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USD678745S1 - Spinning insert polishing pad - Google Patents

Spinning insert polishing pad Download PDF

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Publication number
USD678745S1
USD678745S1 US29/396,834 US201129396834F USD678745S US D678745 S1 USD678745 S1 US D678745S1 US 201129396834 F US201129396834 F US 201129396834F US D678745 S USD678745 S US D678745S
Authority
US
United States
Prior art keywords
polishing pad
spinning insert
insert polishing
spinning
new design
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/396,834
Inventor
Phuong Van Nguyen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to US29/396,834 priority Critical patent/USD678745S1/en
Application granted granted Critical
Publication of USD678745S1 publication Critical patent/USD678745S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a top perspective view of the spinning insert polishing pad showing my new design;
FIG. 2 is a bottom perspective view of the spinning insert polishing pad showing my new design;
FIG. 3 is a top plan view of the spinning insert polishing pad showing my new design;
FIG. 4 is a bottom plan view of the spinning insert polishing pad showing my new design;
FIG. 5 is a front elevation view of the spinning insert polishing pad showing my new design;
FIG. 6 is a rear elevation view of the spinning insert polishing pad showing my new design; and
FIG. 7 is a right side view of the spinning insert polishing pad showing my new design; and,
FIG. 8 is a left side view of the spinning insert polishing pad showing my new design.
The stippling on the upper surface is meant to represent a pattern that extends uniformly across the entire surface.

Claims (1)

    CLAIM
  1. The ornamental design for a spinning insert polishing pad, as shown and described.
US29/396,834 2011-07-07 2011-07-07 Spinning insert polishing pad Active USD678745S1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US29/396,834 USD678745S1 (en) 2011-07-07 2011-07-07 Spinning insert polishing pad

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/396,834 USD678745S1 (en) 2011-07-07 2011-07-07 Spinning insert polishing pad

Publications (1)

Publication Number Publication Date
USD678745S1 true USD678745S1 (en) 2013-03-26

Family

ID=47892566

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/396,834 Active USD678745S1 (en) 2011-07-07 2011-07-07 Spinning insert polishing pad

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US (1) USD678745S1 (en)

Cited By (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD738177S1 (en) * 2012-10-31 2015-09-08 Kwh Mirka Ltd Backing pad
USD786519S1 (en) * 2015-01-28 2017-05-09 Kwh Mirka Ltd Machine polishing pad
USD795666S1 (en) * 2014-06-06 2017-08-29 Diamond Tool Supply, Inc. Polishing pad
US10011999B2 (en) 2014-09-18 2018-07-03 Diamond Tool Supply, Inc. Method for finishing a surface using a grouting pan
US10246885B2 (en) 2014-09-18 2019-04-02 Husqvarna Construction Products North America, Inc. Grouting pan assembly with reinforcement ring
USD852601S1 (en) * 2017-04-24 2019-07-02 Ehwa Diamond Ind. Co., Ltd. Polishing pad
USD854902S1 (en) 2016-09-23 2019-07-30 Husqvarna Construction Products North America, Inc. Polishing or grinding pad
US10414012B2 (en) 2017-01-13 2019-09-17 Husqvarna Construction Products North America, Inc. Grinding pad apparatus
USD873517S1 (en) * 2017-07-21 2020-01-21 3M Innovative Properties Company Floor scrubbing pad
USD873782S1 (en) * 2016-05-17 2020-01-28 Electro Scientific Industries, Inc Component carrier plate
US10667665B2 (en) 2015-09-24 2020-06-02 Husqvarna Ab Method of using polishing or grinding pad assembly
US10710214B2 (en) 2018-01-11 2020-07-14 Husqvarna Ab Polishing or grinding pad with multilayer reinforcement
USD894137S1 (en) 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) * 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD919396S1 (en) 2017-08-30 2021-05-18 Husqvarna Ab Polishing or grinding pad assembly with abrasive disks, reinforcement and pad
USD927952S1 (en) * 2017-08-30 2021-08-17 Husqvarna Ab Polishing or grinding pad assembly with abrasive disk, spacer, reinforcement and pad
USD933725S1 (en) 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD941371S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD942516S1 (en) * 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD946845S1 (en) * 2018-07-19 2022-03-22 3M Innovative Properties Company Floor pad
USD958626S1 (en) * 2017-08-30 2022-07-26 Husqvarna Ab Polishing or grinding pad assembly with abrasive disks, reinforcement and pad
USD1000928S1 (en) * 2022-06-03 2023-10-10 Beng Youl Cho Polishing pad
USD1001749S1 (en) * 2020-05-13 2023-10-17 University Of South Florida Base plate for a foot pedal
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1021595S1 (en) * 2022-08-31 2024-04-09 Smart, Llc Polishing pad
USD1053230S1 (en) 2022-05-19 2024-12-03 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD1072774S1 (en) 2021-02-06 2025-04-29 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1110975S1 (en) 2024-07-08 2026-02-03 Applied Materials Inc. Collimator for a physical vapor deposition (PVD) chamber

