TWD224468S - Portion of heater pedestal - Google Patents
Portion of heater pedestal Download PDFInfo
- Publication number
- TWD224468S TWD224468S TW110304206F TW110304206F TWD224468S TW D224468 S TWD224468 S TW D224468S TW 110304206 F TW110304206 F TW 110304206F TW 110304206 F TW110304206 F TW 110304206F TW D224468 S TWD224468 S TW D224468S
- Authority
- TW
- Taiwan
- Prior art keywords
- view
- heater pedestal
- mirror symmetrical
- design
- parts
- Prior art date
Links
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 title 1
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 230000000007 visual effect Effects 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 abstract 1
Images
Abstract
【物品用途】;本設計請求具有視覺效果之具有溝槽延伸的圖案化加熱基座。;【設計說明】;後視圖與前視圖呈鏡射對稱因而省略。;右側視圖與左側視圖呈鏡射對稱因而省略。;圖式所揭露之虛線部分,為本案不主張設計之部分。[Use of item];This design requires a patterned heating base with groove extensions that has visual effects. ;[Design Description];The rear view and the front view are mirror symmetrical and are omitted. ;The right side view is mirror symmetrical to the left side view and is therefore omitted. ;The dotted line parts disclosed in the diagram are the parts of this case that are not intended to be designed.
Description
本設計請求具有視覺效果之具有溝槽延伸的圖案化加熱基座。 The design calls for a patterned heating susceptor with groove extensions for visual impact.
後視圖與前視圖呈鏡射對稱因而省略。 The rear view is mirror-symmetrical to the front view and thus omitted.
右側視圖與左側視圖呈鏡射對稱因而省略。 The right view is mirror-symmetrical to the left view and thus omitted.
圖式所揭露之虛線部分,為本案不主張設計之部分。 The dotted line part disclosed in the drawing is the part not claimed in this case.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/770,566 USD1066620S1 (en) | 2021-02-12 | 2021-02-12 | Patterned heater pedestal with groove extensions |
| US29/770,566 | 2021-02-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD224468S true TWD224468S (en) | 2023-04-01 |
Family
ID=87576571
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110304206F TWD224468S (en) | 2021-02-12 | 2021-08-12 | Portion of heater pedestal |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD1066620S1 (en) |
| JP (1) | JP1751565S (en) |
| TW (1) | TWD224468S (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD240710S (en) | 2021-04-12 | 2025-10-01 | 美商蘭姆研究公司 (美國) | Pedestal for a substrate processing system |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD193238S (en) | 2017-06-12 | 2018-10-01 | 荷蘭商Asm Ip控股公司 | Heater block |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100804169B1 (en) * | 2005-12-31 | 2008-02-18 | 주식회사 아이피에스 | Susceptor for Thin Film Deposition Chamber |
| US8168050B2 (en) * | 2006-07-05 | 2012-05-01 | Momentive Performance Materials Inc. | Electrode pattern for resistance heating element and wafer processing apparatus |
| US7667475B2 (en) * | 2007-04-05 | 2010-02-23 | Aehr Test Systems | Electronics tester with a signal distribution board and a wafer chuck having different coefficients of thermal expansion |
| USD641031S1 (en) | 2008-02-29 | 2011-07-05 | Ngk Insulators, Ltd. | Shaft portion of an apparatus for holding and heating semiconductor wafers or the like |
| US8540819B2 (en) * | 2008-03-21 | 2013-09-24 | Ngk Insulators, Ltd. | Ceramic heater |
| TWD136587S1 (en) * | 2008-07-22 | 2010-08-21 | 東京威力科創股份有限公司 | Wafer attracting plate |
| USD649126S1 (en) * | 2008-10-20 | 2011-11-22 | Ebara Corporation | Vacuum contact pad |
| US8371567B2 (en) | 2011-04-13 | 2013-02-12 | Novellus Systems, Inc. | Pedestal covers |
| USD708651S1 (en) | 2011-11-22 | 2014-07-08 | Applied Materials, Inc. | Electrostatic chuck |
| US9673077B2 (en) * | 2012-07-03 | 2017-06-06 | Watlow Electric Manufacturing Company | Pedestal construction with low coefficient of thermal expansion top |
| US20140251214A1 (en) * | 2013-03-06 | 2014-09-11 | Applied Materials, Inc. | Heated substrate support with flatness control |
| USD716742S1 (en) * | 2013-09-13 | 2014-11-04 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
| CN103726034B (en) * | 2014-01-22 | 2017-01-25 | 清华大学 | Substrate for technological cavity and control method, tray and design method thereof |
| USD807481S1 (en) * | 2016-04-08 | 2018-01-09 | Applied Materials, Inc. | Patterned heater pedestal |
| USD851613S1 (en) * | 2017-10-05 | 2019-06-18 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| WO2019104060A1 (en) * | 2017-11-21 | 2019-05-31 | Watlow Electric Manufacturing Company | Multi-zone pedestal heater without vias |
| USD862539S1 (en) * | 2017-12-04 | 2019-10-08 | Liqua-Tech Corporation | Register gear adapter plate |
| KR102450476B1 (en) * | 2018-02-28 | 2022-10-05 | 주식회사 미코세라믹스 | Electrostatic chucking Heater And Manufacturing Method Thereof |
| USD884855S1 (en) | 2019-10-30 | 2020-05-19 | Applied Materials, Inc. | Heater pedestal |
| JP7212006B2 (en) * | 2020-06-12 | 2023-01-24 | 日本碍子株式会社 | Thermocouple guide and ceramic heater |
| USD1012873S1 (en) * | 2020-09-24 | 2024-01-30 | Asm Ip Holding B.V. | Electrode for semiconductor processing apparatus |
| USD998112S1 (en) * | 2020-12-08 | 2023-09-05 | Bromic Pty Limited | Heater |
| TWD223375S (en) * | 2021-03-29 | 2023-02-01 | 大陸商北京北方華創微電子裝備有限公司 | Electrostatic chuck |
| JP7796625B2 (en) * | 2022-10-21 | 2026-01-09 | 株式会社堀場エステック | Wafer temperature control device, wafer temperature control method, and wafer temperature control program |
| JP2024106711A (en) * | 2023-01-27 | 2024-08-08 | 株式会社堀場エステック | Wafer temperature control device, wafer temperature control method, and wafer temperature control program |
| KR20240125839A (en) * | 2023-02-10 | 2024-08-20 | 엔지케이 인슐레이터 엘티디 | Multi zone heater |
-
2021
- 2021-02-12 US US29/770,566 patent/USD1066620S1/en active Active
- 2021-08-12 JP JP2021017451F patent/JP1751565S/en active Active
- 2021-08-12 TW TW110304206F patent/TWD224468S/en unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD193238S (en) | 2017-06-12 | 2018-10-01 | 荷蘭商Asm Ip控股公司 | Heater block |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD240710S (en) | 2021-04-12 | 2025-10-01 | 美商蘭姆研究公司 (美國) | Pedestal for a substrate processing system |
| TWD240921S (en) | 2021-04-12 | 2025-10-11 | 美商蘭姆研究公司 (美國) | Pedestal for a substrate processing system |
Also Published As
| Publication number | Publication date |
|---|---|
| USD1066620S1 (en) | 2025-03-11 |
| JP1751565S (en) | 2023-08-24 |
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