TWD230208S - Part of the inner tube of a reaction tube for semiconductor manufacturing equipment - Google Patents
Part of the inner tube of a reaction tube for semiconductor manufacturing equipment Download PDFInfo
- Publication number
- TWD230208S TWD230208S TW111305741F TW111305741F TWD230208S TW D230208 S TWD230208 S TW D230208S TW 111305741 F TW111305741 F TW 111305741F TW 111305741 F TW111305741 F TW 111305741F TW D230208 S TWD230208 S TW D230208S
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor manufacturing
- reaction tube
- tube
- inner tube
- manufacturing equipment
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 5
- 239000004065 semiconductor Substances 0.000 title abstract description 5
- 238000010586 diagram Methods 0.000 description 1
Abstract
【物品用途】;本設計的物品是半導體製造裝置用反應管的內管,係安裝於反應管之內側而被使用的內管,而該反應管係被使用於半導體製造裝置。;【設計說明】;圖式所揭露之虛線部分,為本案不主張設計之部分。;圖式所揭露之一點鏈線僅是表示作為部分設計而欲主張設計專利之部分與其他部分間的邊界,該一點鏈線本身為本案不主張設計之部分。[Use of Article]; The article of this design is an inner tube of a reaction tube for a semiconductor manufacturing device, which is an inner tube installed on the inner side of the reaction tube and used, and the reaction tube is used in a semiconductor manufacturing device. ;[Design Description]; The dotted line portion disclosed in the figure is a portion that is not claimed in this case. ; The dotted chain line disclosed in the figure only indicates the boundary between the portion that is intended to be claimed as a partial design and the other portions, and the dotted chain line itself is a portion that is not claimed in this case.
Description
本設計的物品是半導體製造裝置用反應管的內管,係安裝於反應管之內側而被使用的內管,而該反應管係被使用於半導體製造裝置。The object of this design is an inner tube of a reaction tube for a semiconductor manufacturing device. It is an inner tube that is installed inside the reaction tube and used in the semiconductor manufacturing device.
圖式所揭露之虛線部分,為本案不主張設計之部分。The dotted line parts revealed in the diagram are the parts that are not designed in this case.
圖式所揭露之一點鏈線僅是表示作為部分設計而欲主張設計專利之部分與其他部分間的邊界,該一點鏈線本身為本案不主張設計之部分。The dotted chain line disclosed in the drawing only represents the boundary between the part for which a design patent is intended to be claimed as part of the design and other parts. The dotted chain line itself is a part of the design that is not claimed in this case.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022011411F JP1731675S (en) | 2022-05-30 | 2022-05-30 | Inner tubes for reaction tubes in semiconductor manufacturing equipment |
| JP2022-011411 | 2022-05-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD230208S true TWD230208S (en) | 2024-03-01 |
Family
ID=84322292
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW111305741F TWD230208S (en) | 2022-05-30 | 2022-11-18 | Part of the inner tube of a reaction tube for semiconductor manufacturing equipment |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD1019583S1 (en) |
| JP (1) | JP1731675S (en) |
| TW (1) | TWD230208S (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD213081S (en) | 2020-06-15 | 2021-08-01 | 日商東京威力科創股份有限公司 | Reaction tube for semiconductor manufacturing equipment (1) |
Family Cites Families (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5637153A (en) * | 1993-04-30 | 1997-06-10 | Tokyo Electron Limited | Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus |
| USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
| USD423463S (en) * | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube |
| USD405430S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus |
| USD552047S1 (en) * | 2005-02-28 | 2007-10-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD551634S1 (en) * | 2005-02-28 | 2007-09-25 | Tokyo Electron Limited | Wafer-boat for heat-processing of semiconductor wafers |
| TWD124997S1 (en) * | 2006-09-12 | 2008-09-21 | 東京威力科創股份有限公司 | Semiconductor Process Tubes |
| JP4331768B2 (en) * | 2007-02-28 | 2009-09-16 | 東京エレクトロン株式会社 | Heat treatment furnace and vertical heat treatment equipment |
| US8023806B2 (en) * | 2007-03-20 | 2011-09-20 | Tokyo Electron Limited | Heat processing furnace and vertical-type heat processing apparatus |
| TWD127410S1 (en) * | 2007-04-20 | 2009-02-11 | 東京威力科創股份有限公司 | Process tubes for semiconductor manufacturing |
| TWD125601S (en) * | 2007-05-08 | 2008-10-21 | 東京威力科創股份有限公司 | Processing tubes for semiconductor manufacturing |
| TWD143034S1 (en) * | 2008-03-28 | 2011-10-01 | 東京威力科創股份有限公司 | Processing tubes for semiconductor manufacturing |
| USD610559S1 (en) * | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| US8398773B2 (en) * | 2011-01-21 | 2013-03-19 | Asm International N.V. | Thermal processing furnace and liner for the same |
| USD720309S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD724551S1 (en) * | 2011-11-18 | 2015-03-17 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD720308S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| TWD166332S (en) * | 2013-03-22 | 2015-03-01 | 日立國際電氣股份有限公司 | Part of the wafer boat for substrate processing equipment |
| TWD168774S (en) * | 2013-06-28 | 2015-07-01 | 日立國際電氣股份有限公司 | part of reaction tube |
| TWD167985S (en) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | part of reaction tube |
| TWD167987S (en) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | part of reaction tube |
| USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| TWD167986S (en) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | part of reaction tube |
| TWD168827S (en) * | 2013-07-29 | 2015-07-01 | 日立國際電氣股份有限公司 | Wafer boats for semiconductor manufacturing equipment |
| TWD167988S (en) * | 2013-07-29 | 2015-05-21 | 日立國際電氣股份有限公司 | Wafer boats for semiconductor manufacturing equipment |
| JP1535455S (en) * | 2015-02-25 | 2015-10-19 | ||
| JP1546512S (en) * | 2015-09-04 | 2016-03-22 | ||
| JP1546345S (en) * | 2015-09-04 | 2016-03-22 | ||
| JP1563649S (en) * | 2016-02-12 | 2016-11-21 | ||
| JP1563524S (en) | 2016-03-30 | 2016-11-21 | ||
| JP1605460S (en) * | 2017-08-09 | 2021-05-31 | ||
| JP1605461S (en) * | 2017-08-10 | 2021-05-31 | ||
| JP1605462S (en) * | 2017-08-10 | 2021-05-31 | ||
| JP1605982S (en) * | 2017-12-27 | 2021-05-31 | ||
| USD846514S1 (en) * | 2018-05-03 | 2019-04-23 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
| USD847105S1 (en) * | 2018-05-03 | 2019-04-30 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
| JP6856576B2 (en) * | 2018-05-25 | 2021-04-07 | 株式会社Kokusai Electric | Substrate processing equipment, semiconductor equipment manufacturing methods and programs |
| JP1638282S (en) * | 2018-09-20 | 2019-08-05 | ||
| JP1640260S (en) * | 2018-11-19 | 2019-09-02 | ||
| JP1644260S (en) | 2019-03-20 | 2019-10-28 | ||
| JP1658652S (en) * | 2019-08-07 | 2020-04-27 | ||
| JP1665228S (en) * | 2019-11-28 | 2020-08-03 | ||
| USD931823S1 (en) * | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
| JP1678273S (en) * | 2020-03-10 | 2021-02-01 | reaction tube | |
| JP1678278S (en) * | 2020-03-19 | 2021-02-01 | Boat for substrate processing equipment | |
| WO2022064713A1 (en) * | 2020-09-28 | 2022-03-31 | 株式会社Kokusai Electric | Temperature control method, semiconductor device manufacturing method, program, and substrate processing device |
| JP1700777S (en) * | 2021-03-15 | 2021-11-29 | Boat for substrate processing equipment |
-
2022
- 2022-05-30 JP JP2022011411F patent/JP1731675S/en active Active
- 2022-11-18 TW TW111305741F patent/TWD230208S/en unknown
- 2022-11-28 US US29/861,194 patent/USD1019583S1/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD213081S (en) | 2020-06-15 | 2021-08-01 | 日商東京威力科創股份有限公司 | Reaction tube for semiconductor manufacturing equipment (1) |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1731675S (en) | 2025-12-15 |
| USD1019583S1 (en) | 2024-03-26 |
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