TWI244705B - Light-emitting diode chip package body and packaging method thereof - Google Patents
Light-emitting diode chip package body and packaging method thereof Download PDFInfo
- Publication number
- TWI244705B TWI244705B TW93101125A TW93101125A TWI244705B TW I244705 B TWI244705 B TW I244705B TW 93101125 A TW93101125 A TW 93101125A TW 93101125 A TW93101125 A TW 93101125A TW I244705 B TWI244705 B TW I244705B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- layer
- pad
- metal layer
- conductive
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 72
- 238000004806 packaging method and process Methods 0.000 title claims description 42
- 238000000576 coating method Methods 0.000 claims abstract description 42
- 239000011248 coating agent Substances 0.000 claims abstract description 38
- 239000010410 layer Substances 0.000 claims description 367
- 235000012431 wafers Nutrition 0.000 claims description 243
- 229910052751 metal Inorganic materials 0.000 claims description 179
- 239000002184 metal Substances 0.000 claims description 179
- 239000000758 substrate Substances 0.000 claims description 71
- 229910000679 solder Inorganic materials 0.000 claims description 50
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 41
- 239000010931 gold Substances 0.000 claims description 40
- 229910052737 gold Inorganic materials 0.000 claims description 40
- 239000000463 material Substances 0.000 claims description 38
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 32
- 238000009413 insulation Methods 0.000 claims description 30
- 239000004020 conductor Substances 0.000 claims description 29
- 239000011810 insulating material Substances 0.000 claims description 22
- 229910052759 nickel Inorganic materials 0.000 claims description 16
- 238000005538 encapsulation Methods 0.000 claims description 13
- 238000003466 welding Methods 0.000 claims description 13
- 239000013078 crystal Substances 0.000 claims description 11
- 239000011241 protective layer Substances 0.000 claims description 10
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 239000011247 coating layer Substances 0.000 claims description 6
- 238000005476 soldering Methods 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 230000000149 penetrating effect Effects 0.000 claims description 5
- 210000004508 polar body Anatomy 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 3
- 238000002347 injection Methods 0.000 claims description 2
- 239000007924 injection Substances 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- 239000012811 non-conductive material Substances 0.000 claims 15
- 230000005611 electricity Effects 0.000 claims 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 2
- 239000000843 powder Substances 0.000 claims 2
- 229910052702 rhenium Inorganic materials 0.000 claims 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims 2
- 241000270666 Testudines Species 0.000 claims 1
- 229940037003 alum Drugs 0.000 claims 1
- 230000009194 climbing Effects 0.000 claims 1
- 230000007812 deficiency Effects 0.000 claims 1
- 210000004709 eyebrow Anatomy 0.000 claims 1
- 238000010899 nucleation Methods 0.000 claims 1
- 238000010422 painting Methods 0.000 claims 1
- 230000035515 penetration Effects 0.000 claims 1
- 210000003625 skull Anatomy 0.000 claims 1
- 210000002784 stomach Anatomy 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- 238000010586 diagram Methods 0.000 description 6
- 238000009434 installation Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 5
- 239000007769 metal material Substances 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 241000931705 Cicada Species 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- YOBAEOGBNPPUQV-UHFFFAOYSA-N iron;trihydrate Chemical compound O.O.O.[Fe].[Fe] YOBAEOGBNPPUQV-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical group [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12041—LED
Landscapes
- Led Device Packages (AREA)
Abstract
Description
五、發明說明(1) 【發明所屬之技術領域】 本發明·係有關於一種發光二極體 y於-種發光二極體晶片封裝體及 ::地,係 【先前技術】 了衣方法。 LED晶片。、猶曰曰曰片的焊塾係;:打線上的 線來與在該封裝基it及/或導線架上的接=二屬導 而,如此的結構在封裝時程上 電矾連接。然 於折斷以致於習知LED晶片封妒_二^,金屬導線係易 提升。w 曰曰片封衣體的產量與良率無法有效 此外,隨著晶片製程的進步,led 越小,以致於晶片上之焊墊的面 的尺寸係越來 此小之面積的焊墊執行打線處理Γ困難:此,要對具 【發明内容】 又印難的。 有釔^此本案發明人遂以其從事該行業少 驗,並本著精益求精之揞抽, 乂之夕年經 『發光二極體晶片封裝體及其二違遂有本發明 本發明之目的是為提供 體及其“裝方法。所述之問題的發光二極體晶片封裝 接n t:之一特徵’-種發光二極體晶片封事體r 被拯供,该發光二極體晶片封:一 2封凌體係 片,該發光二極體晶片1# I " 3 如先一極體晶 ^ 片具有—烊墊安裝表面、數個安裝於 1244705 五、發明說明(2) 4焊墊安裝表面 後表面;一光線 光二極體晶片的 發光二極體晶片 層,該表面絕緣 並且具有一用於 份的中 絕緣層 係設置 根 係被提 片,該 該焊墊 後表面 光二極 係形成 於該發 露該發 孔及數 件,該 上的焊墊、 反射塗層, 焊墊安裝表 之對應之焊 層係形成於 曝露該發光 一透光元件 央穿孔; 的中央穿 於該發光 據本發明之另一特徵 供,該發 發—"極 安裝表面 及一與該 該光線反 面上並且 墊的焊墊 該發光二 二極體晶 ,該透光 孔内;及數個導電凸 二極體晶片之一對應 種發 焊墊安 射塗層 具有數 曝露孔 極體晶 片之後 元件係 塊,每 的焊塾 光二極 裝表面 係設置 個用於 表 ;一光線 體晶片的 於碑光線 光二極體 光二極體 個用於曝 透光元件 導電凸塊,i每— 一對應的焊墊上 根據本發明 係被提供,該發 光二極體封 體晶片具有 上的焊墊、 反射塗層, 後表面上; 反射塗層上 晶片的焊塾 晶片之焊塾 露對應之焊 係設置於該 個導電凸塊 〇 之再一特徵 光二極體晶 裝體包含:一 一焊墊安 及一與該 該光線反 一絕緣保 ;一絕緣 女*裝表面 安裝表面 墊的焊墊 絕緣層的 係設置於 裝表面 焊墊安 線塗層 護層, 層,該 上並且之中^央 曝露孔 中央穿 該發光 片的後 表面之 設置於 一個導 上。 體晶片 光二極 、數個 裝表面 係設置 該絕緣 絕緣層 具有一 部份的 » 一透 孔内; 二極體 相對的 於該發 曝露該 面絕緣 表面上 中央部 該表面 電凸塊 封裝體 體晶 安裝於 相對的 於該發 保護層 係形成 用於曝 中央穿 光元 及數個 晶片之 :一種發光二極體晶片封 片封褒體包含:一絕緣基板V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a light-emitting diode y and a light-emitting diode chip package and :: ground, [previous technology] a method of coating. LED chip. The soldering system of the chip is as follows: the wire on the wire is connected with the connection on the packaging substrate it and / or the lead frame = two-general conductor. Such a structure is electrically connected on the packaging time history. However, it is broken so that it is known that the LED chip is jealous, and the metal wire system is easy to be lifted. w It is said that the yield and yield of the film coating body cannot be effective. In addition, with the progress of the wafer process, the smaller the led, the more the size of the surface of the pad on the wafer becomes smaller. Difficulties in dealing with Γ: Therefore, it is difficult to print with the invention. There is yttrium ^ The inventor of this case then used this industry to conduct a few inspections, and in the spirit of excellence, he has passed the "light-emitting diode chip package and its two violations. The purpose of the present invention is to In order to provide a body and its mounting method. The problem described above is a feature of a light-emitting diode chip package nt: a kind of light-emitting diode chip package r is provided, and the light-emitting diode chip package: A 2 sealed system chip, the light-emitting diode wafer 1 # I " 3 As the previous one, the wafer has a 烊 pad mounting surface, several mounted on 1244705, 5. Description of the invention (2) 4 solder pad mounting Surface rear surface; a light-emitting diode wafer layer of a light-emitting diode wafer, the surface is insulated and has a middle insulating layer for setting a root lifter, and the rear surface photodiode of the pad is formed on The hair holes and several pieces are exposed, and the corresponding solder layers on the pads, reflective coatings, and pad installation tables are formed in the central perforation that exposes the light-emitting light-transmitting element; the center of the light penetrates through the light-emitting book. Another feature of the invention is, the hair- ot; a pole mounting surface and a pad on the opposite side of the light and a pad of the light-emitting diode, in the light-transmitting hole; and one of several conductive convex diode wafers corresponding to a type of hair-pad The coating has element system blocks after a number of exposed hole polar body wafers, and each of the welding light diode surface is provided with a surface for the table; one light body wafer is inscribed on the monument light light diode and the light diode is used for exposing the light transmitting element. The conductive bumps are provided on the corresponding solder pads according to the present invention. The light-emitting diode package wafer has an upper pad, a reflective coating, and a rear surface; a solder wafer on the wafer with the reflective coating. The corresponding soldering system of the solder bump is provided on the conductive bump. Another characteristic light diode crystal body includes: a solder pad and an insulation protection against the light; an insulating female surface. The mounting pad insulation layer of the mounting surface pad is provided on the mounting pad of the mounting pad, and the coating layer is provided on a guide. The central and central exposure holes are arranged on a guide through the rear surface of the light-emitting sheet. Wafer light The two poles and several mounting surfaces are provided with a part of the insulating insulating layer »in a through hole; the diode is opposite to the hair and the central part of the surface on the surface of the insulating surface is exposed. On the opposite side, the protective layer is formed for exposing the central light-transmitting element and several wafers: a light-emitting diode wafer encapsulation sealing body includes: an insulating substrate
1244705 五、發明說明(3) 該絕緣基板具有 安裝區域具有_ 晶片安裝 表面 、一 至少一個 晶片安裝 數個貫通該晶片安裝表面 片安裝表面經由對應之貫 一基板絕緣層,該基板絕 板的該至少一個晶片安裝區域的晶 個晶片安 的背面、 個從該晶 電軌跡; 成有一用%曝露該至少 孔;至少 片係設置 有一焊塾 墊 及一 層,該光 的焊墊安 二極體晶 每個導電 應的焊墊 之晶片安 層,該導 在絕緣基 之間的空 晶片之後 根據 體係被提 板,該絕 一個發 於該絕 安裝表 與該焊 破反射 裝表面 片之對 凸體係 且係 裝表面 熱層係 板、該 間來被 着面上 本發明 供,該 緣基板 晶片, 該至少 光二極體 緣基板的 面、數個 墊安裝表 塗層係設 上並且具 應之焊墊 設置於該 與該絕緣基板之該 上之對應的導電轨 導熱材料 發光二極 該 區域,該至少 與έ亥晶片安裝 與5亥为面的貫 孔來延伸到該 緣層係形成於 片安裝表面上 裝區域之中央 至少一個發光 個晶片安裂區 焊墊安裝表面 安裝於該 面相對的後表面;_ 置於該至 有數個用 少一個發光 表面相對 月面的導 該絕緣基 而且係形 區域的開 二極體晶 域並且具 上的焊 線反射塗 極體晶片 措由把'一 至少一個 於曝露該至少一個發光 的焊墊曝露孔;數個導電凸體, 至少一個發光二極體晶片之一對 至少一個晶片安裝區域 ;一導熱 注入形成 體晶片與該等導電凸體 光二極體 跡電氣地連接 經由該I等貫孔 形成,及一形成於該至少一個發 的透光元件。 之又再一特徵,一 發光二極體晶片封 具有至少一個晶片 種發光二極體晶片封裝 裝體包含:一絕緣基 安裝區域,該至少一個1244705 V. Description of the invention (3) The insulating substrate has a mounting area with a _ wafer mounting surface, a plurality of at least one wafer is mounted through the wafer mounting surface, and a wafer mounting surface passes through a corresponding insulating layer of the substrate. A wafer mounting area has a back surface of the wafer, and a track from the crystal; a portion is exposed to at least the hole; at least the wafer is provided with a solder pad and a layer, and the light solder pad is provided with a diode crystal. A conductive layer of a conductive pad is mounted on the wafer, the guide is lifted according to the system after the empty wafer between the insulating bases, the absolute one is issued in the convex system of the insulation installation table and the welding reflection surface sheet, and The surface thermal layer system board is mounted on the surface, the edge substrate wafer, the surface of the at least photodiode edge substrate, a plurality of pad mounting surface coatings are provided and corresponding solder pads are provided. The area of the light-emitting diode of the conductive rail and the heat-conducting material corresponding to the upper part of the insulating substrate is installed at least on the surface of the chip and the surface of the substrate. The hole extends to the edge layer is formed at the center of the mounting area of the chip mounting surface. At least one light emitting wafer is installed in the cracked area. The mounting surface of the pad is installed on the opposite rear surface of the surface. The surface is opposite to the meniscus, and the insulating base and the open area of the diode region of the configuration area are provided with a reflective wire-coated polarized wafer. The at least one exposure pad exposes at least one of the pads; A plurality of conductive protrusions, at least one of the light emitting diode wafers to at least one wafer mounting area; a thermally conductive implant forming body wafer and the conductive convex light diode traces are electrically connected via the I and other through holes, and A light transmitting element formed on the at least one hair. Yet another feature is that a light emitting diode chip package has at least one wafer. The light emitting diode chip package includes: an insulating base mounting area, the at least one
第7頁 1244705 五、發明說明(4) 晶片安裝區 相對的背面 及數個從該 的導電軌跡 緣基板的該 係形成有一用於曝 的開孔;至少一個 體晶片係設置於該 且具有一焊墊安裝 11與該蟬 藉由把 焊墊、及 該導熱層係 域具有一晶片安裝 、數個 晶片安 ;一基 至少一 緣基板、該至少一 的空間來 對應之導 層在靠近 之厚度小 面;一形 成於該金 個導電凸 的焊墊上 晶片安裝 根據 係被k供 被形成; 氧凸體之 晶片之部 的厚度以 成於該絕 屬反射層 if係設置 且係與該 表面上之 本發明之 \該發光 片,該 貫通該晶片 裝表面經由 板絕緣層, 個晶片安裝 露該至少/ 發光二極體 絕緣基板的 表面、數個 墊安裝表面 一導熱材料 個發光二極 —形成於在 間之空間内 h具有一個 致於每個絕 緣材料層之 上的透明保 於該至少一 、絕緣基板之 對應的導電 另一特徵, 二極體晶片 體晶片具有 表面 安裝 對應 該基 區域 個晶 晶片 該至 安裝 相對 經由 體晶 界定 的絕 比在 緣才才 表面 護層 個發 該至 軌跡 -種 封裝 -焊 、一與該晶片 表面與該背面 之貝孔來延伸 板絕緣層係形 的晶片安裝表 片安裝區域之 ,該至少一個 少一個晶片安 於該焊墊安裝 的後表面;一 該等貫孔注入 片與該等導電 每一個開孔之 緣材料層,該 靠近基板絕緣 料層具有一凹 安裝表 的貫孔 到該背 成於該 面上而 中央區 發光二 裝區域 表面上 導熱層 形成在 凸體之 内壁面 絕緣材 層之部 陷的上 層;一 上的金屬反射 ;及數^固導電凸體, 光二極體晶片之一對 少一個晶片安裝區域 電氣地連接。 發光二極體晶 體包含:一發 塾安裝表面、 片封裝 光二極 數個安 面 面 絕 且 域 極 並 的 5 絕 間 與 料 份 表 形 每 應 之 體 體 裝 曰aPage 71244705 V. Description of the invention (4) The opposite side of the wafer mounting area and the conductive track edge substrate are formed with an opening for exposure; at least one body wafer is disposed thereon and has a The pad mounting 11 and the cicada have a wafer mounting, a number of wafers mounted on the pad, and the thermally conductive layer system; a base having at least one edge substrate, and the at least one space corresponding to the thickness of the conductive layer. A small surface; a wafer formed on the gold conductive bumps is mounted on the wafer according to the system k; the thickness of the wafer portion of the oxygen convex body is set on the absolute reflection layer if and is on the surface According to the present invention, the light-emitting sheet penetrates the surface of the wafer through a plate insulation layer, the surface of each wafer is mounted on the surface of the at least / light-emitting diode insulating substrate, a plurality of pad mounting surfaces, a heat-conductive material, and a light-emitting diode are formed In the interspace h, there is another feature that is transparent on top of each insulating material layer to ensure the corresponding conductivity of the at least one insulating substrate, and the diode chip body. The chip has a surface mount corresponding to a base wafer of the base area, and the relative installation is defined by the bulk crystal. The surface protection layer sends the track to the package-soldering, welding to the surface of the wafer and the back of the wafer. Holes to extend the board mounting surface of the board insulation layer system, the at least one less wafer is mounted on the rear surface of the pad mounting; an edge of each through-hole injection sheet and each of the conductive openings A material layer, the insulating material layer near the substrate has a through hole of a concave mounting table to the back formed on the surface and the central area of the light emitting area is formed on the surface of the heat conductive layer formed on the inner wall of the convex body An upper layer; a metal reflection on one; and a plurality of solid conductive bumps, one of the photodiode wafers is electrically connected to at least one wafer mounting area. The light-emitting diode crystal includes: a mounting surface, a chip package, a plurality of mounting surfaces, a plurality of surface areas, and a total of 5 domains and materials. The appearance of each body is as follows:
$ 8頁 Α、發明說明(5) ------ 的ί 5女ί表面上的焊墊、及一與該焊墊安裝表面相對 發i:極雕:ί線t射ϊ層,該光線反線塗層係設置於該 發光一極:曰:的*干墊女裝表面上並且具有-用於曝露該 :先一極脰日-日片之對應之焊墊的焊墊曝露孔丨一透光元 ’該透光7L件係設置於該發光二極體晶片的後表面上; 晶,t ί 每一個導電凸塊係設置於該發光二極體 曰曰片之一對應的焊墊上。 紐 的封Γίί::;;::::種發光二極體晶片繼 -發光二極:ίΐ 封裝方法包含如下之步驟:提供 面、數個安^ =片,该發光二極體晶片具有一焊墊安裝表 安裝ίΐΓί 焊墊安裝表面上的焊塾、及一與該焊墊 極5晶片的γ 2 ί t面;設置一光線反射塗層於該發光二 於曝露該發‘ 一:^ f:上’該光線反射塗層具有數個用 成-表面絕對應之焊墊的焊墊曝露孔1 絕緣層具有一^於=二、一極體晶片的後表面上,該表面 部份的中身穿孔·;二路該發光二極體晶片之後表面之中央 穿孔内;及:姑政,置一透光元件於該表面絕緣層的中央 凸塊。;μ χ—極體晶片之每個焊^墊上設置一導電 根據本發明之再一 的封裝方%係被提供,種發光二極體晶片封裝體 光二極體晶片,方法包含如下之步驟··提供一發 數個安裝‘該π二ϊ $二極體晶片具有一焊塾安裝表面、 表面相對的二女表表面上的焊墊、及一與該焊墊安裝 、’於該發光二極體晶片的後表面上設置 1244705 五、發明說明(6) 1 -- 一光線反射塗層;於該光線反射塗層上形成一絕緣保護 層,於該發光二極體晶片的焊墊安裝表面上形成一絕緣 層’該絕緣層具有一用於曝露該發光二極體晶片之焊墊安 裝表面之中央部份的中央穿孔及數個用於曝露對應之焊墊 的焊墊曝露孔;於該絕緣層的中央穿孔内設置一透光元 件,及於f亥發光二極體晶片的每個焊墊上設置一導電凸 塊0 根 體的封裝方法 供一絶緣基t板 有一焊 的焊墊、及一 明之又再一特徵,一種發光二 係被提供,該 ,該絕緣基板 片安裝區域具 對的背面、數 數個從該晶片 導電軌跡;於 表面上 一用於曝露該 提供至少一個 片安裝表 該晶片安 面經由對 基板的該 基板絕緣 個晶片安 極體晶片 板的該I至 數個安裝 表面相對 安裝表面 個用於曝 墊曝露孔 置一導電 封裝方法包含如下之步 具有至少一個晶片安裝 片封裝 驟:提 區域, 與該晶 裝表面與該背 應之貫孔來延 個晶片 基板絕 層,該 裝區域之中央 ’該至少一個 少一個晶片安 墊安裝 該至少 片安裝 面的貫 伸到該 安裝區 緣層係 區域的 發光二 裝區域 表面上 該至少 反射塗 發光二 個發光 一個晶 表面相 孔、及 背面的 域晶 形成有 開孔; ϋ體晶 並為具 一個發 層,該 極气晶 一核體 片安裝 片係設 光二極 光線反 片之對 晶片之 置於該 墊安裝 與該焊 體晶片 射塗層 應之焊 每個焊 有一晶 個貫通 安裝表 該絕緣 形成一 至少一 發光二 絕緣基 表面、 墊安裝 的焊墊 具有數 墊的焊 墊上設 面 至少一 於該焊 的後表 上設置 露該至 ;於該 凸體, 面;於 一光線 少一個 至少一 該等導$ 8 页 Α 、 Description of the invention (5) ------ 5 female solder pads on the surface, and a surface opposite to the mounting surface of the solder pad i: pole carving: ί line t ϊ, the The anti-light line coating is provided on the light emitting pole: said: * dry pad women's surface and has-for exposing the: the first pole the next day-the corresponding pad exposure hole of the pad 丨A light-transmitting element, the light-transmitting 7L piece is disposed on the rear surface of the light-emitting diode wafer; each of the conductive bumps is disposed on a corresponding pad of the light-emitting diode wafer. . The seal of a button is a kind of light-emitting diode wafer followed by a light-emitting diode: The packaging method includes the following steps: providing a surface and a number of ^ = pieces, the light-emitting diode wafer has a Pad installation table installation ίΐΓί Welding pads on the pad mounting surface, and a γ 2 ί t face with 5 pads of the pad electrode; a light reflecting coating is provided on the light-emitting layer to expose the hair 'a: ^ f : Top 'The light-reflective coating has several pad exposure holes that are made of pads that absolutely correspond to the surface. 1 The insulating layer has a rear surface on the back of the polar wafer, and the middle part of the surface part. Perforation; two-way inside the central perforation of the rear surface of the light-emitting diode wafer; and: placing a light transmitting element on the central bump of the surface insulation layer. ; Μ χ—Each pad of a polar wafer is provided with a conductive package according to yet another aspect of the present invention. The package is provided with a light-emitting diode wafer package and a photodiode wafer. The method includes the following steps. · Provide a number of mountings 'the π diode 具有 $ diode wafer has a welding pad mounting surface, two pads on the surface of two female surfaces opposite to each other, and a mounting pad with the pads,' on the light emitting diode 1247705 is provided on the rear surface of the wafer. 5. Description of the invention (6) 1-a light reflecting coating; an insulating protection layer is formed on the light reflecting coating, and is formed on the pad mounting surface of the light emitting diode wafer An insulation layer 'The insulation layer has a central perforation for exposing the central portion of the pad mounting surface of the light emitting diode wafer and several pad exposure holes for exposing the corresponding pad; A light-transmitting element is arranged in the central perforation, and a conductive bump is provided on each bonding pad of the light-emitting diode wafer, and a packaging method is provided for an insulating substrate with a soldering pad, and Yet another feature, a The optical system is provided. The insulating substrate sheet mounting area has a pair of back surfaces, several conductive traces from the wafer, and a surface for exposing the provided at least one sheet mounting table. The wafer mounting surface passes through the substrate. The substrate is insulated from the wafer, and the mounting surface of the wafer body is opposite to the mounting surface. A conductive packaging method for exposing the exposure holes of the mounting plate includes the following steps: at least one wafer mounting sheet is packaged. The wafer mounting surface and the corresponding through hole extend through the wafer substrate insulation, and the center of the mounting area is' the at least one less wafer mounting pad is mounted to extend from the mounting surface to the edge layer area of the mounting area. On the surface of the light-emitting two-packed area, at least two light-reflecting light-emitting two light-emitting and one crystal surface holes are formed on the surface, and the domain crystals on the back are formed with openings; A pair of wafers with a photodiode light reflector is placed on the pad, and the wafer coating of the weld body should be welded. Through the installation table, the insulation forms at least one light-emitting two insulating base surface, the pad-mounted pad has several pads, and at least one of the pads has a surface on the back surface of the welding; on the convex body, the surface; One light less than one at least one
第10頁 1244705Page 10 1244705
五、發明說明(7) 電凸體係與今 安裝表面緣基板之該至少一個晶片安裝區域之晶片 材料經由該=應的導電軌跡電氣地連接;藉由把〆導熱 二極體晶I蛊二^注入形成在絕緣基板、該至少〆個發光 及於該至少二厂等導電凸體之間的空間來形成〆導熱層: 件。 固發光二極體晶片之後表面上設置一透光元 根據本發日月> 裝體的封#古再另一特徵,一種發光二極體晶片封 提供ml 提供,該封裝方法包含如下之步驟: 域,^ 亥絕緣基板具有至少一個晶片安裝區 該晶ί安二:::曰曰片安襄區域具有-晶片安裝表面、-與 該北&衣表面相對的背面、數個貫通該晶片安裝表面與 21^的、孔、及數個從該晶片安裝表面經由對應之貫孔 到該背面的導電軌跡;於該絕緣基板的該至少一個 =力安裝區域的晶片安裝表面上形成一基板絕緣層,該基 f、、’巴緣層係形成有一用於曝露該至少一個晶片安裝區域之 2央區域的開孔;提供至少一個發光二極體晶片,該至少 一個發光3極體晶片係設置於該絕緣基板的該至少一個曰 2 f裝區域並且具有一焊墊安裳表面、數;個安裝於該焊g 女哀表面上的焊墊、及一與該焊墊安裝表面相對的後表 面;藉由把一導熱材料經由該等貫孔注入形成在絕 該至之一個發光二極體晶片與該等導電凸體之間二空 間來形成一導熱層;於在界定每一個開孔之内壁面與對應 f T電凸體之間之空間内形成-絕緣材料層,該絕緣材料 層在靠近晶片之部份具有一個比在靠近基板絕緣層之部份 1244705 ⑻V. Description of the invention (7) The electroconvex system is electrically connected to the wafer material of the at least one wafer mounting area of the mounting surface edge substrate via the corresponding conductive track; by using the 〆 thermally conductive diode crystal I 蛊 二 ^ A space formed between the insulating substrate, the at least one light-emitting body, and the conductive protrusions such as the at least two factories is implanted to form a heat-conducting layer. A light-transmitting element is provided on the surface of the solid-state diode chip. According to another feature of the present day and month ' s package # 古 再, a light-emitting diode chip package is provided in ml. The packaging method includes the following steps : Domain, ^ The insulating substrate has at least one wafer mounting area. The crystal An: 2 :: Anxiang area has-a wafer mounting surface,-a back surface opposite the north & clothing surface, a number of through the wafer The mounting surface and 21 ^, holes, and a plurality of conductive tracks from the wafer mounting surface to the back surface through corresponding through holes; a substrate insulation is formed on the wafer mounting surface of the at least mounting area of the insulating substrate Layer, the base f, and the rim layer are formed with an opening for exposing the two central regions of the at least one wafer mounting region; providing at least one light emitting diode wafer, the at least one light emitting diode wafer system is provided The at least one 2F mounting area on the insulating substrate has a pad mounting surface, a number of pads, a pad mounted on the padding surface, and a rear surface opposite to the pad mounting surface. ; Forming a thermally conductive layer by injecting a thermally conductive material through the through holes into two spaces formed between a light emitting diode wafer and the conductive protrusions; within the boundaries of each opening An insulating material layer is formed in the space between the wall surface and the corresponding f T electric convex body, and the insulating material layer has a portion closer to the wafer than a portion closer to the substrate insulating layer 1244705 ⑻
、發明說明 ^厚f ^、的厚度以致於每個絕緣材料層具有一凹陷的上表 ;该絕緣材料層之表面上形成一金屬反射層;於該金 射層上形成一透明保護層;及於該至少一個發光二極 ^ = f之每個焊墊上形成〆導電凸塊,該等導電凸塊係與 X、巴緣基板之該至少一個晶片安裝區域之晶片安裝表面上 之對應的導電執跡電氣地連接。 、根據本發明之再另一特徵,一種發光二極體晶片封裝 丑的封I求法係被提供,該封裝方法包含如下之步驟:提 仏 發光二極體晶片,該發光二極體晶片具有一焊墊安裝 表面數個安裝於該焊墊安裝表面上的焊墊、及一與該焊 塾安裝表面相對的後表面;於該發光二極體晶片的焊墊安 义表面上置一光線反射塗層,該光線反射塗層具有一用 於曝露該發光二極體晶片之對應之焊墊的焊墊曝露孔;於 g發光二極體晶片的後表面上設置一透光元件;及於該發 光二極體晶片之每個焊墊上設置一導電凸塊。 【實施方式】 在本發明被詳細說明之前,應要注意的是,在整個說 明書中,相似的元件係由相同的標號標示卜另一方面,為 了清楚揭示本發明之特徵,該等附圖並不是按照元件實際 的尺寸及不是按照真實比例來描繪。 第一气四圖是為以製造步驟方式顯示本發明之第一較 佳實例之LEXD晶片封裝體的示意剖視圖。 晴參閱第一圖所示,一發光二極體(led)晶片10係首 先被提供。該LED晶片1〇是為一個尚未從一晶圓(wafer)Description of the invention ^ thick f ^, so that each insulating material layer has a recessed upper surface; a metal reflective layer is formed on the surface of the insulating material layer; a transparent protective layer is formed on the gold shot layer; and 〆 conductive bumps are formed on each of the pads of the at least one light emitting diode ^ = f, and the conductive bumps are corresponding to the conductive pads on the wafer mounting surface of the at least one wafer mounting area of the X and B substrate The traces are electrically connected. According to still another feature of the present invention, a light-emitting diode chip packaging method is provided. The packaging method includes the following steps: lifting a light-emitting diode wafer, the light-emitting diode wafer having a Pad mounting surface Several pads mounted on the pad mounting surface and a rear surface opposite to the pad mounting surface; a light reflecting coating is placed on the pad surface of the light emitting diode wafer. Layer, the light reflecting coating has a pad exposure hole for exposing a corresponding pad of the light emitting diode wafer; a light transmitting element is provided on the rear surface of the light emitting diode wafer; and the light emitting A conductive bump is disposed on each pad of the diode wafer. [Embodiment] Before the present invention is described in detail, it should be noted that throughout the specification, similar elements are denoted by the same reference numerals. On the other hand, in order to clearly disclose the features of the present invention, the drawings and It is not drawn according to the actual size of the element and not to the true scale. The first diagram is a schematic cross-sectional view of a LEXD chip package showing a first preferred embodiment of the present invention in the form of manufacturing steps. As shown in the first figure, a light emitting diode (LED) chip 10 is first provided. The LED chip 10 is a wafer which has not yet been removed from a wafer.
第12頁 1244705 五、發明說明(9) 切割出來的晶片,也就是說,本發明的發光二極體晶片封 I體之封裝方法是為一種晶圓級封裝方法。當然,該晶片 也可以是為一個已從一晶圓切割出來的晶片。 該LED晶片10具有一個安裝有數個焊墊102的焊墊安 裝表面1 0 〇及一個與該焊墊安裝表面1 〇 〇相對的後表面 ^01 。在本實施例中,兩個焊墊1〇2係被安裝於該料墊安 裝表面100上。然而,應要了解的是,焊墊1〇2的數目並 不受限於兩個,其係端視應用而定。 —光線反射塗層1 1係被設置於該LED晶片1 〇的焊墊安 / ^面1 0 Q上。该光線反射塗層1 1係由任何適合的材料形 成並且具或數個用於曝露對應之焊墊丨0 2的焊墊曝露孔 請參 於每一個 該等凸體 光阻材料 射塗層11 然後對該 另一 於該LED 絕緣層1 3 表面101 理來在中 中央部份 閱第二圖 焊墊1 0 2 1 2係由像 製成。該 上以光阻 凸體形成 方面,一 曰\片1 0的 係由感光 上之後, 央部份形 的中央穿 所示,在光 上係形成有 聚醯亞胺 等凸體1 2的 材料形成一 層進行曝光 由光阻材料 後表面1 0 1 油墨製成。 該表面絕緣 成一用於曝 孔 1 3 0 〇 線反射塗層1 1的 一凸體1 2。在本 (polyimide)及 形成係藉由首先 凸體形成層(圖 和顯影等處^理來 製成的表面絕緣 上。在本貫施例 在形成於該LED 層1 3係經由曝光 露該晶片1 0之後 形成之後, 實施例中, 其類似般的 在該光線反 中未示)而 達成。 層1 3係形成 中,該表面 晶片1 0的後 和顯影等處 表面1 0 1 之Page 12 1244705 V. Description of the invention (9) The diced wafer, that is, the packaging method of the light-emitting diode chip package I of the present invention is a wafer-level packaging method. Of course, the wafer may be a wafer that has been cut from a wafer. The LED chip 10 has a pad mounting surface 100 on which a plurality of pads 102 are mounted, and a rear surface ^ 01 opposite to the pad mounting surface 100. In this embodiment, two pads 102 are mounted on the pad mounting surface 100. It should be understood, however, that the number of pads 102 is not limited to two, and the system end depends on the application. —The light-reflective coating layer 11 is provided on the pad mounting surface 10 Q of the LED chip 10. The light-reflective coating 11 is formed of any suitable material and has a plurality of pad exposure holes for exposing corresponding pads. 0 2 Please refer to each of these convex photoresist material coatings 11 Then the second pad 101 on the surface of the LED insulation layer 1 3 is read in the middle and middle part. The second pad 1 0 2 1 2 is made of an image. In terms of the formation of photoresistive convex bodies, after the photoresist is applied, the central part of the central shape is shown on the surface. The material on the light is formed with convex bodies such as polyimide. Forming a layer for exposure is made of 1 0 1 ink on the rear surface of the photoresist material. The surface is insulated as a convex body 12 for the exposure hole 1330 line reflective coating 1 1. The polyimide and the formation are formed on the surface insulation by firstly forming a convex body forming layer (images, development, etc.). In this embodiment, the LED layer 13 formed on the LED layer is exposed through exposure. After the formation after 10, in the embodiment, it is similarly not shown in the light reflection). During the formation of layer 1 3, the surface of the wafer 10 and the surface of the developing surface 1 0 1
1244705 五、發明說明(10) 接著,請參閱第三圖所示,於該LED晶片1 〇的每,個 焊墊1 0 2 上係形成有一第一金屬層1 4以致於該焊墊1 〇 2的 表面和在該焊墊1 0 2上的凸體1 2係由該第一金屬層1 4覆 蓋。在本實施例中,該等第一金屬層1 4係由鋁形成。然 而’應要了解的是,該第一金屬層丨4亦可以由其他任何適 合的金屬材料形成。 然後,^在每一個第一金屬層1 4上係形成有一第二金屬 層15 ’因此,每個凸體12及其之對應的第一和第二金屬層 1 4和1 5 —起形成一導電凸塊。在本實施例中,每一個第二 金屬層15係由一鎳層150與一金層151組成。 *最後’ 一透光元件丨6係設置於該後表面絕緣層丨3的中 $穿孔130.&内。在本實施例中,該透光元件16係以聚醯亞 胺為材料來被形成並且具有一圓弧形的頂端部份。铁而, :透土元件16亦可以由任何適合的材料與任何適合的、方法 來被设置。例如,該透光元件1 6係能夠以適合的材料辜弁 製造而成,^而然後再被設置於該表面 内。 曰〜τ天牙孔 =要注意的是,該透光元件丨6係可以^依需要來 埭-ί::?當的偏光劑以致於從該透光元件16射出的L 線旎夠具有合意的顏色。 ⑺出的先 應要,解的是,在本實施例中, 金般的金屬形成該凸體12亦可以由像 …屬層“和15係可以被免除。或者,如在第十士日:中1244705 V. Description of the invention (10) Next, referring to the third figure, a first metal layer 14 is formed on each of the pads 10 of the LED chip 10, so that the pad 1 〇 The surface of 2 and the protrusions 12 on the pads 102 are covered by the first metal layer 14. In this embodiment, the first metal layers 14 are formed of aluminum. However, it should be understood that the first metal layer 4 can also be formed of any other suitable metal material. Then, a second metal layer 15 ′ is formed on each of the first metal layers 14. Therefore, each convex body 12 and its corresponding first and second metal layers 14 and 15 are formed together. Conductive bump. In this embodiment, each of the second metal layers 15 is composed of a nickel layer 150 and a gold layer 151. * Finally, a light-transmitting element 6 is disposed in the through hole 130. & of the rear surface insulating layer 丨 3. In this embodiment, the light-transmitting element 16 is formed using polyimide as a material and has a rounded top portion. However, the permeable element 16 may also be provided from any suitable material and any suitable method. For example, the light-transmitting element 16 can be made of a suitable material, and then placed in the surface. ~ Τ 天 牙 孔 = It should be noted that the light-transmitting element 6 series can be used as needed. 埭 ::? The polarizing agent is such that the L-line ray emitted from the light-transmitting element 16 is sufficient. s color. The first requirement is the solution. The solution is that in this embodiment, the convex body 12 formed of gold-like metal can also be exempted from the series of "..." and 15 series. Or, as on the tenth day: in
料形成。然而,請夂㈣+岡所_ °豕凸妝12係由先阻材 1244705 五、發明說明(11) 所示’在以光阻材料形成凸體1 2之前,於每個焊墊1 〇 2上 係形成一界接金屬層2 8。應要注意的是,在本發明中所揭 露之導電凸塊並不受限於在此中所描述的類型和形成方U 式。只要是適於與外部電路電氣連接的話,各式各樣的導 電凸塊和其之形成方式係可應用在本發明。例如,在中華 民國專利申請案第8 9 1 0 0 5 78人03號案和第92 1 1 2 1 6 5號安1 所揭露的導電凸塊及其之形成方式亦可應用於本中 以上外述之LED晶片封裝體具有如下之優點·· 1·該LED晶片封裝體的整體尺寸係與該LED晶片 ,寸大致相同,因此係比目前市面上可得之稱為"〇6〇3"、 0804 、及” 0402"等等之LED晶片封裝體的尺寸小报 2·免%打線處理使整個封裝時程縮短, 產量與良率。 ’双耗升 第五圖疋為顯不本發明楚— — 體晶片封裝體的示意剖視圖。 &貝施例之發光二極 請參閱第五圖所示,本較佳實施例之 封裝體與靜一較佳實施例之 。體日日片 地方是僅在於該透光元件桎體日日片封裝體不同的 平坦的頂端部份 件17係經由研磨•來被形成有— 第/、圖是為顯示本發明二 — 體晶片封气體的部份示意剖視圖了乂土 κ施例之發光二極 請參閱第六圖所示,本 的地方係僅在於進一步包人 /人μ 一較佳實施例不同 的第二透光元件18。該等 二亥^件17之上 九兀仵17,18可以被摻雜有不料 formation. However, please 夂 ㈣ + 所 所 _ ° 豕 The convex makeup 12 is made of the first resisting material 1244705 V. The description of the invention (11) 'Before forming the convex body 12 with a photoresist material, put it on each pad 1 2 The upper system forms a boundary metal layer 28. It should be noted that the conductive bumps disclosed in the present invention are not limited to the types and formation methods described herein. As long as it is suitable for electrical connection with an external circuit, various conductive bumps and their forming methods can be applied to the present invention. For example, the conductive bumps disclosed in the Republic of China Patent Application No. 8 9 1 0 0 5 78 No. 03 and No. 92 1 1 2 1 6 5 An 1 and their formation methods can also be applied to the above The externally described LED chip package has the following advantages: 1. The overall size of the LED chip package is approximately the same as that of the LED chip, so it is called " 〇6〇3 ";, 0804, and "0402", etc., LED chip package size tabloids 2 · Free% wiring processing shortens the entire package time, yield and yield. 'The fifth picture of double consumption rise is clearly invented. — — A schematic cross-sectional view of a body chip package. &Amp; The light emitting diode of the Bayesian embodiment is shown in FIG. 5, the package body of this preferred embodiment and the one of the preferred embodiment. Only the flat top part 17 which is different from the light-transmitting element body and the sun-chip package is formed by grinding. The first and second figures are for showing the second part of the present invention. Schematic cross-sectional view of the light-emitting diode of the ochre κ embodiment This place is only for further enlarging the second light transmitting element 18 which is different from the preferred embodiment. These two light-transmitting elements 17 and 18 may be doped with different
1244705 五、發明說明(12) 同波長之魂當的偏光劑以致於從該第二透光元件18射出的 光線可以具有由兩種顏色調和出來的顏色。 第七至九圖是為顯示本發明之第四較佳實施例之發光 二極體晶片封裝體的示意剖視圖。1244705 V. Description of the invention (12) The polarizing agent with the same wavelength as the soul so that the light emitted from the second light-transmitting element 18 may have a color blended by two colors. 7 to 9 are schematic cross-sectional views showing a light emitting diode chip package according to a fourth preferred embodiment of the present invention.
、f簽閱第七圖所示,一發光二極體(LED)晶片1〇係首 先被提L ^LED晶片1 〇具有一個安裝有數個焊墊丨02的 知墊女衣表面1 〇 〇及一個與該焊墊安裝表面丨〇 〇相對的後 表,1+01 。在本實施例中,兩個焊墊102係被安裝於該焊 墊=衣ί面10 〇上。然而,應要了解的是,焊墊1 〇 2的數 目並不文气於兩個,其係端視應用而定。 光、、在反射塗層1 1係被設置於該L E D晶片1 〇的後表面 101 上。 由光阻f料製成的絕緣保護層1 9係形成於該反射塗 層11上。在本實施例中,該絕緣保護層1 9係由感光油墨製 成。 夂 另方面’一由光阻材料製成的表面絕緣層2 〇係形成 於該LED晶片1〇的焊墊安裝表面1〇〇 i。在本實施例中, 該表面絕緣層2 0係由感光油墨製成。: 曰,著’.¾如在第八圖中所示,在形成於該LEd晶片1 0的 焊墊安装表面1 0 〇 i之後,該表面絕緣層2 〇係經由曝光和 顯影等處ί里來形成—用於曝露該led曰曰曰片1〇之焊墊安裝表 面1 00之中央部份的中央穿孔2〇〇和數個形成於一對應之 焊墊102上的凸體12。 接著,4如在第九圖中所示,於該LED晶片1〇的每一個 1244705And f, as shown in the seventh figure, a light-emitting diode (LED) wafer 10 is firstly lifted. L ^ LED wafer 10 has a pad surface with a plurality of solder pads. 02 A back table opposite the pad mounting surface, 1 + 01. In this embodiment, two solder pads 102 are mounted on the solder pad = clothing surface 100. However, it should be understood that the number of pads 102 is not as small as two, and the end depends on the application. The light-reflective coating 11 is provided on the rear surface 101 of the LED wafer 10. An insulating protective layer 19 made of a photoresist f material is formed on the reflective coating 11. In this embodiment, the insulating protective layer 19 is made of a photosensitive ink.夂 On the other hand, a surface insulation layer 20 made of a photoresist material is formed on the pad mounting surface 100i of the LED chip 10. In this embodiment, the surface insulating layer 20 is made of a photosensitive ink. : As shown in the eighth figure, after the pad mounting surface 1 0 〇i formed on the LEd wafer 10, the surface insulation layer 2 0 is exposed through exposure and development, etc. To form—a central perforation 200 for exposing the central portion of the pad mounting surface 100 of the LED sheet 10 and a plurality of convex bodies 12 formed on a corresponding pad 102. Next, as shown in the ninth figure, each of the LED chips 10 is 1244705.
五、發明說明(13) 丈干塾1 0 2上形成一第一金屬層丨4以致於該焊墊丨〇 2的表面 和=該焊墊102上的凸體12係由該第一金屬層14覆蓋。在 本貝施例中’該等第一金屬層丨4係由鋁形成。然而,應要 了解的是,' 該等第一金屬層丨4亦可以由其他任何適合的金 屬材料形成。 iW k,於每一個第一金屬層丨4上係形成一第二金屬層 1 5,因此,每個凸體丨2及其之對應的第一和第二金屬層 和15 —起幾成一導電凸塊。每一個第二金屬層以係由一鎳 層15〇與一金層151組成。 而最後,一透光元件17係設置於該表面絕緣層20的中央 穿孔20 0内。在本實施例中,該透光元件17係以聚醯亞胺 為材料形成。然而,該透光元件丨7亦可以由任何適合的材 料與任何逾合的方法來形成。 第十二至十八圖是為以製造步驟方式顯示本發明之第 五較佳實施例之發光二極體晶片封裝體的示意剖視圖。 請參閱第十二和十三圖所示,至少一個發光二極體 (L E D)晶片l 1 〇係首先被提供。該l e D晶片1 〇具有一個設置 有數個丨干塾102的焊塾安裝表面100及一 個與該焊塾安f 表面1 0 0相對的後表面1 0 1 。與以上的實施例相同,兩個 焊墊1 0 2係被安裝於該料墊安裝表面1 0 0上。然而,應要 了解的是,焊塾1 0 2的數目並不受限於兩個,其係端視廣 用而定。& 一光線反射塗層1 1係被設置於該L E D晶片1 〇的焊墊安 裝表面1 0 0上。該光線反射塗層1 1具有數個用於曝露對應V. Description of the invention (13) A first metal layer is formed on the stem 1 102, so that the surface of the pad 〇2 and the protrusion 12 on the pad 102 are formed by the first metal layer. 14 cover. In this embodiment, the first metal layers 4 are formed of aluminum. However, it should be understood that the first metal layers 4 may also be formed of any other suitable metal material. iW k, a second metal layer 15 is formed on each of the first metal layers 丨 4, so each convex body 丨 2 and its corresponding first and second metal layers and 15 are almost electrically conductive. Bump. Each second metal layer is composed of a nickel layer 150 and a gold layer 151. Finally, a light transmitting element 17 is disposed in the central through hole 200 of the surface insulating layer 20. In this embodiment, the light-transmitting element 17 is made of polyimide. However, the light-transmitting element 7 can also be formed of any suitable material and any combination method. Twelfth to eighteenth drawings are schematic cross-sectional views showing a light emitting diode chip package according to a fifth preferred embodiment of the present invention in the form of manufacturing steps. Please refer to the twelfth and thirteenth figures. At least one light emitting diode (LED) wafer 110 is first provided. The LED chip 100 has a welding electrode mounting surface 100 provided with a plurality of wafers 102 and a rear surface 10 1 opposite to the welding surface f 0 1 0. Similar to the above embodiments, two pads 102 are mounted on the pad mounting surface 100. However, it should be understood that the number of welding pads 102 is not limited to two, and the system end depends on wide use. & A light reflecting coating 11 is provided on the pad mounting surface 100 of the LED chip 100. The light-reflective coating 11 has several
12447051244705
之焊墊1 0 2的焊墊曝露孔1 j 〇 接著 實施例中 成。該等 以光阻材 體形成層 ,·於每一個 ,該凸體1 2 凸體1 2的形 料形成一凸 奸塾102上係形成有一凸 進行曝光和 ,於該L E D 屬層1 4以致 上的凸體1公係由該第 屬層1 4係由 1 4亦可以由 隨後 一第一金 等第一金 一金屬層 然後 層1 5 ,因 1 4 和 1 5 _ 鎳層150 係由像聚醯亞胺 成係猎由首先在 體形成層(圖中 顯影等處理來達 晶片1 0的每一個 於該焊墊1 0 2的 一金屬層14覆蓋 症呂形成。然而, 其他任何適合的 在每一個第一金屬層14上 气,每個凸體I2及其之對應 起形成一導電凸塊。每一個 與一金層151組成。 荨等般的 該光線反 未示)而 成。 焊墊1 0 2 表面和在 。在本實 應要了解 金屬材料 係形成有 光阻材料製 射塗層1 1上 然後對該凸 上係形成有 該焊墊1 0 2 施例中,該 的是,該第 形成。 一第二金屬 的第一和第二金屬層 第二金屬層15係由一 現在睛蒼閱第十四和十五圖所示,一絕緣基板2丨係被 提供。該絕緣基板21具有數個晶片安裝區域21()。該等晶 1安裝區域210各具有一晶片安裝表面21j 、一與該晶片 安裝表面2 1 1相對的背面2 1 2 、數個貫通該晶片安裝表面 211與該背面212的貫孔213 、及數個從該晶片安裝表面 2 11經由一對應之貫孔2 1 3來延伸到該背面2丨2的導電執 跡2 14 。气本較佳實施例中,每一個晶片安裝區域21〇之 貝孔2 1 3的數目係與對應之L E D晶片1 ◦之焊墊1 〇 2的數目 相等。 ΜThe pad exposure hole 1 j of the pad 10 2 is then formed in the embodiment. The photoresist material is used to form a layer. In each case, the shape of the convex body 1 2 and the convex body 12 form a convex ridge 102. A convex is formed on the LED for exposure and the LED belongs to the layer 14. The convex body 1 on the first layer is composed of the first layer 14 and the first layer 14 may also be composed of a first gold and a first metal and then a metal layer and then a layer 1 5, because the layers 1 4 and 1 5 _ nickel layer 150 are A polyimide-based system is formed by first forming layers in the body (development and other processing in the figure to reach each of the wafers 10 and a metal layer 14 covering the pads 102). However, any other suitable It is formed on each of the first metal layers 14, and each of the convex bodies I2 and the corresponding one forms a conductive bump. Each is composed of a gold layer 151. The light like the net is not shown). Pad 1 0 2 surface and at. In this embodiment, it should be understood that the metal material is formed with a photoresist material-based radiation coating layer 1 1, and then the solder pad 10 is formed on the convex system. In this embodiment, the first layer is formed. First and second metal layers of a second metal The second metal layer 15 is provided by an insulating substrate 2 as shown in Figs. 14 and 15 of the present invention. The insulating substrate 21 includes a plurality of wafer mounting areas 21 (). Each of the crystal 1 mounting areas 210 has a wafer mounting surface 21j, a back surface 2 1 2 opposite to the wafer mounting surface 2 1 1, a plurality of through holes 213 penetrating the wafer mounting surface 211 and the back surface 212, and a number of A conductive track 2 14 extending from the wafer mounting surface 2 11 to the back surface 2 1 2 through a corresponding through hole 2 1 3. In the preferred embodiment, the number of bevel holes 2 1 3 in each wafer mounting area 21 is equal to the number of corresponding pads 102 in the LED chip 1 ◦. Μ
m ii 第18頁 1 1244705 五、發明說明(15) ”在本貝施例中,5亥、纟巴緣基板2 1為一陶瓷基板,然而, -蜿緣基麵2 1亦可以是為由其他絕緣材料製成的基板,例 如’玻璃基板。 然後’如在第十六圖中所示,一基板絕緣層22係形成 於整個絕緣基板21的晶片安裝表面211上。在本實施例 中5亥基板、纟巴緣層22係由光阻材料製成而且係經由曝光與 顯影等處理、來形成有數個用於曝露對應之晶片安裝區域 21 0之中央區域的開孔22〇 。隨後,於界定每個開孔22〇 的内壁面上係形成有一反光塗層23。 接著,明參閱第十七圖所示,數個如上所述被製備的 \ED晶片i(j係被置於對應的晶片安裝區域21〇内而且在該 曰曰片1 0之焊墊1 〇 2上的導電凸塊係經由一導電體2 4來與在 晶片安裝表面211上之對應的導電執跡214電氣連接Ϊ ♦然後,如在第十八圖中所示,一導熱材料係經由該等 貫孔213來被注入形成在絕緣基板21、對應之LED晶片 10、與對磨之導電體24之間的空間來形成導熱層26。該導 熱材料可以是為金屬絕緣導熱材料或者非金屬絕緣導熱材 另一方面,於每個led晶片10上係形成有一透光元件 25。該透气元件25係由與以上所述之較佳實施例相同的 料及相同的方式形成。 一最後’該絕緣基板2 1係依需要來被切割成數個個別的 發光二極體封裝體。例如,每個發光二極體封裝體可以包 含一個晶片安裝區域210或者可以包含九個成矩陣方式^m ii p. 18 1 1244705 V. Description of the invention (15) ”In the example of the present example, the substrate 5 1 and the edge substrate 21 is a ceramic substrate, however,-the base surface 2 1 of the winding edge can also be the reason A substrate made of other insulating materials, such as a 'glass substrate.' Then, as shown in FIG. 16, a substrate insulating layer 22 is formed on the wafer mounting surface 211 of the entire insulating substrate 21. In this embodiment, 5 The substrate and the edge layer 22 are made of a photoresist material and processed through exposure and development to form a plurality of openings 22 for exposing the central area of the corresponding wafer mounting area 210. Then, in A reflective coating layer 23 is formed on the inner wall surface that defines each of the openings 22. Next, referring to FIG. 17, a plurality of \ ED wafers i (j series prepared as described above are placed in the corresponding The conductive bumps in the wafer mounting area 21 and on the pads 10 of the wafer 10 are electrically connected to the corresponding conductive tracks 214 on the wafer mounting surface 211 via a conductor 24. ♦ Then, as shown in the eighteenth figure, a thermally conductive material The through-hole 213 is injected into the space formed between the insulating substrate 21, the corresponding LED chip 10, and the opposed conductor 24 to form a thermally conductive layer 26. The thermally conductive material may be a metal-insulated thermally-conductive material or a non-metal-insulated thermally-conductive material. On the other hand, a light-transmitting element 25 is formed on each LED chip 10. The air-permeable element 25 is formed of the same material and in the same manner as the preferred embodiment described above. Finally, the insulating substrate 2 1 is cut into several individual light-emitting diode packages as needed. For example, each light-emitting diode package may include a chip mounting area 210 or may include nine matrix methods ^
第19頁 1244705Page 12 1244705
列的晶片安裝區域2 10 。 、應要注意的是,該透光元件25係可以被注入偏光染料 背J或逢光劑以致於從該透光元件2 5發射出來的光線可以具 有合意的顏色。 第十九、至二Η 圖是為以製造步驟方式顯示本發明之 第/、較佳貫施例之發光二極體晶片封裝體的示意側視圖。 在本實施例中,至少一個發光二極體(LED)係如在第 五較佳實施例中所述般首先被製備,因此,其之詳細描述 於此被省略。 一然後,如第十九圖所示,一絕緣基板2 1係被提供。本 芦施例之、纟巴緣基板2 1與弟五車父佳實施例之絕緣基板不同的 地方僅在於本較佳實施例之絕緣基板2丨的每個晶片安裝區 域210具有比較大的面積。 然後A如在第二十圖中所示,與該第五較佳實施例相 同’ 一基板絕緣層22係形成於整個絕緣基板2丨的晶片安裝 表面211上。在本實施例中,該基板絕緣層22係由光阻材 料製成而且係經由曝光與顯影等處理來形成有數個用於曝 露對應之晶片安裝區域2 1 0之中央區域的^開孔2 2 〇 。 接著,請參閱第二十一圖所示,數個預先被製備的 LED晶片1 〇係被置於對應的晶片安裝區域2 j 〇内而且在該 晶片1 0之焊墊1 〇 2上的導電凸塊係經由一導電體2 4來與在 晶片安裝表面2 1 1上之對應的導電執跡2 1 4電氣連接。 然後、一導熱材料係經由該等貫孔213注入形成在由 該絕緣基板2 1、對應之LED晶片1 0、與對應之導電體所Rows of wafer mounting areas 2 10. It should be noted that the light-transmitting element 25 can be injected with a polarizing dye back J or a light-emitting agent so that the light emitted from the light-transmitting element 25 can have a desirable color. Nineteenth to Second Twenty Figures are schematic side views showing the light emitting diode chip package of the first and / or preferred embodiments of the present invention in the form of manufacturing steps. In this embodiment, at least one light emitting diode (LED) is first prepared as described in the fifth preferred embodiment, and therefore, a detailed description thereof is omitted here. Then, as shown in FIG. 19, an insulating substrate 21 is provided. In this embodiment, the difference between the insulating substrate 21 and the insulating substrate of the fifth embodiment is only that each of the wafer mounting areas 210 of the insulating substrate 2 of the preferred embodiment has a relatively large area. . Then, as shown in the twentieth figure, A is the same as the fifth preferred embodiment. A substrate insulating layer 22 is formed on the wafer mounting surface 211 of the entire insulating substrate 2 丨. In this embodiment, the substrate insulating layer 22 is made of a photoresist material and is formed with a plurality of openings 2 2 for exposing the central area of the corresponding wafer mounting area 2 1 0 through processes such as exposure and development. 〇. Next, as shown in FIG. 21, a plurality of LED wafers 10 prepared in advance are placed in the corresponding wafer mounting area 2 j 〇 and conductive on the pad 10 of the wafer 10 The bump is electrically connected to a corresponding conductive track 2 1 4 on the wafer mounting surface 2 1 1 via a conductive body 2 4. Then, a thermally conductive material is injected through the through holes 213 and formed in the insulating substrate 21, the corresponding LED chip 10, and the corresponding conductive body.
第20頁 Ϊ244705 五、發明說明(17) 形成的空間内來形成導熱層26。該 絕緣導熱材料或者非金屬絕緣導熱=材科可以是為金屬 在形成導熱層26之後,於在屄卞二 / 壁面與對應之導電體24之間的空間内:形::::20之: 層29。每一絕緣材料層29在靠近曰片n、:有一絕緣材料 在靠近基板絕緣層22之部份份具有一個比 緣材料層29具有一凹陷的上表:度小的…致於每個絕 來連ϊ ί护:ΐ f f射層30與一透明保護層31係以這順序 連、、、貝地形成於母個絕緣材料層29的 層30係作思如一反射鏡面 =屬反, 能完全被反射出來。 < 於以曰日片發射出來的光線 -样it Γ邑緣基板21係如同在第五較佳實施例中所述 一樣==要來被切割成數個個別的發光二極體封裝體。 < 弟一至—十七圖是為以製作步驟方式顯示一種可 應用於本發明$導電凸塊之例子的Η㈣目。 首先明芩閱第二十二圖所示,於晶元10的每個焊墊 102上形成一如導電金屬球般的導電觸點“。在本實施例 中,该導電觸點32是為金球(gold ball ί 。然而,該導 電觸點γ %可以由任何適合的金屬材料製成。 接著’如在第二十三圖中所示,於晶元1 0的焊墊安裝 表面1 0 〇上係形成—由感光材料形成的第一絕緣層3 3。該 第〇%緣層33係形成有數個曝露對應之導電觸點32的開孔 絕 然後’清參閱第二十四和二十五圖所示,於該第Page 20 Ϊ244705 V. Description of the invention (17) The heat conductive layer 26 is formed in the space formed. The insulating and thermally conductive material or non-metallic insulating and thermally conductive material can be made of metal after forming the thermally conductive layer 26 in the space between the second / wall surface and the corresponding conductive body 24: shape :::: 20 of: Layer 29. Each insulating material layer 29 is close to the film n. There is an insulating material in the portion near the substrate insulating layer 22. The insulating material layer 29 has a depression than the edge material layer 29. The degree is small ... Flail protection: The light-emitting layer 30 and a transparent protective layer 31 are connected in this order. The layer 30 formed on the mother insulating material layer 29 is like a reflective mirror surface. It can be completely reversed. Reflected. < The light emitted by the Japanese film -like it Γ the edge substrate 21 is as described in the fifth preferred embodiment == to be cut into several individual light emitting diode packages. < Figures 1 to 17 are diagrams for showing an example of a conductive bump which can be applied to the present invention in a manufacturing step manner. First, as shown in FIG. 22, a conductive contact like a conductive metal ball is formed on each of the bonding pads 102 of the die 10. In this embodiment, the conductive contact 32 is made of gold. The ball (gold ball). However, the conductive contact γ% may be made of any suitable metal material. Then, as shown in the twenty-third figure, on the pad mounting surface 10 of the wafer 10 Upper system formation—a first insulating layer 33 made of a photosensitive material. The 0% marginal layer 33 is formed with a plurality of openings exposing the corresponding conductive contacts 32. Then, refer to twenty-fourth and twenty-five As shown in the figure
第21頁 1244705 五、發明說明(18) 緣層33上形成一由感光材料形成的第二絕緣層34。該第一 絕緣層34係形成有數個與第一絕緣層33之對應之開— 連通且比該對應之開孔330大的通孔34〇 。接著,彼 ,的開孔33、0和通孔340係以錫膏充填。之後,經過^ 處理,充填於該等彼此連通之開孔33〇和通孔34〇 ^ 係形成一與對應之導電觸點32電氣連接且端部係凸认, 通孔3 4 0外部的導電焊點3 5。 ;该 請芩气第二十六圖所示,經由研磨處理,導電 之凸伸在通孔340外部的端部係被磨平。 “,、35 最後,該第二絕緣層34係被移去,以致於每個診 電焊點35與對應之導電觸點32 —起作用為一如上所^導 電凸塊,如在第二十七圖中所示。 厅4之導 第二十八至三十二圖是為以製作步驟方式顯示 可應用於本發明之導電凸塊之例子的示意剖視圖。種 中’忒導气觸點3 2是為金球(g〇 j d ba i i )。然而 電觸點亦可以由任何適合的金屬材料製;成。 接著’於該晶元1 〇的焊墊安裝表面丨〇 〇上係形〜 感光材料形成的第-絕緣層33。該第-絕緣層33係形:由 數個曝露對應之導電觸點32之端部的開孔330 。 有 然後’Λ凊參閱第二十九和三十圖所示,於該第〜々 層33上形成—由感光材料形成的第二絕緣層%。該第:巴緣 緣層34係形成有數個與第—絕緣層33之對應之開孔 U 連 首先’、請參閱第二十八圖所示,於晶元丨〇的每個炉 1 〇 2上形成一如導電金屬球般的導電觸點3 2。在本實大Γ ’誘導Page 21 1244705 V. Description of the invention (18) A second insulating layer 34 made of a photosensitive material is formed on the edge layer 33. The first insulating layer 34 is formed with a plurality of corresponding through-holes 34o that are open-connected to the first insulating layer 33 and are larger than the corresponding openings 330. Next, the openings 33, 0 and the through-holes 340 are filled with solder paste. After that, after the ^ treatment, the open holes 33o and the through holes 34〇 ^ which are connected to each other are formed to be electrically connected to the corresponding conductive contacts 32 and the ends are convex, and the conduction outside the through holes 3 4 0 is conductive. Solder joint 3 5. The air is shown in the twenty-sixth figure. After grinding, the end of the conductive protrusion protruding outside the through hole 340 is ground. ",, 35 Finally, the second insulating layer 34 is removed, so that each diagnostic welding point 35 and the corresponding conductive contact 32 function as conductive bumps as described above, as in the twenty-seventh It is shown in the figure. The twenty-eighth to thirty-second pictures of the guide of the hall 4 are schematic cross-sectional views showing examples of the conductive bumps applicable to the present invention by the manufacturing steps. The '忒 air-conducting contact 3 2 It is a gold ball (g〇jd ba ii). However, the electrical contacts can also be made of any suitable metal material; and then 'formed on the pad mounting surface of the wafer 1 〇 〇〇 photosensitive material The first-insulating layer 33 is formed. The first-insulating layer 33 is formed by a plurality of openings 330 that expose the ends of the corresponding conductive contacts 32. There are then 'Λ 凊 Refer to the figures 29 and 30 It is shown that a second insulating layer formed of a photosensitive material is formed on the first to third layers 33. The first edge layer 34 is formed with a plurality of openings U corresponding to the first insulating layer 33. Please refer to the twenty-eighth figure, a conductive metal ball-like guide is formed on each furnace 102 of the wafer 〇. 2. The contact 3 in the present large Γ 'induced
第22頁 1244705 五、發明說明(19)Page 22 1244705 V. Description of the invention (19)
Si二對?;開f33…通孔340。接著,彼此連通 的開孔330 '和通孔34〇係以錫膏充填。之 = 理,充填於該等彼此連通 、,’二匕口蛘處 形成-與對應之導電二和通孔340的錫膏係 孔34。外部的導電焊::。2電乳連接且端部係凸伸於該通 口月务閱第二十一圖所示,經由 之凸1 申在通,〇外部的端部係被磨平:"Ιέ35 電尸二35斑ί —、巴緣層34係被移去,以致於每個該等導 電干,..,占35人對應之導電觸點32 一 體,如在第三十二圖中所示。(作用4如上所述之凸 之第十四圖是為以製造步驟方式顯示本發明 二弟七…施例之發光二極體晶片封裝體的示意剖視 、十 ^^咖^㈣以如在第十二至十三圖中特 ί —㈣,被製#。然後’如在第三十三圖中所 36内部係被注入有像:士兀件36係被提供。該透光元件 般的液態染料或螢域氣體或者像偏光染料劑 成在該透*元件36“/二,—全反射^金屬層37係被形 A y β、$ & _ 的下表面上而一半反射金屬層38係被形 成在该,成兀件36的上表面上。 饿形 接著,如在第-丄 晶片之後表面藉由一設置在該咖 層(圖中未示)7=2層37之間的透明黏性材料 。遠透光兀件36係被設置於該LED晶片1〇 1244705 五、發明說明(20) 緣材i开要:主意:f,:透光元件36亦可以由其他的透明絕 、=材㈣成,例如,透明的環氧樹脂、聚 由其他的透明絕緣材料形成時,: 〃 2 j粒子係被摻雜在該透明絕緣材料内。 封裝Ϊ i所述1 ί ?明t『發光二極體晶片封裝體及其之 之目的盥^叾,此藉土述所揭露之構造、裝置,達到預期 發明專#;之二且申請前未見於刊物亦未公開使用,符合 寻利之新穎、進步等要件。 而已,非^述=揭露之圖式及說明,僅為本發明之實施例 仕,其所伝,1本叙明之實施例;大凡熟悉該項技藝之人 飾,皆應、皆苗!!明之特徵範疇,所作之其他等效變化或修 …〜在以下本案之申請專利範圍内。Si two pairs? Open f33 ... through hole 340. Next, the openings 330 'and the through-holes 34o communicating with each other are filled with a solder paste. The reason is that the solder paste holes 34 are formed at the two connecting holes ′, ′, and ′, which are connected to each other. External conductive welding ::. 2 The electric milk is connected and the end is protruding from the port. As shown in the twenty-first month of the month, the convex 1 is applied to the pass, and the outer end is smoothed: " Ιέ35 Denshi II 35 The spot 34 is removed, so that each of these conductive stems,..., Accounts for 35 of the corresponding conductive contacts 32 as a whole, as shown in the thirty-second figure. (Action 4 The fourteenth figure of the convex as described above is a schematic cross-sectional view showing the light emitting diode chip package of the present invention in a manufacturing step manner. In the twelfth to thirteenth drawings, special, ㈣, 被 制 #. Then, as in the thirty-sixth figure, the internal system 36 is injected with the image: Shiwu 36 is provided. The light transmitting element is like A liquid dye or a fluorescent domain gas or a polarizing dye is formed on the transmissive element 36 ″ / two, the total reflection ^ metal layer 37 is formed on the lower surface of A y β, $ & _ and the half reflection metal layer 38 The system is formed on the upper surface of the forming member 36. Next, as in the back of the first wafer, the surface is provided with a transparent layer between the coffee layer (not shown) 7 = 2 layer 37 Viscous material. The far-transmitting element 36 is set on the LED chip 1101244475. Description of the invention (20) The edge material i outline: Idea: f ,: The light-transmitting element 36 can also be made of other transparent insulation, = Materials are formed, for example, when transparent epoxy resin or poly is formed of other transparent insulating materials: 〃 2 j particles are doped in the transparent In the edge material, the package is described as "1", "light-emitting diode chip package and its purpose," by borrowing the structure and device disclosed in the soil to achieve the expected invention. And it has not been seen in publications or publicly used before the application, which meets the requirements of novelty and progress of profit-seeking. Only, non-descriptive = uncovered drawings and descriptions are only examples of the present invention, and its description, 1 Example: Everyone who is familiar with this skill should be familiar with the characteristics of the Ming, and other equivalent changes or repairs… ~ within the scope of the patent application in the following case.
•H 第24頁 1244705 圖式簡單說明 第一至、四圖是為以步驟的方式顯示本發明之第一較佳 實施例之發光二極體晶片封裝體的示意剖視圖; 第五圖是為一顯示本發明之第二較佳實施例之發光二 極體晶片封裝體的示意剖視圖; 第六圖是為一顯示本發明之第三較佳實施例之發光二 極體晶片封裝體的示意剖視圖; 第七至九圖是為以步驟的方式顯示本發明之第四較佳 實施例之發光二極體晶片封裝體的示意剖視圖;• H Page 24 1247705 Brief description of the drawings The first to fourth diagrams are schematic cross-sectional views showing the light emitting diode chip package of the first preferred embodiment of the present invention in steps; the fifth diagram is a A schematic cross-sectional view of a light-emitting diode chip package showing a second preferred embodiment of the present invention; a sixth cross-sectional view is a schematic cross-sectional view of a light-emitting diode chip package showing a third preferred embodiment of the present invention; 7 to 9 are schematic cross-sectional views showing a light emitting diode chip package according to a fourth preferred embodiment of the present invention in a stepwise manner;
第十是為一顯示在本發明中所使用之另一種導電凸塊 之結構的术、意剖視圖, 第十一圖是為一顯示在本發明中所使用之另一種導電 凸塊之結構的示意剖視圖; 第十二至十八圖是為以步驟的方式顯示本發明之第五 較佳實施你(之發光二極體晶片封裝體的示意剖視圖; 第十九至二十一圖是為以步驟的方式顯示本發明之第 六較佳實施例之發光二極體晶片封裝體的示意剖視圖; 第二十二至二十七圖是為以步驟的方式顯示在本發明 中所使用之另一種導電凸塊之結構的示意ί剖視圖;The tenth is a cross-sectional view showing the structure of another conductive bump used in the present invention, and the eleventh is a schematic view showing the structure of another conductive bump used in the present invention Sectional views; Figures 12 to 18 are schematic sectional views showing the fifth preferred embodiment of the present invention (the light emitting diode chip package in steps); Figures 19 to 21 are steps A schematic cross-sectional view of a light-emitting diode chip package according to a sixth preferred embodiment of the present invention is shown in a manner; FIGS. 22 to 27 are steps for showing another kind of conductivity used in the present invention. Schematic cross-sectional view of the structure of the bump;
第二十、八至三十二圖是為以步驟的方式顯示在本發明 中所使用之另一種導電凸塊之結構的示意剖視圖;及 第三十三至三十四圖是為以步驟的方式顯示本發明之 第七較佳實施例之發光二極體晶片封裝體的示意剖視圖。 【圖式之主要元件代表符號表】 10 發光二極體晶片 100 焊墊安裝表面Twenty, eighth to thirty-second diagrams are schematic cross-sectional views showing the structure of another conductive bump used in the present invention in steps; and thirty-third to thirty-four diagrams are in steps The mode shows a schematic cross-sectional view of a light emitting diode chip package according to a seventh preferred embodiment of the present invention. [Representative symbols for the main components of the figure] 10 LED chip 100 Pad mounting surface
第25頁 1244705Page 1212705
圖式簡單說明 101 後 表 面 102 焊 墊 11 光 線 反 射 塗層 110 焊 墊 曝 路 孔 12 凸 體 13 表 面 絕 緣 層 130 中 央 穿 孔 14 第 一 金 屬 層 15 第 二 金 屬 層 150 鎳 層 151 金 層 16 透 光 元 件 28 界 接 金 屬 層 17 透 光 元 件 18 透 光 洽件 19 絕 緣 保 護 層 20 絕 緣 層 200 中 央 穿 孔 21 絕 緣 基 板 210 晶 片 安 裝 區 域 211 晶 片 安 裝 表面 212 背 面 213 貫 孔 214 導 電 軌 跡 22 基 板 絕 緣 層 220 開 孔 23 反 光 塗 層 24 導 電 體 26 導 熱 層 25 透 光 元 件 29 絕 緣 材 料 層 30 金 屬 反 射 層 31 透 明 # 護 層 32 導 電 觸 點 33 第 一 絕 緣 層 330 開 孔 i t f 34 第 二 絕 緣 層 340 通 孔 35 導 電 焊 點 36 透 光 元 件 37 全 反 射 金 屬層 38 半 反 射 金 屬 層Brief description of the drawings 101 Back surface 102 Solder pad 11 Light reflecting coating 110 Solder pad exposure hole 12 Convex body 13 Surface insulation layer 130 Central perforation 14 First metal layer 15 Second metal layer 150 Nickel layer 151 Gold layer 16 Light transmission Element 28 Bound metal layer 17 Light-transmitting element 18 Light-transmitting contact 19 Insulating protective layer 20 Insulating layer 200 Central perforation 21 Insulating substrate 210 Wafer mounting area 211 Wafer mounting surface 212 Back surface 213 Through hole 214 Conductive track 22 Substrate insulation layer 220 Open Hole 23 Reflective coating 24 Electrical conductor 26 Thermally conductive layer 25 Light-transmitting element 29 Insulating material layer 30 Metal reflective layer 31 Transparent # Protective layer 32 Conductive contact 33 First insulating layer 330 Opening itf 34 Second insulating layer 340 Through hole 35 Conductive solder joints 36 Light transmitting elements 37 Totally reflective metal layer 38 Semi-reflective metal layer
Claims (1)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW93101125A TWI244705B (en) | 2003-10-14 | 2004-01-16 | Light-emitting diode chip package body and packaging method thereof |
| US11/004,910 US7339198B2 (en) | 2004-01-16 | 2004-12-07 | Light-emitting diode chip package body and packaging method thereof |
| US12/007,276 US7989817B2 (en) | 2004-01-16 | 2008-01-09 | Light-emitting diode chip package body and packaging method thereof |
| US12/007,279 US7576366B2 (en) | 2004-01-16 | 2008-01-09 | Light-emitting diode chip package body and packaging method thereof |
| US12/007,285 US7943403B2 (en) | 2004-01-16 | 2008-01-09 | Light-emitting diode chip package body and packaging method thereof |
| US12/007,280 US7897984B2 (en) | 2004-01-16 | 2008-01-09 | Light-emitting diode chip package body and packaging method thereof |
| US12/007,278 US7838895B2 (en) | 2004-01-16 | 2008-01-09 | Light-emitting diode chip package body and packaging method thereof |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW92128459 | 2003-10-14 | ||
| TW93101125A TWI244705B (en) | 2003-10-14 | 2004-01-16 | Light-emitting diode chip package body and packaging method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200514176A TW200514176A (en) | 2005-04-16 |
| TWI244705B true TWI244705B (en) | 2005-12-01 |
Family
ID=37154868
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW93101125A TWI244705B (en) | 2003-10-14 | 2004-01-16 | Light-emitting diode chip package body and packaging method thereof |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI244705B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI513041B (en) * | 2010-07-30 | 2015-12-11 | Advanced Optoelectronic Tech | Light emitting diode package and light emitting diode module |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI460801B (en) * | 2010-10-22 | 2014-11-11 | 王琮淇 | A wafer-level semiconductor wafer packaging method and a semiconductor wafer package |
-
2004
- 2004-01-16 TW TW93101125A patent/TWI244705B/en not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI513041B (en) * | 2010-07-30 | 2015-12-11 | Advanced Optoelectronic Tech | Light emitting diode package and light emitting diode module |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200514176A (en) | 2005-04-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7897984B2 (en) | Light-emitting diode chip package body and packaging method thereof | |
| US9048352B2 (en) | Solid image-pickup device with flexible circuit substrate | |
| US6274890B1 (en) | Semiconductor light emitting device and its manufacturing method | |
| US8044412B2 (en) | Package for a light emitting element | |
| US9490404B2 (en) | Flip-chip light emitting diode package module and manufacturing method thereof | |
| TWI583018B (en) | Optical semiconductor device | |
| TW434646B (en) | Semiconductor device and method for making the same | |
| CN101241921B (en) | Optical device and method for manufacturing optical device, and camera module and endoscope module | |
| CN103843211B (en) | In the method for substrate over-assemble VCSEL chips | |
| TW201212297A (en) | Power surface mount light emitting die package | |
| TW200406912A (en) | Solid-state photographing apparatus and its manufacturing method | |
| TW201123366A (en) | Semiconductor package having electrical connecting structures and fabrication method thereof | |
| TW200820385A (en) | Semiconductor device and method for making the same | |
| KR102037866B1 (en) | Electronic device | |
| JP2015046513A (en) | Wavelength conversion member, light emitting device, and method of manufacturing light emitting device | |
| TWI250832B (en) | Electrical circuit apparatus and method for assembling same | |
| CN107123721B (en) | A kind of encapsulation structure and encapsulation method of LED with lens | |
| TWI244705B (en) | Light-emitting diode chip package body and packaging method thereof | |
| US20220415943A1 (en) | Image sensor packages and related methods | |
| JP3407131B2 (en) | Method for manufacturing semiconductor device | |
| TW200529387A (en) | Chip package structure | |
| TW200947652A (en) | Semiconductor chip package structure for achieving positive face electrical connection without using substrates and a wire-bonding process | |
| US20240178093A1 (en) | Semiconductor device, method for manufacturing semiconductor device, and electronic apparatus | |
| TW200929462A (en) | Chip, chip manufacturing method, and chip packaging structure | |
| KR20090031289A (en) | Flip Chip Structure and Manufacturing Method Thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |