JP2008281919A - Method for producing color filter forming substrate and color filter forming substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To control a black matrix or a columnar spacer to a desired thickness in a color filter forming substrate formed by superposing each colored layer for forming pixels of red, green and blue colored layers. Provided is a method for manufacturing a color filter forming substrate. At the same time, there is provided a color filter forming substrate in which a black matrix and a columnar spacer are overlapped with each color layer for forming pixels of red, green, and blue color layers and have a desired thickness.
SOLUTION: A method for producing a color filter forming substrate having a black matrix, wherein R (red), G (green), and B (blue) colored layers are formed by a photolithography method using a photosensitive colored material. When forming the pixel, the three colored layers of R (red), G (green), and B (blue) are overlapped to form a black matrix, and at least one color or more is obtained by the photolithography method. In the formation of the colored layer, the exposure amount to the black matrix forming region is set to an exposure amount different from the exposure amount to the pixel region of the colored layer, and development is performed.
[Selection] Figure 1

Description

  The present invention relates to a method for manufacturing a color filter forming substrate having a black matrix, and more particularly to a method for manufacturing a color filter forming substrate having a black matrix having a structure in which three colored layers are stacked.

In a liquid crystal display element, usually, a color filter forming substrate having a color filter formed thereon and an electrode and an electrode substrate having a thin film transistor (TFT), a plurality of scanning electrodes, and the like are opposed to each other. Thus, the liquid crystal is sandwiched between both substrates.
In the color filter forming substrate, for example, a black matrix, red, green, and blue colored pixels, an overcoat, and a transparent electrode are sequentially formed on a transparent substrate.

The black matrix in the color filter forming substrate indicates a light shielding region arranged between pixels and a frame-shaped light shielding part formed at the periphery of the display region, improves the display contrast of the liquid crystal display device, and is an active element such as a TFT. It is provided in order to prevent light from being incident on and malfunctioning.
In general, the black matrix is formed using a metal film such as Cr, carbon black, or resin black obtained by mixing a pigment with a resin. Japanese Patent Application Laid-Open No. 2003-14917 (Patent Document 1) and Japanese Patent Application Laid-Open No. 2004-2004. As disclosed in JP-A-94236 (Patent Document 2), at least two or more of the colored layers for forming colored pixels of red, green, and blue may be overlapped.
Since the black matrix is formed by superimposing the colored layers in the process of forming the colored layers by the photolithography method, the process for forming the black matrix layer can be omitted in manufacturing the color filter forming substrate. There is an advantage.
JP 2003-14917 A JP 2004-94236 A

On the other hand, in order to maintain the thickness (cell gap) of the liquid crystal layer, the liquid crystal display device is usually provided between an electrode substrate having a thin film transistor (TFT) and a plurality of scanning electrodes and a color filter forming substrate. In order to keep the distance between them constant, plastic beads or glass fibers having a uniform particle diameter are dispersed between the two substrates as spacers for controlling the distance.
However, in order to improve the defects caused by this spacer member, for example, cell gap unevenness due to spacer aggregation, and decrease in contrast due to poor alignment around the spacer, an appropriate column shape on the color filter forming substrate by photolithography It is proposed in Japanese Patent Application Laid-Open No. 10-82909 (Patent Document 3), Japanese Patent Application Laid-Open No. 10-20314 (Patent Document 4), and the like and has been put to practical use.
By substituting the columnar spacer, it is possible to significantly improve the uniform distribution, which is a defect of the bead spacer, the bead movement in the cell, and the contrast decrease due to the light leaking due to the disturbance of the orientation around the bead.
For this reason, also in the color filter forming substrate, the demand for the color filter forming substrate with columnar spacers is increasing.
In JP-A-10-82909 and JP-A-10-20314, it is proposed to form a spacer with a material mainly composed of polyimide resin, polyvinyl alcohol resin, acrylic resin, and negative resist.
As the columnar spacers, a method for forming the colored layers for forming red, green, and blue colored pixels by overlapping each other is also described in JP-A-9-120075 (Patent Document 5) and the like. .
As shown in FIG. 6, columnar spacers 26 made of colored layers of three colors are formed on the black stripes 15 made of a light shielding layer.
In the case where the columnar spacers are formed by overlapping the colored layers, there is an advantage that a process for forming the columnar spacers can be omitted in manufacturing the color filter forming substrate.
JP-A-10-82909 Japanese Patent Laid-Open No. 10-20314 JP-A-9-120075

