TW200819913A - Colored photosensitive resin composition - Google Patents
Colored photosensitive resin composition Download PDFInfo
- Publication number
- TW200819913A TW200819913A TW096121572A TW96121572A TW200819913A TW 200819913 A TW200819913 A TW 200819913A TW 096121572 A TW096121572 A TW 096121572A TW 96121572 A TW96121572 A TW 96121572A TW 200819913 A TW200819913 A TW 200819913A
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- photosensitive resin
- colored photosensitive
- acid anhydride
- compound
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 50
- 229920005989 resin Polymers 0.000 claims abstract description 46
- 239000011347 resin Substances 0.000 claims abstract description 46
- 150000001875 compounds Chemical class 0.000 claims abstract description 41
- 150000008065 acid anhydrides Chemical class 0.000 claims abstract description 30
- 150000007519 polyprotic acids Polymers 0.000 claims abstract description 20
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims abstract description 16
- 239000003086 colorant Substances 0.000 claims abstract description 14
- 239000004593 Epoxy Substances 0.000 claims abstract description 13
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 13
- 239000003999 initiator Substances 0.000 claims abstract description 9
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 6
- 239000000049 pigment Substances 0.000 claims description 27
- 238000004040 coloring Methods 0.000 claims description 18
- 239000002253 acid Substances 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 13
- 239000000178 monomer Substances 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 abstract description 22
- 239000000758 substrate Substances 0.000 abstract description 14
- -1 styryl acrylic acid Chemical compound 0.000 description 46
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 20
- 238000000034 method Methods 0.000 description 20
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 13
- 239000006229 carbon black Substances 0.000 description 11
- 230000035945 sensitivity Effects 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 8
- 239000004305 biphenyl Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 235000010290 biphenyl Nutrition 0.000 description 7
- 230000018109 developmental process Effects 0.000 description 7
- 239000003822 epoxy resin Substances 0.000 description 7
- 229920000647 polyepoxide Polymers 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 238000005192 partition Methods 0.000 description 6
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 150000008064 anhydrides Chemical class 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000012860 organic pigment Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- 239000002270 dispersing agent Substances 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- KPSSIOMAKSHJJG-UHFFFAOYSA-N neopentyl alcohol Chemical compound CC(C)(C)CO KPSSIOMAKSHJJG-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 239000000976 ink Substances 0.000 description 3
- 239000001023 inorganic pigment Substances 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- NTKBNCABAMQDIG-UHFFFAOYSA-N 3-butoxypropan-1-ol Chemical compound CCCCOCCCO NTKBNCABAMQDIG-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- KVXNKFYSHAUJIA-UHFFFAOYSA-N acetic acid;ethoxyethane Chemical compound CC(O)=O.CCOCC KVXNKFYSHAUJIA-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 150000002923 oximes Chemical class 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- RYNQKSJRFHJZTK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) acetate Chemical compound COC(C)(C)CCOC(C)=O RYNQKSJRFHJZTK-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- LINSLUIHIHAFNA-OWOJBTEDSA-N (E)-3-sulfanylprop-2-enoic acid Chemical compound OC(=O)\C=C\S LINSLUIHIHAFNA-OWOJBTEDSA-N 0.000 description 1
- CDUQMGQIHYISOP-RMKNXTFCSA-N (e)-2-cyano-3-phenylprop-2-enoic acid Chemical compound OC(=O)C(\C#N)=C\C1=CC=CC=C1 CDUQMGQIHYISOP-RMKNXTFCSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- PUNXVEAWLAVABA-UHFFFAOYSA-N 1,2,3,4-tetrahydroanthracene;1,2,5,6-tetrahydroanthracene Chemical compound C1=CC=C2C=C(CCCC3)C3=CC2=C1.C1=CCCC2=C1C=C1CCC=CC1=C2 PUNXVEAWLAVABA-UHFFFAOYSA-N 0.000 description 1
- KMOUUZVZFBCRAM-UHFFFAOYSA-N 1,2,3,6-tetrahydrophthalic anhydride Chemical compound C1C=CCC2C(=O)OC(=O)C21 KMOUUZVZFBCRAM-UHFFFAOYSA-N 0.000 description 1
- JWTGRKUQJXIWCV-UHFFFAOYSA-N 1,2,3-trihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(O)C(O)CO JWTGRKUQJXIWCV-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- VHJHZYSXJKREEE-UHFFFAOYSA-N 2,2,3,3-tetrafluoropropyl prop-2-enoate Chemical compound FC(F)C(F)(F)COC(=O)C=C VHJHZYSXJKREEE-UHFFFAOYSA-N 0.000 description 1
- FYERTDTXGGOMGT-UHFFFAOYSA-N 2,2-diethoxyethylbenzene Chemical compound CCOC(OCC)CC1=CC=CC=C1 FYERTDTXGGOMGT-UHFFFAOYSA-N 0.000 description 1
- UMIZXRWZTDPABF-UHFFFAOYSA-N 2,3,4,4-tetramethylpent-2-ene Chemical compound CC(C)=C(C)C(C)(C)C UMIZXRWZTDPABF-UHFFFAOYSA-N 0.000 description 1
- MFUCEQWAFQMGOR-UHFFFAOYSA-N 2,4-diethyl-9h-thioxanthene Chemical compound C1=CC=C2CC3=CC(CC)=CC(CC)=C3SC2=C1 MFUCEQWAFQMGOR-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- UVNSFSOKRSZVEZ-UHFFFAOYSA-N 2-(2-decoxyethoxy)ethanol Chemical compound CCCCCCCCCCOCCOCCO UVNSFSOKRSZVEZ-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- CUDYYMUUJHLCGZ-UHFFFAOYSA-N 2-(2-methoxypropoxy)propan-1-ol Chemical compound COC(C)COC(C)CO CUDYYMUUJHLCGZ-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- DJCYDDALXPHSHR-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethanol Chemical compound CCCOCCOCCO DJCYDDALXPHSHR-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- WQNHWIYLCRZRLR-UHFFFAOYSA-N 2-(3-hydroxy-2,5-dioxooxolan-3-yl)acetic acid Chemical compound OC(=O)CC1(O)CC(=O)OC1=O WQNHWIYLCRZRLR-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- JEPGPKGGSYXGKV-UHFFFAOYSA-N 2-ethoxybutanoic acid Chemical compound CCOC(CC)C(O)=O JEPGPKGGSYXGKV-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
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- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- UZOAUVVPRBZUPQ-UHFFFAOYSA-N n,n-bis(sulfanyl)acetamide Chemical class CC(=O)N(S)S UZOAUVVPRBZUPQ-UHFFFAOYSA-N 0.000 description 1
- YWWNNLPSZSEZNZ-UHFFFAOYSA-N n,n-dimethyldecan-1-amine Chemical compound CCCCCCCCCCN(C)C YWWNNLPSZSEZNZ-UHFFFAOYSA-N 0.000 description 1
- HVAAHUDGWQAAOJ-UHFFFAOYSA-N n-benzylethanamine Chemical compound CCNCC1=CC=CC=C1 HVAAHUDGWQAAOJ-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- LBUTZYAMPMBXPT-UHFFFAOYSA-N oxolane-2-carbonyl oxolane-2-carboxylate Chemical compound C1CCOC1C(=O)OC(=O)C1CCCO1 LBUTZYAMPMBXPT-UHFFFAOYSA-N 0.000 description 1
- 150000002927 oxygen compounds Chemical class 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 1
- 229910000105 potassium hydride Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 125000005767 propoxymethyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])[#8]C([H])([H])* 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- HUAZGNHGCJGYNP-UHFFFAOYSA-N propyl butyrate Chemical compound CCCOC(=O)CCC HUAZGNHGCJGYNP-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- BGKZULDOBMANRY-UHFFFAOYSA-N sulfanyl prop-2-enoate Chemical compound SOC(=O)C=C BGKZULDOBMANRY-UHFFFAOYSA-N 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 229910052722 tritium Inorganic materials 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
200819913 九、發明說明· 【發明所屬之技術領域】 本發明係有關於一種著色感光性樹脂組成物,特別是 有關於一種著色感光性樹脂組成物’用以形成被使用於彩 色濾光片的黑色矩陣等處之遮光性膜。 【先前技術】200819913 IX. OBJECTS OF THE INVENTION 1. Field of the Invention The present invention relates to a colored photosensitive resin composition, and more particularly to a colored photosensitive resin composition 'for forming a black color used for a color filter A light-shielding film at a matrix or the like. [Prior Art]
先前’作為使用顏料之彩色濾光片的製法,已知有染 色法、電極沈積法、噴墨法、顏料分散法等。顏料分散法 的情況’係將在著色組成物(使用分散劑等將顏料分散而成) 中添加黏合劑樹脂、光聚合引發劑、及光聚合性單體等而 感光化的者色感光性樹脂組成物,塗布在玻璃基板上,乾 燥後進行曝光、顯像來形成著色圖案。隨後,加熱來使圖 案固著而形成像素。對各顏色重複該等步驟來形成彩色濾 光片。 ^ /巴應无片的像素所使用的著色感光性樹脂 =物求充分的解像性、舆基板的黏附性、低顯像殘 影+ :性。又’藉由顏料分散法來形成時,能夠供給光微 姦 、要求在頌像步驟之除去部分不可 產生殘造或污染、除去部 提高η垒、嘉& 刀必頊,、有充分的溶解性、以及 圖案邊緣的銳利度等圖案形成性。 特別是如黑色矩陣般的要求在 光能力時,會右轴不虚丄 主波長Q域具有遮 差…、 曝光部分與未曝光部分中之交聯密产 差異係十分困難之問題; 聯在度 便疋曝先部分,雖然在光 5 200819913 照射面側能夠充分地硬化,但是會有在基底側面未硬化的 問題等。又,因為多量地調配在顯像液中不溶的黑色著色 劑’亦會產生顯像性顯著下降之問題。 因此,為了解決此種問題,揭示一種著色感光性樹脂 組成物(參照專利文獻1 ),係使用具有羧基之酚醛清漆環 氧丙烯酸酯作為黏合劑樹脂。Conventionally, as a method of producing a color filter using a pigment, a dyeing method, an electrodeposition method, an inkjet method, a pigment dispersion method, and the like are known. In the case of the pigment dispersion method, a photosensitive resin which is sensitized by adding a binder resin, a photopolymerization initiator, a photopolymerizable monomer, or the like to a coloring composition (dispersion of a pigment using a dispersing agent or the like) The composition was applied onto a glass substrate, dried, and exposed and developed to form a colored pattern. Subsequently, heating is applied to fix the pattern to form a pixel. These steps are repeated for each color to form a color filter. ^ / Ba Ying's color-sensitive photosensitive resin used in the film of the film = sufficient resolution for the object, adhesion of the ruthenium substrate, low development image retention +: property. In addition, when it is formed by the pigment dispersion method, it is possible to supply light, and it is required that no part of the removal step can be produced or contaminated, and the removal part can improve the η barrier, and the knives must be sufficiently dissolved. Pattern formation such as sex and sharpness of the edge of the pattern. In particular, if the black matrix is required in the light capability, the right axis is not imaginary, the main wavelength Q domain has a difference in the ..., and the cross-linking difference between the exposed portion and the unexposed portion is very difficult; The exposure portion is sufficiently cured, but it is sufficiently hardened on the side of the irradiation surface of the light 5 200819913, but there is a problem that the side surface of the substrate is not hardened. Further, since a large amount of black colorant which is insoluble in the developing liquid is mixed in a large amount, there is a problem that the developing property is remarkably lowered. Therefore, in order to solve such a problem, a coloring photosensitive resin composition (see Patent Document 1) is disclosed, and a novolak epoxy acrylate having a carboxyl group is used as a binder resin.
