[go: up one dir, main page]

WO2009041254A1 - 有機薄膜トランジスタ - Google Patents

有機薄膜トランジスタ Download PDF

Info

Publication number
WO2009041254A1
WO2009041254A1 PCT/JP2008/066248 JP2008066248W WO2009041254A1 WO 2009041254 A1 WO2009041254 A1 WO 2009041254A1 JP 2008066248 W JP2008066248 W JP 2008066248W WO 2009041254 A1 WO2009041254 A1 WO 2009041254A1
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
film transistor
organic thin
organic
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/066248
Other languages
English (en)
French (fr)
Inventor
Hiroaki Nakamura
Yuki Nakano
Masatoshi Saito
Hirofumi Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Idemitsu Kosan Co Ltd
Original Assignee
Idemitsu Kosan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007249132A external-priority patent/JP2009081265A/ja
Priority claimed from JP2008196278A external-priority patent/JP5180723B2/ja
Application filed by Idemitsu Kosan Co Ltd filed Critical Idemitsu Kosan Co Ltd
Priority to US12/679,634 priority Critical patent/US8525156B2/en
Priority to EP08833663A priority patent/EP2194582A4/en
Priority to CN200880108574A priority patent/CN101809749A/zh
Publication of WO2009041254A1 publication Critical patent/WO2009041254A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/484Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/464Lateral top-gate IGFETs comprising only a single gate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/466Lateral bottom-gate IGFETs comprising only a single gate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/484Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
    • H10K10/486Insulated gate field-effect transistors [IGFETs] characterised by the channel regions the channel region comprising two or more active layers, e.g. forming pn heterojunctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/30Organic light-emitting transistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/191Deposition of organic active material characterised by provisions for the orientation or alignment of the layer to be deposited
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • H10K85/111Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/115Polyfluorene; Derivatives thereof
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • H10K85/151Copolymers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/631Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/631Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
    • H10K85/633Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine comprising polycyclic condensed aromatic hydrocarbons as substituents on the nitrogen atom
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/10Definition of the polymer structure
    • C08G2261/12Copolymers
    • C08G2261/124Copolymers alternating
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/10Definition of the polymer structure
    • C08G2261/22Molecular weight
    • C08G2261/222Molecular weight monodisperse
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/10Definition of the polymer structure
    • C08G2261/22Molecular weight
    • C08G2261/226Oligomers, i.e. up to 10 repeat units
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/30Monomer units or repeat units incorporating structural elements in the main chain
    • C08G2261/31Monomer units or repeat units incorporating structural elements in the main chain incorporating aromatic structural elements in the main chain
    • C08G2261/314Condensed aromatic systems, e.g. perylene, anthracene or pyrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/30Monomer units or repeat units incorporating structural elements in the main chain
    • C08G2261/31Monomer units or repeat units incorporating structural elements in the main chain incorporating aromatic structural elements in the main chain
    • C08G2261/316Monomer units or repeat units incorporating structural elements in the main chain incorporating aromatic structural elements in the main chain bridged by heteroatoms, e.g. N, P, Si or B
    • C08G2261/3162Arylamines
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/70Post-treatment
    • C08G2261/76Post-treatment crosslinking
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/90Applications
    • C08G2261/92TFT applications
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2101/00Properties of the organic materials covered by group H10K85/00
    • H10K2101/30Highest occupied molecular orbital [HOMO], lowest unoccupied molecular orbital [LUMO] or Fermi energy values

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Thin Film Transistor (AREA)

