TWD230594S - Processing chamber purge plate - Google Patents
Processing chamber purge plate Download PDFInfo
- Publication number
- TWD230594S TWD230594S TW111305355F TW111305355F TWD230594S TW D230594 S TWD230594 S TW D230594S TW 111305355 F TW111305355 F TW 111305355F TW 111305355 F TW111305355 F TW 111305355F TW D230594 S TWD230594 S TW D230594S
- Authority
- TW
- Taiwan
- Prior art keywords
- view
- dimensional
- purge plate
- chamber purge
- process chamber
- Prior art date
Links
- 238000010926 purge Methods 0.000 title abstract description 12
- 238000000034 method Methods 0.000 abstract description 11
- 238000004140 cleaning Methods 0.000 description 7
Images
Abstract
【設計說明】;立體圖1為處理腔室淨洗板之裝飾性設計的視圖。;立體圖2為立體圖1之處理腔室淨洗板的視圖。;右側視圖為立體圖1之處理腔室淨洗板的視圖。;左側視圖為立體圖1之處理腔室淨洗板的視圖。;後視圖為立體圖1之處理腔室淨洗板的視圖。;前視圖為立體圖1之處理腔室淨洗板的視圖。;俯視圖為立體圖1之處理腔室淨洗板的視圖。;仰視圖為立體圖1之處理腔室淨洗板的視圖。;虛線顯示不構成主張設計之部分的環境與邊界。;如同顯示與說明，本設計係主張處理腔室淨洗板的裝飾性設計。【Design Description】; The three-dimensional figure 1 is a view of the decorative design of the process chamber purge plate. ; The three-dimensional figure 2 is a view of the process chamber purge plate of the three-dimensional figure 1. ; The right side view is a view of the process chamber purge plate of the three-dimensional figure 1. ; The left side view is a view of the process chamber purge plate of the three-dimensional figure 1. ; The rear view is a view of the process chamber purge plate of the three-dimensional figure 1. ; The front view is a view of the process chamber purge plate of the three-dimensional figure 1. ; The top view is a view of the process chamber purge plate of the three-dimensional figure 1. ; The bottom view is a view of the process chamber purge plate of the three-dimensional figure 1. ; The dotted lines show the environment and boundaries that do not constitute part of the claimed design. ;As shown and described, this design is intended to be a decorative design for the process chamber purge plate.
Description
立體圖1為處理腔室淨洗板之裝飾性設計的視圖。 Figure 1 is a perspective view of the decorative design of the process chamber purge plate.
立體圖2為立體圖1之處理腔室淨洗板的視圖。 The three-dimensional figure 2 is a view of the cleaning plate of the processing chamber in the three-dimensional figure 1.
右側視圖為立體圖1之處理腔室淨洗板的視圖。 The right side view is a view of the processing chamber cleaning plate in the three-dimensional figure 1.
左側視圖為立體圖1之處理腔室淨洗板的視圖。 The left side view is a view of the processing chamber cleaning plate in the three-dimensional figure 1.
後視圖為立體圖1之處理腔室淨洗板的視圖。 The rear view is a view of the processing chamber cleaning plate in the three-dimensional figure 1.
前視圖為立體圖1之處理腔室淨洗板的視圖。 The front view is a view of the processing chamber cleaning plate in the three-dimensional figure 1.
俯視圖為立體圖1之處理腔室淨洗板的視圖。 The top view is a view of the processing chamber cleaning plate in the three-dimensional figure 1.
仰視圖為立體圖1之處理腔室淨洗板的視圖。 The bottom view is a view of the processing chamber cleaning plate in the three-dimensional figure 1.
虛線顯示不構成主張設計之部分的環境與邊界。 Dashed lines show surroundings and boundaries that do not form part of the claimed design.
