052B true TWI900052B (en) | 2025-10-01 |
| TW202548960A TW202548960A (en) | 2025-12-16 |
Family
ID=98058590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW113121280A TWI900052B (en) | 2024-06-07 | 2024-06-07 | Wafer identification device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2025184731A (en) |
| TW (1) | TWI900052B (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201832304A (en) * | 2017-01-30 | 2018-09-01 | 美商克萊譚克公司 | Activation of wafer particle defects for spectral composition analysis |
| CN113161254A (en) * | 2021-03-24 | 2021-07-23 | 创微微电子(常州)有限公司 | Wafer visual detection method, detection system and method for detecting wafer damage |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05343495A (en) * | 1992-06-05 | 1993-12-24 | Tokyo Electron Tohoku Ltd | Transferring apparatus for treated object |
| JP3963572B2 (en) * | 1998-04-30 | 2007-08-22 | 大日本スクリーン製造株式会社 | Substrate loading / unloading device |
| JP2000294617A (en) * | 1999-04-07 | 2000-10-20 | Dainippon Screen Mfg Co Ltd | Device for detecting board inside cassette |
| US7015492B2 (en) * | 2003-08-15 | 2006-03-21 | Asm International N.V. | Method and apparatus for mapping of wafers located inside a closed wafer cassette |
| JP2009302392A (en) * | 2008-06-16 | 2009-12-24 | Kawasaki Heavy Ind Ltd | Substrate detecting device and method |
| JP5185756B2 (en) * | 2008-10-01 | 2013-04-17 | 川崎重工業株式会社 | Substrate detection apparatus and method |
| JP3169676U (en) * | 2011-05-31 | 2011-08-11 | 東京エレクトロン株式会社 | Substrate detection apparatus and substrate processing apparatus having substrate detection apparatus |
| JP7433644B2 (en) * | 2020-06-05 | 2024-02-20 | Aiメカテック株式会社 | Substrate detection device, substrate detection method, and substrate processing unit |
| JP2023132455A (en) * | 2022-03-11 | 2023-09-22 | シンフォニアテクノロジー株式会社 | Board detection method and load port |
| JP3240692U (en) * | 2022-10-17 | 2023-01-27 | 浚輔科技股▲ふん▼有限公司 | Wafer position status detector |
-
2024
- 2024-06-07 TW TW113121280A patent/TWI900052B/en active
- 2024-09-06 JP JP2024153559A patent/JP2025184731A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201832304A (en) * | 2017-01-30 | 2018-09-01 | 美商克萊譚克公司 | Activation of wafer particle defects for spectral composition analysis |
| CN113161254A (en) * | 2021-03-24 | 2021-07-23 | 创微微电子(常州)有限公司 | Wafer visual detection method, detection system and method for detecting wafer damage |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2025184731A (en) | 2025-12-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102576687B (en) | Wafer detecting apparatus | |
| JP7346839B2 (en) | loading port | |
| JP2014038049A (en) | Three-dimensional measuring apparatus, three-dimensional measuring method, program, and base plate manufacturing method | |
| JP2013093389A (en) | Optical inspection device and edge inspection device | |
| CN115088060B (en) | Wafer corner defect inspection device and inspection method | |
| US20250037966A1 (en) | Self-differential confocal tilt sensor for measuring level variation in charged particle beam system | |
| JP7521979B2 (en) | Circuit Board Inspection Equipment | |
| TWI900052B (en) | Wafer identification device | |
| KR101575895B1 (en) | Apparatus and method for inspecting wafer using light | |
| JP6491425B2 (en) | Electronic parts package side view photographing device | |
| JP2010261965A (en) | Component recognition device, surface mounter and component inspection device | |
| TWI637165B (en) | Vision inspection module and device inspection system having the same | |
| JP5954757B2 (en) | Appearance inspection device | |
| KR101314592B1 (en) | Vision inspection apparatus of improved inspection speed | |
| TW202548960A (en) | Wafer identification device | |
| TWM659479U (en) | Wafer identification device | |
| JP6769796B2 (en) | Tilt inspection device for the hand part of the robot and its tilt inspection method | |
| KR101324973B1 (en) | Semiconductor Package Inspecting Unit, Semiconductor Package Inspecting Device and Semiconductor Package Inspecting method | |
| KR101192315B1 (en) | testing apparatus for bad mounting semiconductor | |
| JP2014139550A (en) | Substrate inspection device | |
| TW202312307A (en) | Maintenance method and method for manufacturing electronic component | |
| KR102870970B1 (en) | aligner device | |
| US11009541B2 (en) | Electronic component handler and electronic component tester | |
| WO2023032095A1 (en) | Workpiece height measurement device, and mounting substrate inspection device using same | |
| TWI863241B (en) | Drawing apparatus and drawing method |