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USD1038901S1 - Collimator for a physical vapor deposition chamber - Google Patents

Collimator for a physical vapor deposition chamber Download PDF

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Publication number
USD1038901S1
USD1038901S1 US29/822,866 US202229822866F USD1038901S US D1038901 S1 USD1038901 S1 US D1038901S1 US 202229822866 F US202229822866 F US 202229822866F US D1038901 S USD1038901 S US D1038901S
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Prior art keywords
collimator
vapor deposition
physical vapor
deposition chamber
view
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US29/822,866
Inventor
Fuhong Zhang
Martin Lee Riker
Suhas BANGALORE UMESH
Madan Kumar Shimoga Mylarappa
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Applied Materials Inc
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Applied Materials Inc
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Priority to US29/822,866 priority Critical patent/USD1038901S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: BANGALORE UMESH, SUHAS, RIKER, MARTIN LEE, ZHANG, FUHONG
Priority to TW111303280F priority patent/TWD238346S/en
Priority to TW111303281F priority patent/TWD237223S/en
Priority to JP2022014278F priority patent/JP1770089S/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SHIMOGA MYLARAPPA, MADAN KUMAR
Priority to US29/951,119 priority patent/USD1110975S1/en
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FIG. 1 is a top isometric view of collimator for a physical vapor deposition chamber, according to one embodiment of the novel design.
FIG. 2 is a bottom isometric view thereof.
FIG. 3 is a top plan view thereof.
FIG. 4 is a bottom plan view thereof.
FIG. 5 is a front elevation view thereof.
FIG. 6 is a back elevation view thereof.
FIG. 7 is a left elevation view thereof.
FIG. 8 is a right elevation view thereof; and,
FIG. 9 is a cross-sectional view taken along line 9-9 in FIG. 3 .
The dash-dash broken lines in the drawings illustrate portions of the article that form no part of the claimed design. The dot-dash broken lines are for the purpose of illustrating the indications of the cross-section and form no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a collimator for a physical vapor deposition chamber, as shown and described.
US29/822,866 2022-01-12 2022-01-12 Collimator for a physical vapor deposition chamber Active USD1038901S1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US29/822,866 USD1038901S1 (en) 2022-01-12 2022-01-12 Collimator for a physical vapor deposition chamber
TW111303280F TWD238346S (en) 2022-01-12 2022-07-04 Collimator for use in a physical vapor deposition (pvd) chamber
TW111303281F TWD237223S (en) 2022-01-12 2022-07-04 Collimator for use in a physical vapor deposition (pvd) chamber
JP2022014278F JP1770089S (en) 2022-01-12 2022-07-04 Collimators for physical vapor deposition chambers
US29/951,119 USD1110975S1 (en) 2022-01-12 2024-07-08 Collimator for a physical vapor deposition (PVD) chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/822,866 USD1038901S1 (en) 2022-01-12 2022-01-12 Collimator for a physical vapor deposition chamber

Related Child Applications (1)

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US29/951,119 Division USD1110975S1 (en) 2022-01-12 2024-07-08 Collimator for a physical vapor deposition (PVD) chamber

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USD1038901S1 true USD1038901S1 (en) 2024-08-13

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US29/822,866 Active USD1038901S1 (en) 2022-01-12 2022-01-12 Collimator for a physical vapor deposition chamber
US29/951,119 Active USD1110975S1 (en) 2022-01-12 2024-07-08 Collimator for a physical vapor deposition (PVD) chamber

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US29/951,119 Active USD1110975S1 (en) 2022-01-12 2024-07-08 Collimator for a physical vapor deposition (PVD) chamber

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JP (1) JP1770089S (en)
TW (2) TWD238346S (en)

Cited By (5)

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USD1071886S1 (en) * 2022-01-20 2025-04-22 Applied Materials, Inc. Substrate support for a substrate processing chamber
USD1103950S1 (en) * 2024-03-21 2025-12-02 Applied Materials, Inc. Process chamber collimator
USD1110289S1 (en) * 2024-10-18 2026-01-27 Applied Materials, Inc. Process chamber collimator
USD1110975S1 (en) * 2022-01-12 2026-02-03 Applied Materials Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1110979S1 (en) * 2024-10-18 2026-02-03 Applied Materials, Inc. Process chamber collimator

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