Citations (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US201778A (en) * 1878-03-26 Improvement in emery-wheels
US2405524A (en) * 1944-06-27 1946-08-06 Carborundum Co Abrasive article and method of making
US6224474B1 (en) * 1999-01-06 2001-05-01 Buehler, Ltd. Magnetic disc system for grinding or polishing specimens
US6402594B1 (en) * 1999-01-18 2002-06-11 Shin-Etsu Handotai Co., Ltd. Polishing method for wafer and holding plate
US6454644B1 (en) * 2000-07-31 2002-09-24 Ebara Corporation Polisher and method for manufacturing same and polishing tool
US20030109209A1 (en) * 2001-08-24 2003-06-12 Rogers Inoac Corporation Polishing pad
US20060148393A1 (en) * 2000-12-01 2006-07-06 Koichi Ono Polishing pad and cushion layer for polishing pad
US20070082587A1 (en) * 2004-05-20 2007-04-12 Jsr Corporation Method of manufacturing chemical mechanical polishing pad
US7258602B2 (en) * 2003-10-22 2007-08-21 Iv Technologies Co., Ltd. Polishing pad having grooved window therein and method of forming the same
US20070259612A1 (en) * 2006-05-04 2007-11-08 Iv Technologies Co., Ltd. Polishing Pad and Method Thereof
USD559063S1 (en) * 2004-03-17 2008-01-08 Jsr Corporation Polishing pad
USD559066S1 (en) * 2004-10-26 2008-01-08 Jsr Corporation Polishing pad
USD559064S1 (en) * 2004-03-17 2008-01-08 Jsr Corporation Polishing pad
USD559065S1 (en) * 2004-10-05 2008-01-08 Jsr Corporation Polishing pad
USD559648S1 (en) * 2004-10-05 2008-01-15 Jsr Corporation Polishing pad
USD560457S1 (en) * 2004-10-05 2008-01-29 Jsr Corporation Polishing pad
US20080085661A1 (en) * 2006-07-19 2008-04-10 Innopad, Inc. Polishing Pad Having Micro-Grooves On The Pad Surface
US20080209817A1 (en) * 2007-01-05 2008-09-04 Kinik Company Diamond polishing disc process
US20100056031A1 (en) * 2008-08-29 2010-03-04 Allen Chiu Polishing Pad
US20120190281A1 (en) * 2011-01-26 2012-07-26 Allison William C Polishing pad with concentric or approximately concentric polygon groove pattern

Patent Citations (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US201778A (en) * 1878-03-26 Improvement in emery-wheels
US2405524A (en) * 1944-06-27 1946-08-06 Carborundum Co Abrasive article and method of making
US6224474B1 (en) * 1999-01-06 2001-05-01 Buehler, Ltd. Magnetic disc system for grinding or polishing specimens
US6402594B1 (en) * 1999-01-18 2002-06-11 Shin-Etsu Handotai Co., Ltd. Polishing method for wafer and holding plate
US6454644B1 (en) * 2000-07-31 2002-09-24 Ebara Corporation Polisher and method for manufacturing same and polishing tool
US20060148393A1 (en) * 2000-12-01 2006-07-06 Koichi Ono Polishing pad and cushion layer for polishing pad
US20030109209A1 (en) * 2001-08-24 2003-06-12 Rogers Inoac Corporation Polishing pad
US7258602B2 (en) * 2003-10-22 2007-08-21 Iv Technologies Co., Ltd. Polishing pad having grooved window therein and method of forming the same
USD559064S1 (en) * 2004-03-17 2008-01-08 Jsr Corporation Polishing pad
USD576855S1 (en) * 2004-03-17 2008-09-16 Jsr Corporation Polishing pad
USD559063S1 (en) * 2004-03-17 2008-01-08 Jsr Corporation Polishing pad
USD581237S1 (en) * 2004-03-17 2008-11-25 Jsr Corporation Polishing pad
US20070082587A1 (en) * 2004-05-20 2007-04-12 Jsr Corporation Method of manufacturing chemical mechanical polishing pad
USD559065S1 (en) * 2004-10-05 2008-01-08 Jsr Corporation Polishing pad
USD559648S1 (en) * 2004-10-05 2008-01-15 Jsr Corporation Polishing pad
USD560457S1 (en) * 2004-10-05 2008-01-29 Jsr Corporation Polishing pad
USD592030S1 (en) * 2004-10-26 2009-05-12 Jsr Corporation Polishing pad
USD559066S1 (en) * 2004-10-26 2008-01-08 Jsr Corporation Polishing pad
USD584591S1 (en) * 2004-10-26 2009-01-13 Jsr Corporation Polishing pad
USD592029S1 (en) * 2004-10-26 2009-05-12 Jsr Corporation Polishing pad
USD600989S1 (en) * 2004-10-26 2009-09-29 Jsr Corporation Polishing pad
US20070259612A1 (en) * 2006-05-04 2007-11-08 Iv Technologies Co., Ltd. Polishing Pad and Method Thereof
US20080085661A1 (en) * 2006-07-19 2008-04-10 Innopad, Inc. Polishing Pad Having Micro-Grooves On The Pad Surface
US20080209817A1 (en) * 2007-01-05 2008-09-04 Kinik Company Diamond polishing disc process
US20100056031A1 (en) * 2008-08-29 2010-03-04 Allen Chiu Polishing Pad
US20120190281A1 (en) * 2011-01-26 2012-07-26 Allison William C Polishing pad with concentric or approximately concentric polygon groove pattern