As described above, in recent years, a method of forming the black matrix and the columnar spacer of the color filter forming substrate in the formation of each colored layer by the photolithography method for forming the pixels of the red, green, and blue colored layers has also been adopted. It has been.
However, recently, the demand for high-quality display for liquid crystal display devices has become more stringent. In the formation of the black matrix and the columnar spacers by overlapping the above-mentioned conventional colored layers, the height depends on the thickness of each colored layer. As a result, the thickness could not be controlled to a desired value, which was a problem in terms of quality.
The present invention corresponds to this, and is a color filter forming substrate in which a black matrix or a columnar spacer is formed by overlapping each colored layer for forming pixels of red, green, and blue colored layers. An object of the present invention is to provide a method for manufacturing a color filter forming substrate that can be controlled to a desired thickness.
At the same time, it is intended to provide a color filter forming substrate in which a black matrix and a columnar spacer are overlapped with each color layer for forming pixels of red, green, and blue color layers and have a desired thickness. is there.

The method for producing a color filter forming substrate of the present invention is a method for producing a color filter forming substrate having a black matrix, and is a photolithography method using a photosensitive coloring material, and R (red), G (green), When forming pixels of each colored layer of B (blue), three colored layers of R (red), G (green), and B (blue) are overlapped to form a black matrix, and at least In the formation of a colored layer by the photolithography method for one or more colors, the exposure amount to the black matrix formation region is different from the exposure amount to the pixel region of the coloring layer, and development is performed. It is characterized by.
In the method for manufacturing the color filter forming substrate, the pixels of each colored layer in the photolithography method are exposed through a corresponding photomask for forming the pixels of each colored layer. At least one of the photomasks has a transmittance of exposure light in a region corresponding to a pixel formation region of the colored layer and a transmittance of exposure light in a region corresponding to the black matrix formation region. In the photolithographic method, each colored layer is formed with a negative coloring material, and the one or more photomasks are formed in a pixel formation region. The exposure light transmittance of the corresponding region is set to 100%, and the exposure light transmittance of the region corresponding to the black matrix formation region is set to a predetermined transmittance of less than 100%. It is characterized in that there.
Then, in any one of the above-described methods for producing a color filter forming substrate, pixels of each colored layer of R (red), G (green), and B (blue) are obtained by photolithography using the photosensitive coloring material. Is formed by overlapping two or more of the three colored layers of R (red), G (green), and B (blue) to form a columnar spacer, and at least one color or more of the photolithography method. In the formation of the colored layer by the above, the exposure amount to the columnar spacer forming region is different from the exposure amount to the pixel region of the colored layer, and is exposed and developed. .
Further, in any one of the above-described methods for producing a color filter forming substrate, the exposure by the photolithography method repeatedly exposes an exposure area of a unit corresponding to a part of a repeated pattern of a colored layer to be formed, The exposure areas of the units are connected or the exposure areas of the units are continuously moved to form a desired exposure area.

  The color filter forming substrate of the present invention is manufactured by the method for manufacturing a color filter forming substrate according to any one of claims 1 to 5.

(Function)
In the method for manufacturing a color filter forming substrate of the present invention, with such a configuration, a black matrix or a columnar spacer is overlapped with each colored layer for forming pixels of red, green, and blue colored layers. With the formed color filter forming substrate, it is possible to provide a manufacturing method of the color filter forming substrate capable of controlling these to a desired thickness.
Specifically, when pixels of each colored layer of R (red), G (green), and B (blue) are formed by a photolithography method using a photosensitive coloring material, R (red), G (green) ) And B (blue) are superimposed to form a black matrix, and in the formation of the colored layer by the photolithography method of at least one color, the exposure amount to the black matrix formation region is This is achieved by exposing and developing the exposure amount different from the exposure amount to the pixel region of the colored layer.
Specifically, in the formation of a colored layer by a photolithographic method of at least one color, the exposure amount to the black matrix forming region is different from the exposure amount to the pixel region of the colored layer, and development is performed. Therefore, with respect to the colored layer of one or more colors, it is possible to make a difference in the thickness of the colored layer between the pixel region and the black matrix forming region. As a result, R (red), G (green) ), The total thickness of the black matrix in which the three colored layers of B (blue) are superimposed, and the sum of the thicknesses of the pixel regions of the three colored layers of R (red), G (green), and B (blue) Can have different thicknesses, and in particular, by controlling the exposure amount, it is possible to control the total thickness of the black matrix to a desired thickness.

More specifically, the formation of the pixels of each colored layer in the photolithography method is performed through a corresponding photomask for forming the pixels of each colored layer, and one or more of the photomasks are used. Each of the photomasks has different transmittances of exposure light in a region corresponding to the pixel formation region of the colored layer and exposure light transmittances in a region corresponding to the black matrix formation region. In the formation of the colored layer by the photolithographic method of at least one color, the exposure amount to the black matrix forming region is set to an exposure amount different from the exposure amount to the pixel region of the colored layer. It is possible to do it easily at a practical level.
The formation of each colored layer in the photolithography method is performed with a negative coloring material, and the one or more photomasks have an exposure light transmittance of 100% in a region corresponding to a pixel formation region, The form of the invention of claim 3 wherein the transmittance of the exposure light in the region corresponding to the black matrix forming region is a predetermined transmittance of less than 100%.

Furthermore, when forming pixels of each colored layer of R (red), G (green), and B (blue) by the photolithography method using the photosensitive coloring material, R (red), G (green) , B (blue) two or more of the three colored layers are overlapped to form a columnar spacer, and at least in the formation of the colored layer by the photolithography method of one or more colors, exposure to the columnar spacer formation region In the case of the form of the invention according to claim 4, the thickness of the columnar spacer is also controlled to a desired thickness, in which the amount is an exposure amount different from the exposure amount to the pixel region of the colored layer. Making it possible.
Further, in the exposure in the photolithography method, an exposure area of a unit corresponding to a part of the repeated pattern of the colored layer to be formed is repeatedly exposed to connect the exposure areas of the units, or the exposure areas of the units are continuously formed Therefore, the height of the black matrix and column spacers can be controlled to a desired height, and the exposure of large-size images can be performed with a small-size mask pattern. In particular, it is effective in manufacturing a color filter forming substrate such as a liquid crystal display device.

  With the color filter forming substrate of the present invention, the black matrix and the columnar spacer are overlapped with each colored layer for forming the pixels of the red, green, and blue colored layers, and the desired shape is obtained. It is possible to provide a color filter forming substrate having a thickness of 5 mm.

As described above, the present invention is a color filter forming substrate in which a black matrix or a columnar spacer is formed by overlapping each colored layer for forming pixels of red, green, and blue colored layers. It is possible to provide a method for manufacturing a color filter forming substrate that can be controlled to a thickness.
At the same time, it is possible to provide a color filter forming substrate in which a black matrix and a columnar spacer are overlapped with each colored layer for forming pixels of red, green, and blue colored layers and have a desired thickness.

Embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a process cross-sectional view showing characteristic steps in the first example of the method for manufacturing a color filter forming substrate of the present invention, and FIG. 2 is a second example of the method for manufacturing the color filter forming substrate of the present invention. FIG. 3A is a schematic cross-sectional view of a photomask having a repetitive pattern for forming a colored layer, and FIG. 3B is a cross-sectional view of the mask showing a characteristic process. FIG. 3 (c) is a schematic sectional view, FIG. 3 (c) is a plan view of the mask shown in FIG. 3 (b), FIG. 4 is a diagram showing a part of repeated drawing exposure by repeated exposure, and FIG. It is the schematic of the apparatus for performing exposure.
In FIG. 3, the base substrate holding the light shielding film and the halftone film is omitted.
1 to 5, 10 is a processing substrate, 20 is a colored layer, 21 is a red colored material, 21R is a red colored layer, 22 is a green colored material, 22G is a green colored layer, and 23 is blue Coloring material, 23B is a blue colored layer, 25, 25a to 25c are black matrixes, 26 are columnar spacers, 30, 30a, 30b are photomasks, 30A, 30Aa, 30Ab are photomasks, 30B is a mask, 31 is light-shielding , 32 is an opening, 33a, 33b and 33c are halftone layers, 35 is exposure light, 51 to 54 are exposure areas by the first exposure, 61 to 64 are exposure areas by the second exposure, and 70 is the overlap exposure. , 80 is an exposure unit, 85 is an exposure head, and 90 is an XY stage.

A first example of a method for manufacturing a color filter forming substrate of the present invention will be described.
The first example is a method for producing a color filter forming substrate having a black matrix having a structure in which three colored layers are laminated, and is a photolithography method using a photosensitive coloring material. When forming pixels of each colored layer of (green) and B (blue), a black matrix is formed by overlapping three colored layers of R (red), G (green), and B (blue). , R (red), G (green), and B (blue), the amount of exposure to the black matrix formation region is different from the amount of exposure to the pixel region of the color layer. , Exposing and developing.
Here, the exposure for forming each colored layer is performed using the corresponding photomasks 30, 30 a, and 30 b, and each photomask opens an area corresponding to the area corresponding to the pixel formation area of each colored layer. And the region corresponding to the black matrix forming region is a halftone portion, and the transmittance of the exposure light is different.
In this example, each colored layer is formed using negative-type coloring materials 21, 22, and 23, and each photomask has an exposure light transmittance of 100% in a region corresponding to the pixel formation region. The transmittance of the exposure light in the region corresponding to the black matrix forming region is set to a predetermined transmittance of less than 100% corresponding to the desired thickness of the colored layer to be formed.

Further, a characteristic process will be described with reference to FIG.
First, in order to form an R (red) colored layer, a red coloring material 21 is applied to one surface of the processing substrate 10 to form a film, and then exposed through a photomask 30 with a predetermined exposure machine. (Fig. 1 (a))
Generally, a proximity exposure machine (proximity exposure machine) is used as the exposure machine, and exposure is performed with parallel light.
In the photomask 21, a light shielding portion 31, an opening 32, and a halftone portion 33a are formed in a predetermined shape.
The halftone part 33a in the photomask 21 is produced by, for example, an oxidation process that covers a predetermined opening in a normal binary type photomask in which a pattern is formed by a chromium-based light-shielding part and its opening. Examples include, but are not limited to, forming a chromium nitride halftone layer.
Here, as the coloring material, a pigment-dispersed coloring material in which a pigment, a dye, and the like are mixed and dispersed in a photosensitive resin is used for forming a colored layer of each color. However, the present invention is not limited to this.
As the processing substrate 10, alkali-free glass is usually used, but a plastic substrate, soda lime glass, or the like is also used.
Here, the red colored layer formation region is exposed by the exposure light that has passed through the opening 32, and the black matrix formation region is exposed by the exposure light that has passed through the halftone portion 33a. The area corresponding to the light shielding part is not exposed.
Next, by performing development processing, the red colored layer forming region is thick, the black matrix forming region is thin, the red coloring material 21 is patterned, and the red coloring material in the unexposed region corresponding to the light shielding region 21 is removed by development. (Fig. 1 (b))
Next, after performing drying, heat treatment, and the like as necessary, a green coloring material 22 is applied to the red coloring layer forming surface of the processing substrate 10 to form a film. Exposure is performed through the photomask 30a. (Fig. 1 (c))
Similarly, on the photomask 30a, a light shielding portion 31, an opening portion 32, and a halftone portion 33a are formed in a predetermined shape, and the green colored layer forming region is exposed by the exposure light that has passed through the opening portion 32. The black matrix forming region is exposed by the exposure light that has passed through the halftone portion 33a.
Also in this case, the region corresponding to the light shielding portion is not exposed.Next, by performing development processing, the green colored layer forming region is thick, the black matrix forming region is thin, the green coloring material 22 is patterned, The green coloring material 22 in the unexposed area corresponding to the light shielding area is removed by development. (Fig. 1 (d))
Next, after performing drying, heat treatment, etc. as necessary, a film is formed by applying a blue coloring material 23 on the surface of the processing substrate 10 on which the red coloring layer 21R and the green coloring layer 22G are formed. Further, similarly to the above, exposure is performed by the exposure machine through the photomask 30b. (FIG. 1 (e)) Similarly, the photomask 30b is formed with a light shielding portion 31, an opening 32, and a halftone portion 33a in a predetermined shape. The colored layer forming region is exposed, and the black matrix forming region is exposed by the exposure light passing through the halftone portion 33a.
Also in this case, the area corresponding to the light shielding portion is not exposed.
Next, by performing development processing, the blue colored layer forming region is thick, the black matrix forming region is thin, the blue coloring material 23 is patterned, and the blue coloring material in the unexposed region corresponding to the light shielding region 23 is removed by development. (Fig. 1 (f))
Next, drying, heat treatment, etc. are performed as necessary.
In this way, a black matrix in which a red colored layer, a green colored layer, and a blue colored layer are formed in a predetermined region, and three color layers are stacked in the black matrix forming region. Can be obtained.
For example, the substrate on which the colored layer is formed further includes alignment control protrusions for controlling the alignment of the liquid crystal as necessary, and further an OC layer (protective film) and an ITO film are formed.
In the case of this example, a thin desired thickness can be obtained by controlling the transmittance of the exposure light of the halftone portion 33a.

