CN1812071B - Substrate processing equipment - Google Patents

Abstract

The present invention provides a substrate processing apparatus for reducing the floor area required for installation, capable of transporting a substrate in an inclined posture with a simple structure, and reducing equipment cost. The conveying direction switching part (40) switches the conveying direction, and by the inclined conveying part (49), under the condition that the gradient of passing through the first conveying path (41) and the state of being in an inclined posture are substantially maintained, the first processing The substrate processed by the part (20) is transported to the second transport path (43). The liquid supply unit supplies the processing liquid to the main surface of the substrate (B) transported by the inclined transport unit (49). In the second transport path (43) and the second processing unit (30), the substrate held in an inclined posture by the inclined transport unit (49) is transported and processed in the direction opposite to the first processing unit 20 in the original posture.

Description

Substrate processing equipment

technical field

The present invention relates to a manufacturing process used in a liquid crystal display device, a PDP (plasma display panel), or various semiconductor devices. A substrate processing apparatus that performs predetermined processing on various substrates such as substrates.

Background technique

Conventionally, there is known a substrate processing apparatus in which, for example, as shown in Patent Document 1, each processing section is arranged in a substantially "U" shape in plan view, and performs resist coating processing, exposure processing, and development processing on a substrate. Wait for a series of preset treatments. This substrate processing apparatus has: a first transport path 51 for applying a predetermined process while transporting a substrate taken out of a substrate storage box in one direction; Turning path 53; the second conveying path 52 that applies a predetermined process to the substrate while conveying the substrate received from the reverse path 53 in the direction opposite to the conveying direction of the first conveying path 51, the entire device is generally in the shape of "U" in plan view The structure of the letter shape.

In the substrate processing apparatus disclosed in this patent document 1, the above-mentioned reversing path 53 has an inclined conveyance mechanism that conveys the substrate in an inclined state. By conveying the substrate in this inclined state, it is possible to reduce splashing from the substrate when the processing liquid is supplied to the substrate. out of the liquid.

In addition, as a mechanism for changing a substrate in a horizontal state into an inclined posture, a substrate posture changing device disclosed in Patent Document 2 has been proposed. As shown in FIG. 2 of Patent Document 2, this substrate posture changing device has partially supported rollers 93 that convey the substrate B in an inclined posture. The substrate B is changed to an inclined posture and guided to the entry side transfer loading device 3 of the partially supported rollers 93, by placing a plurality of unit rollers R1 to R5 arranged in parallel and having an axis perpendicular to the conveying direction of the substrate B. The plurality of sub-cylinders C1-C5 for changing the attitude between the horizontal attitude and the inclined attitude allow the substrate B to change the attitude between the horizontal attitude and the inclined attitude.

Patent Document 1: JP Unexamined Patent Publication No. 2000-31239.

Patent Document 2: JP-A-9-226916.

However, in the substrate processing apparatus using the above-mentioned substrate posture changing device, a complicated mechanism (such as FIG. 2 of Patent Document 2) is required to change the substrate from the horizontal posture to the inclined posture, and the cost also increases. In addition, since the substrate attitude changing device is added and installed on the substrate conveyance path, the floor area required for installing the substrate processing apparatus inevitably increases.

Contents of the invention

The present invention has been made in view of this situation, and an object of the present invention is to provide a substrate processing apparatus capable of reducing the floor space required for installation, transporting substrates in an inclined posture with a simple mechanism, and reducing equipment costs.

The substrate processing apparatus of the present invention includes: a first processing unit that processes the substrate while conveying the substrate in a predetermined direction; a second processing unit that is arranged substantially parallel to the first processing unit, and processing the substrate while transporting the substrate in the opposite direction to a preset direction; The substrate processing apparatus is characterized in that the substrate transfer direction in the first processing unit is switched to the substrate transfer direction in the second processing unit, wherein the transfer direction switching unit has a first transfer path from the first processing unit to the first processing unit. The substrate transfer end end of the part accepts the substrate, and has a gradient towards the substrate transfer direction of the first processing part; The substrate conveyance direction of the substrate has a gradient, and the gradient of the second conveyance path is a gradient inclined in a direction opposite to the gradient of the first conveyance path toward the substrate conveyance direction of the first processing part; the inclined conveyance part, It conveys the substrate to the second conveyance path while substantially maintaining the attitude of the substrate inclined based on the gradient of the first conveyance path; and a liquid supply unit supplies the main surface of the substrate conveyed by the inclined conveyance unit for processing. liquid.

In this structure, the substrate processed in the first processing section is changed in the conveying direction by the conveying direction changing section, and is passed through the inclined conveying section in a state where the inclined posture is substantially maintained due to the gradient of the first conveying path. In the state, it is transported to the second processing unit. The liquid supply unit supplies the processing liquid to the main surface of the substrate conveyed by the inclined conveyance unit, and the substrate is processed while being conveyed in a direction opposite to that of the first processing unit in the second processing unit.

In the substrate processing apparatus of the present invention, in the substrate processing apparatus described above, the gradient of the second conveying path toward the substrate conveying direction toward the second processing unit is the same as that of the first conveying path toward the first processing portion. The gradient of the conveying direction is inclined in the opposite direction to the gradient.

This structure is a structure in which, with respect to the substrate conveying direction, the second conveying path having a gradient inclined in the direction opposite to the gradient of the first conveying path will be substantially maintained while the inclination state generated by the substrate conveying section remains substantially unchanged. The inclined posture caused by the gradient of the first conveying path is transported from the inclined conveying part

The substrate is transported toward the substrate transport start end of the second processing section, and the substrate is transported from the first transport path and the substrate transport section to the second transport path without changing the inclined posture of the substrate.

In the substrate processing apparatus of the present invention, in addition to the above-mentioned substrate processing apparatus, a conveying direction changing device is provided on the first conveying path, and the conveying direction changing device is inconvenient to maintain the inclined posture of the substrate given by the gradient of the first conveying path. In the state where the substrate is transported, the substrate transport direction is switched to a direction perpendicular to the substrate transport direction of the first processing unit.

The inclined transfer unit tilts the substrate received from the transfer direction changing device in a direction that is the same as the substrate transfer direction of the first processing unit and perpendicular to the substrate transfer direction of the inclined transfer unit, and transfers the substrate.

In this configuration, while maintaining the tilted posture of the substrate given by the gradient of the first conveyance path, the conveyance direction of the substrate is switched by the conveyance direction switching device, and the position of the substrate in the first conveyance path is not changed in the inclined conveyance section. In the state of the inclined substrate, the substrate whose direction has been changed is conveyed, and the substrate is conveyed to the second conveyance path while maintaining the inclination attitude at this time.

In the substrate processing apparatus of the present invention, in addition to the above-mentioned substrate processing apparatus, a conveying direction changing device is further provided on the second conveying path, and the conveying direction changing device maintains the inclined posture of the substrate conveyed by the inclined conveying unit. In the changed state, the substrate conveying direction is switched to the substrate conveying direction of the above-mentioned second processing section.

According to this configuration, after the substrate is conveyed from the inclined conveyance section to the second conveyance path, the substrate conveyance direction is switched toward the second processing section while maintaining the tilted posture at that time, and the substrate is conveyed to the second processing section. .

In the substrate processing apparatus of the present invention, in addition to the above-mentioned substrate processing apparatus, a substrate transfer mechanism is provided in the first processing section or the second processing section, and the gradient of the first transport path or the second transport path is formed with the same gradient. The substrates are transferred between the substrate transfer robots that take out and put in the substrates from the substrate storage box, and place the substrates on the first processing section or the second processing section.

According to this configuration, even in the first processing section or the second processing section, the gradient makes the substrate in an inclined posture, and the treatment of the processing liquid on the substrate surface can be improved during substrate processing, thereby improving the processing efficiency. In addition, with the substrate transfer mechanism, the transfer of the substrate can be smoothly performed between the first processing unit or the second processing unit having a gradient and the substrate transfer robot arm.

According to the present invention, since the inclined transfer unit substantially maintains the inclined posture due to the gradient of the first processing unit, and transfers the substrate processed in the first processing unit to the second processing unit, it is possible to use a simple mechanism. The substrate is conveyed in an inclined posture, and the equipment cost of this part can be reduced correspondingly. In addition, since the liquid supply unit supplies the processing liquid to the substrate during the conveyance by the inclined conveyance unit, it is not necessary to reserve an extra installation area just for the liquid supply unit, so it is possible to reduce the installation necessary for the substrate processing apparatus. footprint.

According to the present invention, since the second conveying path keeps the state of inclination by the substrate conveying section almost unchanged, and conveys the substrate toward the substrate conveying start end of the second processing section, the tilted posture can be reached with a simple mechanism by a simple mechanism. The effect of reducing the cost of equipment can be obtained accordingly by transferring the substrate.

According to the present invention, the substrate tilted due to the gradient of the first conveying path can be transferred to the second conveying path by switching the conveying direction while maintaining the original posture without providing a complicated structure of the substrate attitude changing mechanism.

According to the present invention, even without installing a complicated structure of the substrate attitude raising mechanism, the gradient and inclined conveying section passing through the first conveying path can make the substrate in an inclined state, maintain the original posture, and convey the substrate up to this point. The direction is switched to the substrate transfer direction at the second processing section, and the substrate is transferred to the second processing section.

According to the present invention, even in the first processing part or the second processing part, the substrate is inclined due to its gradient, the processing of the processing liquid on the substrate surface can be improved during substrate processing, and the processing efficiency can be improved. , the transfer of the substrate can be smoothly performed between the first processing part or the second processing part having a gradient and the substrate transfer robot arm.

Description of drawings

FIG. 1 is a plan view schematically showing a substrate processing apparatus according to a first embodiment of the present invention.

2 is a schematic view showing the substrate processing apparatus shown in FIG. 1 seen from each side, FIG. 2A is a side view showing a transfer direction changing section starting from the first processing section, and FIG. 2B is a side view of the transfer direction changing section. As a side perspective view, FIG. 2C is a side view showing the second processing unit from the transfer direction changing unit.

Fig. 3 is an explanatory view showing an embodiment of the substrate erecting device, wherein Fig. 3A is a side view showing a substrate B placed in a horizontal posture on the substrate erecting device, and Fig. 3B is a rear view showing the same state as Fig. 3A 3C is a side view showing a state in which the substrate on the substrate erecting device has been transferred to the substrate transport path of the first processing unit, and FIG. 3D is a rear view similar to FIG. 3C .

4 is a perspective view showing a part of the substrate processing apparatus, and is a view showing a state in which a substrate is conveyed in a first processing unit.

5 is a perspective view showing a part of the substrate processing apparatus, and is a view showing a state in which a substrate carried into a first conveyance path is carried out to an inclined conveyance section.

6 is a perspective view showing a part of the substrate processing apparatus, and is a view showing a state in which a substrate carried into the second conveyance path is carried out to the second processing unit.

Fig. 7 is a plan view showing a first conveyance path in the vicinity of the substrate elevating device.

8A , 8B, and 8C are diagrams each showing the operation of the substrate elevating device at the time of substrate transfer, and are side views seen from the +X direction in FIG. 4 .

Fig. 9 is a schematic side view showing the operation of each part of the transfer direction switching unit when transferring substrates, viewed from the -Y direction in Fig. 4, and Fig. 9A is a side view showing a portion of the first transfer path near the substrate elevating device, FIG. 9B is a diagram showing the first conveying path, the inclined conveying portion, and the second conveying path from the substrate elevating device to the inclined conveying unit and the substrate elevating device, and FIG. 9C is a diagram showing a portion of the second conveying path near the substrate elevating device. side view.

10 is an explanatory view showing a substrate processing apparatus according to a second embodiment of the present invention seen from the side, and FIG. 10A is a diagram showing a schematic configuration of a first processing unit of the substrate processing apparatus according to the second embodiment of the present invention. 10B is a side view showing a schematic configuration of a second processing unit of a substrate processing apparatus according to a second embodiment of the present invention.

Detailed ways

FIG. 1 is a plan view schematically showing a substrate processing apparatus according to a first embodiment of the present invention. Fig. 2 is a view showing the outline of the substrate processing apparatus shown in Fig. 1 viewed from various sides, Fig. 2A is a side view showing a transfer direction changing section starting from the first processing section, and Fig. 2B is a side view of the transfer direction changing section As a perspective view, FIG. 2C is a side view showing the conveyance direction changing section from the second processing section.

The substrate processing apparatus 10 according to the present embodiment is an apparatus for performing a series of preset processes on a substrate B. As shown in FIG. The first processing unit 20 that implements a series of processes on the substrate B at the same time; the substrate B that has been processed by the first processing unit 20 is transported in the direction opposite to the transport direction of the first processing unit 20 while performing further processing The second processing unit 30 . These first processing unit 20 and second processing unit 30 are connected to each other by a transfer direction changing unit 40 that transfers the substrate B from the downstream side of the first processing unit 20 to the upstream side of the second processing unit 30 . Therefore, the substrate processing apparatus 10 is in a substantially U-shaped state in plan view.

On the other hand, at places corresponding to the upstream side of the first processing unit 20 and the downstream side of the second processing unit 30 of the substrate processing apparatus 10, a plurality of substrate storage boxes C for accommodating the substrates B and a plurality of substrate storage boxes C containing the substrate B are arranged. The indexer part 11 of the robot part R which puts in the board|substrate B is taken out. The substrates B to be processed are sequentially carried out from the substrate storage box C by the robot arm R and transported to the first processing unit 20 . The processed substrate B is returned from the second processing unit 30 to the substrate storage box C by the robot R.

As shown in FIGS. 1 and 2A , the first processing unit 20 includes a substrate erecting device 21 that receives the substrate B conveyed from the substrate storage box C in a horizontal posture by the robot arm R, and changes the posture of the substrate B to Inclined posture in accordance with the gradient of the substrate conveyance path (transportation path) 29 in the first processing unit 20; the ultraviolet irradiation unit 22 irradiates ultraviolet rays to the substrate B conveyed in the inclined posture in accordance with the above-mentioned gradient for decomposition treatment Stains made of organic matter adhering to the substrate B. In the present embodiment, the substrate conveyance path (transport path) 29 in the first processing unit 20 is formed such that the plurality of substrate conveyance rollers 12 face the substrate conveyance direction and form a downward slope with the tip pointing downward.

The substrate B carried out from the substrate storage box C in a horizontal posture by the robot arm R is placed on the pin 2111 of the substrate mounting part 211 of the substrate erecting device 21 in a horizontal posture. 212 descends, the substrate on the substrate loading unit 211 is transferred to the substrate conveying path 29 . As shown in FIG. 2A , the substrate conveyance path 29 has a downward slope toward the front end in the substrate conveyance direction. Thereby, when the board|substrate B transfers to the board|substrate conveyance path 29 which has a downward slope, it switches from a horizontal posture to an inclined posture.

In the ultraviolet irradiation unit 22, an ultraviolet lamp 221 is provided so as to sandwich the first processing unit 20 from above and below, and the substrate B conveyed is driven to rotate and drive the substrate conveying roller 12 by a drive motor (not shown in the figure). By irradiating the surface and the back surface with ultraviolet light from these ultraviolet lamps 221 , organic matter stains adhering to the substrate B are decomposed and easily removed in the subsequent washing process.

As shown in FIG. 2C , the substrate conveyance path 39 of the second processing unit 30 is configured such that a plurality of substrate conveyance rollers 12 are directed toward the downstream side (left side in FIG. 2 ) in an upward slope with respect to the substrate conveyance direction. The front ends are arranged side by side so as to rise. As shown in FIGS. 1 and 2C , this second processing unit 30 includes a drying unit 31 that dries the substrate B transported from the transport direction changing unit 40 in an inclined posture along the upward slope of the substrate transport path 39 . Processing: The substrate carry-out unit 32 is used to make the robot R receive the substrate B. The substrate carrying-out section 32 is provided with a substrate erecting device 21 for returning the inclined posture of the substrate B dried by the drying section 31 to a horizontal posture so that the substrate B can be received by the robot R.

The drying unit 31 performs a drying process on the substrate B that has been cleaned in the transport direction changing unit 40 . A pair of air knives 311 arranged to sandwich the substrate conveyance path 39 from above and below is provided in the drying section 31 . Each of the air knives 311 has elongated air injection holes extending in the width direction on the respective opposing surface sides, and clean compressed air from a compressed air source (not shown) is ejected from these air injection holes. Thus, when the wetted substrate B is conveyed by the substrate conveying roller 12 and passes between the air knives 311, the clean air for drying blown off from the air jet holes of the upper and lower air knives 311 adheres to the surface and is blown off. The washing solution of the back side, whereby the surface and the back side of the substrate B are dried.

In the substrate carry-out unit 32 , the substrate B dried in the drying unit 31 is changed from an inclined posture along the substrate conveyance path 39 to a horizontal posture by the substrate erecting device 21 . That is, the pin 2111 of the substrate mounting part 211 of the substrate erecting device 21 lifts the substrate B in the inclined posture on the substrate conveying rollers 12 upward from between the substrate conveying rollers 12 to a horizontal posture, It becomes the state that the robot part R can be connected.

The conveyance direction changing part 40 conveys the board|substrate B conveyed from the 1st processing part 20 to the 2nd processing part 30 without changing the direction and inclination (FIGS. 1 and 2B). That is, the substrate B is in an inclined state having the same angle as the downward slope of the substrate conveyance path 29 on the downstream side of the first processing part 20, but the conveyance direction changing part 40 maintains a position in which the front end of the substrate B in the substrate conveyance direction is downward relative to the substrate B. With the inclination posture unchanged, the substrate transfer direction is changed by 90 degrees, and the substrate is transported to the upstream side of the second processing unit 30, and then the substrate transfer direction is changed by 90 degrees, and the inclination posture at this time is kept unchanged, and the substrate is transferred to the second processing unit 30 b.

As shown in FIG. 1 and FIG. 2B , the conveyance direction changing section 40 includes: a first conveyance path 41 arranged to connect the substrate B to the downstream side of the first processing section 20; The lifting device 60; the inclined conveying part 49 that conveys the substrate B received from the substrate lifting device 60 in an inclined posture; the liquid supply part 42 that supplies the processing liquid to the substrate B conveyed by the inclined conveying part 49; the second processing part 30 The second conveyance path 43 arranged in parallel on the upstream side; the substrate elevating device 80 for transferring the substrate B processed in the liquid supply part 42 from the inclined conveyance part 49 to the second conveyance path 43 .

The substrate B carried into the liquid supply unit 42 is subjected to substrate surface treatment with the processing liquid supplied from the processing liquid supply device (liquid supply unit) 421 . That is, the predetermined processing is performed on the substrate B simultaneously with the operation of transferring the substrate B from the first processing unit 20 to the second processing unit 30 .

When the substrate B is conveyed from the inclined conveyance section 49 to the second conveyance path 43 , the substrate conveyance direction is further changed by 90 degrees by the substrate elevating device 80 . In addition, on the upstream side of the substrate elevating device 80 in the substrate conveying direction, a water washing shower 431 for finishing processing is provided. The substrate B carried into the substrate conveying path 39 is conveyed from the second conveying path 43 toward the second processing unit 30 after receiving the washing water sprayed from the rinsing shower 431 . The substrate loading portion of the substrate elevating device 80 and the second conveyance path 43 are inclined upward with respect to the front end of the substrate conveyance direction of the second conveyance path 43, and the substrate is kept in an inclined state held by the inclined conveyance section 49 (in the distance from the inclined conveyance section 49). The direction perpendicular to the substrate transfer direction (inclined from the horizontal state) does not change, and the substrate B is transferred in the direction opposite to the substrate transfer direction of the first processing unit 20 .

3 is an explanatory diagram showing an embodiment of the substrate erecting device 21, wherein FIG. 3A is a side view showing a substrate B placed in a horizontal posture on the substrate erecting device 21, and FIG. 3B is the same state as that of FIG. 3A. As a rear view, FIG. 3C is a side view showing a state in which the substrate B on the substrate erecting device 21 is transferred to the substrate transport path 29 of the first processing unit 20 , and FIG. 3D is the same rear view as FIG. 3C .

In the present embodiment, the substrate erecting device 21 is provided on the upstream side of the first processing unit 20 in the substrate transfer direction and on the downstream side of the second processing unit 30 in the substrate transfer direction. As shown in each figure in FIG. 3 , the substrate stand-up device 21 has a substrate mounting section 211 on which the substrate B is mounted, and an air cylinder 212 as an elevating mechanism for raising and lowering the substrate mounting section 211 . The substrate mounting portion 211 supports the lower surface of the substrate B with four pins 2111 that can protrude above the substrate conveying path 29 from the gap between the substrate conveying rollers 12 .

This substrate mounting portion 211 is raised and lowered by the air cylinder 212 to an upper position L1 where the upper end of the pin 2111 is located above the substrate transfer path 29 formed by the substrate transfer roller 12 and a lower position where the upper end of the pin 2111 is located below the substrate transfer path 29. Change positions between L2.

With the substrate erecting device 21 configured in this way, in the state where the substrate mounting part 211 is set at the upper position L1, as shown in FIG. The substrate B is placed on the upper end of the pin 2111 of the substrate mounting part 211 . In this state, if the substrate mounting part 211 is lowered by the air cylinder 212, the substrate B supported by the substrate mounting part 211 is transferred to the substrate transfer path 29 (substrate transfer path 29) in the first processing part 20 as shown in FIG. rollers 12), and thereafter, the substrate is conveyed in the first processing unit 20 by rotational driving of the substrate conveying rollers 12.

In addition, as shown in FIG. 3C , in the state where the substrate B is placed on the substrate conveying roller 12 of the second processing unit 30 , the substrate placing unit 211 of the substrate erecting device 21 is lifted, and the substrate B is lifted from the second processing unit 30 The substrate is transferred to the substrate mounting part 211, and the substrate B can be delivered to the robot part R in a state.

The substrate transfer by the substrate processing apparatus 10 will be described in detail. 4, 5, and 6 are perspective views showing a part of the substrate processing apparatus 10, showing a portion from the downstream side of the first processing unit 20 to the upstream side of the transfer direction changing unit 40 and the second processing unit 30. Specifically, the ultraviolet irradiation unit 22 (substrate conveyance path 29 ), the first conveyance path 41 , the substrate elevating device 60 , the inclined conveying portion 49 , the second conveying path 43 , and the substrate elevating device 80 in FIGS. 1 and 2 are shown. And the drying part 31 (substrate conveyance path 39) (illustration of the ultraviolet lamp 221 and the air knife 311 is omitted). In addition, FIG. 4 shows the state in which the substrate B is transported in the first processing unit 20, FIG. The substrate B is carried out to the second processing unit 30 . In addition, in FIGS. 4 to 6 , the X-X direction is the width direction, the Y-Y direction is the front-rear direction, particularly the -X direction is the left side, the +X direction is the right side, the -Y direction is the front side, and the +Y direction is the rear side.

The operation of transferring the substrate B from the downstream side of the first processing unit 20 in the substrate transfer direction to the portion between the transfer direction changing unit 40 and the upstream side of the second processing unit 30 in the substrate transfer direction will be described. The substrate B moved from the indexer unit 11 shown in FIGS. 1 and 2 to the first processing unit 20 is transported in the +Y direction of FIG. It is transported to the first transport path 41 . When the substrate B is conveyed to the first conveyance path 41, as shown in FIG. 5, the conveyance direction of the substrate B is changed by the substrate elevating device 60, and the conveyance of the substrate B starts in the +X direction in the figure. Then, as shown in FIG. 5 , the substrate B is delivered from the substrate elevating device 60 to the inclined conveying unit 49 , and the substrate B is conveyed by the inclined conveying unit 49 to the substrate elevating device 80 of the second conveying path 43 . If the substrate B is conveyed to the substrate elevating device 80, the substrate B is delivered from the substrate elevating device 80 to the separated substrate conveying roller 121 of the second conveying path 43, and the conveying direction of the substrate B is changed to the direction toward the second processing unit 30. direction. Thereafter, as shown in FIG. 6 , the substrate B is conveyed toward the substrate conveyance path 39 of the second processing unit 30 by the divided board conveyance rollers 121 . The substrate B is conveyed to the downstream side of the second processing unit 30 through the drying unit 31 and taken to the indexer unit 11 .

Next, the structure of the portion from the downstream side of the first processing unit 20 in the substrate transfer direction to the transfer direction changing unit 40 and the upstream side of the second processing unit 30 in the substrate transfer direction will be described in detail with reference to FIGS. 4 to 6 . The transfer direction changing part 40 is provided with: the first transfer path 41 and the substrate elevating device 60 provided on the downstream side of the substrate transfer path 29 of the first processing part 20; The inclined transport unit 49 transports the substrate B in a direction perpendicular to the transport direction of the substrate; the second transport path 43 and the substrate elevating device 80 provided upstream of the second processing unit 30 .

In the substrate processing apparatus 10, there are provided: the first frame 13 inclined downward relative to the front end of the substrate transfer direction along the substrate transfer path 29 of the first processing unit 20 and the first transfer path 41; starting from the second transfer path 43 The second frame 14 is provided along the substrate conveying path 39 of the second processing part 30 and is inclined upward toward the front end of the substrate conveying direction; the rear frame 15 and the front frame 16 are erected between the first processing part 20 and the second processing part 30 .

A plurality of substrate transport rollers 12 are arranged in parallel at equal intervals between the upper edge portions of the pair of first frames 13 in the first processing unit 20 , whereby the front end of the first processing unit 20 is formed downward toward the substrate transport direction. The substrate conveyance path 29 and the first conveyance path 41 provided with the substrate elevating device 60 are provided. In addition, a plurality of identical substrate transport rollers 12 are arranged side by side at equal intervals between the upper edge portions of the pair of second frames 14 in the second processing unit 30 , thereby forming a front end upward toward the substrate transport direction. The second conveyance path 43 of the elevating device 80 and the substrate conveyance path 39 of the second processing unit 30 .

The substrate transport path 29 of the first processing unit 20 is provided up to the first transport path 41 . In the first conveyance path 41 , the substrate conveyance rollers 12 and a pair of separated substrate conveyance rollers 121 separated left and right are arranged in parallel at equal intervals in the front-rear direction. Similarly, the substrate conveyance path 39 of the second processing unit 30 is provided starting from the second conveyance path 43, and on the second conveyance path 43, the substrate conveyance rollers 12 and a pair of substrate conveyance rollers 12 separated from the left and right are arranged side by side at equal intervals in the front-rear direction. The substrate conveying rollers 121 are separated. These separated substrate conveying rollers 121 are driven to rotate around their axes by a drive mechanism (not shown) including a predetermined drive motor.

In addition to the aforementioned FIGS. 4 to 6 , configurations of the substrate elevating devices 60 and 80 of the first transport path 41 and the second transport path 43 will be described with reference to FIGS. 7 to 9 . 7 is a plan view showing the first conveyance path 41 near the substrate elevating device 60, and Fig. 8A, Fig. 8B, and Fig. 8C are diagrams showing the operation of the substrate elevating device 60 during substrate delivery, viewed from the +X direction of Fig. 4 side view. 9 is a schematic side view showing the operation of each part of the transfer direction switching unit 40 when transferring substrates, viewed from the -Y direction in FIG. 4, and FIG. 9B is a diagram showing the first conveying path 41, the inclined conveying portion 49, and the second conveying path 43 from the substrate elevating device 60 to the inclined conveying unit 49 and the substrate elevating device 80, and FIG. 9C shows the substrate elevating device A side view of the second transport path 43 near 80.

As shown in FIG. 7 , the substrate elevating device 60 is installed between the divided substrate conveying rollers 121 of the first conveying path 41 so as to be able to move up and down. This substrate elevating device 60 is provided with a rectangular roller support frame 61 in the front-rear direction in a plan view and a plurality of direction switching devices erected at equal intervals between a pair of side walls in the front-rear direction of the roller support frame 61 . Roller 62.

As shown in FIG. 8A, the substrate loading surface of the substrate elevating device 60 is set at the same inclination angle as that of the substrate conveying path 29 and the first conveying path 41, and when the substrate B is conveyed from the first processing unit 20, the direction changing roller 62 is located It descends to the lower position below the divided substrate conveying rollers 121 . Accordingly, the substrate B is conveyed above the substrate elevating device 60 without interfering with the direction changing rollers 62 due to the drive of the separate substrate conveying rollers 121 ( FIGS. 8B and 9A ).

As shown in FIGS. 4 to 6 , the substrate conveying roller 12 of the inclined conveying section 49 has a downward slope formed on the front end of the first processing section 20 and the first conveying path 41 and a downward slope formed on the second processing section 30 . The same inclination as the upward inclination of the front end of the second transport path 43 is provided between the rear frame 15 and the front frame 16 . In addition, as shown in FIG. 9B , the substrate conveying rollers 12 of the inclined conveying section 49 are disposed at a position opposite to the substrate conveying rollers 12 and the separated substrate conveying rollers 121 on which the first conveying path 41 and the second conveying path 43 are disposed. At the higher position, the conveyance path of the substrate B in the inclined conveyance section 49 is set higher than the substrate conveyance path of the first conveyance path 41 .

The substrate elevating device 80 included in the second processing unit 30 has the same configuration as the substrate elevating device 60 and includes a roller supporting frame 81 and direction changing rollers 82 , although not particularly shown. Then, as shown in FIG. 9B , the substrate elevating device 80 waits at the same height position as the substrate conveying position of the substrate conveying roller 12 of the inclined conveying unit 49 , and receives the substrate B from the substrate conveying roller 12 . Thereafter, if the substrate elevating device 80 is loaded with the substrate B, then as shown in FIG. The substrate conveyance roller 121 and the substrate conveyance roller 12 . Thereafter, the substrate B is transported toward the substrate transport path 39 of the second processing unit 30 by separately driving the substrate transport rollers 121 and the substrate transport rollers 12 .

The substrate elevating device 60 and the substrate elevating device 80 lift and lower the support shaft 63 or 83 attached to the lower portion of the roller support frame 61 or 81 by an unillustrated air cylinder, thereby performing the above-mentioned elevating operation of the loading unit.

Next, the switching operation of the conveyance direction of the substrate B by the substrate elevating devices 60 and 80 will be described in more detail with reference to FIGS. 8 and 9 . The substrate B is transported in the +Y direction of FIG. 4 , and is carried into the first transport path 41 ( FIG. 8A ) through the first processing unit 20 until it is transported to the upper position of the substrate elevating device 60 ( FIGS. 8B and 9A ). The rollers 12 and the separated substrate conveying rollers 121 stop.

Then, the substrate elevating device 60 is raised to a height position higher than the substrate conveyance position of the substrate conveyance roller 12 of the first conveyance path 41 and substantially the same height as the substrate conveyance position of the substrate conveyance roller 12 of the inclined conveyance part 49. (FIG. 8C, FIG. 9B). As a result, the substrate B is transferred from the substrate conveyance roller 12 to the substrate elevating device 60 in the first conveyance path 41.

In this state, when the direction changing roller 62 of the substrate elevating device 60 rotates, the conveyance direction of the substrate B is changed by 90° relative to the substrate conveyance direction (+Y direction in FIG. X direction. Thereby, as shown in FIG. 5 , the substrate B is moved from the substrate elevating device 60 onto the substrate conveyance rollers 12 of the inclined conveyance section 49 . 9B , the inclined conveying unit 49 and the substrate B indicated by the two-dot chain line are shown, and the substrate B is transferred onto the substrate conveying roller 12 of the inclined conveying unit 49 . As described above, since the substrate conveying path formed by the substrate placing surface of the substrate elevating device 60 and the substrate conveying rollers 12 of the inclined conveying unit 49 has the same inclination as that of the substrate conveying path of the first conveying path 41, from the substrate B The transfer of the substrate elevating device 60 to the substrate conveying roller 12 of the inclined conveying section 49 is carried out while maintaining the state where the inclined posture at this time remains unchanged. In addition, the processing liquid is supplied to the substrate B from the liquid supply unit 42 ( FIGS. 1 and 2 ) during the conveyance by the inclined conveyance unit 49 .

During the conveyance of the substrate B by the substrate conveyance rollers 12 of the inclined conveyance part 49, the substrate elevating device 80 rises to the upper position L1 ( FIG. 9B ), the rotation driving direction switching roller 82 . When the substrate B is transported to the substrate elevating device 80 and reaches the approximate center position of the substrate elevating device 80, the direction switching roller 82 stops. When the substrate B is placed on the substrate elevating device 80 in this manner, as shown in FIG. up to position L2. As a result, the substrate B is transferred from the substrate elevating device 80 to the substrate conveyance roller 12 and the separated substrate conveyance roller 121 of the second conveyance path 43 .

Thereafter, if the substrate conveyance roller 12 and the separation substrate conveyance roller 121 of the second conveyance path 43 are rotationally driven, the conveyance direction of the substrate B is changed by 90° from the conveyance direction (+X direction in FIG. to the -Y direction of Figure 4. Then, as shown in FIG. 6 , the substrate B is conveyed from the second conveyance path 43 toward the second processing unit 30 . In addition, during this process, the substrate B is sprayed with washing water from the washing shower 431 to perform a water washing process for finishing.

In this way, according to the substrate processing apparatus 10 according to the embodiment of the present invention, the substrate B transferred from the first processing unit 20 to the second processing unit 30 via the transfer direction changing unit 40 can be processed even without using a conventional direction changing device with a complicated structure. Alternatively, the processing of each part may be performed while maintaining the initial inclination posture given to the first processing unit 20 at all times.

Next, a substrate processing apparatus according to a second embodiment of the present invention will be described. 10 is an explanatory view showing a substrate processing apparatus 10' according to a second embodiment of the present invention seen from the side, and FIG. 10A shows a first processing unit of the substrate processing apparatus 10' according to the second embodiment of the present invention. 10B is a side view showing a schematic configuration of a second processing unit 30 ′ of a substrate processing apparatus 10 ′ according to the second embodiment. In the substrate processing apparatus 10' according to the second embodiment, in the first processing section 20' and the second processing section 30', the substrate conveyance path 29 or 39 is formed horizontally at least to receive the substrate B from the substrate raising device 21. part. Therefore, the substrate B carried out from the substrate storage box C by the robot R is placed in a horizontal posture on the substrate transfer path 29 of the first processing unit 20' or the substrate transfer path 39 of the second processing unit 30'.

In addition, as shown in FIG. 10A , at the downstream side of the substrate conveying path 29 in the substrate conveying direction, for example, in the ultraviolet irradiation section 22, the substrate conveying surface formed by the rollers of a plurality of substrate conveying rollers 12 arranged in parallel, The front end is downward with respect to the substrate conveyance direction, and is smoothly connected to the inclination of the first conveyance path 41 . For example, the board|substrate conveyance path 29 of these parts is formed in the arc shape which protrudes upward.

In addition, in the substrate processing apparatus 10', as shown in FIG. 10B, the substrate conveying path 39 of the second processing unit 30' faces the downstream side of the substrate conveying direction with the substrate conveying surface formed by the substrate conveying rollers 12 (substrate accommodating Box C side) set in such a way that the front end faces upward. For example, in the vicinity of the drying section 31 ′, the substrate conveying path 39 of this part is set in an arc shape protruding upward, and the substrate B is carried out by the substrate erecting device 21 on the downstream side of the substrate conveying direction of the second processing section 30 ′. In the transfer part, the board transfer surface is set to be horizontal.

In addition, the present invention is not limited to the contents limited by the above-mentioned embodiments, but also includes the following contents.

(1) In each of the above-mentioned embodiments, the substrate transfer path 29 of the first processing unit 20 is formed with a downward slope toward the transfer direction changing portion 40 , and the substrate transfer path 39 of the second processing portion 30 is formed upward toward the indexer unit 11 . The inclination of the slope, but the present invention is not limited to such gradients of the first treatment part 20 and the second treatment part 30 . For example, the substrate transport path 29 of the first processing unit 20 may be on an upward slope, and the substrate transport path 39 of the second processing unit 30 may be on a downward slope. At this time, the transfer direction changing part 40 keeps the posture of the substrate B which is in an inclined posture through the upward slope of the first processing part 20, and transfers the substrate B to the second processing part 30 while maintaining the posture of the substrate B. , connected to the downhill substrate transfer of the second processing unit 30 .

(2) In the above-mentioned first embodiment, the gradient is applied from the upstream side to the downstream side of the substrate transfer direction of the first processing part 20 and the second processing part 30, and in the second embodiment, the first processing part 20' The substrate conveying surface on the upstream side of the substrate conveying direction is horizontal, and as it enters the downstream side of the substrate conveying direction, a downward gradient is formed. The substrate transfer surface on the downstream side is horizontal, but the substrate processing apparatus may be constituted by a combination of the first processing unit 20 and the second processing unit 30 ′ or a combination of the first processing unit 20 ′ and the second processing unit 30 .

(3) In addition, in the substrate processing apparatus according to the present invention, either one or both of the first processing unit 20 and the second processing unit 30 may be configured as a horizontal conveyance path extending in the horizontal direction. At this time, when the substrate B is transported from the first processing unit 20 to the first transport path 41, its posture is changed from a horizontal posture to an inclined posture, or when it is transported from the second transport path 43 to the second processing unit 30, its posture is changed. Change from a tilted attitude to a horizontal attitude.

(4) In addition, in each of the above-mentioned embodiments, the first processing unit 20 includes the ultraviolet irradiation unit 22, and the second processing unit 30 includes the drying unit 31 and the substrate carrying-out unit 32, but these are merely examples, and the first processing unit 20 And the processing unit included in the second processing unit 30 can be appropriately changed, and is not limited to the above content.

Claims (4)

1. substrate board treatment has:

First handling part, it is handling this substrate in predefined direction conveyance substrate;

Second handling part, the configuration of itself and the above-mentioned first handling part almost parallel ground, to above-mentioned predefined direction rightabout conveyance substrate in handle this substrate;

The conveyance changes direction end, it finishes between the substrate transferring starting end of end and above-mentioned second handling part in the conveyance substrate at substrate transferring of above-mentioned first handling part, the substrate transferring direction of above-mentioned first handling part is converted to the substrate transferring direction of above-mentioned second handling part

It is characterized in that above-mentioned conveyance changes direction end has:

First carrying channel, its substrate transferring from above-mentioned first handling part finishes termination and is subjected to substrate, and has gradient towards the substrate transferring direction of above-mentioned first handling part;

Second carrying channel, it is towards the substrate transferring starting end conveyance substrate of above-mentioned second handling part, and has gradient towards the substrate transferring direction of above-mentioned second handling part, and the gradient that above-mentioned second carrying channel has is the gradient that tilts to the opposite direction of the gradient towards the substrate transferring direction of above-mentioned first handling part that has with above-mentioned first carrying channel;

The inclination conveying unit, under the state of its attitude of the substrate that tilts roughly keeping the above-mentioned gradient that has based on above-mentioned first carrying channel to the second carrying channel conveyance substrate;

Fluid supply unit, it is to supplying with treatment fluid by the interarea of the substrate of above-mentioned inclination conveying unit conveyance.

2. substrate board treatment as claimed in claim 1 is characterized in that,

Be provided with the conveyance direction-changing device at above-mentioned first carrying channel, this conveyance direction-changing device is being kept under the constant state of the substrate lateral attitude of being given by the gradient of this first carrying channel, the substrate transferring direction is transformed into the direction vertical with the substrate transferring direction of above-mentioned first handling part

Above-mentioned inclination conveying unit makes the substrate that receives from above-mentioned conveyance direction-changing device, tilts to the direction identical and vertical with the substrate transferring direction of this inclination conveying unit with the substrate transferring direction of above-mentioned first handling part, and this substrate of conveyance.

3. substrate board treatment as claimed in claim 2, it is characterized in that, also be provided with the conveyance direction-changing device at above-mentioned second carrying channel, this conveyance direction-changing device is being kept under the state constant by the lateral attitude of the substrate of above-mentioned inclination conveying unit conveyance, the substrate transferring direction is transformed into the substrate transferring direction of above-mentioned second handling part.

4. as any described substrate board treatment in the claim 1 to 3, it is characterized in that, be provided with substrate delivery/reception mechanism at above-mentioned first handling part or second handling part, this substrate delivery/reception mechanism is formed with the identical gradient of gradient with above-mentioned first carrying channel or second carrying channel, join substrate between the substrate transfer robot put into substrate taking out from the substrate storage case, with substrate-placing at above-mentioned first handling part or second handling part.

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