又,揭示一種著色感光性樹脂組成物(參照專利文獻 2) ’係使用具有羧基之丙烯酸樹酯與含有脂環族環氧基之 不餘和化合物之反應物來作為黏合劑樹脂。 又’揭示一種著色感光性樹脂組成物(參照專利文獻 3) ’含有聚羧酸樹脂,該聚羧酸樹脂係使具有2個環氧基 之每氧化合物和單羧酸之反.應物,與酸酐進行反應而得到。 [專利文獻1]日本特開平1 1 -841 26號公報 [專利文獻2 ]日本特開平1 - 2 8 9 8 2 0號公報 [專利文獻3]日本特開2004-43 573號公報 【發明内容】 [發明所欲解決之問題] 但是,即便是在上述專利文獻1〜3所記載之樹脂組成 ’亦會有敏感度不充分、對像素之黏附性差而容易剝落、 各易殘留殘渣等問題點。又,因為顯像餘裕度(margin)小, 俊照顯像時間會有連曝光部都剝離掉、像素的邊緣動搖等 問題尚未解除。 繁於上述課題,本發明提供一種著色感光性樹脂組成 6Further, a coloring photosensitive resin composition (see Patent Document 2) is used as a binder resin by using a reaction product of a carboxyl group-containing acrylate resin and an alicyclic epoxy group-containing compound. Further, the present invention discloses a color-sensitive photosensitive resin composition (see Patent Document 3), which contains a polycarboxylic acid resin which is a reaction product of an oxygen compound having two epoxy groups and a monocarboxylic acid. It is obtained by reacting with an acid anhydride. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei No. Hei. No. 2004-43 No. [Problems to be Solved by the Invention] However, even in the resin composition described in the above Patent Documents 1 to 3, there are problems such as insufficient sensitivity, poor adhesion to pixels, easy peeling, and residual residue. . In addition, since the development margin is small, the problem of the exposure time of the photo will be peeled off and the edge of the pixel will be shaken. In view of the above problems, the present invention provides a coloring photosensitive resin composition 6
200819913 物,能夠在基板上容易地形成直線性優良、不 或殘渣,且顯示對比優良之良好的黑色矩陣圖 [解決問題之技術手段] 為解決上述課題,本發明者等重複專心研 發現藉由將含有對光感受性優良的官能基之樹 光性組成物,能夠解決上述課題,而完成了本 體地,本發明係提供以下之物。 本發明係提供一種著色感光性樹脂組成物 聚合性化合物(A)、光聚合引發劑(B)、及著色丨 感光性樹脂組成物,前述光聚合性化合物(Α)係 化合物(a-1)與含不飽和基羧酸(a-2)之反應物, 酸酐(a-3)反應而得到的樹脂,且前述多元酸酐 至少2個苯環之化合物。 [功效] 若依照本發明之著色感光性樹脂組成物, 感光性樹脂組成物中的光聚合性化合物所含 料,係使用具有至少2個苯環之多元酸酐。因 供感度及溶解性的平衡性優良、且像素邊緣的 基材之黏附性優良之著色感光性樹脂組成物。 容易地以對比高、且R、G、B的發色美麗之形 液晶顯示器用彩色濾光片。 會產生剝落 案。 究之結果, 脂應用於感 發明。更具 ,係含有光 IJ (C)之著色 含有使環氧 進而與多元 (a-3)係具有 作為在著色 有樹脂之原 此,能夠提 銳利性、與 而且,能夠 態,來提供 7 200819913 【實施方式】 [實施發明的較佳形態] 以下,說明本發明之實施形態。本發明之著色感光性 樹脂組成物(以下亦稱為「組成物」),係含有光聚合性化 合物(A)、光聚合引發劑(B)、及著色劑(C)。 [光聚合性化合物(A)]In the case of the above-mentioned problem, the inventors of the present invention have repeatedly developed a black matrix image which is excellent in linearity and does not have a residue and which is excellent in contrast. The optical composition containing a functional group excellent in photoreceptivity can solve the above problems, and the present invention is completed. The present invention provides the following. The present invention provides a colored photosensitive resin composition polymerizable compound (A), a photopolymerization initiator (B), and a colored enamel photosensitive resin composition, and the photopolymerizable compound (Α)-based compound (a-1) a resin obtained by reacting a reaction product containing an unsaturated carboxylic acid (a-2) with an acid anhydride (a-3), and a compound of at least two benzene rings of the above polybasic acid anhydride. [Efficacy] According to the colored photosensitive resin composition of the present invention, a polybasic acid anhydride having at least two benzene rings is used as the material of the photopolymerizable compound in the photosensitive resin composition. A colored photosensitive resin composition which is excellent in balance between sensitivity and solubility and excellent in adhesion of a substrate at the edge of a pixel. It is easy to use a color filter with a high contrast and a beautiful color of R, G, and B. There will be a peeling off. As a result, fat was applied to the invention. In addition, the color containing the light IJ (C) contains the epoxy and the poly (a-3), and can be used as the resin to be colored, and can be sharpened and provided. 7 200819913 [Embodiment] [Best Mode for Carrying Out the Invention] Hereinafter, embodiments of the present invention will be described. The colored photosensitive resin composition (hereinafter also referred to as "composition") of the present invention contains a photopolymerizable compound (A), a photopolymerization initiator (B), and a color former (C). [Photopolymerizable Compound (A)]
光聚合性化合物(以下亦稱為「(A)成分」係含有使環 氧化合物(a-1)與含不飽和基羧酸(a-2)之反應物,進而與多 元酸酐(a-3)反應而得到的樹脂。以下說明各自的成分。 <環氧化合物(a-l)> 本發明所使用的環氧化合物(以下亦稱為(a-1)成分)沒 有特別限定,可舉出例如環氧丙基醚型、環氧丙基酯型、 環氧丙基胺型、脂環型、雙酚A型、雙酚F型、雙酚S型、 聯苯型、萘型、荞型、苯酚酚醛清漆型、鄰甲酚型環氧樹 脂。其中,以聯苯型環氧樹脂為佳。聯苯型環氧樹脂,在 主鏈具有至少1個以上下述式(5)所示之聯苯骨架,且具有 至少1個以上環氧基。又,(a-1 )成分以具有2個以上環氧 基之物為佳。 [化學式1]The photopolymerizable compound (hereinafter also referred to as "(A) component" contains a reaction product of the epoxy compound (a-1) and the unsaturated group-containing carboxylic acid (a-2), and further with a polybasic acid anhydride (a-3). The resin obtained by the reaction. The respective components are described below. <Epoxy compound (al)> The epoxy compound (hereinafter also referred to as component (a-1)) used in the present invention is not particularly limited, and examples thereof include For example, epoxy propyl ether type, epoxy propyl ester type, epoxy propyl amine type, alicyclic type, bisphenol A type, bisphenol F type, bisphenol S type, biphenyl type, naphthalene type, anthraquinone type A phenol novolac type or an o-cresol type epoxy resin. Among them, a biphenyl type epoxy resin is preferred. The biphenyl type epoxy resin has at least one or more of the following formula (5) in the main chain. The biphenyl skeleton has at least one epoxy group. Further, the component (a-1) is preferably one having two or more epoxy groups.
(式中,複數個R3係各自獨立地表示氫原子、碳數1〜1 2的 8 200819913 烷基、i素原子、或是亦可具有取代基之苯基,1係表示 1〜4的整數) 又,在聯苯型環氧樹脂中,以使用下述式(3)所示之環 氧樹脂為佳,以使用下述式(4)所示之環氧樹脂為特佳。藉 由使用式(4)的化合物,能夠提供敏感度及溶解性之平衡性 優良的組成物。又,(a-1)成分可單獨使用,亦可組合使用 2種以上。 [化學式2](In the formula, a plurality of R3 groups each independently represent a hydrogen atom, a carbon number of 1 to 12, 8 200819913 alkyl group, an i atom or a phenyl group which may have a substituent, and 1 represents an integer of 1 to 4; Further, in the biphenyl type epoxy resin, an epoxy resin represented by the following formula (3) is preferably used, and an epoxy resin represented by the following formula (4) is particularly preferable. By using the compound of the formula (4), it is possible to provide a composition excellent in balance of sensitivity and solubility. Further, the component (a-1) may be used singly or in combination of two or more. [Chemical Formula 2]
(式中,複數個R1係各自獨立地表示氫原子、碳數1〜12的 烷基、鹵素原子、或是亦可具有取代基之苯基,η係表示 1〜4的整數) [化學式3](wherein the plural R1 groups each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, a halogen atom, or a phenyl group which may have a substituent, and η represents an integer of 1 to 4) [Chemical Formula 3 ]
又,在式(3)及(4),m為平均值,係表示0〜10的數目。 該m以小於1為佳。 <含不飽和基羧酸(a-2)> 在本發明所使用之含不飽基羧酸(以下亦稱為「(a_2) 200819913 成分」),以在分子中含有丙烯基(acrylic group)及甲基丙 烯基(methacrylic group)等反應性的不飽和雙鍵之單羧酸 為佳。此種含不飽和基羧酸,可舉出例如丙烯酸、曱基丙 烯酸、苯乙烯基丙烯酸、/3-糠基丙烯酸、α-氰基桂板 酸、桂皮酸等。又,(a-2)成分可單獨使用,亦可組合使用 2種以上。Further, in the formulas (3) and (4), m is an average value and represents the number of 0 to 10. The m is preferably less than 1. <Unsaturated Carboxylic Acid (a-2)> The unsaturated carboxylic acid (hereinafter also referred to as "(a_2) 200819913 component") used in the present invention to contain a propylene group in the molecule Group) and a monocarboxylic acid having a reactive unsaturated double bond such as a methacrylic group is preferred. Examples of such an unsaturated group-containing carboxylic acid include acrylic acid, mercapto acrylic acid, styryl acrylic acid, /3-mercaptoacrylic acid, α-cyano cinnamic acid, cinnamic acid and the like. Further, the component (a-2) may be used singly or in combination of two or more.