Abstract

 少なくとも基板上にゲート電極、ソース電極及びドレイン電極の3端子、絶縁体層並びに有機半導体層が設けられ、ソース-ドレイン間電流をゲート電極に電圧を印加することによって制御する有機薄膜トランジスタであって、有機半導体層と絶縁体層の間に、イオン化ポテンシャルが5.8eV未満である非晶質有機化合物を含むチャネル制御層を有する有機薄膜トランジスタは、高温保存した場合でも電界効果移動度の安定性に優れ、かつ応答速度が大きい。
PCT/JP2008/066248 2007-09-26 2008-09-09 有機薄膜トランジスタ Ceased WO2009041254A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/679,634 US8525156B2 (en) 2007-09-26 2008-09-09 Organic thin film transistor having an amorphous channel control layer with specified inozation potential
EP08833663A EP2194582A4 (en) 2007-09-26 2008-09-09 ORGANIC THIN-LAYER TRANSISTOR
CN200880108574A CN101809749A (zh) 2007-09-26 2008-09-09 有机薄膜晶体管

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007249132A JP2009081265A (ja) 2007-09-26 2007-09-26 有機薄膜トランジスタ
JP2007-249132 2007-09-26
JP2008196278A JP5180723B2 (ja) 2008-07-30 2008-07-30 有機薄膜トランジスタ
JP2008-196278 2008-07-30

Publications (1)

Publication Number Publication Date
WO2009041254A1 true WO2009041254A1 (ja) 2009-04-02

Family

ID=40511143

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066248 Ceased WO2009041254A1 (ja) 2007-09-26 2008-09-09 有機薄膜トランジスタ

Country Status (6)

Country Link
US (1) US8525156B2 (ja)
EP (1) EP2194582A4 (ja)
KR (1) KR20100057074A (ja)
CN (1) CN101809749A (ja)
TW (1) TW200933944A (ja)
WO (1) WO2009041254A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8525156B2 (en) 2007-09-26 2013-09-03 Idemitsu Kosan Co., Ltd. Organic thin film transistor having an amorphous channel control layer with specified inozation potential
JP2013536570A (ja) * 2010-07-02 2013-09-19 プレックストロニクス インコーポレーティッド 正孔輸送組成物ならびに関連するデバイスおよび方法(i)
CN104183761A (zh) * 2013-05-22 2014-12-03 海洋王照明科技股份有限公司 倒置有机电致发光器件及其制备方法
US20230024193A1 (en) * 2020-02-26 2023-01-26 The University Of Tokyo Transistor-type sensor

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5309532B2 (ja) * 2007-11-08 2013-10-09 サンケン電気株式会社 窒化物系化合物半導体装置
GB2456298A (en) 2008-01-07 2009-07-15 Anthony Ian Newman Electroluminescent materials comprising oxidation resistant fluorenes
CN102329414B (zh) * 2010-07-12 2012-10-10 海洋王照明科技股份有限公司 含环戊二烯二噻吩-萘四羧酸二酰亚胺共轭聚合物及其制备方法和应用
DE102010031979B4 (de) * 2010-07-22 2014-10-30 Novaled Ag Halbleiterbauelement, Verfahren zu dessen Herstellung, Verwendung des Halbleiterbauelementes und Inverter mit zwei Halbleiterbauelementen
EP2657960A1 (en) * 2010-12-22 2013-10-30 Mitsubishi Chemical Corporation Field-effect transistor, process for producing the same, and electronic device including the same
ITMI20102406A1 (it) * 2010-12-27 2012-06-28 E T C Srl Una piattaforma comprendente un transistor organico ad effetto di campo per applicazioni mediche e biologiche
WO2012090891A1 (ja) * 2010-12-27 2012-07-05 パナソニック株式会社 電界効果トランジスタおよびその製造方法
KR102008034B1 (ko) * 2011-07-11 2019-08-06 메르크 파텐트 게엠베하 유기 전계발광 소자용 화합물
WO2013149678A1 (en) 2012-04-05 2013-10-10 Novaled Ag Organic field effect transistor and method for producing the same
GB201208115D0 (en) * 2012-05-09 2012-06-20 Lomox Ltd Oilgomeric organic light emitting diode (OLED) materrials containing multiple crosslinking functions
US9082983B1 (en) * 2012-05-16 2015-07-14 The United States Of America As Represented By The Secretary Of The Navy Solution processable thin-film transistors
TWI493765B (zh) * 2012-08-07 2015-07-21 E Ink Holdings Inc 有機半導體元件及其製作方法
WO2014102625A1 (en) * 2012-12-24 2014-07-03 Indian Institute Of Technology Kanpur Thin film transistor with a current-induced channel
CN105051906B (zh) * 2013-03-15 2018-12-07 应用材料公司 用于tft的金属氧化物半导体的缓冲层
EP2790238B1 (en) 2013-04-10 2018-08-22 Novaled GmbH Organic field effect transistor and method for production
US9472396B2 (en) * 2014-04-15 2016-10-18 University Of Central Florida Research Foundation, Inc. Plasma treated semiconductor dichalcogenide materials and devices therefrom
GB201411621D0 (en) * 2014-06-30 2014-08-13 Cambridge Display Tech Ltd Organic transistor
TWI560781B (en) * 2014-09-10 2016-12-01 Au Optronics Corp Method for fabricating thin film transistor and apparatus thereof
JP6816101B2 (ja) * 2016-03-01 2021-01-20 パイオニア株式会社 発光装置の製造方法
CN108878650B (zh) * 2017-05-10 2021-12-03 元太科技工业股份有限公司 有机薄膜晶体管
US20220045274A1 (en) * 2020-08-06 2022-02-10 Facebook Technologies Llc Ofets having organic semiconductor layer with high carrier mobility and in situ isolation
KR102540663B1 (ko) * 2021-04-29 2023-06-12 이화여자대학교 산학협력단 병솔 고분자를 포함하는 트랜지스터 게이트절연층용 고분자 박막 및 이를 포함하는 유기전계효과트랜지스터
CN114420844A (zh) * 2022-01-19 2022-04-29 南京邮电大学 聚合物驻极体有机场效应晶体管存储器在生物突触模拟中的应用
CN115207205B (zh) * 2022-07-27 2023-04-25 广东工业大学 一种薄膜振动装置及其制备方法、应用其的清洗装置

Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0555568A (ja) 1991-08-28 1993-03-05 Asahi Chem Ind Co Ltd 有機薄膜トランジスタ
JPH08228034A (ja) 1994-12-09 1996-09-03 At & T Corp 有機薄膜トランジスタ装置
JPH10135481A (ja) 1996-10-15 1998-05-22 Lucent Technol Inc 薄膜トランジスタからなるデバイス
JPH1161406A (ja) 1997-08-27 1999-03-05 Sekisui Chem Co Ltd 反射・帯電防止膜の製造方法
JPH1176800A (ja) 1997-07-17 1999-03-23 Nippon Paint Co Ltd 貴金属又は銅の固体ゾル及び製造方法並びに塗料組成物及び樹脂成型物
JPH1180647A (ja) 1997-07-17 1999-03-26 Nippon Paint Co Ltd 貴金属又は銅のコロイド溶液及びその製造方法並びに塗料組成物及び樹脂成型物
JPH11133205A (ja) 1997-04-21 1999-05-21 Sekisui Chem Co Ltd 反射防止膜の製造方法
JPH11319538A (ja) 1998-05-20 1999-11-24 Nippon Paint Co Ltd 貴金属又は銅のコロイドの製造方法
JP2000029403A (ja) * 1998-05-29 2000-01-28 Lucent Technol Inc 有機発光ダイオ―ドとモノリシックに集積化された薄膜トランジスタ
JP2000123634A (ja) 1998-08-10 2000-04-28 Vacuum Metallurgical Co Ltd Cu超微粒子独立分散液
JP2000121804A (ja) 1998-10-09 2000-04-28 Sekisui Chem Co Ltd 反射防止フィルム
JP2000124157A (ja) 1998-08-10 2000-04-28 Vacuum Metallurgical Co Ltd Cu薄膜の形成法
JP2000147209A (ja) 1998-09-09 2000-05-26 Sekisui Chem Co Ltd 反射防止フィルム及びその製造方法
JP2000185362A (ja) 1998-12-24 2000-07-04 Sekisui Chem Co Ltd 金属元素含有薄膜積層体の製造方法
JP2000239853A (ja) 1999-02-25 2000-09-05 Nippon Paint Co Ltd 金属薄膜の形成方法及び反射型液晶表示装置用反射板の製造方法
JP2001035255A (ja) 1999-07-22 2001-02-09 Vacuum Metallurgical Co Ltd 銀超微粒子独立分散液
JP2001053028A (ja) 1999-08-11 2001-02-23 Vacuum Metallurgical Co Ltd Cu薄膜の形成法
JP2001254185A (ja) 2000-03-13 2001-09-18 Vacuum Metallurgical Co Ltd 導電性金属薄膜の形成方法およびその方法に使用する導電性金属超微粒子分散物
JP2003318196A (ja) * 2002-04-24 2003-11-07 Ricoh Co Ltd 能動素子及びそれを有する表示装置
WO2005056505A1 (ja) * 2003-12-15 2005-06-23 Idemitsu Kosan Co., Ltd. 芳香族化合物およびそれを用いた有機エレクトロルミネッセンス素子
JP2006303459A (ja) * 2005-03-24 2006-11-02 Semiconductor Energy Lab Co Ltd 半導体装置、及びその製造方法
WO2006120859A1 (ja) * 2005-05-09 2006-11-16 Idemitsu Kosan Co., Ltd. 新規有機エレクトロルミネッセンス材料、それを用いた有機エレクトロルミネッセンス素子及び有機エレクトロルミネッセンス用薄膜形成溶液
JP2007103819A (ja) * 2005-10-07 2007-04-19 Toyo Ink Mfg Co Ltd 有機エレクトロルミネッセンス素子用材料
JP2007220772A (ja) * 2006-02-15 2007-08-30 Idemitsu Kosan Co Ltd 有機エレクトロルミネッセンス用高分子化合物及びその製造方法
JP2007527119A (ja) * 2004-02-26 2007-09-20 メルク パテント ゲーエムベーハー 有機半導体を架橋するための方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003282884A (ja) 2002-03-26 2003-10-03 Kansai Tlo Kk サイドゲート型有機fet及び有機el
JP4530334B2 (ja) * 2004-01-21 2010-08-25 国立大学法人京都大学 有機半導体装置、ならびにそれを用いた表示装置および撮像装置
EP1645610A1 (de) * 2004-10-11 2006-04-12 Covion Organic Semiconductors GmbH Phenanthren-Derivate
JP4653469B2 (ja) * 2004-12-01 2011-03-16 出光興産株式会社 有機電界発光素子
KR20080020789A (ko) * 2006-09-01 2008-03-06 엘지전자 주식회사 슬라이드 쇼 점프 기능을 구비한 영상기기 및 그 제어방법
KR20100057074A (ko) 2007-09-26 2010-05-28 이데미쓰 고산 가부시키가이샤 유기 박막 트랜지스터

