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JP2013518740A - 大面積ナノパターン用金属スタンプ複製の方法及びプロセス - Google Patents

大面積ナノパターン用金属スタンプ複製の方法及びプロセス Download PDF

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Publication number
JP2013518740A
JP2013518740A JP2012551510A JP2012551510A JP2013518740A JP 2013518740 A JP2013518740 A JP 2013518740A JP 2012551510 A JP2012551510 A JP 2012551510A JP 2012551510 A JP2012551510 A JP 2012551510A JP 2013518740 A JP2013518740 A JP 2013518740A
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JP
Japan
Prior art keywords
stamp
metal
layer
top surface
imprint
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012551510A
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English (en)
Japanese (ja)
Inventor
マティアス・カイル
ガン・ルオ
イェ・チョウ
Original Assignee
オブダカット・アーベー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by オブダカット・アーベー filed Critical オブダカット・アーベー
Publication of JP2013518740A publication Critical patent/JP2013518740A/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H10P76/2041—

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  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP2012551510A 2010-02-05 2010-02-05 大面積ナノパターン用金属スタンプ複製の方法及びプロセス Pending JP2013518740A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2010/051399 WO2011095217A1 (fr) 2010-02-05 2010-02-05 Procédé et processus permettant une reproduction de poinçon métallique pour des nanomotifs de grande surface

Publications (1)

Publication Number Publication Date
JP2013518740A true JP2013518740A (ja) 2013-05-23

Family

ID=42357620

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012551510A Pending JP2013518740A (ja) 2010-02-05 2010-02-05 大面積ナノパターン用金属スタンプ複製の方法及びプロセス

Country Status (6)

Country Link
US (1) US20120297856A1 (fr)
EP (1) EP2531888A1 (fr)
JP (1) JP2013518740A (fr)
KR (1) KR101698838B1 (fr)
CN (1) CN102713752A (fr)
WO (1) WO2011095217A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8771529B1 (en) * 2010-09-30 2014-07-08 Seagate Technology Llc Method for imprint lithography
JP6068476B2 (ja) * 2011-09-19 2017-01-25 クルーシブル インテレクチュアル プロパティ エルエルシーＣｒｕｃｉｂｌｅ Ｉｎｔｅｌｌｅｃｔｕａｌ Ｐｒｏｐｅｒｔｙ Ｌｌｃ 認証及びテクスチャ化のためのナノ及びマイクロ複製
SG11201510452PA (en) * 2013-06-20 2016-01-28 Ev Group E Thallner Gmbh Die with a Die Structure as well as Device and Method for its Production
US20180311877A1 (en) * 2015-10-27 2018-11-01 Agency For Science, Technology And Research Nanoinjection molding
EP3547026B1 (fr) * 2018-03-28 2023-11-29 CSEM Centre Suisse d'Electronique et de Microtechnique SA Procédé de fabrication d'un tampon métallique pour le gaufrage d'une nano et/ou microstructure sur un dispositif métallique ainsi que ses utilisations et dispositifs fabriqués à partir de celui-ci
KR102142981B1 (ko) * 2018-05-29 2020-08-11 한국기계연구원 나노패턴을 가지는 금속층 제조방법
CN114178067B (zh) * 2022-01-14 2023-04-28 苏州新维度微纳科技有限公司 纳米压印胶体溅射装置及方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002003142A2 (fr) * 2000-06-30 2002-01-10 President And Fellows Of Harvard College Procede et dispositif pour l'impression de microcontacts electriques
JP2008542081A (ja) * 2005-06-10 2008-11-27 オブデュキャット、アクチボラグ 中間スタンプによるパターン複製

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5422389A (en) 1977-07-21 1979-02-20 Toyama Chem Co Ltd Novel 7alpha-methoxycephalosporins and their preparation
US5244730A (en) 1991-04-30 1993-09-14 International Business Machines Corporation Plasma deposition of fluorocarbon
CA2157257C (fr) 1994-09-12 1999-08-10 Kazuhiko Endo Dispositif a semiconducteur a couche de carbone amorphe et sa methode de fabrication
US6184572B1 (en) 1998-04-29 2001-02-06 Novellus Systems, Inc. Interlevel dielectric stack containing plasma deposited fluorinated amorphous carbon films for semiconductor devices
US20030071016A1 (en) * 2001-10-11 2003-04-17 Wu-Sheng Shih Patterned structure reproduction using nonsticking mold
TW200511296A (en) * 2003-09-01 2005-03-16 Matsushita Electric Industrial Co Ltd Method for manufacturing stamper, stamper and optical recording medium
ES2315797T3 (es) * 2005-06-10 2009-04-01 Obducat Ab Metodo de replicacion de modelo.
US7955516B2 (en) * 2006-11-02 2011-06-07 Applied Materials, Inc. Etching of nano-imprint templates using an etch reactor
EP2199855B1 (fr) * 2008-12-19 2016-07-20 Obducat Procédés et méthodes pour modifier les interactions en surface de matériaux polymériques
US20120126458A1 (en) * 2009-05-26 2012-05-24 King William P Casting microstructures into stiff and durable materials from a flexible and reusable mold

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002003142A2 (fr) * 2000-06-30 2002-01-10 President And Fellows Of Harvard College Procede et dispositif pour l'impression de microcontacts electriques
JP2008542081A (ja) * 2005-06-10 2008-11-27 オブデュキャット、アクチボラグ 中間スタンプによるパターン複製

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JPN6014020284; ＹＯＵＮ: 'Ａ　ＲＥＰＬＩＣＡＴＩＯＮ　ＰＲＯＣＥＳＳ　ＯＦ　ＭＥＴＡＬＬＩＣ　ＭＩＣＲＯ-ＭＯＬＤ　ＢＹ　ＵＳＩＮＧ　ＰＡＲＹＬＥＮＥ　ＥＭＢＯＳＳＩＮＧ　ＡＮＤ　ＥＬＥＣＴＲＯＰＬＡＴＩＮＧ' ＭＩＣＲＯＥＬＥＣＴＲＯＮＩＣ　ＥＮＧＩＮＥＥＲＩＮＧ Ｖ８５　Ｎ１, 20071120, Ｐ１６１-１６７, ＥＬＳＥＶＩＥＲ　ＰＵＢＬＩＳＨＥＲＳ　ＢＶ *

Also Published As

Publication number Publication date
KR101698838B1 (ko) 2017-01-23
US20120297856A1 (en) 2012-11-29
KR20120124476A (ko) 2012-11-13
EP2531888A1 (fr) 2012-12-12
WO2011095217A1 (fr) 2011-08-11
CN102713752A (zh) 2012-10-03

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