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TWI862780B - Light emitting display device and method of manufacturing the same - Google Patents

Light emitting display device and method of manufacturing the same Download PDF

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Publication number
TWI862780B
TWI862780B TW110102899A TW110102899A TWI862780B TW I862780 B TWI862780 B TW I862780B TW 110102899 A TW110102899 A TW 110102899A TW 110102899 A TW110102899 A TW 110102899A TW I862780 B TWI862780 B TW I862780B
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light
patterned conductive
display device
substrate
pad area
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TW110102899A
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TW202224230A (en
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范文正
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范文正
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    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/33Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being semiconductor devices, e.g. diodes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electroluminescent Light Sources (AREA)
  • Led Device Packages (AREA)

Abstract

A light-emitting display device has a substrate, a first patterned conductive layer and a second patterned conductive layer respectively disposed on opposite surfaces of the substrate, a plurality of soldering pad areas, and a plurality of light-emitting elements. The minimum distance between the light-emitting elements is 2 to 3 mm. The first patterned conductive layer has a plurality of grid-shaped intersected first wires, the second patterned conductive layer has a plurality of parallel and separated second wires with each of the second wires having derived extensions, and the substrate is used to electrically isolate the first patterned conductive layer and the second patterned conductive layer. The soldering pad areas are separated from each other with one soldering pad area being electrically connected to the first wires while the other soldering pad areas being respectively connected to the derived extensions of three adjacent second wires.

Description

發光顯示裝置及其製造方法 Luminescent display device and manufacturing method thereof

本發明是關於一種顯示裝置,特別是關於一種發光顯示裝置及其製造方法。 The present invention relates to a display device, in particular to a luminous display device and a manufacturing method thereof.

因應顯示器的顯示螢幕朝大尺寸化、平面化、薄型化、輕量化及具可撓性發展,以被動點發光源及主動點發光源作為顯示器的發光源且以可撓性基板作為配置這些發光源的基板的發光顯示技術開發日益重要。被動點發光源例如是發光二極體(Light emitting diode;LED),而主動點發光源例如是有機發光二極體(Organic Light-Emitting Diode;OLED)。一個技術發展分支中,以LED作為光源而開發出的供人們遠距離觀看的大屏幕發光顯示器的後續進展值得關注。 In response to the development of display screens towards larger sizes, flatness, thinness, lightness and flexibility, the development of luminous display technology using passive point light sources and active point light sources as the light sources of the display and using flexible substrates as the substrates for configuring these light sources is becoming increasingly important. Passive point light sources are, for example, light emitting diodes (LEDs), while active point light sources are, for example, organic light-emitting diodes (OLEDs). In a branch of technological development, the subsequent progress of large-screen luminous displays developed with LEDs as light sources for people to watch from a distance is worth paying attention to.

這類供人們遠距離觀看的發光顯示器在製作上,可以選擇將含有多個LED所組成的LED燈珠或LED晶片以陣列的形式裝設在基板上,LED燈珠或LED晶片彼此間的距離不小於2毫米(mm),有別於供人們近距離觀看的有機發光二極體(OLED)顯示器或微尺寸發光二極體(Micro-LED)顯示器。為了讓陣列中每個LED燈珠或LED晶片能夠被點亮且具有符合需求的亮度,這些LED燈珠或LED晶片的配置基板及其配置導線必須具有良好的導電功率。此外,為了提升遠距離觀看這類發光顯示器的對比度,同時也必須降低這些LED燈珠或LED晶片的配 置基板及其配置導線在顯示畫面中的可視性。另一方面,為了因應各種應用場合所需的顯示效果,這些LED燈珠或LED晶片的配置導線的製作必須具有良好的設計變更性並能快速製作完成。針對以上這些技術問題,本發明希望能夠提出解決方案。 In manufacturing, this type of luminous display for people to watch from a distance can be made by installing LED beads or LED chips composed of multiple LEDs in the form of an array on a substrate, and the distance between the LED beads or LED chips is not less than 2 mm, which is different from the organic light-emitting diode (OLED) display or micro-LED display for people to watch from a close distance. In order for each LED bead or LED chip in the array to be lit and have the required brightness, the configuration substrate of these LED beads or LED chips and their configuration wires must have good electrical conductivity. In addition, in order to improve the contrast of such light-emitting displays viewed from a distance, the visibility of the configuration substrate and configuration wires of these LED lamp beads or LED chips in the display screen must also be reduced. On the other hand, in order to cope with the display effects required in various application scenarios, the production of the configuration wires of these LED lamp beads or LED chips must have good design changes and be able to be produced quickly. In response to the above technical problems, the present invention hopes to propose solutions.

有鑑於上述問題,本發明提供一種發光顯示裝置及其製造方法。 In view of the above problems, the present invention provides a luminous display device and a manufacturing method thereof.

一實施例中,發光顯示裝置具有基板、配置於基板上的第一圖案化導電層、第二圖案化導電層、彼此電性隔離的一第一銲墊區、一第二銲墊區、一第三銲墊區和一第四銲墊區及複數發光件。基板具有第一表面及背對第一表面的第二表面,基板上具有複數通孔。第一圖案化導電層配置於第一表面上,具有複數交織成網格狀的第一導線。第二圖案化導電層配置於第二表面上,具有至少三相互平行且彼此等距或不等距相隔的呈線狀的第二導線、自各個第二導線連接出的呈線狀的延伸部及至少一和第二導線相隔的島部,延伸部的配置方向和第二導線的配置方向呈交叉。第一銲墊區配置於島部上,第二銲墊區、第三銲墊區和第四銲墊區分別配置於延伸部上。複數發光件依陣列形式配置於第二表面的同側,彼此間的最小相隔距離為2至3毫米,至少一發光件的四個不同接腳分別連接至第一銲墊區、第二銲墊區、第三銲墊區及第四銲墊區。 In one embodiment, a light-emitting display device comprises a substrate, a first patterned conductive layer disposed on the substrate, a second patterned conductive layer, a first pad region, a second pad region, a third pad region and a fourth pad region electrically isolated from each other, and a plurality of light-emitting elements. The substrate comprises a first surface and a second surface opposite to the first surface, and the substrate comprises a plurality of through holes. The first patterned conductive layer is disposed on the first surface and comprises a plurality of first conductive lines interwoven into a grid shape. The second patterned conductive layer is disposed on the second surface and comprises at least three linear second conductive lines which are parallel to each other and spaced equidistantly or unequally from each other, a linear extension portion connected to each second conductive line, and at least one island portion spaced from the second conductive line, wherein the configuration direction of the extension portion intersects with the configuration direction of the second conductive line. The first pad area is arranged on the island, and the second pad area, the third pad area and the fourth pad area are arranged on the extension part respectively. A plurality of light-emitting elements are arranged on the same side of the second surface in an array, with a minimum spacing of 2 to 3 mm between them, and at least one light-emitting element has four different pins connected to the first pad area, the second pad area, the third pad area and the fourth pad area respectively.

一實施例中,發光顯示裝置的第二圖案化導電層的島部經由通孔其中之一和第一圖案化導電層的第一導線的交接處電性連接。 In one embodiment, the island portion of the second patterned conductive layer of the light-emitting display device is electrically connected to the intersection of the first conductive line of the first patterned conductive layer through one of the through holes.

一實施例中,發光顯示裝置的第一圖案化導電層的各個第一導線的線寬為25微米至100微米且各個第二導線的線寬為25微米至100微米。 In one embodiment, the line width of each first conductive line of the first patterned conductive layer of the light-emitting display device is 25 microns to 100 microns, and the line width of each second conductive line is 25 microns to 100 microns.

一實施例中,發光顯示裝置的第一圖案化導電層的第一導線的網格形狀為矩形、六角形、橢圓形及圓形其中之一。 In one embodiment, the grid shape of the first conductive line of the first patterned conductive layer of the light-emitting display device is one of a rectangle, a hexagon, an ellipse and a circle.

一實施例中,發光顯示裝置還具有一第三圖案化導電層,配置於基板的第二表面上且與第二圖案化導電層電性隔離,具有至少三連接至各第二導線的相互平行且彼此等距或不等距相隔的呈線狀的第三導線,第三導線的延伸方向和第二導線的延伸方向呈交叉,第三導線延伸連接至發光顯示裝置的點亮訊號輸入端。 In one embodiment, the light-emitting display device further has a third patterned conductive layer, which is disposed on the second surface of the substrate and electrically isolated from the second patterned conductive layer, and has at least three third linear conductive lines connected to the second conductive lines, which are parallel to each other and are equidistant or unequally spaced from each other. The extension direction of the third conductive line intersects with the extension direction of the second conductive line, and the third conductive line extends to connect to the lighting signal input terminal of the light-emitting display device.

一實施例中,發光顯示裝置還具有一第一圖案化電性絕緣層,其具有複數第一電性絕緣區塊,配置於第二圖案化導電層及第三圖案化導電層之間,第一電性絕緣區塊使得第三導線和第二導線電性隔離。 In one embodiment, the light-emitting display device further has a first patterned electrically insulating layer having a plurality of first electrically insulating blocks disposed between the second patterned conductive layer and the third patterned conductive layer, and the first electrically insulating blocks electrically isolate the third conductive line from the second conductive line.