Patent Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0555568A (ja) 1991-08-28 1993-03-05 Asahi Chem Ind Co Ltd 有機薄膜トランジスタ
JPH08228034A (ja) 1994-12-09 1996-09-03 At & T Corp 有機薄膜トランジスタ装置
JPH10135481A (ja) 1996-10-15 1998-05-22 Lucent Technol Inc 薄膜トランジスタからなるデバイス
JPH11133205A (ja) 1997-04-21 1999-05-21 Sekisui Chem Co Ltd 反射防止膜の製造方法
JPH1176800A (ja) 1997-07-17 1999-03-23 Nippon Paint Co Ltd 貴金属又は銅の固体ゾル及び製造方法並びに塗料組成物及び樹脂成型物
JPH1180647A (ja) 1997-07-17 1999-03-26 Nippon Paint Co Ltd 貴金属又は銅のコロイド溶液及びその製造方法並びに塗料組成物及び樹脂成型物
JPH1161406A (ja) 1997-08-27 1999-03-05 Sekisui Chem Co Ltd 反射・帯電防止膜の製造方法
JPH11319538A (ja) 1998-05-20 1999-11-24 Nippon Paint Co Ltd 貴金属又は銅のコロイドの製造方法
JP2000029403A (ja) * 1998-05-29 2000-01-28 Lucent Technol Inc 有機発光ダイオ―ドとモノリシックに集積化された薄膜トランジスタ
JP2000124157A (ja) 1998-08-10 2000-04-28 Vacuum Metallurgical Co Ltd Cu薄膜の形成法
JP2000123634A (ja) 1998-08-10 2000-04-28 Vacuum Metallurgical Co Ltd Cu超微粒子独立分散液
JP2000147209A (ja) 1998-09-09 2000-05-26 Sekisui Chem Co Ltd 反射防止フィルム及びその製造方法
JP2000121804A (ja) 1998-10-09 2000-04-28 Sekisui Chem Co Ltd 反射防止フィルム
JP2000185362A (ja) 1998-12-24 2000-07-04 Sekisui Chem Co Ltd 金属元素含有薄膜積層体の製造方法
JP2000239853A (ja) 1999-02-25 2000-09-05 Nippon Paint Co Ltd 金属薄膜の形成方法及び反射型液晶表示装置用反射板の製造方法
JP2001035255A (ja) 1999-07-22 2001-02-09 Vacuum Metallurgical Co Ltd 銀超微粒子独立分散液
JP2001053028A (ja) 1999-08-11 2001-02-23 Vacuum Metallurgical Co Ltd Cu薄膜の形成法
JP2001254185A (ja) 2000-03-13 2001-09-18 Vacuum Metallurgical Co Ltd 導電性金属薄膜の形成方法およびその方法に使用する導電性金属超微粒子分散物
JP2003318196A (ja) * 2002-04-24 2003-11-07 Ricoh Co Ltd 能動素子及びそれを有する表示装置
WO2005056505A1 (ja) * 2003-12-15 2005-06-23 Idemitsu Kosan Co., Ltd. 芳香族化合物およびそれを用いた有機エレクトロルミネッセンス素子
JP2007527119A (ja) * 2004-02-26 2007-09-20 メルク パテント ゲーエムベーハー 有機半導体を架橋するための方法
JP2006303459A (ja) * 2005-03-24 2006-11-02 Semiconductor Energy Lab Co Ltd 半導体装置、及びその製造方法
WO2006120859A1 (ja) * 2005-05-09 2006-11-16 Idemitsu Kosan Co., Ltd. 新規有機エレクトロルミネッセンス材料、それを用いた有機エレクトロルミネッセンス素子及び有機エレクトロルミネッセンス用薄膜形成溶液
JP2007103819A (ja) * 2005-10-07 2007-04-19 Toyo Ink Mfg Co Ltd 有機エレクトロルミネッセンス素子用材料
JP2007220772A (ja) * 2006-02-15 2007-08-30 Idemitsu Kosan Co Ltd 有機エレクトロルミネッセンス用高分子化合物及びその製造方法

