1276199 九、發明說明： 【發明所屬之技術領域】 本發明係關於具有可-面使液晶顯示裝置（lcd)用玻璃 基板、電漿顯示板（PDP)用玻璃基板、半導體晶圓、印刷 基板、電子裝置基板等的基板迴轉，且另一面美 •洗淨、蝕刻、顯像、成膜等的處理之基板迴轉處理^元之 基板處理裝置。 【先前技術】 •例如在LCD等的平面顯示器⑽， 用基板的絲mnght etGhing)步驟中，—面使基板保 持水平姿勢另一面使其在垂直轴周圍迴轉，另一面各別使 用風氟酸作光钱刻、純水作沖洗及乾燥之各基板處理。但 :近:來隨著基板尺寸變大，藉如上述自旋(spin)方式 =貫施全部的處理。因此，光蝕刻處理及沖洗處理被 :有.以樂液作處理效率較高的“走方式之各別處理， 1的乾燥處理則係以比自旋方式對基板損傷比較少 田二方式亦即，一面支持基板向水平方向搬送另一面 = = (air knife)使基板除水.乾燥之方式而實施處理 如，自傳方法巾’其有用水平㈣手段使基板，例 (c〇nveyancer〇ller ^ r〇llerc〇n 處理單元移載，或自基板迴轉處理單元向傳送 滚子移載基板之必要。 牙、 傳i if3板移載動作之機構，以往係使用在鄰接於 傳以子❸而部’以平面視為在傳送滾子的延長線上配置 312ΧΡ/發明說明書(補件)/95-〇2/94136143 1276199 純迴轉處理單元，且在錢料及基板迴轉處 兩側配設互相平行之一對滑軌（sHder q 滑執而被導軌導引之傳送滾子和基板迴轉處理單元：： 设置有可往復移動之滑梭（shuUle)，藉該滑梭可^ 邊使基板在傳送滾子端部和基板迴轉 處理早兀之間移動之方法。又，其 付 手臂部及連結於手臂部之機器人臂部的搬送機:π: =器人在傳送滚子端部和基板迴轉處理二之= 二之傳送(delivery)(例如參照曰本… 利申巧公開第156295號公報）。 【發明内容】 (發明所欲解決之問題） ::有藉由可褒卸自如地支持基板之滑梭導引而藉滑 專达滾子之端部和基板迴轉處理單元之間往復移動 的機構之裝置，由於滑梭摺接在滑軌上而移動，因此，、典 籲梭移動時會有發生灰塵之虞，又，其^適合於設有使用= 液或純水實施濕式處理之處理單元的裝置。又，自傳送滚 子推壓基板，特別是大型的基板或向傳送滾子上回送基板 之機構或支持大型基板的4邊之機構等均报複雜，有此等 問題。-方面’藉由搬送機器人在傳送滾子的端部和基板 迴轉處理單元之間可傳送基板之裝置也不適於濕式處 理，又，由於其必須有使搬送機器人的臂部迴轉之空間， 因此，其有占地面積（footprint)大的問題。 本發明係鑑於以上情況所完成，在具有裝備基板迴轉處 312XP/發明說明書(補件)/95-02/94136143 7 1276199 單=而自水平搬送手段朝向該處理單元移載基板的機 構之衣置中，其目的為提供一種不必擔心會發生灰塵，即 使對具有實施濕式處理的處理單元之裝置也不會不便，且 構造簡單，也可將占地面積構成比較小的基板處理裝置。 (解決問題之手段） 申請專利範圍第i項之發明’其特徵係，其具備有：迴 ^自如地被支持在垂直軸周圍具有可將基板保持於水平 :?之迴轉保持構件且可使基板迴轉處理之基板迴轉處 理早几的基板處理裝置，其特徵為，其具備有：朝向水平 =線地搬送基板之水平搬送手段；及，具有可將基板 、、水平♦勢之支持部’和前述水平搬送手段的搬送路 、:：：：對向’且使前述支持部之基板支持面和水平搬送 :的基板搬送面配置成同一高度之可動支持構件；及， 般Γ段的搬送終端部朝向前述可動支持構 1使基板水㈣動之料手H，自㈣述 二t::的搬送路終端部相對向之位置朝向前述基板迴轉 i理早兀的迴轉保持構件上使支持基板之前述可動支持 置移動手段；而前述迴轉保持構件係具有··可載 =支持構件在上方分離而保持基板之基板= 利範圍第2項之發明，其特徵係，除了W項所 #^1^配置在和前述水錢科段㈣送路終_ 元之迴㈣基“轉處理單 ,、、冓件的正上方，而前述移動手段係具有可使 312XP/發明說明書(補件)/95-02/94136143 1276199 則述可動支持構件升降之升降機構。 申請專利範圍第3項之發 記载者外，在前述可動支持構件上 ；^弟2項所 =保持構件的基板保持部之複數個貫通;有可插通前述 I凊專利範圍第4項之發明，其特徵係， 記載者外’前述可動支持構件之⑽^ 活動二可動支持構件的上面側之複數個 項：:月專利耗圍第5項之發明，其特徵係’除了第1至3 支持部。’L σ 夺構件且支持該可動支持構件之繫合 申》月專利耗圍第6項之發明，其特徵係，除了第i至3 項中任一項所記載者外，前述水平搬送手段係由互相 排列之複數個搬送滾子所構成。 鲁（發明效果） 在申請專利範圍第i項之基板處理裝置中，藉水平搬送 手段將基板搬送至其搬送路終端部時，基板係藉移載手段 而自水平搬送手段的搬送路終端部被水平移動，支持部的 基板支持面朝向被配置成和水平搬送手段的基板搬送面 同一高度之可動支持構件而被移載。基板被支持在可動支 持構件的支持部時，藉移動手段，則支持基板之可動支持 構件朝向基板迴轉處理單元的迴轉保持構件上移動，而可 動支持構件被載置在迴轉保持構件之載置面上，同時，基 312XP/發明說明書(補件)/95-02/9413 6143 9 1276199 板自可動支持料離開上方*㈣持 =持部。又，以在載置可動支持構件之狀態;= 轉=持構件迴轉，則基板也被迴轉而可實施基板之處理。 日士因^如使用中請專利範圍第i項發明之基板處理裝置 r由於構成構件彼此間幾乎都沒有摺接部份，因此 送I段向基板迴轉處理單元移載基板時，不會有發 狀。之：’又’即使對裝有實施濕式處理之處理單元的 :=不:有不方便之情形。又，此基板處理 C二…之機構或支持基板的4 ’其構造變成簡單’又，由於其亦未設 、 口此占地面積也可變成比較小。 為早70的迴轉保持構件之正上方，因 • 申請專利範圍第3項h c 構件對基板迴轉處理單二置係’可動支持 rr.之基板保持部=:=之藉= 保持二板可載 :保二迴轉保持構件之基板;持部上 載置==二載置*上之可動支持構件的 保持動作。…冓件之基板保持部而可實現基板的 312XP/發明說明書(補件)/95-02/94136143 10 1276199 :請專利範圍第4項發明之基板處理事 手段而自水平搬送手段的搬送路 被：：猎移 …基板可一面傳送而—面、？被水平移動 滾子上。因此，不合祐里4 4 、在了動支持構件的活動 不5使基板損傷而可確實1276199 IX. The present invention relates to a glass substrate for a liquid crystal display device (LCD), a glass substrate for a plasma display panel (PDP), a semiconductor wafer, a printed substrate, and the like. A substrate processing apparatus that rotates a substrate such as an electronic device substrate, and performs substrate processing, such as cleaning, etching, development, and film formation. [Prior Art] • For example, in a flat panel display (10) of an LCD or the like, in the step of mnght etGhing of a substrate, the surface is held in a horizontal posture on the other side so as to be rotated around the vertical axis, and the other side is made of fluorinated acid. Each substrate is treated with light money and pure water for rinsing and drying. However: Near: As the size of the substrate becomes larger, the above-mentioned spin method is used. Therefore, the photo-etching treatment and the rinsing treatment are: a separate treatment of the walking method with a high processing efficiency, and a drying treatment of the substrate is less than the spin method. One side of the support substrate is transported to the other side in the horizontal direction = = (air knife) to remove the water from the substrate. The method of drying is performed, for example, the method of self-transfer method is used to make the substrate, (example) (c〇nveyancer〇ller ^ r 〇llerc〇n processing unit transfer, or transfer from the substrate rotation processing unit to the transfer roller. The mechanism for transferring the teeth and transmitting the if 3 board is used in the past. The plane is regarded as the 312ΧΡ/invention specification (supplement)/95-〇2/94136143 1276199 pure rotation processing unit on the extension line of the conveying roller, and one pair of parallel sliding sides are arranged on both sides of the money material and the substrate rotation. Rail (sHder q slippery guide roller and substrate revolving unit:: is provided with a reciprocable shuttle (shuUle) by which the substrate can be placed at the end of the transfer roller and Substrate rotation processing The method of moving between the cymbals. In addition, the arm of the arm and the robot arm connected to the arm: π: = the person at the end of the transfer roller and the substrate rotation process 2 = two delivery (delivery) (For example, refer to 曰本... Lissin et al. No. 156295.) [Summary of the Invention] (Problems to be Solved by the Invention) :: There is a slide guide guided by a detachable support substrate The device for reciprocating between the end of the roller and the substrate rotation processing unit moves because the shuttle is folded on the slide rail, so that dust may occur when the shuttle is moved, and It is suitable for a device equipped with a processing unit that performs wet processing using liquid or pure water. Further, a substrate is pushed from a transfer roller, particularly a large substrate or a mechanism for returning a substrate to a transfer roller or a large substrate. The four-sided mechanism is complicated and has such problems. - The 'device that can transfer the substrate between the end of the transfer roller and the substrate rotation processing unit by the transfer robot is not suitable for wet processing, and It must have a conveyor The space in which the arm of the person rotates, and therefore, has a large footprint. The present invention has been made in view of the above circumstances, and has an equipment substrate revolving portion 312XP/invention specification (supplement)/95-02 /94136143 7 1276199 Single = in the clothing of the mechanism for transferring the substrate from the horizontal transfer means to the processing unit, the purpose of which is to provide a device that does not have to worry about the occurrence of dust, even for a device having a processing unit that performs wet processing. It is inconvenient, and the structure is simple, and the substrate processing device having a relatively small footprint can be formed. (Means for Solving the Problem) The invention of the invention of the scope of the patent application is characterized in that it is supported by: A substrate processing apparatus having a substrate holding surface that can hold a substrate in a horizontal rotation and holding a substrate in a rotating state around the vertical axis, wherein the substrate processing apparatus is configured to convey the substrate toward the horizontal=line a horizontal transport means; and a transport path for the substrate, the horizontal support portion, and the horizontal transport means, :::: The substrate supporting surface of the support