一實施例中,發光顯示裝置還具有第二圖案化電性絕緣層,其具有複數第二電性絕緣區塊,第二電性絕緣區塊分別沿著第一銲墊區、第二銲墊區、第三銲墊區和第四銲墊區的一第一配置方向配置於基板的第二表面上,用以隔離第一銲墊區、第二銲墊區、第三銲墊區和第四銲墊區於一第二配置方向上的電性接觸,第二配置方向和第一配置方向呈交叉。 In one embodiment, the light-emitting display device further has a second patterned electrically insulating layer having a plurality of second electrically insulating blocks, which are respectively arranged on the second surface of the substrate along a first arrangement direction of the first pad area, the second pad area, the third pad area and the fourth pad area, for isolating the electrical contact of the first pad area, the second pad area, the third pad area and the fourth pad area in a second arrangement direction, and the second arrangement direction intersects the first arrangement direction.

一實施例中,發光顯示裝置還具有第三圖案化電性絕緣層,其具有複數第三電性絕緣區塊,第三電性絕緣區塊分別沿著第一銲墊區、第二銲墊區、第三銲墊區和第四銲墊區的第二配置方向配置於連接第三銲墊區的第二導線的上方,用以隔離第一銲墊區、第二銲墊區、第三銲墊區和第四銲墊區於第一配置方向上的電性接觸。 In one embodiment, the light-emitting display device further has a third patterned electrically insulating layer having a plurality of third electrically insulating blocks, which are respectively arranged above the second conductive wire connected to the third pad region along the second arrangement direction of the first pad region, the second pad region, the third pad region and the fourth pad region, to isolate the electrical contact of the first pad region, the second pad region, the third pad region and the fourth pad region in the first arrangement direction.

一實施例中,發光顯示裝置還具有第一圖案化導電金屬種子層,其形成於基板的第一表面上,具有和第一圖案化導電層的圖案相同的圖案,用以作為第一圖案化導電層的形成準備層。 In one embodiment, the light-emitting display device further has a first patterned conductive metal seed layer, which is formed on the first surface of the substrate and has the same pattern as the first patterned conductive layer, and is used as a preparation layer for forming the first patterned conductive layer.

一實施例中,發光顯示裝置還具有第二圖案化導電金屬種子層,其形成於基板的第二表面上,具有和第二圖案化導電層的圖案相同的圖案,用以作為第二圖案化導電層的形成準備層。 In one embodiment, the light-emitting display device further has a second patterned conductive metal seed layer, which is formed on the second surface of the substrate and has the same pattern as the second patterned conductive layer, and is used as a preparation layer for forming the second patterned conductive layer.

各實施例中,發光顯示裝置的基板的材質是玻璃、陶瓷、氮化鋁陶瓷、聚碳酸酯、聚對苯甲酸乙二酯、聚醯亞胺、聚酸甲酯、BT樹脂、玻璃纖維及環狀烯烴共聚物其中之一。 In each embodiment, the material of the substrate of the luminescent display device is one of glass, ceramic, aluminum nitride ceramic, polycarbonate, polyethylene terephthalate, polyimide, polymethyl methacrylate, BT resin, glass fiber and cyclic olefin copolymer.

各實施例中,發光顯示裝置的發光件可以為發光二極體燈珠。 In each embodiment, the light-emitting element of the light-emitting display device can be a light-emitting diode lamp bead.

另一方面,本發明提出一種發光顯示裝置的製造方法。 On the other hand, the present invention provides a method for manufacturing a luminous display device.

一實施例中,發光顯示裝置的製造方法包含下列步驟:提供一具有多個通孔的基板,基板具有一第一表面及背對第一表面的一第二表面;形成包含複數交織成網格狀的第一導線的第一圖案化導電層於第一表面上,且使第一導線的交接處各自對準通孔;形成包含複數第二導線及自各第二導線連接出的延伸部及和第二導線相隔的島部的第二圖案化導電層於第二表面上;及分別將第二導線的延伸部的一部分及島部的一部分配置成一發光件的接腳的銲墊區。 In one embodiment, a method for manufacturing a light-emitting display device includes the following steps: providing a substrate having a plurality of through holes, the substrate having a first surface and a second surface opposite to the first surface; forming a first patterned conductive layer including a plurality of first conductive lines interwoven into a grid on the first surface, and aligning the intersections of the first conductive lines with the through holes; forming a second patterned conductive layer including a plurality of second conductive lines and an extension portion connected from each second conductive line and an island portion separated from the second conductive line on the second surface; and configuring a portion of the extension portion and a portion of the island portion of the second conductive line as a solder pad area of a pin of a light-emitting device.

一實施例中,所提出的發光顯示裝置的製造方法可進一步包含下列步驟:利用濺鍍、網版印刷及噴印其中之一的製程形成一第一圖案化導電金屬種子層於基板的第一表面上,且第一圖案化導電層係利用濺鍍、蝕刻、化學鍍及電鍍其中之一的製程形成於第一圖案化導電金屬種子層上,通孔的靠近基板的第一表面的一側鍍有第一導線的材料。 In one embodiment, the manufacturing method of the proposed light-emitting display device may further include the following steps: forming a first patterned conductive metal seed layer on the first surface of the substrate by one of sputtering, screen printing and inkjet printing processes, and the first patterned conductive layer is formed on the first patterned conductive metal seed layer by one of sputtering, etching, chemical plating and electroplating processes, and the side of the through hole close to the first surface of the substrate is plated with a first conductive wire material.

一實施例中,所提出的發光顯示裝置的製造方法可進一步包含下列步驟:利用濺鍍、網版印刷及噴印其中之一的製程形成一第二圖案化導電金屬種子層於基板的第二表面上;且第二圖案化導電層係利用濺鍍、蝕刻、化學鍍及電鍍其中之一的製程形成於第二圖案化導電金屬種子層上,通孔的靠近基板的第二表面的一側鍍有島部的材料。 In one embodiment, the manufacturing method of the proposed light-emitting display device may further include the following steps: forming a second patterned conductive metal seed layer on the second surface of the substrate by one of sputtering, screen printing and inkjet printing processes; and the second patterned conductive layer is formed on the second patterned conductive metal seed layer by one of sputtering, etching, chemical plating and electroplating processes, and the side of the through hole close to the second surface of the substrate is plated with an island material.

一實施例中,所提出的發光顯示裝置的第二圖案化導電層也可利用網版印刷及噴印其中之一的製程形成;且第二圖案化導電層與第二表面直接接觸。 In one embodiment, the second patterned conductive layer of the proposed light-emitting display device can also be formed by using a process of screen printing or inkjet printing; and the second patterned conductive layer is in direct contact with the second surface.

各實施例中,第一導線的材質是摻有導電粉末的漿料、氧化銦錫(ITO)膜、氟摻雜氧化錫(FTO)膜、氧化鋅(ZnO)膜、氧化鋁鋅(AZO)膜、銅、銀、鎳及鎳金其中之一。 In each embodiment, the material of the first conductive wire is one of a slurry doped with conductive powder, an indium tin oxide (ITO) film, a fluorine-doped tin oxide (FTO) film, a zinc oxide (ZnO) film, an aluminum zinc oxide (AZO) film, copper, silver, nickel, and nickel-gold.

綜上所述,依照本發明各實施例所描述的發光顯示裝置及其製造方法將對應到發光件的接腳的銲墊區的連接導線分層配置,使得銲墊區中的電源連接導線和銲墊區中的訊號連接導線不共用同一平面配置空間,有利於加大電源連接導線的平面配置空間以及提升電源連接導線的導電率。另一方面,由於電源連接導線和訊號連接導線是分別形成在基板的不同面,因此在分層配置的設計上無須製作電性絕緣層來電性隔離電源連接導線和訊號連接導線,可以簡化整體製程步驟。此外,基板的單一表面上只有電源連接導線的配置,在加大的平面配置空間內,電源連接導線可被細分成複數線寬更小的等效導線,以提高顯示畫面的通透度。此外,發光件亦可採用微小型發光二極體晶片以降低發光件本身在顯示畫面中的可視性。如此一來,在發光件的配置基板是透明的情況下,可大幅地降低位於基板上的導線和發光件在顯示畫面中的可視性,進而提升在一定距離外觀看這類發光顯示器的對比度和清晰度。另一方面,由於電性連接至發光件的第一圖案化導電層及第二圖案化導電層可採用諸如網版印 刷及噴印的印刷製程來製作,因而可進一步利用近紅外光照射來快速固化印刷或噴印後的導電層,以縮短製程時間和便利製程程序。 In summary, the light-emitting display device and the manufacturing method thereof described in the embodiments of the present invention are configured in layers in the pad area corresponding to the pins of the light-emitting element, so that the power connection wires in the pad area and the signal connection wires in the pad area do not share the same plane configuration space, which is beneficial to increase the plane configuration space of the power connection wires and improve the conductivity of the power connection wires. On the other hand, since the power connection wires and the signal connection wires are formed on different surfaces of the substrate, there is no need to make an electrical insulation layer to electrically isolate the power connection wires and the signal connection wires in the layered configuration design, which can simplify the overall process steps. In addition, only the power connection wires are arranged on a single surface of the substrate. In the enlarged plane arrangement space, the power connection wires can be subdivided into a plurality of equivalent wires with smaller line widths to improve the transparency of the display screen. In addition, the light-emitting element can also use a micro-light-emitting diode chip to reduce the visibility of the light-emitting element itself in the display screen. In this way, when the configuration substrate of the light-emitting element is transparent, the visibility of the wires and the light-emitting element on the substrate in the display screen can be greatly reduced, thereby improving the contrast and clarity of such light-emitting displays viewed from a certain distance. On the other hand, since the first patterned conductive layer and the second patterned conductive layer electrically connected to the light-emitting element can be manufactured by a printing process such as screen printing and inkjet printing, near-infrared light irradiation can be further used to quickly cure the printed or inkjet printed conductive layer to shorten the process time and facilitate the process procedure.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 In order to make the above features and advantages of the present invention more clearly understood, the following is a detailed description of the embodiments with the accompanying drawings.

