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DE60132944D1 - Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE60132944D1
DE60132944D1 DE60132944T DE60132944T DE60132944D1 DE 60132944 D1 DE60132944 D1 DE 60132944D1 DE 60132944 T DE60132944 T DE 60132944T DE 60132944 T DE60132944 T DE 60132944T DE 60132944 D1 DE60132944 D1 DE 60132944D1
Authority
DE
Germany
Prior art keywords
making
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60132944T
Other languages
English (en)
Other versions
DE60132944T2 (de
Inventor
Hendricus Wilhelmus Al Janssen
Michael Jozefa Mathijs Renkens
Rob Tabor
Jakob Vijfvinkel
Ronald Maarten Schneider
Theodorus Hubertus J Bisschops
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60132944D1 publication Critical patent/DE60132944D1/de
Publication of DE60132944T2 publication Critical patent/DE60132944T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H10P76/00—
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/02—Sliding-contact bearings
    • F16C29/025—Hydrostatic or aerostatic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0603—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/72—Sealings
    • F16C33/74—Sealings of sliding-contact bearings
    • F16C33/741—Sealings of sliding-contact bearings by means of a fluid
    • F16C33/748—Sealings of sliding-contact bearings by means of a fluid flowing to or from the sealing gap, e.g. vacuum seals with differential exhaust
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
    • F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
    • F16F15/0275—Control of stiffness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2300/00—Application independent of particular apparatuses
    • F16C2300/40—Application independent of particular apparatuses related to environment, i.e. operating conditions
    • F16C2300/62—Application independent of particular apparatuses related to environment, i.e. operating conditions low pressure, e.g. elements operating under vacuum conditions

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • General Physics & Mathematics (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Acoustics & Sound (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
DE60132944T 2000-04-17 2001-04-12 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung Expired - Fee Related DE60132944T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00201355 2000-04-17
EP00201355 2000-04-17

Publications (2)

Publication Number Publication Date
DE60132944D1 true DE60132944D1 (de) 2008-04-10
DE60132944T2 DE60132944T2 (de) 2009-02-19

Family

ID=8171353

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60132944T Expired - Fee Related DE60132944T2 (de) 2000-04-17 2001-04-12 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Country Status (5)

Country Link
US (2) US6597429B2 (de)
JP (2) JP2002025903A (de)
KR (1) KR100592573B1 (de)
DE (1) DE60132944T2 (de)
TW (1) TW509823B (de)

