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WO1992019540A1 - Organosol d'oxyde d'antimoine et composition de revetement le contenant - Google Patents

Organosol d'oxyde d'antimoine et composition de revetement le contenant Download PDF

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Publication number
WO1992019540A1
WO1992019540A1 PCT/JP1992/000536 JP9200536W WO9219540A1 WO 1992019540 A1 WO1992019540 A1 WO 1992019540A1 JP 9200536 W JP9200536 W JP 9200536W WO 9219540 A1 WO9219540 A1 WO 9219540A1
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WO
WIPO (PCT)
Prior art keywords
antimony oxide
sol
coating composition
dispersion medium
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP1992/000536
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English (en)
Japanese (ja)
Inventor
Hiroyasu Nishida
Yoshichika Tanaka
Michio Komatsu
Teruo Migita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JGC Catalysts and Chemicals Ltd
Original Assignee
Catalysts and Chemicals Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Catalysts and Chemicals Industries Co Ltd filed Critical Catalysts and Chemicals Industries Co Ltd
Priority to US08/137,140 priority Critical patent/US5785892A/en
Publication of WO1992019540A1 publication Critical patent/WO1992019540A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G30/00—Compounds of antimony
    • C01G30/004—Oxides; Hydroxides; Oxyacids
    • C01G30/005—Oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/0004—Preparation of sols
    • B01J13/0021—Preparation of sols containing a solid organic phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/0004—Preparation of sols
    • B01J13/0026—Preparation of sols containing a liquid organic phase
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/40—Electric properties
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Definitions