環氧化合物(a-1)與含不飽和基羧酸(a-2),能夠藉由眾 所周知的方法合成。可舉出例如將環氧化合物(a-1)與含不 飽和基羧酸(a-2),以三乙胺、苄基乙胺等3級胺、氯化十 二烷基三甲銨、氯化四甲銨、氯化四乙銨、氯化苄基三乙 銨等4級銨鹽、吼啶、三苯基膦等作為觸媒,於有機溶劑 中在反應溫度50〜150 °C反應數〜數十小時之方法。 (a-1)成分與(a-2)成分在反應時之使用量,係(a-1)成分 的環氧當量與(a-2)成分的羧酸當量比通常為1 : 0.5〜1 : 2, 以1 : 0.8〜1 : 1.25為佳,以1 : 1為更佳。(a-1)成分與(a-2) 成分的使用量比,若是根據前述當量比為1 : 0.5〜1 : 2時, 有提高交聯效率之傾向,乃是較佳。 <多元酸酐(a-3)> 在本發明所使用的多元酸酐(以下亦稱為「(a-3成 分)」),係具有2個以上的羧基之多元酸酐,含有具有至 少2個苯環之化合物。此種(a_ 3)成分可舉出例如下述式(1) 所示之具有聯苯骨架之酸酐、(2)所示之2個苯環藉由有機 基鍵結而成的酸酐。 10 (1)200819913 [化學式4]The epoxy compound (a-1) and the unsaturated group-containing carboxylic acid (a-2) can be synthesized by a well-known method. For example, the epoxy compound (a-1) and the unsaturated group-containing carboxylic acid (a-2), a tertiary amine such as triethylamine or benzylethylamine, dodecyltrimethylammonium chloride or chlorine may be mentioned. 4th ammonium salt such as tetramethylammonium chloride, tetraethylammonium chloride or benzyltriethylammonium chloride, acridine, triphenylphosphine, etc. as a catalyst, reacted in an organic solvent at a reaction temperature of 50 to 150 ° C ~ dozens of hours of method. The amount of (a-1) component and (a-2) component used in the reaction is such that the ratio of the epoxy equivalent of the component (a-1) to the carboxylic acid equivalent of the component (a-2) is usually 1: 0.5 to 1 : 2, with 1: 0.8~1: 1.25 is better, and 1:1 is better. When the ratio of the component (a-1) to the component (a-2) is from 1:0.5 to 1:2, the crosslinking efficiency tends to be improved, which is preferable. <Polyhydric acid anhydride (a-3)> The polybasic acid anhydride (hereinafter also referred to as "(a-3 component)") used in the present invention is a polybasic acid anhydride having two or more carboxyl groups, and has at least two a compound of a benzene ring. The (a-3) component may, for example, be an acid anhydride having a biphenyl skeleton represented by the following formula (1) and an acid anhydride in which two benzene rings represented by (2) are bonded by an organic group. 10 (1)200819913 [Chemical Formula 4]
(式中, 藉 在光聚 光聚合 良、且 組成物 又 外,亦 丁烯二 六氫酜 酸酐、 R2係表示亦可具有碳數1〜1 0的取代基之伸烷基) 由使用上述具有2個以上的羧基之羧酸的酐,能夠 合性化合物中,導入至少2個苯環。藉由使用此種 性化合物,能夠提供敏感度及溶解性的平衡性優 像素邊緣的銳利性、黏附性優良的著色感光性樹脂 〇 ,(a-3)成分除了上述具有至少 2個苯環之酸酐以 可含有其他多元酸酐。其他多元酸酐可舉出例如順 酸酐、琥珀酸酐、伊康酸酐、酞酸酐、四氫酞酸酐、 酸酐、曱基六氫酞酸酐、甲基四氫酞酸酐、苯偏三 焦蜜石酸酐、二苯基酮四羧酸二酐、3 -甲基六氫& π 200819913 酸酐、4 -甲基六氫酞酸酐、3 -乙基六氫酞酸酐、4 -乙基六 氫酞酸酐、四氫酞酸酐、3 -甲基四氫酿酸酐、4 -甲基四氫 酞酸酐、3 -乙基四氳酞酸酐、4 -乙基四氫酞酸酐等,此等 可單獨使用,亦可組合使用2種以上。(In the formula, by photopolymerization, and the composition is further, butene hexahydrophthalic anhydride, and R2 means an alkylene group which may have a substituent having a carbon number of 1 to 10). An anhydride having a carboxylic acid having two or more carboxyl groups, and at least two benzene rings can be introduced into the conjugated compound. By using such a compound, it is possible to provide a color-sensitive photosensitive resin having excellent sharpness and solubility in the balance of sensitivity and solubility, and the (a-3) component has at least two benzene rings in addition to the above. The acid anhydride may contain other polybasic acid anhydrides. Examples of the other polybasic acid anhydrides include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, acid anhydride, mercapto hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, benzene trimellitic acid anhydride, and diphenyl. Ketone tetracarboxylic dianhydride, 3-methylhexahydro& π 200819913 anhydride, 4-methylhexahydrophthalic anhydride, 3-ethylhexahydrophthalic anhydride, 4-ethylhexahydrophthalic anhydride, tetrahydroanthracene An acid anhydride, 3-methyltetrahydro-glycolic anhydride, 4-methyltetrahydrophthalic anhydride, 3-ethyltetraphthalic anhydride, 4-ethyltetrahydrophthalic anhydride, etc., which may be used singly or in combination 2 More than one species.
使(a-Ι)成分與(a-2)成分反應後,與(a-3)成分反應之方 法,能夠使用眾所周知的方法。又,使用量比,係(a -1)成 分與(a-2)成分之反應後的成分中之OH基的莫耳數、與(a-3) 成分之酸酐基的當量比,通常為1:1〜1:0.1,以1:0.8〜1: 0.2為佳。藉由設在上述範圍,在顯像液中的溶解性有變 為適當之傾向,乃是較佳。 又,藉由使光聚合性化合物(a-1)成分、(a-2)成分、及 (a-3)成分反應而得到的樹脂之酸價,樹脂固體成分時,以 10毫克KOH/克以上150毫克/克以下為佳,以70亳克KOH/ 克以上110亳克KOH/克以下為更佳。藉由使樹脂的酸價 為10毫克KOH/克以上,在顯像液中能夠得到充分的溶解 性;又,藉由使酸價為15 0毫克KOH/克以下,能夠得到 充分的硬化性,能夠使表面性良好。 又,樹脂的重量平均分子量以1 0 0 0以上4 0 0 0 0以下為 佳,以2 0 0 0以上3 0 0 0 0以下為更佳。藉由使重量平均分子 量為1 000以上,能夠提升耐熱性及膜強度。又,藉由在 40000以下,在顯像液中能夠得到充分的溶解性。 <具有乙烯性不飽和基之單體> 本發明之著色感光性樹脂組成物,以含有具有乙烯性 12 200819913 不飽和基之單體來作為光聚合性化合物為佳。 上述具有乙烯性不飽和基之單體,以具有複數聚合性 官能基為佳。藉由含有具有乙烯性不飽和基之單體,能夠 提高所形成的膜之膜強度、或對基板的黏附性。 具有乙烯性不飽和基之單體,可舉出單官能單體及多 官能單體。A method known as a method of reacting the (a-Ι) component with the component (a-2) and reacting with the component (a-3) can be carried out by a known method. Further, the ratio of use is such that the molar ratio of the OH group in the component after the reaction of the component (a-1) and the component (a-2) and the acid anhydride group of the component (a-3) are usually 1:1~1:0.1, preferably 1:0.8~1: 0.2. By setting it in the above range, the solubility in the developing solution tends to be appropriate, which is preferable. In addition, the acid value of the resin obtained by reacting the photopolymerizable compound (a-1) component, the component (a-2), and the component (a-3) is 10 mg KOH/g in the case of the resin solid component. The above 150 mg/g is preferred, and more preferably 70 g KOH/g or more and 110 g KOH/g or less. When the acid value of the resin is 10 mgKOH/g or more, sufficient solubility can be obtained in the developing solution, and sufficient acidity can be obtained by setting the acid value to 150 mgKOH/g or less. It is possible to make the surface properties good. Further, the weight average molecular weight of the resin is preferably from 1,000 to 4,000, and more preferably from 2,000 to 3,000. By setting the weight average molecular weight to 1,000 or more, heat resistance and film strength can be improved. Further, by 40,000 or less, sufficient solubility can be obtained in the developing solution. <Monomer having an ethylenically unsaturated group> The colored photosensitive resin composition of the present invention preferably contains a monomer having an ethylenic 12 200819913 unsaturated group as a photopolymerizable compound. The above monomer having an ethylenically unsaturated group preferably has a plurality of polymerizable functional groups. By containing a monomer having an ethylenically unsaturated group, the film strength of the formed film or the adhesion to the substrate can be improved. The monomer having an ethylenically unsaturated group may, for example, be a monofunctional monomer or a polyfunctional monomer.
單官能單體,可舉出:(甲基)丙烯醯胺、羥甲基(甲基) 丙烯醯胺、甲氧基曱基(甲基)丙烯醯胺'乙氧基甲基(甲基) 丙烯醯胺、丙氧基甲基(甲基)丙烯醯胺、丁氧基甲氧曱基 (甲基)丙烯醯胺、丙烯酸'順丁烯二酸、順丁烯二酸酐、 伊康酸、伊康酸酐、檸康酸、檸檬酸酐、巴豆酸、2 _丙烯 醯胺-2-甲基丙烷磺酸、第三丁基丙烯醯胺磺酸、(甲基)丙 烯酸曱酯、(曱基)丙烯酸乙酯、(曱基)丙烯酸丁酯、(甲基) 丙烯酸2-乙基己酯、(甲基)丙烯酸2-羥基乙酯、(曱基)丙 烯酸2 -羥基丙酯、(甲基)丙烯酸2 -羥基丁酯、(甲基)丙烯 酸2-苯氧基-2羥基丙酯、酞酸2-(曱基)丙烯醯氧基-2-羥基 丙酯、甘油一(甲基)丙烯酸醋、(甲基)丙稀酸四氫糠酯、(甲 基)丙烯酸二甲胺酯、(甲基)丙烯酸環氧丙酯、(甲基)丙稀 酸2,2,2-三氟乙酯、(甲基)丙烯酸2,2,3,3-四氟丙酯、酞酸 衍生物的半(曱基)丙烯酸酯、N-羥甲基(曱基)丙烯醯胺 等。又,此等可單獨使用,亦可組合使用2種以上。 另一方面,多官能單體可舉出:乙二醇二(甲基)丙烯 酸酯、二甘醇二(曱基)丙烯酸酯、四甘醇二(甲基)丙烯酸 酯、丙二醇二(曱基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸 13The monofunctional monomer may, for example, be (meth) acrylamide, hydroxymethyl (meth) acrylamide, methoxy decyl (meth) acrylamide ethoxymethyl (methyl) Propylene decylamine, propoxymethyl (meth) acrylamide, butoxymethoxy methoxy (meth) acrylamide, acrylic acid 'maleic acid, maleic anhydride, itaconic acid, Ikonic anhydride, citraconic acid, citric acid anhydride, crotonic acid, 2 propylene acrylamide 2-methylpropane sulfonic acid, t-butyl acrylamide decyl sulfonate, decyl (meth) acrylate, (fluorenyl) Ethyl acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, (methyl) 2-hydroxybutyl acrylate, 2-phenoxy-2 hydroxypropyl (meth) acrylate, 2-(indenyl) propylene oxy-2-hydroxypropyl phthalate, glycerol mono(meth) acrylate , (meth) isopropyl tetrahydrofurfuryl ester, dimethyl (meth) acrylate, glycidyl (meth) acrylate, 2,2,2-trifluoroethyl (meth) acrylate (A ) 2,2,3,3-tetrafluoro-propyl acrylate, phthalic acid derivative half (Yue-yl) acrylate, N- methylol (Yue-yl) acrylamide and the like. Further, these may be used alone or in combination of two or more. On the other hand, examples of the polyfunctional monomer include ethylene glycol di(meth)acrylate, diethylene glycol di(decyl)acrylate, tetraethylene glycol di(meth)acrylate, and propylene glycol di(decyl) group. Acrylate, polypropylene glycol di(meth)acrylic acid 13
200819913 酯、丁二醇二(曱基)丙烯酸酯、新戊二醇二(曱基) 酯、1,6-己二醇二(甲基)丙#酸酯、三羥甲基丙烷三 丙烯酸酯、甘油二(曱基)丙烯酸酯、新戊四醇三丙烯 新戊四醇四丙烯酸酯、二新戊四醇五丙烯酸酯、二 醇六丙烯酸酯、二新戊四醇二(甲基)丙烯酸酯、新 三(甲基)丙烯酸酯、新戊四醇四(曱基)丙烯酸酯、 四醇五(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯 2,2-雙(4-(甲基)丙烯醯氧基二乙氧基苯基)丙烷、 (4-(曱基)丙烯醯氧基聚乙氧基苯基)丙烷、2-羥基-3. 丙烯醯氧基丙基(曱基)丙烯酸酯、乙二醇二環氧丙 (甲基)丙烯酸酯、二甘醇二環丙基醚二(曱基)丙烯 酞酸二環氧丙基酯二(甲基)丙烯酸酯、甘油三丙烯 甘油聚環氧丙基醚聚(曱基)丙烯酸酯、(甲基)丙烯 甲酸酯(亦即,曱苯二異氰酸酯)、三曱基六亞曱基 酸酯及六亞甲基二異氰酸酯等與(甲基)丙烯酸2_羥 之反應物、亞曱基雙(曱基)丙烯醯胺、(曱基)丙烯 曱基醚、多元醇與N-羥甲基(甲基)丙烯醯胺之縮合 官能單體、或三丙烯甲縮醛等。又,此等可單獨使 可組合使用2種以上。 相對於著色感光性樹脂組成物之固體成分,此 乙烯性不飽和基之單體的含量以5質量%以上50質 下為佳,以1 0質量%以上4 0質量%以下為更佳。藉 述的範圍,敏感度、顯像性、解像性的平衡,有容 的傾向,乃是較佳。 丙烯酸 (甲基) 酸S旨、 新戊四 戊四醇 二新戊 酸酯、 2,2·雙 -(甲基) 基醚二 酸酯、 酸酯、 酸胺基 二異氰 基乙酯 醯胺亞 物等多 用,亦 種具有 量%以 由在上 易得到 14 200819913 [光聚合引發劑(B)] 又,光聚合引發劑(以下亦稱為「(B)成分」,可舉出:200819913 Ester, butanediol di(mercapto) acrylate, neopentyl glycol bis(indenyl) ester, 1,6-hexanediol di(methyl)propanoate, trimethylolpropane triacrylate , glycerol di(decyl) acrylate, neopentyl alcohol tripropylene neopentyl alcohol tetraacrylate, dipentaerythritol pentaacrylate, diol hexaacrylate, dipentaerythritol di(meth)acrylic acid Ester, neotris(meth)acrylate, pentaerythritol tetrakis(meth)acrylate, tetraol penta(meth)acrylate, dipentaerythritol hexa(methyl)propene 2,2-dual ( 4-(Methyl)propenyloxydiethoxyphenyl)propane, (4-(indenyl)propenyloxypolyethoxyphenyl)propane, 2-hydroxy-3. Acryloxypropane Base (mercapto) acrylate, ethylene glycol dimethacrylate (meth) acrylate, diethylene glycol dicyclopropyl ether bis(indenyl) acrylic acid diepoxypropyl bis (meth) acrylate Ester, glycerol tripropylene glycerol polyepoxypropyl ether poly(indenyl) acrylate, (meth) acrylate (ie, phthalmethylene diisocyanate), tridecyl hexamethylene fluorene Reaction of acid ester and hexamethylene diisocyanate with 2-hydroxyl (meth)acrylic acid, fluorenyl bis(indenyl) acrylamide, (fluorenyl) propylene decyl ether, polyol and N-hydroxyl A condensed functional monomer of methyl (meth) acrylamide or tripropylene acetal. Further, these may be used alone or in combination of two or more. The content of the monomer of the ethylenically unsaturated group is preferably 5% by mass or more and 50% by mass, and more preferably 10% by mass or more and 40% by mass or less based on the solid content of the coloring photosensitive resin composition. The range of reliance, the balance of sensitivity, imaging, and resolution, and the tendency to have a tendency are better. Acrylic (meth) acid S, neopentyl pentaerythritol dipivalate, 2,2·bis-(methyl) ether diester, acid ester, acid amine diisocyanoethyl ester Amines and the like are used in a large amount, and are also available in an amount of up to 14 200819913 [Photopolymerization Initiator (B)] Further, a photopolymerization initiator (hereinafter also referred to as "(B) component"),
乙醯苯、2,2 -二乙氧基乙醯苯、對二甲基乙醯苯' 對二甲 基胺基丙醯苯、二氯乙醯苯、三氯乙醯苯、對第三丁基乙 醯苯等的乙醯苯類、或二苯基酮、2-氯二苯基酮、對,對-雙二甲胺基二苯基酮等二苯基酮類、或苄基、苯偶姻、苯 偶姻甲基醚、苯偶姻異丙基醚、苯偶姻異丁基醚等苯偶姻 醚類、或苄基二甲基縮酮、噻噸、2-氯噻噸、2,4-二乙基 噻噸、2 -甲基噻噸、2 _異丙基噻噸等硫化合物、或2 -乙基 蒽醌、八甲基蒽醌、1,2_苯并蒽醌、2,3-二笨基蒽醌等的蒽 醌類、或偶氮雙異丁腈、過氧化苯甲醯、過氧化枯烯等有 機過氧物、或2_氫硫基苯并咪唑、2-氫硫基笨并噚唑、2-氫硫基苯并噻唑等的硫醇化合物、或2-(鄰氯苯基)-4,5-二 (間甲氧基苯基)-咪唑基二聚物等咪唑基化合物、或對甲氧 基三哄(triazine)等三畊化合物、或 2,4,6-參(三氯甲基)-s-三哄、二甲基_4,6-雙(三氯甲基)-s-三哄、2-[2-(5 -甲基呋喃 -2-基)乙烯基]-4,6-雙(三氯曱基)-s-三畊、2-[2-(呋喃-2-基) 乙烯基]-4,6-雙(三氯甲基三畊、2-[2-(4·二乙胺基-2 -曱 基苯基)乙烯基]-4,6-雙(三氯甲基)-s-三哄、2-[2-(3,4-二甲 氧基苯基)乙烯基]-4,6-雙(三氯曱基)-^三哄、2-(4-甲氧基 苯基)-4,6-雙(三氯甲基)-s-三哄、2-(4-乙氧基苯乙烯基)· 4,6-雙(三氯甲基)-s-三阱、2-(4-正丁氧基苯基)-4,6-雙(三 氣曱基)-s-三哄等的具有鹵曱基之三阱化合物、或2·苄基 15 200819913 -2-一甲胺基-1-(4·味啉(m〇rph〇lin〇)苯基)_ 丁烷]酮等的 胺基綱化合物。此等光聚合引發劑可單獨使用,亦可組合 使用2種以上。 相對於溶劑以外之固體成分的合計1 00質量份,光聚 合引發劑的含量以1質量份〜150質量份為佳,以5質量份 〜100質量份為較佳,以1〇質量份〜50質量份為更佳。藉 由使含量為1 5〇質量份以下,能夠得到充分的耐熱性、耐 藥品性,又,藉由使含量為1質量份以上,能夠提升塗膜 形成性能’且抑制光硬化不良。 [著色劑(C)]Acetylene, 2,2-diethoxyethyl benzene, p-dimethyl acetophenone 'p-dimethylamino propyl benzene, dichloro ethane benzene, trichloro ethane benzene, third butyl Ethylene benzene such as acetophenone or diphenyl ketone such as diphenyl ketone, 2-chlorodiphenyl ketone, p-p-didimethylaminodiphenyl ketone, or benzyl or benzene Amarantry, benzoin methyl ether, benzoin isopropyl ether, benzoin isobutyl ether and other benzoin ethers, or benzyl dimethyl ketal, thioxanthene, 2-chlorothioxene, a sulfur compound such as 2,4-diethylthioxanthene, 2-methylthioxanthene, 2-isopropylthioxanthene, or 2-ethylhydrazine, octamethylguanidine, 1,2-benzopyrene An anthraquinone such as 2,3-diphenyl, or an organic peroxygen such as azobisisobutyronitrile, benzamidine peroxide or cumene peroxide, or 2-hydrothiobenzimidazole, a thiol compound such as 2-hydrothio benzoxazole or 2-hydrothiobenzothiazole, or 2-(o-chlorophenyl)-4,5-di(m-methoxyphenyl)-imidazolyl An imidazolyl compound such as a dimer or a tri-till compound such as p-methoxytriazine or 2,4,6-para(trichloromethyl)-s-tritium or dimethyl _4,6-bis(trichloromethyl)-s-triazine, 2-[2-(5-methylfuran-2-yl)vinyl]-4,6-bis(trichloroindenyl)-s - Three-plowing, 2-[2-(furan-2-yl)vinyl]-4,6-bis(trichloromethyl three-pile, 2-[2-(4·diethylamino-2-indenyl) Phenyl)vinyl]-4,6-bis(trichloromethyl)-s-triterpene, 2-[2-(3,4-dimethoxyphenyl)vinyl]-4,6-double (Trichloroindolyl)-^trimium, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triterpene, 2-(4-ethoxystyrene Base)· 4,6-bis(trichloromethyl)-s-tripper, 2-(4-n-butoxyphenyl)-4,6-bis(triseodecyl)-s-triterpene, etc. a tritrap compound having a halofluorenyl group, or a 2-benzyl group 15 200819913 -2-monomethylamino-1-(4. saccharin (m〇rph〇lin〇)phenyl)-butane] ketone The above-mentioned photopolymerization initiator may be used singly or in combination of two or more kinds thereof. The total amount of the solid component other than the solvent is 100 parts by mass, and the content of the photopolymerization initiator is 1 part by mass to 150 parts by mass. The portion is preferably 5 parts by mass to 100 parts by mass, more preferably 1 part by mass to 50 parts by mass. When the content is 15 parts by mass or less, sufficient heat resistance and chemical resistance can be obtained, and when the content is 1 part by mass or more, the coating film formation performance can be improved and the photohardening failure can be suppressed. )]