1:發光顯示裝置 1: Luminous display device

100:基板 100: Substrate

1001:第一表面 1001: First surface

1002:第二表面 1002: Second surface

1003:通孔 1003:Through hole

900:第一圖案化導電金屬種子層 900: First patterned conductive metal seed layer

10:第一圖案化導電層 10: First patterned conductive layer

101:第一導線 101: First conductor

1011:第一延伸方向的第一導線 1011: The first conductive line in the first extension direction

1012:第二延伸方向的第一導線 1012: The first conductor in the second extension direction

102:交接處 102: Junction

103:網格 103: Grid

20:第二圖案化導電層 20: Second patterned conductive layer

200:第二圖案化導電金屬種子層 200: Second patterned conductive metal seed layer

201:第二導線 201: Second conductor

202:延伸部 202: Extension

203:島部 203: Island Department

30:第三圖案化導電層 30: The third patterned conductive layer

301:第三導線 301: Third conductor

40:第一圖案化電性絕緣層 40: First patterned electrical insulating layer

401:第一電性絕緣區塊 401: First electrically insulating block

501:第一銲墊區 501: First welding pad area

502:第二銲墊區 502: Second welding pad area

503:第三銲墊區 503: The third pad area

504:第四銲墊區 504: Fourth pad area

60:第二圖案化電性絕緣層 60: Second patterned electrical insulating layer

601:第二電性絕緣區塊 601: Second electrically insulating block

70:第三圖案化電性絕緣層 70: The third patterned electrical insulating layer

701:第三電性絕緣區塊 701: The third electrically insulating block

80:電性連接材料 80: Electrical connection materials

1000:發光件 1000: Luminous parts

11~16:步驟 11~16: Steps

21~25:步驟 21~25: Steps

圖1A係平面示意圖,顯示本發明一實施例之發光顯示裝置的第一圖案化導電層及其導線。 FIG1A is a schematic plan view showing the first patterned conductive layer and its conductive lines of a light-emitting display device according to an embodiment of the present invention.

圖1B係平面示意圖,顯示本發明一實施例之發光顯示裝置的其他圖案化導電層及其導線。 FIG1B is a schematic plan view showing other patterned conductive layers and their conductive lines of a light-emitting display device according to an embodiment of the present invention.

圖2A係一剖面示意圖,顯示圖1A之發光顯示裝置於一製程中的的A-A剖面。 FIG2A is a schematic cross-sectional view showing the A-A cross section of the light-emitting display device of FIG1A during a manufacturing process.

圖2B係一剖面示意圖,顯示圖1A之發光顯示裝置於一製程中的B-B剖面。 FIG2B is a schematic cross-sectional view showing the B-B cross-section of the light-emitting display device of FIG1A during a manufacturing process.

圖2C係一剖面示意圖,顯示圖1A之發光顯示裝置於一製程中的C-C剖面。 FIG2C is a schematic cross-sectional view showing the C-C cross-section of the light-emitting display device of FIG1A during a manufacturing process.

圖2D係一剖面示意圖,顯示圖1A之發光顯示裝置於一製程中的D-D剖面。 FIG2D is a schematic cross-sectional view showing the D-D cross section of the light-emitting display device of FIG1A during a manufacturing process.

圖3係一方塊流程圖,顯示圖1A之發光顯示裝置於一製程中之製造方法步驟。 FIG3 is a block flow chart showing the steps of a manufacturing method of the light-emitting display device of FIG1A in a manufacturing process.

圖4A係一剖面示意圖,顯示圖1A之發光顯示裝置於另一製程中的的A-A剖面。 FIG4A is a schematic cross-sectional view showing the A-A cross section of the light-emitting display device of FIG1A in another manufacturing process.

圖4B係一剖面示意圖,顯示圖1A之發光顯示裝置於另一製程中的B-B剖面。 FIG4B is a schematic cross-sectional view showing the B-B cross-section of the light-emitting display device of FIG1A in another manufacturing process.

圖4C係一剖面示意圖,顯示圖1A之發光顯示裝置於另一製程中的C-C剖面。 FIG4C is a cross-sectional schematic diagram showing the C-C cross section of the light-emitting display device of FIG1A in another manufacturing process.

圖4D係一剖面示意圖,顯示圖1A之發光顯示裝置於另一製程中的D-D剖面。 FIG4D is a cross-sectional schematic diagram showing the D-D cross section of the light-emitting display device of FIG1A in another manufacturing process.

圖5係一方塊流程圖,顯示圖1A之發光顯示裝置於另一製程中之製造方法步驟。 FIG5 is a block flow chart showing the steps of the manufacturing method of the light-emitting display device of FIG1A in another manufacturing process.

圖6係一平面示意圖,顯示本發明一實施例之發光顯示裝置的具蜂巢狀的網格導線。 FIG6 is a schematic plan view showing a honeycomb grid conductor of a light-emitting display device according to an embodiment of the present invention.

本發明揭示一種發光顯示裝置,以下文中所敘及的已為本領域普通技術人員所能明瞭者,將不再作完整描述,例如發光二極體的發光原理、具有特定導電線路圖案而呈層狀立體結構(線路圖案彼此間具有高低差)的圖案化導電層等。另外,以下文中所敘及的技術用語的意思如有與所屬技術領域的通常用語的意思不同時,以文中的意思為準,而文中所對照的附圖意在表達與本發明特徵有關的含義,並未依據實際尺寸完整繪製,亦先行敘明。 The present invention discloses a light-emitting display device. The following descriptions are already understood by ordinary technicians in this field and will not be fully described, such as the light-emitting principle of the light-emitting diode, the patterned conductive layer with a specific conductive circuit pattern and a layered three-dimensional structure (the circuit patterns have height differences), etc. In addition, if the meaning of the technical terms described in the following text is different from the meaning of the common terms in the technical field, the meaning in the text shall prevail. The accompanying drawings in the text are intended to express the meaning related to the characteristics of the present invention and are not fully drawn according to the actual size, which is also described in advance.

圖1A係平面示意圖,顯示本發明一實施例之發光顯示裝置的第一圖案化導電層及其導線。圖1B係平面示意圖,顯示本發明一實施例之發光顯示裝置的其他圖案化導電層及其導線。圖2A係一剖面示意圖,顯示圖1A之發光顯示裝置於一製程中的A-A剖面。圖2B係一剖面示意圖,顯示圖1A之發光顯示裝置於一製程中的B-B剖面。圖2C係一剖面示意圖,顯示圖1A之發光顯示裝置於 一製程中的C-C剖面。圖2D係一剖面示意圖,顯示圖1A之發光顯示裝置於一製程中的D-D剖面。 FIG. 1A is a schematic plan view showing a first patterned conductive layer and its conductive wires of a light-emitting display device of an embodiment of the present invention. FIG. 1B is a schematic plan view showing other patterned conductive layers and their conductive wires of a light-emitting display device of an embodiment of the present invention. FIG. 2A is a schematic cross-sectional view showing an A-A cross-section of the light-emitting display device of FIG. 1A in a process. FIG. 2B is a schematic cross-sectional view showing a B-B cross-section of the light-emitting display device of FIG. 1A in a process. FIG. 2C is a schematic cross-sectional view showing a C-C cross-section of the light-emitting display device of FIG. 1A in a process. FIG. 2D is a schematic cross-sectional view showing a D-D cross-section of the light-emitting display device of FIG. 1A in a process.

請同時參照圖1A至圖2C,一實施例中,發光顯示裝置1具有一基板100、配置於基板100上的第一圖案化導電層10、第二圖案化導電層20及第三圖案化導電層30、彼此電性隔離的第一銲墊區501、第二銲墊區502、第三銲墊區503、第四銲墊區504及多個電連接至銲墊區的發光件1000。各個發光件1000的分別對應於銲墊區501至504的各個接腳通過電性連接材料80例如錫膏固定且電性連接至對應的銲墊區501至504,其中銲墊區501和發光件1000的電源接腳構成電性連接而其他銲墊區502、503、504分別和發光件1000的發光訊號接腳構成電性連接。發光件1000可以是單一的發光二極體元件、一個以上的發光二極體組合的發光二極體組件或者發光二極體晶片,但不包含驅動晶片(IC)。當發光件1000為單一的發光二極體時,和其對應連接的銲墊區可以只有二個。 1A to 2C , in one embodiment, the light-emitting display device 1 comprises a substrate 100, a first patterned conductive layer 10, a second patterned conductive layer 20 and a third patterned conductive layer 30 disposed on the substrate 100, a first solder pad region 501, a second solder pad region 502, a third solder pad region 503, a fourth solder pad region 504 electrically isolated from each other, and a plurality of light-emitting elements 1000 electrically connected to the solder pad regions. Each pin of each light-emitting device 1000 corresponding to the pad area 501 to 504 is fixed and electrically connected to the corresponding pad area 501 to 504 through an electrical connection material 80 such as solder paste, wherein the pad area 501 is electrically connected to the power pin of the light-emitting device 1000 and the other pad areas 502, 503, 504 are electrically connected to the light-emitting signal pin of the light-emitting device 1000. The light-emitting device 1000 can be a single light-emitting diode element, a light-emitting diode assembly of more than one light-emitting diode combination, or a light-emitting diode chip, but does not include a driver chip (IC). When the light-emitting element 1000 is a single light-emitting diode, there may be only two corresponding pad areas connected thereto.

請繼續參照圖1A至圖2C,本實施例中,基板100具有一第一表面1001、背對第一表面1001的第二表面1002及多個貫通第一表面1001及第二表面1002的通孔1003,通孔1003用於電性連接位於基板100的第一表面1001一側的圖案化導電層及位於基板100的第二表面1002一側的圖案化導電層。基板100較佳為透明,其材質可以是玻璃、陶瓷、氮化鋁陶瓷、聚碳酸酯、聚對苯甲酸乙二酯、聚醯亞胺、聚酸甲酯、BT樹脂、玻璃纖維或環狀烯烴共聚物。完成電性連接的發光件1000依陣列形式配置於基板100的第二表面1002的同側,發光件彼此間的最小相隔距離不小於2毫米,較佳為2至3毫米,以有別於有機發光二極體(OLED)顯示器或微尺寸發光二極體(Micro-LED)顯示器。 Please continue to refer to FIG. 1A to FIG. 2C . In this embodiment, the substrate 100 has a first surface 1001, a second surface 1002 opposite to the first surface 1001, and a plurality of through holes 1003 penetrating the first surface 1001 and the second surface 1002. The through holes 1003 are used to electrically connect the patterned conductive layer located on one side of the first surface 1001 of the substrate 100 and the patterned conductive layer located on one side of the second surface 1002 of the substrate 100. The substrate 100 is preferably transparent, and its material can be glass, ceramic, aluminum nitride ceramic, polycarbonate, polyethylene terephthalate, polyimide, polymethyl methacrylate, BT resin, glass fiber or cyclic olefin copolymer. The light-emitting elements 1000 that have completed electrical connection are arranged in an array on the same side of the second surface 1002 of the substrate 100. The minimum distance between the light-emitting elements is not less than 2 mm, preferably 2 to 3 mm, to distinguish them from organic light-emitting diode (OLED) displays or micro-LED displays.

如圖1B及圖2A至圖2D所示,第一圖案化導電層10配置於基板100的第一表面1001上,具有複數交織成網格狀的第一導線101,第一導線101包含第一延伸方向的第一導線1011及第二延伸方向的第一導線1012,第一延伸方向 和第二延伸方向互相交叉。本實施例中,不同延伸方向的第一導線101交織出的網格形狀例如是矩形、六角形、橢圓形或圓形。第一導線101的線寬為25至100微米,相較於傳統導線具有更細小的線寬,藉以降低其在顯示畫面中的可視性。如圖1A及圖2A至圖2D所示,第二圖案化導電層20配置於基板100的第二表面1002上,具有至少三相互平行且彼此等距或不等距相隔的呈線狀的第二導線201、自各個第二導線201連接出的呈線狀的延伸部202、至少一和第二導線201相隔的島部203。第三圖案化導電層30配置於基板100的第二表面1002上但與第二圖案化導電層20係以一第一圖案化電性絕緣層40電性隔離。第三圖案化導電層30具有至少三連接至各個第二導線201的相互平行且彼此等距或不等距相隔的呈線狀的第三導線301。第三導線301的延伸方向和第二導線201的延伸方向呈交叉,例如呈垂直。第二導線201經由延伸部202各自連接一個銲墊區,第三導線301延伸連接至發光顯示裝置的點亮訊號輸入端。一實施例中,延伸部202的延伸方向和第二導線201的延伸方向呈交叉,例如呈垂直,但和第三導線301的延伸方向呈平行。島部203和第二導線201相隔一距離而獨立配置的塊體,島部203的延伸方向和基板100的第二表面1002垂直,其可以與第二導線201於同一道製程中形成,也可以於另外製程中形成。如圖2B所示,島部203經由基板100的通孔1003其中之一和第一導線101的交接處102電性連接。交接處102即第一導線101的網格節點處。第二導線201的配置方向和第一導線101的配置方向呈交叉。第二導線201及第二導線201的延伸部202的線寬為25微米至100微米。可選地,第二導線201及第二導線201的延伸部202的線寬相同或不同於第一導線101的線寬。 As shown in FIG. 1B and FIG. 2A to FIG. 2D, the first patterned conductive layer 10 is disposed on the first surface 1001 of the substrate 100, and has a plurality of first conductive lines 101 interwoven into a grid shape. The first conductive lines 101 include first conductive lines 1011 in a first extension direction and first conductive lines 1012 in a second extension direction. The first extension direction and the second extension direction intersect each other. In this embodiment, the grid shape interwoven by the first conductive lines 101 in different extension directions is, for example, a rectangle, a hexagon, an ellipse or a circle. The line width of the first conductive line 101 is 25 to 100 microns, which is smaller than the line width of the conventional conductive line, so as to reduce its visibility in the display screen. As shown in FIG. 1A and FIG. 2A to FIG. 2D , the second patterned conductive layer 20 is disposed on the second surface 1002 of the substrate 100, and has at least three linear second conductive lines 201 that are parallel to each other and spaced equidistantly or unequally from each other, a linear extension portion 202 connected to each second conductive line 201, and at least one island portion 203 spaced from the second conductive line 201. The third patterned conductive layer 30 is disposed on the second surface 1002 of the substrate 100 but is electrically isolated from the second patterned conductive layer 20 by a first patterned electrical insulating layer 40. The third patterned conductive layer 30 has at least three linear third conductive lines 301 that are parallel to each other and spaced equidistantly or unequally from each other and connected to each second conductive line 201. The extension direction of the third conductive line 301 is intersecting with the extension direction of the second conductive line 201, for example, being perpendicular. The second wire 201 is connected to a pad area through the extension portion 202, and the third wire 301 is extended to be connected to the lighting signal input terminal of the light-emitting display device. In one embodiment, the extension direction of the extension portion 202 is intersecting with the extension direction of the second wire 201, for example, perpendicular, but parallel to the extension direction of the third wire 301. The island portion 203 is a block independently configured at a distance from the second wire 201, and the extension direction of the island portion 203 is perpendicular to the second surface 1002 of the substrate 100. It can be formed in the same process as the second wire 201, or in another process. As shown in Figure 2B, the island portion 203 is electrically connected to the intersection 102 of the first wire 101 through one of the through holes 1003 of the substrate 100. The intersection 102 is the grid node of the first wire 101. The configuration direction of the second wire 201 intersects with the configuration direction of the first wire 101. The line width of the second wire 201 and the extension 202 of the second wire 201 is 25 microns to 100 microns. Optionally, the line width of the second wire 201 and the extension 202 of the second wire 201 is the same as or different from the line width of the first wire 101.

如圖1A、圖2B及圖2C所示,第一銲墊區501配置於基板100的第二表面1002的上方的第二圖案化導電層20的島部203上,第二銲墊區502、第三 銲墊區503和第四銲墊區504分別配置於基板100的第二表面1002的上方的第二圖案化導電層20的三條彼此相鄰的第二導線201的延伸部202上。 As shown in FIG. 1A, FIG. 2B and FIG. 2C, the first pad region 501 is disposed on the island portion 203 of the second patterned conductive layer 20 above the second surface 1002 of the substrate 100, and the second pad region 502, the third pad region 503 and the fourth pad region 504 are respectively disposed on the extension portions 202 of three adjacent second conductive lines 201 of the second patterned conductive layer 20 above the second surface 1002 of the substrate 100.

請參照圖1A及圖2D,一實施例中,發光顯示裝置1還包含第一圖案化電性絕緣層40,配置於第二圖案化導電層20的上方,具有複數第一電性絕緣區塊401,使得第三導線301的部分區段位於第一電性絕緣區塊401上而與第二導線201電性隔離且分層配置,藉此增加第二導線201在第二圖案化導電層20中的配置空間以及將第三導線301的佈線空間和第一導線101的佈線空間重疊藉以弱化第三導線301在顯示畫面中的可視性。 Please refer to FIG. 1A and FIG. 2D . In one embodiment, the light-emitting display device 1 further includes a first patterned electrically insulating layer 40, which is disposed above the second patterned conductive layer 20 and has a plurality of first electrically insulating blocks 401, so that a portion of the third conductive line 301 is located on the first electrically insulating block 401 and is electrically isolated from the second conductive line 201 and disposed in layers, thereby increasing the configuration space of the second conductive line 201 in the second patterned conductive layer 20 and overlapping the wiring space of the third conductive line 301 with the wiring space of the first conductive line 101 to weaken the visibility of the third conductive line 301 in the display screen.