Non-Patent Citations (12)

* Cited by examiner, † Cited by third party
Title
"Kagaku Binran Kiso-hen II", 1983, MARUZEN CO. , LTD., pages: 493
"Kagaku Binran Kiso-hen II", 1983, MARUZEN CO., LTD., pages: 493
C.W. TANG; S.A. VANSLYKE, APPL. PHYS. LETT., vol. 51, 1987, pages 913
H. FUCHIGAMI ET AL., APPLIED PHYSICS LETTER, vol. 63, 1993, pages 1372
HOROWITZ ET AL., ADVANCED MATERIALS, vol. 8, no. 3, 1996, pages 242
ISHIKAWA ET AL.: "Preprint of The 54th Spring Meeting", JSAP AND RELATED SOCIETIES, vol. 30A-W-11, 2007, pages 1424
JANOS VERES ET AL., CHEM. MATER., vol. 16, 2004, pages 4543 - 4555
LAY-LAY CHUA ET AL., NATURE, vol. 434, 10 March 2005 (2005-03-10), pages 194
MYUNG-HAN YOON ET AL., J. AM. CHEM. SOC, vol. 127, 2005, pages 10388 - 10395
See also references of EP2194582A4
T.P.I. SARAGI; T. FUHRMANN-LIEKER; J. SALBECK: "Comparison of Charge Transport in Thin Films of Spiro-Linked Compounds and Their Corresponding Parent Compounds", ADVANCED FUNCTIONAL MATERIALS, vol. 16, 2006, pages 966
YASUDA ET AL., JPN. J. APPL. PHYS., vol. 42, 2003

