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TWI388023B - An optical detecting device and a detecting method using the same - Google Patents

An optical detecting device and a detecting method using the same Download PDF

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TWI388023B
TWI388023B TW98132606A TW98132606A TWI388023B TW I388023 B TWI388023 B TW I388023B TW 98132606 A TW98132606 A TW 98132606A TW 98132606 A TW98132606 A TW 98132606A TW I388023 B TWI388023 B TW I388023B
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optical detecting
optical
semiconductor light
carrier
detecting device
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TW98132606A
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TW201112340A (en
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Huga Optotech Inc
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  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
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Description

光學檢測裝置及使用該裝置之檢測方法Optical detecting device and detecting method using the same

本發明係與光學檢測技術有關,具體而言,是指一種半導體發光元件之光參數量測設備與方法。The invention relates to optical detection technology, and in particular to an optical parameter measurement device and method for a semiconductor light-emitting component.

一般光源的光參數量測是透過積分球(Light Integrating Sphere)搭配一偵測器來進行,積分球係開設有一輸入孔與一輸出孔之球體,球體內壁則均勻塗佈有高反射率的硫酸鋇塗層,偵測器則設置於輸出孔。因此,當待測光源發出的光線自該輸入孔入射於積分球之後,將會在積分球內部均勻地反射與漫射,因而可藉由該偵測器準確量測該光源所輸出光線的強度、照度等光參數。The optical parameter measurement of a general light source is performed by using a Light Integrating Sphere with a detector. The integrating sphere has a sphere with an input aperture and an output aperture, and the inner wall of the sphere is uniformly coated with a high reflectivity. The barium sulfate coating, the detector is placed in the output hole. Therefore, when the light emitted by the light source to be tested is incident on the integrating sphere from the input hole, it will be uniformly reflected and diffused inside the integrating sphere, so that the intensity of the light output by the light source can be accurately measured by the detector. , illuminance and other light parameters.

習知半導體發光元件之光參數量測設備與方法,如美國專利第6,734,959號發明專利所揭,一半導體發光元件是放置在一承載座上,一積分球則對準該半導體發光元件上方,運用二探針導電點亮該半導體發光元件上每一發光單元之後,再由該積分球收集來自該發光單元所發出的部份光線來進行光參數量測。A light-parameter measuring device and method for a conventional semiconductor light-emitting device, as disclosed in US Pat. No. 6,734,959, a semiconductor light-emitting device is placed on a carrier, and an integrating sphere is aligned above the semiconductor light-emitting device. After the two probes electrically illuminate each of the light-emitting units on the semiconductor light-emitting element, a part of the light emitted from the light-emitting unit is collected by the integrating sphere to perform optical parameter measurement.

實際上,半導體發光元件多為360度發光的,然而,由於探針的存在,進而導致半導體發光元件無法置入積分球當中進行完整的收光。以現有的光學檢測設備來說,積分球的輸入孔外周緣與該半導體發光元件中心所構成的收光角度僅有12°~120°,換句話說,習知的光學檢測設備根 本無法收集前述收光角度以外的光線,而且只能夠量測該半導體發光元件頂部所發出的光線,完全無法量測該半導體發光元件底部所發出的光線,量測的準確度因此大打折扣。In fact, the semiconductor light-emitting elements are mostly 360-degree light-emitting. However, due to the presence of the probe, the semiconductor light-emitting elements cannot be placed in the integrating sphere for complete light collection. In the conventional optical detecting device, the outer peripheral edge of the input hole of the integrating sphere and the light receiving angle formed by the center of the semiconductor light emitting element are only 12° to 120°, in other words, the conventional optical detecting device root. The light outside the above-mentioned light-receiving angle cannot be collected, and only the light emitted from the top of the semiconductor light-emitting element can be measured, and the light emitted from the bottom of the semiconductor light-emitting element can not be measured at all, and the accuracy of the measurement is greatly reduced.

此外,受限於半導體發光元件的製程良率,不同發光元件的光形不盡相同,頂部和底部發光的比例也存有差異,且封裝後的成品將會應用到底部所發出的光線,因此,如果無法將半導體發光元件底部所發出的光線納入量測範圍,造成各項光學參數量測上的誤差,對於業者在品質管控上將會造成很大的困擾。In addition, limited by the process yield of the semiconductor light-emitting device, the light shapes of different light-emitting elements are not the same, the ratio of the top and bottom light-emitting is also different, and the packaged finished product will be applied to the light emitted from the bottom, so If the light emitted from the bottom of the semiconductor light-emitting element cannot be included in the measurement range, the error in the measurement of various optical parameters will cause great trouble to the quality control of the operator.

本發明之目的在於提供一種光學檢測設備及使用該裝置之檢測方法,可同時收集半導體發光元件頂部與底部所發出的光線並進行量測,提高量測的準確度。An object of the present invention is to provide an optical detecting device and a detecting method using the same, which can simultaneously collect and measure the light emitted from the top and the bottom of the semiconductor light emitting element, thereby improving the accuracy of the measurement.

本發明之另一目的在於提供一種光學檢測設備及使用該裝置之檢測方法,其僅就原本的檢測設備作小幅修改,轉換成本低廉。Another object of the present invention is to provide an optical detecting apparatus and a detecting method using the same, which are only slightly modified with respect to the original detecting apparatus, and the conversion cost is low.

為達成前揭目的,本發明提供一種量測半導體發光元件光參數之光學檢測設備,包含有用來承載至少一半導體發光元件的一承載座,以及一光學偵測裝置,該光學檢測設備之特徵在於:該承載座對應該半導體發光元件底部之頂面更設有一反射裝置。In order to achieve the foregoing object, the present invention provides an optical detecting apparatus for measuring optical parameters of a semiconductor light emitting element, comprising a carrier for carrying at least one semiconductor light emitting element, and an optical detecting device characterized in that the optical detecting device is characterized in that The carrier is further provided with a reflecting means corresponding to the top surface of the bottom of the semiconductor light emitting element.

本發明亦提供一種量測半導體發光元件光參數之光學 檢測方法,其步驟包含:將至少一半導體發光元件放置於一承載座之頂面,且該承載座之頂面設有一反射裝置;將一光學偵測裝置對準該半導體發光元件;啟動該光學偵測裝置所對準之該半導體發光元件,同時,該反射裝置將反射或散射(Scatter)該半導體發光元件之底部光線而部分射向該光學偵測裝置,再以該光學偵測裝置進行光參數量測。The invention also provides an optical for measuring the optical parameters of a semiconductor light-emitting component The detecting method comprises the steps of: placing at least one semiconductor light emitting element on a top surface of a carrier, and providing a reflecting device on a top surface of the carrier; aligning an optical detecting device with the semiconductor light emitting device; and starting the optical Detecting the semiconductor light-emitting element to which the device is directed, and at the same time, the reflecting device reflects or scatters the bottom light of the semiconductor light-emitting element and partially targets the optical detecting device, and then performs light with the optical detecting device. Parameter measurement.

因此,本發明只需在原有檢測設備的承載座上設置反射裝置即可,應用該反射裝置來反射或散射半導體發光元件底部所發出的光線,進而提高量測的準確度,轉換成本低廉,從而達成本發明之目的。Therefore, the present invention only needs to provide a reflecting device on the carrier of the original detecting device, and the reflecting device is used to reflect or scatter the light emitted from the bottom of the semiconductor light emitting device, thereby improving the accuracy of the measurement and the conversion cost is low, thereby The object of the invention is achieved.

其中,該反射裝置係可採用硫酸鋇、分佈式布拉格反射層(Distributed Bragg Reflectors,DBR)、金屬反射層(Metallic Reflector)、或者金屬反射層與透光層、保護層所構成的複合結構。The reflective device may be a composite structure composed of barium sulfate, distributed Bragg reflectors (DBR), a metal reflective layer, or a metal reflective layer and a light transmissive layer and a protective layer.

為了更瞭解本發明之特點所在,茲舉以下一較佳實施例並配合圖式說明如下,其中:第一圖係本發明較佳實施例所使用之設備示意圖;第二圖係本發明第一實施例中承載座之剖視圖;第三圖係本發明第一實施例之承載座直接承載一半導體發光元件之示意圖; 第四圖係本發明第二實施例中承載座之剖視圖;第五圖係本發明第三實施例中承載座之剖視圖;第六圖係本發明第四實施例中承載座之剖視圖。In order to better understand the features of the present invention, the following description of the preferred embodiments and the accompanying drawings are as follows, wherein: FIG. 1 is a schematic diagram of the apparatus used in the preferred embodiment of the present invention; The cross-sectional view of the carrier in the embodiment; the third figure is a schematic diagram of the carrier of the first embodiment of the present invention directly carrying a semiconductor light-emitting component; 4 is a cross-sectional view of a carrier in a second embodiment of the present invention; a fifth view is a cross-sectional view of a carrier in a third embodiment of the present invention; and a sixth is a cross-sectional view of the carrier in the fourth embodiment of the present invention.

請參閱第一圖,本發明所提供一種光學檢測裝置包含有一光學偵測裝置20與一承載座30。其中,該承載座30係可用以承載至少一半導體發光元件50,且該承載座30對應該半導體發光元件底部之頂面更設有一反射裝置31,而該光學偵測裝置20位於該半導體發光元件50相對遠離於該承載座30之一側,且該光學偵測裝置20包含有二探針21、一積分球22與一偵測器23,該積分球開設有一輸入孔221,該偵測器23則安裝於該積分球相對該輸入孔221之一側,該偵測器23可以是光功率計(Optical Power Meter)或光檢測計(Photo Detector)之類的偵測器。需要說明的是,就本發明而言,該光學偵測裝置20不一定要包含該積分球22。由於該光學偵測裝置20之詳細結構與工作原理係屬習知技術,在此擬不贅述。Referring to the first figure, an optical detecting device provided by the present invention includes an optical detecting device 20 and a carrier 30. The carrier 30 can be used to carry at least one semiconductor light emitting element 50, and the carrier 30 is further provided with a reflecting device 31 corresponding to the top surface of the bottom of the semiconductor light emitting device, and the optical detecting device 20 is located at the semiconductor light emitting device. The optical detecting device 20 includes two probes 21, an integrating sphere 22 and a detector 23. The integrating sphere defines an input hole 221, and the detector has an input hole 221. 23 is mounted on one side of the integrating sphere with respect to the input hole 221, and the detector 23 may be a detector such as an optical power meter or a photo Detector. It should be noted that, in the present invention, the optical detecting device 20 does not have to include the integrating sphere 22. Since the detailed structure and working principle of the optical detecting device 20 are conventional technologies, they are not described herein.

本發明所提供第一實施例,請參考第二圖,該承載座30的頂面設有一反射裝置31,用以反射該半導體發光元件50底部所發出的光線而射向該光學偵測裝置20,增加該積分球22所收集的光線量而提高光參數量測的準確度。該反射裝置31於本實施例中係為一分佈式布拉格反射層(Distributed Bragg Reflectors,DBR),由不同光學介質交替組成的多層膜材料,藉以提供高品質的反射效果。The first embodiment of the present invention is provided with reference to the second figure. The top surface of the carrier 30 is provided with a reflecting device 31 for reflecting the light emitted from the bottom of the semiconductor light emitting element 50 to be directed to the optical detecting device 20 The amount of light collected by the integrating sphere 22 is increased to improve the accuracy of the optical parameter measurement. In this embodiment, the reflecting device 31 is a distributed Bragg Reflector (DBR), which is a multi-layer film material composed of different optical media, thereby providing a high-quality reflection effect.

此外,前述實施例之反射裝置31亦可改用金屬反射層 (Metallic Reflector)。In addition, the reflective device 31 of the foregoing embodiment may also use a metal reflective layer instead. (Metallic Reflector).

另外說明的是,本實施例更包含有由透光材質所製成之一膠膜40,該膠膜之透光度至少在40%以上;在本實施例中,其透光度為80%;且該膠膜40一面具有黏著性,可用來黏附固定一個以上的半導體發光元件50,再將該半導體發光元件50和膠膜40共同置放於該承載座30頂面;但是,該承載座30亦可直接承載包含複數個半導體發光元件之晶圓(wafer),晶圓上具有多數個發光單元51(即待切割的半導體發光元件),如第三圖所示,在此一情形下將不需要使用該膠膜40。In addition, the embodiment further includes a film 40 made of a light-transmitting material, the film having a transmittance of at least 40% or more; in the embodiment, the transmittance is 80%. And the adhesive film 40 has adhesiveness on one side, and can be used for adhering and fixing one or more semiconductor light emitting elements 50, and then the semiconductor light emitting element 50 and the adhesive film 40 are placed together on the top surface of the carrier 30; however, the carrier 30 can also directly carry a wafer containing a plurality of semiconductor light-emitting elements, the wafer having a plurality of light-emitting units 51 (ie, semiconductor light-emitting elements to be cut), as shown in the third figure, in this case This film 40 is not required to be used.

請參考第四圖,本發明第二實施例之承載座30頂面同樣設有一反射裝置31,其主要差異在於:該反射裝置31係由一金屬反射層32,以及位於金屬反射層32上方的一透光層33所共同構成。Referring to the fourth figure, the top surface of the carrier 30 of the second embodiment of the present invention is also provided with a reflecting device 31. The main difference is that the reflecting device 31 is composed of a metal reflective layer 32 and above the metal reflective layer 32. A light transmissive layer 33 is formed in common.

本實施例中,該透光層33是由玻璃、石英,或者聚對苯二甲酸乙二酯(Polyethylene Terephthalate,PET)、聚氯乙烯(PolyVinyl Chloride,PVC)、乙烯-乙酸乙烯酯共聚物(Ethylene Vinyl Acetate,EVA)等可透光的多分子材料所製成。該金屬反射層32則為鋁(Al)、銀(Ag)、鉻(Cr)、銠(Rh)等具有較高光射率之金屬所製成,且該金屬反射層32係可以電鍍,或者濺鍍、蒸鍍等物理或化學方法而直接形成於該承載座30之頂面,再以該透光層33覆蓋之,可避免該金屬反射層32因接觸空氣而造成的氧化、硫化與反射率下降的問題。In this embodiment, the light transmissive layer 33 is made of glass, quartz, or polyethylene terephthalate (PET), polyvinyl chloride (PolyVinyl Chloride, PVC), ethylene-vinyl acetate copolymer ( Ethylene Vinyl Acetate, EVA) is made of light-transmissive multi-molecular materials. The metal reflective layer 32 is made of a metal having a high light transmittance such as aluminum (Al), silver (Ag), chromium (Cr), or rhenium (Rh), and the metal reflective layer 32 can be plated or splashed. Physical or chemical methods such as plating and evaporation are directly formed on the top surface of the carrier 30, and covered by the light-transmitting layer 33, thereby avoiding oxidation, vulcanization and reflectance of the metal reflective layer 32 due to contact with air. The problem of falling.

或者,該金屬反射層32亦可以電鍍,或者濺鍍、蒸鍍等物理或化學方法而形成於該透光層33之一面,隨即將該透光層33與該金屬反射層32一併覆蓋於該承載座30之頂面。Alternatively, the metal reflective layer 32 may be formed by electroplating or physical or chemical methods such as sputtering or vapor deposition on one side of the light transmissive layer 33, and then the light transmissive layer 33 and the metal reflective layer 32 may be covered together. The top surface of the carrier 30.

