TW200819912A - Colored photosensitive resin composition - Google Patents
Colored photosensitive resin composition Download PDFInfo
- Publication number
- TW200819912A TW200819912A TW096121567A TW96121567A TW200819912A TW 200819912 A TW200819912 A TW 200819912A TW 096121567 A TW096121567 A TW 096121567A TW 96121567 A TW96121567 A TW 96121567A TW 200819912 A TW200819912 A TW 200819912A
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- photosensitive resin
- colored photosensitive
- compound
- composition according
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 59
- 150000001875 compounds Chemical class 0.000 claims abstract description 61
- 239000011347 resin Substances 0.000 claims abstract description 38
- 229920005989 resin Polymers 0.000 claims abstract description 38
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000004593 Epoxy Substances 0.000 claims abstract description 25
- 239000003086 colorant Substances 0.000 claims abstract description 16
- 150000008065 acid anhydrides Chemical class 0.000 claims abstract description 14
- 239000004305 biphenyl Substances 0.000 claims abstract description 14
- 235000010290 biphenyl Nutrition 0.000 claims abstract description 14
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims abstract description 13
- 150000007519 polyprotic acids Polymers 0.000 claims abstract description 11
- 239000003999 initiator Substances 0.000 claims abstract description 7
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 6
- 239000000049 pigment Substances 0.000 claims description 31
- 239000000178 monomer Substances 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 13
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 125000001424 substituent group Chemical group 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 125000004429 atom Chemical group 0.000 claims 1
- 239000011159 matrix material Substances 0.000 abstract description 22
- 239000000758 substrate Substances 0.000 abstract description 18
- -1 Anthraquinone anhydride Chemical class 0.000 description 36
- 238000000034 method Methods 0.000 description 25
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 22
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 21
- 238000004040 coloring Methods 0.000 description 13
- 150000002148 esters Chemical class 0.000 description 12
- 239000002253 acid Substances 0.000 description 11
- 239000006229 carbon black Substances 0.000 description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 230000035945 sensitivity Effects 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 150000008064 anhydrides Chemical class 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 238000005192 partition Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000002270 dispersing agent Substances 0.000 description 5
- 239000012860 organic pigment Substances 0.000 description 5
- 229920000647 polyepoxide Polymers 0.000 description 5
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- KPSSIOMAKSHJJG-UHFFFAOYSA-N neopentyl alcohol Chemical compound CC(C)(C)CO KPSSIOMAKSHJJG-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 3
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 3
- 239000001023 inorganic pigment Substances 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SZNYYWIUQFZLLT-UHFFFAOYSA-N 2-methyl-1-(2-methylpropoxy)propane Chemical compound CC(C)COCC(C)C SZNYYWIUQFZLLT-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- QOSMNYMQXIVWKY-UHFFFAOYSA-N Propyl levulinate Chemical compound CCCOC(=O)CCC(C)=O QOSMNYMQXIVWKY-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Chemical compound CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- WHRIKZCFRVTHJH-UHFFFAOYSA-N ethylhydrazine Chemical compound CCNN WHRIKZCFRVTHJH-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- XBZYWSMVVKYHQN-MYPRUECHSA-N (4as,6as,6br,8ar,9r,10s,12ar,12br,14bs)-10-hydroxy-2,2,6a,6b,9,12a-hexamethyl-9-[(sulfooxy)methyl]-1,2,3,4,4a,5,6,6a,6b,7,8,8a,9,10,11,12,12a,12b,13,14b-icosahydropicene-4a-carboxylic acid Chemical compound C1C[C@H](O)[C@@](C)(COS(O)(=O)=O)[C@@H]2CC[C@@]3(C)[C@]4(C)CC[C@@]5(C(O)=O)CCC(C)(C)C[C@H]5C4=CC[C@@H]3[C@]21C XBZYWSMVVKYHQN-MYPRUECHSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- JWTGRKUQJXIWCV-UHFFFAOYSA-N 1,2,3-trihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(O)C(O)CO JWTGRKUQJXIWCV-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- IMSVBNQVZVQSND-UHFFFAOYSA-N 1,5-bis(sulfanyl)pentan-3-one Chemical compound SCCC(=O)CCS IMSVBNQVZVQSND-UHFFFAOYSA-N 0.000 description 1
- VOIWQNVWCVIHPK-UHFFFAOYSA-N 1-[2-(2-decoxyethoxy)ethoxy]decane Chemical compound CCCCCCCCCCOCCOCCOCCCCCCCCCC VOIWQNVWCVIHPK-UHFFFAOYSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- PTXVSDKCUJCCLC-UHFFFAOYSA-N 1-hydroxyindole Chemical compound C1=CC=C2N(O)C=CC2=C1 PTXVSDKCUJCCLC-UHFFFAOYSA-N 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- FYERTDTXGGOMGT-UHFFFAOYSA-N 2,2-diethoxyethylbenzene Chemical compound CCOC(OCC)CC1=CC=CC=C1 FYERTDTXGGOMGT-UHFFFAOYSA-N 0.000 description 1
- MFUCEQWAFQMGOR-UHFFFAOYSA-N 2,4-diethyl-9h-thioxanthene Chemical compound C1=CC=C2CC3=CC(CC)=CC(CC)=C3SC2=C1 MFUCEQWAFQMGOR-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- CUDYYMUUJHLCGZ-UHFFFAOYSA-N 2-(2-methoxypropoxy)propan-1-ol Chemical compound COC(C)COC(C)CO CUDYYMUUJHLCGZ-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- XYVAYAJYLWYJJN-UHFFFAOYSA-N 2-(2-propoxypropoxy)propan-1-ol Chemical compound CCCOC(C)COC(C)CO XYVAYAJYLWYJJN-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- WQNHWIYLCRZRLR-UHFFFAOYSA-N 2-(3-hydroxy-2,5-dioxooxolan-3-yl)acetic acid Chemical compound OC(=O)CC1(O)CC(=O)OC1=O WQNHWIYLCRZRLR-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- HRJYGQAACVZSEO-UHFFFAOYSA-N 2-chloro-9h-thioxanthene Chemical compound C1=CC=C2CC3=CC(Cl)=CC=C3SC2=C1 HRJYGQAACVZSEO-UHFFFAOYSA-N 0.000 description 1
- CDUQMGQIHYISOP-UHFFFAOYSA-N 2-cyano-3-phenylprop-2-enoic acid Chemical compound OC(=O)C(C#N)=CC1=CC=CC=C1 CDUQMGQIHYISOP-UHFFFAOYSA-N 0.000 description 1
- LWXQERZNZPSHEM-UHFFFAOYSA-N 2-decoxyethyl acetate Chemical compound CCCCCCCCCCOCCOC(C)=O LWXQERZNZPSHEM-UHFFFAOYSA-N 0.000 description 1
- NJRHMGPRPPEGQL-UHFFFAOYSA-N 2-hydroxybutyl prop-2-enoate Chemical compound CCC(O)COC(=O)C=C NJRHMGPRPPEGQL-UHFFFAOYSA-N 0.000 description 1
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- ATTLFLQPHSUNBK-UHFFFAOYSA-N 2-methyl-9h-thioxanthene Chemical compound C1=CC=C2CC3=CC(C)=CC=C3SC2=C1 ATTLFLQPHSUNBK-UHFFFAOYSA-N 0.000 description 1
- TYEYBOSBBBHJIV-UHFFFAOYSA-N 2-oxobutanoic acid Chemical compound CCC(=O)C(O)=O TYEYBOSBBBHJIV-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- DAWJJMYZJQJLPZ-UHFFFAOYSA-N 2-sulfanylprop-2-enoic acid Chemical compound OC(=O)C(S)=C DAWJJMYZJQJLPZ-UHFFFAOYSA-N 0.000 description 1
- XFOWYEKVIRMOBI-UHFFFAOYSA-N 3,3-dimethylbutanenitrile Chemical compound CC(C)(C)CC#N XFOWYEKVIRMOBI-UHFFFAOYSA-N 0.000 description 1
- XDOGFYDZGUDBQY-UHFFFAOYSA-N 3-Methylbutyl decanoate Chemical compound CCCCCCCCCC(=O)OCCC(C)C XDOGFYDZGUDBQY-UHFFFAOYSA-N 0.000 description 1
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 1
- SFCRZVSQIVWLKR-UHFFFAOYSA-N 3-methylheptyl acetate Chemical compound CCCCC(C)CCOC(C)=O SFCRZVSQIVWLKR-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- LKVFCSWBKOVHAH-UHFFFAOYSA-N 4-Ethoxyphenol Chemical compound CCOC1=CC=C(O)C=C1 LKVFCSWBKOVHAH-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- AGXULMINMVSGBC-UHFFFAOYSA-N 4-ethyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound CCC1CCCC2C(=O)OC(=O)C12 AGXULMINMVSGBC-UHFFFAOYSA-N 0.000 description 1
- QXBYUPMEYVDXIQ-UHFFFAOYSA-N 4-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound CC1CCCC2C(=O)OC(=O)C12 QXBYUPMEYVDXIQ-UHFFFAOYSA-N 0.000 description 1
- LWMIDUUVMLBKQF-UHFFFAOYSA-N 4-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound CC1CC=CC2C(=O)OC(=O)C12 LWMIDUUVMLBKQF-UHFFFAOYSA-N 0.000 description 1
- OFXZNFPSUTXSRF-UHFFFAOYSA-N 5-ethyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1C(CC)CCC2C(=O)OC(=O)C12 OFXZNFPSUTXSRF-UHFFFAOYSA-N 0.000 description 1
- ZCSLAJZAESSSQF-UHFFFAOYSA-N 5-ethyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1=CC(CC)CC2C(=O)OC(=O)C12 ZCSLAJZAESSSQF-UHFFFAOYSA-N 0.000 description 1
- IEAJQNJSHYCMEK-UHFFFAOYSA-N 5-methoxy-2,5-dimethylhexanoic acid Chemical compound COC(C)(C)CCC(C)C(O)=O IEAJQNJSHYCMEK-UHFFFAOYSA-N 0.000 description 1
- FKBMTBAXDISZGN-UHFFFAOYSA-N 5-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)CCC2C(=O)OC(=O)C12 FKBMTBAXDISZGN-UHFFFAOYSA-N 0.000 description 1
- JDBDDNFATWXGQZ-UHFFFAOYSA-N 5-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1=CC(C)CC2C(=O)OC(=O)C12 JDBDDNFATWXGQZ-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- MCMVZAFMSOOIQK-UHFFFAOYSA-N 6-propan-2-yloxathiane Chemical compound CC(C)C1CCCSO1 MCMVZAFMSOOIQK-UHFFFAOYSA-N 0.000 description 1
- PQJUJGAVDBINPI-UHFFFAOYSA-N 9H-thioxanthene Chemical compound C1=CC=C2CC3=CC=CC=C3SC2=C1 PQJUJGAVDBINPI-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- FLNCGTCHUOSODR-UHFFFAOYSA-N C(C)(=O)OC(COCC)C.COCCOCCOC Chemical compound C(C)(=O)OC(COCC)C.COCCOCCOC FLNCGTCHUOSODR-UHFFFAOYSA-N 0.000 description 1
- IXQBMTJJADIMOS-UHFFFAOYSA-N C(C)(=O)OC(COCCCCCCCCCC)C Chemical compound C(C)(=O)OC(COCCCCCCCCCC)C IXQBMTJJADIMOS-UHFFFAOYSA-N 0.000 description 1
- QAVVNFKCBCJSRG-UHFFFAOYSA-N C1(CC1)OCCOCCOC1CC1 Chemical compound C1(CC1)OCCOCCOC1CC1 QAVVNFKCBCJSRG-UHFFFAOYSA-N 0.000 description 1
- FMHOKQWTLPYLAT-UHFFFAOYSA-N CC(CCCC(=O)O)(OC)S Chemical compound CC(CCCC(=O)O)(OC)S FMHOKQWTLPYLAT-UHFFFAOYSA-N 0.000 description 1
- PIBUGCLIVOPVMK-UHFFFAOYSA-N CCCCCCCCCCN(COC)C(=O)C=C Chemical compound CCCCCCCCCCN(COC)C(=O)C=C PIBUGCLIVOPVMK-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- GXGJIOMUZAGVEH-UHFFFAOYSA-N Chamazulene Chemical group CCC1=CC=C(C)C2=CC=C(C)C2=C1 GXGJIOMUZAGVEH-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 1
- 240000007472 Leucaena leucocephala Species 0.000 description 1
- 235000010643 Leucaena leucocephala Nutrition 0.000 description 1
- XOBKSJJDNFUZPF-UHFFFAOYSA-N Methoxyethane Chemical compound CCOC XOBKSJJDNFUZPF-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- IDSZPFCIFJOHJB-UHFFFAOYSA-N OC(C(=O)OCCCCCCCCCC)C(C)C Chemical compound OC(C(=O)OCCCCCCCCCC)C(C)C IDSZPFCIFJOHJB-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- IPTNXMGXEGQYSY-UHFFFAOYSA-N acetic acid;1-methoxybutan-1-ol Chemical compound CC(O)=O.CCCC(O)OC IPTNXMGXEGQYSY-UHFFFAOYSA-N 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- PLZZFHDKKXMEGX-UHFFFAOYSA-N benzene;1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl.C1=CC=CC=C1 PLZZFHDKKXMEGX-UHFFFAOYSA-N 0.000 description 1
- FVELDMCOCLJSQN-UHFFFAOYSA-N benzene;1,1-dichloroethane Chemical compound CC(Cl)Cl.C1=CC=CC=C1 FVELDMCOCLJSQN-UHFFFAOYSA-N 0.000 description 1
- TXVHTIQJNYSSKO-UHFFFAOYSA-N benzo[e]pyrene Chemical compound C1=CC=C2C3=CC=CC=C3C3=CC=CC4=CC=C1C2=C34 TXVHTIQJNYSSKO-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- BTMVHUNTONAYDX-UHFFFAOYSA-N butyl propionate Chemical compound CCCCOC(=O)CC BTMVHUNTONAYDX-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- CZPLANDPABRVHX-UHFFFAOYSA-N cascade blue Chemical compound C=1C2=CC=CC=C2C(NCC)=CC=1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 CZPLANDPABRVHX-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000006231 channel black Substances 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical class CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 1
- MASUWWUXFOSASS-UHFFFAOYSA-N decyl 2-oxopropanoate Chemical compound CCCCCCCCCCOC(=O)C(C)=O MASUWWUXFOSASS-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000412 dendrimer Substances 0.000 description 1
- 229920000736 dendritic polymer Polymers 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- LAOJXEABQKKMDP-UHFFFAOYSA-N dimethoxymethane;prop-1-ene Chemical compound CC=C.COCOC LAOJXEABQKKMDP-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- JOECUOHCAKJFJX-UHFFFAOYSA-N ethyl 2-hydroxy-2-sulfanylpropanoate Chemical compound CCOC(=O)C(C)(O)S JOECUOHCAKJFJX-UHFFFAOYSA-N 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000006232 furnace black Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 125000004970 halomethyl group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000000968 intestinal effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 239000006233 lamp black Substances 0.000 description 1
- 150000002632 lipids Chemical class 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- JKJJSJJGBZXUQV-UHFFFAOYSA-N methyl 2-methylidenebutanoate Chemical compound CCC(=C)C(=O)OC JKJJSJJGBZXUQV-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- IVECIWLVOYDMRU-UHFFFAOYSA-N methyl acetate Chemical compound COC(C)=O.COC(C)=O IVECIWLVOYDMRU-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- FJYACARVIOXIAK-UHFFFAOYSA-N n'-hydroxyprop-2-enimidamide Chemical compound C=CC(N)=NO FJYACARVIOXIAK-UHFFFAOYSA-N 0.000 description 1
- QDOHXBBRYQKICH-UHFFFAOYSA-N n,n-dimethyl-4-propylaniline Chemical compound CCCC1=CC=C(N(C)C)C=C1 QDOHXBBRYQKICH-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- HVAAHUDGWQAAOJ-UHFFFAOYSA-N n-benzylethanamine Chemical compound CCNCC1=CC=CC=C1 HVAAHUDGWQAAOJ-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- ZRBSSYMJCKNFFZ-UHFFFAOYSA-N octadecylhydrazine Chemical compound CCCCCCCCCCCCCCCCCCNN ZRBSSYMJCKNFFZ-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 125000005767 propoxymethyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])[#8]C([H])([H])* 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- HUAZGNHGCJGYNP-UHFFFAOYSA-N propyl butyrate Chemical compound CCCOC(=O)CCC HUAZGNHGCJGYNP-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- WMOVHXAZOJBABW-UHFFFAOYSA-N tert-butyl acetate Chemical compound CC(=O)OC(C)(C)C WMOVHXAZOJBABW-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- UNWZKBKTIYBBRV-UHFFFAOYSA-N tetraazanium;tetrachloride Chemical compound [NH4+].[NH4+].[NH4+].[NH4+].[Cl-].[Cl-].[Cl-].[Cl-] UNWZKBKTIYBBRV-UHFFFAOYSA-N 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- LYIQCFVNCQKBHH-UHFFFAOYSA-N trisodium ethanolate Chemical compound [O-]CC.[O-]CC.[O-]CC.[Na+].[Na+].[Na+] LYIQCFVNCQKBHH-UHFFFAOYSA-N 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
200819912 九、發明說明: 【發明所屬之技術領域】 本發明係有關於一種著色感光性樹腊組成物,特別是 有關於一種著色感光性樹脂組成物,用以形成使用於彩色 濾光片的黑色矩陣等處之遮光性膜。200819912 IX. Description of the Invention: [Technical Field] The present invention relates to a color-sensitive photosensitive wax composition, and more particularly to a colored photosensitive resin composition for forming black for use in a color filter A light-shielding film at a matrix or the like.
【先前技術】 先前,作為使用顏料之彩 色法、電極沈積法、噴墨法、 的情況,係將在著色組成物(使 中添加黏合劑樹脂、光聚合引 感光化的著色感光性樹脂組成 燥後進行曝光、顯像來形成著 案固著而形成像素。對各顏色 光片。 形成此種彩色濾光片的像 組成物,要求充分的解像性、 渣等特性。又,藉由顏料分散 影步驟使用。因此^,經常要求 產生殘渣或污染、除去部分必 提南圖案邊緣的銳利度等圖案 用的基板持續大型化,逐漸要 特別疋如黑色矩陣般的要 光能力時,會有賦予曝光部分 色濾光片的製法,已知有染 顏料分散法等。顏料分散法 用分散劑等將顏料分散而成) 發劑、及光聚合性單體等而 物,塗布在玻璃基板上,乾 色圖案。隨後,加熱來使圖 重複該等步驟來形成彩色慮 素所使用的著色感光性樹脂 與基板的黏附性、低顯像殘 法來形成時,能夠供給光微 在顯像步驟之除去部分不可 須具有充分的溶解性、以及 形成性。而且,近年來所使 求具有大的顯像餘裕度。 求在光的全波長區域具有遮 與未曝光部分中之交聯密度 5 200819912 差異係十分困難之問題;以及即使是曝光部分,雖然在光 照射面側能夠充分地硬化,但是會有在基底側面未硬化的 問題等。又,因為多量地調配在顯像液中不溶的黑色著色 劑,亦會產生顯像性顯著下降之問題。 因此,為了解決此種問題,揭示一種著色感光性樹脂 組成物(參照專利文獻1 ),係使用具有羧基之酚醛清漆環 氧丙烯酸酯來作為黏合劑樹脂。[Prior Art] In the case of a color method using a pigment, an electrodeposition method, or an inkjet method, a coloring composition (a coloring photosensitive resin to which a binder resin or a photopolymerization is added) is dried. Then, exposure and development are performed to form a film to form a pixel. For each color light sheet, the image composition forming such a color filter requires sufficient resolution, slag, etc. The dispersion shadow step is used. Therefore, it is often required to generate a residue or a stain, and the substrate for removing the sharpness of the edge of the pattern must be continuously enlarged, and gradually, for example, a black matrix-like light power is required. A method for producing an exposed partial color filter is known as a dye dispersion method, etc. The pigment dispersion method is obtained by dispersing a pigment with a dispersant or the like, and a photopolymerizable monomer or the like is coated on a glass substrate. , dry color pattern. Then, when heating is performed to repeat the steps to form the adhesion between the colored photosensitive resin used for the color factor and the substrate, and the low development residual method is formed, it is possible to supply the light to be removed in the developing step. It has sufficient solubility and formability. Moreover, in recent years, it has been required to have a large margin of development. It is found that the difference in the cross-linking density in the entire wavelength region of the light and the unexposed portion is very difficult; and even the exposed portion can be sufficiently hardened on the side of the light-irradiating surface, but there is a side on the substrate side. Unhardened problems, etc. Further, since a large amount of a black coloring agent which is insoluble in the developing liquid is blended in a large amount, there is a problem that the developing property is remarkably lowered. Therefore, in order to solve such a problem, a coloring photosensitive resin composition (see Patent Document 1) is disclosed, and a novolak epoxy acrylate having a carboxyl group is used as a binder resin.
又,揭示一種著色感光性樹脂組成物(參照專利文獻 2),係使用具有羧基之丙烯酸樹酯與含有脂環族環氧基之 不飽和化合物之反應物來作為黏合劑樹脂。 又,揭示一種著色感光性樹脂組成物(參照專利文獻 3 ),含有聚羧酸樹脂,該聚羧酸樹脂係使具有2個環氧基 之環氧化合物和單羧酸之反應物,與酸酐進行反應而得到。 [專利文獻1]曰本特開平11-84 1 26號公報 [專利文獻2]日本特開平1 -289820號公報 [專利文獻3]日本特開2004-43573號公報Further, a coloring photosensitive resin composition (see Patent Document 2) is disclosed, and a reactant of a carboxyl group-containing acrylic resin and an alicyclic epoxy group-containing unsaturated compound is used as the binder resin. Further, a colored photosensitive resin composition (see Patent Document 3) is disclosed, which comprises a polycarboxylic acid resin which is a reaction product of an epoxy compound having two epoxy groups and a monocarboxylic acid, and an acid anhydride. It is obtained by carrying out a reaction. [Patent Document 1] JP-A-2004-43573 (Patent Document 3) JP-A-2004-43573
【發明内容】 [發明所欲解決之問題] 但是,即便是在上述專利文獻1〜3所記載之樹脂組成 物,亦會有敏感度不充分、對像素之黏附性差而容易剝落、 容易殘留殘渣等問題點。又,因為顯像餘裕度(margin)小, 依照顯像時間會有連曝光部都剝離掉、像素的邊緣動搖等 問題尚未解除。 6 200819912 鑒於上述課題,本發明提供一種著色感光性樹脂組成 物,能夠在基板上容易地形成直線性優良、不會產生剝落 或殘渣,且顯示對比優良之良好的黑色矩陣圖案。 [解決問題之技術手段] 為解決上述課題,本發明者等重複專心研究之結果, 發現藉由將含有對光感受性優良的官能基之樹脂應用於感 光性組成物,能夠解決上述課題,而完成了本發明。更具 體地,本發明係提供以下之物。[Problems to be Solved by the Invention] However, even in the resin compositions described in Patent Documents 1 to 3, the sensitivity is insufficient, the adhesion to the pixel is poor, and the resin is easily peeled off, and residue is likely to remain. Wait for the problem. Further, since the development margin is small, the problem that the exposure portion is peeled off and the edge of the pixel is shaken according to the development time has not been released. In view of the above, the present invention provides a colored photosensitive resin composition which can easily form a favorable black matrix pattern which is excellent in linearity, does not cause peeling or residue, and exhibits excellent contrast. [Means for Solving the Problems] In order to solve the above problems, the inventors of the present invention have found that the above-mentioned problems can be solved by applying a resin containing a functional group excellent in photoreceptivity to a photosensitive composition. The invention has been made. More specifically, the present invention provides the following.