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8525156B2 (en) 2007-09-26 2013-09-03 Idemitsu Kosan Co., Ltd. Organic thin film transistor having an amorphous channel control layer with specified inozation potential
JP2013536570A (ja) * 2010-07-02 2013-09-19 プレックストロニクス インコーポレーティッド 正孔輸送組成物ならびに関連するデバイスおよび方法(i)
CN104183761A (zh) * 2013-05-22 2014-12-03 海洋王照明科技股份有限公司 倒置有机电致发光器件及其制备方法
US20230024193A1 (en) * 2020-02-26 2023-01-26 The University Of Tokyo Transistor-type sensor

Also Published As

Publication number Publication date
TW200933944A (en) 2009-08-01
CN101809749A (zh) 2010-08-18
EP2194582A1 (en) 2010-06-09
KR20100057074A (ko) 2010-05-28
US20100283041A1 (en) 2010-11-11
US8525156B2 (en) 2013-09-03
EP2194582A4 (en) 2012-01-04

Similar Documents

Publication Publication Date Title
WO2009041254A1 (ja) 有機薄膜トランジスタ
WO2009028660A1 (ja) 有機薄膜トランジスタ及び有機薄膜発光トランジスタ
TW200735375A (en) Organic thin film transistor and organic thin film luminescence transistor
US9728560B2 (en) TFT substrate structure
TW200419810A (en) Structure of thin-film transistor, and the manufacturing method thereof
WO2009044614A1 (ja) 有機半導体装置
JP2011146574A5 (ja) トランジスタの駆動方法及び該方法で駆動されるトランジスタを含む表示装置
ATE526686T1 (de) Dünnschicht-feldeffekttransistor und anzeige
WO2009028460A1 (ja) ベンゾジチオフェン誘導体並びにそれを用いた有機薄膜トランジスタ及び有機薄膜発光トランジスタ
WO2013126698A3 (en) Flexible high-voltage thin film transistors
WO2009060731A1 (ja) 有機薄膜トランジスタの製造方法及び有機薄膜トランジスタ
TW200715562A (en) Thin film transistor substrate and fabrication thereof
WO2008099528A1 (ja) 表示装置、表示装置の製造方法
Koo et al. Novel organic inverters with dual-gate pentacene thin-film transistor
Cho et al. Passivation of bottom-gate IGZO thin film transistors
WO2008117362A1 (ja) 有機トランジスタ及びその製造方法
GB2434033A (en) Organic transistor
WO2008156121A1 (ja) 有機薄膜トランジスタ及び有機薄膜発光トランジスタ
TW200729508A (en) Thin-film transistor panel and method for manufacturing the same
CN104183649A (zh) 一种阈值电压可调的薄膜晶体管
TW200644242A (en) Ambipolar organic thin-film field-effect transistor and method for making the same
US9356248B2 (en) Organic thin-film transistor
Gupta et al. Mobility estimation incorporating the effects of contact resistance and gate voltage dependent mobility in top contact organic thin film transistors
KR101450841B1 (ko) 박막 트랜지스터 및 그 제조방법
문연건 et al. Characteristics of ZnO-based TFT using La2O3 high-k dielectrics

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880108574.3

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08833663

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2008833663

Country of ref document: EP

ENP Entry into the national phase

Ref document number: 20107006448

Country of ref document: KR

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 12679634

Country of ref document: US