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TW591342B (en) * 2000-11-30 2004-06-11 Asml Netherlands Bv Lithographic projection apparatus and integrated circuit manufacturing method using a lithographic projection apparatus
US20030155882A1 (en) * 2002-02-19 2003-08-21 Nikon Corporation Anti-gravity mount with air and magnets
CN100421024C (zh) 2002-09-30 2008-09-24 Asml荷兰有限公司 光刻装置及器件制造方法
JP4175086B2 (ja) * 2002-10-29 2008-11-05 日本電気株式会社 検査用ウエハ支持装置及び検査用ウエハ支持方法
WO2005026801A2 (en) * 2003-09-12 2005-03-24 Carl Zeiss Smt Ag Apparatus for manipulation of an optical element
US7156174B2 (en) * 2004-01-30 2007-01-02 Halliburton Energy Services, Inc. Contained micro-particles for use in well bore operations
KR20070039926A (ko) * 2004-07-23 2007-04-13 가부시키가이샤 니콘 지지 장치, 스테이지 장치, 노광 장치, 및 디바이스의 제조방법
US7394076B2 (en) 2004-08-18 2008-07-01 New Way Machine Components, Inc. Moving vacuum chamber stage with air bearing and differentially pumped grooves
US7462958B2 (en) * 2004-09-21 2008-12-09 Nikon Corporation Z actuator with anti-gravity
US20060061218A1 (en) * 2004-09-21 2006-03-23 Nikon Corporation Dual force wafer table
US7417714B2 (en) * 2004-11-02 2008-08-26 Nikon Corporation Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage
US7869000B2 (en) * 2004-11-02 2011-01-11 Nikon Corporation Stage assembly with lightweight fine stage and low transmissibility
JP2006140366A (ja) * 2004-11-15 2006-06-01 Nikon Corp 投影光学系及び露光装置
US7193683B2 (en) * 2005-01-06 2007-03-20 Nikon Corporation Stage design for reflective optics
US7459260B2 (en) * 2005-03-29 2008-12-02 Intel Corporation Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method
US7999910B2 (en) * 2005-04-27 2011-08-16 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for manufacturing a mask for semiconductor processing
US20070236854A1 (en) * 2006-04-11 2007-10-11 Lee Martin E Anti-Gravity Device for Supporting Weight and Reducing Transmissibility
US7642523B1 (en) * 2006-05-02 2010-01-05 New Way Machine Components, Inc. Vacuum chamber stage with application of vacuum from below
EP1882983A1 (de) * 2006-07-25 2008-01-30 Carl Zeiss SMT AG Halterung mit Schwerkraftausgleich für ein optisches Element
US8282281B2 (en) * 2007-02-14 2012-10-09 Integrated Dynamics Engineering Gmbh Air bearing with consideration of high-frequency resonances
EP2034593B1 (de) * 2007-09-10 2016-07-13 Etel S. A.. Senkrechter Stellantrieb mit Mitteln für die Kompensation der Schwerkraft
CN102265219B (zh) * 2008-12-11 2014-07-16 卡尔蔡司Smt有限责任公司 投射曝光设备中的光学元件的重力补偿
US9422978B2 (en) * 2013-06-22 2016-08-23 Kla-Tencor Corporation Gas bearing assembly for an EUV light source
JP6563600B2 (ja) * 2015-11-23 2019-08-21 エーエスエムエル ネザーランズ ビー．ブイ． 振動絶縁デバイス、リソグラフィ装置、および振動絶縁システムを調節する方法
DE102015225537B4 (de) 2015-12-17 2019-11-14 Carl Zeiss Smt Gmbh Vorrichtung zur Ausrichtung eines Bauteils, Betätigungseinrichtung und Projektionsbelichtungsanlage
US11249403B2 (en) 2017-08-08 2022-02-15 Asml Netherlands B.V. Vibration isolation system and lithographic apparatus
US11442369B2 (en) * 2017-11-14 2022-09-13 Asml Netherlands B.V. Object stage bearing for lithographic apparatus
WO2020154816A1 (en) 2019-02-01 2020-08-06 Zaber Technologies Inc. Adjustable magnetic counterbalance

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US4349244A (en) 1980-04-23 1982-09-14 Jenoptik Jena Gmbh High quality objective using air bearing
JPS6232613A (ja) 1985-08-05 1987-02-12 Canon Inc 投影露光装置
US4818838A (en) 1988-01-11 1989-04-04 The Perkin-Elmer Corporation Apparatus for preselecting and maintaining a fixed gap between a workpiece and a vacuum seal apparatus in particle beam lithography systems
US5523193A (en) * 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
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US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US5337560A (en) 1992-04-02 1994-08-16 Abdelmalek Fawzy T Shock absorber and a hermetically sealed scroll gas expander for a vehicular gas compression and expansion power system
JP3255707B2 (ja) * 1992-06-02 2002-02-12 日立建機株式会社 微細位置決め装置
JP2881363B2 (ja) 1993-02-02 1999-04-12 キヤノン株式会社 平行移動装置およびレンズ移動装置
JPH08229759A (ja) 1995-02-24 1996-09-10 Canon Inc 位置決め装置並びにデバイス製造装置及び方法
TW316874B (de) 1995-05-30 1997-10-01 Philips Electronics Nv
JP3634483B2 (ja) * 1996-02-13 2005-03-30 キヤノン株式会社 ステージ装置、及びこれを用いた露光装置やデバイス生産方法
WO1997033205A1 (en) * 1996-03-06 1997-09-12 Philips Electronics N.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
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JP2000031007A (ja) * 1998-07-08 2000-01-28 Nikon Corp ステージ装置及びそれを用いた光学装置
TWI242113B (en) * 1998-07-17 2005-10-21 Asml Netherlands Bv Positioning device and lithographic projection apparatus comprising such a device
EP0973067A3 (de) * 1998-07-17 2001-10-24 ASM Lithography B.V. Positionierungsvorrichtung und lithographisches Projektionsapparat mit einer solchen Vorrichtung

Also Published As

Publication number Publication date
US20040001188A1 (en) 2004-01-01
JP2002025903A (ja) 2002-01-25
US20020021425A1 (en) 2002-02-21
DE60132944T2 (de) 2009-02-19
TW509823B (en) 2002-11-11
JP2007251195A (ja) 2007-09-27
US6747731B2 (en) 2004-06-08
US6597429B2 (en) 2003-07-22
KR20010098545A (ko) 2001-11-08
KR100592573B1 (ko) 2006-06-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee