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TWD214069S - Heater pedestal - Google Patents

Heater pedestal Download PDF

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Publication number
TWD214069S
TWD214069S TW109301975F TW109301975F TWD214069S TW D214069 S TWD214069 S TW D214069S TW 109301975 F TW109301975 F TW 109301975F TW 109301975 F TW109301975 F TW 109301975F TW D214069 S TWD214069 S TW D214069S
Authority
TW
Taiwan
Prior art keywords
view
heater pedestal
design
heater
symmetrical
Prior art date
Application number
TW109301975F
Other languages
Chinese (zh)
Inventor
瑪赫西 拉瑪克里斯納
南滿 阿普瓦
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD214069S publication Critical patent/TWD214069S/en

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Abstract

【物品用途】;本設計所請求之加熱器基座係用於半導體製程。;【設計說明】;後視圖、左側視圖、右側視圖，與前視圖呈前後/左右鏡射、對稱因而省略。[Use of article]; The heater base requested by this design is used in the semiconductor manufacturing process. ;[Design Description];The rear view, left view, and right view are mirrored front and rear/left and right with the front view and are symmetrical, so they are omitted.

Description

加熱器基座 Heater base

本設計所請求之加熱器基座係用於半導體製程。 The heater base requested by this design is used for semiconductor manufacturing.

後視圖、左側視圖、右側視圖，與前視圖呈前後/左右鏡射、對稱因而省略。 The rear view, left side view, and right side view are mirrored back and forth/left and right with the front view and are symmetrical, so they are omitted.

TW109301975F 2019-10-30 2020-04-13 Heater pedestal TWD214069S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/711,377 2019-10-30
US29/711,377 USD884855S1 (en) 2019-10-30 2019-10-30 Heater pedestal

Publications (1)

Publication Number Publication Date
TWD214069S true TWD214069S (en) 2021-09-21

Family

ID=70615523

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109301975F TWD214069S (en) 2019-10-30 2020-04-13 Heater pedestal

Country Status (3)

Country Link
US (1) USD884855S1 (en)
JP (1) JP1689809S (en)
TW (1) TWD214069S (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD236821S (en) 2021-12-02 2025-03-11 日商日本碍子股份有限公司 (日本) Ceramic heater parts
TWD236822S (en) 2021-12-02 2025-03-11 日商日本碍子股份有限公司 (日本) Ceramic heater parts
USD1077761S1 (en) 2021-12-02 2025-06-03 Ngk Insulators, Ltd. Ceramic heater
USD1080701S1 (en) 2021-12-02 2025-06-24 Ngk Insulators, Ltd. Ceramic heater
USD1080568S1 (en) 2021-12-02 2025-06-24 Ngk Insulators, Ltd. Ceramic heater

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD998112S1 (en) * 2020-12-08 2023-09-05 Bromic Pty Limited Heater
USD1066620S1 (en) 2021-02-12 2025-03-11 Applied Materials, Inc. Patterned heater pedestal with groove extensions

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USD807481S1 (en) 2016-04-08 2018-01-09 Applied Materials, Inc. Patterned heater pedestal
TWD193237S (en) 2017-06-12 2018-10-01 荷蘭商Ａｓｍ Ｉｐ控股公司 Heater block

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US9624137B2 (en) * 2011-11-30 2017-04-18 Component Re-Engineering Company, Inc. Low temperature method for hermetically joining non-diffusing ceramic materials
US9984866B2 (en) * 2012-06-12 2018-05-29 Component Re-Engineering Company, Inc. Multiple zone heater
US9673077B2 (en) * 2012-07-03 2017-06-06 Watlow Electric Manufacturing Company Pedestal construction with low coefficient of thermal expansion top
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USD716742S1 (en) * 2013-09-13 2014-11-04 Asm Ip Holding B.V. Substrate supporter for semiconductor deposition apparatus
KR101465640B1 (en) * 2014-08-08 2014-11-28 주식회사 펨빅스 CVD Process Chamber Components with Anti-AlF3 Coating Layer
US10510625B2 (en) * 2015-11-17 2019-12-17 Lam Research Corporation Systems and methods for controlling plasma instability in semiconductor fabrication
US11702748B2 (en) * 2017-03-03 2023-07-18 Lam Research Corporation Wafer level uniformity control in remote plasma film deposition
USD862539S1 (en) * 2017-12-04 2019-10-08 Liqua-Tech Corporation Register gear adapter plate
US11014853B2 (en) * 2018-03-07 2021-05-25 Applied Materials, Inc. Y2O3—ZrO2 erosion resistant material for chamber components in plasma environments
US10892175B2 (en) * 2018-07-26 2021-01-12 Samsung Electronics Co., Ltd. Stable heater rebuild inspection and maintenance platform

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD807481S1 (en) 2016-04-08 2018-01-09 Applied Materials, Inc. Patterned heater pedestal
TWD193237S (en) 2017-06-12 2018-10-01 荷蘭商Ａｓｍ Ｉｐ控股公司 Heater block
TWD193236S (en) 2017-06-12 2018-10-01 荷蘭商Ａｓｍ Ｉｐ控股公司 Heater block
TWD193238S (en) 2017-06-12 2018-10-01 荷蘭商Ａｓｍ Ｉｐ控股公司 Heater block
TWD193609S (en) 2017-06-12 2018-10-21 荷蘭商Ａｓｍ Ｉｐ控股公司 Heater block

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD236821S (en) 2021-12-02 2025-03-11 日商日本碍子股份有限公司 (日本) Ceramic heater parts
TWD236822S (en) 2021-12-02 2025-03-11 日商日本碍子股份有限公司 (日本) Ceramic heater parts
USD1077769S1 (en) 2021-12-02 2025-06-03 Ngk Insulators, Ltd. Ceramic heater
USD1077876S1 (en) 2021-12-02 2025-06-03 Ngk Insulators, Ltd. Ceramic heater
USD1077761S1 (en) 2021-12-02 2025-06-03 Ngk Insulators, Ltd. Ceramic heater
USD1080701S1 (en) 2021-12-02 2025-06-24 Ngk Insulators, Ltd. Ceramic heater
USD1080568S1 (en) 2021-12-02 2025-06-24 Ngk Insulators, Ltd. Ceramic heater

Also Published As

Publication number Publication date
JP1689809S (en) 2021-07-12
USD884855S1 (en) 2020-05-19

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