TWI284090B - Method for preparing flexible metal foil/polyimide laminate - Google Patents
Method for preparing flexible metal foil/polyimide laminate Download PDFInfo
- Publication number
- TWI284090B TWI284090B TW093118359A TW93118359A TWI284090B TW I284090 B TWI284090 B TW I284090B TW 093118359 A TW093118359 A TW 093118359A TW 93118359 A TW93118359 A TW 93118359A TW I284090 B TWI284090 B TW I284090B
- Authority
- TW
- Taiwan
- Prior art keywords
- metal foil
- bis
- polyimine
- flexible metal
- producing
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 58
- 239000002184 metal Substances 0.000 title claims abstract description 58
- 239000011888 foil Substances 0.000 title claims abstract description 54
- 229920001721 polyimide Polymers 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims abstract description 20
- 239000004642 Polyimide Substances 0.000 title claims abstract description 17
- 239000000853 adhesive Substances 0.000 claims abstract description 19
- 230000001070 adhesive effect Effects 0.000 claims abstract description 19
- 238000010438 heat treatment Methods 0.000 claims abstract description 10
- 239000012790 adhesive layer Substances 0.000 claims abstract description 7
- 239000002904 solvent Substances 0.000 claims description 28
- 238000004519 manufacturing process Methods 0.000 claims description 24
- 239000002253 acid Substances 0.000 claims description 20
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 17
- 239000011889 copper foil Substances 0.000 claims description 15
- 238000003475 lamination Methods 0.000 claims description 13
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 10
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 claims description 7
- 150000008064 anhydrides Chemical class 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims description 3
- 238000009833 condensation Methods 0.000 claims description 3
- 230000005494 condensation Effects 0.000 claims description 3
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 claims description 3
- 125000001841 imino group Chemical group [H]N=* 0.000 claims description 2
- 150000001413 amino acids Chemical class 0.000 claims 1
- CEIPQQODRKXDSB-UHFFFAOYSA-N ethyl 3-(6-hydroxynaphthalen-2-yl)-1H-indazole-5-carboximidate dihydrochloride Chemical compound Cl.Cl.C1=C(O)C=CC2=CC(C3=NNC4=CC=C(C=C43)C(=N)OCC)=CC=C21 CEIPQQODRKXDSB-UHFFFAOYSA-N 0.000 claims 1
- 239000013557 residual solvent Substances 0.000 abstract description 5
- 238000010030 laminating Methods 0.000 abstract description 3
- 238000013007 heat curing Methods 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 27
- -1 diamine compound Chemical class 0.000 description 19
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 18
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 14
- 239000010410 layer Substances 0.000 description 12
- 239000004305 biphenyl Substances 0.000 description 10
- 235000010290 biphenyl Nutrition 0.000 description 9
- 125000006267 biphenyl group Chemical group 0.000 description 9
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 9
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 125000001931 aliphatic group Chemical group 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 229920001187 thermosetting polymer Polymers 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 150000004985 diamines Chemical class 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000004512 die casting Methods 0.000 description 4
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 239000001294 propane Substances 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 3
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 229910021603 Ruthenium iodide Inorganic materials 0.000 description 3
- 229920001646 UPILEX Polymers 0.000 description 3
- 238000005576 amination reaction Methods 0.000 description 3
- 150000004984 aromatic diamines Chemical class 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000002320 enamel (paints) Substances 0.000 description 3
- 150000002466 imines Chemical class 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- LJZVDOUZSMHXJH-UHFFFAOYSA-K ruthenium(3+);triiodide Chemical compound [Ru+3].[I-].[I-].[I-] LJZVDOUZSMHXJH-UHFFFAOYSA-K 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 3
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 3
- 229910052727 yttrium Inorganic materials 0.000 description 3
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 3
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- GEYAGBVEAJGCFB-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 GEYAGBVEAJGCFB-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004954 Polyphthalamide Substances 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- 229920002125 Sokalan® Polymers 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000001273 butane Substances 0.000 description 2
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 2
- 239000012295 chemical reaction liquid Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000006358 imidation reaction Methods 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229940018564 m-phenylenediamine Drugs 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- DYFXGORUJGZJCA-UHFFFAOYSA-N phenylmethanediamine Chemical compound NC(N)C1=CC=CC=C1 DYFXGORUJGZJCA-UHFFFAOYSA-N 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 2
- 239000004584 polyacrylic acid Substances 0.000 description 2
- 229920002098 polyfluorene Polymers 0.000 description 2
- 229920006375 polyphtalamide Polymers 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 150000004060 quinone imines Chemical class 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 229920006259 thermoplastic polyimide Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- GGAUUQHSCNMCAU-ZXZARUISSA-N (2s,3r)-butane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C[C@H](C(O)=O)[C@H](C(O)=O)CC(O)=O GGAUUQHSCNMCAU-ZXZARUISSA-N 0.000 description 1
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- HTSGKJQDMSTCGS-UHFFFAOYSA-N 1,4-bis(4-chlorophenyl)-2-(4-methylphenyl)sulfonylbutane-1,4-dione Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(C(=O)C=1C=CC(Cl)=CC=1)CC(=O)C1=CC=C(Cl)C=C1 HTSGKJQDMSTCGS-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- XVXRQPHRNCORAZ-UHFFFAOYSA-N 1-chlorocyclohexa-3,5-diene-1,2-diamine Chemical compound NC1C=CC=CC1(N)Cl XVXRQPHRNCORAZ-UHFFFAOYSA-N 0.000 description 1
- BAHPQISAXRFLCL-UHFFFAOYSA-N 2,4-Diaminoanisole Chemical compound COC1=CC=C(N)C=C1N BAHPQISAXRFLCL-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- 229940075142 2,5-diaminotoluene Drugs 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- BXGYYDRIMBPOMN-UHFFFAOYSA-N 2-(hydroxymethoxy)ethoxymethanol Chemical compound OCOCCOCO BXGYYDRIMBPOMN-UHFFFAOYSA-N 0.000 description 1
- IAVLETUBZIDPJH-UHFFFAOYSA-N 2-[4-(1,1,1,3,3,3-hexafluoropropan-2-yl)phenoxy]aniline Chemical compound NC1=C(OC2=CC=C(C=C2)C(C(F)(F)F)C(F)(F)F)C=CC=C1 IAVLETUBZIDPJH-UHFFFAOYSA-N 0.000 description 1
- HGUYBLVGLMAUFF-UHFFFAOYSA-N 2-methoxybenzene-1,4-diamine Chemical compound COC1=CC(N)=CC=C1N HGUYBLVGLMAUFF-UHFFFAOYSA-N 0.000 description 1
- OBCSAIDCZQSFQH-UHFFFAOYSA-N 2-methyl-1,4-phenylenediamine Chemical compound CC1=CC(N)=CC=C1N OBCSAIDCZQSFQH-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- HUWXDEQWWKGHRV-UHFFFAOYSA-N 3,3'-Dichlorobenzidine Chemical compound C1=C(Cl)C(N)=CC=C1C1=CC=C(N)C(Cl)=C1 HUWXDEQWWKGHRV-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical compound C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- ZDBWYUOUYNQZBM-UHFFFAOYSA-N 3-(aminomethyl)aniline Chemical compound NCC1=CC=CC(N)=C1 ZDBWYUOUYNQZBM-UHFFFAOYSA-N 0.000 description 1
- TYKLCAKICHXQNE-UHFFFAOYSA-N 3-[(2,3-dicarboxyphenyl)methyl]phthalic acid Chemical compound OC(=O)C1=CC=CC(CC=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O TYKLCAKICHXQNE-UHFFFAOYSA-N 0.000 description 1
- CKOFBUUFHALZGK-UHFFFAOYSA-N 3-[(3-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC(CC=2C=C(N)C=CC=2)=C1 CKOFBUUFHALZGK-UHFFFAOYSA-N 0.000 description 1
- UCFMKTNJZCYBBJ-UHFFFAOYSA-N 3-[1-(2,3-dicarboxyphenyl)ethyl]phthalic acid Chemical compound C=1C=CC(C(O)=O)=C(C(O)=O)C=1C(C)C1=CC=CC(C(O)=O)=C1C(O)=O UCFMKTNJZCYBBJ-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- LBPVOEHZEWAJKQ-UHFFFAOYSA-N 3-[4-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 LBPVOEHZEWAJKQ-UHFFFAOYSA-N 0.000 description 1
- MFTFTIALAXXIMU-UHFFFAOYSA-N 3-[4-[2-[4-(3-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)C(C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 MFTFTIALAXXIMU-UHFFFAOYSA-N 0.000 description 1
- NQZOFDAHZVLQJO-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenoxy]phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(OC=3C=CC(OC=4C=C(N)C=CC=4)=CC=3)=CC=2)=C1 NQZOFDAHZVLQJO-UHFFFAOYSA-N 0.000 description 1
- AXNUJYHFQHQZBE-UHFFFAOYSA-N 3-methylbenzene-1,2-diamine Chemical compound CC1=CC=CC(N)=C1N AXNUJYHFQHQZBE-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- FWOLORXQTIGHFX-UHFFFAOYSA-N 4-(4-amino-2,3,5,6-tetrafluorophenyl)-2,3,5,6-tetrafluoroaniline Chemical compound FC1=C(F)C(N)=C(F)C(F)=C1C1=C(F)C(F)=C(N)C(F)=C1F FWOLORXQTIGHFX-UHFFFAOYSA-N 0.000 description 1
- ZDFDINMHFLFYGQ-UHFFFAOYSA-N 4-(4-aminophenyl)-2-methoxyaniline Chemical compound C1=C(N)C(OC)=CC(C=2C=CC(N)=CC=2)=C1 ZDFDINMHFLFYGQ-UHFFFAOYSA-N 0.000 description 1
- WYHSHHJLHFEEFE-UHFFFAOYSA-N 4-(4-aminophenyl)-6,6-dimethylcyclohexa-1,3-dien-1-amine Chemical compound C1=C(N)C(C)(C)CC(C=2C=CC(N)=CC=2)=C1 WYHSHHJLHFEEFE-UHFFFAOYSA-N 0.000 description 1
- BXIXXXYDDJVHDL-UHFFFAOYSA-N 4-Chloro-ortho-phenylenediamine Chemical compound NC1=CC=C(Cl)C=C1N BXIXXXYDDJVHDL-UHFFFAOYSA-N 0.000 description 1
- IWXCYYWDGDDPAC-UHFFFAOYSA-N 4-[(3,4-dicarboxyphenyl)methyl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1CC1=CC=C(C(O)=O)C(C(O)=O)=C1 IWXCYYWDGDDPAC-UHFFFAOYSA-N 0.000 description 1
- HWBVOOWDSUQMHR-UHFFFAOYSA-N 4-[1-(3,4-dicarboxyphenyl)-1,2,2,3,3,3-hexafluoropropyl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(F)(C(F)(F)C(F)(F)F)C1=CC=C(C(O)=O)C(C(O)=O)=C1 HWBVOOWDSUQMHR-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- VCFYKCXKADGLPS-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)-3,5-dimethylphenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]-2,6-dimethylphenoxy]aniline Chemical compound CC1=CC(C(C=2C=C(C)C(OC=3C=CC(N)=CC=3)=C(C)C=2)(C(F)(F)F)C(F)(F)F)=CC(C)=C1OC1=CC=C(N)C=C1 VCFYKCXKADGLPS-UHFFFAOYSA-N 0.000 description 1
- PDYQWKUIJVOAON-UHFFFAOYSA-N 4-[4-[2-[4-[4-amino-3-(trifluoromethyl)phenoxy]phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]-2-(trifluoromethyl)aniline Chemical compound C1=C(C(F)(F)F)C(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=C(C(N)=CC=3)C(F)(F)F)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 PDYQWKUIJVOAON-UHFFFAOYSA-N 0.000 description 1
- LDFYRFKAYFZVNH-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenoxy]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 LDFYRFKAYFZVNH-UHFFFAOYSA-N 0.000 description 1
- DGRGLKZMKWPMOH-UHFFFAOYSA-N 4-methylbenzene-1,2-diamine Chemical compound CC1=CC=C(N)C(N)=C1 DGRGLKZMKWPMOH-UHFFFAOYSA-N 0.000 description 1
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
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- B32B2307/3065—Flame resistant or retardant, fire resistant or retardant
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- B32B2457/08—PCBs, i.e. printed circuit boards
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2400/00—Presence of inorganic and organic materials
- C09J2400/10—Presence of inorganic materials
- C09J2400/16—Metal
- C09J2400/163—Metal in the substrate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2479/00—Presence of polyamine or polyimide
- C09J2479/08—Presence of polyamine or polyimide polyimide
- C09J2479/086—Presence of polyamine or polyimide polyimide in the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/227—Drying of printed circuits
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Laminated Bodies (AREA)
- Lining Or Joining Of Plastics Or The Like (AREA)
Description
1284090 (1) 玖、發明說明 【發明所屬之技術領域】 本發明係有關印刷電路基板等之電子零件所使用之軟 性金屬箔聚醯亞胺層合板之製造方法。 【先前技術】 向來’係於導體上直接塗敷聚醯亞胺先驅物樹脂溶液 ’乾燥,硬化製造軟性基板,例如,日本特開昭59-23 245 5號,日本特開昭6 1 -27 5 325號,日本特開昭62-212140號,日本特開平7-57540號公報已有揭示。又, 如於導體上分數次塗敷聚醯亞胺先驅物樹脂溶液之方法, 例如,日本特開平2-180682號,日本特開平2-180679號 ,曰本特開平1-245586號,日本特開平2-122697號公報 所揭示。 但是’於導體上直接塗敷聚醯亞胺先驅物樹脂溶液之 方法,軟性基板最終之聚醯亞胺厚度不在20 // m以上時 無支撐力,作業有困難,無論如何塗敷厚重的聚醯亞胺先 驅物樹脂使最終聚醯亞胺之厚度必要爲2 0 // m以上於導 體上硬化,塗敷均勻的厚度有困難,再三產生厚度差異成 爲不良品。此係分數次塗敷時依塗敷次數愈多極端顯示厚 度差異之傾向。 所以,例如,日本特開平]-244 84 1號,日本特開平 6 - 1 9 0 9 6 7號公報揭示,於導體上形成熱可塑性聚醯亞胺 再粘貼之方法。依此方法,由於壓鑄熱可塑性聚醯亞胺層 各 (2) (2)1284090 ,全體之聚醯亞胺層之厚度可成爲均勻。特別如日本特開 平6- 1 90967號公報揭示,塗敷聚醯亞胺或聚醯亞胺酸溶 液,乾燥,硬化作成熱可塑性聚醯亞胺/金屬箔層合板, 該熱可塑性聚醯亞胺側將聚醯亞胺薄膜加熱,壓鑄,熱可 塑性聚醯亞胺因加熱溶融,修正厚度,與聚醯亞胺薄膜粘 貼後之全體聚醯胺層可成爲均勻的厚度。 但是,由此方法加熱硬化之聚醯亞胺,必要壓鑄,需 要能加熱至聚醯亞胺之玻璃轉移點(Tg )以上溫度之特殊 裝置,不經濟。 【發明內容】 〔發明之揭示〕 本發明係以提供充分發揮具優耐熱性,耐藥品性,難 燃性,電氣特性等耐熱性聚醯亞胺樹脂薄膜特性之軟性金 屬箔聚醯亞胺層合板之製造方法爲目的。 本發明者爲達成上述目的經深入硏究結果,金屬箔與 聚醯亞胺及介入耐熱性接著劑,特別是醯亞胺化率低於 5%,更理想爲溶劑含量爲3〜50質量%之聚醯亞胺酸,層 合後,由加熱處理去除接著劑中之溶劑,由熱硬化接著劑 ’發現可於低溫乾燥,低層合溫度製造接著強度高之軟性 金屬箔聚醯亞胺層合板,完成本發明。 因此,本發明提供下述軟性金屬箔聚醯亞胺層合板之 製造方法。 (1 )介以耐熱性接著劑,以加熱輥輪壓鑄層合金屬 -6- (3) (3)1284090 箔與聚醯亞胺薄膜後,由加熱處理去除接著劑層中殘留之 溶劑,熱硬化之軟性金屬箔聚醯亞胺層合板製造方法。 (2 )上述熱硬化之軟性金屬箔聚醯亞胺層合板製造 方法,耐熱性接著劑於層合的時候’係爲醯亞胺化低於 5 %之聚醯亞胺酸。 (3 )上述熱硬化之軟性金屬箔聚醯亞胺層合板製造 方法,耐熱性接著劑於層合的時候,係爲溶劑含量3〜50 質量%之聚醯亞胺酸。 (4 )上述熱硬化之軟性金屬箔聚醯亞胺層合板製造 方法,層合時,溶劑含量3〜50質量%之耐性接著劑之軟 化點爲1 5 0 °C以下者。 (5 )上述熱硬化之軟性金屬箔聚醯亞胺層合板製造 方法,接著劑成分爲,均苯四甲酸酐與4,4’-二氨基二苯 基醚之縮合物,3,453 ’,4’-二苯基四羧酸酐與p-苯撐基二 胺之縮合物,或其混合物所選之聚醯亞胺酸。或其混合物 所選之聚醯亞胺酸。 (6)上述熱硬化之軟性金屬箔聚醯亞胺層合板製造 方法,金屬箔爲1〇//ηι以上之軋壓銅箔,聚醯亞胺薄膜 爲1 2 // m以上且耐熱性接著劑層爲5 // m以下者。 (7 )上述熱硬化之軟性金屬箔聚醯亞胺層合板製造 方法,軟性金屬箔聚醯亞胺層合板爲軟性單面金屬箔聚醯 亞胺層合板或軟性雙面金屬箔聚醯亞胺層合板者。 〔用以實施發明之最佳型態〕 (4) 1284090 形成本發明聚醯亞胺金屬層合板用之 可使用向來各種層合板使用之任一者聚醯 用由下述一般式(I)所示之二胺化合物 II )所示之四羧酸二酐所得之下述一般式 醯亞胺樹脂薄膜,亦可使用市售品。可使 曰本鐘淵化學工業(股)製 商5 日本Toray Dupond公司製 商名 H2N-Ri-NH2 ( 1 ) (式中所示’ R1爲由脂肪族基,環 環式芳香族基’縮合多環式芳香族基,芳 聯劑連結之非縮合環式芳香族基之群中所
〇 〇 (式中所示’ R2爲由脂肪族基, 環式方香族基’縮合多環式芳香族基, 聯劑連結之非縮合環式芳香族基之群中 聚醯亞胺薄膜, 亞胺薄膜,可使 與下述一般式( (III )所示之聚 用如下之市售品 、名:APICAL π πρ · Kaputon 式脂肪族基,單 香族爲直接或交 選之2價基) 〇1) 式脂肪族基,單 香族爲直接或交 選之4價基)
0 II
〇 II 八八 C II 〇 / c
II 〇 (式中,R】’ R2如上所示) 各 (III) (5) 1284090 一般式(I )所示二胺化合物可列舉如,〇-苯撐二胺 ,m-苯撐二胺,ρ-苯撐二胺,m-氨基苄胺,ρ-氨基苄胺, 2-氯-1,2·苯撐二胺,4-氯-1,2-苯撐二胺,2,3-二氨基甲苯 ,2,4-二氨基甲苯,2,5-二氨基甲苯,2,6-二氨基甲苯, 3,4-二氨基甲苯,2-甲氧基-1,4-苯撐二胺,4-甲氧基-1,3-苯撐二胺,聯苯胺,3,3’-二氯聯苯胺,3,3^二甲基聯苯 胺,3,3’-二甲氧基-聯苯胺,3,3、二氨基二苯基醚,3,4、 二氨基二苯基醚,4,4’-二氨基二苯基醚,3,3’-二氨基二 苯基硫化物,3,4’-二氨基二苯基硫化物,4,4’-二氨基二 苯基硫化物,3,3’-二氨基二苯基亞碼,4-二氨基二苯 基亞碼,3,35-二氨基二苯基碼,3,4’·二氨基二苯基碼, 4,4、二氨基二苯基碼,3,3’-二氨基二苯甲酮,3,4、二氨 基二苯甲酮,4,4’-二氨基二苯甲酮,3,3’-二氨基二苯基 甲烷,3,4-二氨基二苯基甲烷,4,4’-二氨基二苯基甲烷, 雙[4-3-胺基苯氧基]苯基]甲烷,雙[4-4-胺基苯氧基]苯基] 甲烷,雙[4-3-胺基苯氧基]苯基]乙烷,1,1-雙[4-4-胺 基苯氧基]苯基]乙烷,1,2-雙[4-3-胺基苯氧基]苯基]乙烷 ,1,2-雙[4-4-胺基苯氧基]苯基]乙烷,2,2·雙[4-3·胺基苯 氧基]苯基]丙烷,2,2-雙[4-4-胺基苯氧基]苯基]丙烷, 2,2-雙[4-3-胺基苯氧基]苯基]丁烷,2,2-雙[4-4-胺基苯氧 基]苯基]丁烷,2,2-雙[4-3-胺基苯氧基]苯基]-],151,3,3,3 六氟丙烷,2,2-雙[4-4-胺基苯氧基]苯基]-1,1,1,3 5 3 5 3六氟 丙烷,1,3-雙(3-氨基苯氧基)苯,1,3-雙(心氨基苯氧 基)苯,1,4-雙(3-氨基苯氧基)苯,1,4-雙(4-氨基苯 -9- (6) (6)1284090 氧基)苯’ 4,4-雙(3-氨基苯氧基)二苯,4,4-雙(4_氨 基苯氧基)二苯,雙[4·3-胺基苯氧基]苯基]酮,雙[4-4-胺 基苯氧基]苯基]酮,雙[4-3-胺基苯氧基]苯基]硫化物,雙 [4-4-胺基苯氧基]苯基]硫化物,雙[4-3-胺基苯氧基]苯基] 亞碼,雙[4-4-胺基苯氧基]苯基]亞碼,雙[4-3-胺基苯氧基 ]苯基]碼’雙[4-4 -胺基苯氧基]苯基]碼,雙[4- (3 -胺基苯 氧基)苯基]醚,雙[4-(4-胺基苯氧基)苯基]醚,ΐ,4-雙 [[4- (3-胺基苯氧基)苯醯基]苯,ΐ,3-雙[4- (3-胺基苯氧 基)苯醯基]苯,4,4 -雙[3-(4 -胺基苯氧基)苯醯基]二苯 基醚,4,4-雙[3-(3-胺基苯氧基)苯醯基]二苯基醚,4,4· 雙[4-(4-氨基- α5α-二甲基苄基)苯氧基]二苯甲酮, 4,4-雙[4-(4-氨基-α,α-二甲基苄基)苯氧基]二苯基碼 ’雙[4-[4· ( 4-胺基苯氧基)苯氧基]苯基;|酮,雙[4-[4-( [胺基苯氧基)苯氧基]苯基]碼,I,4-雙[4-(4-氨基苯氧 基)- 二甲基苄基]苯,1,3-雙[4- (4-氨基苯氧基)- α,α -二甲基苄基)苯等,此等可單獨或2種以上混合使 用。 一般式(II )所示之四羧酸二酐可列舉如,於一般式 (〇,例如R2爲脂肪族基之乙撐四羧酸二酐等,R2爲環 式脂肪族基之環戊烷四羧酸二酐等,R2爲單環式脂肪族 基之1,2,3,4·萘四羧酸二酐,均苯四甲酸二酐,r2爲縮合 多環式芳香族基之2,3,6,7·萘四羧酸二酐,14,5,8-萘四羧 酸二酐,1,2,5,6-萘四羧酸二酐,3,4,9,1〇-茈四羧酸二酐 ’ 2,3 5 6,7 -蒽四羧酸二酐,1,2,7,8-菲四羧酸二酐等,R2爲 -10- (7) 1284090 直接連結芳香族基之非環式芳香族基之3,3’-4,4,-雙苯基 四羧酸二酐,2,2,,3,3,-雙苯基四羧酸二酐,R2爲由交聯 連結之非環式芳香族基之3,3’-4,4’-二苯甲酮基四羧酸二 酐,2,2’53,3、二苯甲酮基四羧酸二酐,2,2-雙(3,4-二羧 基苯基)丙烷二酐,2,2-雙(2,3·二羧基苯基)丙烷二酐 ’雙(3,4-二羧基苯基)醚二酐,雙(3,‘二羧基苯基) 碼二酐,雙(2,3-二羧基苯基)碼二酐,1,1-雙(2,3-二 羧基苯基)乙烷二酐,雙(2,3-二羧基苯基)甲烷二酐, 雙(3,4-二羧基苯基)甲烷二酐,4,4’-(p-苯撐二羧基) 二隣苯二甲二酐,4,4’-(m-苯撐二羧基)二隣苯二甲二 酐等,此等可單獨或2種以上混合使用。 又,聚醯亞胺薄膜之厚度可適當的選擇,無特別限定 ’通常爲12〜75// m,特別適當爲12〜25// m。 一方面,本發明使用之金屬箔之種類無特別限定,通 常多數爲使用銅,鎳,鋁,不鏽鋼,鈹銅合金等,爲形成 印刷電路之金屬多數使用銅箔。銅箔可使用軋壓銅箔,電 解銅箔之任一者。又,爲提高直接與金屬箔接觸之聚醯亞 胺與金屬箔之接著力,金屬箔上以金屬單體或其氧化物或 合金,例如金屬箔爲銅箔時,可形成銅單體,氧化銅, 鎳-銅合金或鋅-銅合金等之無機物層,又,無機物以外亦 可塗敷氨基矽烷,環氧矽烷,毓基矽烷等之耦合劑於金屬 箔上。 金屬箔之厚度亦可適宜的選擇,並無特別限定,通常 爲1 〇〜3 5 y m,特別適宜爲1 8〜3 5 # m。 -11· (8) 1284090 於本發明,首先上述金屬箔與聚醯亞胺薄膜介以耐熱 性接著劑由加熱輥輪壓鑄層合。 此時,耐熱性接著劑以聚醯亞胺酸爲理想。 使用於本發明接著劑之聚醯亞胺酸,可由芳香族四羧 酸酐與芳香族二胺反應所得。 本發明使用之酸酐,可列舉四羧酸酐及其衍生物。又 ’以下爲四羧酸之具體例,此等之酯化物,酸酐,酸氯化 物亦當然可使用。即,四羧酸可列舉如均苯四甲酸,3,3 ’ -4,4、二苯基四酸,3,3’,4,4、二苯甲酮四羧酸,3,3’,4,4’-二苯基碼四羧酸,2,3,3,,4-二苯甲酮四羧酸,2,3,6,7-萘 基四羧酸,1,2,5,6 -萘基四羧酸,3,3,4,4、二苯基甲烷四 殘酸,2,2-雙(3,4-二羧基苯基)丙烷,2,2·雙(3,4-二羧 基苯基)六氟丙烷,3,4,9,10 -四羧基茈,2,2 -雙[4-(3.4-一竣基苯氧基)苯基]丙院,2,2·雙[4- (3.4 -二殘基苯氧基 )苯基]六氟丙烷,丁烷四羧酸,環戊烷四羧酸等。又, 均苯四甲酸及其衍生物等。 又’以具反應性官能基化合物變性,亦可導入交聯構 造或梯形構造。 〜方面,本發明所使用之二胺爲p-苯撐二胺,m-苯 撐二胺’ 2,-甲氧基·454,·二氨基苯醯苯胺,4,4,-二氨基二 本基醚,二氨基甲苯,4,4,-二氨基苯基甲烷,3,3,-二甲 基-4,4-二氨基苯基甲烷,2,2·雙[4- (4-氨基苯氧基)苯基 ]丙院,1,2-雙(苯胺基)乙烷,二氨基二苯基碼,二氨基 苯酸苯胺,二氨基苯甲酸酯,二氨基二苯基硫化物,2,2- -12 - (9) 1284090 雙(P-氨苯基)丙烷,2,2·雙(p-氨苯基)六氟丙烷, 1,5-二伎基萘,二氨基甲苯,二氨基偶苯三氟化物,1,4-雙(p-氨基苯氧基)苯,4,45-(p-氨基苯氧基)二苯,二 氨基蒽醌,454’·雙(3-氨基苯氧基苯基)二苯基碼,1,3· 雙(苯胺基)八氟丙烷,1,5-雙(苯胺基)十氟丙烷, 1,7-雙(苯胺基)十氟丙烷,2,2-雙[4-([氨基苯氧基) 苯基]六氟丙烷,2,2-雙[4-(3-氨基苯氧基)苯基]六氟丙 烷,2,2-雙[4- (2-氨基苯氧基)苯基]六氟丙烷,2,2-雙 [4- (4-氨基苯氧基)-3,5-二甲基苯基]六氟丙烷,2,2-雙 [4- (4-氨基苯氧基)-3,5-三氟甲基苯基]六氟丙烷,p-雙 (4-氨基-2-二氟甲基苯氧基)苯,4,4’-雙(4-氨基-2-三 氟甲基苯氧基)二苯,4,45·雙(4-氨基-3-三氟甲基苯氧 基)二苯,4,4、雙(4-氨基-2-三氟甲基苯氧基)二苯基 碼,4,4’-雙(4-氨基-5-三氟甲基苯氧基)二苯基碼,2,2-雙[4-(4-氨基-3-三氟甲基苯氧基)苯基]六氟丙烷,聯苯 胺,3,3’,5,5^四甲基聯苯胺,八氟聯苯胺,3 5 3 5-甲氧基 聯苯胺,聯間甲苯胺,Hi-間甲苯胺,2,2’ 5 5 5 ’,6,65-六氟 聯間甲苯胺,454 5-二氨基聯三苯,4,4’’’-二氨基對聯四苯 等之二胺類及此等二胺與光氣等之反應而得之二異氰酸酯 類,及二氨基矽氧烷類等。 又,此處所使用之溶劑,可列舉如N-甲基吡咯烷酮 (NMP ),二甲基甲醯胺(DMF ),二甲基乙醯胺( DMAc ),二甲基亞碼(DMOS ),硫酸二甲酯,環丁碼 ,丁內酯,甲酚,苯酚,鹵化苯酚,環己烷,二噁烷,四 -13- (10) 1284090 氫呋喃,二甲醇二甲醚等。 又’聚醯胺薄膜通常係,均苯四甲酸與4 4,_ 一 苯基醚之縮合物或,3 5 4 5 3,5 4,-二苯基四羧酸酐與p_ 基二胺之縮合物所形成,本發明者等,使用賦予聚醯 薄膜同樣化學構造及同等特性成爲聚醯亞胺接著層之 亞胺酸爲接著劑,使用熱硬化層合之方法,經深入硏 結果,作爲接著劑,特別以均苯四甲酸酐與4,4,-二 苯基醚之縮合物或’ 3,4,3,,4,-二苯基四羧酸酐與p_ 基二胺之縮合物或混合物所成之聚醯亞胺酸爲理想, 反應於極性溶劑DM Ac,NMP之單獨液或混合液中進 反應溫度1 0〜4 0 C ’反應液濃度爲3 0質量%以下,芳 四羧酸酐與芳香族二胺之莫耳比爲〇.95: 1〇〇〜1〇5: 之範圍於氮氣環境反應者爲理想。原料之溶解方法及 方法無特別限定。 又,於本發明,使用上述縮合物等共聚合或所得 醯亞胺酸可混合使用。又,爲改良種種特性之目的, 合無機質,有機質或金屬等之粉末,纖維等使用。更 高接著性等目的可混合異種之聚合物。 本發明相關之聚醯亞胺金屬箔層合板之製造方法 述聚醯亞胺酸於銅箔之金屬箔上鑄膜醯亞胺化後之膜 5 // m以下,理想爲2〜5 // m,更理想爲2〜4 // m,於 胺化(理想爲醯亞胺化率低於5 % )溫度乾燥至溶劑 爲3〜5 0質量%後,聚醯亞胺薄膜於加熱輥輪壓鑄進 合,更乾燥溶劑及進行醯亞胺化爲理想,由此,可無 氨基 苯撐 亞胺 聚醯 究之 氛基 苯撐 縮合 行, 香族 1 .00 添加 之聚 可混 爲提 ,上 厚爲 醯亞 含量 行層 向來 -14- (11) 1284090 接著劑之耐熱性等諸特性之下降問題,且可有 無皴紋之全聚醯亞胺金屬箔層合板。 即,本發明製造方法所使用之接著劑,於 胺化率低於5 %,理想爲低於3 %,更理想爲低 稱爲聚醯亞胺酸者,且由於含溶劑,軟化點爲 ,理想爲 80〜150°C,更理想爲 80〜120°C者。 酸爲芳香族二胺與芳香族四羧酸酐於極性溶劑 者,反應液可原樣作爲淸漆使用。 本發明所使用之聚醯亞胺酸爲,芳香族四 香族二胺縮合反應所得者,如上述均苯四甲| 二氨基二苯基醚之縮合物,3,4,3’,4’-二苯基 P-苯撐基二胺之縮合物或此等之混合物所選者 時,層合板所使用之之金屬箔爲1 0 // m以 10〜3 5 // m,更理想爲18〜35 // m之軋壓銅箔爲 亞胺薄膜爲12//m以上,理想爲12〜75//m 12〜25//m之開普東型(Kapton type)或{ Upilex type)爲理想,聚醯胺酸之淸漆塗敷厚 胺化後之厚度爲5 // m以下爲理想。軋壓銅箔 l〇Mm時,製造時產生皺紋,及層合步驟之強 產生須使用保護材料之情形。 又,聚醯亞胺薄膜,如上所述,特性上以 型(Kapton type)或優必雷型(Upilex type) 醯亞胺薄膜表面亦可施以電漿處理或蝕刻處理 又,接著劑層之厚度大於5 μ m時,層合 效率的製造 層合時醯亞 於 1 %之可 1 5 0 °C以下 該聚醯亞胺 中反應所得 羧酸酐與芳 :酐與4,4、 3羧酸酐與 爲理想。此 t,理想爲 理想,聚醯 ,更理想爲 E必雷型( 度,以醯亞 之厚度低於 度等問題, 使用開普東 爲適合,聚 〇 板捲曲有變 -15- (12) (12)1284090 大之慮。 於本發明’理想係以上述聚醯亞胺酸淸漆塗敷於軋壓 銅范等金屬箔之處理面’進行乾燥,裝置及方法無特別限 疋’塗敷使用標準塗敷器’ T膜,$昆輪塗敷器,括刀塗敷 器’逆向塗敷器,凸緣塗敷器等即可,乾燥爲通過加熱輥 輪壓_時’溶劑含量爲3〜5 0質量%,理想爲3〜1 〇質量% ,且未進行醯亞胺化(醯亞胺化率低於5 % )之原狀聚醯 亞β女酸’接者之溫度爲120C以下,理想以80〜120 t適宜 乾燥。 溶劑含量超過5 0質量%時,輥輪壓鑄時或後硬化時 產生氣泡或膨脹,又,溶劑含量至低於3質量%承受之熱 履歷時,部份開始醯亞胺化,且由於聚醯亞胺酸層之軟化 點超過1 5 0 °C,以熱輥輪壓鑄層時,須要高溫高壓,產生 設成本高的情形。 輥輪壓鑄之加熱方法可列舉如輥輪直接以油或蒸氣等 加熱之方法。又輥輪材質亦以碳鋼之金屬輥輪或,耐熱性 之氟橡膠或聚矽氧烷橡膠所成之橡膠輥輪。 有關輥輪壓鑄條件亦無特別限定,溫度爲乾燥後之含 溶劑聚醯亞胺酸之軟化點以上之範圍,且爲使用溶劑之沸 點以下之100〜150°c,線壓爲 5〜lOOkg/cm之範圍進行爲 理想。 有關層合後之溶劑乾燥及醯亞胺化之方法,溶劑乾燥 溫度爲淸漆所使用溶劑之沸點以下,通常爲30〜20 0 °C, 特以4 0〜1 5 0 °C爲理想,溶劑乾燥時間由於須透過粘貼之 善 (13) 1284090 聚醯亞胺薄膜去除溶劑,適宜的去掉溶劑的時間,通常爲 3〜30分鐘。 又,醯亞胺化在去除溶劑後,持續進行亦可,如向來 的方法,銅箔等金屬箔不氧化之氧濃度(2質量%以下) 減壓或氮氣環境下,於250〜3 5 0 °C進行3〜20小時。進行 去除該溶劑及醯亞胺化時之型態,爲薄片狀或筒狀均可, 筒狀之捲取方法無特別限制,以銅箔等之金屬箔爲內側或 爲外均可,又挾以隔離材之筒狀亦可。 此處,本發明由於產生去除溶劑及層合後之殘留溶劑 或醯亞胺化時之脫水,理想筒狀之捲取方法以蓬鬆挾帶其 他材質之筒狀狀態進行加熱處理。 又’上述之製造方法,係有關單面金屬箔聚醯亞胺層 合板之製造方法,本發明亦適宜使用於雙面金屬箔聚醯亞 胺層合板之製造方法。有關雙面金屬箔聚醯到胺層合板之 製造’已進行層合之聚醯亞胺薄膜之單面物之薄膜上與, 其他金屬箔上形成聚醯亞胺酸層,進行去除溶劑之聚醯亞 胺酸側相互以熱輥輪層合接著,成爲雙面金屬箔聚醯亞胺 層合板。層合條件及硬化(醯亞胺化)條件等可與單面物 之製造方法相同。 【實施方式】 以下以實施例及比較例更詳細說明本發明,本發明不 限於實施例。 (14) 1284090 [實施例Π 聚醯亞胺酸之合成 添加均苯四甲酸酐218.5g於lkg之Ν,Ν-二甲基乙醯 胺,於Ν2環境下攪拌,保持於10°C時,緩緩添加4,4’-二 氨基苯基醚200.5 g溶解於lkgN,N-二甲基乙醯胺之溶解物 ,內溫不要超過1 5 °C。其後,於1 〇〜1 5 °C反應2小時後’ 更於室溫進行反應6小時。反應終了後之對數粘度爲 〇.8dl/g (使用U粘度管,0.5g/l濃度,30°C之粘度)。 層合板之製作 於截斷成 30cmx25cm之軋壓銅箔上,如上述調製之 聚醯亞胺酸淸漆,以應用器具塗敷成60 # m液厚’於烘 箱進行120°C x5分鐘乾燥。與截切成3〇Cmx25cm之25 // m厚度之Apical NPI (日本鐘淵化學工業(股)製)重 疊,使用試驗輥輪層合機(日本西村Machinary公司製) ,以1 2 0 °C x 1 5 k g / c m X 4 m / m i η進行層合。於氮氣惰性化之 烘箱內,以 160°C x4hi*,250°C X lhr,25(TC X lhr 之條件進 行連續加熱處理。所得之層合板爲銅箔3 5 // m,聚醯亞胺 層 3 0 // m 〇 殘溶劑量,軟化點,醯亞胺化率之測定 在層合板製作時’塗敷後乾燥終了時測定。殘溶劑量 以次式算出。 (塗敷之淸漆重量-乾燥後之減纛)x1()0/塗敷之淸漆 -18- (15) (15)1284090 重量 又,軟化點爲’削取乾燥後之聚醯亞胺酸層,使用 DSC-2 00 (曰本Seiko電子工業(股)製,由DSC測定曲 線圖讀取。又,醯亞胺化率由紅外線吸收光譜1 5 ;! 1 cnT 1 之苯環伸縮之吸光度與相對於1 775 cmq之醯亞胺之C = 0 伸縮之吸光度之比率算出。使用此樣本,依以下之條件進 行評價剝離強度,焊錫耐熱強度。結果如表1所示。 剝離強度 依JIS C 647 1爲基準,作成1mm寬度之電路樣本,以 50mm/分之拉伸速度以90°角度剝離測定。 焊錫耐熱性 浸漬於3 6 0 °C焊錫浴3 0秒後,以目視觀察有無剝離 或膨脹, [比較例1〜3] 比較例1 ’ 2如表1所示聚醯亞胺酸進行乾燥外,與 實施例1同樣層合,進行剝離強度,焊錫耐熱性之評價。 又,比較例3與實施例1不同,於聚醯亞胺薄膜塗敷乾燥 後,與銅箔進行層合。結果如表1所示。 (16) (16)1284090 表1 實施例 1 比較例 1 比較例 2 比較例 3 塗敷乾4後之聚醯亞胺酸層 殘溶劑量(質量% ) 5 1 56 5 醯亞胺化率(% ) 2 6 1 3 軟化點(°C ) 118 163 57 118 醯亞胺化後之特性 剝離強度(kg/cm ) 1 . 1 0.5 0.3 0.4 焊錫耐熱性 〇 〇 X 〇 (3 6 0 °C X 3 0 s ) 〔產業上之利用領域〕 依本發明,使用耐熱性聚醯亞胺接著劑製造全聚醯亞 胺之軟性金屬箔聚醯亞胺層合板,接著度高,且薄接著層 可以低乾燥溫度,層合溫度之條件製造。 -20-
Claims (1)
1284090 拾、申請專利範面 第93 1 1 8359號專利申請案 | 中文申請專利範圍修正本 民國95年12月21日修正 1 · 一種軟性金屬箔聚醯亞胺層合板之製造方法,其 特徵爲介以耐熱性接著劑,以加熱輥輪壓鑄層合金屬箔與 聚醯亞胺薄膜後,由加熱處理去除接著劑層中殘留之溶劑 後熱硬化者。 2.如申請專利範圍第1項之軟性金屬箔聚醯亞胺層 合板之製造方法,其中耐熱性接著劑於層合的時候,係爲 由醯亞胺化率未達5%之聚醯亞胺酸所成。 3 ·如申請專利範圍第i項或第2項之軟性金屬箔聚 醯亞胺層合板之製造方法,其中耐熱性接著劑於層合的時 候,係爲溶劑含量3〜50質量%之聚醯亞胺酸。 4·如申請專利範圍第3項之軟性金屬箔聚醯亞胺層 合板之製造方法,其中於層合的時候,溶劑含量爲3〜50 質量%之耐熱性接著劑之軟化點爲150°C以下者。 5 ·如申請專利範圍第2項之軟性金屬箔聚醯亞胺層 合板之製造方法,其中接著劑成分爲,選自均苯四甲酸酐 與4,4’-二氨基二苯基醚之縮合物、3,4,3,,4,-二苯基四羧 酸酐與P-苯撐基二胺之縮合物、或其混合物之聚醯亞胺 酸。 6 ·如申請專利範圍第1項之軟性金屬箔聚醯亞胺層 合板之製造方法,其中金屬箔爲10//m以上之軋壓銅箔 1284090 ,聚醯亞胺薄膜爲1 2 // m以上且耐熱性接著劑層爲5 // m 以下者。 7.如申請專利範圍第1項之軟性金屬箔聚醯亞胺層合 板之製造方法,其中軟性金屬箔聚醯亞胺層合板爲軟性單 面金屬箔聚醯亞胺層合板或軟性雙面金屬箔聚醯亞胺層合 板者。
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| JP3768104B2 (ja) * | 2001-01-22 | 2006-04-19 | ソニーケミカル株式会社 | フレキシブルプリント基板 |
| US20040231141A1 (en) * | 2001-07-06 | 2004-11-25 | Masaru Nishinaka | Laminate and its producing method |
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| JP4200376B2 (ja) * | 2004-02-17 | 2008-12-24 | 信越化学工業株式会社 | フレキシブル金属箔ポリイミド積層板及びその製造方法 |
-
2003
- 2003-06-25 JP JP2003181236A patent/JP3952196B2/ja not_active Expired - Fee Related
-
2004
- 2004-06-16 KR KR1020057014188A patent/KR100852943B1/ko not_active Expired - Fee Related
- 2004-06-16 WO PCT/JP2004/008788 patent/WO2005000562A1/ja not_active Ceased
- 2004-06-16 CN CNB200480005467XA patent/CN100402273C/zh not_active Expired - Fee Related
- 2004-06-16 US US10/545,810 patent/US20060191632A1/en not_active Abandoned
- 2004-06-24 TW TW093118359A patent/TWI284090B/zh not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI615073B (zh) * | 2015-04-09 | 2018-02-11 | 柏彌蘭金屬化研究股份有限公司 | 製成可撓式金屬積層材之方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100852943B1 (ko) | 2008-08-19 |
| TW200513381A (en) | 2005-04-16 |
| CN1753775A (zh) | 2006-03-29 |
| CN100402273C (zh) | 2008-07-16 |
| US20060191632A1 (en) | 2006-08-31 |
| JP2005014353A (ja) | 2005-01-20 |
| JP3952196B2 (ja) | 2007-08-01 |
| KR20060016741A (ko) | 2006-02-22 |
| WO2005000562A1 (ja) | 2005-01-06 |
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