  • the present invention relates to an antimony oxide sol using a photocurable resin monomer as a dispersion medium, and a coating composition containing the sol.
  • antimony oxide is a flame-retardant substance
  • antimony oxide having a pi-mouthed chlorite structure is a conductive substance (Journal of the Chemical Society of Japan, No. 4 (1989)). 3 years), p. 488).
  • antimony oxide particles Conventionally, the use of antimony oxide particles has been focused on flame retardancy, and coating compositions containing antimony oxide particles have been applied to the surface of plastics, woven fabrics, and other articles. It has been put to practical use to form a flame-retardant film.
  • a coating composition containing antimony oxide particles is used.
  • the antimony oxide particles be prepared as a colloid solution, that is, as an antimony oxide sol.
  • Japanese Patent Application Laid-Open No. Sho 60-251129 discloses the following formula of an amount corresponding to 0.5 to 25% by weight of antimony oxide. Dispersed in the organosilicon compound represented by A hydrosol having a pH of 2.5 to 12 in which the surface of a colloidal antimony oxide is modified is described.
  • R does not contain an amino group, a mercapto group, a methacryloxy group or a halogen atom ((to (: a hydrocarbon group of 8 ; R 1 and R 2 represent a hydrocarbon group of to C 4 ; And R 3 is ((-C 4 alkyl, alkoxy substituted alkyl or acetyl)
  • the above-mentioned antimony oxide hydrosol is compatible with ordinary organic solvents such as alcohols and ketones, and is supposedly drip-proof. However, other organic compounds that are liquid at room temperature, such as light
  • This hydrosol is compatible with the vinyl monomer or oligomer (hereinafter also referred to as photocurable monomer or oligomer) constituting the curable resin because of the dispersoid, antimony oxide. Only when the surface is modified with a relatively large amount of the above-mentioned organosilicon compound, antimony oxide having a relatively small amount of the organosilicon compound contributing to the surface modification is mixed with a vinyl monomer or oligomer. Then, there is an inconvenience of gelation.
  • Japanese Patent Application Laid-Open No. 62-95130 discloses that at least 80 mol% of the dispersion medium is occupied by a monomer which is cured by light energy such as ultraviolet rays, electron beams, 7 rays and X rays.
  • An organosol in which the dispersoid is silica, alumina or iron oxide is described.
  • the production method of the organosol taught by the above-mentioned publication is based on an organosol using a silica or alumina hydrosol or an alcohol as a dispersion medium as a starting material, mixing a photocurable monomer with the starting material, and then adding water or water under reduced pressure. It consists of removing the alcohol and replacing the dispersion medium of the sol with a photocurable monomer. Therefore, in order to prepare an organomonomer of antimony oxide using a photocurable monomer as a dispersion medium by using this method, a hydrosol or alcohol of antimony oxide as a starting material is used as a dispersion medium. An organosol must be prepared.
  • organosols of antimony oxide that are homogeneously mixed with photocurable monomers have not yet been developed.
  • hydrosol among the conventionally known antimony oxide mouth sols, the fact that it is homogeneously mixed with the photocurable monomer is described in Japanese Patent Application Laid-Open No. 60-25111 described above.
  • Japanese Patent Publication No. 29 only a hydrosol in which the surface of antimony oxide has been modified with a large amount of an organosilicon compound that sacrifices the conductivity of antimony oxide remains. Therefore, in the prior art, a photocurable monomer is used as a dispersion medium, However, it is impossible to prepare an organosol containing an antimony oxide whose conductivity is not impaired as a dispersoid.
  • One of the objects of the present invention is to use an organic solvent that is intimately mixed with a photocurable monomer or oligomer as a dispersion medium, and disperse antimony oxide in this state without substantially impairing its conductivity.
  • Another object of the present invention is to provide an antimony oxide sol.
  • Another object of the present invention is to provide an organoantimony oxide sol in which most of the dispersion medium of the sol is made of a photocurable monomer or oligomer, and the dispersoid is made of colloidal antimony oxide having conductivity. .
  • Another object of the present invention is to provide a coating composition containing the above-mentioned antimony oxide sol.
  • Still another object of the present invention is to provide a synthetic resin molded article provided with a coating film of the above-mentioned organoantimony oxide sol-containing coating composition.
  • the organoantimony oxide sol according to the present invention comprises an antimony oxide sol having a colloidal antimony oxide particle having a pi-mouth structure as a dispersoid, and an organic solvent as a dispersion medium. Characterized by being treated with the organosilicon compound represented by the general formula (1).
  • R 2 is hydrogen or (: ⁇ ⁇ -C 5 alkyl group
  • R 8 is hydrogen or an alkyl group of ⁇ C
  • R represents (: -C n alkylene group
  • R is hydrogen or an alkyl group of -C 8,
  • i is an integer from 1 to 3
  • j is an integer from 0 to 2
  • the dispersion medium is ordinary alcohol, ketone, aliphatic hydrocarbon, alicyclic hydrocarbon, or aromatic. It may be a common organic solvent exemplified by aromatic hydrocarbons, but is preferably a photocurable monomer.