請繼續參照圖1A,一實施例中,發光顯示裝置1還具有第二圖案化電性絕緣層60,具有多個第二電性絕緣區塊601,這些第二電性絕緣區塊601分別沿著銲墊區501、502、503、504的第一配置方向例如水平方向配置於基板100的第二表面1002上,用以隔離銲墊區501、502、503、504於銲墊區501、502、503、504的第二配置方向例如垂直方向上的電性接觸。另一實施例中,發光顯示裝置1還具有第三圖案化電性絕緣層70,具有多個第三電性絕緣區塊701,這些第三電性絕緣區塊701分別沿著銲墊區501、502、503、504的第二配置方向例如垂直方向配置於連接第三銲墊區503的第二導線201的上方,用以隔離銲墊區501、502、503、504於第一配置方向例如水平方向上的電性接觸。其他實施例中,第三圖案化電性絕緣層70也可和第二圖案化電性絕緣層60在同一道製程中形成,使第三電性絕緣區塊701配置於連接第三銲墊區503的第二導線201的下方且配置於基板100的第二表面1002上。上述的第二配置方向和第一配置方向呈互相交叉,例如呈互相垂直。實施例中,第一配置方向例如是和第二導線201的配置方向(圖1A所示的水平方向)平行,而第二配置方向例如是和第二導線201的配置方向垂直。 Please continue to refer to Figure 1A. In one embodiment, the light-emitting display device 1 further has a second patterned electrical insulating layer 60, which has a plurality of second electrical insulating blocks 601. These second electrical insulating blocks 601 are respectively arranged on the second surface 1002 of the substrate 100 along the first arrangement direction of the pad regions 501, 502, 503, and 504, such as the horizontal direction, to isolate the electrical contact of the pad regions 501, 502, 503, and 504 in the second arrangement direction of the pad regions 501, 502, 503, and 504, such as the vertical direction. In another embodiment, the light-emitting display device 1 further has a third patterned electrical insulating layer 70 having a plurality of third electrical insulating blocks 701. These third electrical insulating blocks 701 are respectively arranged above the second conductive wire 201 connected to the third pad area 503 along the second arrangement direction of the pad areas 501, 502, 503, 504, such as the vertical direction, to isolate the electrical contact of the pad areas 501, 502, 503, 504 in the first arrangement direction, such as the horizontal direction. In other embodiments, the third patterned electrical insulating layer 70 and the second patterned electrical insulating layer 60 may also be formed in the same process, so that the third electrical insulating region 701 is arranged below the second wire 201 connected to the third pad region 503 and arranged on the second surface 1002 of the substrate 100. The second arrangement direction and the first arrangement direction mentioned above are mutually intersecting, for example, perpendicular to each other. In the embodiment, the first arrangement direction is, for example, parallel to the arrangement direction of the second wire 201 (the horizontal direction shown in FIG. 1A), and the second arrangement direction is, for example, perpendicular to the arrangement direction of the second wire 201.

請繼續參照圖2A至圖2C,一實施例中,發光顯示裝置1還包含一第一圖案化導電金屬種子層900,配置於基板100的第一表面1001上,具有和第一圖案化導電層10的第一導線101的圖案相同的圖案,用以作為第一圖案化導電層10的形成準備層。在此情況下,第一導線101配置在第一圖案化導電金屬種子層900上。此外,發光顯示裝置1還包含一第二圖案化導電金屬種子層200,配置於基板100的第二表面1002上,具有和第二圖案化導電層20的第二導線201、延伸部202及島部203的圖案相同的圖案,用以作為第二圖案化導電層20的形成準備層。在此情況下,第二導線201、延伸部202及島部203配置在第二圖案化導電金屬種子層200上。圖3係一方塊流程圖,顯示圖1A的發光顯示裝置的製造方法的一實施例步驟。請參照圖3,一實施例中,圖1A的發光顯示裝置的製造方法包含下列步驟: 2A to 2C , in one embodiment, the light-emitting display device 1 further includes a first patterned conductive metal seed layer 900 disposed on the first surface 1001 of the substrate 100, having the same pattern as the first conductive line 101 of the first patterned conductive layer 10, and serving as a preparation layer for forming the first patterned conductive layer 10. In this case, the first conductive line 101 is disposed on the first patterned conductive metal seed layer 900. In addition, the luminescent display device 1 further includes a second patterned conductive metal seed layer 200, which is disposed on the second surface 1002 of the substrate 100 and has the same pattern as the second conductive wire 201, the extension 202 and the island 203 of the second patterned conductive layer 20, and is used as a preparation layer for forming the second patterned conductive layer 20. In this case, the second conductive wire 201, the extension 202 and the island 203 are disposed on the second patterned conductive metal seed layer 200. FIG. 3 is a block flow chart showing an embodiment of the manufacturing method of the luminescent display device of FIG. 1A. Referring to FIG. 3, in one embodiment, the manufacturing method of the luminescent display device of FIG. 1A includes the following steps:

步驟11:提供一具有多個通孔的基板。如圖2B所示,提供一具有多個通孔1003的基板100。 Step 11: Provide a substrate having a plurality of through holes. As shown in FIG. 2B , provide a substrate 100 having a plurality of through holes 1003 .

步驟12:利用濺鍍、網版印刷及噴印其中之一的製程形成一第一圖案化導電金屬種子層於基板上。如圖2A至圖2D所示,形成第一圖案化導電金屬種子層900於基板100的第一表面1001上。 Step 12: Form a first patterned conductive metal seed layer on the substrate using one of the processes of sputtering, screen printing and inkjet printing. As shown in FIG. 2A to FIG. 2D , a first patterned conductive metal seed layer 900 is formed on the first surface 1001 of the substrate 100.

步驟13:利用濺鍍、蝕刻、化學鍍及電鍍其中之一的製程形成包含複數交織成網格狀的第一導線的第一圖案化導電層於第一圖案化導電金屬種子層上,使第一導線的交接處對準通孔,且部分通孔的靠近基板的第一表面的一側鍍上第一導線的材料。如圖1A至圖2C所示,第一圖案化導電金屬種子層900上形成包含第一導線101的第一圖案化導電層10,第一圖案化導電層10和第一圖案化導電金屬種子層900的圖案相同。又如圖1B及2B所示,兩個第一導線101的交接處102對準各個通孔1003,部分通孔1003靠近基板100的第一表面1001的一 側鍍上第一導線101的材料。藉由第一圖案化導電金屬種子層900的形成,可以讓所形成的第一圖案化導電層10穩固地附著在基板100上。 Step 13: Form a first patterned conductive layer including a plurality of first conductive lines interwoven into a grid on the first patterned conductive metal seed layer by one of sputtering, etching, chemical plating and electroplating processes, align the intersections of the first conductive lines with the through holes, and plate the first conductive line material on one side of some of the through holes close to the first surface of the substrate. As shown in FIGS. 1A to 2C , a first patterned conductive layer 10 including first conductive lines 101 is formed on the first patterned conductive metal seed layer 900, and the first patterned conductive layer 10 and the first patterned conductive metal seed layer 900 have the same pattern. As shown in Figures 1B and 2B, the intersection 102 of the two first conductive lines 101 is aligned with each through hole 1003, and the material of the first conductive line 101 is plated on the side of the first surface 1001 of the substrate 100. By forming the first patterned conductive metal seed layer 900, the formed first patterned conductive layer 10 can be stably attached to the substrate 100.

步驟14:利用濺鍍、網版印刷及噴印其中之一的製程形成第二圖案化導電金屬種子層於基板的第二表面上。如圖2A至圖2C所示,形成第二圖案化導電金屬種子層200於基板100的第二表面1002上。 Step 14: Form a second patterned conductive metal seed layer on the second surface of the substrate using one of the processes of sputtering, screen printing and inkjet printing. As shown in FIG. 2A to FIG. 2C , a second patterned conductive metal seed layer 200 is formed on the second surface 1002 of the substrate 100.

步驟15:利用濺鍍、蝕刻、化學鍍及電鍍其中之一的製程形成包含第二導線、第二導線的延伸部、島部的第二圖案化導電層於第二圖案化導電金屬種子層上,並使靠近基板的第一表面的一側已鍍上第一導線的材料的通孔的靠近基板的第二表面的另一側鍍上島部的材料且島部和第一導線構成電性連接。如圖1A至圖2C所示,第二圖案化導電金屬種子層200的上方形成包含第二導線201、第二導線201的延伸部202、島部203的第二圖案化導電層20,其中島部203的材料鍍入通孔1003中並經由通孔1003和兩個第一導線101的交接處102電連接。 Step 15: Form a second patterned conductive layer including a second conductive line, an extension of the second conductive line, and an island on the second patterned conductive metal seed layer by one of the processes of sputtering, etching, chemical plating, and electroplating, and make the through hole near the first surface of the substrate, which has been plated with the material of the first conductive line, be plated with the material of the island on the other side of the second surface of the substrate, and the island and the first conductive line are electrically connected. As shown in FIG. 1A to FIG. 2C, a second patterned conductive layer 20 including a second conductive line 201, an extension of the second conductive line 201 202, and an island 203 is formed on the second patterned conductive metal seed layer 200, wherein the material of the island 203 is plated into the through hole 1003 and electrically connected to the junction 102 of the two first conductive lines 101 through the through hole 1003.

步驟16:分別將第二導線的延伸部的一部分及島部的一部分配置成發光件的接腳的銲墊區。如圖1A、圖2B及圖2C所示,將島部203的一部分配置成發光件的接腳的銲墊區501,以及分別將三個相鄰的第二導線201的延伸部202的一部分配置成發光件的三接腳的銲墊區502、503、504。一實施例中,島部203和銲墊區501形成一體,三個相鄰的第二導線201的延伸部202分別和銲墊區502、503、504形成一體。 Step 16: respectively configure a portion of the extension portion of the second conductor and a portion of the island portion as the soldering pad area of the pin of the light-emitting device. As shown in FIG. 1A, FIG. 2B and FIG. 2C, a portion of the island portion 203 is configured as the soldering pad area 501 of the pin of the light-emitting device, and a portion of the extension portion 202 of the three adjacent second conductors 201 is configured as the soldering pad areas 502, 503, and 504 of the three pins of the light-emitting device. In one embodiment, the island portion 203 and the soldering pad area 501 are formed into one body, and the extension portions 202 of the three adjacent second conductors 201 are respectively formed into one body with the soldering pad areas 502, 503, and 504.