A second example of the method for manufacturing the color filter forming substrate of the present invention will be described.
The second example is a method for producing a color filter forming substrate having a black matrix having a structure in which three colored layers are laminated and a columnar spacer, and is a photolithographic method using a photosensitive coloring material. When forming the pixels of the colored layers of red (red), G (green), and B (blue), the three colored layers of R (red), G (green), and B (blue) are overlapped to form a black matrix. In the formation of colored layers of three colors R (red), G (green), and B (blue), the exposure amount to the black matrix formation region is defined as the exposure amount to the pixel region of the coloring layer. Different exposure amounts are exposed and developed.
Here, the exposure for forming each colored layer is performed using the corresponding photomasks 30A, 30Aa, and 30Ab. However, each photomask is in a region corresponding to the pixel forming region and the columnar spacer forming region of each colored layer, respectively. The corresponding region is an opening, and the region corresponding to the black matrix formation region is a halftone portion, and the transmittance of exposure light is different.
In the second example, as in the first example, each colored layer is formed using negative coloring materials 21, 22, and 23, and each photomask is placed in the pixel formation region of each colored layer. The exposure light transmittance in the corresponding region and the columnar spacer formation region is 100%, and the exposure light transmittance in the region corresponding to the black matrix formation region is set to a predetermined transmittance of less than 100%.

In the second example, basically, as in the first example, the red coloring material 21, the green coloring material 22, and the blue coloring material 23 are sequentially applied to the photomasks 30A and 30Aa, respectively. , 30Ab, and exposure and development to form a black matrix and columnar spacers having a structure in which colored layers of three colors are laminated in the black matrix formation region and the columnar spacer formation region, respectively.
A photosensitive red coloring material is applied to form a film, exposed and developed with a photomask 30A, and thick in the pixel formation region and columnar spacer formation region of each colored layer, and thin in the black matrix formation region. The red coloring material is patterned. (Fig. 2 (a), Fig. 2 (b))
Similarly, after drying, heat treatment, and the like are performed as necessary, a photosensitive green coloring material 22 is applied to the surface of the processing substrate 10 on which the red coloring layer 21R is formed to form a film. The mask 30Aa is exposed to light and developed to form a pattern of red coloring material that is thick in the pixel formation region and columnar spacer formation region of each colored layer and thin in the black matrix formation region. (FIG. 2 (c), FIG. 2 (d))
Furthermore, similarly, after performing drying, heat treatment, and the like as necessary, the photosensitive blue coloring material 23 is formed on the surface of the processing substrate 10 on which the red coloring layer 21R and the green coloring layer 22G are formed. Coating to form a film, exposure and development with a photomask 30Ab, pattern formation of a red coloring material that is thick in the pixel formation region and columnar spacer formation region of each colored layer and thin in the black matrix formation region To do. (FIG. 2 (e), FIG. 2 (f))
Next, drying, heat treatment, etc. are performed as necessary.
In this way, a red colored layer, a green colored layer, and a blue colored layer are formed in a predetermined region, and three colored layers are stacked in the black matrix forming region and the columnar spacer forming region. Can be obtained.
For example, the substrate on which the colored layer is formed further has alignment control protrusions for controlling the alignment of the liquid crystal as necessary, and further an OC layer (protective film) and an ITO film are formed.
In the case of this example, by controlling the transmittance of the exposure light of the halftone portion 33a, it is possible to obtain a black matrix forming region and a desired thin thickness compared to the conventional case (see FIG. 6), and A thick columnar spacer 26 is formed.
About each member, exposure machine, etc., since the same thing as the 1st example was used, those explanations are omitted here.

The exposure method of the present invention is not limited to the exposure method using the photomask in the first example and the second example.
In the second example, the pixel region of the colored layer and the photomask region corresponding to the columnar spacer are opened to set the exposure light transmittance to 100%, but the photomask region corresponding to the columnar spacer is used. And the exposure light transmittance in the region of the photomask corresponding to the pixel region of the colored layer is set to a predetermined transmittance of less than 100%.
Further, by using the mask forming the exposure range of the unit, the exposure area of the unit corresponding to the exposure range of the unit is repeatedly shifted, or the exposure areas of the unit are continuously moved and overlapped for exposure. You may perform the exposure which connects an area | region and may acquire the same exposure effect.
Such exposure does not require an increase in photomask size, and is effective for forming each colored layer.
In the case of an exposure method in which the exposure areas of the unit corresponding to the exposure range of the unit are repeatedly shifted to connect the exposure areas, which is also called a step-and-repeat method, this will be further described.
Usually, the formed colored layer is repeated, and the photomasks 30, 30a, 30b, 30A, 30Aa, and 30Ab are formed with repeated exposure ranges of units.
For example, the photomask 30 shown in FIG. 3A has a length of a colored layer to be formed by arranging 10R patterns in the A1-A2 direction at a predetermined pitch.
Then, FIG. 3B shows the cross section thereof, and FIG. 3C shows the plane thereof, and the exposure with the mask 10Ra is repeated in the A3-A4 direction, and the exposure is performed for the pattern of 10R. It can be performed.
Further, similar exposure can be performed in place of exposure by the photomask 30 by sequentially repeating similar and sequential exposures by shifting the arrangement pitch in the A1-A2 direction.
As shown in FIG. 4, the first exposure area 51 and the second exposure area are slightly overlapped with each other by a mask 30B so as not to be separated after development, the first exposures 51 to 54 are performed, and the second exposures 601 to 601 are performed. The exposure operation to perform 604 is repeated in the A3-A4 direction and shifted.
By performing this exposure operation even when the arrangement pitch is shifted in the A1-A2 direction, the exposure effect by the photomask 30 can be substituted.
As an exposure apparatus, for example, as shown in FIG. 5, a processing substrate 10 is placed on an XY stage 90, and exposure is performed from above by an exposure head 85 that can project and expose a unit exposure area 10Ra at the same magnification. In the form of a device.
This apparatus repeatedly exposes a mask having an exposure area 10Ra as a unit while moving the XY stage 90 continuously or intermittently.
The light source is light that can sensitize a photosensitive coloring material, and examples thereof include a high-pressure mercury lamp and a XeCl excimer laser (308 nm).
In the case of an exposure method in which the exposure areas of the unit are continuously moved and overlapped to connect the exposure areas, for example, a base material to be exposed is placed on an XY stage, and the position control of the XY stage is performed. While using a laser interferometer, while simultaneously controlling the pulse oscillation of the excimer laser lamp light source as a light source, the unit exposure area is moved continuously from the base material to be exposed, and a desired The entire exposure area is exposed.

It is process sectional drawing which showed the characteristic process in the 1st example of the manufacturing method of the color filter formation board | substrate of this invention. It is process sectional drawing which showed the characteristic process in the 2nd example of the manufacturing method of the color filter formation board | substrate of this invention. 3A is a schematic cross-sectional view of a photomask having a repeating pattern for forming a colored layer, FIG. 3B is a schematic cross-sectional view of a mask having a repeating pattern of units, and FIG. It is a top view of the mask shown to 3 (b). It is the figure which showed a part of the superposition drawing exposure by repeated exposure. It is the schematic of the apparatus for performing the superposition drawing exposure by repeated exposure. It is a schematic sectional drawing of the conventional columnar spacer.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Processing base material 20 Colored layer 21 Red colored material 21R Red colored layer 22 Green colored material 22G Green colored layer 23 Blue colored material 23B Blue colored layer 25, 25a-25c Black matrix 26 Columnar spacer 30, 30a, 30b Photomask 30A, 30Aa, 30Ab Photomask 30B Mask 31 Light shielding part 32 Opening part 33a, 33b, 33c Halftone layer 35 Exposure light 51-54 Exposure area 61-64 by 1st exposure Exposure by 2nd exposure Area 70 Linking portion 80 by overexposure 80 Exposure portion 85 Exposure head 90 XY stage

Claims (6)

  A method for producing a color filter forming substrate having a black matrix, wherein pixels of each colored layer of R (red), G (green), and B (blue) are formed by a photolithography method using a photosensitive coloring material. In this case, three colored layers of R (red), G (green), and B (blue) are stacked to form a black matrix, and at least one colored layer is formed by the photolithography method. The method for producing a color filter forming substrate according to claim 1, wherein the exposure is performed with the exposure amount to the black matrix forming region being different from the exposure amount to the pixel region of the colored layer.   2. The method for producing a color filter forming substrate according to claim 1, wherein the formation of pixels of each colored layer in the photolithography method is performed through a corresponding photomask for forming the pixels of each colored layer. In the photomask, at least one of the photomasks includes an exposure light transmittance in a region corresponding to the pixel formation region of the colored layer, and an exposure light transmittance in a region corresponding to the black matrix formation region, respectively. A method for manufacturing a color filter forming substrate, wherein the substrate is different.   3. The method for manufacturing a color filter forming substrate according to claim 2, wherein the formation of each colored layer in the photolithography method is performed with a negative coloring material, and the one or more photomasks are pixels. A color characterized in that the exposure light transmittance in the region corresponding to the formation region is 100%, and the exposure light transmittance in the region corresponding to the black matrix formation region is a predetermined transmittance of less than 100%. A method for producing a filter-formed substrate.   4. The method for producing a color filter forming substrate according to claim 1, wherein R (red), G (green), and B (blue) are produced by a photolithography method using the photosensitive coloring material. ) To form a columnar spacer by superimposing two or more of the three colored layers of R (red), G (green), and B (blue). In the formation of the colored layer by the photolithography method of one or more colors, the exposure amount to the columnar spacer formation region is exposed and developed as an exposure amount different from the exposure amount to the pixel region of the coloring layer. A manufacturing method of a color filter forming substrate characterized by the above.   The method for producing a color filter forming substrate according to any one of claims 1 to 4, wherein the exposure in the photolithography method includes an exposure area in a unit corresponding to a part of a repetitive pattern of a colored layer to be formed. A method for producing a color filter forming substrate, characterized in that exposure is repeated, the exposure areas of the units are connected, or the exposure areas of the units are continuously moved to form a desired exposure area.   A color filter forming substrate having a black matrix, which is manufactured by the method for manufacturing a color filter forming substrate according to any one of claims 1 to 5.

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