如同顯示與說明，本設計係主張處理腔室淨洗板的裝飾性設計。 As shown and described, this design is intended to be a decorative design for the process chamber purge plate.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/792,965 USD1107669S1 (en) | 2022-05-02 | 2022-05-02 | Processing chamber purge plate |
| US29/792,965 | 2022-05-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD230594S true TWD230594S (en) | 2024-04-01 |
Family
ID=91333559
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112304968F TWD234282S (en) | 2022-05-02 | 2022-10-31 | Processing chamber purge plate |
| TW111305355F TWD230594S (en) | 2022-05-02 | 2022-10-31 | Processing chamber purge plate |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112304968F TWD234282S (en) | 2022-05-02 | 2022-10-31 | Processing chamber purge plate |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD1107669S1 (en) |
| TW (2) | TWD234282S (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD211239S (en) | 2019-11-28 | 2021-05-01 | 日商國際電氣股份有限公司 | Wafer holder part |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5849148A (en) * | 1993-08-12 | 1998-12-15 | Ancon Chemical Pty. Ltd. | Distributor plate and evaporator |
| US7493906B2 (en) * | 2002-04-12 | 2009-02-24 | Sanist Technologies | Distribution/retention plate for minimizing off-gassing |
| USD649126S1 (en) * | 2008-10-20 | 2011-11-22 | Ebara Corporation | Vacuum contact pad |
| JP6087161B2 (en) * | 2012-02-03 | 2017-03-01 | 東京エレクトロン株式会社 | Method for purging substrate container |
| USD716742S1 (en) * | 2013-09-13 | 2014-11-04 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
| USD724553S1 (en) * | 2013-09-13 | 2015-03-17 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
| US10217614B2 (en) * | 2015-01-12 | 2019-02-26 | Lam Research Corporation | Ceramic gas distribution plate with embedded electrode |
| JP6451453B2 (en) * | 2015-03-31 | 2019-01-16 | Tdk株式会社 | GAS PURGE DEVICE, LOAD PORT DEVICE, PURGE CONTAINER CONTAINER STAND, AND GAS PURGE METHOD |
| US10483092B2 (en) * | 2016-04-13 | 2019-11-19 | Lam Research Corporation | Baffle plate and showerhead assemblies and corresponding manufacturing method |
| US10508339B2 (en) * | 2017-05-31 | 2019-12-17 | Applied Materials, Inc. | Blocker plate for use in a substrate process chamber |
| CN107587117B (en) * | 2017-08-16 | 2019-06-11 | 武汉华星光电半导体显示技术有限公司 | A gas diffusion device |
| WO2019044013A1 (en) * | 2017-08-30 | 2019-03-07 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | Protection plate, substrate treatment device, and method for manufacturing semiconductor device |
| USD935572S1 (en) * | 2019-05-24 | 2021-11-09 | Asm Ip Holding B.V. | Gas channel plate |
| JP1651619S (en) * | 2019-07-11 | 2020-01-27 | ||
| JP1651618S (en) * | 2019-07-11 | 2020-01-27 | ||
| US11732361B2 (en) * | 2019-10-08 | 2023-08-22 | Dai Nippon Printing Co., Ltd. | Metal plate for manufacturing deposition mask, method for manufacturing metal plate, deposition mask and method for manufacturing deposition mask |
| US11810805B2 (en) * | 2020-07-09 | 2023-11-07 | Applied Materials, Inc. | Prevention of contamination of substrates during gas purging |
| USD947914S1 (en) * | 2020-11-23 | 2022-04-05 | Applied Materials, Inc. | Base plate for a processing chamber substrate support |
| USD980813S1 (en) * | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
| USD990441S1 (en) * | 2021-09-07 | 2023-06-27 | Asm Ip Holding B.V. | Gas flow control plate |
| US11841189B1 (en) * | 2022-09-15 | 2023-12-12 | Velico Medical, Inc. | Disposable for a spray drying system |
-
2022
- 2022-05-02 US US29/792,965 patent/USD1107669S1/en active Active
- 2022-10-31 TW TW112304968F patent/TWD234282S/en unknown
- 2022-10-31 TW TW111305355F patent/TWD230594S/en unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD211239S (en) | 2019-11-28 | 2021-05-01 | 日商國際電氣股份有限公司 | Wafer holder part |
Also Published As
| Publication number | Publication date |
|---|---|
| TWD234282S (en) | 2024-10-21 |
| USD1107669S1 (en) | 2025-12-30 |
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