本發明係提供一種著色感光性樹脂組成物,係含有光 聚合性化合物(A)、光聚合引發劑(B)、及著色劑(C)之著色 感光性樹脂組成物,前述光聚合性化合物(A)係含有使環氧 化合物(a_l)與含不飽和基羧酸(a-2)之反應物,進而與多元 酸酐(a-3)反應而得到的樹脂,且前述樹脂係具有聯苯骨架 之化合物。 [功效] 若依照本發明之著色感光性樹脂組成物,在著色感光 性樹脂組成物中的光聚合性化合物所含有樹脂之原料,係 使用具有聯苯骨架之化合物。因此,因為在著色感光性樹 脂組成物中具有聯苯骨架,能夠提供感度及溶解性的平衡 性優良、且像素邊緣的銳利性、與基材之黏附性優良之著 色感光性樹脂組成物。而且,能夠容易地以對比高、且R、 G、B的發色美麗之形態,來提供液晶顯示器用彩色濾光 片0 7 200819912 【實施方式】 [實施發明的較佳形態] 以下’說明本發明之實施形態。本發明之著色感光性 樹脂組成物(以下亦稱為「組成物」),係含有光聚合性化 合物(A)、光聚合弓I發劑(B)、及著色劑(C)。 [光聚合性化合物(A)]The present invention provides a colored photosensitive resin composition containing a photopolymerizable compound (A), a photopolymerization initiator (B), and a coloring photosensitive resin composition of a coloring agent (C), and the photopolymerizable compound ( A) is a resin obtained by reacting an epoxy compound (a-1) with a reaction product containing an unsaturated carboxylic acid (a-2) and further with a polybasic acid anhydride (a-3), and the resin has a biphenyl skeleton. Compound. [Efficacy] According to the colored photosensitive resin composition of the present invention, a compound having a biphenyl skeleton is used as a raw material of the resin contained in the photopolymerizable compound in the colored photosensitive resin composition. Therefore, since the coloring photosensitive resin composition has a biphenyl skeleton, it is possible to provide a colored photosensitive resin composition which is excellent in balance between sensitivity and solubility, sharpness of the edge of the pixel, and excellent adhesion to the substrate. Further, it is possible to easily provide a color filter for a liquid crystal display with a high contrast and a beautiful color of R, G, and B. [Embodiment] [Better Mode for Carrying Out the Invention] Embodiments of the invention. The colored photosensitive resin composition (hereinafter also referred to as "composition") of the present invention contains a photopolymerizable compound (A), a photopolymerization agent (B), and a color former (C). [Photopolymerizable Compound (A)]
光聚合性化合物(以下亦稱為「(A)成分」係含有使環 氧化合物(a-1)與含不飽和基羧酸(a-2)之反應物,進而與多 元酸酐(a-3)反應而得到的樹脂,且前述樹脂係具有聯笨骨 架之化合物。以下說明各自的成分。 <環氧化合物(a-l)> 本發明所使用的環氧化合物(以下亦稱為(a-1)成分), 以具有聯苯骨架之環氧化合物為佳。具有聯苯骨架之化合物 係在主鏈具有至少1個以上下述式(5)所示之聯苯骨架,且 具有1個以上環氧基。又,該(a -1)成分以具有2個以上環 氧基之物為佳。藉由使用具有聯苯骨架之環氧化合物,因 為在反應後的光聚合性化合物中具有聯苯骨架,能約提供敏 感度及溶解性的平衡性優良,且像素邊緣的銳利性、黏附性 優良之著色感光性樹脂組成物。 200819912 [化學式1]The photopolymerizable compound (hereinafter also referred to as "(A) component" contains a reaction product of the epoxy compound (a-1) and the unsaturated group-containing carboxylic acid (a-2), and further with a polybasic acid anhydride (a-3). The resin obtained by the reaction, and the resin is a compound having a stupid skeleton. The respective components will be described below. <Epoxy compound (al)> The epoxy compound used in the present invention (hereinafter also referred to as (a-) 1) Component) An epoxy compound having a biphenyl skeleton is preferred. The compound having a biphenyl skeleton has at least one or more biphenyl skeletons represented by the following formula (5) in the main chain, and has one or more Further, the (a-1) component is preferably one having two or more epoxy groups. By using an epoxy compound having a biphenyl skeleton, since it has a bond in the photopolymerizable compound after the reaction. The benzene skeleton is a color-sensitive photosensitive resin composition which is excellent in balance of sensitivity and solubility, and has excellent sharpness and adhesion at the edge of the pixel. 200819912 [Chemical Formula 1]
(5)(5)
(式中,複數個R3係各自獨立地表示氫原子、碳數1〜1 2的 烷基、鹵素原子、或是亦可具有取代基之苯基,1係表示 1〜4的整數) 又,聯苯型環氧樹脂沒有特別限定,可舉出例如下述 式(1)所示之環氧化合物。 [化學式2](wherein a plurality of R3 groups each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, a halogen atom, or a phenyl group which may have a substituent, and 1 represents an integer of 1 to 4) The biphenyl type epoxy resin is not particularly limited, and examples thereof include an epoxy compound represented by the following formula (1). [Chemical Formula 2]
(式中,複數個R1係各自獨立地表示氫原子、碳數1〜1 2的 烷基、鹵素原子、或是亦可具有取代基之苯基,η係表示 1〜4的整數) 又,式(1)中,以使用下述式(2)所示之環氧化合物為 佳。藉由使用式(2)的化合物,能夠提供敏感度及溶解性的 平衡性優良之組成物。 [化學式3] 9 200819912(wherein the plural R1 groups each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, a halogen atom, or a phenyl group which may have a substituent, and η represents an integer of 1 to 4) In the formula (1), an epoxy compound represented by the following formula (2) is preferably used. By using the compound of the formula (2), it is possible to provide a composition excellent in balance of sensitivity and solubility. [Chemical Formula 3] 9 200819912
又,在式(1)及(2),m為平均值,係表示0〜10的數目。 該m以小於1為佳。 <含不飽和基竣酸(a_2)>Further, in the formulas (1) and (2), m is an average value and represents the number of 0 to 10. The m is preferably less than 1. <Unsaturated decanoic acid (a_2)>
在本發明所使用之含不飽基羧酸(以下亦稱為「(a-2) 成分」),以在分子中含有丙烯基(acrylic group)及甲基丙 烯基(methacrylic group)等反應性的不飽和雙鍵之單羧酸 為佳。此種含不飽和基羧酸,可舉出例如丙烯酸、甲基丙 烯酸、々·苯乙烯基丙烯酸、沒-糠基丙烯酸、氰基桂板 酸、桂皮酸等。又,(a_ 2)成分可單獨使用,亦可組合使用 2種以上。 環氧化合物(a-1)與含不飽和基羧酸(a-2),能夠藉由眾 所周知的方法合成。可舉出例如將環氧化合物(a-1)與含不 飽和基羧酸(a-2),以三乙胺、苄基乙胺等3級胺、氯化十 二烷基三曱銨、氯化四曱銨、氯化四乙銨、氯化苄基三乙 銨等4級銨鹽、吼啶、三苯基膦等作為觸媒,於有機溶劑 中在反應溫度5 0〜1 5 0 °C反應數〜數十小時之方法。 (a-1)成分與(a-2)成分在反應時之使用量,係(a· 1)成分 的環氧當量與(a-2)成分的羧酸當量比通常為1 : 0.5〜1 : 2, 以1 : 0.8〜1 : 1.25為佳,以1 : 1為更佳。(a-Ι)成分與(a-2) 成分的使用量比,若是根據前述當量比為1 : 0.5〜1 : 2時, 10 200819912 有提高交聯效率之傾向,乃是較佳D 〈多元酸酐(a-3)>The unsaturated carboxylic acid (hereinafter also referred to as "(a-2) component)" used in the present invention contains reactivity such as an acrylic group and a methacrylic group in the molecule. The monocarboxylic acid of the unsaturated double bond is preferred. Examples of such an unsaturated group-containing carboxylic acid include acrylic acid, methacrylic acid, anthracene styryl acrylic acid, mercaptoacrylic acid, cyano cinnamic acid, and cinnamic acid. Further, the component (a-2) may be used singly or in combination of two or more. The epoxy compound (a-1) and the unsaturated group-containing carboxylic acid (a-2) can be synthesized by a well-known method. For example, the epoxy compound (a-1) and the unsaturated group-containing carboxylic acid (a-2), a tertiary amine such as triethylamine or benzylethylamine, or dodecyltrimonium chloride may be mentioned. 4th ammonium salt such as tetraammonium chloride, tetraethylammonium chloride or benzyltriethylammonium chloride, acridine or triphenylphosphine as catalyst, in organic solvent at reaction temperature 5 0~1 5 0 The method of °C reaction number to tens of hours. The amount of the component (a-1) and the component (a-2) used in the reaction, the ratio of the epoxy equivalent of the component (a·1) to the carboxylic acid equivalent of the component (a-2) is usually 1:0.5 to 1 : 2, with 1: 0.8~1: 1.25 is better, and 1:1 is better. When the ratio of the (a-Ι) component to the component (a-2) is from 1:0.5 to 1:2, 10 200819912 has a tendency to improve the crosslinking efficiency, and is preferable to D. Anhydride (a-3)>
多元酸酐(以下亦稱為「(a-3成分)」)係具有2個以上 的羧基之多元酸酐。該多元酸酐沒有特別限定,可舉出例 如順丁烯二酸酐、琥拍酸野、伊康酸酐、献酸酐、四氫酿 酸酐、六氫酞酸酐、甲基六氫酞酸酐、甲基四氫酞酸酐、 苯偏三酸酐、焦蜜石酸酐、二苯基酮四羧酸二酐、3 -甲基 六氫酜酸酐、4-甲基六氫酞酸酐、3 -乙基六氫酞酸酐、4-乙基六氫酞酸酐、四氫酞酸酐、3 -甲基四氫酞酸酐、4 -甲 基四氫酞酸酐、3 乙基®氫酞酸酐、4 -乙基四氫酞酸酐、 下述式(3)、(4)所示之化合物。又,此等(a-3)成分可單獨 使用,亦可組合使用2種以上。The polybasic acid anhydride (hereinafter also referred to as "(a-3 component)") is a polybasic acid anhydride having two or more carboxyl groups. The polybasic acid anhydride is not particularly limited, and examples thereof include maleic anhydride, acacia acid, iconic anhydride, acetic anhydride, tetrahydrogenic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, and methyltetrahydrogen. Anthraquinone anhydride, trimellitic anhydride, pyrogallanoic anhydride, diphenylketone tetracarboxylic dianhydride, 3-methylhexahydrophthalic anhydride, 4-methylhexahydrophthalic anhydride, 3-ethylhexahydrophthalic anhydride, 4-ethylhexahydrophthalic anhydride, tetrahydrophthalic anhydride, 3-methyltetrahydrophthalic anhydride, 4-methyltetrahydrophthalic anhydride, 3-ethylhydrohydrophthalic anhydride, 4-ethyltetrahydrophthalic anhydride, lower The compounds represented by the formulas (3) and (4). Further, these (a-3) components may be used singly or in combination of two or more.
