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DE60315403D1 - Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung und Substrathalter - Google Patents

Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung und Substrathalter

Info

Publication number
DE60315403D1
DE60315403D1 DE60315403T DE60315403T DE60315403D1 DE 60315403 D1 DE60315403 D1 DE 60315403D1 DE 60315403 T DE60315403 T DE 60315403T DE 60315403 T DE60315403 T DE 60315403T DE 60315403 D1 DE60315403 D1 DE 60315403D1
Authority
DE
Germany
Prior art keywords
making
substrate holder
lithographic apparatus
lithographic
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60315403T
Other languages
English (en)
Other versions
DE60315403T2 (de
Inventor
Ballegoij Robertus N J Van
Martinus A W Cuijpers
Pieter J G Meijers
Nunen Gerardus P M Van
Joost J Ottens
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60315403D1 publication Critical patent/DE60315403D1/de
Publication of DE60315403T2 publication Critical patent/DE60315403T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H10P76/00—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60315403T 2002-12-20 2003-12-19 Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung und Substrathalter Expired - Lifetime DE60315403T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02258833A EP1431825A1 (de) 2002-12-20 2002-12-20 Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung und Substrathalter
EP02258833 2002-12-20

Publications (2)

Publication Number Publication Date
DE60315403D1 true DE60315403D1 (de) 2007-09-20
DE60315403T2 DE60315403T2 (de) 2008-04-24

Family

ID=32338180

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60315403T Expired - Lifetime DE60315403T2 (de) 2002-12-20 2003-12-19 Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung und Substrathalter

Country Status (8)

Country Link
US (1) US7030967B2 (de)
EP (1) EP1431825A1 (de)
JP (1) JP4057998B2 (de)
KR (1) KR100620981B1 (de)
CN (1) CN100429579C (de)
DE (1) DE60315403T2 (de)
SG (1) SG121845A1 (de)
TW (1) TWI245975B (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7304715B2 (en) * 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR100763251B1 (ko) * 2006-02-01 2007-10-04 삼성전자주식회사 웨이퍼 이송 장치
CN100535762C (zh) * 2007-11-28 2009-09-02 上海微电子装备有限公司 硅片固定部件
JP5656392B2 (ja) * 2009-11-27 2015-01-21 キヤノン株式会社 基板保持装置、それを用いた露光装置、及びデバイスの製造方法
CN101733546B (zh) * 2009-12-22 2012-06-13 中国科学院长春光学精密机械与物理研究所 在凹球面上生成纬线相交网格图形的装置
NL2006536A (en) * 2010-05-13 2011-11-15 Asml Netherlands Bv A substrate table, a lithographic apparatus, a method of flattening an edge of a substrate and a device manufacturing method.
NL2009189A (en) * 2011-08-17 2013-02-19 Asml Netherlands Bv Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method.
JP5891851B2 (ja) * 2012-02-29 2016-03-23 株式会社Sumco シリコンウェーハの表面に形成された酸化膜の除去方法
CN104810315B (zh) * 2014-01-29 2018-07-20 上海微电子装备（集团）股份有限公司 一种用于led基底曝光的夹持装置
WO2016198255A1 (en) 2015-06-11 2016-12-15 Asml Netherlands B.V. Lithographic apparatus and method for loading a substrate
KR20170036165A (ko) * 2015-09-23 2017-04-03 삼성전자주식회사 기판 지지 유닛 및 이를 포함하는 기판 처리 장치
CN108604066B (zh) 2016-02-08 2021-06-29 Asml荷兰有限公司 光刻设备、用于卸载衬底的方法和用于装载衬底的方法
US11378531B1 (en) 2021-02-01 2022-07-05 Applied Materials Israel Ltd. Method for focusing an electron beam on a wafer having a transparent substrate

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6099538A (ja) * 1983-11-01 1985-06-03 横河・ヒュ−レット・パッカ−ド株式会社 ピンチヤツク
JPH0521584A (ja) * 1991-07-16 1993-01-29 Nikon Corp 保持装置
US5923408A (en) * 1996-01-31 1999-07-13 Canon Kabushiki Kaisha Substrate holding system and exposure apparatus using the same
JP4075966B2 (ja) * 1996-03-06 2008-04-16 エーエスエムエル ネザーランズ ビー．ブイ． 差分干渉計システム及びこのシステムを具えたリソグラフステップアンドスキャン装置
US5761023A (en) * 1996-04-25 1998-06-02 Applied Materials, Inc. Substrate support with pressure zones having reduced contact area and temperature feedback
DE69717975T2 (de) * 1996-12-24 2003-05-28 Asml Netherlands B.V., Veldhoven In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
US6576064B2 (en) * 1997-07-10 2003-06-10 Sandia Corporation Support apparatus for semiconductor wafer processing
TW535034B (en) * 1998-03-31 2003-06-01 Asml Netherlands Bv Lithographic projection apparatus with improved substrate holder
EP0947884B1 (de) * 1998-03-31 2004-03-10 ASML Netherlands B.V. Lithographischer Projektionsapparat mit Substrathalter
US6257564B1 (en) * 1998-05-15 2001-07-10 Applied Materials, Inc Vacuum chuck having vacuum-nipples wafer support
JP2000311933A (ja) * 1999-04-27 2000-11-07 Canon Inc 基板保持装置、基板搬送システム、露光装置、塗布装置およびデバイス製造方法ならびに基板保持部クリーニング方法
US6809802B1 (en) * 1999-08-19 2004-10-26 Canon Kabushiki Kaisha Substrate attracting and holding system for use in exposure apparatus
US6799940B2 (en) * 2002-12-05 2004-10-05 Tokyo Electron Limited Removable semiconductor wafer susceptor

Also Published As

Publication number Publication date
EP1431825A1 (de) 2004-06-23
US7030967B2 (en) 2006-04-18
JP4057998B2 (ja) 2008-03-05
TW200428156A (en) 2004-12-16
DE60315403T2 (de) 2008-04-24
TWI245975B (en) 2005-12-21
US20040179183A1 (en) 2004-09-16
SG121845A1 (en) 2006-05-26
KR100620981B1 (ko) 2006-09-13
JP2004214653A (ja) 2004-07-29
CN1510521A (zh) 2004-07-07
KR20040055700A (ko) 2004-06-26
CN100429579C (zh) 2008-10-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition