ES8103397A1 - Un procedimiento para producir un elemento capaz de formar imagenes. - Google Patents
Un procedimiento para producir un elemento capaz de formar imagenes.Info
- Publication number
- ES8103397A1 ES8103397A1 ES488890A ES488890A ES8103397A1 ES 8103397 A1 ES8103397 A1 ES 8103397A1 ES 488890 A ES488890 A ES 488890A ES 488890 A ES488890 A ES 488890A ES 8103397 A1 ES8103397 A1 ES 8103397A1
- Authority
- ES
- Spain
- Prior art keywords
- weight
- organic solvent
- compositions
- solvent soluble
- free radical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title abstract 4
- 239000003960 organic solvent Substances 0.000 abstract 4
- 239000012949 free radical photoinitiator Substances 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 1
- 239000008240 homogeneous mixture Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 150000003254 radicals Chemical class 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US1558479A | 1979-02-27 | 1979-02-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ES488890A0 ES488890A0 (es) | 1981-02-16 |
| ES8103397A1 true ES8103397A1 (es) | 1981-02-16 |
Family
ID=21772291
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES488890A Expired ES8103397A1 (es) | 1979-02-27 | 1980-02-25 | Un procedimiento para producir un elemento capaz de formar imagenes. |
Country Status (10)
| Country | Link |
|---|---|
| JP (1) | JPS55120028A (nl) |
| BE (1) | BE881956A (nl) |
| BR (1) | BR8001128A (nl) |
| CA (1) | CA1144804A (nl) |
| DE (1) | DE3007212A1 (nl) |
| ES (1) | ES8103397A1 (nl) |
| FR (1) | FR2450473A1 (nl) |
| GB (1) | GB2044788B (nl) |
| NL (1) | NL8001085A (nl) |
| ZA (1) | ZA801085B (nl) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57141640A (en) * | 1981-02-03 | 1982-09-02 | Konishiroku Photo Ind Co Ltd | Photosensitive image forming material |
| JPS57197537A (en) * | 1981-05-29 | 1982-12-03 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JPS582847A (ja) * | 1981-06-30 | 1983-01-08 | Konishiroku Photo Ind Co Ltd | 平版印刷版 |
| JPS58199341A (ja) * | 1982-05-17 | 1983-11-19 | Tokyo Ohka Kogyo Co Ltd | 耐熱性感光性樹脂組成物 |
| JPS5953836A (ja) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JPS59101644A (ja) * | 1982-12-01 | 1984-06-12 | Fuji Photo Film Co Ltd | 感光性組成物 |
| US4600679A (en) * | 1984-05-25 | 1986-07-15 | W. R. Grace & Co. | Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer |
| DE3425328A1 (de) * | 1984-07-10 | 1986-01-16 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
| EP0184725B1 (de) * | 1984-12-06 | 1989-01-04 | Hoechst Celanese Corporation | Lichtempfindliches Gemisch |
| DE3504658A1 (de) * | 1985-02-12 | 1986-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial |
| DE3605717A1 (de) * | 1985-02-28 | 1986-08-28 | Hoechst Celanese Corp., Somerville, N.J. | Durch strahlung polymerisierbares gemisch |
| US4851319A (en) * | 1985-02-28 | 1989-07-25 | Hoechst Celanese Corporation | Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers |
| US5080999A (en) * | 1985-06-10 | 1992-01-14 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide |
| US4772538A (en) * | 1985-08-02 | 1988-09-20 | American Hoechst Corporation | Water developable lithographic composition |
| US5120772A (en) * | 1985-08-02 | 1992-06-09 | Walls John E | Radiation-polymerizable composition and element containing a photopolymerizable mixture |
| US4780392A (en) * | 1985-08-02 | 1988-10-25 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer |
| US4822720A (en) * | 1985-08-02 | 1989-04-18 | Hoechst Celanese Corporation | Water developable screen printing composition |
| US4652604A (en) * | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
| US4707437A (en) * | 1985-08-02 | 1987-11-17 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