圖4A係一剖面示意圖,顯示圖1A之發光顯示裝置於另一製程中的A-A剖面。圖4B係一剖面示意圖,顯示圖1A之發光顯示裝置於另一製程中的B-B剖面。圖4C係一剖面示意圖,顯示圖1A之發光顯示裝置於另一製程中的C-C剖面。圖4D係一剖面示意圖,顯示圖1A之發光顯示裝置於另一製程中的D-D剖面。 FIG4A is a cross-sectional schematic diagram showing the A-A cross section of the luminescent display device of FIG1A in another process. FIG4B is a cross-sectional schematic diagram showing the B-B cross section of the luminescent display device of FIG1A in another process. FIG4C is a cross-sectional schematic diagram showing the C-C cross section of the luminescent display device of FIG1A in another process. FIG4D is a cross-sectional schematic diagram showing the D-D cross section of the luminescent display device of FIG1A in another process.

請同時參照圖1A、圖1B、圖4A至圖4D,另一製程中,不同於上述實施例的是,發光顯示裝置1雖具有第一圖案化導電金屬種子層900,但不具有第二圖案化導電金屬種子層200。其他元件均與前述實施例同。 Please refer to FIG. 1A, FIG. 1B, and FIG. 4A to FIG. 4D simultaneously. In another process, different from the above embodiment, the light-emitting display device 1 has a first patterned conductive metal seed layer 900, but does not have a second patterned conductive metal seed layer 200. The other components are the same as the above embodiment.

圖5係一方塊流程圖,顯示圖1A的發光顯示裝置於另一製程中的製造方法步驟。請參照圖4A至圖4C,另一實施例中,圖1A的發光顯示裝置的第二圖案化導電層可以不用濺鍍、蝕刻及電鍍其中之一的製程形成,因而免除了第二圖案化導電金屬種子層的形成步驟。圖5的製造方法包含下列步驟: FIG5 is a block flow chart showing the steps of the manufacturing method of the light-emitting display device of FIG1A in another process. Referring to FIG4A to FIG4C, in another embodiment, the second patterned conductive layer of the light-emitting display device of FIG1A can be formed without using one of the processes of sputtering, etching and electroplating, thereby eliminating the step of forming the second patterned conductive metal seed layer. The manufacturing method of FIG5 includes the following steps:

步驟21:提供一具有多個通孔的基板。如圖4B所示,提供一具有多個通孔1003的基板100。 Step 21: Provide a substrate having a plurality of through holes. As shown in FIG. 4B , provide a substrate 100 having a plurality of through holes 1003.

步驟22:利用濺鍍、網版印刷及噴印其中之一的製程形成一第一圖案化導電金屬種子層於基板上。如圖4A至圖4D所示,形成第一圖案化導電金屬種子層900於基板100的第一表面1001上。 Step 22: Form a first patterned conductive metal seed layer on the substrate using one of the processes of sputtering, screen printing and inkjet printing. As shown in FIGS. 4A to 4D , a first patterned conductive metal seed layer 900 is formed on the first surface 1001 of the substrate 100.

步驟23:利用濺鍍、蝕刻、化學鍍及電鍍其中之一的製程形成包含複數交織成網格狀的第一導線的第一圖案化導電層於第一圖案化導電金屬種子層上,使第一導線的交接處對準通孔,且部分通孔的靠近基板的第一表面的一側鍍上第一導線的材料。如圖1A、圖1B、圖4A至圖4D所示,第一圖案化導電金屬種子層900上形成包含第一導線101的第一圖案化導電層10,第一圖案化導電層10和第一圖案化導電金屬種子層900的圖案相同。又如圖1B及4B所示,兩個第一導線101的交接處102對準各個通孔1003,部分通孔1003靠近基板100的第一表面1001的一側鍍上第一導線101的材料。藉由第一圖案化導電金屬種子層900的形成,可以讓所形成的第一圖案化導電層10穩固地附著在基板100上。 Step 23: Form a first patterned conductive layer including a plurality of first conductive lines interwoven into a grid on the first patterned conductive metal seed layer by one of sputtering, etching, chemical plating and electroplating processes, align the intersections of the first conductive lines with the through holes, and plate the first conductive line material on one side of some through holes close to the first surface of the substrate. As shown in FIG. 1A , FIG. 1B , and FIG. 4A to FIG. 4D , a first patterned conductive layer 10 including first conductive lines 101 is formed on the first patterned conductive metal seed layer 900, and the first patterned conductive layer 10 and the first patterned conductive metal seed layer 900 have the same pattern. As shown in Figures 1B and 4B, the intersection 102 of the two first conductive lines 101 is aligned with each through hole 1003, and the material of the first conductive line 101 is plated on the side of the first surface 1001 of the substrate 100 near the part of the through hole 1003. By forming the first patterned conductive metal seed layer 900, the formed first patterned conductive layer 10 can be stably attached to the substrate 100.

步驟24:利用網版印刷及噴印其中之一的製程形成包含第二導線、第二導線的延伸部、島部的第二圖案化導電層於基板的第二表面上,並使靠近基板的第一表面的一側已鍍上第一導線的材料的通孔的靠近基板的第二表 面的另一側填入島部的材料且島部和第一導線構成電性連接。如圖1A、圖1B及圖4A至圖4C所示,包含第二導線201、第二導線201的延伸部202、島部203的第二圖案化導電層20直接形成於基板的第二表面1002上,即第二圖案化導電層20與基板的第二表面1002直接接觸,其中島部203的材料以網版印刷及噴印的方式填入通孔1003中並經由通孔1003和兩個第一導線101的交接處電連接。 Step 24: Form a second patterned conductive layer including a second conductive line, an extension of the second conductive line, and an island on the second surface of the substrate by using one of screen printing and inkjet printing processes, and fill the island with the material of the through hole on one side close to the first surface of the substrate and the other side close to the second surface of the substrate, so that the island is electrically connected to the first conductive line. As shown in FIG. 1A, FIG. 1B and FIG. 4A to FIG. 4C, the second patterned conductive layer 20 including the second conductive line 201, the extension portion 202 of the second conductive line 201, and the island portion 203 is directly formed on the second surface 1002 of the substrate, that is, the second patterned conductive layer 20 is in direct contact with the second surface 1002 of the substrate, wherein the material of the island portion 203 is filled into the through hole 1003 by screen printing and inkjet printing and is electrically connected through the through hole 1003 and the intersection of the two first conductive lines 101.

步驟25:分別將第二導線的延伸部的一部分及島部的一部分配置成發光件的接腳的銲墊區。如圖1A、圖4B及圖4C所示,將島部203的一部分配置成發光件的接腳的銲墊區501,以及分別將三個相鄰的第二導線201的延伸部202的一部分配置成發光件的三接腳的銲墊區502、503、504。一實施例中,島部203和銲墊區501形成一體,三個相鄰的第二導線201的延伸部202分別和銲墊區502、503、504形成一體。 Step 25: respectively configure a portion of the extension portion of the second conductor and a portion of the island portion as the soldering pad area of the pin of the light-emitting device. As shown in FIG. 1A, FIG. 4B and FIG. 4C, a portion of the island portion 203 is configured as the soldering pad area 501 of the pin of the light-emitting device, and a portion of the extension portion 202 of the three adjacent second conductors 201 is configured as the soldering pad areas 502, 503, and 504 of the three pins of the light-emitting device. In one embodiment, the island portion 203 and the soldering pad area 501 are integrated, and the extension portions 202 of the three adjacent second conductors 201 are respectively integrated with the soldering pad areas 502, 503, and 504.

圖6係一平面示意圖,顯示本發明一實施例之發光顯示裝置的具蜂巢狀的網格導線。在前述實施例中,呈網狀的第一圖案化導電層10的第一導線101所構成的網格103的形狀可以是六角形而如蜂巢狀,藉此提升第一導線的導電效率。 FIG6 is a schematic plan view showing a honeycomb-shaped grid conductor of a light-emitting display device according to an embodiment of the present invention. In the aforementioned embodiment, the shape of the grid 103 formed by the first conductor 101 of the first patterned conductive layer 10 in a mesh shape can be hexagonal and honeycomb-shaped, thereby improving the conductive efficiency of the first conductor.

