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TWI494443B - A Fe-Co alloy sputtering target, a method for producing the same, and a soft magnetic thin film layer and a vertical magnetic recording medium using the same - Google Patents

A Fe-Co alloy sputtering target, a method for producing the same, and a soft magnetic thin film layer and a vertical magnetic recording medium using the same Download PDF

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Publication number
TWI494443B
TWI494443B TW102128978A TW102128978A TWI494443B TW I494443 B TWI494443 B TW I494443B TW 102128978 A TW102128978 A TW 102128978A TW 102128978 A TW102128978 A TW 102128978A TW I494443 B TWI494443 B TW I494443B
Authority
TW
Taiwan
Prior art keywords
sputtering target
alloy sputtering
same
alloy
film layer
Prior art date
Application number
TW102128978A
Other languages
English (en)
Chinese (zh)
Other versions
TW201413003A (zh
Inventor
長谷川浩之
澤田俊之
松原慶明
Original Assignee
山陽特殊製鋼股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 山陽特殊製鋼股份有限公司 filed Critical 山陽特殊製鋼股份有限公司
Publication of TW201413003A publication Critical patent/TW201413003A/zh
Application granted granted Critical
Publication of TWI494443B publication Critical patent/TWI494443B/zh

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
    • G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
  • Thin Magnetic Films (AREA)
TW102128978A 2012-08-14 2013-08-13 A Fe-Co alloy sputtering target, a method for producing the same, and a soft magnetic thin film layer and a vertical magnetic recording medium using the same TWI494443B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012179811A JP6050050B2 (ja) 2012-08-14 2012-08-14 Ｆｅ−Ｃｏ系合金スパッタリングターゲット材およびその製造方法

Publications (2)

Publication Number Publication Date
TW201413003A TW201413003A (zh) 2014-04-01
TWI494443B true TWI494443B (zh) 2015-08-01

Family

ID=50285930

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102128978A TWI494443B (zh) 2012-08-14 2013-08-13 A Fe-Co alloy sputtering target, a method for producing the same, and a soft magnetic thin film layer and a vertical magnetic recording medium using the same

Country Status (6)

Country Link
JP (1) JP6050050B2 (ja)
CN (1) CN104508167B (ja)
MY (1) MY167435A (ja)
SG (1) SG11201408794VA (ja)
TW (1) TWI494443B (ja)
WO (1) WO2014027636A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6801168B2 (ja) * 2014-06-27 2020-12-16 三菱マテリアル株式会社 スパッタリングターゲット、光学機能膜、及び、積層配線膜
US10644230B2 (en) 2015-03-04 2020-05-05 Jx Nippon Mining & Metals Corporation Magnetic material sputtering target and method for producing same
JP6575775B2 (ja) * 2015-03-27 2019-09-18 日立金属株式会社 軟磁性膜
JP6784733B2 (ja) * 2018-08-20 2020-11-11 山陽特殊製鋼株式会社 磁気記録媒体の軟磁性層用Ｃｏ系合金
WO2024128075A1 (ja) * 2022-12-16 2024-06-20 株式会社プロテリアル スパッタリングターゲットおよびその製造方法
CN119609133B (zh) * 2024-12-12 2025-12-02 先导薄膜材料(安徽)有限公司 一种FeCoNbW合金靶材及其热等静压制备方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008121071A (ja) * 2006-11-13 2008-05-29 Sanyo Special Steel Co Ltd 軟磁性ＦｅＣｏ系ターゲット材

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4331182B2 (ja) * 2006-04-14 2009-09-16 山陽特殊製鋼株式会社 軟磁性ターゲット材
US20070253103A1 (en) * 2006-04-27 2007-11-01 Heraeus, Inc. Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target
JP4907259B2 (ja) * 2006-08-16 2012-03-28 山陽特殊製鋼株式会社 Ｃｒを添加したＦｅＣｏＢ系ターゲット材
JP5111835B2 (ja) * 2006-11-17 2013-01-09 山陽特殊製鋼株式会社 （ＣｏＦｅ）ＺｒＮｂ／Ｔａ／Ｈｆ系ターゲット材およびその製造方法
JP5253781B2 (ja) * 2007-09-18 2013-07-31 山陽特殊製鋼株式会社 垂直磁気記録媒体における軟磁性膜層用合金ターゲット材
JP5397755B2 (ja) * 2008-06-17 2014-01-22 日立金属株式会社 軟磁性膜形成用Ｆｅ−Ｃｏ系合金スパッタリングターゲット材
JP5726615B2 (ja) * 2010-11-22 2015-06-03 山陽特殊製鋼株式会社 磁気記録媒体のシード層用合金およびスパッタリングターゲット材
CN104145043B (zh) * 2012-06-06 2015-11-25 日立金属株式会社 Fe-Co系合金溅射靶材及其制造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008121071A (ja) * 2006-11-13 2008-05-29 Sanyo Special Steel Co Ltd 軟磁性ＦｅＣｏ系ターゲット材

Also Published As

Publication number Publication date
CN104508167A (zh) 2015-04-08
JP6050050B2 (ja) 2016-12-21
CN104508167B (zh) 2017-08-04
JP2014037569A (ja) 2014-02-27
TW201413003A (zh) 2014-04-01
WO2014027636A1 (ja) 2014-02-20
SG11201408794VA (en) 2015-02-27
MY167435A (en) 2018-08-28

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