本發明之著色感光性樹脂組成物含有著色劑(以下亦 稱為「(C)成分」)。 著色劑可舉迁 !例 如在比 色指數 (C.I. ;染 色師及著色師 學會(The Society of Dyers and Colourists)公司發行 )分類 為顏料的化合物 ,具 體上, 以使用 下述 的比色指數 (C.I.) 號網 !之物為隹。 C.I·顏料黃1(以· 下,「C .I.顏料 黃」相同 ,只有記載號 碼) 、3 、 11 、 12 、 13、 > 14、1 5、16、 17、 20、 24、3 1 ' 53 ' 55 > 60' 61% 65' 71 、73、74、8 1、 83 ^ 86 - 93、95 、97、 98 ^ 99 ^ 100 - 101 > 104 - 106、108 、109 '11 0、113、 114、 116 、117、 119、 120 、125、 126、 127、 128 、129、 137、 138 、139、 147 、 148 ' 150、 151、 152、 153 、154、 155 ^ 156 、166 、 167 、 168 、175、 180、 185 ; 16 200819913The colored photosensitive resin composition of the present invention contains a coloring agent (hereinafter also referred to as "(C) component"). Colorants can be moved, for example, as a pigment in a colorimetric index (CI; issued by The Society of Dyers and Colourists). Specifically, the following colorimetric index (CI) is used. ) No. Net! CI·Pigment Yellow 1 (under ·, "C.I. Pigment Yellow" is the same, only the number is recorded), 3, 11, 12, 13, and > 14, 15, 5, 16, 17, 20, 24, 3 1 ' 53 ' 55 > 60' 61% 65' 71 , 73 , 74 , 8 1 , 83 ^ 86 - 93 , 95 , 97 , 98 ^ 99 ^ 100 - 101 > 104 - 106, 108 , 109 '11 0 , 113, 114, 116, 117, 119, 120, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148 '150, 151, 152, 153, 154, 155 ^ 156, 166, 167 , 168, 175, 180, 185; 16 200819913
C. I ·顏与 畔橙 1(以下 ,「C, ► I .顏料 撥」 相同 只有記載號 碼) 、5 > 13 、14 、16、1 7、24、34、 * 36 ' 38、 40 ^ 43 、46、 49、 5 1 '55 、59 、 61 、 63、丨 64、71 、73 ; C. I.顏料紫 1(以下 ,「C‘ .I.顏料 紫」 相同 只有記載號 碼) ' 1 9 ' 23 > 29 ' 30 ^ 32、 36、 37 、 38 、 39 、 40、 50 ; C· I.顏料紅 1(以下 ,「C, .I.顏料 紅」 相同 只有記載號 碼) 、2 ' 3 ^ 4、5、6、7 ' 8 x 9、1 0 '11 、12、 1, 4^15 、1 6、 17 \ 18 、19 、21 、22、23、30、3 1, 、32 、37、 3 8、40 、41、 42 > 48 :卜 4 8 : 2 > 4 8: 3、48 ·· 4、 4 9 ·· 1、49 : 2、50 ·· 1、 52 : 卜 53 : 卜 57 ' 57 : 1、57 : 2、 58 ·· 2、58 : 4、6 0 : 1、 63 : 1、 63 : 2、 64:1、 81 : 1 > 83, 、88 ^ 90 : 1 、97、 101、 102 ' 1 04 ' 105 、106、 108、 112、 113 、114 122、 123、 '144 、1 46、 149 、15 0、 15卜 155 > 1 66 、168 、 170 ^ 171、 172 > 1 74、 175 、17 6、 177、 178、 179 、180 、 185、 187、 188 ' 1 90 ' 192 、193、 194、 202 ^ 206 、207 208、 209、 215 、216、 217 > 2 20、 223 ^ 224、 226 ' 227 、 228 ^ 240 > 242 、243、 245 、254、 25 5、 264、 265 j C.I.顏料藍 1(以下 ,「C .I.顏料 藍」 相同 5 只有記載號 碼) '2 '15 ^ 15 ·· 3 ' 15 :4、 15:6 、16 、22、 60、64 ^ 66 ; C· I.顏料綠 -7、C.I .顏料 綠-3 6 、C· I.顏料 綠 -3 7 ; C· I ·顏; 科棕 23、C.I.顏 $ 14棕25、C.I.顏料 棕 26 、C.I_ 顏· f棕 28 ; C. I ·顏i 钭黑 1、C.I_ _顏料 黑7。 又 ,形 成黑 色矩陣 時,(C)成分以使用黑 色 顏料 為佳。 17C. I · Yan and Pan Orange 1 (hereinafter, "C, ► I. Pigment Dial" is the same as the number only), 5 > 13 , 14 , 16 , 1 7 , 24 , 34 , * 36 ' 38 , 40 ^ 43 , 46 , 49 , 5 1 '55 , 59 , 61 , 63 , 丨 64 , 71 , 73 ; CI Pigment Violet 1 (hereinafter, "C' .I. Pigment Violet" is the same as the number only) ' 1 9 ' 23 > 29 ' 30 ^ 32, 36, 37, 38, 39, 40, 50 ; C· I. Pigment Red 1 (hereinafter, "C, .I. Pigment Red" is the same as the record number), 2 ' 3 ^ 4 , 5, 6, 7 ' 8 x 9, 1 0 '11 , 12, 1, 4^15 , 1 6 , 17 \ 18 , 19 , 21 , 22 , 23 , 30 , 3 1, , 32 , 37 , 3 8, 40, 41, 42 > 48 : Bu 4 8 : 2 > 4 8: 3, 48 ·· 4, 4 9 ··1, 49 : 2, 50 ·· 1, 52 : Bu 53 : Bu 57 ' 57 : 1, 57 : 2, 58 · 2, 58 : 4, 6 0 : 1, 63 : 1, 63 : 2, 64:1, 81 : 1 > 83, 88 ^ 90 : 1 , 97 , 101, 102 ' 1 04 ' 105 , 106 , 108 , 112 , 113 , 114 122 , 123 , '144 , 1 46 , 149 , 15 0 , 15 155 > 1 66 , 168 170 ^ 171, 172 > 1 74, 175, 17 6 , 177, 178, 179, 180, 185, 187, 188 ' 1 90 ' 192 , 193 , 194 , 202 ^ 206 , 207 208 , 209 , 215 , 216 , 217 > 2 20, 223 ^ 224, 226 ' 227 , 228 ^ 240 > 242 , 243 , 245 , 254 , 25 5 , 264 , 265 j CI Pigment Blue 1 (hereinafter, "C.I. Pigment Blue" The same 5 only record number) '2 '15 ^ 15 ·· 3 ' 15 : 4, 15:6 , 16, 22, 60, 64 ^ 66 ; C · I. Pigment Green -7, CI . Pigment Green - 3 6 , C · I. Pigment Green-3 7 ; C · I · Yan; Branch Brown 23, CI Yan $ 14 Brown 25, CI Pigment Brown 26, C.I_ Yan·f Brown 28; C. I · Yan i 钭 Black 1. C.I_ _Pigment Black 7. Further, when a black matrix is formed, the component (C) is preferably a black pigment. 17
200819913 又,黑色顏料以碳黑為佳。又,亦可舉出鈦黑、銅、鐵 猛、結、鉻、鎳、鋅、#5、銀等的金屬氧化物、複合氧 物、金屬硫化物、金屬硫酸鹽或金屬碳酸鹽等。該等黑 顏料之中,以使用具有高遮光性之碳黑為更佳。藉由使 上述光聚合性化合物,即便使用高遮光性的黑色顏料, 能夠得到黏附性高、顯像餘裕度優良之著色感光性樹脂 成物。 碳黑可使用槽法碳黑、爐黑、熱黑、燈黑等眾所周 的碳黑。又,以使用遮光性優良之槽法碳黑為特佳。又 亦可使用樹脂被覆碳黑。 因為樹脂被覆碳黑與未樹脂被覆的碳黑比較時,其 電性較低,所以使用作為如液晶顯示器之液晶顯示元件 黑色矩陣時,能夠製造出漏電少、可信賴性高之低耗電 示器。 又,亦可適當地添加上述有機顏料作為辅助顏料, 以調整碳黑的色調。 又,用以將著色劑均勻地分散之分散劑,以使用聚 乙亞胺系、胺基甲酸酯樹脂系、丙烯酸樹脂系的高分子 散劑為佳,特別是使用碳黑作為著色劑時,分散劑以使 丙烯酸樹脂系為佳。 又,無機顏料及有機顏料各自可單獨使用,亦可併 2種以上,併用時相對於無機顏料及有機顏料總量1 0 0 量份,有機顏料以在10質量份〜80質量份範圍使用為卷 以在20質量份〜40質量份範圍為更佳。上述無機顏料及 化 色 用 亦 組 知 導 的 顯 用 伸 分 用 用 質 有 18 200819913 機顏料以使用分散劑分散成適當濃度之溶液後,添加在著 色感光性樹脂組成物中為佳。200819913 Also, black pigments are preferably carbon black. Further, metal oxides such as titanium black, copper, iron, knot, chromium, nickel, zinc, #5, silver, composite oxides, metal sulfides, metal sulfates or metal carbonates may also be mentioned. Among these black pigments, carbon black having a high light-shielding property is more preferable. By using the above-mentioned photopolymerizable compound, a coloring photosensitive resin having high adhesion and excellent image retention can be obtained by using a black pigment having a high light-shielding property. For carbon black, carbon black such as channel black, furnace black, hot black, and lamp black can be used. Further, it is particularly preferable to use a grooved carbon black having excellent light shielding properties. It is also possible to coat the carbon black with a resin. When the resin-coated carbon black is compared with the carbon black which is not coated with the resin, the electrical properties are low. Therefore, when a black matrix of a liquid crystal display element such as a liquid crystal display is used, it is possible to produce a low power consumption with less leakage and high reliability. Device. Further, the above organic pigment may be appropriately added as an auxiliary pigment to adjust the color tone of the carbon black. Further, a dispersant for uniformly dispersing a colorant is preferably a polyethylene-based, urethane-based or acrylic-based polymer powder, particularly when carbon black is used as a colorant. The dispersant is preferably an acrylic resin. Further, each of the inorganic pigment and the organic pigment may be used singly or in combination of two or more kinds, and in combination with the total amount of the inorganic pigment and the organic pigment in an amount of 100 parts by mass, and the organic pigment is used in an amount of from 10 parts by mass to 80 parts by mass. The volume is preferably in the range of 20 parts by mass to 40 parts by mass. The above-mentioned inorganic pigments and coloring are also known to be used for the purpose of stretching and dispensing. 18 200819913 The organic pigment is preferably dispersed in a photosensitive resin composition after being dispersed in a suitable concentration using a dispersing agent.
又,相對於著色感光性樹脂組成物的固體成分,在本 發明著色感光性樹脂組成物之著色劑的使用量以5質量% 以上7 0質量%以下為佳,以2 5質量%以上5 5質量%以下 為較佳,以3 0質量%以上5 0質量%以下為更佳。藉由在上 述範圍,能夠以目標圖案的方式形成黑色矩陣或各著色劑 層,乃是較佳。 特別是形成黑色矩陣時,較佳為調整著色感光性樹脂 組成物中的黑色顏料的量,使得每膜厚度1微米之OD值 為4以上。在黑色矩陣,每膜厚度1微米之OD值若是在 4以上,使用作為液晶顯示器的黑色矩陣時,能夠得到充 分的顯示對比。 [其他成分] 本發明之著色感光性樹脂組成物可按照必要調配添加 劑。具體上可舉出的有敏化劑、硬化促進劑、光交聯劑、 光敏化劑、分散助劑、填料、黏附促進劑、抗氧化劑、紫 外線吸收劑、防凝聚劑等。 又,本發明之感光性樹脂組成物亦可添加用以稀釋之 溶劑、或熱聚合抑制劑、消泡劑、界面活性劑等。 在此,作為可添加在著色感光性樹脂組成物中的溶 劑,可舉出的有例如:乙二醇一甲基醚、乙二醇一乙基醚、 乙二醇一正丙基醚、乙二醇一正丁基醚、二甘醇一曱基醚、 19 200819913In addition, the amount of the coloring agent used in the coloring photosensitive resin composition of the present invention is preferably 5% by mass or more and 70% by mass or less, and preferably 25% by mass or more, based on the solid content of the coloring photosensitive resin composition. The mass% or less is preferable, and more preferably 30% by mass or more and 50% by mass or less. It is preferable that the black matrix or the respective colorant layers can be formed in the target pattern by the above range. In particular, when a black matrix is formed, it is preferred to adjust the amount of the black pigment in the coloring photosensitive resin composition so that the OD value per film thickness of 1 μm is 4 or more. In the black matrix, if the OD value of 1 μm per film thickness is 4 or more, and a black matrix as a liquid crystal display is used, sufficient display contrast can be obtained. [Other components] The coloring photosensitive resin composition of the present invention can be formulated with an additive as necessary. Specific examples thereof include a sensitizer, a curing accelerator, a photocrosslinking agent, a photosensitizer, a dispersing aid, a filler, an adhesion promoter, an antioxidant, an ultraviolet absorber, and an anti-agglomerating agent. Further, the photosensitive resin composition of the present invention may be added with a solvent for dilution, a thermal polymerization inhibitor, an antifoaming agent, a surfactant, or the like. Here, examples of the solvent which can be added to the coloring photosensitive resin composition include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, and B. Glycol-n-butyl ether, diethylene glycol monodecyl ether, 19 200819913
二甘醇一乙基醚、二甘醇一正丙基醚、二甘醇一正丁基醚、 三甘醇一甲基醚、三甘醇一乙基醚、丙二醇一甲基醚、丙 二醇一乙基醚、丙二醇一正丙基醚、丙二醇一正丁基醚、 二伸丙甘醇一甲基醚、二伸丙甘醇一乙基醚、二伸丙甘醇 一正丙基醚、二伸丙甘醇一正丁基醚、三伸丙甘醇一甲基 醚、三伸丙甘醇一乙基醚等的(聚)伸烷基二醇一烷基醚 類;乙二醇一甲基醚乙酸酯、乙二醇一乙基醚乙酸酯、二 甘醇一甲基醚乙酸酯、二甘醇一乙基醚乙酸酯、丙二醇一 甲基醚乙酸酯、丙二醇一乙基醚乙酸酯等的(聚)伸烷基二 醇一烷基醚乙酸酯類;二甘醇二甲基醚、二甘醇甲基乙基 醚、二甘醇二乙基醚、四氫呋喃等其他的醚類;甲基乙基 酮、環己烷、2 -庚酮、3 -庚酮等的酮類;2_羥基丙酸曱酯、 2-羥基丙酸乙酯等的乳酸烷基酯類;2·羥基-2-甲基丙酸乙 酯、3 -甲氧基丙酸甲酯、3 -甲氧基丙酸乙酯、3 -乙氧基丙 酸甲酯、3 -乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸 乙酯、2-羥基-3-曱基丁酸曱酯、3-甲基-3-甲氧基丁基乙酸 酯、3 -甲基-3 -曱氧基丁基丙酸酯、乙酸乙酯、乙酸正丙酯、 乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、曱酸正戊酯、乙 酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異 丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正 丙酯、乙醯乙簸甲酯、乙醯乙酸乙酯、2-側氧基丁酸乙酯 等其他的酯類;甲苯、二甲苯等的芳香族烴類;N-甲基吡 咯啶酮、N,N-二甲基曱醯胺、及N,N-二曱基乙醯胺等的醯 胺類。此等溶劑可單獨或混合使用2種以上。 20Diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol Ethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, di- propylene glycol monomethyl ether, di-n-ethylene glycol monoethyl ether, di-n-glycol-n-propyl ether, two (poly)alkylene glycol monoalkyl ethers such as propylene glycol mono-n-butyl ether, tri-n-propyl propylene glycol monomethyl ether, tri-n-propyl propylene glycol monoethyl ether; Ethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol (poly)alkylene glycol monoalkyl ether acetates such as ethyl ether acetate; diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, tetrahydrofuran And other ethers; ketones such as methyl ethyl ketone, cyclohexane, 2-heptanone, and 3-heptanone; lactated alkyl groups such as 2-hydroxylpropionate and ethyl 2-hydroxypropionate Ester; 2·hydroxy-2-methylpropionic acid ethyl ester Methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl glycol Ester, decyl 2-hydroxy-3-mercaptobutyrate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxy butyl propionate, ethyl acetate , n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl decanoate, isoamyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, butyl Isopropyl acrylate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl ethyl acetate, ethyl acetate, 2-ethyloxybutyrate, etc. Other esters; aromatic hydrocarbons such as toluene and xylene; decylamines such as N-methylpyrrolidone, N,N-dimethyldecylamine, and N,N-dimercaptoacetamide class. These solvents may be used alone or in combination of two or more. 20
200819913 上述溶劑中,因為丙二醇一甲基醚、乙二醇一甲 乙酸酯、丙二醇一甲基醚乙酸酯、丙二醇一乙基醚乙酸 二甘醇二甲基醚、二甘醇甲基乙基醚、環己酮、及3-基丁基乙酸酯,係對光聚合性化合物、及光聚合引發 示優良的溶解性,同時能夠使顏料等的不溶性成分之 性變為良好,乃是較佳,以使用丙二醇一曱基醚乙酸 3 -甲氧基丁基乙酸酯為特佳。相對於光聚合性化合物 聚合引發劑、及著色劑之合計量100質量份,溶劑可1 質量份以上500質量份以下之範圍使用。 又,熱聚合抑制劑可使用氫醌、氫醌一乙基醚等。 消泡劑可使用矽系、氟系化合物;界面活性劑可用陰 系、陽離子系、非離子系等眾所周知的各種界面活性 又,使用本發明之著色感光性樹脂組成物來形成 時,係如後述,在基板上塗布本發明之著色感光性樹 成物,並使其乾燥來形成膜。為了改善此時之塗布性 硬化的物性,除了上述成分以外,亦可更含有高分子 劑作為結合劑。結合劑可按照相溶性、被膜形成性、 性、黏著性等改善目的而適當地選擇。 在基板上所形成黑色矩陣的厚度通常可設定在1 〜10微米的範圍,以1.5微米〜8微米為佳,以2微米。 米為更佳。厚度為1 .5微米以上時,不僅是能夠使用 通常的彩色濾光片用黑色矩陣,而且亦可使用作為喷 之彩色濾光片的黑色矩陣。 本發明之著色感光性樹脂組成物能夠藉由使用攪 基謎 酉旨、 甲氧 劑顯 分散 酯、 、光 50 又, 離子 劑。 圖案 脂組 、及 黏合 顯像 微米 微 作為 墨式 拌機 21 200819913 混合上述各成分而广 m # S*J f 。又,亦可使用過濾器過濾,來使 所传到的混合物成為均句之物。 [衫色遽光片的形成方法] ' 請*明使用本發明 成彩色渡光片 著色感光性樹脂組成物來形 之方法。 <黑色矩陣(墅吞* 、,平(“、、色者色層)的形成> 首先’將本發明 著色劑),使用輥、、、者色感光性樹脂組成物(含有黑色的 印型塗布@b塗布益、逆輥塗布器及棒塗布器等接觸轉 等非接=布:旋轉器.(旋轉式塗布裝置卜簾流塗布器 透射性之基Γ 塗布在基板上。基板可使用具有光 性:β。破璃基板與著色感光性樹月旨組成物之黏附 性’亦可預先在破璃其 制# 璃基板上塗布矽烷偶合劑。或是亦可以 在调製著色感光性樹脂έ忐 如、、且成物時添加矽烷偶合劑。 塗布該著色感光性線4 士、 树、卫成物後,使其乾燥來除去溶 劑。乾燥方法沒有特別限定,例如能夠使用以下任一種方 法’⑴於熱板上在以下、較佳是9(rc以 上I 0 0 〇C以下之溫度,兹檢a η 4/丨、E 1 η Λ 乾知60秒至l2〇秒鐘之方法,(2) 在室溫放置數小時至數天之方法’⑺在溫風加熱器或紅外 線加熱器中放置數十分至數小時來除去溶劑之方法。 接著,使負型光罩介於中間,照射紫外線、準分子雷 射光等的活性能量線來進行部分性曝光。&照射能量線量 係因感光性樹脂組成物的組成而不同,例如以—2 22 200819913 至2000 mJ/cm2左右為佳。 接著,藉由顯像液將曝光後的膜顯像而圖案化成為需 要的形狀。顯像方法沒有特別限定,例如能夠使用浸潰法、 喷灑法等。顯像液可舉出一乙醇胺、二乙醇胺、及三乙醇 胺等有機系之物,或氫氧化鈉、氳氧化鉀、碳酸鈉、氨、 及4級銨鹽等的水溶液。 接著,對顯像後的圖案在200 °C左右進行後烘焙,來 形成黑色矩陣。又,以將所形成的圖案全面曝光為佳。200819913 Among the above solvents, propylene glycol monomethyl ether, ethylene glycol monoacetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate diethylene glycol dimethyl ether, diethylene glycol methyl ethyl Ether, cyclohexanone, and 3-butylbutyl acetate show excellent solubility in photopolymerizable compounds and photopolymerization initiation, and at the same time, the properties of insoluble components such as pigments can be improved. Preferably, propylene glycol monodecyl ether acetate 3-methoxybutyl acetate is particularly preferred. The solvent may be used in an amount of from 1 part by mass to 500 parts by mass per 100 parts by mass of the total amount of the photopolymerizable compound polymerization initiator and the coloring agent. Further, as the thermal polymerization inhibitor, hydroquinone, hydroquinone monoethyl ether or the like can be used. An antimony-based or fluorine-based compound can be used as the antifoaming agent; and the surfactant can be formed by using various known interface activities such as a cation, a cation, or a nonionic system, and when the colored photosensitive resin composition of the present invention is used, as described later. The colored photosensitive dendrimer of the present invention is applied onto a substrate and dried to form a film. In order to improve the physical properties of the coating hardening at this time, in addition to the above components, a polymer may be further contained as a binder. The binder can be appropriately selected in accordance with the purpose of improving compatibility such as compatibility, film formability, and adhesion. The thickness of the black matrix formed on the substrate can be generally set in the range of 1 to 10 μm, preferably 1.5 μm to 8 μm, and 2 μm. The meter is better. When the thickness is 1.5 μm or more, not only a black matrix for a usual color filter but also a black matrix which is a color filter for spraying can be used. The colored photosensitive resin composition of the present invention can be obtained by using a kiln, a methoxyphore, an ester, a light, and an ionic agent. Pattern grease group, and adhesion imaging micron micro as an ink mixer 21 200819913 Mix the above ingredients and wide m # S*J f . Alternatively, a filter can be used to filter the mixture to be a uniform. [Method of Forming Shirt Color Polishing Sheet] 'Please describe the method of coloring the photosensitive resin composition by using the colored light-emitting sheet of the present invention. <Formation of black matrix (formation of "coloring layer"), first, "coloring agent of the present invention", using a roller, and a color photosensitive resin composition (including black printing) Type coating @b coating benefits, reverse roll coater and bar coater, etc. Contactless etc.: Rotator. (Rotary coating device, the basis of transparency of the coating applicator is coated on the substrate. The substrate can be used It has optical properties: β. The adhesion of the glass substrate to the color-sensitive photosensitive tree composition can also be coated with a decane coupling agent in advance on the glass substrate. Alternatively, the coloring photosensitive resin can also be prepared. For example, a decane coupling agent is added to the product. The coloring photosensitive wire 4, the tree, and the auxiliaries are applied and dried to remove the solvent. The drying method is not particularly limited, and for example, any of the following methods can be used. '(1) On the hot plate below, preferably 9 (rc above I 0 0 〇C temperature, check a η 4 / 丨, E 1 η Λ dry for 60 seconds to l2 〇 seconds, ( 2) Place the method at room temperature for several hours to several days '(7) in a warm air heater or A method of removing the solvent by placing the anode heater for a few tenths to several hours. Next, the negative mask is placed in the middle to irradiate the active energy rays such as ultraviolet rays and excimer laser light to perform partial exposure. The amount of the wire varies depending on the composition of the photosensitive resin composition, and is preferably, for example, about -2 22 200819913 to 2000 mJ/cm 2 . Next, the exposed film is developed by a developing liquid to be patterned into a desired shape. The development method is not particularly limited, and for example, a dipping method, a spraying method, or the like can be used. Examples of the developing liquid include organic substances such as monoethanolamine, diethanolamine, and triethanolamine, or sodium hydroxide, potassium hydride, and carbonic acid. An aqueous solution of sodium, ammonia, and a quaternary ammonium salt, etc. Next, the developed pattern is post-baked at about 200 ° C to form a black matrix. Further, it is preferred to expose the formed pattern to the entire surface.
該形成的黑色矩陣,根據其圖案形狀、厚度的不同, 亦能夠作為間隔物、喷墨用隔牆來使用。 (1) 藉由微影方式來形成彩色濾光片 在上述形成有黑色矩陣之基板上,使用含有通常R、 G、B三原色的著色劑之著色感光性樹腊組成物,與形成 上述黑色矩陣同樣地,每種顏色依照順序形成著色層。藉 此能夠形成彩色濾、光片。 (2) 藉由喷墨方式來形成彩色濾光片 藉由喷墨方式來形成彩色濾光片時,係使用由本發明 的著色感光性樹脂組成物所形成之喷墨式彩色濾光片形成 用隔牆(以後簡稱隔牆)。因為該隔牆係黑色的,同時能夠 達成作為黑色矩陣之任務。 具體上,首先將R、G、B的印墨,以噴墨方式吐出至 被上述隔牆包圍的部位,而積存在隔牆内。接著,使用熱 或光使積存的印墨硬化。藉此,能夠形成彩色濾光片。 23 200819913 [實施例] [實施例1]The formed black matrix can also be used as a spacer or an inkjet partition depending on the shape and thickness of the pattern. (1) Forming a color filter by lithography on a substrate on which a black matrix is formed, using a colored photosensitive wax composition containing a coloring agent of three primary colors of R, G, and B, and forming the black matrix Likewise, each color forms a colored layer in sequence. Thereby, color filters and light sheets can be formed. (2) When a color filter is formed by an inkjet method, a color filter is formed by an inkjet method, and an inkjet color filter formed of the colored photosensitive resin composition of the present invention is used. Partition wall (hereinafter referred to as the partition wall). Because the partition is black, it can also be used as a task for the black matrix. Specifically, first, the inks of R, G, and B are ejected by inkjet to a portion surrounded by the partition wall, and are accumulated in the partition wall. Next, the accumulated ink is hardened using heat or light. Thereby, a color filter can be formed. 23 200819913 [Examples] [Example 1]
混合400克環氧化合物之EPICOAT YX 4000H(JAPAN EPOXY RESIN公司製、環氧當量190)、5克三苯基膦、153 克丙烯酸、及600克3·曱氧基丁基乙酸酯,並在90〜100 °C使其反應。隨後,藉由添加 360克聯苯四羧酸酐及40 克四氣歐酸酐(THPA)來作為多元酸酐,進而使其反應而得 到樹脂A。該樹脂A之使用GP C所測定的質量平均分子量 為7 000,其酸價為90毫克KOH/克。 混合 15 0克上述樹脂 A、3 0克二新戊四醇六丙烯酸 酯、12克1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基;l· 乙酮-1-(0-乙醯肟)(商品名:IRGACURE OXE 02、CIBA SPECIALTY CHEMICALS公司製)、6克氫硫基苯并咪唑、 4克2,4·雙(三氣甲基)-6-(3 -溴-4-甲氧基)苯基-s-三哄、7〇〇 克顏料液(商品名:C F黑、含碳黑2 4 %、御國色素公司製)、 5〇〇克3-甲氧基丁基乙酸酯,來調製著色感光性樹脂組成 物。 [實施例2 ] 除了只使用4 8 0克下述式的化合物(7)來作為多元酸 肝以外,與實施例1同樣地合成樹脂B。該樹脂b的分子 I為7800 ’其酸價為85宅克KOH/克。使用該樹脂B來調 製著色感光性樹脂組成物。 [化學式5] 24 200819913400 grams of epoxy compound EPICOAT YX 4000H (manufactured by JAPAN EPOXY RESIN, epoxy equivalent 190), 5 g of triphenylphosphine, 153 g of acrylic acid, and 600 g of 3·decyloxybutyl acetate, and Let it react at 90~100 °C. Subsequently, Resin A was obtained by adding 360 g of biphenyltetracarboxylic anhydride and 40 g of tetra-glycolic anhydride (THPA) as a polybasic acid anhydride and further reacting it. The resin A had a mass average molecular weight of 7,000 as measured by GP C and an acid value of 90 mg KOH/g. Mix 150 g of the above resin A, 30 g of dipentaerythritol hexaacrylate, 12 g of 1-[9-ethyl-6-(2-methylbenzylidene)-9H-carbazole-3- Base; l· Ethyl ketone-1-(0-acetamidine) (trade name: IRGACURE OXE 02, manufactured by CIBA SPECIALTY CHEMICALS), 6 g of thiothiobenzimidazole, 4 g of 2,4·bis (three gases) Methyl)-6-(3-bromo-4-methoxy)phenyl-s-triterpene, 7 g of pigment liquid (trade name: CF black, carbon black 24%, manufactured by Royal Gum Co., Ltd. 5 g of 3-methoxybutyl acetate was used to prepare a colored photosensitive resin composition. [Example 2] Resin B was synthesized in the same manner as in Example 1 except that only 480 g of the compound (7) of the following formula was used as the polybasic acid liver. The resin I had a molecular weight of 7800 Å and an acid value of 85 KOH KOH/g. This resin B was used to modulate the colored photosensitive resin composition. [Chemical Formula 5] 24 200819913
[實施例3][Example 3]
除了使用450克式(7)的化合物及40克四氫酞酸酐來 作為多元酸酐以外,與實施例1同樣地合成樹脂C。該樹 脂C的分子量為6700,其酸價為90亳克KOH/克。使用該 樹脂C來調製著色感光性樹脂組成物。 [實施例4] 除了只使用420克聯苯四羧酸二厨來作為多元酸酐以 外,與實施例1同樣地合成樹脂D。該樹脂D的分子量為 6500,其酸價為100毫克KOH/克。使用該樹脂D來調製 著色感光性樹脂組成物。 [實施例5] 在實施例4,延長反應時間來合成樹脂E。該樹脂E 的分子量為29000,其酸價為100亳克KOH/克。使用該樹 脂E來調製著色感光性樹脂組成物。 [比較例1 ] 除了使用250克下述式(6)所示的化合物及100g四氫 酞酸酐來作為多元酸酐以外,與實施例1同樣地合成樹脂 25 200819913 F。該樹脂F的分子量為43 00。使用該樹脂F來調製著色 感光性樹脂組成物。 [化學式6]Resin C was synthesized in the same manner as in Example 1 except that 450 g of the compound of the formula (7) and 40 g of tetrahydrophthalic anhydride were used as the polybasic acid anhydride. The resin C had a molecular weight of 6,700 and an acid value of 90 g KOH/g. This resin C was used to prepare a colored photosensitive resin composition. [Example 4] Resin D was synthesized in the same manner as in Example 1 except that only 420 g of biphenyltetracarboxylic acid was used as the polybasic acid anhydride. The resin D had a molecular weight of 6,500 and an acid value of 100 mg KOH/g. This resin D was used to prepare a colored photosensitive resin composition. [Example 5] In Example 4, the reaction time was extended to synthesize the resin E. The resin E had a molecular weight of 29,000 and an acid value of 100 g KOH/g. This resin E was used to prepare a colored photosensitive resin composition. [Comparative Example 1] Resin 25 200819913 F was synthesized in the same manner as in Example 1 except that 250 g of the compound represented by the following formula (6) and 100 g of tetrahydrofurfuric anhydride were used as the polybasic acid anhydride. The resin F had a molecular weight of 430,000. This resin F was used to prepare a colored photosensitive resin composition. [Chemical Formula 6]
[比較例2] 除了只使用2 2 0克四氫酞酸酐作為多元酸酐以外,與 實施例1同樣地合成樹脂G。該樹脂G的分子量為3 8 00。 使用該樹脂G來調製著色感光性樹脂組成物。 [比較例3 ] 除了只使用 43 0克式(6)的化合物作為多元酸酐以 外,與實施例1同樣地合成樹脂Η。該樹脂Η的分子量為 5 1 00。使用該樹脂Η來調製著色感光性樹脂組成物。 (黑色矩陣的形成) 在玻璃基板上塗布實施例及比較例的著色感光性樹脂 組成物,在90°C烘焙120秒,來形成厚度1.5微米的膜(預 烘焙膜)。隨後,透過光罩使所形成的膜曝光,使用鹼顯像 液(商品名:N-A3K、東京應化工業社製)顯像來形成圖案。 26 200819913 隨後,使用循環式烘箱在2 2 〇 °c將所形成的圖案後烘焙3 0 分鐘,來形成線寬1 〇微米的黑色矩陣。 (評價) 對上述實施例及比較例所調製的著色感光性樹脂組成 物、及所形成的黑色矩陣,確認顯像餘裕度、圖案直線前 進性、敏感度、及顯像液溶解時間。結果如表1所示。[Comparative Example 2] Resin G was synthesized in the same manner as in Example 1 except that only 2,200 g of tetrahydrophthalic anhydride was used as the polybasic acid anhydride. The resin G has a molecular weight of 3 8 00. This resin G was used to prepare a colored photosensitive resin composition. [Comparative Example 3] Resin oxime was synthesized in the same manner as in Example 1 except that only 40 g of the compound of the formula (6) was used as the polybasic acid anhydride. The resin oxime has a molecular weight of 5 00. This resin ruthenium was used to prepare a colored photosensitive resin composition. (Formation of a black matrix) The colored photosensitive resin compositions of the examples and the comparative examples were applied onto a glass substrate, and baked at 90 ° C for 120 seconds to form a film (prebaked film) having a thickness of 1.5 μm. Subsequently, the formed film was exposed through a reticle, and developed using an alkali developing solution (trade name: N-A3K, manufactured by Tokyo Ohka Kogyo Co., Ltd.) to form a pattern. 26 200819913 Subsequently, the formed pattern was post-baked for 30 minutes at 2 2 〇 °c using a circulating oven to form a black matrix with a line width of 1 μm. (Evaluation) With respect to the colored photosensitive resin composition prepared in the above Examples and Comparative Examples and the black matrix formed, the development margin, the pattern straightness, the sensitivity, and the developing time of the developing solution were confirmed. The results are shown in Table 1.
又,評價方法如下。 敏感度:變化曝光量,以形成圖案所必要之最小的曝 光量作為敏感度。 圖案直線前進性(直線前進性):目視判定所形成的1 0 微米線之邊緣是否搖動,未搖動時為〇,搖動時為X。 顯像餘裕度:在以1 〇〇mJ/cm2的曝光量曝光後之顯像 時,測定能夠以無圖案未剝落、圖案的直線前進性良好、 且無殘渣的方式形成圖案之時間。 顯像液溶解時間:測定將 N-A3K : 3 = 1 : 19(重量比) 的顯像液,在2 5 °C喷灑塗布在前述預烘焙膜時,預烘焙膜 至完全溶解的時間。 [表1] 敏感度 (m J/cm2) 圖案直線 前進性 顯像餘裕度 (秒) 顯像液溶解 時間(秒) 實施例1 60 〇 18 31 實施例2 65 〇 20 36 實施例3 6 5 〇 19 32 實施例4 65 〇 23 38 實施例5 65 〇 25 40 27 200819913 比較例1 90 X 5 15 比較例2 95 X 7 12 比較例3 90 X 8 11 根據表1,使用在酸酐具有2個苯環之化合物,進行合 成而得到樹脂,將該樹脂使用作為光聚合性化合物而成的 著色感光性樹脂組成物,能夠形成敏感度高、且圖案直線 前進性良好之遮光膜。 【圖式簡單說明】 無 【主要元件符號說明】 無Further, the evaluation method is as follows. Sensitivity: The amount of exposure is varied to minimize the amount of exposure necessary to form a pattern. Pattern linear advancement (linear advancement): visually determine whether the edge of the formed 10 micron line is shaken, 〇 when not shaken, and X when shaken. Development margin: When developing at a exposure amount of 1 〇〇mJ/cm2, the time during which the pattern can be formed without leaving the pattern unpeeled, the straightness of the pattern is good, and the residue is not formed is measured. Development solution dissolution time: A time period in which the film was pre-baked to the time of complete dissolution when a developing solution of N-A3K : 3 = 1 : 19 (weight ratio) was spray-coated at 25 ° C. [Table 1] Sensitivity (m J/cm 2 ) Pattern Linear Advancing Development margin (sec) Developing solution dissolution time (sec) Example 1 60 〇 18 31 Example 2 65 〇 20 36 Example 3 6 5 〇 19 32 Example 4 65 〇 23 38 Example 5 65 〇 25 40 27 200819913 Comparative Example 1 90 X 5 15 Comparative Example 2 95 X 7 12 Comparative Example 3 90 X 8 11 According to Table 1, two anhydrides were used. A compound of a benzene ring is synthesized to obtain a resin, and a colored photosensitive resin composition which is a photopolymerizable compound is used as the resin, and a light-shielding film having high sensitivity and good linearity of pattern can be formed. [Simple diagram description] None [Main component symbol description] None
2828
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| JP4745146B2 (en) * | 2006-06-22 | 2011-08-10 | 東京応化工業株式会社 | Colored photosensitive resin composition |
| JP4752648B2 (en) * | 2006-07-10 | 2011-08-17 | Jsr株式会社 | Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element |
| CN101681107B (en) * | 2007-05-11 | 2012-12-26 | 日立化成工业株式会社 | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed circuit board |
| TWI585527B (en) * | 2012-02-29 | 2017-06-01 | 新日鐵住金化學股份有限公司 | A photosensitive composition for black matrix and a method for producing the same |
| JP5934664B2 (en) * | 2012-03-19 | 2016-06-15 | 富士フイルム株式会社 | Colored radiation-sensitive composition, colored cured film, color filter, colored pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device |
| CN102645693B (en) * | 2012-04-20 | 2014-09-10 | 深圳市华星光电技术有限公司 | Color filter and method for manufacturing same |
| JP6708367B2 (en) * | 2014-03-31 | 2020-06-10 | 日鉄ケミカル&マテリアル株式会社 | Photosensitive resin composition for light-shielding film, light-shielding film and color filter obtained by curing the same |
| TWI550025B (en) * | 2014-10-02 | 2016-09-21 | 奇美實業股份有限公司 | Liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element |
| JP2021192068A (en) * | 2018-08-30 | 2021-12-16 | 昭和電工株式会社 | Photosensitive resin composition, black column spacer and image display device |
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