  • the colloidal antimony oxide particles which are dispersoids, do not necessarily have to be pure antimony oxide as long as the antimony oxide has a pyrochlore structure. Therefore, antimony oxide having a pyrochlore structure is mainly used, and different elements such as silicon, zinc, tin, indium, phosphorus, boron, titanium, zirconium, hafnium, selenium, iron, tellurium, and tungsten are used.
  • the doped composite antimony oxide particles are included in the colloidal antimony oxide particles referred to in the present invention.
  • An alkaline suspension of antimony trioxide is prepared by dispersing antimony trioxide and an alkaline substance in water in a molar ratio of 1: 2.0 to 2.5.
  • the concentration of antimony trioxide in this suspension is preferably in the range of 3 to 15% by weight.
  • the suspension is heated to a temperature of 50 ° C or higher, and a hydrogen peroxide solution having a concentration of 5 to 35% by weight is added to the suspension in an amount of 0.2 mol or less of hydrogen peroxide per mol of antimony trioxide in the suspension.
  • the reaction is carried out dropwise at a speed.
  • the resulting reaction mixture was passed through a cation-exchange resin to remove alkali ions, and then heated to form a zole, which was then treated with an ultrafiltration membrane to obtain an antimony oxide. Get a drosol (concentration 5-40% by weight).
  • An organosilicon compound represented by the following general formula (2) and an organic solvent represented by a lower alcohol are added to a hydrosol of antimony oxide, and the mixture is stirred at a temperature of 30 to 70 ° C and a temperature of 0.5 to 5 ° C. By preserving the time, the pretreatment of the colloidal antimony oxide particles is completed.
  • • is a hydrocarbon group of C chi -C, alkyl group, vinyl group, ⁇
  • Examples include a lil group and an acetyl group.
  • Examples of the organosilicon compound represented by the above general formula (2) include tetramethoxysilane, methyltrimethoxysilane, dimethyldimethoxysilane, trimethylmethoxysilane. Tetraethoxysilane, and methylethoxysilane.
  • Alkoxysilanes such as riboxysilane, methyltriisopropoxysilane and phenyltriethoxysilane: In addition to vinylalkoxysilanes such as vinyltriethoxysilane, vinylsilanes can also be used.
  • the addition amount of the organic silicon compound of the general formula (2) is a S i 0 9 terms, S b n 0 F 1 mole contained in human Dorozoru, 0.01 to 0.8 mol, good or properly in the range of 0.2 to 5 moles It is in. If the amount added is less than 0.01 mol, the stability of the finally obtained organoantimony oxide sol is poor, and if it exceeds 0.8 mol, the conductivity of the colloidal antimony oxide particles is impaired.
  • organic solvent used in the step (ii) examples include alcohols such as methanol, ethanol, isoprononol, and n-butanol, and methylsolvent solvent, ethyl chloride solvent solvent, A water-soluble or water-miscible organic solvent such as acetate can be exemplified. Above all, the boiling point is 100. Organic solvents of C or less are preferred because they can be easily replaced with photocurable monomers.
  • the organosilicon compound of the general formula (2) and the organic solvent can be added to the antimony oxide hydrosol at the same time.
  • the organic solvent is added first, and then the organosilicon compound of the general formula (2) is added. Either adding the compound or pre-mixing the organic solvent with the organosilicon compound of the general formula (2) and adding the mixture to the hydrosol I prefer to do that.
  • the amount of organic solvent added initially desirable to moderate such that the S b 2 0 5 concentration in the sol becomes 3-20 wt% arbitrariness.
  • the sol pretreated in the above step (ii) is concentrated by a known means, for example, such as evaporation or ultrafiltration, and then diluted by adding the above-mentioned water-soluble or water-miscible organic solvent. Then, by repeating the operation of concentrating the water, the water contained in the dispersion medium of the sol is replaced with an organic solvent. In this case, the amount of water remaining in the sol, to implement the above operation until the 3 wt% or less, correct preferred to adjust the S b 2 0 5 concentration in the sol in the range of 20-40 wt% .
  • the organosilicon compound represented by the above-mentioned formula (1) is added to the antimony oxide sol obtained in step (iii), and the mixture is reacted at a temperature of 40 to 90 for 0.5 to 5 hours with stirring. Thereby, the surface modification of the target colloidal antimony oxide is completed.
  • organosilicon compound represented by the general formula (1) examples include 7-methacryloxypropyl trimethoxysilane, 7-methacryloxy lip mouth, prill triethoxysilane, and ⁇ -methacryloxypropyl methyl. Examples include dimethoxysilane, tris (-methacryloxyshethyl) propoxysilane, and acryloxyprovir triethoxysilane.
  • reaction amount is less than 0.004 mol, gelling is likely to occur when the antimony oxide sol is mixed with a photocurable monomer, and if the reaction amount exceeds 0.12 mol, the antimony oxide will be used.
  • the film forming property of the sol that is, the photocurability, is reduced.