再請參考第五圖,本發明第三實施例所提供之承載座30頂面同樣設有一反射裝置31,而該反射裝置31係由上而下依序為一透光層33、一金屬反射層32與一保護層34,該金屬反射層32同樣為具有較高光射率之金屬所製成,而該保護層則由鈦(Ti)、金(Au)、鉑(Pt)、鎢(W)、二氧化矽(SiO2 )或氮化矽(Si3 N4 )等一般用於形成介電保護層之物質所製成。Referring to the fifth figure, the top surface of the carrier 30 provided by the third embodiment of the present invention is also provided with a reflecting device 31, and the reflecting device 31 is a light transmissive layer 33 and a metal reflection from top to bottom. The layer 32 and a protective layer 34 are also made of a metal having a high light transmittance, and the protective layer is made of titanium (Ti), gold (Au), platinum (Pt), tungsten (W). ), cerium oxide (SiO 2 ) or cerium nitride (Si 3 N 4 ), which is generally used for forming a dielectric protective layer.

值得一提的是本實施例中反射裝置31的製作過程,其係先將該金屬反射層32形成於該透光層33之表面,隨即再以電鍍,或者濺鍍、蒸鍍等物理或化學方法而形成該保護層34於該金屬反射層32表面,避免該金屬反射層32產生氧化。待反射裝置31製作完成後,再置放於該承載座30的表面,用以反射該半導體發光元件50底部所發的光線。It is worth mentioning that the manufacturing process of the reflecting device 31 in the embodiment first forms the metal reflective layer 32 on the surface of the light transmissive layer 33, and then is electroplated, or physical or chemical such as sputtering or evaporation. The protective layer 34 is formed on the surface of the metal reflective layer 32 to prevent oxidation of the metal reflective layer 32. After the reflective device 31 is completed, it is placed on the surface of the carrier 30 to reflect the light emitted from the bottom of the semiconductor light emitting device 50.

除此之外,再請參閱第六圖,本發明第四實施例所提供之承載座30頂面更開設有一凹槽35,而可容設並定位一反射裝置31,該反射裝置31之製作過程如前段敘述。In addition, referring to the sixth figure, the top surface of the carrier 30 provided by the fourth embodiment of the present invention further has a recess 35 for receiving and positioning a reflecting device 31, and the reflecting device 31 is fabricated. The process is as described in the previous paragraph.

針對上述第一至第四實施例,本發明可用於檢測半導體發光元件50以及半導體發光元件之晶圓上之多數個發光單元51,亦可將一膠膜40與至少一半導體發光元件50 承載於對應該反射裝置31之位置,同樣可達成本發明之目的與預定功效。For the first to fourth embodiments, the present invention can be used to detect a plurality of light emitting units 51 on a semiconductor light emitting device 50 and a semiconductor light emitting device, or a film 40 and at least one semiconductor light emitting device 50. The position bearing the corresponding reflection device 31 can also achieve the purpose and predetermined efficacy of the invention.

本發明更提供一種應用前述光學檢測設備10的光學檢測方法,其步驟包含:a)將至少一半導體發光元件50放置於承載座30之反射裝置31上;b)將光學偵測裝置20中積分球22之輸入孔221對準該半導體發光元件50;c)利用該二探針21電性連通該半導體發光元件50而啟動之,此時,該半導體發光元件50將被點亮而同時在其頂部與底部發出光線,位於該半導體發光元件50底部之反射裝置31將接收來自該半導體發光元件50底部的光線,並加以反射而使其行進方向朝向該光學偵測裝置20之積分球22,再以該光學偵測裝置20之偵測器23對於所收集之光線進行光參數量測。The invention further provides an optical detecting method using the optical detecting device 10, the steps comprising: a) placing at least one semiconductor light emitting element 50 on the reflecting device 31 of the carrier 30; b) integrating the optical detecting device 20 The input hole 221 of the ball 22 is aligned with the semiconductor light emitting element 50; c) the second light emitting element 50 is electrically connected to the semiconductor light emitting element 50, and at this time, the semiconductor light emitting element 50 will be illuminated while being The top and bottom emit light, and the reflecting means 31 located at the bottom of the semiconductor light emitting element 50 will receive the light from the bottom of the semiconductor light emitting element 50 and reflect it so as to travel toward the integrating sphere 22 of the optical detecting device 20, and then The detector 23 of the optical detecting device 20 performs optical parameter measurement on the collected light.