[化學式4][Chemical Formula 4]
⑶ 11 200819912(3) 11 200819912
(式中,R2係表示亦可具有碳數1〜1 0的取代基之伸烷基)(wherein R2 represents an alkylene group which may have a substituent having 1 to 10 carbon atoms)
而且,(a-3)成分以具有2個以上苯環之化合物佳。上 述化合物中,以含有式(3)、(4)所示化合物之至少一方之 化合物為佳。藉由使用由具有2個以上苯環之多元酸酐所 合成的樹脂,能夠提供敏感度及溶解性的平衡性優良之著 色感光性樹脂組成物。 使(a-Ι)成分與(a-2)成分反應後,與(a-3)成分反應之方 法,能夠使用眾所周知的方法。 又,使用量比,係(a-1)成分與(a-2)成分之反應後的成 分中之OH基的莫耳數、與(a-3)成分之酸酐基的當量比, 通常為1: 1〜1: 0·1,以1: 0.8〜1: 0·2為佳。藉由設在上 述範圍,在顯像液中的溶解性有變為適當之傾向,乃是較 佳。 又,藉由使光聚合性化合物(a-1)成分、(a-2)成分、及 (a-3)成分反應而得到的樹脂之酸價,樹脂固體成分時,以 10毫克KOH/克以上150亳克/克以下為佳,以70毫克KOH/ 克以上110毫克KOH/克以下為更佳。藉由使樹脂的酸價 為10毫克KOH/克以上,在顯像液中能夠得到充分的溶解 性;又,藉由使酸價為150亳克【011/克以下,能夠得到 12 200819912 充分的硬化性,能夠使表面性良好。 又,樹脂的重量平均分子量以1 000以上40000以下為 佳,以2000以上30000以下為更佳。藉由使重量平均分子 量為1000以上,能夠提升耐熱性及膜強度。又,藉由在 400 0 0以下,在顯像液中能夠得到充分的溶解性。 <具有乙烯性不飽和基之單體>Further, the component (a-3) is preferably a compound having two or more benzene rings. Among the above compounds, a compound containing at least one of the compounds represented by the formulae (3) and (4) is preferred. By using a resin synthesized from a polybasic acid anhydride having two or more benzene rings, it is possible to provide a colored photosensitive resin composition having excellent balance of sensitivity and solubility. A method known as a method of reacting the (a-Ι) component with the component (a-2) and reacting with the component (a-3) can be carried out by a known method. Further, the ratio of use is such that the molar ratio of the OH group in the component after the reaction between the component (a-1) and the component (a-2) and the acid anhydride group of the component (a-3) is usually 1: 1~1: 0·1, preferably 1: 0.8~1: 0·2. By setting it in the above range, the solubility in the developing solution tends to be appropriate, which is preferable. In addition, the acid value of the resin obtained by reacting the photopolymerizable compound (a-1) component, the component (a-2), and the component (a-3) is 10 mg KOH/g in the case of the resin solid component. The above 150 g/g is preferred, and more preferably 70 mg KOH/g or more and 110 mg KOH/g or less. By making the acid value of the resin 10 mg KOH/g or more, sufficient solubility can be obtained in the developing solution; and by making the acid value 150 gram [01 / gram or less, 12 200819912 can be obtained. It has a hardenability and can make the surface properties good. Further, the weight average molecular weight of the resin is preferably 1,000 or more and 40,000 or less, and more preferably 2,000 or more and 30,000 or less. By setting the weight average molecular weight to 1,000 or more, heat resistance and film strength can be improved. Further, by 4000 or less, sufficient solubility can be obtained in the developing solution. <Monomer having an ethylenically unsaturated group>
本發明之著色感光性樹脂組成物,以含有具有乙烯性 不飽和基之單體來作為光聚合性化合物為佳。 上述具有乙烯性不飽和基之單體,以具有複數聚合性 官能基為佳。藉由含有具有乙烯性不飽和基之單體,能夠 提高所形成的膜之膜強度、或對基板的黏附性。 具有乙烯性不飽和基之單體,可舉出單官能單體及多 官能單體。 單官能單體,可舉出:(甲基)丙烯醯胺、羥甲基(甲基) 丙烯醯胺、甲氧基甲基(曱基)丙烯醯胺、乙氧基曱基(曱基) 丙烯醯胺、丙氧基甲基(甲基)丙烯醯胺、丁氧基曱氧基甲 基(甲基)丙烯醯胺、丙烯酸 '順丁烯二酸、順丁烯二酸酐、 伊康酸、伊康酸酐、檸康酸、檸檬酸酐、巴豆酸、2 _丙烯 醯胺-2-曱基丙烷磺酸、第三丁基丙烯醯胺磺酸、(曱基)丙 烯酸甲酯、(甲基)丙烯酸乙酯、(曱基)丙烯酸丁酯、(甲基) 丙烯酸2 -乙基己酯、(甲基)丙烯酸2 -羥基乙酯、(甲基)丙 烯酸2-羥基丙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯 酸2-苯氧基-2羥基丙酯、酞酸2-(甲基)丙烯醯氧基-2-羥基 13The colored photosensitive resin composition of the present invention preferably contains a monomer having an ethylenically unsaturated group as a photopolymerizable compound. The above monomer having an ethylenically unsaturated group preferably has a plurality of polymerizable functional groups. By containing a monomer having an ethylenically unsaturated group, the film strength of the formed film or the adhesion to the substrate can be improved. The monomer having an ethylenically unsaturated group may, for example, be a monofunctional monomer or a polyfunctional monomer. Examples of the monofunctional monomer include (meth)acrylamide, hydroxymethyl (meth) acrylamide, methoxymethyl (decyl) acrylamide, and ethoxylated fluorenyl (fluorenyl). Acrylamide, propoxymethyl (meth) acrylamide, butoxy methoxymethyl (meth) acrylamide, acrylic acid 'maleic acid, maleic anhydride, itaconic acid , itaconic anhydride, citraconic acid, citric anhydride, crotonic acid, 2 _ propylene phthalamide-2-mercaptopropane sulfonic acid, t-butyl acryl decyl sulfonic acid, methyl (meth) acrylate, (methyl Ethyl acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, (methyl) ) 2-hydroxybutyl acrylate, 2-phenoxy-2 hydroxypropyl (meth) acrylate, 2-(methyl) propylene oxy 2-hydroxy 13
200819912 丙酯、甘油一(甲基)丙烯酸酯、(甲基)丙烯酸四氫糠 基)丙烯酸二甲胺酯、(甲基)丙烯酸環氧丙酯、(甲^ 酸2,2,2·三氟乙酯、(曱基)丙烯酸2,2,3,3-四氟丙酯 衍生物的半(曱基)丙烯酸酯、N-羥甲基(甲基)丙 等。又,此等可單獨使用,亦可組合使用2種以上 另一方面,多官能單體可舉出:乙二醇二(甲^ 酸酯、二甘醇二(甲基)丙烯酸酯、四甘醇二(甲基) 酯、丙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基) 酯、丁二醇二(甲基)丙烯酸酯、新戊二醇二(甲基) 酯、1,6 -己二醇二(甲基)丙烯酸酯、三羥甲基丙烷三 丙烯酸酯、甘油二(甲基)丙烯酸酯、新戊四醇三丙烤 新戊四醇四丙烯酸酯、二新戊四醇五丙烯酸酯、二 醇六丙烯酸酯、二新戊四醇二(曱基)丙烯酸酯、新 三(曱基)丙烯酸酯、新戊四醇四(曱基)丙烯酸酯、 四醇五(曱基)丙烯酸酯、二新戊四醇六(曱基)丙烯 2,2-雙(4-(曱基)丙烯醯氧基二乙氧基苯基)丙烷、 (4-(甲基)丙烯醯氧基聚乙氧基苯基)丙烷、2-羥基-3 丙烯醯氧基丙基(甲基)丙烯酸酯、乙二醇二環氧丙 (甲基)丙烯酸酯、二甘醇二環丙基醚二(甲基)丙烯 酞酸二環氧丙基酯二(甲基)丙烯酸酯、甘油三丙烯 甘油聚環氧丙基醚聚(甲基)丙烯酸酯、(甲基)丙烯 甲酸酯(亦即,曱苯二異氰酸酯)、三甲基六亞甲基 酸酯及六亞甲基二異氰酸酯等與(甲基)丙烯酸2 -羥 之反應物、亞甲基雙(甲基)丙烯醯胺、(甲基)丙烯 酯、(甲 Μ丙烯 、酞酸 烯醯胺 〇 I )丙婦 丙婦酸 丙烯酸 丙烯酸 (甲基) 「酸酯、 新戊四 戊四醇 二新戊 酸酷、 2,2-雙 -(甲基) 基醚二 酸酯、 酸酯、 酸胺基 二異氰 基乙酯 醯胺亞 14 200819912 甲基醚、多元醇與N-羥曱基(甲基)丙烯醯胺之縮合物等多 官能單體、或三丙烯甲縮醛等。又,此等可單獨使用,亦 可組合使用2種以上。200819912 Propyl ester, glycerol mono(meth)acrylate, dimethylamine (meth)acrylate, propyl methacrylate, (2,2,2·3 a fluoroethyl ester, a bis(indenyl) acrylate of a 2,2,3,3-tetrafluoropropyl (meth) acrylate derivative, N-hydroxymethyl (meth) propyl, etc. Further, these may be separately Two or more types may be used in combination, and the polyfunctional monomer may, for example, be ethylene glycol di(methacrylate), diethylene glycol di(meth)acrylate or tetraethylene glycol di(methyl). Ester, propylene glycol di(meth)acrylate, polypropylene glycol di(meth)ester, butanediol di(meth)acrylate, neopentyl glycol di(meth)ester, 1,6-hexanediol II (meth) acrylate, trimethylolpropane triacrylate, glycerol di(meth) acrylate, neopentyl alcohol tripropylene roasted neopentyl alcohol tetraacrylate, dipentaerythritol pentaacrylate, two Alcohol hexaacrylate, dipentaerythritol bis(indenyl) acrylate, neotris(decyl) acrylate, pentaerythritol tetrakis(meth) acrylate, Alcohol penta(indenyl) acrylate, dipentaerythritol hexakis(propylene) propylene 2,2-bis(4-(indolyl)propenyloxydiethoxyphenyl)propane, (4-(A) Acryloxypolyethoxyphenyl)propane, 2-hydroxy-3 propyleneoxypropyl (meth) acrylate, ethylene glycol dimethacrylate (meth) acrylate, diethylene glycol Dicyclopropyl ether di(meth)acrylic acid diepoxypropyl ester di(meth)acrylate, glycerol tripropylene glycerol polyepoxypropyl ether poly(meth) acrylate, (meth) propylene a reaction product of a formate (i.e., toluene diisocyanate), trimethylhexamethylene acid ester, and hexamethylene diisocyanate with 2-hydroxyl (meth)acrylate, methylene bis (methyl) ) acrylamide, (meth) acrylate, (methacrylic acid, acrylamide oxime I), propyl acrylate, acrylic acid, acrylic acid (methyl), acid ester, neopentyl pentaerythritol dipivalic acid Cool, 2,2-bis-(methyl) ether diester, acid ester, acid amine diisocyanoethyl ester decylamine 14 200819912 methyl ether, polyol and N-hydroxyindole ( The polyfunctional monomer yl) acrylamide of condensate, or tri propylene methylal etc. Also, these may be used alone, but also be used in combination of two or more.
相對於著色感光性樹脂組成物之固體成分,此種具有 乙烯性不飽和基之單體的含量以5質量%以上5 0質量%以 下為佳,以1 0質量%以上4 0質量%以下為更佳。藉由在上 述的範圍,敏感度、顯像性、解像性的平衡,有容易得到 的傾向,乃是較佳。 [光聚合引發劑(B)] 又,光聚合引發劑(以下亦稱為「(B)成分」,可舉出: 乙醯苯、2,2 -二乙氧基乙醯苯、對二甲基乙醯苯、對二甲 基胺基丙醯苯、二氯乙醯苯、三氯乙醯苯、對第三丁基乙 醯苯等的乙醯苯類、或二苯基酮、2 -氯二苯基酮、對,對-雙二甲胺基二苯基酮等二苯基酮類、或苄基、苯偶姻、苯 偶姻甲基醚、苯偶姻異丙基醚、苯偶姻異丁基醚等苯偶姻 醚類、或苄基二甲基縮酮、噻噸、2-氯噻噸、2,4-二乙基 噻噸、2-甲基噻噸、2-異丙基噻噸等硫化合物、或2-乙基 蒽醌、八曱基蒽醌、1,2-苯并蒽醌、2,3-二苯基蒽醌等的蒽 醌類、或偶氮雙異丁腈、過氧化苯曱醯、過氧化枯烯等有 機過氧物、或2-氫硫基苯并咪唑、2-氫硫基苯并噚唑、2-氫硫基苯并噻唑等的硫醇化合物、或2-(鄰氯苯基)-4,5-二 (間甲氧基苯基)-咪唑基二聚物等咪唑基化合物、或對甲氧 基三阱ttriazine)等三併化合物、或2,4,6-參(三氯甲基)-s- 15 200819912The content of the monomer having an ethylenically unsaturated group is preferably 5% by mass or more and 50% by mass or less based on the solid content of the coloring photosensitive resin composition, and is preferably 10% by mass or more and 40% by mass or less. Better. It is preferable to have a tendency to be easily obtained by the balance of sensitivity, development, and resolution in the above range. [Photopolymerization Initiator (B)] Further, a photopolymerization initiator (hereinafter also referred to as "(B) component") includes acetophenone, 2,2-diethoxyethyl benzene, and dimethylene. Ethyl benzene, p-dimethylamino propyl benzene, dichloro ethane benzene, trichloro ethane benzene, acetophenone such as t-butyl acetonitrile, or diphenyl ketone, 2 - Diphenyl ketones such as chlorodiphenyl ketone, p-p-didimethylaminodiphenyl ketone, or benzyl, benzoin, benzoin methyl ether, benzoin isopropyl ether, benzene Benzoyl ethers such as isobutyl ether, or benzyldimethylketal, thioxanthene, 2-chlorothioxanthene, 2,4-diethylthioxanthene, 2-methylthioxanthene, 2- a sulfur compound such as isopropyl thioxane or an anthracene such as 2-ethyl hydrazine, octadecyl hydrazine, 1,2-benzopyrene or 2,3-diphenyl hydrazine, or an azo Organic peroxygen such as diisobutyronitrile, benzoquinone peroxide or cumene peroxide, or 2-hydrothiobenzimidazole, 2-hydrothiobenzoxazole, 2-hydrothiobenzothiazole, etc. a thiol compound, or an imidazolyl compound such as 2-(o-chlorophenyl)-4,5-di(m-methoxyphenyl)-imidazolyl dimer, or Oxy triple well ttriazine) and three other compounds, or 2,4,6-reference (trichloromethyl) -s- 15 200819912
三哄、二甲基-4,6-雙(三氯甲基)-5-三哄、2-[2-(5-甲基呋喃 -2-基)乙烯基]一4,6-雙(三氯甲基)-卜三哄、2-[2-(呋喃-2-基) 乙烯基]-4,6-雙(三氯甲基)-s-三阱、2-[2-(4-二乙胺基-2 -曱 基苯基)乙烯基]-4,6-雙(三氯甲基)-s-三哄、2-[2-(3,4-二甲 氧基苯基)乙烯基]-4,6-雙(三氯甲基)-S-三阱、2-(4-甲氧基 苯基)-4,6-雙(三氯曱基)-5-三哄、2-(4-乙氧基苯乙烯基)-4,6-雙(三氯甲基)-卜三哄、2-(4-正丁氧基苯基)-4,6-雙(三 氯甲基)-s-三喷等具有鹵甲基之三哄化合物、或2-苄基-2-二甲胺基-1 - (4 -味淋(rnorphqlino)苯基)-丁烧-1嗣等的胺基 酮化合物。此等光聚合引發劑可單獨使用,.亦可組合使用 2種以上。 相對於溶劑以外之固體成分的合計1 00質量份,光聚 合引發劑的含量以1質量份〜1 5 0質量份為佳,以5質量份 〜100質量份為較佳,以10質量份〜50質量份為更佳。藉 由使含量為1 5 0質量份以下,能夠得到充分的耐熱性、耐 藥品性,又,藉由使含量為1質量份以上,能夠提升塗膜 形成性能,且抑制光硬化不良。 [著色劑(C)] 本發明之著色感光性樹脂組成物含有著色劑(以下亦 稱為「(C)成分」)。 著色劑可舉出例如在比色指數(C.I.;染色師及著色師 學會(The Society of Dyers and Colourists)公司發行)分類 為顏料的化合物,具體上,以使用下述的比色指數(C. I.) 16 200819912 號碼之物為佳。 C · I ·顏料黃1 (以下,「C · I ·顏料黃」相同,只有記載號 碼)、3、11、12、13、14、15、16、17、20、24' 31、53、 55、60、61、65、71、73、74、81、83、86、93、95、97、 98、99、100、101、104、106、108、109、110、113、114、 116、 117、 119、 120' 125、 126、 127、 128、 129 > 137、 138、 139、 147、 148、 150、 151、 152、 153、 154、 155、Triterpenoid, dimethyl-4,6-bis(trichloromethyl)-5-trimethyl, 2-[2-(5-methylfuran-2-yl)vinyl]- 4,6-bis ( Trichloromethyl)-b-trimium, 2-[2-(furan-2-yl)vinyl]-4,6-bis(trichloromethyl)-s-tripper, 2-[2-(4 -diethylamino-2-mercaptophenyl)vinyl]-4,6-bis(trichloromethyl)-s-triterpene, 2-[2-(3,4-dimethoxyphenyl) )vinyl]-4,6-bis(trichloromethyl)-S-tripper, 2-(4-methoxyphenyl)-4,6-bis(trichloroindenyl)-5-triterpene , 2-(4-ethoxystyryl)-4,6-bis(trichloromethyl)-b-trimium, 2-(4-n-butoxyphenyl)-4,6-bis (three a trimethyl hydrazine compound having a halomethyl group such as chloromethyl)-s-three-spray, or 2-benzyl-2-dimethylamino-1 - (4-nolphqlino phenyl)-butane-1 An aminoketone compound such as hydrazine. These photopolymerization initiators may be used singly or in combination of two or more. The content of the photopolymerization initiator is preferably from 1 part by mass to 150 parts by mass, preferably from 5 parts by mass to 100 parts by mass, based on 100 parts by mass of the solid component other than the solvent, and is preferably 10 parts by mass. 50 parts by mass is more preferred. By setting the content to 150 parts by mass or less, sufficient heat resistance and chemical resistance can be obtained, and when the content is 1 part by mass or more, the coating film formation performance can be improved and the photocuring failure can be suppressed. [Colorant (C)] The coloring photosensitive resin composition of the present invention contains a coloring agent (hereinafter also referred to as "(C) component"). The coloring agent may, for example, be a compound classified as a pigment in a colorimetric index (CI; issued by The Society of Dyers and Colourists), specifically, using the colorimetric index (CI) described below. 16 200819912 The number is better. C · I · Pigment Yellow 1 (hereinafter, "C · I · Pigment Yellow" is the same, only the number is recorded), 3, 11, 12, 13, 14, 15, 16, 17, 20, 24' 31, 53, 55 , 60, 61, 65, 71, 73, 74, 81, 83, 86, 93, 95, 97, 98, 99, 100, 101, 104, 106, 108, 109, 110, 113, 114, 116, 117 , 119, 120' 125, 126, 127, 128, 129 > 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155,
156、 166、 167、 168、 175、 180、 185 ; C.I.顏料橙1(以下,「C.I.顏料橙」相同,只有記載號 碼)、5、13、14、16、17、2 4、3 4、36、38、40、43、46' 49 、 5卜 55 、 59 、 61 、 63 、 64 、 71 、 73 ; C.I·顏料紫1(以下,「C.I.顏料紫」相同,只有記載號 碼)、19' 23' 29、30、32、36、37、38、39、40、50;156, 166, 167, 168, 175, 180, 185; CI Pigment Orange 1 (hereinafter, "CI Pigment Orange" is the same, only the number is recorded), 5, 13, 14, 16, 17, 2 4, 3 4, 36 , 38, 40, 43, 46' 49, 5, 55, 59, 61, 63, 64, 71, 73; CI·Pigment Violet 1 (hereinafter, “CI Pigment Violet” is the same, only the number is recorded), 19' 23 '29, 30, 32, 36, 37, 38, 39, 40, 50;
C.I.顏料紅1(以下,「C.I.顏料紅」相同,只有記載號 碼)、2、3、4、5、6、7、8、9、10、11、12、14、15、16、 17、18、19、21、22、23、30、31、32、37、38、40、41、 42、48 ·· 1、48 ·· 2、48 ·· 3、48 ·· 4、49 : 1、49 ·· 2、50 : 1、 52 : 卜53 : :卜 5 7 、57 : :1〜 5 7:2、 58 : 2、58 : 4、 60:1, 63 : 1、63 :2、 64 ·· 1 ' 81 ·· 卜83 、88 、90 ·· 1 '97 、101, 102 、104、 105 106 ' 108 、112、 113 >114' 122 、123、 144 、146、 149 X 150、 151 ' 155 ' 166 、16 8、 170 、171、 172 、174、 175 176 ^ 177 、178 > 179 、1 80、 185 、187 ' 188 > 190 ' 192 ' 193 、 194 、 202 ' 206 ' 207 、 208 ' 209 ' 215 、 216 、 217 、 220 、 223 、 224 、 226 、 227 ' 228 、 240 、 17CI Pigment Red 1 (hereinafter, "CI Pigment Red" is the same, only the number is recorded), 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 14, 15, 16, 17, 18 , 19, 21, 22, 23, 30, 31, 32, 37, 38, 40, 41, 42, 48 ··1,48 ·· 2,48 ·· 3,48 ·· 4,49 : 1,49 ·· 2, 50 : 1, 52 : Bu 53 : : Bu 5 7 , 57 : : 1~ 5 7:2 , 58 : 2 , 58 : 4 , 60:1 , 63 : 1, 63 : 2 , 64 · · 1 ' 81 · · 83 , 88 , 90 · · 1 '97 , 101 , 102 , 104 , 105 106 ' 108 , 112 , 113 > 114 ' 122 , 123 , 144 , 146 , 149 X 150 , 151 ' 155 ' 166 , 16 8 , 170 , 171 , 172 , 174 , 175 176 ^ 177 , 178 > 179 , 1 80 , 185 , 187 ' 188 > 190 ' 192 ' 193 , 194 , 202 ' 206 ' 207 , 208 ' 209 ' 215 , 216 , 217 , 220 , 223 , 224 , 226 , 227 ' 228 , 240 , 17
200819912 242 、 243 、 245 、 254、 255 、 264 、 265 ; C.I.顏料藍1(以下,「C.I.顏料藍」相同,只有記 碼)、2、15、15: 3、15: 4、15: 6、16、22、60、64、 C.I.顏料綠-7、C.I.顏料綠-36、C.I.顏料綠-37 ; C.I.顏料棕 23、C.I.顏料棕 25、C.I.顏料棕 26、 顏料棕2 8 ; C · I.顏料黑1、C . I.顏料黑7。 又,形成黑色矩陣時,(C)成分以使用黑色顏料為 又,黑色顏料以碳黑為佳。又,亦可舉出鈦黑、銅、 錳、鈷、鉻、鎳、鋅、鈣、銀等的金屬氧化物、複合 物、金屬硫化物、金屬硫酸鹽或金屬碳酸鹽等。該等 顏料之中,以使用具有高遮光性之碳黑為更佳。藉由 上述光聚合性化合物,即便使用高遮光性的黑色顏料 能夠得到黏附性高、顯像餘裕度優良之著色感光性樹 成物。 碳黑可使用槽法碳黑、爐黑、熱黑、燈黑等眾所 的碳黑。又,以使用遮光性優良之槽法碳黑為特佳。 亦可使用樹脂被覆碳黑。 因為樹脂被覆碳黑與未樹脂被覆的碳黑比較時, 電性較低,所以使用作為如液晶顯示器之液晶顯示元 黑色矩陣時,能夠製造漏電少、可信賴性高之低耗電 又,亦可適當地添加上述有機顏料作為輔助顏料 以調整碳黑的色調。 載號 66; C.I. 佳。 鐵、 氧化 黑色 使用 ,亦 月旨組 周知 又, 其導 件的 顯示 ,用 18 200819912 又,用以將著色劑均勻地分散之分散劑,以使用聚伸 乙亞胺系、胺基甲酸酯樹脂系、丙烯酸樹脂系的高分子分 散劑為佳,特別是使用碳黑作為著色劑時,分散劑以使用 丙烯酸樹脂系為佳。200819912 242, 243, 245, 254, 255, 264, 265; CI Pigment Blue 1 (hereinafter, "CI Pigment Blue" is the same, only code), 2, 15, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, CI Pigment Green-7, CI Pigment Green-36, CI Pigment Green-37; CI Pigment Brown 23, CI Pigment Brown 25, CI Pigment Brown 26, Pigment Brown 2 8; C · I. Pigment Black 1, C. I. Pigment Black 7. Further, when a black matrix is formed, the component (C) is made of a black pigment, and the black pigment is preferably carbon black. Further, metal oxides, composites, metal sulfides, metal sulfates or metal carbonates such as titanium black, copper, manganese, cobalt, chromium, nickel, zinc, calcium, and silver may also be mentioned. Among these pigments, carbon black having a high light-shielding property is more preferable. By using the above-mentioned photopolymerizable compound, it is possible to obtain a color-sensitive photosensitive material having high adhesion and excellent image retention even when a black pigment having a high light-shielding property is used. For carbon black, carbon black such as channel black, furnace black, hot black, and lamp black can be used. Further, it is particularly preferable to use a grooved carbon black having excellent light shielding properties. The resin can also be coated with carbon black. When the resin-coated carbon black is compared with the carbon black which is not coated with the resin, the electrical properties are low. Therefore, when a black matrix of a liquid crystal display element such as a liquid crystal display is used, it is possible to manufacture a low power consumption with low leakage and high reliability. The above organic pigment may be appropriately added as an auxiliary pigment to adjust the color tone of the carbon black. No. 66; C.I. Good. Iron, oxidized black, also known as the group, the display of the guide, using 18 200819912, a dispersant for uniformly dispersing the colorant to use polyamidene, urethane A resin-based or acrylic resin-based polymer dispersant is preferred, and in particular, when carbon black is used as the colorant, the dispersant is preferably an acrylic resin.
