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TWD211969S - 用於物理氣相沉積(pvd)腔室中的準直器 - Google Patents

用於物理氣相沉積(pvd)腔室中的準直器 Download PDF

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Publication number
TWD211969S
TWD211969S TW107305407D01F TW107305407D01F TWD211969S TW D211969 S TWD211969 S TW D211969S TW 107305407D01 F TW107305407D01 F TW 107305407D01F TW 107305407D01 F TW107305407D01 F TW 107305407D01F TW D211969 S TWD211969 S TW D211969S
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TW
Taiwan
Prior art keywords
pvd
collimator
chamber
vapor deposition
physical vapor
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Application number
TW107305407D01F
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English (en)
Inventor
馬丁李 萊克
仲蘭蘭
張富宏
征 王
Original Assignee
美商應用材料股份有限公司
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Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD211969S publication Critical patent/TWD211969S/zh

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Abstract

【物品用途】;本設計所請求係用於物理氣相沉積(PVD)腔室中的準直器。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。

Description

用於物理氣相沉積(PVD)腔室中的準直器
本設計所請求係用於物理氣相沉積(PVD)腔室中的準直器。
圖式所揭露之虛線部分，為本案不主張設計之部分。
TW107305407D01F 2018-03-16 2018-09-13 用於物理氣相沉積(pvd)腔室中的準直器 TWD211969S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/640,788 USD859333S1 (en) 2018-03-16 2018-03-16 Collimator for a physical vapor deposition chamber
US29/640,788 2018-03-16

Publications (1)

Publication Number Publication Date
TWD211969S true TWD211969S (zh) 2021-06-11

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TW107305407D01F TWD211969S (zh) 2018-03-16 2018-09-13 用於物理氣相沉積(pvd)腔室中的準直器
TW107305407F TWD210127S (zh) 2018-03-16 2018-09-13 用於物理氣相沉積(pvd)腔室中的準直器

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TW107305407F TWD210127S (zh) 2018-03-16 2018-09-13 用於物理氣相沉積(pvd)腔室中的準直器

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US (1) USD859333S1 (zh)
TW (2) TWD211969S (zh)

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TWD210127S (zh) 2021-03-01
USD859333S1 (en) 2019-09-10

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