上述實施例中,儘管第三圖案化導電層30係和第二圖案化導電層20配置於基板100的第二表面1002上,但本發明不以此為限,其他實施例中,第三圖案化導電層30也可配置基板100的第一表面1001上而和第一圖案化導電層10彼此間電性隔離。換言之,只要第一圖案化導電層10、第二圖案化導電層20及第三圖案化導電層30彼此間可以電性隔離,其於基板100上的分層配置順序可以依情況變更,以滿足最佳的配置關係及最小的可視性要求。此外,各個圖案化導電層上的導線或延伸部或島部也可分層設置,只要滿足第一導線連接到發光件的電源接腳的銲墊區、第二導線的延伸部連接到發光件的其他接腳的銲墊 區且第二導線各自連接至第三導線的電連接關係,本發明不對分層設置的配置態樣設限。 In the above-mentioned embodiment, although the third patterned conductive layer 30 and the second patterned conductive layer 20 are disposed on the second surface 1002 of the substrate 100, the present invention is not limited thereto. In other embodiments, the third patterned conductive layer 30 may also be disposed on the first surface 1001 of the substrate 100 and electrically isolated from the first patterned conductive layer 10. In other words, as long as the first patterned conductive layer 10, the second patterned conductive layer 20 and the third patterned conductive layer 30 can be electrically isolated from each other, the layered arrangement order on the substrate 100 may be changed according to circumstances to meet the best arrangement relationship and the minimum visibility requirement. In addition, the wires or extensions or islands on each patterned conductive layer can also be arranged in layers, as long as the electrical connection relationship that the first wire is connected to the pad area of the power pin of the light-emitting device, the extension of the second wire is connected to the pad area of the other pins of the light-emitting device, and the second wires are each connected to the third wire is satisfied, the present invention does not limit the configuration of the layered arrangement.

綜上所述,依照本發明各實施例所描述的發光顯示裝置及其製造方法將對應到發光件的接腳的銲墊區的連接導線分層配置,使得銲墊區中的電源連接導線和銲墊區中的訊號連接導線不共用同一平面配置空間,有利於加大電源連接導線的平面配置空間以及提升電源連接導線的導電率。由於基板的單一側表面上只配置電源連接導線,在加大的平面配置空間內,電源連接導線可被細分成複數線寬更小的等效導線,以提高顯示畫面的通透度。另一方面,訊號連接導線的引出線路(即實施例中的第三導線)可以進一步利用電性絕緣層來進行分層配置,讓這些引出線路可以和電源連接導線在電性隔離下重疊配置以弱化引出線路的可視性。此外,發光件亦可採用微小型發光二極體晶片以降低發光件本身在顯示畫面中的可視性。如此一來,在發光件的配置基板是透明的情況下,可大幅地降低位於基板上的導線和發光件在顯示畫面中的可視性,進而提升在一定距離外觀看這類發光顯示器的對比度和清晰度。另一方面,由於電性連接至發光件的第一圖案化導電層及第二圖案化導電層可採用諸如網版印刷及噴印的印刷製程來製作,因而可進一步利用近紅外光照射來快速固化印刷或噴印後的導電層,以縮短製程時間和便利製程程序。此外,第一圖案化導電層及第二圖案化導電層的材質可依製程的不同來進行選擇,在製程設計上具有彈性。例如,第一圖案化導電層的第一導線的材質可以是摻有導電粉末的漿料並可進一步添加可化學鍍的材料,可以是具高透明度的氧化銦錫(ITO)膜、氟摻雜氧化錫(FTO)膜、氧化鋅(ZnO)膜或氧化鋁鋅(AZO)膜,也可以是銅、銀、鎳或鎳金。同理,第二圖案化導電層的第二導線、第二導線的延伸部及島部的材質可以是摻有導電粉末的漿料並可進一步添加可化學鍍的材料,可以是具高透明度的氧化銦錫(ITO)膜、氟摻雜氧化錫(FTO)膜、氧化鋅(ZnO)膜或氧化鋁鋅 (AZO)膜,也可以是銅、銀、鎳或鎳金。本發明中,第一圖案化導電層或第二導電層的材料並不限於上述所提的材料,凡具有導電性的材料例如石墨烯、奈米碳管等材質亦可被使用。 In summary, the light-emitting display device and the manufacturing method thereof described in the embodiments of the present invention configure the connection wires of the pad area corresponding to the pins of the light-emitting element in layers, so that the power connection wires in the pad area and the signal connection wires in the pad area do not share the same plane configuration space, which is beneficial to increase the plane configuration space of the power connection wires and improve the conductivity of the power connection wires. Since only the power connection wires are configured on a single side surface of the substrate, the power connection wires can be subdivided into a plurality of equivalent wires with smaller line widths within the enlarged plane configuration space to improve the transparency of the display screen. On the other hand, the lead-out lines of the signal connection wires (i.e., the third wires in the embodiment) can be further configured in layers using an electrical insulation layer, so that these lead-out lines can be overlapped with the power connection wires under electrical isolation to weaken the visibility of the lead-out lines. In addition, the light-emitting element can also use a micro-light-emitting diode chip to reduce the visibility of the light-emitting element itself in the display screen. In this way, when the configuration substrate of the light-emitting element is transparent, the visibility of the wires and the light-emitting element on the substrate in the display screen can be greatly reduced, thereby improving the contrast and clarity of such a light-emitting display when viewed from a certain distance. On the other hand, since the first patterned conductive layer and the second patterned conductive layer electrically connected to the light-emitting element can be manufactured by printing processes such as screen printing and inkjet printing, near-infrared light irradiation can be further used to quickly cure the printed or inkjet printed conductive layer to shorten the process time and facilitate the process procedure. In addition, the materials of the first patterned conductive layer and the second patterned conductive layer can be selected according to different processes, which is flexible in process design. For example, the material of the first conductive line of the first patterned conductive layer may be a slurry mixed with conductive powder and may further include a chemically plated material, such as an indium tin oxide (ITO) film, a fluorine-doped tin oxide (FTO) film, a zinc oxide (ZnO) film or an aluminum zinc oxide (AZO) film with high transparency, or copper, silver, nickel or nickel gold. Similarly, the material of the second conductive line, the extension part of the second conductive line and the island part of the second patterned conductive layer can be a slurry mixed with conductive powder and can further add a material that can be chemically plated, which can be a highly transparent indium tin oxide (ITO) film, fluorine-doped tin oxide (FTO) film, zinc oxide (ZnO) film or aluminum zinc oxide (AZO) film, or copper, silver, nickel or nickel gold. In the present invention, the material of the first patterned conductive layer or the second conductive layer is not limited to the above-mentioned materials, and any conductive material such as graphene, carbon nanotubes, etc. can also be used.

以上描述,對於本發明所屬技術領域的通常知識者而言,應可明瞭與實施。本發明的些許實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可做些許的更動和潤飾。換言之,其它未脫離本發明所揭示的精神下所完成的等效實施例,均應包含於本發明,而本發明的保護範圍當以後附的申請專利範圍所界定者為準。 The above description should be understandable and implementable to those with ordinary knowledge in the technical field to which the present invention belongs. Some embodiments of the present invention are disclosed as above, but they are not used to limit the present invention. Any person with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. In other words, other equivalent embodiments completed without departing from the spirit disclosed by the present invention should be included in the present invention, and the scope of protection of the present invention shall be defined by the scope of the attached patent application.

1:發光顯示裝置 1: Luminous display device

100:基板 100: Substrate

1001:第一表面 1001: First surface

1002:第二表面 1002: Second surface

1003:通孔 1003:Through hole

900:第一圖案化導電金屬種子層 900: First patterned conductive metal seed layer

101:第一導線 101: First conductor

102:交接處 102: Junction

200:第二圖案化導電金屬種子層 200: Second patterned conductive metal seed layer

202:延伸部 202: Extension

203:島部 203: Island Department

501:第一銲墊區 501: First welding pad area

502:第二銲墊區 502: Second welding pad area

80:電性連接材料 80: Electrical connection materials

1000:發光件 1000: Luminous parts

Claims (15)