  • the organic solvent used in the step (ii) needs to be water-soluble or water-miscible. If is soluble in a water-soluble or water-miscible organic solvent, it can be used provided that it is used in combination with a water-soluble or water-miscible organic solvent. The same applies to the organic solvent used in the step (iii). Rather, in this step, the organic solvent is soluble in a water-soluble or water-miscible organic solvent and in a water-soluble or water-miscible organic solvent that is sparingly soluble in water.
  • the dispersion medium of the organoantimony oxide sol can be made into a two-component system consisting of a water-soluble or water-miscible organic solvent and a poorly water-soluble organic solvent. It is possible to use a one-component system consisting of only a poorly water-soluble organic solvent.
  • step (i) of preparing a hydrosol of antimony oxide Si, Zn, Sn, In, P, B, Ti, Zr were added to an alkali suspension of antimony trioxide. , Hf, Ce, Fe, Te, W, and other compounds containing different elements coexist to prepare a heterosol-doped antimony oxide hydrosol, which is used in step (i).
  • a heterosol-doped antimony oxide hydrosol which is used in step (i).
  • the organoantimony oxide sol of the present invention thus produced can be used for exactly the same purpose as the conventional antimony oxide sol and can be used for the same purpose. Therefore, various coating compositions can be prepared using the organoantimony sol of the present invention as it is. In this case, when the conventional antimony oxide sol is mixed with a monomer or oligomer which is a main component of the coating composition, gelation is not uncommon, but the organoantimony sol of the present invention has a colloidal oxide. Since antimony is surface-modified as described above, there is no concern about such gelling.
  • the dispersing medium of the organosol is generally an organic solvent, not limited to the antimony oxide sol
  • the organic solvent is first removed from the coating film. It is customary to evaporate off by heating. For this reason, it is preferable that the organosol to be combined with the coating composition for articles that do not want to be heated does not substantially contain an organic solvent.
  • the antimony oxide sol of the present invention can easily replace most of the dispersion medium with a photocurable monomer.
  • This dispersion medium replacement can be carried out in the same manner as in the step (iii) described above.
  • the resultant is subjected to a photocurable monomer or oligomer. And then By repeating the operation of concentrating this by known means such as evaporation or ultrafiltration, the amount of the organic solvent remaining in the antimony oxide sol is reduced to 20% by weight or less, preferably 10% by weight or less.
  • S b 2 0 with 5 concentration is 1 0-70% by weight rollers can Rukoto give organo oxide antimony Nzoru to substantially photocurable monomers or cage Goma dispersant.
  • the average particle size of antimony oxide dispersed in the organosol thus obtained is preferably in the range of 5 to 100 nanometers, and preferably in the range of 10 to 50 nanometers.
  • photocurable monomers or oligomers examples include monomers such as aryl acrylate, benzyl acrylate, butoxyl acrylate, butyl acrylate, and butyl acrylate.
  • the antimony oxide sol according to the present invention has a dispersoid acid Since the conductivity of the antimony fluoride particles is not impaired, if this is mixed with the photocurable resin composition, a coating composition for imparting conductivity to the substrate can be obtained.
  • the photocurable resin composition refers to a composition containing a monomer or an oligomer that starts polymerization by light energy such as ultraviolet light, electron beam, or radiation. Usually, these polymerization reactions are carried out in the presence of a photopolymerization initiator under ultraviolet light having low light energy.
  • a hydrogen abstraction type photopolymerization initiator such as isopropylthioxanthone, benzophenone, 2-ethylanthraquinone and isobutylthioxanthone is preferable.
  • the amount of the organoantimony oxide sol of the present invention in the photocurable resin composition is as follows:
  • the above-mentioned coating composition of the present invention is applied to a base material such as a film or a sheet made of a synthetic resin such as a polycarbonate resin or an acrylic resin, and is coated with an antistatic coating. It is suitable for forming In particular, since the coating obtained from the coating composition of the present invention is excellent in transparency and has conductivity, the coating composition has a conductive property on the light-irradiated surface of the optical disc and on the surface of Z or the recording layer. Suitable for forming a functional film.
  • the coating composition of the present invention provides antistatic properties to eyeglasses, clean room windows or curtains, automobile windows, etc., or packaging materials, furniture, musical instruments, etc. It can also be used when applying. And, just in case, we add that the present invention Antimony ganoate sol can, of course, be used as a flame retardant.
  • This sol was collected in 5 liters of a separable flask equipped with a stirrer and a cooler, and a mixture of 84.4 g of tetraethoxysilane and 2000 g of methyl alcohol was further added thereto. The reaction was held at C for 60 minutes. Then cooled, an ultrafiltration membrane, and concentrated to a S b 2 0 5 concentration to 20 wt%. Then, methyla While adding alcohol, 30 wt% of water and methyl alcohol as substitution and S b 2 0 5 concentration in ultrafiltration membrane to obtain a dispersion sol in an organic solvent medium moisture 0.8 wt%.