綜上所陳,本發明透過在承載座上設置一高反射品質的反射裝置,故可有效將半導體發光元件底部所發出的光線反射向上,使光學偵測裝置可以收集到來自半導體發光元件底部的光線,進而提高各項光參數量測的準確度,並且不需要更換原有的檢測設備,而只需作小幅的改良,轉換成本低廉。In summary, the present invention provides a highly reflective reflective device on the carrier, so that the light emitted from the bottom of the semiconductor light emitting device can be effectively reflected upward, so that the optical detecting device can collect the bottom portion of the semiconductor light emitting device. The light, in turn, improves the accuracy of the measurement of various optical parameters, and does not require replacement of the original detection equipment, but only requires a small improvement, and the conversion cost is low.

10‧‧‧光學檢測設備10‧‧‧Optical testing equipment

20‧‧‧光學偵測裝置20‧‧‧Optical detection device

21‧‧‧探針21‧‧‧ probe

22‧‧‧積分球22‧‧·score ball

221‧‧‧輸入孔221‧‧‧ input hole

23‧‧‧偵測器23‧‧‧Detector

30‧‧‧承載座30‧‧‧Hosting

31‧‧‧反射裝置31‧‧‧Reflecting device

32‧‧‧金屬反射層32‧‧‧Metal reflector

33‧‧‧透光層33‧‧‧Transparent layer

34‧‧‧保護層34‧‧‧Protective layer

35‧‧‧凹槽35‧‧‧ Groove

40‧‧‧膠膜40‧‧‧ film

50‧‧‧半導體發光元件50‧‧‧Semiconductor light-emitting components

51‧‧‧發光單元51‧‧‧Lighting unit

第一圖係本發明較佳實施例所使用之設備示意圖;第二圖係本發明第一實施例中承載座之剖視圖;第三圖係本發明第一實施例之承載座直接承載一半導體發光元件之示意圖;第四圖係本發明第二實施例中承載座之剖視圖;第五圖係本發明第三實施例中承載座之剖視圖;第六圖係本發明第四實施例中承載座之剖視圖。1 is a schematic view of a device used in a preferred embodiment of the present invention; a second view is a cross-sectional view of a carrier in a first embodiment of the present invention; and a third embodiment is a carrier directly carrying a semiconductor light emitting device in the first embodiment of the present invention. 4 is a cross-sectional view of a carrier in a second embodiment of the present invention; a fifth view is a cross-sectional view of a carrier in a third embodiment of the present invention; and a sixth embodiment is a carrier in the fourth embodiment of the present invention. Cutaway view.

10‧‧‧光學檢測設備10‧‧‧Optical testing equipment

20‧‧‧光學偵測裝置20‧‧‧Optical detection device

21‧‧‧探針21‧‧‧ probe

22‧‧‧積分球22‧‧·score ball

221‧‧‧輸入孔221‧‧‧ input hole

23‧‧‧偵測器23‧‧‧Detector

30‧‧‧承載座30‧‧‧Hosting

31‧‧‧反射裝置31‧‧‧Reflecting device

50‧‧‧半導體發光元件50‧‧‧Semiconductor light-emitting components

Claims (28)

一種光學檢測設備,用以量測半導體發光元件之光參數,包含有一承載座,用以承載至少一半導體發光元件;以及一光學偵測裝置,其中,該光學檢測設備之特徵在於:該承載座對應該半導體發光元件底部之頂面更設有一反射裝置。 An optical detecting device for measuring optical parameters of a semiconductor light emitting device, comprising: a carrier for carrying at least one semiconductor light emitting device; and an optical detecting device, wherein the optical detecting device is characterized in that: the bearing A reflecting means is further disposed on the top surface of the bottom of the semiconductor light emitting element. 如請求項1所述光學檢測設備,其中該反射裝置係為一分佈式布拉格反射層(Distributed Bragg Reflectors)。 The optical detecting device of claim 1, wherein the reflecting device is a distributed Bragg Reflectors. 如請求項1所述之光學檢測設備,其中該反射裝置係為一硫酸鋇反射層。 The optical detecting device of claim 1, wherein the reflecting device is a barium sulfate reflective layer. 如請求項1所述之光學檢測設備,其中該反射裝置為一金屬反射層。 The optical detecting device of claim 1, wherein the reflecting device is a metal reflective layer. 如請求項4所述之光學檢測設備,其中該金屬反射層係由鋁(Al)、銀(Ag)、鉻(Cr)及銠(Rh)其中之一所製成。 The optical detecting apparatus of claim 4, wherein the metal reflective layer is made of one of aluminum (Al), silver (Ag), chromium (Cr), and rhodium (Rh). 如請求項4所述之光學檢測設備,其中該反射裝置更具有一透光層位於該金屬反射層遠離該承載座之一側。 The optical detecting device of claim 4, wherein the reflecting device further has a light transmitting layer located on a side of the metal reflective layer away from the carrier. 如請求項6所述之光學檢測設備,其中該透光層是由玻璃、石英、聚對苯二甲酸乙二酯、聚氯乙烯、及乙烯-乙酸乙烯酯共聚物其中之一所製成。 The optical detecting apparatus according to claim 6, wherein the light transmissive layer is made of one of glass, quartz, polyethylene terephthalate, polyvinyl chloride, and ethylene-vinyl acetate copolymer. 如請求項4或5所述之光學檢測設備,其中該金屬反射層係以電鍍或物理氣相沉積方法所形成。 The optical detecting apparatus of claim 4 or 5, wherein the metal reflective layer is formed by electroplating or physical vapor deposition. 如請求項4或5所述之光學檢測設備,其中該金屬反射層係以化學蒸鍍方法所形成。 The optical detecting device of claim 4 or 5, wherein the metal reflective layer is formed by a chemical vapor deposition method. 如請求項4或6所述之光學檢測設備,其中該反 射裝置更具有一保護層位於該金屬反射層與該承載座之間。 The optical detecting device of claim 4 or 6, wherein the counter The radiation device further has a protective layer between the metal reflective layer and the carrier. 如請求項10所述之光學檢測設備,其中該保護層係由鈦(Ti)、金(Au)、鉑(Pt)、鎢(W)、二氧化矽(SiO2 )及氮化矽(Si3 N4 )其中之一所製成。The optical detecting apparatus according to claim 10, wherein the protective layer is made of titanium (Ti), gold (Au), platinum (Pt), tungsten (W), hafnium oxide (SiO 2 ), and tantalum nitride (Si). 3 N 4 ) Made of one of them. 如請求項11所述之光學檢測設備,其中該保護層係以電鍍或物理氣相沉積方法所形成。 The optical detecting apparatus of claim 11, wherein the protective layer is formed by electroplating or physical vapor deposition. 如請求項11所述之光學檢測設備,其中該保護層係以化學蒸鍍方法所形成。 The optical detecting apparatus of claim 11, wherein the protective layer is formed by a chemical vapor deposition method. 如請求項1所述之光學檢測設備,其中該半導體發光元件係黏附於一膠膜而置放於該承載座上,且該膠膜之透光度在40%以上。 The optical detecting device of claim 1, wherein the semiconductor light emitting device is adhered to a film and placed on the carrier, and the film has a transmittance of 40% or more. 如請求項14所述之光學檢測設備,其中該膠膜之透光度在80%以上。 The optical detecting device of claim 14, wherein the film has a transmittance of 80% or more. 一種光學檢測方法,用以量測半導體發光元件之光參數,其步驟包含:將至少一半導體發光元件放置於一承載座之頂面,且該承載座之頂面設有一反射裝置;將一光學偵測裝置對準該半導體發光元件;啟動該光學偵測裝置所對準之該半導體發光元件,該反射裝置將反射或散射該半導體發光元件之底部光線而使其部分射向該光學偵測裝置,之後再以該光學偵測裝置進行光參數量測。 An optical detecting method for measuring optical parameters of a semiconductor light emitting device, the method comprising: placing at least one semiconductor light emitting device on a top surface of a carrier, and a top surface of the carrier is provided with a reflecting device; The detecting device is aligned with the semiconductor light emitting device; the semiconductor light emitting device is aligned with the optical detecting device, and the reflecting device reflects or scatters the bottom light of the semiconductor light emitting device to partially face the optical detecting device Then, the optical parameter measurement is performed by the optical detecting device. 如請求項16所述之光學檢測方法,其中該反射裝 置係為一分佈式布拉格反射層(Distributed Bragg Reflectors)。 The optical detection method of claim 16, wherein the reflective device The system is a Distributed Bragg Reflectors. 如請求項16所述之光學檢測方法,其中該反射裝置係為一硫酸鋇反射層。 The optical detection method of claim 16, wherein the reflecting device is a barium sulfate reflective layer. 如請求項16所述之光學檢測方法,其中該反射裝置為一金屬反射層。 The optical detection method of claim 16, wherein the reflecting device is a metal reflective layer. 如請求項19所述之光學檢測方法,其中該金屬反射層係由鋁(Al)、銀(Ag)、鉻(Cr)及銠(Rh)其中之一所製成。 The optical detecting method according to claim 19, wherein the metal reflective layer is made of one of aluminum (Al), silver (Ag), chromium (Cr), and rhodium (Rh). 如請求項19所述之光學檢測方法,其中該反射裝置更具有一透光層位於該金屬反射層遠離該承載座之一側。 The optical detection method of claim 19, wherein the reflecting device further has a light transmissive layer on a side of the metal reflective layer away from the carrier. 如請求項21所述之光學檢測方法,其中該透光層是由玻璃、石英、聚對苯二甲酸乙二酯、聚氯乙烯、及乙烯-乙酸乙烯酯共聚物其中之一所製成。 The optical detecting method according to claim 21, wherein the light transmissive layer is made of one of glass, quartz, polyethylene terephthalate, polyvinyl chloride, and ethylene-vinyl acetate copolymer. 如請求項19或21所述之光學檢測方法,其中該反射裝置更具有一保護層位於該金屬反射層與該承載座之間。 The optical detecting method of claim 19 or 21, wherein the reflecting device further has a protective layer between the metal reflective layer and the carrier. 如請求項23所述之光學檢測方法,其中該保護層係由鈦(Ti)、金(Au)、鉑(Pt)、鎢(W)、二氧化矽(SiO2 )及氮化矽(Si3 N4 )其中之一所製成。The optical detecting method according to claim 23, wherein the protective layer is made of titanium (Ti), gold (Au), platinum (Pt), tungsten (W), cerium oxide (SiO 2 ), and tantalum nitride (Si). 3 N 4 ) Made of one of them. 如請求項16所述之光學檢測方法,其中該光學偵測裝置包含有一積分球與一偵測器,用以收集並量測該積分球所收集的光線。 The optical detecting method of claim 16, wherein the optical detecting device comprises an integrating sphere and a detector for collecting and measuring the light collected by the integrating sphere. 如請求項16所述之光學檢測方法,其中該光學偵測裝置更包含有二探針,用以啟動該半導體發光元件而使之發光。 The optical detection method of claim 16, wherein the optical detecting device further comprises two probes for activating the semiconductor light emitting element to emit light. 如請求項16所述之光學檢測方法,其中該半導體發光元件係黏附於一膠膜而置放於該承載座上,且該膠膜之透光度在40%以上。 The optical detection method of claim 16, wherein the semiconductor light-emitting element is adhered to a film and placed on the carrier, and the film has a transmittance of 40% or more. 如請求項27所述之光學檢測方法,其中該膠膜之透光度在80%以上。 The optical detection method according to claim 27, wherein the film has a transmittance of 80% or more.
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