一種發光顯示裝置,包含:一基板,具有一第一表面及背對該第一表面的一第二表面,基板上具有複數通孔;一第一圖案化導電層,配置於該基板的該第一表面上,具有複數交織成網格狀的第一導線;一第二圖案化導電層,配置於該基板的該第二表面上,具有至少三相互平行且彼此等距或不等距相隔的呈線狀的第二導線、自各個該些第二導線連接出的呈線狀的延伸部及至少一和該些第二導線相隔的島部,該些延伸部的配置方向和該些第二導線的配置方向呈交叉,該島部經由該些通孔其中之一和該些第一導線的交接處電性連接;彼此電性隔離的一第一銲墊區、一第二銲墊區、一第三銲墊區和一第四銲墊區,該第一銲墊區配置於該島部上,該第二銲墊區、該第三銲墊區和該第四銲墊區分別配置於該些延伸部上;及複數發光件,依陣列形式配置於該基板的該第二表面的同側,彼此間的最小相隔距離為2至3毫米,至少一該些發光件的四個不同接腳分別連接至該第一銲墊區、該第二銲墊區、該第三銲墊區及該第四銲墊區。 A light-emitting display device comprises: a substrate having a first surface and a second surface opposite to the first surface, the substrate having a plurality of through holes; a first patterned conductive layer disposed on the first surface of the substrate, having a plurality of first conductive lines interwoven into a grid; a second patterned conductive layer disposed on the second surface of the substrate, having at least three linear second conductive lines parallel to each other and spaced equidistantly or unequally from each other, linear extensions connected from each of the second conductive lines, and at least one island portion spaced from the second conductive lines, wherein the arrangement direction of the extensions intersects the arrangement direction of the second conductive lines. , the island portion is electrically connected to the intersection of the first conductive lines through one of the through holes; a first pad area, a second pad area, a third pad area and a fourth pad area are electrically isolated from each other, the first pad area is arranged on the island portion, the second pad area, the third pad area and the fourth pad area are respectively arranged on the extension portions; and a plurality of light-emitting elements are arranged in an array on the same side of the second surface of the substrate, with a minimum spacing of 2 to 3 mm between each other, and at least four different pins of at least one of the light-emitting elements are respectively connected to the first pad area, the second pad area, the third pad area and the fourth pad area. 如請求項1之發光顯示裝置,其中各個該些第一導線及各個該些第二導線的線寬為25微米至100微米。 As in claim 1, the light-emitting display device, wherein the line width of each of the first conductive lines and each of the second conductive lines is 25 microns to 100 microns. 如請求項1之發光顯示裝置,其中該些第一導線的網格形狀為矩形、六角形、橢圓形及圓形其中之一。 As in claim 1, the light-emitting display device, wherein the grid shape of the first conductive lines is one of rectangular, hexagonal, elliptical and circular. 如請求項1之發光顯示裝置,更包含: 一第三圖案化導電層,配置於該基板的該第二表面上且與該第二圖案化導電層電性隔離,具有至少三連接至各該些第二導線的相互平行且彼此等距或不等距相隔的呈線狀的第三導線,該些第三導線的延伸方向和該些第二導線的延伸方向呈交叉,該些第三導線延伸連接至該發光顯示裝置的點亮訊號輸入端。 The light-emitting display device of claim 1 further comprises: A third patterned conductive layer, disposed on the second surface of the substrate and electrically isolated from the second patterned conductive layer, having at least three third linear conductive lines connected to each of the second conductive lines, parallel to each other and spaced equidistantly or unequally from each other, the extension direction of the third conductive lines intersecting with the extension direction of the second conductive lines, and the third conductive lines extending to connect to the lighting signal input terminal of the light-emitting display device. 如請求項4之發光顯示裝置,更包含:一第一圖案化電性絕緣層,具有複數第一電性絕緣區塊,配置於該第二圖案化導電層及該第三圖案化導電層之間,該些第一電性絕緣區塊使得該些第三導線和該些第二導線電性隔離。 The light-emitting display device of claim 4 further comprises: a first patterned electrically insulating layer having a plurality of first electrically insulating blocks disposed between the second patterned conductive layer and the third patterned conductive layer, wherein the first electrically insulating blocks electrically isolate the third conductive lines from the second conductive lines. 如請求項1之發光顯示裝置,更包含:一第二圖案化電性絕緣層,具有複數第二電性絕緣區塊,該些第二電性絕緣區塊分別沿著該第一銲墊區、該第二銲墊區、該第三銲墊區和該第四銲墊區的一第一配置方向配置於該基板的該第二表面上,用以隔離該第一銲墊區、該第二銲墊區、該第三銲墊區和該第四銲墊區於一第二配置方向上的電性接觸,該第二配置方向和該第一配置方向呈交叉。 The light-emitting display device of claim 1 further comprises: a second patterned electrically insulating layer having a plurality of second electrically insulating regions, the second electrically insulating regions being arranged on the second surface of the substrate along a first arrangement direction of the first pad region, the second pad region, the third pad region and the fourth pad region, respectively, for isolating the electrical contact of the first pad region, the second pad region, the third pad region and the fourth pad region in a second arrangement direction, the second arrangement direction intersecting the first arrangement direction. 如請求項6之發光顯示裝置,更包含:一第三圖案化電性絕緣層,具有複數第三電性絕緣區塊,該些第三電性絕緣區塊分別沿著該第一銲墊區、該第二銲墊區、該第三銲墊區和該第四銲墊區的該第二配置方向配置於連接該第三銲墊區的該第二導線的上方,用以隔離該第一銲墊區、該第二銲墊區、該第三銲墊區和該第四銲墊區於該第一配置方向上的電性接觸。 The light-emitting display device of claim 6 further comprises: a third patterned electrically insulating layer having a plurality of third electrically insulating blocks, the third electrically insulating blocks being respectively arranged above the second wire connected to the third welding pad area along the second arrangement direction of the first welding pad area, the second welding pad area, the third welding pad area and the fourth welding pad area, for isolating the electrical contact of the first welding pad area, the second welding pad area, the third welding pad area and the fourth welding pad area in the first arrangement direction. 如請求項1之發光顯示裝置,更包含: 一第一圖案化導電金屬種子層,形成於該基板的該第一表面上,具有和該第一圖案化導電層的圖案相同的圖案,用以作為該第一圖案化導電層的形成準備層。 The light-emitting display device of claim 1 further comprises: A first patterned conductive metal seed layer formed on the first surface of the substrate, having the same pattern as the first patterned conductive layer, and used as a preparation layer for forming the first patterned conductive layer. 如請求項8之發光顯示裝置,更包含:一第二圖案化導電金屬種子層,形成於該基板的該第二表面上,具有和該第二圖案化導電層的圖案相同的圖案,用以作為該第二圖案化導電層的形成準備層。 The light-emitting display device of claim 8 further comprises: a second patterned conductive metal seed layer formed on the second surface of the substrate, having the same pattern as the second patterned conductive layer, and used as a preparation layer for forming the second patterned conductive layer. 如請求項1至9中任一項之發光顯示裝置,其中該基板的材質是玻璃、陶瓷、氮化鋁陶瓷、聚碳酸酯、聚對苯甲酸乙二酯、聚醯亞胺、聚酸甲酯、BT樹脂、玻璃纖維及環狀烯烴共聚物其中之一。 A light-emitting display device as claimed in any one of claims 1 to 9, wherein the material of the substrate is one of glass, ceramic, aluminum nitride ceramic, polycarbonate, polyethylene terephthalate, polyimide, polymethyl methacrylate, BT resin, glass fiber and cyclic olefin copolymer. 如請求項1至9中任一項之發光顯示裝置,其中該些發光件為發光二極體燈珠。 A light-emitting display device as claimed in any one of claims 1 to 9, wherein the light-emitting elements are light-emitting diode lamp beads. 一種發光顯示裝置的製造方法,包含:提供一具有多個通孔的基板,該基板具有一第一表面及背對該第一表面的一第二表面;利用濺鍍、網版印刷及噴印其中之一的製程形成一第一圖案化導電金屬種子層於該第一表面上;利用濺鍍、蝕刻、化學鍍及電鍍其中之一的製程形成包含複數交織成網格狀的第一導線的第一圖案化導電層於該第一圖案化導電金屬種子層上,且使第一導線的交接處各自對準該些通孔;形成包含複數第二導線及自各該些第二導線連接出的延伸部及和該些第二導線相隔的島部的第二圖案化導電層於該第二表面上;及 分別將該些第二導線的該延伸部的一部分及該島部的一部分配置成一發光件的接腳的銲墊區;其中,該些通孔的靠近該基板的該第一表面的一側鍍有該第一導線的材料。 A method for manufacturing a light-emitting display device comprises: providing a substrate having a plurality of through holes, the substrate having a first surface and a second surface opposite to the first surface; forming a first patterned conductive metal seed layer on the first surface by using one of a process selected from the group consisting of sputtering, screen printing and inkjet printing; forming a first patterned conductive layer comprising a plurality of first conductive lines interwoven into a grid on the first patterned conductive metal seed layer by using one of a process selected from the group consisting of sputtering, etching, chemical plating and electroplating. On the second surface, a second patterned conductive layer is formed, which includes a plurality of second conductive lines, extensions connected from each of the second conductive lines, and islands separated from the second conductive lines; and a portion of the extensions and a portion of the islands of the second conductive lines are respectively configured as a soldering pad area of a pin of a light-emitting device; wherein the side of the through holes close to the first surface of the substrate is plated with the material of the first conductive line. 如請求項12之發光顯示裝置的製造方法,還包含:利用濺鍍、網版印刷及噴印其中之一的製程形成一第二圖案化導電金屬種子層於該第二表面上;且該第二圖案化導電層係利用濺鍍、蝕刻、化學鍍及電鍍其中之一的製程形成於該第二圖案化導電金屬種子層上;其中,該些通孔的靠近該基板的該第二表面的一側鍍有該島部的材料。 The manufacturing method of the light-emitting display device of claim 12 further comprises: forming a second patterned conductive metal seed layer on the second surface by one of sputtering, screen printing and inkjet printing; and the second patterned conductive layer is formed on the second patterned conductive metal seed layer by one of sputtering, etching, chemical plating and electroplating; wherein the side of the through holes close to the second surface of the substrate is plated with the material of the island portion. 如請求項12之發光顯示裝置的製造方法,其中該第二圖案化導電層係利用網版印刷及噴印其中之一的製程形成;且該第二圖案化導電層與該第二表面直接接觸。 A method for manufacturing a light-emitting display device as claimed in claim 12, wherein the second patterned conductive layer is formed by a process of screen printing or inkjet printing; and the second patterned conductive layer is in direct contact with the second surface. 如請求項12至14中任一項之發光顯示裝置的製造方法,其中該第一導線的材質是摻有導電粉末的漿料、氧化銦錫(ITO)膜、氟摻雜氧化錫(FTO)膜、氧化鋅(ZnO)膜、氧化鋁鋅(AZO)膜、銅、銀、鎳及鎳金其中之一。 A method for manufacturing a light-emitting display device as claimed in any one of claims 12 to 14, wherein the material of the first conductive line is one of a slurry doped with conductive powder, an indium tin oxide (ITO) film, a fluorine-doped tin oxide (FTO) film, a zinc oxide (ZnO) film, an aluminum zinc oxide (AZO) film, copper, silver, nickel and nickel-gold.
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