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TWI244705B - Light-emitting diode chip package body and packaging method thereof - Google Patents

Light-emitting diode chip package body and packaging method thereof Download PDF

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Publication number
TWI244705B
TWI244705B TW93101125A TW93101125A TWI244705B TW I244705 B TWI244705 B TW I244705B TW 93101125 A TW93101125 A TW 93101125A TW 93101125 A TW93101125 A TW 93101125A TW I244705 B TWI244705 B TW I244705B
Authority
TW
Taiwan
Prior art keywords
light
layer
pad
metal layer
conductive
Prior art date
Application number
TW93101125A
Other languages
Chinese (zh)
Other versions
TW200514176A (en
Inventor
Yu-Nung Shen
Original Assignee
Yu-Nung Shen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yu-Nung Shen filed Critical Yu-Nung Shen
Priority to TW93101125A priority Critical patent/TWI244705B/en
Priority to US11/004,910 priority patent/US7339198B2/en
Publication of TW200514176A publication Critical patent/TW200514176A/en
Application granted granted Critical
Publication of TWI244705B publication Critical patent/TWI244705B/en
Priority to US12/007,276 priority patent/US7989817B2/en
Priority to US12/007,279 priority patent/US7576366B2/en
Priority to US12/007,285 priority patent/US7943403B2/en
Priority to US12/007,280 priority patent/US7897984B2/en
Priority to US12/007,278 priority patent/US7838895B2/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12041LED

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  • Led Device Packages (AREA)

Abstract

An LED chip package body includes an LED chip having a pad-installed surface, a plurality of pads installed on the pad-installed surface and a rear surface formed on an opposite side of the pad-installed surface. A light-reflecting coating is disposed on the pad-installed surface and has a plurality of exposed holes for exposure of the corresponding pads. A first insulative layer is formed on the light-reflecting coating and has a plurality of through holes communicating with the corresponding exposed holes. A second insulative layer is disposed on the rear surface and has a central through hole for exposure of a central portion of the rear surface. A lens is received in the central through hole. Each of a plurality of external connected conductive bodies is electrically connected to the corresponding pad and projects out of the corresponding through hole in the first insulative layer.

Description

五、發明說明(1) 【發明所屬之技術領域】 本發明·係有關於一種發光二極體 y於-種發光二極體晶片封裝體及 ::地,係 【先前技術】 了衣方法。 LED晶片。、猶曰曰曰片的焊塾係;:打線上的 線來與在該封裝基it及/或導線架上的接=二屬導 而,如此的結構在封裝時程上 電矾連接。然 於折斷以致於習知LED晶片封妒_二^,金屬導線係易 提升。w 曰曰片封衣體的產量與良率無法有效 此外,隨著晶片製程的進步,led 越小,以致於晶片上之焊墊的面 的尺寸係越來 此小之面積的焊墊執行打線處理Γ困難:此,要對具 【發明内容】 又印難的。 有釔^此本案發明人遂以其從事該行業少 驗,並本著精益求精之揞抽, 乂之夕年經 『發光二極體晶片封裝體及其二違遂有本發明 本發明之目的是為提供 體及其“裝方法。所述之問題的發光二極體晶片封裝 接n t:之一特徵’-種發光二極體晶片封事體r 被拯供,该發光二極體晶片封:一 2封凌體係 片,該發光二極體晶片1# I " 3 如先一極體晶 ^ 片具有—烊墊安裝表面、數個安裝於 1244705 五、發明說明(2) 4焊墊安裝表面 後表面;一光線 光二極體晶片的 發光二極體晶片 層,該表面絕緣 並且具有一用於 份的中 絕緣層 係設置 根 係被提 片,該 該焊墊 後表面 光二極 係形成 於該發 露該發 孔及數 件,該 上的焊墊、 反射塗層, 焊墊安裝表 之對應之焊 層係形成於 曝露該發光 一透光元件 央穿孔; 的中央穿 於該發光 據本發明之另一特徵 供,該發 發—"極 安裝表面 及一與該 該光線反 面上並且 墊的焊墊 該發光二 二極體晶 ,該透光 孔内;及數個導電凸 二極體晶片之一對應 種發 焊墊安 射塗層 具有數 曝露孔 極體晶 片之後 元件係 塊,每 的焊塾 光二極 裝表面 係設置 個用於 表 ;一光線 體晶片的 於碑光線 光二極體 光二極體 個用於曝 透光元件 導電凸塊,i每— 一對應的焊墊上 根據本發明 係被提供,該發 光二極體封 體晶片具有 上的焊墊、 反射塗層, 後表面上; 反射塗層上 晶片的焊塾 晶片之焊塾 露對應之焊 係設置於該 個導電凸塊 〇 之再一特徵 光二極體晶 裝體包含:一 一焊墊安 及一與該 該光線反 一絕緣保 ;一絕緣 女*裝表面 安裝表面 墊的焊墊 絕緣層的 係設置於 裝表面 焊墊安 線塗層 護層, 層,該 上並且之中^央 曝露孔 中央穿 該發光 片的後 表面之 設置於 一個導 上。 體晶片 光二極 、數個 裝表面 係設置 該絕緣 絕緣層 具有一 部份的 » 一透 孔内; 二極體 相對的 於該發 曝露該 面絕緣 表面上 中央部 該表面 電凸塊 封裝體 體晶 安裝於 相對的 於該發 保護層 係形成 用於曝 中央穿 光元 及數個 晶片之 :一種發光二極體晶片封 片封褒體包含:一絕緣基板V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a light-emitting diode y and a light-emitting diode chip package and :: ground, [previous technology] a method of coating. LED chip. The soldering system of the chip is as follows: the wire on the wire is connected with the connection on the packaging substrate it and / or the lead frame = two-general conductor. Such a structure is electrically connected on the packaging time history. However, it is broken so that it is known that the LED chip is jealous, and the metal wire system is easy to be lifted. w It is said that the yield and yield of the film coating body cannot be effective. In addition, with the progress of the wafer process, the smaller the led, the more the size of the surface of the pad on the wafer becomes smaller. Difficulties in dealing with Γ: Therefore, it is difficult to print with the invention. There is yttrium ^ The inventor of this case then used this industry to conduct a few inspections, and in the spirit of excellence, he has passed the "light-emitting diode chip package and its two violations. The purpose of the present invention is to In order to provide a body and its mounting method. The problem described above is a feature of a light-emitting diode chip package nt: a kind of light-emitting diode chip package r is provided, and the light-emitting diode chip package: A 2 sealed system chip, the light-emitting diode wafer 1 # I " 3 As the previous one, the wafer has a 烊 pad mounting surface, several mounted on 1244705, 5. Description of the invention (2) 4 solder pad mounting Surface rear surface; a light-emitting diode wafer layer of a light-emitting diode wafer, the surface is insulated and has a middle insulating layer for setting a root lifter, and the rear surface photodiode of the pad is formed on The hair holes and several pieces are exposed, and the corresponding solder layers on the pads, reflective coatings, and pad installation tables are formed in the central perforation that exposes the light-emitting light-transmitting element; the center of the light penetrates through the light-emitting book. Another feature of the invention is, the hair- ot; a pole mounting surface and a pad on the opposite side of the light and a pad of the light-emitting diode, in the light-transmitting hole; and one of several conductive convex diode wafers corresponding to a type of hair-pad The coating has element system blocks after a number of exposed hole polar body wafers, and each of the welding light diode surface is provided with a surface for the table; one light body wafer is inscribed on the monument light light diode and the light diode is used for exposing the light transmitting element. The conductive bumps are provided on the corresponding solder pads according to the present invention. The light-emitting diode package wafer has an upper pad, a reflective coating, and a rear surface; a solder wafer on the wafer with the reflective coating. The corresponding soldering system of the solder bump is provided on the conductive bump. Another characteristic light diode crystal body includes: a solder pad and an insulation protection against the light; an insulating female surface. The mounting pad insulation layer of the mounting surface pad is provided on the mounting pad of the mounting pad, and the coating layer is provided on a guide. The central and central exposure holes are arranged on a guide through the rear surface of the light-emitting sheet. Wafer light The two poles and several mounting surfaces are provided with a part of the insulating insulating layer »in a through hole; the diode is opposite to the hair and the central part of the surface on the surface of the insulating surface is exposed. On the opposite side, the protective layer is formed for exposing the central light-transmitting element and several wafers: a light-emitting diode wafer encapsulation sealing body includes: an insulating substrate

1244705 五、發明說明(3) 該絕緣基板具有 安裝區域具有_ 晶片安裝 表面 、一 至少一個 晶片安裝 數個貫通該晶片安裝表面 片安裝表面經由對應之貫 一基板絕緣層,該基板絕 板的該至少一個晶片安裝區域的晶 個晶片安 的背面、 個從該晶 電軌跡; 成有一用%曝露該至少 孔;至少 片係設置 有一焊塾 墊 及一 層,該光 的焊墊安 二極體晶 每個導電 應的焊墊 之晶片安 層,該導 在絕緣基 之間的空 晶片之後 根據 體係被提 板,該絕 一個發 於該絕 安裝表 與該焊 破反射 裝表面 片之對 凸體係 且係 裝表面 熱層係 板、該 間來被 着面上 本發明 供,該 緣基板 晶片, 該至少 光二極體 緣基板的 面、數個 墊安裝表 塗層係設 上並且具 應之焊墊 設置於該 與該絕緣基板之該 上之對應的導電轨 導熱材料 發光二極 該 區域,該至少 與έ亥晶片安裝 與5亥为面的貫 孔來延伸到該 緣層係形成於 片安裝表面上 裝區域之中央 至少一個發光 個晶片安裂區 焊墊安裝表面 安裝於該 面相對的後表面;_ 置於該至 有數個用 少一個發光 表面相對 月面的導 該絕緣基 而且係形 區域的開 二極體晶 域並且具 上的焊 線反射塗 極體晶片 措由把'一 至少一個 於曝露該至少一個發光 的焊墊曝露孔;數個導電凸體, 至少一個發光二極體晶片之一對 至少一個晶片安裝區域 ;一導熱 注入形成 體晶片與該等導電凸體 光二極體 跡電氣地連接 經由該I等貫孔 形成,及一形成於該至少一個發 的透光元件。 之又再一特徵,一 發光二極體晶片封 具有至少一個晶片 種發光二極體晶片封裝 裝體包含:一絕緣基 安裝區域,該至少一個1244705 V. Description of the invention (3) The insulating substrate has a mounting area with a _ wafer mounting surface, a plurality of at least one wafer is mounted through the wafer mounting surface, and a wafer mounting surface passes through a corresponding insulating layer of the substrate. A wafer mounting area has a back surface of the wafer, and a track from the crystal; a portion is exposed to at least the hole; at least the wafer is provided with a solder pad and a layer, and the light solder pad is provided with a diode crystal. A conductive layer of a conductive pad is mounted on the wafer, the guide is lifted according to the system after the empty wafer between the insulating bases, the absolute one is issued in the convex system of the insulation installation table and the welding reflection surface sheet, and The surface thermal layer system board is mounted on the surface, the edge substrate wafer, the surface of the at least photodiode edge substrate, a plurality of pad mounting surface coatings are provided and corresponding solder pads are provided. The area of the light-emitting diode of the conductive rail and the heat-conducting material corresponding to the upper part of the insulating substrate is installed at least on the surface of the chip and the surface of the substrate. The hole extends to the edge layer is formed at the center of the mounting area of the chip mounting surface. At least one light emitting wafer is installed in the cracked area. The mounting surface of the pad is installed on the opposite rear surface of the surface. The surface is opposite to the meniscus, and the insulating base and the open area of the diode region of the configuration area are provided with a reflective wire-coated polarized wafer. The at least one exposure pad exposes at least one of the pads; A plurality of conductive protrusions, at least one of the light emitting diode wafers to at least one wafer mounting area; a thermally conductive implant forming body wafer and the conductive convex light diode traces are electrically connected via the I and other through holes, and A light transmitting element formed on the at least one hair. Yet another feature is that a light emitting diode chip package has at least one wafer. The light emitting diode chip package includes: an insulating base mounting area, the at least one

第7頁 1244705 五、發明說明(4) 晶片安裝區 相對的背面 及數個從該 的導電軌跡 緣基板的該 係形成有一用於曝 的開孔;至少一個 體晶片係設置於該 且具有一焊墊安裝 11與該蟬 藉由把 焊墊、及 該導熱層係 域具有一晶片安裝 、數個 晶片安 ;一基 至少一 緣基板、該至少一 的空間來 對應之導 層在靠近 之厚度小 面;一形 成於該金 個導電凸 的焊墊上 晶片安裝 根據 係被k供 被形成; 氧凸體之 晶片之部 的厚度以 成於該絕 屬反射層 if係設置 且係與該 表面上之 本發明之 \該發光 片,該 貫通該晶片 裝表面經由 板絕緣層, 個晶片安裝 露該至少/ 發光二極體 絕緣基板的 表面、數個 墊安裝表面 一導熱材料 個發光二極 —形成於在 間之空間内 h具有一個 致於每個絕 緣材料層之 上的透明保 於該至少一 、絕緣基板之 對應的導電 另一特徵, 二極體晶片 體晶片具有 表面 安裝 對應 該基 區域 個晶 晶片 該至 安裝 相對 經由 體晶 界定 的絕 比在 緣才才 表面 護層 個發 該至 軌跡 -種 封裝 -焊 、一與該晶片 表面與該背面 之貝孔來延伸 板絕緣層係形 的晶片安裝表 片安裝區域之 ,該至少一個 少一個晶片安 於該焊墊安裝 的後表面;一 該等貫孔注入 片與該等導電 每一個開孔之 緣材料層,該 靠近基板絕緣 料層具有一凹 安裝表 的貫孔 到該背 成於該 面上而 中央區 發光二 裝區域 表面上 導熱層 形成在 凸體之 内壁面 絕緣材 層之部 陷的上 層;一 上的金屬反射 ;及數^固導電凸體, 光二極體晶片之一對 少一個晶片安裝區域 電氣地連接。 發光二極體晶 體包含:一發 塾安裝表面、 片封裝 光二極 數個安 面 面 絕 且 域 極 並 的 5 絕 間 與 料 份 表 形 每 應 之 體 體 裝 曰aPage 71244705 V. Description of the invention (4) The opposite side of the wafer mounting area and the conductive track edge substrate are formed with an opening for exposure; at least one body wafer is disposed thereon and has a The pad mounting 11 and the cicada have a wafer mounting, a number of wafers mounted on the pad, and the thermally conductive layer system; a base having at least one edge substrate, and the at least one space corresponding to the thickness of the conductive layer. A small surface; a wafer formed on the gold conductive bumps is mounted on the wafer according to the system k; the thickness of the wafer portion of the oxygen convex body is set on the absolute reflection layer if and is on the surface According to the present invention, the light-emitting sheet penetrates the surface of the wafer through a plate insulation layer, the surface of each wafer is mounted on the surface of the at least / light-emitting diode insulating substrate, a plurality of pad mounting surfaces, a heat-conductive material, and a light-emitting diode are formed In the interspace h, there is another feature that is transparent on top of each insulating material layer to ensure the corresponding conductivity of the at least one insulating substrate, and the diode chip body. The chip has a surface mount corresponding to a base wafer of the base area, and the relative installation is defined by the bulk crystal. The surface protection layer sends the track to the package-soldering, welding to the surface of the wafer and the back of the wafer. Holes to extend the board mounting surface of the board insulation layer system, the at least one less wafer is mounted on the rear surface of the pad mounting; an edge of each through-hole injection sheet and each of the conductive openings A material layer, the insulating material layer near the substrate has a through hole of a concave mounting table to the back formed on the surface and the central area of the light emitting area is formed on the surface of the heat conductive layer formed on the inner wall of the convex body An upper layer; a metal reflection on one; and a plurality of solid conductive bumps, one of the photodiode wafers is electrically connected to at least one wafer mounting area. The light-emitting diode crystal includes: a mounting surface, a chip package, a plurality of mounting surfaces, a plurality of surface areas, and a total of 5 domains and materials. The appearance of each body is as follows:

$ 8頁 Α、發明說明(5) ------ 的ί 5女ί表面上的焊墊、及一與該焊墊安裝表面相對 發i:極雕:ί線t射ϊ層,該光線反線塗層係設置於該 發光一極:曰:的*干墊女裝表面上並且具有-用於曝露該 :先一極脰日-日片之對應之焊墊的焊墊曝露孔丨一透光元 ’該透光7L件係設置於該發光二極體晶片的後表面上; 晶,t ί 每一個導電凸塊係設置於該發光二極體 曰曰片之一對應的焊墊上。 紐 的封Γίί::;;::::種發光二極體晶片繼 -發光二極:ίΐ 封裝方法包含如下之步驟:提供 面、數個安^ =片,该發光二極體晶片具有一焊墊安裝表 安裝ίΐΓί 焊墊安裝表面上的焊塾、及一與該焊墊 極5晶片的γ 2 ί t面;設置一光線反射塗層於該發光二 於曝露該發‘ 一:^ f:上’該光線反射塗層具有數個用 成-表面絕對應之焊墊的焊墊曝露孔1 絕緣層具有一^於=二、一極體晶片的後表面上,該表面 部份的中身穿孔·;二路該發光二極體晶片之後表面之中央 穿孔内;及:姑政,置一透光元件於該表面絕緣層的中央 凸塊。;μ χ—極體晶片之每個焊^墊上設置一導電 根據本發明之再一 的封裝方%係被提供,種發光二極體晶片封裝體 光二極體晶片,方法包含如下之步驟··提供一發 數個安裝‘該π二ϊ $二極體晶片具有一焊塾安裝表面、 表面相對的二女表表面上的焊墊、及一與該焊墊安裝 、’於該發光二極體晶片的後表面上設置 1244705 五、發明說明(6) 1 -- 一光線反射塗層;於該光線反射塗層上形成一絕緣保護 層,於該發光二極體晶片的焊墊安裝表面上形成一絕緣 層’該絕緣層具有一用於曝露該發光二極體晶片之焊墊安 裝表面之中央部份的中央穿孔及數個用於曝露對應之焊墊 的焊墊曝露孔;於該絕緣層的中央穿孔内設置一透光元 件,及於f亥發光二極體晶片的每個焊墊上設置一導電凸 塊0 根 體的封裝方法 供一絶緣基t板 有一焊 的焊墊、及一 明之又再一特徵,一種發光二 係被提供,該 ,該絕緣基板 片安裝區域具 對的背面、數 數個從該晶片 導電軌跡;於 表面上 一用於曝露該 提供至少一個 片安裝表 該晶片安 面經由對 基板的該 基板絕緣 個晶片安 極體晶片 板的該I至 數個安裝 表面相對 安裝表面 個用於曝 墊曝露孔 置一導電 封裝方法包含如下之步 具有至少一個晶片安裝 片封裝 驟:提 區域, 與該晶 裝表面與該背 應之貫孔來延 個晶片 基板絕 層,該 裝區域之中央 ’該至少一個 少一個晶片安 墊安裝 該至少 片安裝 面的貫 伸到該 安裝區 緣層係 區域的 發光二 裝區域 表面上 該至少 反射塗 發光二 個發光 一個晶 表面相 孔、及 背面的 域晶 形成有 開孔; ϋ體晶 並為具 一個發 層,該 極气晶 一核體 片安裝 片係設 光二極 光線反 片之對 晶片之 置於該 墊安裝 與該焊 體晶片 射塗層 應之焊 每個焊 有一晶 個貫通 安裝表 該絕緣 形成一 至少一 發光二 絕緣基 表面、 墊安裝 的焊墊 具有數 墊的焊 墊上設 面 至少一 於該焊 的後表 上設置 露該至 ;於該 凸體, 面;於 一光線 少一個 至少一 該等導$ 8 页 Α 、 Description of the invention (5) ------ 5 female solder pads on the surface, and a surface opposite to the mounting surface of the solder pad i: pole carving: ί line t ϊ, the The anti-light line coating is provided on the light emitting pole: said: * dry pad women's surface and has-for exposing the: the first pole the next day-the corresponding pad exposure hole of the pad 丨A light-transmitting element, the light-transmitting 7L piece is disposed on the rear surface of the light-emitting diode wafer; each of the conductive bumps is disposed on a corresponding pad of the light-emitting diode wafer. . The seal of a button is a kind of light-emitting diode wafer followed by a light-emitting diode: The packaging method includes the following steps: providing a surface and a number of ^ = pieces, the light-emitting diode wafer has a Pad installation table installation ίΐΓί Welding pads on the pad mounting surface, and a γ 2 ί t face with 5 pads of the pad electrode; a light reflecting coating is provided on the light-emitting layer to expose the hair 'a: ^ f : Top 'The light-reflective coating has several pad exposure holes that are made of pads that absolutely correspond to the surface. 1 The insulating layer has a rear surface on the back of the polar wafer, and the middle part of the surface part. Perforation; two-way inside the central perforation of the rear surface of the light-emitting diode wafer; and: placing a light transmitting element on the central bump of the surface insulation layer. ; Μ χ—Each pad of a polar wafer is provided with a conductive package according to yet another aspect of the present invention. The package is provided with a light-emitting diode wafer package and a photodiode wafer. The method includes the following steps. · Provide a number of mountings 'the π diode 具有 $ diode wafer has a welding pad mounting surface, two pads on the surface of two female surfaces opposite to each other, and a mounting pad with the pads,' on the light emitting diode 1247705 is provided on the rear surface of the wafer. 5. Description of the invention (6) 1-a light reflecting coating; an insulating protection layer is formed on the light reflecting coating, and is formed on the pad mounting surface of the light emitting diode wafer An insulation layer 'The insulation layer has a central perforation for exposing the central portion of the pad mounting surface of the light emitting diode wafer and several pad exposure holes for exposing the corresponding pad; A light-transmitting element is arranged in the central perforation, and a conductive bump is provided on each bonding pad of the light-emitting diode wafer, and a packaging method is provided for an insulating substrate with a soldering pad, and Yet another feature, a The optical system is provided. The insulating substrate sheet mounting area has a pair of back surfaces, several conductive traces from the wafer, and a surface for exposing the provided at least one sheet mounting table. The wafer mounting surface passes through the substrate. The substrate is insulated from the wafer, and the mounting surface of the wafer body is opposite to the mounting surface. A conductive packaging method for exposing the exposure holes of the mounting plate includes the following steps: at least one wafer mounting sheet is packaged. The wafer mounting surface and the corresponding through hole extend through the wafer substrate insulation, and the center of the mounting area is' the at least one less wafer mounting pad is mounted to extend from the mounting surface to the edge layer area of the mounting area. On the surface of the light-emitting two-packed area, at least two light-reflecting light-emitting two light-emitting and one crystal surface holes are formed on the surface, and the domain crystals on the back are formed with openings; A pair of wafers with a photodiode light reflector is placed on the pad, and the wafer coating of the weld body should be welded. Through the installation table, the insulation forms at least one light-emitting two insulating base surface, the pad-mounted pad has several pads, and at least one of the pads has a surface on the back surface of the welding; on the convex body, the surface; One light less than one at least one

第10頁 1244705Page 10 1244705

五、發明說明(7) 電凸體係與今 安裝表面緣基板之該至少一個晶片安裝區域之晶片 材料經由該=應的導電軌跡電氣地連接;藉由把〆導熱 二極體晶I蛊二^注入形成在絕緣基板、該至少〆個發光 及於該至少二厂等導電凸體之間的空間來形成〆導熱層: 件。 固發光二極體晶片之後表面上設置一透光元 根據本發日月> 裝體的封#古再另一特徵,一種發光二極體晶片封 提供ml 提供,該封裝方法包含如下之步驟: 域,^ 亥絕緣基板具有至少一個晶片安裝區 該晶ί安二:::曰曰片安襄區域具有-晶片安裝表面、-與 該北&衣表面相對的背面、數個貫通該晶片安裝表面與 21^的、孔、及數個從該晶片安裝表面經由對應之貫孔 到該背面的導電軌跡;於該絕緣基板的該至少一個 =力安裝區域的晶片安裝表面上形成一基板絕緣層,該基 f、、’巴緣層係形成有一用於曝露該至少一個晶片安裝區域之 2央區域的開孔;提供至少一個發光二極體晶片,該至少 一個發光3極體晶片係設置於該絕緣基板的該至少一個曰 2 f裝區域並且具有一焊墊安裳表面、數;個安裝於該焊g 女哀表面上的焊墊、及一與該焊墊安裝表面相對的後表 面;藉由把一導熱材料經由該等貫孔注入形成在絕 該至之一個發光二極體晶片與該等導電凸體之間二空 間來形成一導熱層;於在界定每一個開孔之内壁面與對應 f T電凸體之間之空間内形成-絕緣材料層,該絕緣材料 層在靠近晶片之部份具有一個比在靠近基板絕緣層之部份 1244705 ⑻V. Description of the invention (7) The electroconvex system is electrically connected to the wafer material of the at least one wafer mounting area of the mounting surface edge substrate via the corresponding conductive track; by using the 〆 thermally conductive diode crystal I 蛊 二 ^ A space formed between the insulating substrate, the at least one light-emitting body, and the conductive protrusions such as the at least two factories is implanted to form a heat-conducting layer. A light-transmitting element is provided on the surface of the solid-state diode chip. According to another feature of the present day and month ' s package # 古 再, a light-emitting diode chip package is provided in ml. The packaging method includes the following steps : Domain, ^ The insulating substrate has at least one wafer mounting area. The crystal An: 2 :: Anxiang area has-a wafer mounting surface,-a back surface opposite the north & clothing surface, a number of through the wafer The mounting surface and 21 ^, holes, and a plurality of conductive tracks from the wafer mounting surface to the back surface through corresponding through holes; a substrate insulation is formed on the wafer mounting surface of the at least mounting area of the insulating substrate Layer, the base f, and the rim layer are formed with an opening for exposing the two central regions of the at least one wafer mounting region; providing at least one light emitting diode wafer, the at least one light emitting diode wafer system is provided The at least one 2F mounting area on the insulating substrate has a pad mounting surface, a number of pads, a pad mounted on the padding surface, and a rear surface opposite to the pad mounting surface. ; Forming a thermally conductive layer by injecting a thermally conductive material through the through holes into two spaces formed between a light emitting diode wafer and the conductive protrusions; within the boundaries of each opening An insulating material layer is formed in the space between the wall surface and the corresponding f T electric convex body, and the insulating material layer has a portion closer to the wafer than a portion closer to the substrate insulating layer 1244705 ⑻

、發明說明 ^厚f ^、的厚度以致於每個絕緣材料層具有一凹陷的上表 ;该絕緣材料層之表面上形成一金屬反射層;於該金 射層上形成一透明保護層;及於該至少一個發光二極 ^ = f之每個焊墊上形成〆導電凸塊,該等導電凸塊係與 X、巴緣基板之該至少一個晶片安裝區域之晶片安裝表面上 之對應的導電執跡電氣地連接。 、根據本發明之再另一特徵,一種發光二極體晶片封裝 丑的封I求法係被提供,該封裝方法包含如下之步驟:提 仏 發光二極體晶片,該發光二極體晶片具有一焊墊安裝 表面數個安裝於該焊墊安裝表面上的焊墊、及一與該焊 塾安裝表面相對的後表面;於該發光二極體晶片的焊墊安 义表面上置一光線反射塗層,該光線反射塗層具有一用 於曝露該發光二極體晶片之對應之焊墊的焊墊曝露孔;於 g發光二極體晶片的後表面上設置一透光元件;及於該發 光二極體晶片之每個焊墊上設置一導電凸塊。 【實施方式】 在本發明被詳細說明之前,應要注意的是,在整個說 明書中,相似的元件係由相同的標號標示卜另一方面,為 了清楚揭示本發明之特徵,該等附圖並不是按照元件實際 的尺寸及不是按照真實比例來描繪。 第一气四圖是為以製造步驟方式顯示本發明之第一較 佳實例之LEXD晶片封裝體的示意剖視圖。 晴參閱第一圖所示,一發光二極體(led)晶片10係首 先被提供。該LED晶片1〇是為一個尚未從一晶圓(wafer)Description of the invention ^ thick f ^, so that each insulating material layer has a recessed upper surface; a metal reflective layer is formed on the surface of the insulating material layer; a transparent protective layer is formed on the gold shot layer; and 〆 conductive bumps are formed on each of the pads of the at least one light emitting diode ^ = f, and the conductive bumps are corresponding to the conductive pads on the wafer mounting surface of the at least one wafer mounting area of the X and B substrate The traces are electrically connected. According to still another feature of the present invention, a light-emitting diode chip packaging method is provided. The packaging method includes the following steps: lifting a light-emitting diode wafer, the light-emitting diode wafer having a Pad mounting surface Several pads mounted on the pad mounting surface and a rear surface opposite to the pad mounting surface; a light reflecting coating is placed on the pad surface of the light emitting diode wafer. Layer, the light reflecting coating has a pad exposure hole for exposing a corresponding pad of the light emitting diode wafer; a light transmitting element is provided on the rear surface of the light emitting diode wafer; and the light emitting A conductive bump is disposed on each pad of the diode wafer. [Embodiment] Before the present invention is described in detail, it should be noted that throughout the specification, similar elements are denoted by the same reference numerals. On the other hand, in order to clearly disclose the features of the present invention, the drawings and It is not drawn according to the actual size of the element and not to the true scale. The first diagram is a schematic cross-sectional view of a LEXD chip package showing a first preferred embodiment of the present invention in the form of manufacturing steps. As shown in the first figure, a light emitting diode (LED) chip 10 is first provided. The LED chip 10 is a wafer which has not yet been removed from a wafer.

第12頁 1244705 五、發明說明(9) 切割出來的晶片,也就是說,本發明的發光二極體晶片封 I體之封裝方法是為一種晶圓級封裝方法。當然,該晶片 也可以是為一個已從一晶圓切割出來的晶片。 該LED晶片10具有一個安裝有數個焊墊102的焊墊安 裝表面1 0 〇及一個與該焊墊安裝表面1 〇 〇相對的後表面 ^01 。在本實施例中,兩個焊墊1〇2係被安裝於該料墊安 裝表面100上。然而,應要了解的是,焊墊1〇2的數目並 不受限於兩個,其係端視應用而定。 —光線反射塗層1 1係被設置於該LED晶片1 〇的焊墊安 / ^面1 0 Q上。该光線反射塗層1 1係由任何適合的材料形 成並且具或數個用於曝露對應之焊墊丨0 2的焊墊曝露孔 請參 於每一個 該等凸體 光阻材料 射塗層11 然後對該 另一 於該LED 絕緣層1 3 表面101 理來在中 中央部份 閱第二圖 焊墊1 0 2 1 2係由像 製成。該 上以光阻 凸體形成 方面,一 曰\片1 0的 係由感光 上之後, 央部份形 的中央穿 所示,在光 上係形成有 聚醯亞胺 等凸體1 2的 材料形成一 層進行曝光 由光阻材料 後表面1 0 1 油墨製成。 該表面絕緣 成一用於曝 孔 1 3 0 〇 線反射塗層1 1的 一凸體1 2。在本 (polyimide)及 形成係藉由首先 凸體形成層(圖 和顯影等處^理來 製成的表面絕緣 上。在本貫施例 在形成於該LED 層1 3係經由曝光 露該晶片1 0之後 形成之後, 實施例中, 其類似般的 在該光線反 中未示)而 達成。 層1 3係形成 中,該表面 晶片1 0的後 和顯影等處 表面1 0 1 之Page 12 1244705 V. Description of the invention (9) The diced wafer, that is, the packaging method of the light-emitting diode chip package I of the present invention is a wafer-level packaging method. Of course, the wafer may be a wafer that has been cut from a wafer. The LED chip 10 has a pad mounting surface 100 on which a plurality of pads 102 are mounted, and a rear surface ^ 01 opposite to the pad mounting surface 100. In this embodiment, two pads 102 are mounted on the pad mounting surface 100. It should be understood, however, that the number of pads 102 is not limited to two, and the system end depends on the application. —The light-reflective coating layer 11 is provided on the pad mounting surface 10 Q of the LED chip 10. The light-reflective coating 11 is formed of any suitable material and has a plurality of pad exposure holes for exposing corresponding pads. 0 2 Please refer to each of these convex photoresist material coatings 11 Then the second pad 101 on the surface of the LED insulation layer 1 3 is read in the middle and middle part. The second pad 1 0 2 1 2 is made of an image. In terms of the formation of photoresistive convex bodies, after the photoresist is applied, the central part of the central shape is shown on the surface. The material on the light is formed with convex bodies such as polyimide. Forming a layer for exposure is made of 1 0 1 ink on the rear surface of the photoresist material. The surface is insulated as a convex body 12 for the exposure hole 1330 line reflective coating 1 1. The polyimide and the formation are formed on the surface insulation by firstly forming a convex body forming layer (images, development, etc.). In this embodiment, the LED layer 13 formed on the LED layer is exposed through exposure. After the formation after 10, in the embodiment, it is similarly not shown in the light reflection). During the formation of layer 1 3, the surface of the wafer 10 and the surface of the developing surface 1 0 1

1244705 五、發明說明(10) 接著,請參閱第三圖所示,於該LED晶片1 〇的每,個 焊墊1 0 2 上係形成有一第一金屬層1 4以致於該焊墊1 〇 2的 表面和在該焊墊1 0 2上的凸體1 2係由該第一金屬層1 4覆 蓋。在本實施例中,該等第一金屬層1 4係由鋁形成。然 而’應要了解的是,該第一金屬層丨4亦可以由其他任何適 合的金屬材料形成。 然後,^在每一個第一金屬層1 4上係形成有一第二金屬 層15 ’因此,每個凸體12及其之對應的第一和第二金屬層 1 4和1 5 —起形成一導電凸塊。在本實施例中,每一個第二 金屬層15係由一鎳層150與一金層151組成。 *最後’ 一透光元件丨6係設置於該後表面絕緣層丨3的中 $穿孔130.&内。在本實施例中,該透光元件16係以聚醯亞 胺為材料來被形成並且具有一圓弧形的頂端部份。铁而, :透土元件16亦可以由任何適合的材料與任何適合的、方法 來被设置。例如,該透光元件1 6係能夠以適合的材料辜弁 製造而成,^而然後再被設置於該表面 内。 曰〜τ天牙孔 =要注意的是,該透光元件丨6係可以^依需要來 埭-ί::?當的偏光劑以致於從該透光元件16射出的L 線旎夠具有合意的顏色。 ⑺出的先 應要,解的是,在本實施例中, 金般的金屬形成該凸體12亦可以由像 …屬層“和15係可以被免除。或者,如在第十士日:中1244705 V. Description of the invention (10) Next, referring to the third figure, a first metal layer 14 is formed on each of the pads 10 of the LED chip 10, so that the pad 1 〇 The surface of 2 and the protrusions 12 on the pads 102 are covered by the first metal layer 14. In this embodiment, the first metal layers 14 are formed of aluminum. However, it should be understood that the first metal layer 4 can also be formed of any other suitable metal material. Then, a second metal layer 15 ′ is formed on each of the first metal layers 14. Therefore, each convex body 12 and its corresponding first and second metal layers 14 and 15 are formed together. Conductive bump. In this embodiment, each of the second metal layers 15 is composed of a nickel layer 150 and a gold layer 151. * Finally, a light-transmitting element 6 is disposed in the through hole 130. & of the rear surface insulating layer 丨 3. In this embodiment, the light-transmitting element 16 is formed using polyimide as a material and has a rounded top portion. However, the permeable element 16 may also be provided from any suitable material and any suitable method. For example, the light-transmitting element 16 can be made of a suitable material, and then placed in the surface. ~ Τ 天 牙 孔 = It should be noted that the light-transmitting element 6 series can be used as needed. 埭 ::? The polarizing agent is such that the L-line ray emitted from the light-transmitting element 16 is sufficient. s color. The first requirement is the solution. The solution is that in this embodiment, the convex body 12 formed of gold-like metal can also be exempted from the series of "..." and 15 series. Or, as on the tenth day: in

料形成。然而,請夂㈣+岡所_ °豕凸妝12係由先阻材 1244705 五、發明說明(11) 所示’在以光阻材料形成凸體1 2之前,於每個焊墊1 〇 2上 係形成一界接金屬層2 8。應要注意的是,在本發明中所揭 露之導電凸塊並不受限於在此中所描述的類型和形成方U 式。只要是適於與外部電路電氣連接的話,各式各樣的導 電凸塊和其之形成方式係可應用在本發明。例如,在中華 民國專利申請案第8 9 1 0 0 5 78人03號案和第92 1 1 2 1 6 5號安1 所揭露的導電凸塊及其之形成方式亦可應用於本中 以上外述之LED晶片封裝體具有如下之優點·· 1·該LED晶片封裝體的整體尺寸係與該LED晶片 ,寸大致相同,因此係比目前市面上可得之稱為"〇6〇3"、 0804 、及” 0402"等等之LED晶片封裝體的尺寸小报 2·免%打線處理使整個封裝時程縮短, 產量與良率。 ’双耗升 第五圖疋為顯不本發明楚— — 體晶片封裝體的示意剖視圖。 &貝施例之發光二極 請參閱第五圖所示,本較佳實施例之 封裝體與靜一較佳實施例之 。體日日片 地方是僅在於該透光元件桎體日日片封裝體不同的 平坦的頂端部份 件17係經由研磨•來被形成有— 第/、圖是為顯示本發明二 — 體晶片封气體的部份示意剖視圖了乂土 κ施例之發光二極 請參閱第六圖所示,本 的地方係僅在於進一步包人 /人μ 一較佳實施例不同 的第二透光元件18。該等 二亥^件17之上 九兀仵17,18可以被摻雜有不料 formation. However, please 夂 ㈣ + 所 所 _ ° 豕 The convex makeup 12 is made of the first resisting material 1244705 V. The description of the invention (11) 'Before forming the convex body 12 with a photoresist material, put it on each pad 1 2 The upper system forms a boundary metal layer 28. It should be noted that the conductive bumps disclosed in the present invention are not limited to the types and formation methods described herein. As long as it is suitable for electrical connection with an external circuit, various conductive bumps and their forming methods can be applied to the present invention. For example, the conductive bumps disclosed in the Republic of China Patent Application No. 8 9 1 0 0 5 78 No. 03 and No. 92 1 1 2 1 6 5 An 1 and their formation methods can also be applied to the above The externally described LED chip package has the following advantages: 1. The overall size of the LED chip package is approximately the same as that of the LED chip, so it is called " 〇6〇3 ";, 0804, and "0402", etc., LED chip package size tabloids 2 · Free% wiring processing shortens the entire package time, yield and yield. 'The fifth picture of double consumption rise is clearly invented. — — A schematic cross-sectional view of a body chip package. &Amp; The light emitting diode of the Bayesian embodiment is shown in FIG. 5, the package body of this preferred embodiment and the one of the preferred embodiment. Only the flat top part 17 which is different from the light-transmitting element body and the sun-chip package is formed by grinding. The first and second figures are for showing the second part of the present invention. Schematic cross-sectional view of the light-emitting diode of the ochre κ embodiment This place is only for further enlarging the second light transmitting element 18 which is different from the preferred embodiment. These two light-transmitting elements 17 and 18 may be doped with different

1244705 五、發明說明(12) 同波長之魂當的偏光劑以致於從該第二透光元件18射出的 光線可以具有由兩種顏色調和出來的顏色。 第七至九圖是為顯示本發明之第四較佳實施例之發光 二極體晶片封裝體的示意剖視圖。1244705 V. Description of the invention (12) The polarizing agent with the same wavelength as the soul so that the light emitted from the second light-transmitting element 18 may have a color blended by two colors. 7 to 9 are schematic cross-sectional views showing a light emitting diode chip package according to a fourth preferred embodiment of the present invention.

、f簽閱第七圖所示,一發光二極體(LED)晶片1〇係首 先被提L ^LED晶片1 〇具有一個安裝有數個焊墊丨02的 知墊女衣表面1 〇 〇及一個與該焊墊安裝表面丨〇 〇相對的後 表,1+01 。在本實施例中,兩個焊墊102係被安裝於該焊 墊=衣ί面10 〇上。然而,應要了解的是,焊墊1 〇 2的數 目並不文气於兩個,其係端視應用而定。 光、、在反射塗層1 1係被設置於該L E D晶片1 〇的後表面 101 上。 由光阻f料製成的絕緣保護層1 9係形成於該反射塗 層11上。在本實施例中,該絕緣保護層1 9係由感光油墨製 成。 夂 另方面’一由光阻材料製成的表面絕緣層2 〇係形成 於該LED晶片1〇的焊墊安裝表面1〇〇 i。在本實施例中, 該表面絕緣層2 0係由感光油墨製成。: 曰,著’.¾如在第八圖中所示,在形成於該LEd晶片1 0的 焊墊安装表面1 0 〇 i之後,該表面絕緣層2 〇係經由曝光和 顯影等處ί里來形成—用於曝露該led曰曰曰片1〇之焊墊安裝表 面1 00之中央部份的中央穿孔2〇〇和數個形成於一對應之 焊墊102上的凸體12。 接著,4如在第九圖中所示,於該LED晶片1〇的每一個 1244705And f, as shown in the seventh figure, a light-emitting diode (LED) wafer 10 is firstly lifted. L ^ LED wafer 10 has a pad surface with a plurality of solder pads. 02 A back table opposite the pad mounting surface, 1 + 01. In this embodiment, two solder pads 102 are mounted on the solder pad = clothing surface 100. However, it should be understood that the number of pads 102 is not as small as two, and the end depends on the application. The light-reflective coating 11 is provided on the rear surface 101 of the LED wafer 10. An insulating protective layer 19 made of a photoresist f material is formed on the reflective coating 11. In this embodiment, the insulating protective layer 19 is made of a photosensitive ink.夂 On the other hand, a surface insulation layer 20 made of a photoresist material is formed on the pad mounting surface 100i of the LED chip 10. In this embodiment, the surface insulating layer 20 is made of a photosensitive ink. : As shown in the eighth figure, after the pad mounting surface 1 0 〇i formed on the LEd wafer 10, the surface insulation layer 2 0 is exposed through exposure and development, etc. To form—a central perforation 200 for exposing the central portion of the pad mounting surface 100 of the LED sheet 10 and a plurality of convex bodies 12 formed on a corresponding pad 102. Next, as shown in the ninth figure, each of the LED chips 10 is 1244705.

五、發明說明(13) 丈干塾1 0 2上形成一第一金屬層丨4以致於該焊墊丨〇 2的表面 和=該焊墊102上的凸體12係由該第一金屬層14覆蓋。在 本貝施例中’該等第一金屬層丨4係由鋁形成。然而,應要 了解的是,' 該等第一金屬層丨4亦可以由其他任何適合的金 屬材料形成。 iW k,於每一個第一金屬層丨4上係形成一第二金屬層 1 5,因此,每個凸體丨2及其之對應的第一和第二金屬層 和15 —起幾成一導電凸塊。每一個第二金屬層以係由一鎳 層15〇與一金層151組成。 而最後,一透光元件17係設置於該表面絕緣層20的中央 穿孔20 0内。在本實施例中,該透光元件17係以聚醯亞胺 為材料形成。然而,該透光元件丨7亦可以由任何適合的材 料與任何逾合的方法來形成。 第十二至十八圖是為以製造步驟方式顯示本發明之第 五較佳實施例之發光二極體晶片封裝體的示意剖視圖。 請參閱第十二和十三圖所示,至少一個發光二極體 (L E D)晶片l 1 〇係首先被提供。該l e D晶片1 〇具有一個設置 有數個丨干塾102的焊塾安裝表面100及一 個與該焊塾安f 表面1 0 0相對的後表面1 0 1 。與以上的實施例相同,兩個 焊墊1 0 2係被安裝於該料墊安裝表面1 0 0上。然而,應要 了解的是,焊塾1 0 2的數目並不受限於兩個,其係端視廣 用而定。& 一光線反射塗層1 1係被設置於該L E D晶片1 〇的焊墊安 裝表面1 0 0上。該光線反射塗層1 1具有數個用於曝露對應V. Description of the invention (13) A first metal layer is formed on the stem 1 102, so that the surface of the pad 〇2 and the protrusion 12 on the pad 102 are formed by the first metal layer. 14 cover. In this embodiment, the first metal layers 4 are formed of aluminum. However, it should be understood that the first metal layers 4 may also be formed of any other suitable metal material. iW k, a second metal layer 15 is formed on each of the first metal layers 丨 4, so each convex body 丨 2 and its corresponding first and second metal layers and 15 are almost electrically conductive. Bump. Each second metal layer is composed of a nickel layer 150 and a gold layer 151. Finally, a light transmitting element 17 is disposed in the central through hole 200 of the surface insulating layer 20. In this embodiment, the light-transmitting element 17 is made of polyimide. However, the light-transmitting element 7 can also be formed of any suitable material and any combination method. Twelfth to eighteenth drawings are schematic cross-sectional views showing a light emitting diode chip package according to a fifth preferred embodiment of the present invention in the form of manufacturing steps. Please refer to the twelfth and thirteenth figures. At least one light emitting diode (LED) wafer 110 is first provided. The LED chip 100 has a welding electrode mounting surface 100 provided with a plurality of wafers 102 and a rear surface 10 1 opposite to the welding surface f 0 1 0. Similar to the above embodiments, two pads 102 are mounted on the pad mounting surface 100. However, it should be understood that the number of welding pads 102 is not limited to two, and the system end depends on wide use. & A light reflecting coating 11 is provided on the pad mounting surface 100 of the LED chip 100. The light-reflective coating 11 has several

12447051244705

之焊墊1 0 2的焊墊曝露孔1 j 〇 接著 實施例中 成。該等 以光阻材 體形成層 ,·於每一個 ,該凸體1 2 凸體1 2的形 料形成一凸 奸塾102上係形成有一凸 進行曝光和 ,於該L E D 屬層1 4以致 上的凸體1公係由該第 屬層1 4係由 1 4亦可以由 隨後 一第一金 等第一金 一金屬層 然後 層1 5 ,因 1 4 和 1 5 _ 鎳層150 係由像聚醯亞胺 成係猎由首先在 體形成層(圖中 顯影等處理來達 晶片1 0的每一個 於該焊墊1 0 2的 一金屬層14覆蓋 症呂形成。然而, 其他任何適合的 在每一個第一金屬層14上 气,每個凸體I2及其之對應 起形成一導電凸塊。每一個 與一金層151組成。 荨等般的 該光線反 未示)而 成。 焊墊1 0 2 表面和在 。在本實 應要了解 金屬材料 係形成有 光阻材料製 射塗層1 1上 然後對該凸 上係形成有 該焊墊1 0 2 施例中,該 的是,該第 形成。 一第二金屬 的第一和第二金屬層 第二金屬層15係由一 現在睛蒼閱第十四和十五圖所示,一絕緣基板2丨係被 提供。該絕緣基板21具有數個晶片安裝區域21()。該等晶 1安裝區域210各具有一晶片安裝表面21j 、一與該晶片 安裝表面2 1 1相對的背面2 1 2 、數個貫通該晶片安裝表面 211與該背面212的貫孔213 、及數個從該晶片安裝表面 2 11經由一對應之貫孔2 1 3來延伸到該背面2丨2的導電執 跡2 14 。气本較佳實施例中,每一個晶片安裝區域21〇之 貝孔2 1 3的數目係與對應之L E D晶片1 ◦之焊墊1 〇 2的數目 相等。 ΜThe pad exposure hole 1 j of the pad 10 2 is then formed in the embodiment. The photoresist material is used to form a layer. In each case, the shape of the convex body 1 2 and the convex body 12 form a convex ridge 102. A convex is formed on the LED for exposure and the LED belongs to the layer 14. The convex body 1 on the first layer is composed of the first layer 14 and the first layer 14 may also be composed of a first gold and a first metal and then a metal layer and then a layer 1 5, because the layers 1 4 and 1 5 _ nickel layer 150 are A polyimide-based system is formed by first forming layers in the body (development and other processing in the figure to reach each of the wafers 10 and a metal layer 14 covering the pads 102). However, any other suitable It is formed on each of the first metal layers 14, and each of the convex bodies I2 and the corresponding one forms a conductive bump. Each is composed of a gold layer 151. The light like the net is not shown). Pad 1 0 2 surface and at. In this embodiment, it should be understood that the metal material is formed with a photoresist material-based radiation coating layer 1 1, and then the solder pad 10 is formed on the convex system. In this embodiment, the first layer is formed. First and second metal layers of a second metal The second metal layer 15 is provided by an insulating substrate 2 as shown in Figs. 14 and 15 of the present invention. The insulating substrate 21 includes a plurality of wafer mounting areas 21 (). Each of the crystal 1 mounting areas 210 has a wafer mounting surface 21j, a back surface 2 1 2 opposite to the wafer mounting surface 2 1 1, a plurality of through holes 213 penetrating the wafer mounting surface 211 and the back surface 212, and a number of A conductive track 2 14 extending from the wafer mounting surface 2 11 to the back surface 2 1 2 through a corresponding through hole 2 1 3. In the preferred embodiment, the number of bevel holes 2 1 3 in each wafer mounting area 21 is equal to the number of corresponding pads 102 in the LED chip 1 ◦. Μ

m ii 第18頁 1 1244705 五、發明說明(15) ”在本貝施例中,5亥、纟巴緣基板2 1為一陶瓷基板,然而, -蜿緣基麵2 1亦可以是為由其他絕緣材料製成的基板,例 如’玻璃基板。 然後’如在第十六圖中所示,一基板絕緣層22係形成 於整個絕緣基板21的晶片安裝表面211上。在本實施例 中5亥基板、纟巴緣層22係由光阻材料製成而且係經由曝光與 顯影等處理、來形成有數個用於曝露對應之晶片安裝區域 21 0之中央區域的開孔22〇 。隨後,於界定每個開孔22〇 的内壁面上係形成有一反光塗層23。 接著,明參閱第十七圖所示,數個如上所述被製備的 \ED晶片i(j係被置於對應的晶片安裝區域21〇内而且在該 曰曰片1 0之焊墊1 〇 2上的導電凸塊係經由一導電體2 4來與在 晶片安裝表面211上之對應的導電執跡214電氣連接Ϊ ♦然後,如在第十八圖中所示,一導熱材料係經由該等 貫孔213來被注入形成在絕緣基板21、對應之LED晶片 10、與對磨之導電體24之間的空間來形成導熱層26。該導 熱材料可以是為金屬絕緣導熱材料或者非金屬絕緣導熱材 另一方面,於每個led晶片10上係形成有一透光元件 25。該透气元件25係由與以上所述之較佳實施例相同的 料及相同的方式形成。 一最後’該絕緣基板2 1係依需要來被切割成數個個別的 發光二極體封裝體。例如,每個發光二極體封裝體可以包 含一個晶片安裝區域210或者可以包含九個成矩陣方式^m ii p. 18 1 1244705 V. Description of the invention (15) ”In the example of the present example, the substrate 5 1 and the edge substrate 21 is a ceramic substrate, however,-the base surface 2 1 of the winding edge can also be the reason A substrate made of other insulating materials, such as a 'glass substrate.' Then, as shown in FIG. 16, a substrate insulating layer 22 is formed on the wafer mounting surface 211 of the entire insulating substrate 21. In this embodiment, 5 The substrate and the edge layer 22 are made of a photoresist material and processed through exposure and development to form a plurality of openings 22 for exposing the central area of the corresponding wafer mounting area 210. Then, in A reflective coating layer 23 is formed on the inner wall surface that defines each of the openings 22. Next, referring to FIG. 17, a plurality of \ ED wafers i (j series prepared as described above are placed in the corresponding The conductive bumps in the wafer mounting area 21 and on the pads 10 of the wafer 10 are electrically connected to the corresponding conductive tracks 214 on the wafer mounting surface 211 via a conductor 24. ♦ Then, as shown in the eighteenth figure, a thermally conductive material The through-hole 213 is injected into the space formed between the insulating substrate 21, the corresponding LED chip 10, and the opposed conductor 24 to form a thermally conductive layer 26. The thermally conductive material may be a metal-insulated thermally-conductive material or a non-metal-insulated thermally-conductive material. On the other hand, a light-transmitting element 25 is formed on each LED chip 10. The air-permeable element 25 is formed of the same material and in the same manner as the preferred embodiment described above. Finally, the insulating substrate 2 1 is cut into several individual light-emitting diode packages as needed. For example, each light-emitting diode package may include a chip mounting area 210 or may include nine matrix methods ^