  • Example 1 An antimony oxide sol shown in Table 1 was prepared in the same manner as in Example 1, except that cointacryloxypropyltriethoxysilane was used in place of y-methacryloxyprovirtrimethoxysilane. did.
  • Example 1 was repeated in the same manner as in Example 1 except that 2-hydroxybutyl acrylate (HBA) was used instead of 2-hydroxyl acrylate (HEA). Antimony oxide sols shown in Table 1 were prepared.
  • HBA 2-hydroxybutyl acrylate
  • HOA 2-hydroxyl acrylate
  • An antimony oxide sol shown in Table 1 was prepared in the same manner as in Example 1, except that 76 g of vinyltriethoxysilane was used instead of 84.4 g of tetraethoxysilane.
  • Example 5 An antimony oxide sol shown in Table 1 was prepared in the same manner as in Example 1, except that 76 g of vinyltriethoxysilane was used instead of 84.4 g of tetraethoxysilane.
  • Example 2 The same operation as in Example 1 was carried out except that 18 g of tetratraethoxysilane was used instead of 84.4 g of tetratraethoxysilane.
  • Example 1 and was added three 5 wt% oxide Anchimon obtained by dissolving S b ft O r liquid l OOO g to 5 wt3 ⁇ 4 S n 0 3 ⁇ 4 of tin oxide Li um solution 100 g in the same manner, then this After diluting the solution with 1500 g of pure water, the solution was passed through a cation exchange resin and deionized to prepare a composite antimony oxide sol containing tin oxide using water as a dispersion medium. This tin oxide-containing composite antimony had a pyrochlore structure. Using the composite antimony oxide sol, the same operation as in Example 1 was performed to prepare an antimony oxide sol shown in Table 1.
  • Zr02 was changed to 50 g of a 5 wt% zirconyl ammonium carbonate solution, and instead of HEA as a monomer, 2- r Using hydroxypropyl acrylate (HPA), the same procedure was used to prepare the antimony oxide sol shown in Table 1.
  • HPA hydroxypropyl acrylate
  • Example 1 To the deionized solution of antimony oxide obtained in the same manner as in Example 1, After the T i O 2 and was supplemented with 1% titanium chloride solution 25 g and the liquid was heated for 10 hours at a temperature of 100 to remove chlorine by anion exchange resin. And concentrated in ultrafilter membrane 19% A composite sol of antimony oxide and titanium oxide was obtained. Using the composite antimony oxide sol, the same operation as in Example 1 was performed to prepare an antimony oxide sol shown in Table 1.
  • Example 9 On the same operation as in Example 1 5 wt3 ⁇ 4 B 0 3 borate de Ion solution of oxidized Anchimon obtained in the same manner as the solution 100 g Example 9 was added, antimony oxide shown in Table 1 A sol was prepared.
  • antimony oxide using this methyl alcohol as a dispersion medium is used.
  • 20 g of 2-hydroxyhexyl acrylate (HEA) was added to 100 g of the mixture, and the mixture was distilled under reduced pressure on a bath at 40 ° C overnight to cause gelation.
  • a coating composition was prepared using the antimony oxide sol using the monomers of Examples 1 to 11 and Comparative Example 2 as a dispersion medium, and the surface resistance of the coating obtained by coating was measured. 58.3 g of each of the antimony oxide sols of Examples 1 to 11 and Comparative Example 2 was mixed with 20 g of a UV-curable urethane resin (DH-700, manufactured by Daihachi Chemical Co., Ltd.). The following coating compositions were prepared. Next, using these paints, a spinner was applied to a polycarbonate plate at 2000 rpm and cured by UV irradiation of a high-pressure mercury tamper to form a coating. The surface resistance of the obtained coating was measured. Table 1 shows the results.
  • a coating similar to that of Example 11 was prepared by mixing 58.3 g of the antimony oxide sol containing the monomer of Example 1 as a dispersion medium with 20 g of a urethane-based UV-curable resin (DH700, manufactured by Daihachi Chemical). A composition was prepared. This coating composition is applied to the light transmitting surface of a polycarbonate resin optical disk substrate by a spin coating method (2,500 rpm ⁇ 5 sec), and immediately cured by irradiation with ultraviolet light from a high-pressure mercury lamp. A conductive film was formed on the disk substrate surface. Table 2 shows the properties of the obtained optical disc substrate.
  • the optical disc substrate of the present invention has excellent transparency and low surface resistance.
  • Example 13 a conductive film was formed on the surface of the optical disc substrate in the same manner as in Example 13 except that an antimony oxide sol using the monomer of Example 3 as a dispersion medium and an acryl resin optical disc substrate were used. A functional film was formed. Table 2 shows the properties of the obtained optical disc substrate. Table 2
  • Example 14 3 2 X 10 12 90 H 3 Water 1... Measured with Heyres evening (Mitsubishi Yuka Corporation). Water 2: Measured by Haze Computer 1 (manufactured by Suga Test Instruments Co., Ltd.) Measured in accordance with JIS-K-5400. [Effect]
  • the organoantimony oxide sol of the present invention can be directly blended into the photocurable resin composition without using a solvent.
  • the coating composition obtained by applying the coating composition The film has conductivity.
  • the coating composition in which the organoantimony oxide sol containing the photocurable resin monomer of the present invention as a dispersion medium is blended with the photocurable resin composition does not need to evaporate the organic solvent, so that the above facilities become unnecessary. It can also be applied to substrates that cannot be heated

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Colloid Chemistry (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Laminated Bodies (AREA)

Abstract

Nouvel organosol d'oxyde d'antimoine pouvant être utilisé comme agent de conductivité, et composition de revêtement photopolymérisable le contenant. L'organosol comprend, comme dispersoïde, des particules d'oxyde d'antimoine colloïdal possédant chacune une structure de pyrochlore et une surface modifiée avec un composé d'organosilicium représenté par la formule générale (I), dans laquelle R2 représente hydrogène ou alkyle C¿1?-C5; R?3¿ représente hydrogène ou alkyle C¿1?-C5; R?4¿ représente alkylène C¿1?-C8; R?5¿ représente hydrogène ou alkyle C¿1?-C8; i représente un nombre entier compris entre 1 et 3; j représente un nombre compris entre 0 et 2; et k représente un nombre entier compris entre 1 et 3, et est égal à i + j.
PCT/JP1992/000536 1991-04-24 1992-04-24 Organosol d'oxyde d'antimoine et composition de revetement le contenant Ceased WO1992019540A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US08/137,140 US5785892A (en) 1991-04-24 1992-04-24 Organo-antimony oxide sols and coating compositions thereof

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JP12230391A JP2506065B2 (ja) 1991-04-24 1991-04-24 オルガノ酸化アンチモンゾルとそれを含む塗料
JP3/122303 1991-04-24

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Cited By (1)

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EP0909784A1 (fr) * 1997-10-16 1999-04-21 Nissan Chemical Industries, Limited Sol d'antimoniate de zinc et procédé pour sa préparation

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JP4535237B2 (ja) * 2003-03-27 2010-09-01 日産化学工業株式会社 五酸化アンチモンゾル及びその製造方法
JP4513347B2 (ja) * 2004-02-06 2010-07-28 東洋インキ製造株式会社 重合性有機無機複合体粒子
DE102006034240A1 (de) * 2006-07-25 2008-01-31 Clariant International Limited Mit polymerisierbarem Coating modifizierte Pigmente, deren Herstellung und Anwendung
JP2009096927A (ja) 2007-10-18 2009-05-07 Tdk Corp 活性エネルギー線硬化性樹脂組成物およびその積層体

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JPS61227919A (ja) * 1985-04-03 1986-10-11 Nissan Chem Ind Ltd 陽に帯電した五酸化アンチモンゾル及びその製造法
JPS62129140A (ja) * 1985-11-29 1987-06-11 Nissan Chem Ind Ltd オルガノ五酸化アンチモンゾルの製造法
JPH01131028A (ja) * 1987-11-17 1989-05-23 Nissan Chem Ind Ltd 疎水性有機溶剤を分散媒とする五酸化アンチモンゾル及びその製造方法

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Publication number Priority date Publication date Assignee Title
JPS61227919A (ja) * 1985-04-03 1986-10-11 Nissan Chem Ind Ltd 陽に帯電した五酸化アンチモンゾル及びその製造法
JPS62129140A (ja) * 1985-11-29 1987-06-11 Nissan Chem Ind Ltd オルガノ五酸化アンチモンゾルの製造法
JPH01131028A (ja) * 1987-11-17 1989-05-23 Nissan Chem Ind Ltd 疎水性有機溶剤を分散媒とする五酸化アンチモンゾル及びその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0909784A1 (fr) * 1997-10-16 1999-04-21 Nissan Chemical Industries, Limited Sol d'antimoniate de zinc et procédé pour sa préparation
US6093749A (en) * 1997-10-16 2000-07-25 Nissan Chemical Industries, Ltd. Anhydrous zinc antimonate sol and method for producing the same

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JPH04325567A (ja) 1992-11-13
JP2506065B2 (ja) 1996-06-12

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