portion and the substrate transfer surface are arranged at the same height as the movable support member; and the transfer terminal portion of the normal portion is oriented toward the movable support 1 to move the substrate water (four) to the handle H, from (4) The transfer holding terminal portion of the second t:: the movable holding member moving means for supporting the substrate on the turning holding member which is rotated toward the substrate, and the turning holding member has a load carrying member. The invention is characterized in that the support member is separated above and the substrate of the substrate is held. The invention of the second item is characterized in that, in addition to the W item, the configuration is in the same manner as the above-mentioned water money section (four). The transfer means is directly above the member, and the moving means has an elevating mechanism which can lift and lower the movable supporting member by the 312XP/invention specification (supplement)/95-02/94136143 1276199. In addition to the description of the third paragraph of the patent application, the plurality of substrate holding portions of the holding member are connected to the movable supporting member; and the fourth substrate of the above-mentioned I Patent No. 4 is inserted. The invention is characterized by a plurality of items on the upper side of the movable supporting member (10) and the movable movable supporting member: the invention of the fifth patent of the monthly patent, the characteristic of which is 'except the first to third Support department. The invention of the sixth patent of the 'L σ 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承 承It consists of a plurality of transport rollers arranged in series. Lu (Invention Effect) In the substrate processing apparatus of the invention of claim i, when the substrate is transported to the transport path end portion by the horizontal transport means, the substrate is transported from the transport path end portion of the horizontal transport means by the transfer means The substrate supporting surface of the support portion is horizontally moved toward the movable supporting member disposed at the same height as the substrate conveying surface of the horizontal conveying means. When the substrate is supported by the support portion of the movable supporting member, the movable supporting member of the supporting substrate moves toward the turning holding member of the substrate turning processing unit by the moving means, and the movable supporting member is placed on the mounting surface of the turning holding member. Above, at the same time, base 312XP / invention manual (supplement) / 95-02 / 9413 6143 9 1276199 plate from the movable support material left above * (four) holding = holding part. Further, in the state in which the movable supporting member is placed; = the rotation of the holding member is rotated, the substrate is also rotated to perform the processing of the substrate. In the substrate processing apparatus r of the invention of the invention of the invention, the substrate processing apparatus r of the invention is not folded at all, so that when the substrate is transferred to the substrate rotation processing unit, the substrate is not sent. shape. It is: 'And' even if it is inconvenient for the processing unit equipped with the wet processing: = no: Further, the structure of the substrate processing C or the support substrate 4' is simplified. Further, since it is not provided, the footprint can be made smaller. It is the top of the swing holding member of the early 70, because the patent application scope is the third item hc member to the substrate rotation processing single two-system 'movable support rr. The substrate holding part =:= l borrowing = keep the second board loadable: The substrate of the second holding member is held; and the holding portion of the movable supporting member on the holding portion == two mounts is placed. 312XP/invention specification (supplement)/95-02/94136143 10 1276199, which can realize the substrate holding portion of the substrate, and the substrate processing method of the fourth invention, and the transfer path from the horizontal transfer means is :: Hunting... The substrate can be transported on one side, and – Moved horizontally on the roller. Therefore, it is not possible to make the substrate damage during the activity of the movable support member.
段上向可動支持構件上傳送。 “地自水平搬送手I 申明專利範圍第5項發明之基板處理 :广繫合在移動手段的繫合支持部且被 脫離，而迴轉伴持構件在：二，自可動支持構件 和保持構件在保持可動支持構件下可予以 1此藉由比較簡單的機構即可朝向基板迴轉處理單= 勺迴轉保持構件上實施可動支持構件的移動。 申請專利範圍第6項發明之基板處理褒置係，基板藉禮 置固搬达滾子而被水平搬送至和可動支持構件對向之位 ⑩【實施方式】 以下參照圖式說明本發明之實施形態。 圖1至圖4表示本發明之實施形態之一例，圖丨表示美 板處理裝置的重要部份之構成的平面圖，圖2係其側= 面圖，圖3係此基板處理裝置的構成元件之可動支持構件 (輸送板carrier plate)的平面圖，圖4(a)係圖3之α_α 剖面圖，圖4(b)係圖3之β-Β剖面圖，圖4(c)係圖3之 C—C剖面圖。 此一基板處理裝置係具備有可使LCD用玻璃基板等的 312XP/發明說明書(補件)/95-02/94136143 1276199 ι〇〇:基;f W —面迴轉一面處理之基板迴轉處理口口 iU〇此一處理單元1r)在 、得爽理早元 理而以純水實施沖洗處理 軸w而被支持成水平姿勢且可將基板平、迴轉支 之迴轉保持圓板12,此一 呆持在水平姿勢 旋轉馬達（SPin m +、 持®板12係藉未圖示之 ’違(咖m〇tor)而使迴轉支軸 之 圍迴轉。另外，雖在處理單轉而= 酸或純水等之喷嘴，但其等之說明被省略。表面實出風氟 10在= 反處理裝置配設有鄰接於基板迴轉處理單元 "、’方向可直線地搬送基板w c〇nveyor c〇nveyanceroller, :滾子16係由互相平行被排列之複數個搬 ίΐ元= 向於此傳送滾子16的搬送路終端部且= ::10的迴轉保持圓板12之正上方位置， 面形狀而比基板w更大的角形之 有十 plate)20。 勒廷板（earner =板20上，如圖3所示’在四角隅各形成一對而 共㈠十8個角隅貫通孔22，同時’全面分散設置有複數 個小徑貫通孔24。又，在輸送板2〇的上面中央部形成有 直線狀之淺溝26。又，在輸送板20的上面侧，被配嗖有 各個迴轉軸和溝26的長邊方向成正交而迴轉自如地被安 裝之複數個活動滾子（freer〇iier)28。各活動滾子28係 如圖4(c)所示，自輸送板20的上面各露出一部份，且全 3 UXP/發明說明書(補件)/95·02/94136143 12 1276199 =的活動滾子28之上端被安 輸送板20係藉複數個水千面内。此 如圖2所示，位在和傳 輸^板2〇係， 之基板傳送位置八時=:6,7路終端部相對向 广高度。又’在輪送板… 橫孔30。 r兴。卩形成有 在傳送滾子1 6側之相7L送、吞7 細長板狀的移载臂3:=載子;= 上面，各別設有可繫人2=夂32 “端部及後端部的 3处。移載臂32係藉未圖示之支持 二口凸:广、 水平姿勢，1 W㈣彳；構而被支持成 直線地往復移動，同時，爱朝 向上下方向僅可往復移動稍許距離。X，移载臂32 = 構成藉由對水平方向之移動動作，而可在傳送滾子16、^ 搬运路終端部位置和被配置輸送板2()之基㈣送 之間往復移動’而藉向上下方向之移動動作， 34a、m在繫合基板w的各端邊之上部位置以及;入= 部34a、34b自基板w的各端邊脫離之下部位置之間^凸 移動。 设 又，在央住輸送板20之傳送滾？ 16的反對側，如圖ι 至圖10所示，配設有輸送板2G之支持.移動機構^ 支持.移動機構36係具備：具有螺絲部之先端部可穿 如地繫合於輸送板2G的橫孔30而支持輸送板2g之、= 312XP/發明說明書(補件)/95-02/9413 6143 13 1276199 支持桿38 ;雖然其構造之說明被省略，且 支持桿38的螺絲部之螺母部的不會和繫合^ ^合 旋轉而使其迴似賴送㈣的橫孔起 2的先端部進入及退出之水平㈣部 == 平驅動部40而朝向上下方 支持此水 2，如此所構成。藉此支持. ^ 和傳逆乎早1Raaw , 私動械構36，輪送板20在 6的搬送路終端部相對向之上方的基板傳： 位置A ;及，載置在基板迴轉處理 反傳达 板12上的下方之迴轉處理位置B;之間而可之往 持圓 ^板迴轉處理單元1G的迴轉保持圓板12 可支持輸送板20之载置面，曰.μ二/ 面構成 於基板w的各角部且支持美^；^面側植設有各別繫合 隅持基板¥之各一對而合計8根的角 隅支持銷44，同時，全面分散插执 的下面且去牲其缸w刀政植5又有上端各別抵接基板？ 角：Γί 複數根的下面支持銷46。此等各 鄉=44及各下面支持銷46係被配置於位在各別對 應於设在輸送板2〇的各角 W對 24之來m π ☆ 牙孔22及各小徑貫穿孔 y ^ 。，各角隅支持銷44及各下面支持銷 係如圖4(a)及⑻所示（以二 各=支制46 鏈線表不支持銷44、46)， 小別插通在設於輪送板20的各角隅貫穿孔22及各 孔24之尺寸’又’各角隅支持銷44之基板支持 邛的同度及各下面支持銷46 仫、士接Α、 輸送板20的厚度更大。_呈^ μ ^ 稭^、有如此之構造，在輸送板20 牛广輸送板20的各角隅貫穿孔以及各小徑 4和迴轉保持圓板12的各角隅支持銷44及各下面支持 312ΧΡ/發明說明書(補件)/95 -02/94136143 1276199 銷46則各別互相不會接 作，而在迴轉伴拉, T合斗輪迗板20之下降動 :在迴轉保持固板12上可載置輸送板2〇。 …依照圖5至圖1〇說明具 裝置之基板W的移载動作。 肖成之基板處理 如圖5(a)所示，以移載臂32位 而 街16使基板^搬送至:::置而错傳 臂32之繫合凸部34b二如圖5(b)所示，移載 如圖5㈦所示，藉移載 稚秒戰# 32向配置輸送板2〇之其杧扁 迗位置A之方向水平移動時 反20之基板傳 子16之搬送滾子18上，土 ^支持在傳送滾 邱4 A r 3 另一面在移载臂32的擊人Λ 二:广被支持在輪送板二動;==:， 如圖6所示，基板臂至，^ 置A，基板W被藉支持.移㈣構362 ^入至基板傳送位 支持之輸送板20的活動滾子 、’、合支持桿38所 所干，梦讲辟上而支持停止時，如圄7 所不，私載臂32則在輪送板2〇的溝 ·^圖7 移動。由此，可解除移載臂32之繫人 月向下部位置 板W之兩端邊的繫合狀態。又 ;a、34b和基 16的搬送路終端部位 朝向傳送滾子 置A脫離。 白水千移動’並自基板傳送位 312XP/發明說明書(補件)/95-02/94136143 如圖8所示，移载臂32自基板傳送位置A脫離時，在 ^276199 ，動滾子28上支持基板w之輪送板2{)係藉 ί 36的升降驅動部42而朝向基板迴轉處：單元心： 夕動。由此，如圖9所示，隨著自基 二= 板迴轉處理位置B之輸送板2〇的下降動^^朝向基 的活動滾…朝向迴轉保持圓板12的角〇 及下；士』士 μ 丹1馬支持銷44 u的角隅支持：么:使基板w移換’而藉迴轉保持圓板 時，於Λ 支持銷46來保持基板评，同The segment is transported onto the movable support member. "Based from the horizontal transfer hand I claim the patent range of the fifth invention of the substrate treatment: the wide-angle is attached to the support portion of the moving means and is detached, and the rotary accommodating member is: Second, the self-moving support member and the holding member are The movable support member can be moved under the movable support member, and the movement of the movable support member can be performed on the substrate rotation processing unit by the relatively simple mechanism. The substrate processing system of the sixth invention of the patent application, the substrate The present invention is described below with reference to the drawings. FIG. 1 to FIG. 4 show an example of an embodiment of the present invention. FIG. 2 is a plan view showing a configuration of an important part of the sheet processing apparatus, FIG. 2 is a side view thereof, and FIG. 3 is a plan view showing a movable support member (carrier plate) of the constituent elements of the substrate processing apparatus. 4(a) is a sectional view of FIG. 3, FIG. 4(b) is a sectional view of FIG. 3, and FIG. 4(c) is a sectional view taken along line C-C of FIG. 3. The substrate processing apparatus is provided with Can make glass base for LCD 312XP / invention manual (supplement) / 95-02/94136143 1276199 ι〇〇: base; f W - surface rotation processing of the substrate processing mouth iU 〇 this processing unit 1r) In the early stage, the flushing treatment axis w is carried out with pure water and supported in a horizontal posture, and the flat plate and the swivel branch can be rotated to hold the circular plate 12, which is held in the horizontal posture rotating motor (SPin m +, holding the plate) In the 12th, the rotation of the rotary fulcrum is rotated by a singularity (not shown). In addition, although a nozzle such as acid or pure water is treated as a single rotation, the description thereof is omitted. The wind fluorine 10 is disposed in the reverse processing device adjacent to the substrate rotation processing unit ", and the substrate can be linearly conveyed wc〇nveyor c〇nveyanceroller: the roller 16 is arranged in parallel with each other ΐ = ====================================================================================================== Board (earner = board 20, as shown in Figure 3) in the four corners each form a pair and a total of (one) ten eight corners The through hole 22 is simultaneously provided with a plurality of small-diameter through-holes 24 in a completely dispersed manner. Further, a linear shallow groove 26 is formed in a central portion of the upper surface of the conveying plate 2A. Further, on the upper surface side of the conveying plate 20, A plurality of movable rollers 28 are attached to each of the rotary shafts and the longitudinal direction of the grooves 26 so as to be orthogonal to each other, and the movable rollers 28 are as shown in Fig. 4(c). A part of each of the upper surface of the conveying plate 20 is exposed, and the upper end of the movable roller 28 of the full 3 UXP/invention specification (supplement)/95·02/94136143 12 1276199 = is borrowed from the conveying plate 20 by a plurality of water thousand In-plane. As shown in Fig. 2, the position of the substrate transfer position is 8:=6, and the 7-terminal end portion is relatively wide. Also in the wheel plate... transverse hole 30. R Xing.卩There is a 7L-feeding and swallowing 7-shaped transfer arm 3 on the side of the transport roller 16:=carrier; = top, each with a human 2=夂32 “end and back” The transfer arm 32 is supported by a not-shown two-portion: wide, horizontal posture, 1 W (four) 彳; the structure is supported to reciprocate in a straight line, and at the same time, the love can only reciprocate in the up and down direction. Distance X. The transfer arm 32 = constitutes a movement in the horizontal direction, and can reciprocate between the transfer roller 16 and the position of the end portion of the conveyance path and the base (four) of the conveyance plate 2 (). Further, by the movement operation in the upward and downward directions, 34a and m are positioned at the upper portion of each end of the bonding substrate w and the in/or portions 34a and 34b are moved from the respective end sides of the substrate w to the lower position. Further, on the opposite side of the transport roller 16 of the central transport panel 20, as shown in Fig. 10 to Fig. 10, support for the transporting plate 2G is provided. The moving mechanism is supported. The moving mechanism 36 is provided with a screw portion. The tip end portion can be worn to the transverse hole 30 of the conveying plate 2G to support the conveying plate 2g, = 312XP / invention manual (supplement) / 95-02/94 13 6143 13 1276199 Support rod 38; although the description of the structure is omitted, and the nut portion of the screw portion of the support rod 38 does not rotate with the coupling to make it return to the transverse hole 2 of the (4) The level of the tip end entry and exit (four) == flat drive unit 40 supports the water 2 upwards and downwards, so as to support this. ^ and pass the reverse 1Raaw, the private mechanism 36, the transfer board 20 The transfer path end portion of the transfer path portion of 6 is positioned at a position above the substrate A; and the position S is placed on the lower side of the substrate transfer processing reverse transfer plate 12; The turning holding circular plate 12 of the turning processing unit 1G can support the mounting surface of the conveying plate 20, and the 二.μ2/face is formed at each corner of the substrate w and supports the beauty of the surface. Holding a pair of base plates and a total of 8 corner support pins 44, at the same time, fully disperse the underside of the insert and go to the bottom of the tank, and the upper end has abutting the substrate separately. Angle: Γ 复The lower support pin 46. These townships = 44 and each of the lower support pins 46 are arranged in the respective positions corresponding to the delivery 2 〇 corners W to 24 m π ☆ dental hole 22 and each small diameter through hole y ^, each corner 隅 support pin 44 and each of the lower support pins are as shown in Figures 4 (a) and (8) Two each = support 46 The chain line table does not support the pins 44, 46), and the small pins are inserted in the corners of the turn board 20 and the holes 24 and the sizes of the holes 24 The substrate supports the same degree of 邛 and the lower support pins 46 仫, 接 Α, the thickness of the conveying plate 20 is larger. _ is ^ μ ^ straw ^, has such a configuration, in the conveying plate 20 cattle wide conveying plate 20 Each of the corners through-holes and the respective corners of each of the small diameters 4 and the rotation-retaining circular plate 12 support pin 44 and each of the lower support 312ΧΡ/invention specification (supplement)/95 -02/94136143 1276199 pin 46 are not mutually different In the case of the rotary splicing, the lower movement of the T-fold rim 20: the conveying plate 2 can be placed on the slewing holding solid plate 12. The transfer operation of the substrate W having the device will be described with reference to Figs. 5 to 1B. As shown in Fig. 5(a), Xiao Cheng's substrate processing is carried out by the transfer arm 32 and the street 16 transports the substrate to::: the misaligned arm 32 is attached to the convex portion 34b as shown in Fig. 5(b) As shown in Fig. 5 (7), the transfer roller 18 of the substrate transfer 16 of the reverse 20 is moved horizontally by the transfer of the childish second battle #32 to the direction of the flattened position A of the transporting plate 2 , soil ^ support in the transfer roll Qiu 4 A r 3 on the other side of the transfer arm 32 hits two: wide is supported on the transfer board two movement; ==:, as shown in Figure 6, the substrate arm to, ^ In the case of A, the substrate W is supported by the transfer. The moving roller of the transport plate 20 supported by the substrate transfer position, and the support rod 38 are dry, and the dream is supported and stopped. 7 No, the private arm 32 moves in the groove of the wheel feed plate 2〇. Thereby, the engagement state of the both ends of the lower end position plate W of the transfer arm 32 can be released. Further, the end portions of the conveyance path of the a, 34b, and the base 16 are separated toward the transport roller A. White water movement 'and from the substrate transfer position 312XP / invention manual (supplement) / 95-02 / 94136143 As shown in Figure 8, when the transfer arm 32 is detached from the substrate transfer position A, on the ^276199, the moving roller 28 The transfer board 2{) supporting the substrate w is rotated toward the substrate by the elevation drive unit 42 of the ί 36: unit core: Eve. Therefore, as shown in FIG. 9, the lowering of the conveying plate 2 of the conveying plate 2 from the base 2 = plate turning processing position B is toward the base, and the corner of the circular plate 12 is turned toward the bottom; Shi μ Dan 1 horse support pin 44 u corner support: What: Move the substrate w to change ' while holding the circular plate by rotation, support the pin 46 to maintain the substrate evaluation, the same
τ輪达板20被載置於迴轉保持圓板12的上面 持保持圓板12的上面被保持的輪送板2G藉角隅支 夕，及下面支持鎖’46❿使基板W被保持時，藉支 私動機構36之水平驅動部4〇而繫合持 s 、 ，板2。離開方向而移動。由此，如支圖 擊：部自輸送板20的橫孔30被拔出，而解除 圓=二 送板20之繫合狀態。然後，迴轉保持 0板12.交成可迴轉之狀態，而在基板迴轉處理單元丨〇杏 施既定的基板處理。 貝 在基板迴轉處理單元10中基板W的處理終了時，藉與 上述的動作相反之動作，基板w則自迴轉保持圓板^上 朝輸送板2G上被移載，且被支持在輸送板2()上而自基板 迴轉處理位置B朝向基板傳送位置A移動後，再藉移載臂 32自輸送板2〇上返回傳送滾子16上。 本發明之基板處理裝置雖然如上述所構成而動作，但自 基板的水平搬送手段、輸送板、水平搬送手段向輸送板之 基板的移載手段、輸送板之支持·移動手段等的構成並非 312XP/發明說明書(補件)/95·〇2/94ΐ36143 16 1276199 依上述實施形態之内容而被限定，其係可採用各 等效物者。 偁之 【圖式簡單說明】 圖1係本發明之實施形態的一例，表示基板 重要部份之構成的平面圖。 衣置的 圖2表示圖1之基板處理裝置的側視剖面圖。The τ wheel plate 20 is placed on the upper surface of the slewing holding circular plate 12, and the slewing plate 2G held by the holding circular plate 12 is held by the horn, and the lower support lock '46 ❿ is used to hold the substrate W. The horizontal drive unit 4 of the private movement mechanism 36 is coupled to the s and the plate 2. Move away from the direction. Thereby, the cross-hole 30 of the transporting plate 20 is pulled out as shown in the figure: the uncoupling state of the circle=two-feeding plate 20 is released. Then, the slewing and holding 0 plate 12 is placed in a rotatable state, and the substrate is processed by a predetermined substrate in the substrate rotation processing unit. When the processing of the substrate W is completed in the substrate rotation processing unit 10, the substrate w is transferred from the rotation holding circular plate to the conveying plate 2G by the operation opposite to the above-described operation, and is supported on the conveying plate 2 After moving from the substrate rotation processing position B toward the substrate transfer position A, the transfer arm 32 is returned from the transport plate 2 to the transfer roller 16 by the transfer arm 32. The substrate processing apparatus of the present invention operates as described above, but the configuration of the horizontal transfer means, the transport plate, the transfer means of the horizontal transfer means to the substrate of the transfer plate, and the support and movement means of the transfer plate are not 312XP. /Instruction of the Invention (Supplement) / 95 · 〇 2 / 94 ΐ 36143 16 1276199 The content of the above embodiment is limited, and the equivalents can be employed. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing an example of an embodiment of the present invention, showing a configuration of an important portion of a substrate. Fig. 2 is a side sectional view showing the substrate processing apparatus of Fig. 1.
圖3表示圖丨之基板處理裝置的構成元件之可動 件（輪送板）的平面圖。 、 3之B-B剖面圖， 圖4(a)係圖3之A-A剖面圖，（b)係圖 (c)係圖3之〇C剖面圖。 _ 圖5(a)〜（c)表示圖1之基板處理裝置中說明移载動作 .用之圖，表示傳送滚子的部份之側視剖面圖。 圖6表示圖丨之基板處理裝置的輸送板、輸送板之支 持.移動機構及基板迴轉處理單元的一部份之側視圖。 圖7表示圖1之基板處理裝置的輸送板、輪送板之支 籲持.移動機構及基板迴轉處理單元的一部份之側視圖。 圖8表示圖丨之基板處理裝置的輸送板、輪送板之支 持.移動機構及基板迴轉處理單元的一部份之側視圖。 圖9表示圖i之基板處理裝置的輸送板、輪送板之支 ‘持·移動機構及基板迴轉處理單元的一部份之側視圖。 .圖1〇表示圖1之基板處理裝置的輸送板、輸送板之支 持·移動機構及基板迴轉處理單元的一部份之側視圖。 【主要元件符號說明】 1〇 基板迴轉處理單元 312Xp/發明說明書(補件)/95-02/94136143 17 1276199 12 迴轉保持圓板 14 迴轉支軸 16 傳送滾子 18 搬送滾子 20 輸送板 22 角隅貫穿孔 24 小徑貫穿孔 26 溝 28 活動滾子 30 橫孔 32 移載臂 34a 、 34b 繫合凸部 36 支持、移動機構 38 繫合支持桿 40 水平驅動部 42 升降驅動部 44 角隅支持銷 46 下面支持銷 A 基板傳送位置 B 迴轉處理位置 W 基板 312XP/發明說明書(補件)/95-02/94136143 18Fig. 3 is a plan view showing a movable member (wheeling plate) of constituent elements of the substrate processing apparatus of Fig. 3. Fig. 4(a) is a cross-sectional view taken along line A-A of Fig. 3, and Fig. 4(a) is a cross-sectional view taken along line C of Fig. 3. 5(a) to 5(c) are diagrams showing the transfer operation in the substrate processing apparatus of Fig. 1. Fig. 5 is a side cross-sectional view showing a portion of the transfer roller. Fig. 6 is a side elevational view showing a portion of the transporting plate and the transporting plate of the substrate processing apparatus of the drawing, a moving mechanism, and a substrate turning processing unit. Fig. 7 is a side elevational view showing a portion of a conveying plate, a moving mechanism, and a substrate turning processing unit of the conveying plate and the conveying plate of the substrate processing apparatus of Fig. 1. Fig. 8 is a side elevational view showing a portion of the conveying plate and the conveying plate of the substrate processing apparatus of the drawing, a moving mechanism, and a substrate turning processing unit. Fig. 9 is a side elevational view showing a portion of the transfer plate and the transfer plate of the transfer processing plate and the transfer plate of the substrate processing apparatus of Fig. i; Fig. 1A is a side elevational view showing a portion of a conveying plate, a conveying plate supporting and moving mechanism, and a substrate turning processing unit of the substrate processing apparatus of Fig. 1. [Main component symbol description] 1〇Substrate rotation processing unit 312Xp/Invention manual (supplement)/95-02/94136143 17 1276199 12 Rotary holding circular plate 14 Rotary support shaft 16 Transfer roller 18 Transfer roller 20 Conveying plate 22 Corner隅through hole 24 small diameter through hole 26 groove 28 movable roller 30 transverse hole 32 transfer arm 34a, 34b tying convex portion 36 support, moving mechanism 38 tying support rod 40 horizontal drive portion 42 lifting drive portion 44 corner 隅 support Pin 46 Support pin A Substrate transfer position B Swing processing position W Substrate 312XP / Invention manual (supplement) / 95-02/94136143 18