第19頁 1244705Page 12 1244705

列的晶片安裝區域2 10 。 、應要注意的是,該透光元件25係可以被注入偏光染料 背J或逢光劑以致於從該透光元件2 5發射出來的光線可以具 有合意的顏色。 第十九、至二Η 圖是為以製造步驟方式顯示本發明之 第/、較佳貫施例之發光二極體晶片封裝體的示意側視圖。 在本實施例中,至少一個發光二極體(LED)係如在第 五較佳實施例中所述般首先被製備,因此,其之詳細描述 於此被省略。 一然後,如第十九圖所示,一絕緣基板2 1係被提供。本 芦施例之、纟巴緣基板2 1與弟五車父佳實施例之絕緣基板不同的 地方僅在於本較佳實施例之絕緣基板2丨的每個晶片安裝區 域210具有比較大的面積。 然後A如在第二十圖中所示,與該第五較佳實施例相 同’ 一基板絕緣層22係形成於整個絕緣基板2丨的晶片安裝 表面211上。在本實施例中,該基板絕緣層22係由光阻材 料製成而且係經由曝光與顯影等處理來形成有數個用於曝 露對應之晶片安裝區域2 1 0之中央區域的^開孔2 2 〇 。 接著,請參閱第二十一圖所示,數個預先被製備的 LED晶片1 〇係被置於對應的晶片安裝區域2 j 〇内而且在該 晶片1 0之焊墊1 〇 2上的導電凸塊係經由一導電體2 4來與在 晶片安裝表面2 1 1上之對應的導電執跡2 1 4電氣連接。 然後、一導熱材料係經由該等貫孔213注入形成在由 該絕緣基板2 1、對應之LED晶片1 0、與對應之導電體所Rows of wafer mounting areas 2 10. It should be noted that the light-transmitting element 25 can be injected with a polarizing dye back J or a light-emitting agent so that the light emitted from the light-transmitting element 25 can have a desirable color. Nineteenth to Second Twenty Figures are schematic side views showing the light emitting diode chip package of the first and / or preferred embodiments of the present invention in the form of manufacturing steps. In this embodiment, at least one light emitting diode (LED) is first prepared as described in the fifth preferred embodiment, and therefore, a detailed description thereof is omitted here. Then, as shown in FIG. 19, an insulating substrate 21 is provided. In this embodiment, the difference between the insulating substrate 21 and the insulating substrate of the fifth embodiment is only that each of the wafer mounting areas 210 of the insulating substrate 2 of the preferred embodiment has a relatively large area. . Then, as shown in the twentieth figure, A is the same as the fifth preferred embodiment. A substrate insulating layer 22 is formed on the wafer mounting surface 211 of the entire insulating substrate 2 丨. In this embodiment, the substrate insulating layer 22 is made of a photoresist material and is formed with a plurality of openings 2 2 for exposing the central area of the corresponding wafer mounting area 2 1 0 through processes such as exposure and development. 〇. Next, as shown in FIG. 21, a plurality of LED wafers 10 prepared in advance are placed in the corresponding wafer mounting area 2 j 〇 and conductive on the pad 10 of the wafer 10 The bump is electrically connected to a corresponding conductive track 2 1 4 on the wafer mounting surface 2 1 1 via a conductive body 2 4. Then, a thermally conductive material is injected through the through holes 213 and formed in the insulating substrate 21, the corresponding LED chip 10, and the corresponding conductive body.

第20頁 Ϊ244705 五、發明說明(17) 形成的空間内來形成導熱層26。該 絕緣導熱材料或者非金屬絕緣導熱=材科可以是為金屬 在形成導熱層26之後,於在屄卞二 / 壁面與對應之導電體24之間的空間内:形::::20之: 層29。每一絕緣材料層29在靠近曰片n、:有一絕緣材料 在靠近基板絕緣層22之部份份具有一個比 緣材料層29具有一凹陷的上表:度小的…致於每個絕 來連ϊ ί护:ΐ f f射層30與一透明保護層31係以這順序 連、、、貝地形成於母個絕緣材料層29的 層30係作思如一反射鏡面 =屬反, 能完全被反射出來。 < 於以曰日片發射出來的光線 -样it Γ邑緣基板21係如同在第五較佳實施例中所述 一樣==要來被切割成數個個別的發光二極體封裝體。 < 弟一至—十七圖是為以製作步驟方式顯示一種可 應用於本發明$導電凸塊之例子的Η㈣目。 首先明芩閱第二十二圖所示,於晶元10的每個焊墊 102上形成一如導電金屬球般的導電觸點“。在本實施例 中,该導電觸點32是為金球(gold ball ί 。然而,該導 電觸點γ %可以由任何適合的金屬材料製成。 接著’如在第二十三圖中所示,於晶元1 0的焊墊安裝 表面1 0 〇上係形成—由感光材料形成的第一絕緣層3 3。該 第〇%緣層33係形成有數個曝露對應之導電觸點32的開孔 絕 然後’清參閱第二十四和二十五圖所示,於該第Page 20 Ϊ244705 V. Description of the invention (17) The heat conductive layer 26 is formed in the space formed. The insulating and thermally conductive material or non-metallic insulating and thermally conductive material can be made of metal after forming the thermally conductive layer 26 in the space between the second / wall surface and the corresponding conductive body 24: shape :::: 20 of: Layer 29. Each insulating material layer 29 is close to the film n. There is an insulating material in the portion near the substrate insulating layer 22. The insulating material layer 29 has a depression than the edge material layer 29. The degree is small ... Flail protection: The light-emitting layer 30 and a transparent protective layer 31 are connected in this order. The layer 30 formed on the mother insulating material layer 29 is like a reflective mirror surface. It can be completely reversed. Reflected. < The light emitted by the Japanese film -like it Γ the edge substrate 21 is as described in the fifth preferred embodiment == to be cut into several individual light emitting diode packages. < Figures 1 to 17 are diagrams for showing an example of a conductive bump which can be applied to the present invention in a manufacturing step manner. First, as shown in FIG. 22, a conductive contact like a conductive metal ball is formed on each of the bonding pads 102 of the die 10. In this embodiment, the conductive contact 32 is made of gold. The ball (gold ball). However, the conductive contact γ% may be made of any suitable metal material. Then, as shown in the twenty-third figure, on the pad mounting surface 10 of the wafer 10 Upper system formation—a first insulating layer 33 made of a photosensitive material. The 0% marginal layer 33 is formed with a plurality of openings exposing the corresponding conductive contacts 32. Then, refer to twenty-fourth and twenty-five As shown in the figure

第21頁 1244705 五、發明說明(18) 緣層33上形成一由感光材料形成的第二絕緣層34。該第一 絕緣層34係形成有數個與第一絕緣層33之對應之開— 連通且比該對應之開孔330大的通孔34〇 。接著,彼 ,的開孔33、0和通孔340係以錫膏充填。之後,經過^ 處理,充填於該等彼此連通之開孔33〇和通孔34〇 ^ 係形成一與對應之導電觸點32電氣連接且端部係凸认, 通孔3 4 0外部的導電焊點3 5。 ;该 請芩气第二十六圖所示,經由研磨處理,導電 之凸伸在通孔340外部的端部係被磨平。 “,、35 最後,該第二絕緣層34係被移去,以致於每個診 電焊點35與對應之導電觸點32 —起作用為一如上所^導 電凸塊,如在第二十七圖中所示。 厅4之導 第二十八至三十二圖是為以製作步驟方式顯示 可應用於本發明之導電凸塊之例子的示意剖視圖。種 中’忒導气觸點3 2是為金球(g〇 j d ba i i )。然而 電觸點亦可以由任何適合的金屬材料製;成。 接著’於該晶元1 〇的焊墊安裝表面丨〇 〇上係形〜 感光材料形成的第-絕緣層33。該第-絕緣層33係形:由 數個曝露對應之導電觸點32之端部的開孔330 。 有 然後’Λ凊參閱第二十九和三十圖所示,於該第〜々 層33上形成—由感光材料形成的第二絕緣層%。該第:巴緣 緣層34係形成有數個與第—絕緣層33之對應之開孔 U 連 首先’、請參閱第二十八圖所示,於晶元丨〇的每個炉 1 〇 2上形成一如導電金屬球般的導電觸點3 2。在本實大Γ ’誘導Page 21 1244705 V. Description of the invention (18) A second insulating layer 34 made of a photosensitive material is formed on the edge layer 33. The first insulating layer 34 is formed with a plurality of corresponding through-holes 34o that are open-connected to the first insulating layer 33 and are larger than the corresponding openings 330. Next, the openings 33, 0 and the through-holes 340 are filled with solder paste. After that, after the ^ treatment, the open holes 33o and the through holes 34〇 ^ which are connected to each other are formed to be electrically connected to the corresponding conductive contacts 32 and the ends are convex, and the conduction outside the through holes 3 4 0 is conductive. Solder joint 3 5. The air is shown in the twenty-sixth figure. After grinding, the end of the conductive protrusion protruding outside the through hole 340 is ground. ",, 35 Finally, the second insulating layer 34 is removed, so that each diagnostic welding point 35 and the corresponding conductive contact 32 function as conductive bumps as described above, as in the twenty-seventh It is shown in the figure. The twenty-eighth to thirty-second pictures of the guide of the hall 4 are schematic cross-sectional views showing examples of the conductive bumps applicable to the present invention by the manufacturing steps. The '忒 air-conducting contact 3 2 It is a gold ball (g〇jd ba ii). However, the electrical contacts can also be made of any suitable metal material; and then 'formed on the pad mounting surface of the wafer 1 〇 〇〇 photosensitive material The first-insulating layer 33 is formed. The first-insulating layer 33 is formed by a plurality of openings 330 that expose the ends of the corresponding conductive contacts 32. There are then 'Λ 凊 Refer to the figures 29 and 30 It is shown that a second insulating layer formed of a photosensitive material is formed on the first to third layers 33. The first edge layer 34 is formed with a plurality of openings U corresponding to the first insulating layer 33. Please refer to the twenty-eighth figure, a conductive metal ball-like guide is formed on each furnace 102 of the wafer 〇. 2. The contact 3 in the present large Γ 'induced

第22頁 1244705 五、發明說明(19)Page 22 1244705 V. Description of the invention (19)

Si二對?;開f33…通孔340。接著,彼此連通 的開孔330 '和通孔34〇係以錫膏充填。之 = 理,充填於該等彼此連通 、,’二匕口蛘處 形成-與對應之導電二和通孔340的錫膏係 孔34。外部的導電焊::。2電乳連接且端部係凸伸於該通 口月务閱第二十一圖所示,經由 之凸1 申在通,〇外部的端部係被磨平:"Ιέ35 電尸二35斑ί —、巴緣層34係被移去,以致於每個該等導 電干,..,占35人對應之導電觸點32 一 體,如在第三十二圖中所示。(作用4如上所述之凸 之第十四圖是為以製造步驟方式顯示本發明 二弟七…施例之發光二極體晶片封裝體的示意剖視 、十 ^^咖^㈣以如在第十二至十三圖中特 ί —㈣,被製#。然後’如在第三十三圖中所 36内部係被注入有像:士兀件36係被提供。該透光元件 般的液態染料或螢域氣體或者像偏光染料劑 成在該透*元件36“/二,—全反射^金屬層37係被形 A y β、$ & _ 的下表面上而一半反射金屬層38係被形 成在该,成兀件36的上表面上。 饿形 接著,如在第-丄 晶片之後表面藉由一設置在該咖 層(圖中未示)7=2層37之間的透明黏性材料 。遠透光兀件36係被設置於該LED晶片1〇 1244705 五、發明說明(20) 緣材i开要:主意:f,:透光元件36亦可以由其他的透明絕 、=材㈣成,例如,透明的環氧樹脂、聚 由其他的透明絕緣材料形成時,: 〃 2 j粒子係被摻雜在該透明絕緣材料内。 封裝Ϊ i所述1 ί ?明t『發光二極體晶片封裝體及其之 之目的盥^叾,此藉土述所揭露之構造、裝置,達到預期 發明專#;之二且申請前未見於刊物亦未公開使用,符合 寻利之新穎、進步等要件。 而已,非^述=揭露之圖式及說明,僅為本發明之實施例 仕,其所伝,1本叙明之實施例;大凡熟悉該項技藝之人 飾,皆應、皆苗!!明之特徵範疇,所作之其他等效變化或修 …〜在以下本案之申請專利範圍内。Si two pairs? Open f33 ... through hole 340. Next, the openings 330 'and the through-holes 34o communicating with each other are filled with a solder paste. The reason is that the solder paste holes 34 are formed at the two connecting holes ′, ′, and ′, which are connected to each other. External conductive welding ::. 2 The electric milk is connected and the end is protruding from the port. As shown in the twenty-first month of the month, the convex 1 is applied to the pass, and the outer end is smoothed: " Ιέ35 Denshi II 35 The spot 34 is removed, so that each of these conductive stems,..., Accounts for 35 of the corresponding conductive contacts 32 as a whole, as shown in the thirty-second figure. (Action 4 The fourteenth figure of the convex as described above is a schematic cross-sectional view showing the light emitting diode chip package of the present invention in a manufacturing step manner. In the twelfth to thirteenth drawings, special, ㈣, 被 制 #. Then, as in the thirty-sixth figure, the internal system 36 is injected with the image: Shiwu 36 is provided. The light transmitting element is like A liquid dye or a fluorescent domain gas or a polarizing dye is formed on the transmissive element 36 ″ / two, the total reflection ^ metal layer 37 is formed on the lower surface of A y β, $ & _ and the half reflection metal layer 38 The system is formed on the upper surface of the forming member 36. Next, as in the back of the first wafer, the surface is provided with a transparent layer between the coffee layer (not shown) 7 = 2 layer 37 Viscous material. The far-transmitting element 36 is set on the LED chip 1101244475. Description of the invention (20) The edge material i outline: Idea: f ,: The light-transmitting element 36 can also be made of other transparent insulation, = Materials are formed, for example, when transparent epoxy resin or poly is formed of other transparent insulating materials: 〃 2 j particles are doped in the transparent In the edge material, the package is described as "1", "light-emitting diode chip package and its purpose," by borrowing the structure and device disclosed in the soil to achieve the expected invention. And it has not been seen in publications or publicly used before the application, which meets the requirements of novelty and progress of profit-seeking. Only, non-descriptive = uncovered drawings and descriptions are only examples of the present invention, and its description, 1 Example: Everyone who is familiar with this skill should be familiar with the characteristics of the Ming, and other equivalent changes or repairs… ~ within the scope of the patent application in the following case.

•H 第24頁 1244705 圖式簡單說明 第一至、四圖是為以步驟的方式顯示本發明之第一較佳 實施例之發光二極體晶片封裝體的示意剖視圖; 第五圖是為一顯示本發明之第二較佳實施例之發光二 極體晶片封裝體的示意剖視圖; 第六圖是為一顯示本發明之第三較佳實施例之發光二 極體晶片封裝體的示意剖視圖; 第七至九圖是為以步驟的方式顯示本發明之第四較佳 實施例之發光二極體晶片封裝體的示意剖視圖;• H Page 24 1247705 Brief description of the drawings The first to fourth diagrams are schematic cross-sectional views showing the light emitting diode chip package of the first preferred embodiment of the present invention in steps; the fifth diagram is a A schematic cross-sectional view of a light-emitting diode chip package showing a second preferred embodiment of the present invention; a sixth cross-sectional view is a schematic cross-sectional view of a light-emitting diode chip package showing a third preferred embodiment of the present invention; 7 to 9 are schematic cross-sectional views showing a light emitting diode chip package according to a fourth preferred embodiment of the present invention in a stepwise manner;

第十是為一顯示在本發明中所使用之另一種導電凸塊 之結構的术、意剖視圖, 第十一圖是為一顯示在本發明中所使用之另一種導電 凸塊之結構的示意剖視圖; 第十二至十八圖是為以步驟的方式顯示本發明之第五 較佳實施你(之發光二極體晶片封裝體的示意剖視圖; 第十九至二十一圖是為以步驟的方式顯示本發明之第 六較佳實施例之發光二極體晶片封裝體的示意剖視圖; 第二十二至二十七圖是為以步驟的方式顯示在本發明 中所使用之另一種導電凸塊之結構的示意ί剖視圖;The tenth is a cross-sectional view showing the structure of another conductive bump used in the present invention, and the eleventh is a schematic view showing the structure of another conductive bump used in the present invention Sectional views; Figures 12 to 18 are schematic sectional views showing the fifth preferred embodiment of the present invention (the light emitting diode chip package in steps); Figures 19 to 21 are steps A schematic cross-sectional view of a light-emitting diode chip package according to a sixth preferred embodiment of the present invention is shown in a manner; FIGS. 22 to 27 are steps for showing another kind of conductivity used in the present invention. Schematic cross-sectional view of the structure of the bump;

第二十、八至三十二圖是為以步驟的方式顯示在本發明 中所使用之另一種導電凸塊之結構的示意剖視圖;及 第三十三至三十四圖是為以步驟的方式顯示本發明之 第七較佳實施例之發光二極體晶片封裝體的示意剖視圖。 【圖式之主要元件代表符號表】 10 發光二極體晶片 100 焊墊安裝表面Twenty, eighth to thirty-second diagrams are schematic cross-sectional views showing the structure of another conductive bump used in the present invention in steps; and thirty-third to thirty-four diagrams are in steps The mode shows a schematic cross-sectional view of a light emitting diode chip package according to a seventh preferred embodiment of the present invention. [Representative symbols for the main components of the figure] 10 LED chip 100 Pad mounting surface

第25頁 1244705Page 1212705

圖式簡單說明 101 後 表 面 102 焊 墊 11 光 線 反 射 塗層 110 焊 墊 曝 路 孔 12 凸 體 13 表 面 絕 緣 層 130 中 央 穿 孔 14 第 一 金 屬 層 15 第 二 金 屬 層 150 鎳 層 151 金 層 16 透 光 元 件 28 界 接 金 屬 層 17 透 光 元 件 18 透 光 洽件 19 絕 緣 保 護 層 20 絕 緣 層 200 中 央 穿 孔 21 絕 緣 基 板 210 晶 片 安 裝 區 域 211 晶 片 安 裝 表面 212 背 面 213 貫 孔 214 導 電 軌 跡 22 基 板 絕 緣 層 220 開 孔 23 反 光 塗 層 24 導 電 體 26 導 熱 層 25 透 光 元 件 29 絕 緣 材 料 層 30 金 屬 反 射 層 31 透 明 # 護 層 32 導 電 觸 點 33 第 一 絕 緣 層 330 開 孔 i t f 34 第 二 絕 緣 層 340 通 孔 35 導 電 焊 點 36 透 光 元 件 37 全 反 射 金 屬層 38 半 反 射 金 屬 層Brief description of the drawings 101 Back surface 102 Solder pad 11 Light reflecting coating 110 Solder pad exposure hole 12 Convex body 13 Surface insulation layer 130 Central perforation 14 First metal layer 15 Second metal layer 150 Nickel layer 151 Gold layer 16 Light transmission Element 28 Bound metal layer 17 Light-transmitting element 18 Light-transmitting contact 19 Insulating protective layer 20 Insulating layer 200 Central perforation 21 Insulating substrate 210 Wafer mounting area 211 Wafer mounting surface 212 Back surface 213 Through hole 214 Conductive track 22 Substrate insulation layer 220 Open Hole 23 Reflective coating 24 Electrical conductor 26 Thermally conductive layer 25 Light-transmitting element 29 Insulating material layer 30 Metal reflective layer 31 Transparent # Protective layer 32 Conductive contact 33 First insulating layer 330 Opening itf 34 Second insulating layer 340 Through hole 35 Conductive solder joints 36 Light transmitting elements 37 Totally reflective metal layer 38 Semi-reflective metal layer

Claims (1)

12447051244705 六、申請專利範圍 1 · 一種發光二極體晶片封裝體,包含: 一發光二極體晶片,該發光二極體晶片具有一焊塾 安裝表面、數個安裝於該焊墊安裝表面上的焊墊、及_ 與該焊墊安裝表面相對的後表面; 一光線反射塗層,該光線反射塗層係設置於該發光 一極體晶片的焊墊女l表面上並且具有數個用於曝露該發 光二極體晶片之對應之焊塾的焊墊曝露孔; 一表面絕緣層’該表面絕緣層係形成於該發光二極 體晶片的後表面上並且具有一用於曝露該發光二極體晶片 之後表面久中央部份的中央穿孔; VC 一透光元件,該透光元件係設置於該表面絕緣層的 中央穿孔内;及 數個導電凸塊,每一個導電凸塊係設置於該發光二 極體晶片之一對應的焊墊上。 2 ·如申請奪利範圍第i項所述之封裝體,其中,該透光元 件具有一圓弧形的頂端部份。 3. 如申請專利範圍第1項所述之封裝體,其中,該透光元 件具有一平坦的頂端部份。 * 4. 如申請气利範圍第3項所述之封裝體/更包含一設置於 該透光元件之頂端部份上的第二透光元件,該等透光元件 係被摻雜有不同波長的偏光劑。 5· t!凊專利範圍第1項所述之封裝·,其中,每個導電 凸塊包含:6. Scope of patent application 1 · A light emitting diode chip package, comprising: a light emitting diode chip, the light emitting diode chip having a welding pad mounting surface, and a plurality of solders mounted on the pad mounting surface A pad, and a rear surface opposite to the mounting surface of the pad; a light-reflective coating, which is disposed on the surface of the pad pad 1 of the light-emitting polar wafer and has a plurality of surfaces for exposing the pad A pad exposure hole corresponding to a solder pad of the light emitting diode wafer; a surface insulation layer is formed on the rear surface of the light emitting diode wafer and has a light emitting diode wafer for exposing the light emitting diode wafer. The central perforation of the central part of the surface afterwards; VC a light-transmitting element disposed in the central perforation of the surface insulating layer; and a plurality of conductive bumps, each of which is disposed in the light-emitting diode On one of the polar body wafers. 2. The package according to item i of the claim range, wherein the light-transmitting element has an arc-shaped top portion. 3. The package according to item 1 of the scope of patent application, wherein the light transmitting element has a flat top portion. * 4. The package described in item 3 of the application scope of gas benefits / further includes a second light-transmitting element disposed on the top portion of the light-transmitting element, the light-transmitting elements are doped with different wavelengths Polarizer. 5. The package described in item 1 of the t! 凊 patent scope, wherein each conductive bump includes: 第27頁 1244705 六、申請專利範圍 非導電材料形成的凸體; 一形成於該發光二極體晶片之一對應之焊墊上 覆蓋該對應之焊墊之表面及在該對應之焊墊平1 一金屬層及 …之凸體的第 一形成於一對應之第一金屬層上的第二金屬層。 6 ·如申請專利範圍第5項所述之封裝體,其中,每二^ 一 金屬層係由一錄層與一金層構成。 第 7.如申請气利範圍第】項所述之封裝體,更包含數個 成於一對應之焊墊上的界接金屬層。 7 8·如申請專利範圍第7項所述之封裝體,1中, 凸塊包含: 、 母们¥電 一形成於該發光二極體晶片之一對應之界接金 上之由非攀電材料形成的凸體; “曰 一形成於該發光二極體晶片之一對應之界接 蓋該對應之界接金屬層之表面及在該對應之界i 金屬層上之凸體的第一金屬層;及 1接 q a 气成於—對應之第〆金屬層上的第二金屬層。 • 17申睛專利範圍第8項戶斤述之封裝體,^其中,々一 一 金屬層係由一錄層與一金層構成。 一 10.如申請專利範圍第1項所述之封裝體,中,兮笙.首 電凸塊係由金形成。 八宁该專導 lj.如申請嚀利範圍第i項所述之封裝體, 電凸塊包含: T母個V 一形成於該發光二椏體晶片之一對應之焊墊上的 1244705 六、申請專利範圍 導電觸點;及 一形成於一對應之導電觸點上的導電焊點。 12. —種發光二極體晶片封裝體,包含: 一發光二極體晶片,該發光二極體晶片具有一焊 墊安裝表面、數個安裝於該焊墊安裝表面上的焊墊、 及一與該焊墊安裝表面相對的後表面; , 一光線反射塗層’該光線反線塗層係設置於該發 光二極體晶片的後表面上; 一絕緣保護層,該絕緣保護層係形成於該光線反 射塗層上; 一絕緣層,該絕緣層係形成於該發光二極體晶片 Ξϊϊΐίί面上並且具有一用於曝露該發光二極體晶片 于墊女衣表面之中央部份的中央穿孔及數個用於曝露對 應之焊墊的焊墊曝露孔; 、“ 央穿孔内;,及光兀件’該透光兀件係設置於該絕緣層的中 數個導電凸塊,备一個導雷 二極體晶片之-對應的:塾上 塊^置於該發光 3件如/Λ專/=圍第12項所述之封裝體:其巾,該透光 ’ x十坦的頂端部份。 於該如專//圍第13項所^封n更包含一設置 件係被摻雜=頂端部份上的f丨二透光元件1等透光元 Φ 1有不同波長的偏光劑。 •如申請^利範圍第12項所述之封裝體,其中,每Page 27 1244705 VI. Protrusions made of non-conductive material in the scope of patent application; One is formed on one of the corresponding pads of the light-emitting diode wafer to cover the surface of the corresponding pad and is flat on the corresponding pad. A first metal layer and a second metal layer of the convex body are formed on a corresponding first metal layer. 6. The package according to item 5 of the scope of patent application, wherein every two metal layers are composed of a recording layer and a gold layer. 7. The package according to item [1] of the application scope, further comprising a plurality of interface metal layers formed on a corresponding solder pad. 7 8 · The package as described in item 7 of the scope of the patent application, in 1, the bumps include: , females ¥ electricity one formed on the junction gold corresponding to one of the light-emitting diode wafer by non-climbing electricity A convex body formed of a material; "a first metal formed on a corresponding boundary of one of the light-emitting diode wafers to cover the surface of the corresponding boundary metal layer and the convex body on the corresponding boundary i metal layer And the second metal layer on top of the third metal layer corresponding to qa. • The package described in Item 8 of the 17th patent scope, where the metal layer is composed of a The recording layer is composed of a gold layer. 10. The package body described in item 1 of the scope of patent application, in which Xi Sheng. The first electric bump is formed of gold. Ba Ning This special guide lj. If you apply for a profit scope The package according to item i, the electric bumps include: T female V one formed on a corresponding pad of one of the light-emitting diode wafers 12447705 6. Patent application scope conductive contacts; and one formed on one corresponding Conductive solder joints on the conductive contacts 12. 12. A light emitting diode chip package including : A light emitting diode wafer having a pad mounting surface, a plurality of pads mounted on the pad mounting surface, and a rear surface opposite to the pad mounting surface; Light-reflective coating 'The light-reflective coating is disposed on the rear surface of the light-emitting diode wafer; an insulating protective layer formed on the light-reflective coating; an insulating layer, the insulation The layer system is formed on the surface of the light-emitting diode wafer and has a central perforation for exposing the light-emitting diode wafer to the central part of the surface of the pad women's clothing and several pads for exposing the corresponding pads. Exposure hole; "in the central perforation;" and the light element 'the light transmitting element is provided in the insulating layer of a number of conductive bumps, prepare a light-emitting diode chip-corresponding: 塾 on the block ^ Place the three light-emitting packages as described in / Λ 专 / = circle 12: its towel, the top part of the light-transmitting x ten tan. The seal n as described in the item 13 of the patent // further includes a setting member that is doped = the light transmissive element Φ 1 on the top part, and other light transmitting elements Φ 1 have polarizers of different wavelengths. • The package according to item 12 of the application scope, wherein each 1244705 六'申請專利範圍' ~ 電凸塊包含: 一形成於該發光二極體晶片之一對應之焊墊上之 由非導電材料形成的凸體; 一形成於該發光二極體晶片之一對應之焊墊上俾 可覆蓋該fl、應之焊墊之表面及在該對應之焊墊上之凸體的 第一金屬層;及 一形成於一對應之第一金屬層上的第二金屬層。 1 6 ·如申請專利範圍第1 5項所述之封裝體,其中,每一第 一金屬層歲由一鎳層與一金層構成。 1 7 ·如申請專利範圍第1 2項所述之封裝體,更包含數個夂 形成於一對應之焊墊上的界接金屬層。 口 1 8 ·如申凊專利範圍第1 7項所述之封裝體,其中, 電凸塊包含: a V , 一 %成於一對應之界接金屬層上之由非導電材料 一形成於一對應之界接金屬層上俾可覆蓋該 之界接金屬層之表面及在該對應之界接金屬上Ύ 第一金屬層d及 上之凸體的 ,丨/从一对應I π 此/蜀yf 上 其中,每一第 其中,該等導 其中,每個導 1 9 ·如申請專利範圍第1 8項所述之封裝體 一金屬層各由一鎳層與一金層構成。 2 0 ·如申請專利範圍第1 2項所述之封裝體 電凸塊係#金形成。 2 1 ·如申請專利範圍第1 2項所述之封骏體1244705 Six 'Scope of Patent Application' ~ Electric bumps include: a bump formed of a non-conductive material formed on a corresponding pad of one of the light-emitting diode wafers; a corresponding bump formed on one of the light-emitting diode wafers The pad on the pad may cover the fl, the surface of the corresponding pad and the first metal layer of the convex body on the corresponding pad; and a second metal layer formed on a corresponding first metal layer. 16 · The package according to item 15 of the scope of patent application, wherein each first metal layer is composed of a nickel layer and a gold layer. 1 7 · The package as described in item 12 of the scope of patent application, further comprising a plurality of boundary metal layers formed on a corresponding solder pad.口 18. The package as described in item 17 of the patent claim, wherein the electrical bumps include: a V, one percent formed on a corresponding boundary metal layer, formed of a non-conductive material one on one The corresponding boundary metal layer 俾 may cover the surface of the boundary metal layer and on the corresponding boundary metal Ύ of the first metal layer d and the convex body, 丨 / from a corresponding I π this / On the yf, each of them, each of these guides, each guide 19 • The metal layer of the package as described in item 18 of the scope of patent application, each consisting of a nickel layer and a gold layer. 2 0 · The package as described in item 12 of the scope of patent application. The electrical bumps are formed of #gold. 2 1 · Feng Jun body as described in item 12 of the scope of patent application 1244705 ----- 、、申請專利範圍 電凸塊包含: 導電觸點 形成於該發光二極體 及 一形成於一對應之導電觸點上的導電焊點。 •一種發光二極體晶片封裝體,包含·· 區心、 絕緣基板,該絕緣基板具有至少一個晶片安裝 Γ /美夕一個晶片安裝區域具有一晶片安裝表面、〆 F/7?令女日 μ h 口口 / I i If I片女#表面相對的背面、數個貫通該晶片安裝表面 背面的貫孔、及數個從該晶片安裝表面經由對應之貫 來延伸到該背面的導電執跡; 板 一.基板絕緣層,該基板絕緣層係形成於該絕緣基 成有亥至^ 一個晶片安裝區域的晶片安裝表面上而且係形 力· 一用於曝露該至少一個晶片安裝區域之中央區域的開 體曰至一個發光二極體晶片,該至少一個發光二極 且^右置於該絕緣基板的該至少一個晶片安裝區域並 卢轨 ^墊安裝表面、數個安裝於該焊墊安裝表面上的 坪墊、及一與該焊墊安裝表面相對的後表丨面; 一光線反射塗層,該光線反射塗層係設置於該至 少一個發光二極體晶片的焊塾安裴表面上並且具有數個用 於曝露該ί少一個發光二極體晶片之對應之焊墊的焊墊曝 露孑L , 數個導電凸體,每個導電凸體係設置於該至少一 個發光二極體晶片之一對應的焊墊上且係與該絕緣基板之1244705 -----, Patent application scope The electric bump includes: a conductive contact formed on the light emitting diode and a conductive solder joint formed on a corresponding conductive contact. A light-emitting diode chip package including a central core and an insulating substrate having at least one wafer mounting Γ / 美 夕 a wafer mounting area having a wafer mounting surface, 〆F / 7? Order female day μ h口 口 / I i If I 片 女 # The opposite back surface, several through holes penetrating through the back surface of the wafer mounting surface, and several conductive tracks extending from the wafer mounting surface to the back surface through corresponding penetrations; board I. A substrate insulating layer formed on the wafer mounting surface of the insulating base having a wafer mounting area and a forming force · An open body for exposing a central area of the at least one wafer mounting area To a light-emitting diode wafer, the at least one light-emitting diode is placed on the at least one wafer mounting area of the insulating substrate and a rail is attached to a pad mounting surface, and several pads are mounted on the pad mounting surface. A pad, and a rear surface opposite to the mounting surface of the pad; a light reflecting coating, the light reflecting coating is disposed on the at least one light emitting diode wafer. Luan Pei has a plurality of pads exposed on the surface and having a plurality of corresponding pads for exposing the at least one light-emitting diode wafer, a plurality of conductive protrusions, each of which is disposed on the at least one light-emitting One of the diode pads corresponds to the pad and is connected to the insulating substrate. 第31頁 1244705 六、申請專利範圍 該至少—個晶片安裝區域之晶片安裝表面上之對應的導電 執跡電氣地連接; ^ 、弘 一導熱層,該導熱層係藉由把一導熱材料經由該 等貫孔注入形成在絕緣基板、該至少一個發光二極體晶片 與該等導電凸體之間的空間來被形成;及 一形成於該至少一個發光二極體晶片之後表面上 的透光元件。 2 3 ·如申請專利範圍第2 2項所述之封裝體,更包含一形成 於在界定每一個開孔之内壁面上的反光塗層。 24·如申請溥利範圍第22項所述之封裝體,更包含數個導 電體,每個導電凸體係經由〆對應的導電體來與對應的電 路執跡電氣連接。 μ 一 其中,該導熱 其中,該導熱 2 5 ·如申請專利範圍第2 2項所述之封裝體 層係由金屬、絕緣導熱材料形成。 26·如申請^利範圍第22項所述之封裝體 層係由非金屬絕緣導熱材料形成。 2 7·如申請專利範圍第22項所述之封裝體,其中 元件係被摻雜有染料粉末。 ^ 28.如申請.專利範圍第22項所述之封裝體,其中 電凸塊包含: 一幵> 成於該發光二極體晶片之一對應之烊墊上之 由非導電材料形成的凸體; f成於該發光二極體晶片之一對應之焊墊上俾 士應之煜執夕志而芨力妓斟龜之悝轨μ夕几冑# ..V;"八口么口又/匕一々π肌日日门〜 〜^汗堂」 可覆蓋該對應之焊墊之表面及在該對應之焊墊上之凸Page 31 1244705 VI. Scope of patent application The corresponding conductive track on the wafer mounting surface of the at least one wafer mounting area is electrically connected; ^, a thermally conductive layer, which is made by passing a thermally conductive material through these A through hole is formed by injecting a space formed between the insulating substrate, the at least one light emitting diode wafer and the conductive protrusions; and a light transmitting element formed on a rear surface of the at least one light emitting diode wafer. 2 3 · The package according to item 22 of the scope of patent application, further comprising a reflective coating formed on an inner wall surface defining each opening. 24. The package according to item 22 of the scope of application, which further includes a plurality of conductors, and each conductive convex system is electrically connected to the corresponding circuit track via the corresponding conductors of 〆. μ 1 Among them, the heat conduction among them, the heat conduction 2 5 · The package body layer as described in Item 22 of the scope of patent application is formed of a metal, an insulating heat conduction material. 26. The package layer according to item 22 of the application scope is formed of a non-metallic insulating and thermally conductive material. 27. The package according to item 22 of the scope of patent application, wherein the element is doped with a dye powder. ^ 28. The package as described in Application No. 22 of the Patent Scope, wherein the electrical bumps include: a 幵 > a protrusion formed of a non-conductive material on a 烊 pad corresponding to one of the light emitting diode wafers F is formed on a pad corresponding to one of the light-emitting diode wafers, and should be used by a shi shi zhi yu zhi xi zhi and a prostitute who scrutinizes the track of the turtle μ μ 胄. # ..V; " 八 口 么 口 又 / 々 一 々 π 肌 日 日 门 ~~ ^ 汗 堂 '' can cover the surface of the corresponding pad and the protrusion on the corresponding pad 第32頁 1244705 的f二金屬層 六、申請專利範圍 第一金屬層;及 其中,每一第 更包含數個各 其中,每個導 2 9 ·如申請專利範圍第2 8項所述之封裝體 二金屬層係由一鎳層與一金層構成。 3 0 ·如申請專利範圍第2 8項所述之封裝體 形成於一對應之焊墊上的界接金屬層。 3 1 ·如申請^利範圍第3 0項所述之封裝體 電凸塊包含' : 一形成於一對應之界接金屬層上之由非導 形成的凸體; F命省材枓 一形成於一對應之界接金屬層上俾可霜莫 之界接金暴層之表面及在該對應之界接全 1 ^怎 第-金屬層〆及 接金屬層上之凸體的 一形成於一對應之第一金屬層上的第二 32·如申請專利範圍第31項所述之封裝體,其中了々f : 二金屬層气由一鎳層與一金層構成。 母一第 33·如申請蓴利範圍第28項所述之封裝體,i 電凸塊係由金形成。 〆、宁,该寺導 34.如申請專利範圍第28項所述 電凸塊包含: ’其中’每個導 一形成於該發光二極體晶片之—斟 導電觸點;及 < 對應之焊墊上的 35· 一形成於一對應之導電觸點上的導電 •種發光二極體晶片封裝體,包含: ”、、。The second metal layer on page 32 of 1447705 6. The first metal layer in the scope of patent application; and each of them includes several ones, each of which is 2 9 · Packaging as described in item 28 of the scope of patent application The bulk metal layer is composed of a nickel layer and a gold layer. 30. The package as described in item 28 of the scope of patent application, a boundary metal layer formed on a corresponding pad. 3 1 · The electrical bump of the package as described in item 30 of the application scope includes: a non-conducting bump formed on a corresponding boundary metal layer; The surface of the corrosive metal layer and the metal storm layer on a corresponding boundary metal layer and all 1 ^ how the metal layer and the convex body on the metal layer are formed on a corresponding boundary. Corresponding to the second 32. The package as described in item 31 of the scope of patent application, wherein 々f: the two metal layer gas is composed of a nickel layer and a gold layer. Female-No. 33. The package as described in item 28 of the scope of application, the i-electric bump is formed of gold.宁, Ning, the temple guide 34. The electric bump as described in item 28 of the scope of patent application includes: 'wherein' each guide is formed on the light-emitting diode wafer—conducting conductive contacts; and < correspondingly 35 · a conductive light-emitting diode chip package formed on a corresponding conductive contact on the pad, including: ",,. 第33頁 1244705 ^絕緣基板,該絕緣基板具有至少-個晶片安裝 與該晶片安裝表面=f:區域广晶片安裝表… 與該背面的貫孔、及::…數個貫通該晶片安裝表面 孔來延伸到該背面:;:f該晶片安裝表面經由對應之貫 叫的導電執跡; 板的該至^反個^基板絕緣層係形成於該絕緣基 成有-用於曝露該至t衣f域的晶片#裝表面上而且係形 孔; 夕一個晶片安裝區域之中央區域的開 體晶片係設置於該體晶4 ’該至少一個發光二極 且具有—焊墊安、、,彖基板的該至少一個晶片安裝區域並 焊塾、及-與該焊個安裝於料塾安裝表面上的 -導埶層,λ衣表面相對的後表面; 等貫孔注入形成在免緣ζ熱/係藉由把一導熱材料經由該 與該等導^凸歸 、、豕暴板、該至少一個發光二極體晶片 1:上間的空間來被形成; 化成於在只Α Λ« 電凸體之間之空間 疋母一個開孔之内壁面與對應之導 晶片之部份具有二内的絕緣材料層,該絕|緣材料層在靠近 的厚度以臻於备,比在靠近基板絕緣層之部份之厚度小 —形成於j巴^彖材料層具有一凹陷的上表面; —形成於Κι材料層之表面上的金屬反射層; 光 數個導電 屬反射層上的透明保護層;及 二極體晶片 ^ ’每個導電凸體係設置於該至少一 I 9 之—對應的焊墊上且係與該絕緣基板之Page 33 1247005 ^ an insulating substrate having at least one wafer mounting and the wafer mounting surface = f: wide area wafer mounting table ... with through holes on the back side, and: ... several holes penetrating the wafer mounting surface To extend to the back side :; f the mounting surface of the wafer via a corresponding conductive track; the substrate insulation layer of the board is formed on the insulating base-for exposing the substrate t The wafer of the domain is mounted on the surface and is a shaped hole; the open-body wafer in the central area of a wafer mounting area is disposed on the bulk crystal 4 'the at least one light-emitting diode and has- The at least one wafer mounting area is soldered together, and the back surface opposite to the surface of the lambda-coating layer is opposite to the soldering surface mounted on the material mounting surface; the through-hole injection is formed at the edge free of zeta heat / borrowing A thermally conductive material is formed through the space between the conductive protrusions, the heat-dissipating plate, and the at least one light-emitting diode wafer 1: and is formed between only the electric convex bodies. The inner wall of an opening The corresponding part of the conductive wafer has two inner insulating material layers. The insulating material layer is prepared in a thickness close to the thickness of the insulating material layer, which is smaller than the thickness of the portion near the insulating layer of the substrate. The material layer has a recessed upper surface;-a metal reflective layer formed on the surface of the Kl material layer; a transparent protective layer on the light-reflective conductive reflective layers; and a diode wafer ^ 'each conductive convex system is disposed on The at least one I 9 -corresponding pad is connected to the insulating substrate 第34頁 1244705 六、申請專利範圍 該至少一^固晶片安裝區域之晶片安裝表面上之對應的導電 軌跡電氣地連接。 3 6.如申請專利範圍第3 5項所述之封裝體,更包含數個導 電體,每個導電凸體係經由一對應的導電體來與對應的電 路軌跡電氣連接。 3 7.如申請專利範圍第3 5項所述之封裝體,其中,該導熱 層係由金屬絕緣導熱材料形成。 3 8.如申請專利範圍第35項所述之封裝體,其中,該導熱 層係由非金屬絕緣導熱材料形成。 3 9.如申請專利範圍第3 5項所述之封裝體,其中,每個導 電凸塊包含: 一形成於該發光二極體晶片之一對應之焊墊上之 由非導電材料形成的凸體; 一形成於該發光二極體晶片之一對應之焊墊上俾 可覆蓋該對應之焊墊之表面及在該對應之焊墊上之凸體的 第一金屬嬉;及 一形成於一對應之第一金屬層上的第二金屬層。 4 0.如申請專利範圍第39項所述之封裝體‘其中,每一第 二金屬層係由一錄層與一金層構成。 4 1.如申請#利範圍第3 5項所述之封裝體,更包含數個各 形成於一對應之焊墊上的界接金屬層。 4 2.如申請專利範圍第41項所述之封裝體,其中,每個導 電凸塊包含: 一形成於一對應之界接金屬層上之由非導電材料Page 34 1244705 6. Scope of patent application The corresponding conductive tracks on the wafer mounting surface of the at least one wafer mounting area are electrically connected. 36. The package according to item 35 of the scope of patent application, further comprising a plurality of conductive bodies, and each conductive convex system is electrically connected to the corresponding circuit track through a corresponding conductive body. 37. The package of claim 35, wherein the thermally conductive layer is formed of a metal insulating and thermally conductive material. 3 8. The package as described in claim 35, wherein the thermally conductive layer is formed of a non-metallic insulating and thermally conductive material. 39. The package according to item 35 of the scope of patent application, wherein each conductive bump comprises: a bump formed of a non-conductive material formed on a corresponding pad of one of the light-emitting diode wafers. A first metal pad formed on a corresponding pad of the light-emitting diode wafer to cover the surface of the corresponding pad and the convex body on the corresponding pad; and a first formed on a corresponding first pad A second metal layer on a metal layer. 40. The package according to item 39 of the scope of the patent application, wherein each second metal layer is composed of a recording layer and a gold layer. 4 1. The package according to item 35 of the application, further comprising a plurality of interface metal layers each formed on a corresponding solder pad. 4 2. The package according to item 41 of the scope of patent application, wherein each conductive bump comprises: a non-conductive material formed on a corresponding boundary metal layer 第35頁 1244705 六、申請專利範圍、\ 形成的凸體; 一形成於一對應之界接金屬層上俾可覆蓋該對應 之界接金屬層之表面及在該對應之界接金屬層上之凸體的 第一金屬層;及 一把成於一對應之第一金屬層上的第二金屬層。 4 3.如申請專利範圍第42項所述之封裝體,其中,每一第 二金屬層各由一鎳層與一金層構成。 4 4.如申請專利範圍第35項所述之封裝體,其中,該等導 電凸塊係由^金形成。 4 5.如申請專利範圍第3 5項所述之封裝體,其中,每個導 電凸塊包含: 一形成於該發光二極體晶片之一對應之焊墊上的 導電觸點;及 一 %成於一對應之導電觸點上的導電焊點。 4 6. —種發光二極體晶片封裝體,包含: 一發光二極體晶片,該發光二極體晶片具有一焊 墊安裝表面、數個安裝於該焊墊安裝表面上的焊墊、 及一與該珞墊安裝表面相對的後表面;t 一光線反射塗層,該光線反線塗層係設置於該發 光二極體晶片的焊墊安裝表面上並且具有一用於曝露該發 光二極體晶片之對應之焊墊的焊墊曝露孔; 一透光元件’該透光元件係設置於該發光二極體 晶片的後#面上;及 數個導電凸塊,每一個導電凸塊係設置於該發光Page 35 1247075 VI. Application for patent scope, \ Convex body formed;-formed on a corresponding boundary metal layer; can cover the surface of the corresponding boundary metal layer and the surface of the corresponding boundary metal layer; A first metal layer of the convex body; and a second metal layer formed on a corresponding first metal layer. 4 3. The package according to item 42 of the scope of patent application, wherein each second metal layer is composed of a nickel layer and a gold layer. 4 4. The package as described in claim 35, wherein the conductive bumps are formed of gold. 4 5. The package according to item 35 of the scope of patent application, wherein each conductive bump includes: a conductive contact formed on a pad corresponding to one of the light-emitting diode chips; and A conductive solder joint on a corresponding conductive contact. 4 6. A light emitting diode chip package comprising: a light emitting diode chip having a pad mounting surface, a plurality of pads mounted on the pad mounting surface, and A rear surface opposite to the mounting surface of the cymbal pad; t a light reflecting coating, which is disposed on the pad mounting surface of the light emitting diode wafer and has a light emitting diode for exposing the light emitting diode The pad exposure holes corresponding to the corresponding solder pads of the body wafer; a light-transmitting element is provided on the rear surface of the light-emitting diode wafer; and a plurality of conductive bumps, each of which is Set on the glow 第36頁Page 36 —對應的焊墊上° 4 7 ·如申請專利範圍第4 6項所述之封裝體,更包含一設置 在该發光二極體晶片之後表面與遠透光元件之下表面之間 的全反射金屬層。 4 8 ·如申睛專利範圍第4 7項所述之封裝體,更包含一設置 在該透光元件之上表面上的半反射金屬層。 該透光 該透光 該透光 該透光 該透光 49.如申請專利範圍第46項所述之封裝體,其中, 元件係由玻璃材料形成而真是為一中空透光元件 元件内部係被注入有鈍氣氣髏。 50·如申請專利範圍第46項所述之封裴體,其中, 元件係由玻璃材料形成而真是為一中空透光元件 元件内部係被注入有液態染料或螢光劑。 5 一1 ·如申請專利範圍第4 6項所述之封裴體,其中,該立 凡件係由^雜有偏光染料劑粒子的透明絕緣材料形成。 52·如申請^利範圍第46項所述之封裝體,其中,每個 電凸塊包含: 一形成於該發光二極體晶片之一對應之焊墊上之 由非導電材料形成的凸體; : 一彤成於該發光二極體晶片之一對應之焊墊上俾 y覆蓋該對應之焊墊之表面及在該對應之焊墊上之凸體的 第一金屬層;及 一形成於一對應之第’金屬層上的第二金屬層。 5 一3 ·如申請^利範圍第5 2項所述之封裂體,其中,每一第 一金屬層係]由一鎳層與一金層構成。—The corresponding solder pad ° 4 7 · The package as described in item 46 of the patent application scope, further comprising a total reflection metal disposed between the rear surface of the light emitting diode wafer and the lower surface of the far-transmissive element Floor. 48. The package as described in item 47 of the patent application of Shenyan, further comprising a semi-reflective metal layer disposed on the upper surface of the light-transmitting element. The light-transmitting, light-transmitting, light-transmitting, light-transmitting, light-transmitting 49. The package according to item 46 of the scope of patent application, wherein the element is formed of a glass material and is really a hollow light-transmitting element. Infused with blunt gas skull. 50. The sealed body according to item 46 of the scope of the patent application, wherein the element is formed of a glass material and is really a hollow light-transmitting element. The inside of the element is injected with a liquid dye or a fluorescent agent. 5-1 · The seal body according to item 46 of the scope of patent application, wherein the extraordinary piece is formed of a transparent insulating material mixed with polarizing dye particles. 52. The package according to item 46 of the application, wherein each of the electrical bumps includes: a convex body formed of a non-conductive material formed on a pad corresponding to one of the light-emitting diode wafers; : A first metal layer covering a surface of the corresponding pad and a convex body on the corresponding pad on a corresponding pad of the light-emitting diode wafer; and a formed on a corresponding A second metal layer on the first metal layer. 5-3. The cracked body as described in item 52 of the application, wherein each first metal layer is composed of a nickel layer and a gold layer. 第37頁 1244705 六、申請專利範圍 5 4.如申請專利範圍第46項所述之封裝體,更包含數個各 形成於一對應之焊墊上的界接金屬層。 5 5.如申請專利範圍第5 4項所述之封裝體,其中,每個導 電凸塊包含: 一形成於一對應之界接金屬層上之由非導電材料 形成的凸體; 一形成於一對應之界接金屬層上俾可覆蓋該對應 之界接金屬層之表面及在該對應之界接金屬層上之凸體的 第一金屬層;及 一形成於一對應之第一金屬層上的第二金屬層。 5 6.如申請¥利範圍第5 5項所述之封裝體,其中,每一第 二金屬層各由一鎳層與一金層構成。 57.如申請專利範圍第46項所述之封裝體,其中,該等導 電凸塊係由金形成。 5 8.如申請·專利範圍第46項所述之封裝體,其中,每個導 電凸塊包含: 一形成於該發光二極體晶片之一對應之焊墊上的 導電觸點,及 t 一形成於一對應之導電觸點上的導電焊點。 5 9. —種發‘先二極體晶片封裝體的封裝方法,包含如下之 步驟: 提供一發光二極體晶片,該發光二極體晶片具有 一焊墊安裝表面、數個安裝於該焊墊安裝表面上的焊墊、 及一與該焊、墊安裝表面相對的後表面;Page 37 1244705 6. Scope of patent application 5 4. The package according to item 46 of the scope of patent application, further includes a plurality of interface metal layers each formed on a corresponding pad. 5 5. The package according to item 54 of the scope of patent application, wherein each conductive bump includes: a bump formed of a non-conductive material formed on a corresponding boundary metal layer; and a bump formed on A corresponding first metal layer covering a surface of the corresponding boundary metal layer and a convex body on the corresponding boundary metal layer; and a corresponding first metal layer formed on the corresponding boundary metal layer; On the second metal layer. 56. The package according to claim 55, wherein each of the second metal layers is composed of a nickel layer and a gold layer. 57. The package of claim 46, wherein the conductive bumps are formed of gold. 5 8. The package according to item 46 of the scope of application · patent, wherein each conductive bump includes: a conductive contact formed on a pad corresponding to one of the light-emitting diode chips, and t-formed A conductive solder joint on a corresponding conductive contact. 5 9. —Packaging method for a 'first diode chip package', including the following steps: Provide a light emitting diode chip, the light emitting diode chip has a pad mounting surface, and several are mounted on the solder A solder pad on the pad mounting surface, and a rear surface opposite to the solder and pad mounting surface; 第38頁 1244705 六、申請專利範圍 設置一光線反射塗層於該發光二極體晶片的焊墊 安裝表面上,該光線反射塗層具有數個用於曝露該發光二 極體晶片之對應之焊墊的焊墊曝露孔; 形成一表面絕緣層於該發光二極體晶片的後表面 上,該表面絕緣層具有一用於曝露該發光二極體晶片之後 表面之中央部份的中央穿孔; 設置一透光元件於該表面絕緣層的中央穿孔内’ 及 於該發光二極體晶片之每個焊墊上設置一導電 塊。 6 0 ·如申請專利範圍第5 9項所述之封裝方法,其中,在^ 置该透光元件的步驟中,該透光元件具有一圓弧形的了負而 部份。 \ 6 1.如申請專利範圍第5 9項所述之封裝方法,其中,在設 置該透光元件的步驟中,該透光元件具有一平坦的頂端部 份。 62·如申請^利範圍第59項所述之封裝方亨,更包含於該_ 透光元件之頂端部份上設置一第二透光元游的步驟’該等 透光元件係被摻雜有不同波長的偏光劑。 6 3 ·如申請專利範圍第5 9項所述之封裝方法,其中,在設 置導電凸塊的步驟中,包含如下之步驟: 於.該發光二極體晶片之每個焊墊上以非導電材料 形成一凸體; 於該發光二極體晶片之每個焊墊上形成一覆蓋該Page 38, 1244705 6. The scope of the patent application is to set a light reflecting coating on the pad mounting surface of the light emitting diode wafer. The light reflecting coating has several corresponding weldings for exposing the light emitting diode wafer. A pad exposure hole of the pad; forming a surface insulation layer on the rear surface of the light emitting diode wafer, the surface insulation layer having a central perforation for exposing a central portion of the rear surface of the light emitting diode wafer; A light-transmitting element is disposed in a central perforation of the surface insulation layer and a conductive block is disposed on each pad of the light-emitting diode wafer. 60. The packaging method according to item 59 of the scope of patent application, wherein in the step of placing the light-transmitting element, the light-transmitting element has an arc-shaped negative and negative portion. \ 6 1. The packaging method according to item 59 of the scope of patent application, wherein in the step of setting the light-transmitting element, the light-transmitting element has a flat top portion. 62. The package Fang Heng described in item 59 of the application scope, further includes the step of setting a second light transmitting element on the top part of the light transmitting element 'the light transmitting elements are doped There are different wavelengths of polarizers. 6 3 · The packaging method as described in item 59 of the scope of patent application, wherein the step of setting the conductive bumps includes the following steps: Non-conductive material is used on each pad of the light-emitting diode wafer. Forming a convex body; forming a cover on each bonding pad of the light emitting diode wafer 第39頁 1244705 ------- 申請專利範圍 墊之表面—及在該焊墊上之凸體的第一金屬層;及 64如一第一金屬層上形成—第二金屬層。 :—申#專利範圍第63項所述之封裝方法,其中,在形 么:二金屬層的步驟中,每一第二金屬層係由一鎳層與一 垾 金層構成 n r 更包含於每 其中,在設 • θ如申請專利範圍第5 9項所述之封裝方法 固焊塾上形成一界接金屬層的步驟。 6.、·如申請專利範圍第65項所述之封裝方法,其中,在設 V電凸塊的步驟中,包含如下之步驟: 雷於該發光二極體晶片之每個界接金屬層上以非導 电材料形成一凸體; 择罢於1¾發光二極體晶片之每—界接金屬層上形成一 後a 4界接金屬層之表面及在該界接金屬層上之凸體的第 一金屬層;及 於每一第一金屬層上形成一第二金屬層。 如申請專利範圍第66項所述之封裝方法,其中,在形 成第一至羼層的步驟中,每一第一金屬層係由一層與〆 金層構成。 , ” t 68·如申請專利範圍第59項所述之封裝方法,其中,在設 置導電凸塊的步驟中,該等導電凸塊係由金形成。 69·、如申請^利範圍第59項所述之封裝方法,其中,在設 置導電凸I的步驟中,包含如下之步驟: 於该發光二極體晶片之母個焊墊上設置一導電觸 點; 。Page 44 1244705 ------- Patent Application Scope The surface of the pad-and the first metal layer of the convex body on the pad; and 64 is formed on a first metal layer-a second metal layer. : —Shen # The encapsulation method described in item 63 of the patent scope, wherein, in the step of forming two metal layers, each second metal layer is composed of a nickel layer and a gold layer, and nr is included in each Among them, the step of forming a boundary metal layer on the solder joint with the package method θ as described in Item 59 of the patent application scope. 6. The packaging method as described in item 65 of the scope of patent application, wherein the step of setting a V electric bump includes the following steps: Lightning on each boundary metal layer of the light emitting diode wafer A non-conductive material is used to form a convex body; alternatively, a surface of a 4 a junction metal layer and a convex body on the junction metal layer are formed on each of the 1¾ light-emitting diode wafers. A first metal layer; and forming a second metal layer on each of the first metal layers. The packaging method according to item 66 of the scope of patent application, wherein in the step of forming the first to rhenium layers, each first metal layer is composed of one layer and a rhenium layer. "68. The encapsulation method as described in item 59 of the scope of patent application, wherein in the step of providing conductive bumps, the conductive bumps are formed of gold. 69 ·, such as the application of the 59th scope of the application In the packaging method, the step of setting the conductive bump I includes the following steps: setting a conductive contact on a female pad of the light-emitting diode wafer; 第40頁 1244705 、申請專利範圍 __ 絕緣層形成:光:線反射塗層上形成-第-絕緣層,該第一 孔; 有數個曝露對應之導電觸點之至少一部份的開 層係形成弟個^象層上形成一第二絕緣層,第二絕緣 應之開孔大的f -絕緣層之對應之開孔連通且比該對 j錫膏充填彼此連通的開孔和通孔; 孔的錫膏错#^回/處理使充填於該等彼此連通之開孔和通Page 40 1247705, the scope of patent application __ Insulation layer formation: light: formed on the line reflection coating-the first-insulating layer, the first hole; there are several open layer systems that expose at least part of the corresponding conductive contacts A second insulating layer is formed on the image forming layer, and the second insulating layer should have a large f-insulating layer corresponding to the corresponding opening and communicate with the openings and through holes communicating with each other than the pair of solder paste filling;孔 的 锡膏 错 # ^ Back / Processing fills these openings and holes that communicate with each other. 伸於哕i孔:f 一與對應之導電觸點電氣連接且端部係凸 伸於d通孔外部的導電焊點; 藉声研磨處理把導電焊點之凸伸在通孔外部的端 部磨十,及 把該第二絕緣層移去。 方法’包含如下之 7 0 · 一種發光二極體晶片封裝體的封裝 步驟: 提·供一發光二極體晶片’該發光二極體晶片具有 一焊墊安裝表面、數個安裝於該焊墊安裝表面上的焊墊、 及一與該焊墊安裝表面相對的後表面;^Extending through the 哕 i hole: f-a conductive solder joint that is electrically connected to the corresponding conductive contact and has an end protruding outside the d through-hole; the conductive solder joint is protruded outside the through-hole by sound grinding Grind and remove the second insulating layer. Method 'contains the following 70' packaging steps of a light emitting diode chip package: providing a light emitting diode chip 'The light emitting diode chip has a pad mounting surface, and several are mounted on the pad A solder pad on the mounting surface, and a rear surface opposite to the mounting surface of the solder pad; ^ 於該發光二極體晶片的後表面上設置一光線反射 塗層; 於該光線反射塗層上形成一絕緣保護層; 於該發光二極體晶片的焊墊安裝表面上形成一絕 緣層,該絕緣層具有一用於曝露該發光二極體晶片之焊墊 安裝表面之中央部份的中央穿孔及數個用於曝露對應之焊A light reflecting coating is provided on the rear surface of the light emitting diode wafer; an insulating protection layer is formed on the light reflecting coating; an insulating layer is formed on the pad mounting surface of the light emitting diode wafer, the The insulating layer has a central perforation for exposing the central portion of the pad mounting surface of the light-emitting diode wafer and several for exposing the corresponding solder 第41頁 1244705 六、申請專利範圍 墊的焊墊曝露孔; 於該絕緣層的中央穿孔内設置一透光元件;及 於該發光二極體晶片的每個焊墊上設置一導電凸 塊。 7 1.如申請專利範圍第7 0項所述之封裝方法,其中,在設 置透光元件的步驟中,該透光元件具有一平坦的頂端部 份。 7 2.如申請專利範圍第71項所述之封裝方法,其中,在設 置透光元件的步驟中,更包含於該透光元件之頂端部份上 設置一第二^透光元件的步驟,該等透光元件係被摻雜有不 同波長的偏光劑。 7 3.如申請專利範圍第70項所述之封裝方法,其中,在設 置導電凸塊的步驟中,包含如下之步驟: 於諺發光二極體晶片之每個焊墊上以非導電材料 形成一凸體; 於該發光二極體晶片之每個焊墊上形成一覆蓋該 焊墊之表面及在該焊墊上之凸體的第一金屬層;及 f 於每一第一金屬層上形成一第二金屬層。 7 4.如申請^利範圍第73項所述之封裝方法,其中,在形 成第二金屬層的步驟中,每一第二金屬層係由一鎳層與一 金層構成。 75. 如申請專利範圍第70項所述之封裝方法,更包含於該 發光二極载晶片之每個焊墊上形成一界接金屬層的步驟。 76. 如申請專利範圍第75項所述之封裝方法,其中,在設Page 41 1244705 VI. Patent application pads Pad exposure holes; a light-transmitting element is provided in the central perforation of the insulating layer; and a conductive bump is provided on each pad of the light-emitting diode wafer. 7 1. The packaging method according to item 70 of the scope of patent application, wherein in the step of setting the light-transmitting element, the light-transmitting element has a flat top portion. 7 2. The packaging method according to item 71 of the scope of patent application, wherein the step of providing a light-transmitting element further includes a step of placing a second light-transmitting element on a top portion of the light-transmitting element, These light-transmitting elements are doped with polarizers of different wavelengths. 7 3. The packaging method according to item 70 of the scope of patent application, wherein the step of setting the conductive bumps includes the following steps: forming a non-conductive material on each pad of the conventional light emitting diode wafer A convex body; forming a first metal layer on each bonding pad of the light emitting diode wafer covering the surface of the bonding pad and the convex body on the bonding pad; and f forming a first metal layer on each first metal layer Two metal layers. 7 4. The packaging method according to item 73 of the application, wherein in the step of forming the second metal layer, each second metal layer is composed of a nickel layer and a gold layer. 75. The packaging method as described in item 70 of the scope of patent application, further comprising the step of forming a boundary metal layer on each of the bonding pads of the light emitting diode carrier wafer. 76. The packaging method described in item 75 of the scope of patent application, wherein 第42頁 1244705Page 12 1244705 置導電凸塊的步驟中,包含如下之步驟: 於母個界接金屬層上以非導電材料形成一凸體; 於每一界接金屬層上形成一覆蓋該界接金屬層之 表面及在該界接金屬層上之凸體的第_金屬層;及曰The step of placing the conductive bumps includes the following steps: forming a convex body with a non-conductive material on the mother interface metal layer; forming a surface covering the interface metal layer on each interface metal layer and The _ metal layer of the bump on the metal layer; and 於每一第一金屬層上形成一第二金屬層。 77·如申請專利範圍第76項所述之封裴方法,其中,在形 成第二金屬層的步驟中,每/第二金屬層各由一錦層與一 金層構成。 曰〃 78·如申請專利範圍第7〇項所述之封裝方法,其中,該等 導電凸塊係由金形成。 ' 79· —種發1二極體晶片封裝體的封裝方法,包含如下之 步驟: 提供一絕緣基板,該絕緣基板具有至少一個晶片 安裝區域,該至少一個晶片安裝區域具有一晶片安裝表 面、一與議晶片安裝表面相對的背面、數個貫通該晶片安 裝表面與該背面的貫孔、及數個從該晶片安裝表面經由對 應之貫孔來延伸到該背面的導電軌跡; 於該絕緣基板的該至少一個晶片安裝區域的晶片 安裝表面上形成一基板絕緣層,該基板絕緣層係形成有一 用於曝露d至少一個晶片安裝區域之中央區域的開孔; 提供至少一個發光二極體晶片,該至少一個發光 二極體晶片係設置於該絕緣基板的該至少一個晶片安裝區 域並且具有一焊墊安裝表面、數個安裝於該焊墊安裝表面 上的焊墊、^及一與該焊墊安裝表面相對的後表面;A second metal layer is formed on each first metal layer. 77. The sealing method according to item 76 of the scope of patent application, wherein in the step of forming the second metal layer, each / second metal layer is composed of a brocade layer and a gold layer. 〃 78. The packaging method according to item 70 of the scope of patent application, wherein the conductive bumps are formed of gold. '79 · — A packaging method for a 1-diode wafer package, including the following steps: providing an insulating substrate having at least one wafer mounting area, the at least one wafer mounting area having a wafer mounting surface, a A back surface opposite to the mounting surface of the wafer, a plurality of through holes penetrating the wafer mounting surface and the back surface, and a plurality of conductive tracks extending from the wafer mounting surface to the back surface through corresponding through holes; A substrate insulating layer is formed on a wafer mounting surface of the at least one wafer mounting region, and the substrate insulating layer is formed with an opening for exposing a central region of the at least one wafer mounting region; providing at least one light emitting diode wafer, the The at least one light emitting diode wafer is disposed on the at least one wafer mounting area of the insulating substrate and has a pad mounting surface, a plurality of pads mounted on the pad mounting surface, and a pad mounting. Opposite surface 第43頁 1244705 六'申請專利範圍 ^ 於該至少一個發光二極體晶片的焊墊安裝表面上 C ί :光線反射塗層,該光線反射塗層具有數個用於曝露 >、一個發光二極體晶片之對應之焊墊的 露孔; 省@ " 個發光二極體晶片之每個焊墊上設置 J二31该:導電凸體係與該絕緣基板之該至少-個 $接^衣晶片安裝表面上之對應的導,電軌跡電氣地 基板、料經由該等貫孔注入形成在絕緣 空間來形成一導熱^忐二極體晶片與該等導電凸體之間的 、、、q ’及 透光元件於。°亥至/ —個發光二極體晶片之後表面上設置一 8 0 .如申請專利鈴m 界定每-“孔之内第辟79項所/成之,方法’ t包含於在 8!·如申請專利範圍^面上^ 反光塗層的步驟。 數個導電體於對廡/J9項所述广封襄方法’更包含形成 經由-對應的導“?路執跡2步•’每•,電凸體係 8 2.如申請‘專利範圍體,對應f的之電,跡電氣連接。 成導熱層的步驟中Λ;9項戶斤數方法,其中,在形 成。 该導熱詹係由金屬絕緣導熱材料形 8 3.如申請專利誌 成導熱層巧步驟中第79項戶斤述二封裳方法,其中,在形 成。 遠導熱廣係由非金屬絕緣導熱材料形 設 84·如申請專利範 園第7 9項所述之封裝方法,其中,在Page 43 1247005 Six 'patent application scope ^ On the pad mounting surface of the at least one light-emitting diode wafer C: light-reflecting coating, the light-reflecting coating has several light-emitting coatings, one light-emitting diode The exposed holes of the corresponding pads of the polar wafer; save the J < 31 on each of the pads of the light-emitting diode wafers: the conductive bump system and the at least one piece of connecting wafer of the insulating substrate Corresponding conductors on the mounting surface, electrical trajectories, electrical ground, substrates, and materials are injected into the insulation space through the through holes to form a thermally conductive ^ 忐 diode wafer and the conductive protrusions. Light transmitting element. ° Hai to /-A light emitting diode wafer is provided with an 80 on the surface. For example, if the patent application bell m defines each-"the hole within the 79th item / method, the method is not included in the 8! · Such as The scope of the patent application is ^ face ^ reflective coating step. Several conductors in the method of facing / J9 described in the Guangfengxiang method further include forming a via-corresponding guide? 2 steps of road track • 'each •, electric convex system 8 2. If you apply for a' patent scope body ', corresponding to the electricity of f, the track is electrically connected. In the step of forming the heat-conducting layer, Λ; 9 items of household weight method, wherein, is formed. The thermal conduction system is formed of a metal insulating thermally conductive material. 3. As described in the 79th step of the patent application process for forming the thermal conduction layer, the second method is described. Far thermal conductivity is formed by non-metallic insulating and thermally conductive materials. 84. The encapsulation method described in item 7 or 9 of the patent application park, where 1244705 六'申請專利範圍 〇置透光元件的步驟中,該透光元件係祉^ 85.、如申請專利範圍第79項所述之封壯皮^雜有染料粉末。 置導電凸塊的步驟中,包含如下之步衣驟.法,其中,在設 , 於該發光二極體晶片之每個垾. 形成一凸體; 上以非導電材料 於該發光二極體晶片之每個烊 ^ 焊墊之表面及在該焊墊上之凸體的第—形成一覆蓋該 於母一第一金屬層上形成—第二曰,及 8 6 ·如申請專利範圍第8 5項所述之封裝方’二。 , 二金屬層的步驟中,每〆第二金屬層由、一中在 金層構成。 田銲層只 ⑺·如申請利範圍第79項所述之封裝方法,更包含於每 個焊墊上形成一界接金屬層的步驟。 8 8 ·如申請專利範圍第8 7項所述之封裝方法,其中,在設 置導電凸塊的步驟中,包含如下之步驟: 於蠢一界接金屬層上以非導電材料形成一凸體; 於每一界接金屬層上形成一覆蓋該界接金屬層之 表面及在該界接金屬層上之凸體的第一金έ屬層;及 於每一第一金屬層上形成一第二金屬層。 8 9 ·如申請專利範圍第8 8項所述之封裝方法,其中,在形 成第二金屬:Λ層的步驟中,每/第一孟屬層各由一鎳層與一 金層構成。 90.如申請專利範圍第79項戶斤述之封裴方法,其中,在設 置導電凸塊的步驟中,該等導電凸塊係由金形成。1244705 6 'Application for patent scope 〇 In the step of placing a light-transmitting element, the light-transmitting element is 85. As described in item 79 of the scope of application for patent, the skin is strong and mixed with dye powder. The step of placing the conductive bumps includes the following steps. In the method, a bump is formed on each of the light-emitting diode wafers; a non-conductive material is provided on the light-emitting diodes. The surface of each 烊 ^ pad of the wafer and the first of the convex body on the pad—formed to cover the first metal layer of the mother—formed second, and 8 6 The encapsulation party described in item '2. In the step of two metal layers, each second metal layer is composed of one and one gold layer. Tian solder layer only: The packaging method described in item 79 of the application scope further includes the step of forming a boundary metal layer on each pad. 8 8 The packaging method as described in item 87 of the scope of patent application, wherein the step of setting the conductive bumps includes the following steps: forming a convex body with a non-conductive material on the stupid boundary metal layer; Forming on each boundary metal layer a first metal layer covering the surface of the boundary metal layer and a convex body on the boundary metal layer; and forming a second metal layer on each first metal layer Metal layer. 89. The packaging method according to item 88 of the scope of patent application, wherein, in the step of forming the second metal: Λ layer, each / first mongolian layer is composed of a nickel layer and a gold layer. 90. The sealing method described in item 79 of the scope of patent application, wherein in the step of setting the conductive bumps, the conductive bumps are formed of gold. 1244705 六、申請專利範圍 91·如申請蓴利範圍 置導電凸塊的步驟中,9項所述之封裝方法,其中,在設 於該發光二辦包曰含μ如下二步驟: 點; |日日片之母個焊墊上設置一導電觸 〜居:么光去線反射塗層上形成-第-絕緣展,,签 孔; 路對應之*電觸點之至少-部份的開 層係形成緣層’第二絕緣 應之開孔身的絕緣層之對應之開孔連通且比該對 =錫胃充填彼此連通的開孔和通孔; 藉由回焊處理使充填於該等彼 =的錫膏係形成-與對應之導電觸點電匕連通之開Μ 伸於該通%、外部的導電焊點; 电矾連接且端部係凸 藉由研磨處理把導電焊點之凸伸 部磨平;及 甲在通孔外部的端 把σ亥弟—絕緣層移去。 Μ· —種發光二極體晶片封裝體的裝漆, 步驟: F 包含如下之 提供一絕緣基板,該絕緣基板具有至少一 安裝區域,該至少一個晶片安裝區域具有一晶片—個曰曰片 面、一與該晶片安裝表面相對的背面、數個貫通二^〜 裝表面與續背面的貫孔、及數個從該晶片安 曰一曰片安 應之貫孔來延伸到該背面的導電軌跡; 、又A由對1244705 VI. Application for Patent Scope 91. For the method of encapsulating conductive bumps in the scope of application, the encapsulation method described in item 9 above, wherein the following two steps are included in the light-emitting package: point; | day A conductive contact is provided on the mother pad of the Japanese film ~ Home: Formed on the reflective coating of the light line-the-insulation exhibition, sign hole; at least-part of the open layer system corresponding to the * electrical contact is formed The marginal layer's second insulation should correspond to the corresponding openings of the insulation layer of the opening body, and the openings and through holes communicating with each other than the pair = tin stomach filling are connected to each other; Solder paste system is formed-the openings which communicate with the corresponding conductive contacts are extended to the external conductive solder joints; the alum is connected and the ends are convex. The protruding parts of the conductive solder joints are ground by grinding. Flat; and A removes the σ-Hyper-Insulation layer at the outer end of the through-hole. Μ · —Painting of a light-emitting diode chip package, the steps are as follows: F includes providing an insulating substrate having at least one mounting area, and the at least one wafer mounting area having one wafer—one side, one side, A back surface opposite to the mounting surface of the wafer, a plurality of through holes penetrating through the mounting surface and the back surface, and a plurality of conductive tracks extending from the wafer mounting holes to the back surface; And A by 第46頁 !244705Page 46! 244705 於该絕緣基板的該至少一個晶片 ^表面上形成—基板絕緣 ^的晶片 用於曝露該至少-個晶片安裝區域之中;==有-提供至少一個發光二極體晶片,次的開孔; =極體晶片係、設置於該絕緣基板的該 1二—個發光 有-焊塾安裝表面、數個安裝於該; 上的誶墊/及一與該焊墊安裝表面相對的後表面Τ衣表面 藉‘ ’由把一導熱材料經由該等貫孔 / ’ ^ ^ ^ - ^ # ^ ,a „ Λ t Λ f. ^ Jk Tl/ JL> 、分i T命电凸體之間的A substrate-insulating wafer is formed on the surface of the at least one wafer of the insulating substrate for exposing the at least one wafer mounting area; == yes-providing at least one light-emitting diode wafer, and a second opening; = Polar body wafer system, the one or two light-emitting solder-mounting surfaces provided on the insulating substrate, a plurality of solder pads mounted on the; and a rear surface opposite to the solder-pad mounting surface. The surface is borrowed by '' by passing a thermally conductive material through the through holes / '^ ^ ^-^ # ^, a „Λ t Λ f. ^ Jk Tl / JL > 二間來形成一導熱層; j J 於在界定每一個開孔之内壁面與對應之導電凸體 :間之空吸内形成一絕緣材料層,該絕緣材料層在靠近二曰曰 片之部份具有一個比在靠近基板絕緣層之部份之厚度小的 厚度以致於每個絕緣材料層具有一凹陷的上表面; 於該絕緣材料層之表面上形成一金屬反射層;Two to form a thermally conductive layer; j J forms an insulating material layer in the inner wall surface defining each opening and the corresponding conductive convex body: the insulating material layer is close to the part of the second sheet Has a thickness smaller than that of the portion near the insulating layer of the substrate so that each insulating material layer has a recessed upper surface; a metal reflective layer is formed on the surface of the insulating material layer; 於5玄金屬反射層上形成一^透明保護層;及 於該至少一個發光二極體晶片之每個焊墊上形成 一導電凸塊,該等導電凸塊係與該絕緣基^:反之該至少一個 晶片安裝區域之晶片安裝表面上之對應的導電執跡電氣地 連接。 9 3 ·如申請,專利範圍第9 2項所述之封裝方法,更包含於每 一導電軌跡< 上形成一導電體的步驟,每個導電凸體係經由 一對應的導電體來與對應的電路軌跡電氣連接。 9 4 ·如申請專利範圍第9 2項所述之封裝方法,其中’在形A transparent protective layer is formed on the five-metal reflective layer; and a conductive bump is formed on each pad of the at least one light-emitting diode wafer, and the conductive bumps are connected to the insulating substrate. Corresponding conductive tracks on the wafer mounting surface of a wafer mounting area are electrically connected. 9 3 · According to the application, the encapsulation method described in item 92 of the patent scope further includes the step of forming a conductive body on each conductive track < each conductive convex system passes a corresponding conductive body to correspond to the corresponding Circuit traces are electrically connected. 9 4 · The encapsulation method described in item 92 of the scope of patent application, wherein 第47頁 1244705 六、申請專利範圍 ----- 成導熱層的步驟中,續導埶層係由全眉 成。 Τ 3寺〆、 至屬絶緣導熱材料形 95·如申請專利範圍第92項所述之封裝方法,其中, 成導熱層的步驟中,該導熱層係由非全眉p接、’在形 成。 ^ F至屬絶緣導熱材料形 9 6.如申請專利範圍第9 2項所述之封裝方法,其中,气 置導電凸塊的步驟中,包含如下之步驟: °又 f 、 於17亥叙光一極體晶片之母個烊墊上以非導雷奸斗 形成一凸體; 材料 於該發光二極體晶片之每個焊墊上形成_舜 焊墊之表狳及在該焊墊上之凸體的第一金屬層;及没皿“ 於每一第一金屬層上形成一第二金屬層。 9 7 ·如申晴專利範圍第㈣項所述之封裝方法,其中,/ 成第二金屬層的步驟中,每/第二金屬層係由一^ 金層構成、 螺層與一 'K 更包含於每 98.如申請專利範圍第92項所述之封裝方法 4墊上形成一界接金屬廣的步驟。 其中 在形 9 9 ·如申請專利範圍第9 8項所述之封裝方‘ 成導電凸塊的步驟中,包含如下之步驟: 於% —界接金屬層上以非導電材料形成一凸體; 於每一界接金屬層上形成一覆蓋該界接金屬層之 表面及在該界接金屬層上之凸體的第一金屬層;及 於每一第一金屬層上形成一第二金屬層。 1 0 0 ·如申t專利範圍第9 9項所述之封裝方法,其中,在形Page 47 1244705 VI. Scope of patent application ----- In the step of forming a thermally conductive layer, the continuous conductive layer is formed by the entire eyebrow. Τ3. The shape of the insulating and thermally conductive material 95. The encapsulation method according to item 92 of the scope of application for a patent, wherein in the step of forming a thermally conductive layer, the thermally conductive layer is formed by incomplete contact. ^ F belongs to the shape of an insulating and thermally conductive material 9 6. The packaging method as described in Item 92 of the scope of patent application, wherein the step of air-conducting conductive bumps includes the following steps: ° f, at 17 A convex body is formed on the female pad of the polar body wafer by a non-conductive lightning trap; the material is formed on each pad of the light-emitting diode wafer. The table of the Shun pad and the first part of the convex body on the pad is formed. A metal layer; and a metal plate "to form a second metal layer on each of the first metal layers. 9 7 · The packaging method as described in item (2) of the Shen Qing patent scope, wherein the step of forming the second metal layer In each, the second metal layer is composed of a gold layer, a screw layer and a 'K are included in every 98. The packaging method described in item 92 of the scope of patent application, 4 steps of forming a boundary metal on the pad In which, the step of forming a conductive bump as described in the package method described in item 98 of the scope of patent application includes the following steps: A convex body is formed with a non-conductive material on the% -bound metal layer. ; Forming a boundary metal layer on each boundary metal layer; A first metal layer on the surface and a convex body on the boundary metal layer; and a second metal layer is formed on each of the first metal layers. 1 0 0 · As described in item 99 of the patent application Encapsulation method, in which 第48頁 1244705 ----—_ 第二金屬層各由一鎳層與一 述之封裝方法,其中,在設 電凸塊係由金形成。 述之封裝方法,其中,在設 六、申請專利範圍 成第二金屬層的步驟中,每/ 金層構成。 101·如申請專利範圍第92項所 置導電凸塊的步驟中,該等導電凸塊係由金形成 1 0 2 .如申請專利範圍第9 2項所述之封裝方。^ 置導電凸塊的步驟中,包含如下之步驟: 於該發光二極體晶片之每個焊墊上設置一導電觸 點; 於該光線反射塗層上形成一第一絕緣層,該第一 系巴緣層形成有數個曝露對應之導電觸點之至少一部份的開 孑L ; 於該第一絕緣層上形成一第二絕緣層,第二絕緣 ^ ^成#數個與第一絕緣層之對應之開孔連通且比該對 應之開孔大的通孔; f錫膏充填彼此連通的開孔和通孔; 藉由回焊處理使充填於該等彼此連诵夕門a 4 、s 孔的錫貧,形成一與對應之導 ,之開孔和通 伸於該通孔外部的導電焊點μ m連接且端部係凸 藉由研磨處理把導雷捏 部磨平;及 I、沾之凸伸在通孔外部的端 把該第二絕緣層移去。 1 〇3· —種發、光二極體晶片封 步驟: t體的封装方法,包含如下之 提供一發光二極m曰 枝體晶片,該發光二極體晶片具有Page 48 1244705 -------- The second metal layer is each composed of a nickel layer and a packaging method as described above, in which the current bump is formed of gold. The encapsulation method described above, wherein in the step of setting a patent application scope to form a second metal layer, each / gold layer is constituted. 101. In the step of applying the conductive bumps set in item 92 of the scope of patent application, the conductive bumps are formed of gold 102. The encapsulation party described in item 92 of the scope of patent application. ^ The step of placing conductive bumps includes the following steps: a conductive contact is provided on each pad of the light-emitting diode wafer; a first insulating layer is formed on the light-reflective coating layer, and the first system The edge edge layer is formed with a plurality of openings L that expose at least a part of the corresponding conductive contact; a second insulating layer is formed on the first insulating layer, and the second insulating layer is formed into a plurality of first insulating layers. Corresponding openings communicate through and are larger than the corresponding openings; f Solder paste fills the openings and through-holes that communicate with each other; fills these consecutive gates a 4 and s by reflow soldering. The tin deficiency of the hole forms a corresponding lead, the opening of which is connected to the conductive solder joint μm extending outside the through hole, and the end is convex, and the lead pinch portion is ground by grinding; and I, The end of the dimple protruding outside the through hole removes the second insulating layer. 1 〇3 · — Seeding and Photodiode Wafer Encapsulation Steps: A method for packaging a t-body, including the following: Provide a light-emitting diode m branch chip, the light-emitting diode wafer has 苐49頁 1244705 六、申請專利範圍 劑粒子的透明絕緣材料形成。 1 0 9 .如申請專利範圍第1 0 3項所述之封裝方法,其中,在 設置導電凸塊的步驟中,包含如下之步驟: 於該發光二極體晶片之每個焊墊上以非導電材料 形成一凸體; 於該發光二極體晶片之每個烊墊上形成一覆蓋該 焊墊之表面及在該焊墊上之凸體的第一金屬層;及 於每一第一金屬層上形成一第二金屬層。 1 1 0 .如申請專利範圍第1 0 9項所述之封裝方法,其中,在 形成第二金屬層的步驟中,每一第二金屬層係由一鎳層與 一金層構成。 m.如申請專利範圍第1 〇 3項所述之封裝方法,更包含一 於每一焊墊上形成一界接金屬層的步驟。 1 1 2 .如申請專利範圍第1 1 1項所述之封裝方法,其中,在 人.. 設置導電凸< 塊的步驟中,包含如下之步驟: 於每一界接金屬層上以非導電材料形成一凸體; 於每一界接金屬層上形成一覆蓋該界接金屬層之 表面及在該界接金屬層上之凸體的第一金έ屬層;及 旅每一第一金屬層上形成一第二金屬層。 I 1 3 .如申請專利範圍第11 2項所述之封裝方法,其中,在 形成第二金屬層的步驟中,每一第二金屬層各由一錄層與 一金層構成。 II 4 .如申請專利範圍第1 0 3 項所述之封裝方法,其中,在 設置導電ίί塊的步驟中,該等導電凸塊係由金形成。苐 Page 49 1244705 6. Scope of patent application Formed by transparent insulating material of agent particles. 1 0 9. The packaging method as described in item 103 of the scope of patent application, wherein the step of setting the conductive bumps includes the following steps: non-conductive on each pad of the light-emitting diode wafer A material forms a convex body; a first metal layer covering the surface of the bonding pad and a convex body on the bonding pad is formed on each of the pads of the light-emitting diode wafer; and each of the first metal layers is formed A second metal layer. 1 10. The packaging method according to item 109 of the scope of patent application, wherein in the step of forming the second metal layer, each second metal layer is composed of a nickel layer and a gold layer. m. The packaging method as described in item 103 of the scope of patent application, further comprising a step of forming a boundary metal layer on each pad. 1 1 2. The packaging method as described in item 11 of the scope of the patent application, wherein the step of setting the conductive bump < block by the person includes the following steps: A conductive material forms a convex body; forming a first metal layer covering each surface of the boundary metal layer and the convex body on the boundary metal layer on each boundary metal layer; and each first metal layer A second metal layer is formed on the metal layer. I 1 3. The packaging method according to item 11 of the scope of patent application, wherein in the step of forming the second metal layer, each second metal layer is composed of a recording layer and a gold layer. II 4. The packaging method as described in item 103 of the scope of patent application, wherein in the step of providing conductive blocks, the conductive bumps are formed of gold. 第51頁Page 51
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US11/004,910 US7339198B2 (en) 2004-01-16 2004-12-07 Light-emitting diode chip package body and packaging method thereof
US12/007,276 US7989817B2 (en) 2004-01-16 2008-01-09 Light-emitting diode chip package body and packaging method thereof
US12/007,279 US7576366B2 (en) 2004-01-16 2008-01-09 Light-emitting diode chip package body and packaging method thereof
US12/007,285 US7943403B2 (en) 2004-01-16 2008-01-09 Light-emitting diode chip package body and packaging method thereof
US12/007,280 US7897984B2 (en) 2004-01-16 2008-01-09 Light-emitting diode chip package body and packaging method thereof
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TWI513041B (en) * 2010-07-30 2015-12-11 Advanced Optoelectronic Tech Light emitting diode package and light emitting diode module

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TWI460801B (en) * 2010-10-22 2014-11-11 王琮淇 A wafer-level semiconductor wafer packaging method and a semiconductor wafer package

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