TW200801861A - Exposure method and exposure apparatus - Google Patents
Exposure method and exposure apparatusInfo
- Publication number
- TW200801861A TW200801861A TW95120320A TW95120320A TW200801861A TW 200801861 A TW200801861 A TW 200801861A TW 95120320 A TW95120320 A TW 95120320A TW 95120320 A TW95120320 A TW 95120320A TW 200801861 A TW200801861 A TW 200801861A
- Authority
- TW
- Taiwan
- Prior art keywords
- exposure
- substrate
- mask
- capturing
- pixels
- Prior art date
Links
- 239000000758 substrate Substances 0.000 abstract 7
- 230000003287 optical effect Effects 0.000 abstract 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
- Optical Filters (AREA)
Abstract
An exposure apparatus of the present invention irradiates exposure light from a lamp (continuous light source) 9 to substrate 4, which is transported at a constant speed in a one direction by a substrate transport portion 5, through a mask 11 provided on an optical axis (light path) of an exposure system 3 at an exposure station (exposure portion) 2. When images of opening portions 11a of the mask 11 are transferred and exposed to the substrate 4, a reference position on the substrate 4 in the transporting direction and in a direction perpendicular thereto is detected by capturing forward and side edges (pattern edges) of pixels (reference patterns) 18, which are preformed on the substrate 4, by means of a linear CCD 20 in a capturing portion 6. When the pixels 18 captured by the capturing portion 6 are transported from a capturing position F to an exposure position E, the exposure station 2 continuously exposes an exposure area along the transporting direction of the substrate 4 with adjusting the position of the mask 11 such that the position of the mask 11 is identical with the reference position on the substrate 4.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005111928A JP4304165B2 (en) | 2005-04-08 | 2005-04-08 | Exposure method and exposure apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200801861A true TW200801861A (en) | 2008-01-01 |
| TWI481971B TWI481971B (en) | 2015-04-21 |
Family
ID=37413583
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095120320A TWI481971B (en) | 2005-04-08 | 2006-06-08 | Exposure method and exposure apparatus |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4304165B2 (en) |
| TW (1) | TWI481971B (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4738887B2 (en) * | 2005-05-19 | 2011-08-03 | 株式会社ブイ・テクノロジー | Exposure equipment |
| JP2008281919A (en) * | 2007-05-14 | 2008-11-20 | Dainippon Printing Co Ltd | Method for producing color filter forming substrate and color filter forming substrate |
| JP5685756B2 (en) | 2010-11-10 | 2015-03-18 | 株式会社ブイ・テクノロジー | Film exposure method |
| JP5630864B2 (en) * | 2010-12-06 | 2014-11-26 | 凸版印刷株式会社 | Exposure equipment |
| JP2012159713A (en) * | 2011-02-01 | 2012-08-23 | Arisawa Mfg Co Ltd | Manufacturing method of film-like product, manufacturing apparatus of film-like product, and mask |
| WO2013035696A1 (en) * | 2011-09-05 | 2013-03-14 | 株式会社ニコン | Substrate transfer apparatus and substrate processing apparatus |
| CN104145299B (en) * | 2012-03-12 | 2017-09-22 | 住友化学株式会社 | Optics shows that the calibrating installation and optics of part show the calibration method of part |
| CN105684126A (en) * | 2013-10-22 | 2016-06-15 | 应用材料公司 | Roll-to-roll maskless lithography with active alignment |
| WO2016114178A1 (en) * | 2015-01-15 | 2016-07-21 | 株式会社村田製作所 | Exposure device |
| JP7052573B2 (en) * | 2018-06-06 | 2022-04-12 | 東京エレクトロン株式会社 | Coating film forming device and adjustment method of coating film forming device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7375795B2 (en) * | 2004-12-22 | 2008-05-20 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
-
2005
- 2005-04-08 JP JP2005111928A patent/JP4304165B2/en not_active Expired - Fee Related
-
2006
- 2006-06-08 TW TW095120320A patent/TWI481971B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI481971B (en) | 2015-04-21 |
| JP4304165B2 (en) | 2009-07-29 |
| JP2006292919A (en) | 2006-10-26 |
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