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TW200801861A - Exposure method and exposure apparatus - Google Patents

Exposure method and exposure apparatus

Info

Publication number
TW200801861A
TW200801861A TW95120320A TW95120320A TW200801861A TW 200801861 A TW200801861 A TW 200801861A TW 95120320 A TW95120320 A TW 95120320A TW 95120320 A TW95120320 A TW 95120320A TW 200801861 A TW200801861 A TW 200801861A
Authority
TW
Taiwan
Prior art keywords
exposure
substrate
mask
capturing
pixels
Prior art date
Application number
TW95120320A
Other languages
English (en)
Other versions
TWI481971B (zh
Inventor
Jin Iino
Original Assignee
Integrated Solutions Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Integrated Solutions Co Ltd filed Critical Integrated Solutions Co Ltd
Publication of TW200801861A publication Critical patent/TW200801861A/zh
Application granted granted Critical
Publication of TWI481971B publication Critical patent/TWI481971B/zh

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
TW095120320A 2005-04-08 2006-06-08 曝光方法及曝光裝置 TWI481971B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005111928A JP4304165B2 (ja) 2005-04-08 2005-04-08 露光方法および露光装置

Publications (2)

Publication Number Publication Date
TW200801861A true TW200801861A (en) 2008-01-01
TWI481971B TWI481971B (zh) 2015-04-21

Family

ID=37413583

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095120320A TWI481971B (zh) 2005-04-08 2006-06-08 曝光方法及曝光裝置

Country Status (2)

Country Link
JP (1) JP4304165B2 (zh)
TW (1) TWI481971B (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4738887B2 (ja) * 2005-05-19 2011-08-03 株式会社ブイ・テクノロジー 露光装置
JP2008281919A (ja) * 2007-05-14 2008-11-20 Dainippon Printing Co Ltd カラーフィルタ形成基板の作製方法およびカラーフィルタ形成基板
JP5685756B2 (ja) 2010-11-10 2015-03-18 株式会社ブイ・テクノロジー フィルム露光方法
JP5630864B2 (ja) * 2010-12-06 2014-11-26 凸版印刷株式会社 露光装置
JP2012159713A (ja) * 2011-02-01 2012-08-23 Arisawa Mfg Co Ltd フィルム状製品の製造方法、フィルム状製品の製造装置、及び、マスク
WO2013035696A1 (ja) * 2011-09-05 2013-03-14 株式会社ニコン 基板搬送装置及び基板処理装置
CN104145299B (zh) * 2012-03-12 2017-09-22 住友化学株式会社 光学显示零件的校准装置及光学显示零件的校准方法
CN105684126A (zh) * 2013-10-22 2016-06-15 应用材料公司 具有主动对准的卷对卷无掩模光刻
WO2016114178A1 (ja) * 2015-01-15 2016-07-21 株式会社村田製作所 露光装置
JP7052573B2 (ja) * 2018-06-06 2022-04-12 東京エレクトロン株式会社 塗布膜形成装置及び塗布膜形成装置の調整方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7375795B2 (en) * 2004-12-22 2008-05-20 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Also Published As

Publication number Publication date
TWI481971B (zh) 2015-04-21
JP4304165B2 (ja) 2009-07-29
JP2006292919A (ja) 2006-10-26

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