又,無機顏料及有機顏料各自可單獨使用,亦可併用 2種以上,併用時相對於無機顏料及有機顏料總量1 00質 量份,有機顏料以在10質量份〜80質量份範圍使用為佳, 以在20質量份〜40質量份範圍為更佳。上述無機顏料及有 機顏料以使用分散劑分散成適當濃度之溶液後,添加在著 色感光性樹脂組成物中為佳。 又,相對於著色感光性樹脂組成物的固體成分,在本 發明著色感光性樹脂組成物之著色劑的使用量以5質量% 以上70質量%以下為佳,以2 5質量%以上5 5質量%以下 為較佳,以3 0質量%以上5 0質量%以下為更佳。藉由在上 述範圍,能夠以目標圖案的方式形成黑色矩陣或各著色劑 層,乃是較佳。 特別是形成黑色矩陣時,較佳為調整著色感光性樹脂 組成物中的黑色顏料的量,使得每膜厚度1微米之OD值 為4以上。在黑色矩陣,每膜厚度1微米之00值若是在 4以上,使用作為液晶顯示器的黑色矩陣時,能夠得到充 分的顯示對比。 [其他成分] 本發明之著色感光性樹脂組成物可按照必要調配添加 19 200819912 劑。具體上可舉出的有敏化劑、硬化促進劑、光交聯劑、 光敏化劑、分散助劑、填料、黏附促進劑、抗氧化劑、紫 外線吸收劑'防凝聚劑等。 又,本發明之感光性樹脂組成物亦可添加用以稀釋之 溶劑、或熱聚合抑制劑、消泡劑、界面活性劑等。Further, each of the inorganic pigment and the organic pigment may be used singly or in combination of two or more kinds thereof, and in combination with the total amount of the inorganic pigment and the organic pigment in an amount of 100 parts by mass, and the organic pigment is preferably used in an amount of from 10 parts by mass to 80 parts by mass. It is preferably in the range of 20 parts by mass to 40 parts by mass. The inorganic pigment and the organic pigment are preferably dispersed in a photosensitive resin composition after being dispersed in a solution having a suitable concentration using a dispersing agent. In addition, the amount of the coloring agent used in the coloring photosensitive resin composition of the present invention is preferably 5% by mass or more and 70% by mass or less, and preferably 25% by mass or more and 55% by mass based on the solid content of the coloring photosensitive resin composition. % or less is preferable, and more preferably 30% by mass or more and 50% by mass or less. It is preferable that the black matrix or the respective colorant layers can be formed in the target pattern by the above range. In particular, when a black matrix is formed, it is preferred to adjust the amount of the black pigment in the coloring photosensitive resin composition so that the OD value per film thickness of 1 μm is 4 or more. In the black matrix, if the value of 00 per film thickness of 1 μm is 4 or more, a sufficient display contrast can be obtained when a black matrix as a liquid crystal display is used. [Other Ingredients] The colored photosensitive resin composition of the present invention can be added as needed according to the preparation of the compound. Specifically, there are sensitizers, hardening accelerators, photocrosslinking agents, photosensitizers, dispersing aids, fillers, adhesion promoters, antioxidants, ultraviolet absorbers, anti-agglomerating agents, and the like. Further, the photosensitive resin composition of the present invention may be added with a solvent for dilution, a thermal polymerization inhibitor, an antifoaming agent, a surfactant, or the like.
在此,作為可添加在著色感光性樹脂組成物中的溶 劑,可舉出的有例如:乙二醇一甲基醚、乙二醇一乙基醚、 乙二醇一正丙基醚、乙二醇一正丁基醚、二甘醇一甲基醚、 二甘醇一乙基謎、二甘醇一正丙基鍵、二甘醇一正丁基醚、 三甘醇一甲基醚、三甘醇一乙基醚、丙二醇一甲基醚、丙 二醇一乙基醚、丙二醇一正丙基醚、丙二醇一正丁基謎、 二伸丙甘醇一甲基醚、二伸丙甘醇一乙基醚、二伸丙甘醇 一正丙基醚、二伸丙甘醇一正丁基醚、三伸丙甘醇一甲基 醚、三伸丙甘醇一乙基醚等的(聚)伸烷基二醇一烷基醚 類;乙二醇一曱基醚乙酸酯 '乙二醇一乙基醚乙酸酯、二 甘醇一甲基醚乙酸酯、二甘醇一乙基醚乙酸酯、丙二醇一 曱基醚乙酸酯、丙二醇一乙基醚乙酸酯等的(聚)伸烷基二 醇一烷基醚乙酸酯類;二甘醇二曱基醚、二甘醇甲基乙基 醚、二甘醇二乙基醚、四氫呋喃等其他的醚類;曱基乙基 酮、環己烷、2 -庚酮、3 -庚酮等的酮類;2 -羥基丙酸曱酯、 2-羥基丙酸乙酯等的乳酸烷基酯類;2-羥基-2-曱基丙酸乙 酯、3 -甲氧基丙酸甲酯、3 -甲氧基丙酸乙酯、3 -乙氧基丙 酸曱酯、3 -乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸 乙酯、2-羥基-3-甲基丁酸曱酯、3 -曱基-3-曱氧基丁基乙酸 20Here, examples of the solvent which can be added to the coloring photosensitive resin composition include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, and B. Glycol-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl mystery, diethylene glycol mono-n-propyl bond, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, Triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl mystery, di- propylene glycol monomethyl ether, di-propanol (poly) of ethyl ether, dipropylene glycol mono-n-propyl ether, di-n-propylglycol-n-butyl ether, tri-n-propylglycol monomethyl ether, tri-n-propylglycol monoethyl ether Alkyl glycol monoalkyl ethers; ethylene glycol monodecyl ether acetate 'ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl (poly)alkylene glycol monoalkyl ether acetates such as ether acetate, propylene glycol monodecyl ether acetate, propylene glycol monoethyl ether acetate; diethylene glycol didecyl ether, digan Alcohol methyl ethyl ether, two Other ethers such as alcohol diethyl ether and tetrahydrofuran; ketones such as mercaptoethyl ketone, cyclohexane, 2-heptanone, 3-heptanone; 2-hydroxylpropionate, 2-hydroxypropionic acid Alkyl lactate such as ethyl ester; ethyl 2-hydroxy-2-mercaptopropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionic acid Ethyl ester, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, decyl 2-hydroxy-3-methylbutanoate, 3-mercapto-3-methoxy butyl Acetic acid 20
200819912 酯、3 -甲基-3 -甲氧基丁基丙酸酯、乙酸乙酯、乙酸正丙 乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、曱酸正戊酯 酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁 丙酯、丁酸正丁酯、丙酮酸曱酯、丙酮酸乙酯、丙酮 丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2 -側氧基丁酸 等其他的酯類;甲苯、二甲苯等的芳香族烴類;N-甲 咯啶酮、N,N-二甲基甲醯胺、及N,N-二甲基乙醯胺等 胺類。此等溶劑可單獨或混合使用2種以上。 上述溶劑中,因為丙二醇一甲基醚、乙二醇一甲 乙酸酯、丙二醇一甲基醚乙酸酯、丙二醇一乙基醚乙酸 二甘醇二甲基醚、二甘醇曱基乙基醚、環己酮、及3-基丁基乙酸酯,係對光聚合性化合物、及光聚合引發 示優良的溶解性,同時能夠使顏料等的不溶性成分之 性變為良好,乃是較佳,以使用丙二醇一甲基醚乙酸 3 -甲氧基丁基乙酸酯為特佳。相對於光聚合性化合物 聚合引發劑、及著色劑之合計量1 0 〇質量份,溶劑可/ 質量份以上5 00質量份以下之範圍使用。 又,熱聚合抑制劑可使用氫醌、氫醌一乙基醚等。 消泡劑可使用石夕系、氟系化合物;界面活性劑可用陰 系、陽離子系、非離子系等眾所周知的各種界面活性 又,使用本發明之著色感光性樹脂組成物來形成 時,係如後述,在基板上塗布本發明之著色感光性樹 成物,並使其乾燥來形成膜。為了改善此時之塗布性 硬化的物性,除了上述成分以外,亦可更含有高分子 酯、 、乙 酸異 酸正 乙酯 基吡 的醯 基醚 酯、 甲氧 劑顯 分散 酯、 、、光 ^ 50 又, 離子 劑。 圖案 脂組 、及 黏合 21 200819912 劑作為結合劑。結合劑可按照相溶性、被膜形成性、顯像 性、黏著性等改善目的而適當地選擇。 在基板上所形成黑色矩陣的厚度通常可設定在1微米 〜10微米的範圍,以1.5微米〜8微米為佳,以2微米〜5微 米為更佳。厚度為1 .5微米以上時,不僅是能夠使用作為 通常的彩色濾光片用黑色矩陣,而且亦可使用作為喷墨式 之彩色濾光片的黑色矩陣。200819912 Ester, 3-methyl-3-methoxybutylpropionate, ethyl acetate, isopropyl n-propyl acetate, n-butyl acetate, isobutyl acetate, isoamyl decanoate , n-butyl propionate, ethyl butyrate, n-propyl butyrate, butyrate, n-butyl butyrate, decyl pyruvate, ethyl pyruvate, acetone propyl ester, methyl acetate methyl acetate, ethyl hydrazine Other esters such as ethyl acetate and 2-oxobutyric acid; aromatic hydrocarbons such as toluene and xylene; N-methylrrolidone, N,N-dimethylformamide, and N,N An amine such as dimethylacetamide. These solvents may be used alone or in combination of two or more. Among the above solvents, propylene glycol monomethyl ether, ethylene glycol monoacetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate diethylene glycol dimethyl ether, diethylene glycol decyl ethyl ether Cyclohexanone and 3-butylbutyl acetate are excellent in solubility in photopolymerizable compounds and photopolymerization, and are excellent in insoluble components such as pigments. It is particularly preferable to use propylene glycol monomethyl ether acetate 3-methoxybutyl acetate. The total amount of the photopolymerizable compound polymerization initiator and the coloring agent is 10 parts by mass, and the solvent can be used in a range of from 500 parts by mass to 500 parts by mass. Further, as the thermal polymerization inhibitor, hydroquinone, hydroquinone monoethyl ether or the like can be used. The antifoaming agent may be a stone-based or fluorine-based compound; and the surfactant may be formed by various known interface activities such as a cation, a cation, or a nonionic system, and when the colored photosensitive resin composition of the present invention is used. Hereinafter, the colored photosensitive dendrimer of the present invention is applied onto a substrate and dried to form a film. In order to improve the physical properties of the coating hardening at this time, in addition to the above components, a macromolecular ester, a mercaptoether ester of n-ethyl acetate isophthalate, a methoxy-dispersible ester, and an optical ^ may be further included. 50, ionic agent. Patterns of lipids, and adhesions 21 200819912 agents as binders. The binder can be appropriately selected for the purpose of improving compatibility such as compatibility, film formability, developability, and adhesion. The thickness of the black matrix formed on the substrate can be generally set in the range of 1 μm to 10 μm, preferably 1.5 μm to 8 μm, and more preferably 2 μm to 5 μm. When the thickness is 1.5 μm or more, not only a black matrix which is a usual color filter but also a black matrix which is an ink jet type color filter can be used.
本發明之著色感光性樹脂組成物能夠藉由使用攪拌機 混合上述各成分而得到。又,亦可使用過濾器過濾、,來使 所得到的混合物成為均勻之物。 [彩色濾光片的形成方法] 以下,說明使用本發明之著色感光性樹脂組成物來形 成彩色濾光片之方法。 <黑色矩陣(黑色著色層)的形成> 首先,將本發明之著色感光性樹脂組成物(含有黑色的 著色劑),使用輥塗布器、逆輥塗布器及棒塗布器等接觸轉 印型塗布裝置、或旋轉器(旋轉式塗布裝置)、簾流塗布器 等非接觸型塗布裝置,塗布在基板上。基板可使用具有光 透射性之基板。 為了提高玻璃基板與著色感光性樹脂組成物之黏附 性,亦可預先在玻璃基板上塗布矽烷偶合劑。或是亦可以 在調製著色感光性樹脂組成物時添加矽烷偶合劑。 .塗布該著色感光性樹脂組成物後,使其乾燥來除去溶 22The colored photosensitive resin composition of the present invention can be obtained by mixing the above components using a stirrer. Further, it is also possible to filter by using a filter to make the obtained mixture uniform. [Method of Forming Color Filter] Hereinafter, a method of forming a color filter using the colored photosensitive resin composition of the present invention will be described. <Formation of Black Matrix (Black Colored Layer)> First, the colored photosensitive resin composition of the present invention (black-containing coloring agent) is subjected to contact transfer using a roll coater, a reverse roll coater, and a bar coater. A non-contact type coating device such as a coating device or a rotator (rotary coating device) or a curtain coater is applied onto a substrate. A substrate having light transparency can be used as the substrate. In order to improve the adhesion of the glass substrate to the colored photosensitive resin composition, a decane coupling agent may be applied to the glass substrate in advance. Alternatively, a decane coupling agent may be added in the preparation of the colored photosensitive resin composition. After coating the colored photosensitive resin composition, it is dried to remove the solvent.
200819912 劑。乾燥方法沒有特別限定,例如能夠使用以下 法,(1)於熱板上在80°c以上120°c以下、較佳: 上1 0 0 °C以下之溫度,乾燥6 0秒至1 2 0秒鐘之 在室溫放置數小時至數天之方法,(3)在溫風加熱 線加熱器中放置數十分至數小時來除去溶劑之方 接著,使負型光罩介於中間,照射紫外線、 射光等的活性能量線來進行部分性曝光。所照射 係因感光性樹脂組成物的組成而不同,例如以 至2000 mJ/cm2左右為佳。 接著,藉由顯像液將曝光後的膜顯像而圖案 要的形狀。顯像方法沒有特別限定,例如能夠使月 喷灑法等。顯像液可舉出一乙醇胺、二乙醇胺、 胺等有機系之物,或氫氧化鈉、氫氧化鉀、碳酸 及4級鐘鹽等的水溶液。 接著,對顯像後的圖案在200t左右進行後 形成黑色矩陣。又,以將所形成的圖案全面曝光 該形成的黑色矩陣,根據其圖案形狀、厚度 亦能夠作為間隔物、喷墨用隔牆來使用。 (1) 藉由微影方式來形成彩色濾光片 在上述形成有黑色矩陣之基板上,使用含有 G、B三原色的著色劑之著色感光性樹脂組成物 上述黑色矩陣同樣地,每種顏色依照順序形成著 此能夠形成彩色濾光片。 (2) 藉由喷墨方式來形成彩色濾光片 任一種方 是9 0 〇C以 方法,(2) 器或紅外 法。 準分子雷 能量線量 3 0 m J / c m 2 化成為需 I浸潰法、 及三乙醇 鈉、氨、 烘焙,來 ,為佳。 的不同, 通常R、 ,與形成 色層。藉 23200819912 agent. The drying method is not particularly limited. For example, the following method can be used. (1) Drying at 60 ° C or more and 120 ° C or less on a hot plate, preferably at a temperature of 10 ° C or less, drying 60 seconds to 1 2 0 The method of placing the second at room temperature for several hours to several days, (3) placing the gas in the warm air heater for several ten minutes to several hours to remove the solvent, and then placing the negative mask in the middle, illuminating Partial exposure is performed by active energy lines such as ultraviolet light and light. The irradiation is different depending on the composition of the photosensitive resin composition, and is preferably, for example, about 2000 mJ/cm2. Next, the exposed film is developed by a developing liquid to form a desired shape. The development method is not particularly limited, and for example, a monthly spray method or the like can be employed. Examples of the developing solution include organic substances such as monoethanolamine, diethanolamine, and amine, or aqueous solutions of sodium hydroxide, potassium hydroxide, carbonic acid, and a 4-grade salt. Next, the developed pattern is formed at about 200t to form a black matrix. Further, the black matrix formed by uniformly exposing the formed pattern can be used as a spacer or an ink jet partition depending on the pattern shape and thickness. (1) Forming a color filter by a lithography method On the substrate on which the black matrix is formed, a coloring photosensitive resin composition containing a coloring agent of three primary colors of G and B is used, and the black matrix is similarly This is formed in sequence to form a color filter. (2) Forming a color filter by inkjet method Any one of the methods is 90 〇C by method, (2) or infrared method. The amount of excimer lightning energy line 3 0 m J / c m 2 is required to be I-impregnation method, sodium triethanolate, ammonia, baking, and preferably. The difference is usually R, , and the formation of the color layer. Borrow 23
200819912 藉由噴墨方式來形成彩色濾光片時,係、 、烫用由 的著色感光性樹脂組成物所形成之喷墨式奢金、 用隔牆(以後簡稱隔牆)。因為該隔牆係黑多& * ί〇] 達成作為黑色矩陣之任務。 具體上,首先將R、G、Β的印墨,以喑敏 被上述隔牆包圍的部位,而積存在隔牆内。 鸯箸, 或光使積存的印墨硬化。藉此,能夠形成彩 /巴璩光 [實施例] [實施例1 ] 混合400克EPICOAT ΥΧ 4000Η(作為具 /、有聯i 環氧化合物、JAPAN EPOXY RESIN公司製 > 192)、4克三苯基膦、15 3克丙烯酸、及6〇()t 丁基乙酸酯,並在9 0〜1 0 〇。(:使其反應。隨您 40克四氫酞酸酐及3 60克聯苯四叛酸酐來仕 邛為多 進而使其反應而得到具有聯苯骨架之樹脂A。 使用GPC所測定的質量平均分子量為70〇〇,甘 毫克KOH/克。 混合150克上述樹脂a、30克二新戊四醇六 醋、12克1-[9-乙基-6-(2-甲基苯甲醯基)_91!-咔唾 乙酮小(0-乙醯肟)(商品名:IRGACURE OXE 02 SPECIALTY CHEMICALS公司製)、6克氫硫基苯并 4克2,4·雙(三氯甲基)-6-(3-溴-4-曱氧基)苯基-s-三 克顏料液(商品名:CF黑、含碳黑24%、御國色素公 片形成 時能约 片。 氣當量 •田 /- -_酐, 腸A之 f賈為9〇 丙婦酸 -3·基]-、CIBA 咪ϋ坐、 併 ' 7 0 0 司製)、 24 200819912 5 0 0克3 ·甲氧基丁基乙酸酯,來調製著色感光性樹脂組成 物0 [實施例2]200819912 In the case of forming a color filter by an inkjet method, an inkjet-type luxury gold or a partition wall (hereinafter referred to as a partition wall) formed by using a colored photosensitive resin composition. Because the partition wall is black more & * ί〇] to achieve the task as a black matrix. Specifically, first, the inks of R, G, and Β are accumulated in the partition wall by the portion surrounded by the above-mentioned partition wall.鸯箸, or light hardens the accumulated ink. Thereby, it is possible to form a color/bar light [Examples] [Example 1] 400 g of EPICOAT ΥΧ 4000 混合 (as a bis-epoxy compound, JAPAN EPOXY RESIN company > 192), 4 g 3 Phenylphosphine, 15 3 g of acrylic acid, and 6 〇()t butyl acetate, and at 90 to 10 〇. (: The reaction is carried out. With 40 g of tetrahydrophthalic anhydride and 3 60 g of biphenyl tetracarboxylic anhydride, the reaction is carried out to obtain a resin A having a biphenyl skeleton. The mass average molecular weight measured by GPC 70 〇〇, mg KOH/g. Mix 150 g of the above resin a, 30 g of dipentaerythritol vinegar, 12 g of 1-[9-ethyl-6-(2-methylbenzhydryl) _91!-咔 咔 乙 ketone small (0-acetamidine) (trade name: IRGACURE OXE 02 SPECIALTY CHEMICALS company), 6 grams of thiosulfonylbenzo 4 grams 2,4 bis (trichloromethyl)-6 -(3-Bromo-4-indolyl)phenyl-s-three-gram pigment liquid (trade name: CF black, carbon black 24%, and the film of the royal pigment can form a film. Gas equivalent•Field/ - -_ Anhydride, Intestinal A, F is 9 〇 〇 -3 -3 - 】], CIBA ϋ ϋ, and ' 7000 system, 24 200819912 5 0 0 3 · methoxybutyl Acetate to prepare a colored photosensitive resin composition 0 [Example 2]
除了使用520克14€:-3000(作為具有聯苯骨架之環氧化 合物、日本化藥公司製、環氧當量188)、及650克3 -甲氧 基丁基乙酸酯以外,與實施例1同樣地進行,來合成樹脂 Β。該,樹脂Β的分子量為6000,其酸價為90亳克ΚΟΗ/克。 使用該樹脂Β來調製著色感光性樹脂組成物。 [實施例3] 除了只有使用 420g聯苯四羧酸二酐來作為多元酸酐 以外,與實施例1同樣地進行,來合成樹脂C。該樹脂C 的分子量為29000,其酸價為100亳克KOH/克。使用該樹 脂C來調製著色感光性樹脂組成物。 [比較例1 ] 除了使用 3 90克雙酚 A型環氧樹脂之 EPICOAT828 (JAPAN EPOXY RESIN公司製、環氧當量190)來作為環氧 化合物以外,與實施例1同樣地進行,來合成樹脂D。該 樹脂D的分子量為4000。使用該樹脂0來調製著色感光 性樹脂組成物。 [比較例2 ] 除了使用500克下述式(6)所示之雙環戊二烯型環氧樹 25 200819912 脂(環氧當量283)作為環氧化合物以外,與實施例1同樣地 進行,來合成樹脂E。該樹脂E的分子量為4 5 0 0。使用該 樹脂E來調製著色感光性樹脂組成物。 [化學式5]Except for 520 g of 14 €:-3000 (as an epoxy compound having a biphenyl skeleton, manufactured by Nippon Kayaku Co., Ltd., epoxy equivalent 188), and 650 g of 3-methoxybutyl acetate, and examples 1 was carried out in the same manner to synthesize resin hydrazine. The resin oxime has a molecular weight of 6000 and an acid value of 90 gram/g. This resin ruthenium was used to prepare a colored photosensitive resin composition. [Example 3] Resin C was synthesized in the same manner as in Example 1 except that only 420 g of biphenyltetracarboxylic dianhydride was used as the polybasic acid anhydride. The resin C had a molecular weight of 29,000 and an acid value of 100 g KOH/g. This resin C was used to prepare a colored photosensitive resin composition. [Comparative Example 1] Resin D was synthesized in the same manner as in Example 1 except that EPICOAT 828 (manufactured by JAPAN EPOXY RESIN Co., Ltd., epoxy equivalent 190) of 3 90 g of bisphenol A type epoxy resin was used as the epoxy compound. . The resin D had a molecular weight of 4,000. This resin 0 was used to prepare a colored photosensitive resin composition. [Comparative Example 2] The same procedure as in Example 1 was carried out except that 500 g of a dicyclopentadiene type epoxy resin 25 200819912 (epoxy equivalent 283) represented by the following formula (6) was used as the epoxy compound. Synthetic resin E. The molecular weight of the resin E was 4,500. This resin E was used to prepare a colored photosensitive resin composition. [Chemical Formula 5]
黑色矩陣的形成係如下進行。The formation of the black matrix is performed as follows.
在玻璃基板上塗布實施例及比較例的著色感光性樹脂 組成物,在9(TC烘焙120秒,來形成厚度1 .5微米的膜。 隨後,透過光罩使所形成的膜曝光(使曝光量在 50〜120mJ/cm2的範圍變化),使用鹼顯像液(商品名: N-A3K、東京應化工業社製)顯像(使顯像時間45〜70秒的 範圍變化)來形成圖案。隨後,使用循環式烘箱在220°C將 所形成的圖案後烘焙3 0分鐘,來形成線寬1 0微米的黑色 矩陣。 又,形成黑色矩陣時係以表1所示之曝光量、顯像時 間進行。 (評價) 對上述實施例及比較例所調製的著色感光性樹脂組成 物、及所形成的黑色矩陣,確認圖案直線前進性、敏感度、 26 200819912 及塗布著色感光性樹脂組成物時異物之產生。結果如表1 所示。 又,評價方法如下。 圖案直線前進性(直線前進性):目視判定所形成的1 0 微米線之邊緣是否搖動,未搖動時為〇,搖動時為X。 黏附性:在曝光部沒有剝落及缺損時為〇,有剝落及 缺損時為X。The colored photosensitive resin compositions of the examples and the comparative examples were applied on a glass substrate, and baked at a thickness of 1.5 μm for 9 seconds at TC for 120 seconds. Subsequently, the formed film was exposed through a photomask (exposure) The amount is changed in the range of 50 to 120 mJ/cm 2 ), and an alkali developing solution (trade name: N-A3K, manufactured by Tokyo Ohka Kogyo Co., Ltd.) is used for image formation (change in the range of development time of 45 to 70 seconds) to form a pattern. Subsequently, the formed pattern was post-baked at 220 ° C for 30 minutes using a circulating oven to form a black matrix having a line width of 10 μm. Further, when the black matrix was formed, the exposure amount shown in Table 1 was used. (Evaluation) The colored photosensitive resin composition prepared in the above Examples and Comparative Examples and the black matrix formed were examined for pattern linear advancement and sensitivity, and 26 200819912 and the coated colored photosensitive resin composition. The results are shown in Table 1. The evaluation method is as follows: Pattern linear advancement (linear advancement): visually judge whether the edge of the formed 10 μm line is shaken, and when it is not shaken, it is shaken. When it is moving, it is X. Adhesiveness: It is 〇 when there is no peeling and defect in the exposed part, and X when there is peeling and defect.
殘渣:顯像後在未曝光部沒有殘渣時為〇,有殘渣時 為X 〇 塗布時之異物產生:將著色感光性樹脂組成物塗布在 玻璃基板(550亳米X650亳米)後,立刻計算所形成膜上的 異物數目,求取塗布在20片玻璃基板後之平均值。 [表1] 顯像 時間 (秒) 曝光量(mJ/cm2) 異物 (個) 50 80 100 120 直線前 進性 黏附性 殘渣 直線前 進性 黏附性 殘渣 直線前 進性 黏附性 殘渣 直線前 進性 黏附性 殘渣 實施例 1 45 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 1.5 50 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 55 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇· 60 X X 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 70 X X 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 實施例 2 45 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 1.4 50 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 55 X X 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 60 X X 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 70 X X 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 實施例 3 45 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 1.4 50 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 55 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 60 X X 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 70 X X 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 比較例 1 45 X X 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 1.9 50 X X 〇 X X 〇 〇 〇 〇 〇 〇 〇 55 X X 〇 X X 〇 X X 〇 〇 〇 〇 60 X X 〇 X X 〇 X X 〇 X X 〇 70 X X 〇 X X 〇 X X 〇 X X 〇 27 200819912 比較例 2 45 X X 〇 X X 〇 X X 〇 〇 〇 〇 4.3 50 X X 〇 X X 〇 X X 〇 X X 〇 55 X X 〇 X X 〇 X X 〇 X X 〇 60 X X 〇 X X 〇 X X 〇 X X 〇 70 X X 〇 X X 〇 X X 〇 X X 〇 根據表1,使用具有聯苯骨架之光聚合性化合物而成的 著色感光性樹脂組成物,能夠具有(增大)顯像餘裕度,可形 成敏感度高、且圖案直線前進性良好之遮光膜。Residue: 显 when there is no residue in the unexposed part after development, and foreign matter when X 〇 is applied when there is residue: Applying the colored photosensitive resin composition on a glass substrate (550 X X 650 亳 meters), calculate immediately The number of foreign matters on the formed film was determined by the average value after coating on 20 glass substrates. [Table 1] Development time (seconds) Exposure amount (mJ/cm2) Foreign matter (unit) 50 80 100 120 Linear advancement Adhesive residue Linear advancement Adhesive residue Linear advancement Adhesive residue Linear advancement Adhesive residue implementation Example 1 45 〇〇〇〇〇〇〇〇〇〇〇〇1.5 50 〇〇〇〇〇〇〇〇〇〇〇〇55 〇〇〇〇〇〇〇〇〇〇〇〇· 60 XX 〇〇〇〇〇 〇〇〇〇〇70 XX 〇〇〇〇〇〇〇〇〇〇Embodiment 2 45 〇〇〇〇〇〇〇〇〇〇〇〇1.4 50 〇〇〇〇〇〇〇〇〇〇〇〇55 XX 〇 〇〇〇〇〇〇〇〇〇60 XX 〇〇〇〇〇〇〇〇〇〇70 XX 〇〇〇〇〇〇〇〇〇〇Example 3 45 〇〇〇〇〇〇〇〇〇〇〇〇1.4 50 〇〇〇〇〇〇〇〇〇〇〇〇55 〇〇〇〇〇〇〇〇〇〇〇〇60 XX 〇〇〇〇〇〇〇〇〇〇70 XX 〇〇〇〇〇〇 〇〇〇〇Comparative example 1 45 XX 〇〇〇〇〇〇〇〇〇〇1.9 50 XX 〇XX 〇〇〇〇〇〇〇55 XX 〇XX 〇XX 〇〇〇〇60 XX 〇XX 〇XX 〇XX 〇 70 XX 〇XX 〇XX 〇XX 〇27 200819912 Comparative Example 2 45 XX 〇XX 〇XX 〇〇〇〇4.3 50 XX 〇XX 〇XX 〇XX 〇55 XX 〇XX 〇XX 〇XX 〇60 XX 〇XX 〇XX 〇 XX 〇70 XX 〇XX 〇XX 〇XX 〇 According to Table 1, a colored photosensitive resin composition using a photopolymerizable compound having a biphenyl skeleton can have (increased) development margin and can form sensitivity. A light-shielding film that is high and has a straight line pattern.
【圖式簡單說明】 無 【主要元件符號說明】 無[Simple diagram description] None [Main component symbol description] None
2828
Claims (1)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006172581A JP4745146B2 (en) | 2006-06-22 | 2006-06-22 | Colored photosensitive resin composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200819912A true TW200819912A (en) | 2008-05-01 |
Family
ID=38991666
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096121567A TW200819912A (en) | 2006-06-22 | 2007-06-14 | Colored photosensitive resin composition |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4745146B2 (en) |
| KR (1) | KR20070121551A (en) |
| CN (1) | CN101093359A (en) |
| TW (1) | TW200819912A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI686669B (en) * | 2014-03-31 | 2020-03-01 | 日商日鐵化學材料股份有限公司 | Photosensitive resin composition for light shielding film, light shielding film using the same, and color filter including that film |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008003299A (en) * | 2006-06-22 | 2008-01-10 | Tokyo Ohka Kogyo Co Ltd | Colored photosensitive resin composition |
| JP2008052069A (en) * | 2006-08-25 | 2008-03-06 | Tokyo Ohka Kogyo Co Ltd | Colored photosensitive resin composition |
| CN101681107B (en) * | 2007-05-11 | 2012-12-26 | 日立化成工业株式会社 | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed circuit board |
| JP5096814B2 (en) * | 2007-07-04 | 2012-12-12 | 東京応化工業株式会社 | Colored photosensitive composition |
| JP5415923B2 (en) | 2009-12-14 | 2014-02-12 | 太陽ホールディングス株式会社 | Photosensitive resin composition, dry film thereof, and printed wiring board using them |
| JP5515714B2 (en) * | 2009-12-16 | 2014-06-11 | Jsr株式会社 | Coloring composition, color filter and color liquid crystal display element |
| JP5572737B1 (en) * | 2013-06-04 | 2014-08-13 | 太陽インキ製造株式会社 | Photo-curing thermosetting resin composition, cured product, and printed wiring board |
| JP5959125B2 (en) * | 2015-01-22 | 2016-08-02 | 日本化薬株式会社 | Reactive carboxylate compound, active energy ray-curable resin composition using the same, and use thereof |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0764281A (en) * | 1993-08-30 | 1995-03-10 | Nippon Steel Corp | Photosensitive resin composition, cured product thereof, and image forming material |
| JP4033428B2 (en) * | 1999-03-31 | 2008-01-16 | 日本化薬株式会社 | Novel unsaturated group-containing polycarboxylic acid resin, resin composition and cured product thereof |
| JP2005126674A (en) * | 2003-09-30 | 2005-05-19 | Mitsubishi Chemicals Corp | Colored resin composition, color filter, and liquid crystal display device |
| JP4534697B2 (en) * | 2003-10-27 | 2010-09-01 | 住友化学株式会社 | Colored photosensitive resin composition |
| WO2006030631A1 (en) * | 2004-09-17 | 2006-03-23 | Toppan Printing Co., Ltd. | Colored alkali developable photosensitive resin composition, and color filter using said colored alkali developable photosensitive resin composition |
| JP2007003807A (en) * | 2005-06-23 | 2007-01-11 | Sumitomo Bakelite Co Ltd | Photosensitive resin composition and solder resist using the composition |
| JP2008003299A (en) * | 2006-06-22 | 2008-01-10 | Tokyo Ohka Kogyo Co Ltd | Colored photosensitive resin composition |
-
2006
- 2006-06-22 JP JP2006172581A patent/JP4745146B2/en active Active
-
2007
- 2007-06-14 TW TW096121567A patent/TW200819912A/en unknown
- 2007-06-19 CN CNA2007101125235A patent/CN101093359A/en active Pending
- 2007-06-20 KR KR1020070060541A patent/KR20070121551A/en not_active Ceased
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI686669B (en) * | 2014-03-31 | 2020-03-01 | 日商日鐵化學材料股份有限公司 | Photosensitive resin composition for light shielding film, light shielding film using the same, and color filter including that film |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101093359A (en) | 2007-12-26 |
| JP2008003298A (en) | 2008-01-10 |
| JP4745146B2 (en) | 2011-08-10 |
| KR20070121551A (en) | 2007-12-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101291480B1 (en) | Photosensitive composition and color filter formed from photosensitive composition | |
| JP5096814B2 (en) | Colored photosensitive composition | |
| TWI719016B (en) | Colored photosensitive resin composition, color filter, and image display apparatus comprising the same | |
| TWI536104B (en) | A photosensitive resin composition, and a color filter and a display device using the same | |
| TW200819912A (en) | Colored photosensitive resin composition | |
| TWI472517B (en) | Coloring composition, color filter, and color liquid crystal display element | |
| JP2008015530A (en) | Photoresist composition and method for producing color filter substrate using the same | |
| KR20090096328A (en) | Colored photosensitive resin composition | |
| JP5843907B2 (en) | Colored photosensitive resin composition, black matrix, color filter, and liquid crystal display | |
| JP2014182383A (en) | Colored photosensitive resin composition | |
| TW200819913A (en) | Colored photosensitive resin composition | |
| TW200921271A (en) | Colored photosensitive resin composition | |
| TWI377441B (en) | ||
| KR101250684B1 (en) | Radiation-sensitive composition for the formation of colored layers, color filters, and color liquid crystal displays | |
| JP2002341533A (en) | Color composition and photosensitive color composition for color filter | |
| TWI402619B (en) | A coloring photosensitive resin composition, a black matrix, a color filter, and a liquid crystal display | |
| JP2007072035A (en) | Photosensitive composition | |
| TWI659266B (en) | Photosensitive resin composition | |
| CN110018615B (en) | Green photosensitive resin composition, color filter and image display device | |
| JP2020515898A (en) | Blue photosensitive resin composition, color filter manufactured using the same, and image display device | |
| JP2008052069A (en) | Colored photosensitive resin composition | |
| KR20180057943A (en) | Colored photosensitive resin composition, color filter and image display device produced using the same | |
| KR102195690B1 (en) | Photosensitive resin comopsition, photocurable pattern formed from the same and image display comprising the pattern | |
| JP2025024693A (en) | Photosensitive composition, cured product, black matrix, black bank, color filter, image display panel, image display device, method for producing cured product, and compound | |
| CN115903385A (en) | Photosensitive resin composition, cured film, color filter, touch panel, and display device |