| DE3528309A1 (de) * | 1985-08-07 | 1987-02-12 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
| JPS6278544A (ja) * | 1985-10-01 | 1987-04-10 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JPS62238553A (ja) * | 1986-04-10 | 1987-10-19 | Nippon Foil Mfg Co Ltd | 感光性樹脂組成物 |
| US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
| DE3644160A1 (de) * | 1986-12-23 | 1988-07-14 | Hoechst Ag | Lichtempfindliches aufzeichnungsmaterial mit einer lichtempfindlichen zwischenschicht |
| US4886731A (en) * | 1987-01-05 | 1989-12-12 | Cookson Graphics Inc. | Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions |
| JPH0727208B2 (ja) * | 1987-04-20 | 1995-03-29 | 富士写真フイルム株式会社 | 感光性組成物 |
| DE3738863A1 (de) * | 1987-11-16 | 1989-05-24 | Hoechst Ag | Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck |
| US5286594A (en) * | 1988-01-29 | 1994-02-15 | International Paper Company | Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles |
| US5340681A (en) * | 1988-01-29 | 1994-08-23 | International Paper Company | Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process |
| CA2000712A1 (en) * | 1988-10-21 | 1990-04-21 | Thomas Dunder | Negative-working, photopolymerizable color proofing film without triplet oxygen quenching |
| DE3903001A1 (de) * | 1989-02-02 | 1990-08-16 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
| JP6962216B2 (ja) * | 2018-01-24 | 2021-11-05 | 日本製鉄株式会社 | 溶接鋼管用防錆処理液、溶接鋼管の化成処理方法、溶接鋼管および溶接鋼管の成形加工品 |
| CN113105570B (zh) * | 2021-04-12 | 2022-05-03 | 之江实验室 | 一种液体双光子引发剂及其制备方法与应用 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1141544A (en) * | 1966-07-13 | 1969-01-29 | Gordon Owen Shipton | Polymer compositions |
| US3905815A (en) * | 1971-12-17 | 1975-09-16 | Minnesota Mining & Mfg | Photopolymerizable sheet material with diazo resin layer |
| IT1000315B (it) * | 1972-12-14 | 1976-03-30 | Polychrome Corp | Perfezionamento nelle composizioni monomere diazoiche insature potosensibili |
| FI207474A7 (nl) * | 1973-08-16 | 1975-02-17 | Hercules Inc | |
| JPS50108003A (nl) * | 1974-02-01 | 1975-08-26 | ||
| JPS50114122A (nl) * | 1974-02-16 | 1975-09-06 | ||
| GB1523762A (en) * | 1975-02-25 | 1978-09-06 | Oce Van Der Grinten Nv | Photocopying materials |
| US4042386A (en) * | 1976-06-07 | 1977-08-16 | Napp Systems | Photosensitive compositions |
| JPS549619A (en) * | 1977-06-23 | 1979-01-24 | Oji Paper Co | Photosensitive composition |
| AU526602B2 (en) * | 1977-10-06 | 1983-01-20 | Polychrome Corp. | Lithographic printing plate |
-
1980
- 1980-02-22 NL NL8001085A patent/NL8001085A/nl not_active Application Discontinuation
- 1980-02-25 ES ES488890A patent/ES8103397A1/es not_active Expired
- 1980-02-26 BR BR8001128A patent/BR8001128A/pt unknown
- 1980-02-26 DE DE19803007212 patent/DE3007212A1/de not_active Ceased
- 1980-02-26 CA CA000346444A patent/CA1144804A/en not_active Expired
- 1980-02-26 ZA ZA00801085A patent/ZA801085B/xx unknown
- 1980-02-26 GB GB8006481A patent/GB2044788B/en not_active Expired
- 1980-02-26 FR FR8004164A patent/FR2450473A1/fr not_active Withdrawn
- 1980-02-27 JP JP2394780A patent/JPS55120028A/ja active Pending
- 1980-02-27 BE BE0/199576A patent/BE881956A/fr not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| FR2450473A1 (fr) | 1980-09-26 |
| ES488890A0 (es) | 1981-02-16 |
| GB2044788B (en) | 1983-05-25 |
| ZA801085B (en) | 1981-07-29 |
| JPS55120028A (en) | 1980-09-16 |
| NL8001085A (nl) | 1980-08-29 |
| CA1144804A (en) | 1983-04-19 |
| BE881956A (fr) | 1980-08-27 |
| BR8001128A (pt) | 1980-11-04 |
| GB2044788A (en) | 1980-10-22 |
| DE3007212A1 (de) | 1980-08-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FD1A | Patent lapsed |
Effective date: 19971201 |