Cited By (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD740637S1 (en) * 2012-10-31 2015-10-13 Kwh Mirka Ltd Backing pad
USD738177S1 (en) * 2012-10-31 2015-09-08 Kwh Mirka Ltd Backing pad
USD873108S1 (en) * 2014-06-06 2020-01-21 Husqvarna Ab Polishing pad
USD795666S1 (en) * 2014-06-06 2017-08-29 Diamond Tool Supply, Inc. Polishing pad
USD837015S1 (en) * 2014-06-06 2019-01-01 Husqvarna Construction Products North America, Inc. Polishing pad
US10011999B2 (en) 2014-09-18 2018-07-03 Diamond Tool Supply, Inc. Method for finishing a surface using a grouting pan
US10246885B2 (en) 2014-09-18 2019-04-02 Husqvarna Construction Products North America, Inc. Grouting pan assembly with reinforcement ring
USD786519S1 (en) * 2015-01-28 2017-05-09 Kwh Mirka Ltd Machine polishing pad
US10667665B2 (en) 2015-09-24 2020-06-02 Husqvarna Ab Method of using polishing or grinding pad assembly
US11084140B2 (en) 2015-09-24 2021-08-10 Husqvarna Ab Method of using polishing or grinding pad assembly
USD873782S1 (en) * 2016-05-17 2020-01-28 Electro Scientific Industries, Inc Component carrier plate
USD854902S1 (en) 2016-09-23 2019-07-30 Husqvarna Construction Products North America, Inc. Polishing or grinding pad
USD933440S1 (en) * 2016-09-23 2021-10-19 Husqvarna Ab Polishing or grinding pad
US10414012B2 (en) 2017-01-13 2019-09-17 Husqvarna Construction Products North America, Inc. Grinding pad apparatus
USD852601S1 (en) * 2017-04-24 2019-07-02 Ehwa Diamond Ind. Co., Ltd. Polishing pad
USD873517S1 (en) * 2017-07-21 2020-01-21 3M Innovative Properties Company Floor scrubbing pad
USD927952S1 (en) * 2017-08-30 2021-08-17 Husqvarna Ab Polishing or grinding pad assembly with abrasive disk, spacer, reinforcement and pad
USD919396S1 (en) 2017-08-30 2021-05-18 Husqvarna Ab Polishing or grinding pad assembly with abrasive disks, reinforcement and pad
USD958626S1 (en) * 2017-08-30 2022-07-26 Husqvarna Ab Polishing or grinding pad assembly with abrasive disks, reinforcement and pad
USD894137S1 (en) 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US10710214B2 (en) 2018-01-11 2020-07-14 Husqvarna Ab Polishing or grinding pad with multilayer reinforcement
USD902165S1 (en) * 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD946845S1 (en) * 2018-07-19 2022-03-22 3M Innovative Properties Company Floor pad
USD942516S1 (en) * 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
USD933725S1 (en) 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD941371S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD1001749S1 (en) * 2020-05-13 2023-10-17 University Of South Florida Base plate for a foot pedal
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD966357S1 (en) 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1072774S1 (en) 2021-02-06 2025-04-29 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1053230S1 (en) 2022-05-19 2024-12-03 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD1000928S1 (en) * 2022-06-03 2023-10-10 Beng Youl Cho Polishing pad
USD1021595S1 (en) * 2022-08-31 2024-04-09 Smart, Llc Polishing pad
USD1110975S1 (en) 2024-07-08 2026-02-03 Applied Materials Inc. Collimator for a physical vapor deposition (PVD) chamber

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