[go: up one dir, main page]

JP2012096920A - Glass substrate defect inspection device and glass substrate defect inspection method and glass substrate defect inspection system - Google Patents

Glass substrate defect inspection device and glass substrate defect inspection method and glass substrate defect inspection system Download PDF

Info

Publication number
JP2012096920A
JP2012096920A JP2010248484A JP2010248484A JP2012096920A JP 2012096920 A JP2012096920 A JP 2012096920A JP 2010248484 A JP2010248484 A JP 2010248484A JP 2010248484 A JP2010248484 A JP 2010248484A JP 2012096920 A JP2012096920 A JP 2012096920A
Authority
JP
Japan
Prior art keywords
glass substrate
air
inspection
defect inspection
substrate defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010248484A
Other languages
Japanese (ja)
Inventor
Yuichi Shimoda
勇一 下田
Kohei Kinugawa
耕平 衣川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Priority to JP2010248484A priority Critical patent/JP2012096920A/en
Publication of JP2012096920A publication Critical patent/JP2012096920A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

【課題】分ガラス基板の全面亘って平坦性を確保し、精度よく検査できるガラス基板欠陥検査装置またはガラス基板欠陥検査方法あるいはガラス基板欠陥検査システムを提供する。
【解決手段】ガラス基板をエアで浮上力を発生させて浮上させ、前記浮上力のない検査領域に搬送し、前記検査領域において前記ガラス基板を撮像し検査するガラス基板欠陥検査装置またはガラス基板欠陥検査方法において、前記検査領域の周囲において、前記浮上力を発生する前記ガラス基板面と反対側の面に前記ガラス基板をエアで挟み込む挟込力を発生させる。
【選択図】図4
Disclosed is a glass substrate defect inspection apparatus, a glass substrate defect inspection method, or a glass substrate defect inspection system capable of ensuring flatness over the entire surface of a divided glass substrate and accurately inspecting.
A glass substrate defect inspection apparatus or glass substrate defect that floats by generating a levitation force with air, transports the glass substrate to an inspection area without the levitation force, images the glass substrate in the inspection area, and inspects the glass substrate. In the inspection method, a clamping force is generated to sandwich the glass substrate with air on a surface opposite to the glass substrate surface that generates the levitation force around the inspection region.
[Selection] Figure 4

Description

本発明は、ガラス基板欠陥検査装置及びガラス基板欠陥検査方法並びにガラス基板欠陥検査システムに係わり、精度よく検査できるガラス基板欠陥検査装置及びガラス基板欠陥検査方法並びにガラス基板欠陥検査システムに関する。   The present invention relates to a glass substrate defect inspection apparatus, a glass substrate defect inspection method, and a glass substrate defect inspection system, and relates to a glass substrate defect inspection apparatus, a glass substrate defect inspection method, and a glass substrate defect inspection system that can be inspected with high accuracy.

液晶表示パネルや太陽電池パネルの製造は、フォトリソグラフィ技術等によりガラス基板上にパターンを形成して行なわれる。その際に、ガラス基板の表面の傷や異物等の欠陥が存在すると、パターンが良好に形成されず、不良の原因となる。このため、従来から、欠陥検査装置を用いてガラス基板の表面の傷や異物等の欠陥検査が行なわれている。   Manufacture of a liquid crystal display panel and a solar cell panel is performed by forming a pattern on a glass substrate by a photolithography technique or the like. At that time, if there are defects such as scratches or foreign matter on the surface of the glass substrate, the pattern is not formed satisfactorily, causing a defect. For this reason, conventionally, a defect inspection apparatus has been used to inspect defects such as scratches and foreign matter on the surface of a glass substrate.

欠陥検査を実施するためには、ガラス基板を欠陥検査装置に搬送し検査する必要がある。従来は、ロボットやローラコンベアなどが用いられているが、搬送の際にロボットの吸着パット、ローラコンベアのローラに使用されている材料がガラス基板に付着、あるいは割れたガラス破片の付着により傷や異物の欠陥の要因になる。このために、ガラス基板を非接触にて搬送する技術として、ガラス基板の端部を吸着保持し、エア浮上させてガラス基板を搬送する構成が、特許文献1に記載されている。また、ガラス基板上の傷または異物の検査方法が特許文献2に記載されている。   In order to carry out the defect inspection, it is necessary to transport the glass substrate to a defect inspection apparatus for inspection. Conventionally, robots, roller conveyors, etc. are used, but the materials used for the robot's suction pads and rollers of the roller conveyor adhere to the glass substrate during transportation, or scratches due to adhesion of broken glass fragments. It becomes a factor of the defect of a foreign material. For this purpose, Patent Document 1 discloses a configuration in which an end portion of a glass substrate is sucked and held and air-lifted to convey the glass substrate as a technique for conveying the glass substrate in a non-contact manner. Patent Document 2 describes a method for inspecting scratches or foreign matters on a glass substrate.

特開2006−188313号公報JP 2006-188313 A 特開平9−257642号公報Japanese Patent Laid-Open No. 9-257642

前述したエア浮上でガラス基板を搬送する方式では、搬送するときの状態によりガラス基板の端部の跳ね上がり(上昇)や垂れ下がり(下降)が発生し、ガラス基板の平坦性が失われ、全面に亘って検査を精度よくできないという課題がある。この課題は、昨今のガラス基板の大型化と薄型化に伴い、基板製作時の残存内部応力による歪の影響が大きくなり、さらに顕著になってきている。   In the above-described method of transporting a glass substrate by air levitation, the glass substrate edge may jump (up) or sag (down) depending on the state of transport, and the flatness of the glass substrate will be lost and the entire surface will be lost. Therefore, there is a problem that inspection cannot be performed with high accuracy. This problem has become more prominent with the recent increase in the size and thickness of glass substrates, and the effect of strain due to residual internal stress during substrate production has increased.

特許文献1には、ガラス基板を搬送し、停止して処理することが開示しているが、搬送中に検査するときの上記課題についての認識はなく、まして課題に対する解決策についての開示もない。また、特許文献2についても、光学式の検査装置を開示されているが、搬送中に検査することの上記課題についての認識もなく、解決策に対する開示もない。   Patent Document 1 discloses that a glass substrate is transported, stopped, and processed, but there is no recognition of the above problems when inspecting during transport, and there is no disclosure of solutions to the problems. . Also, Patent Document 2 discloses an optical inspection device, but there is no recognition of the above-mentioned problem of inspection during conveyance, and there is no disclosure of a solution.

本発明は、上記の課題を鑑みてなされたものであり、ガラス基板の全面亘って平坦性を確保し、基板全面を一方向送りにより、精度よく検査できるガラス基板欠陥検査装置またはガラス基板欠陥検査方法あるいはガラス基板欠陥検査システムを提供することにある。   The present invention has been made in view of the above-described problems. A glass substrate defect inspection apparatus or a glass substrate defect inspection capable of ensuring flatness over the entire surface of the glass substrate and accurately inspecting the entire surface of the substrate by one-way feeding. It is to provide a method or a glass substrate defect inspection system.

本発明は、上記の目的を達成するために、少なくとも下記の特徴を有する。
本発明は、ガラス基板をエアで浮上力を発生させて浮上させ、前記浮上力のない検査領域に搬送し、前記検査領域において前記ガラス基板を撮像し検査するガラス基板欠陥検査装置またはガラス基板欠陥検査方法において、前記検査領域の周囲において、前記浮上力を発生する前記ガラス基板面と反対側の面に前記ガラス基板をエアで挟み込む挟込力を発生させることを第1の特徴とする。
In order to achieve the above object, the present invention has at least the following features.
The present invention is a glass substrate defect inspection apparatus or glass substrate defect that floats by generating a levitation force with air, transports the glass substrate to an inspection area without the levitation force, images and inspects the glass substrate in the inspection area In the inspection method, a first feature is that a pinching force for sandwiching the glass substrate with air is generated on a surface opposite to the glass substrate surface that generates the levitation force around the inspection region.

また、本発明は、前記浮上力を発生させるエア浮上手段は、前記周囲において前記エアを噴出しガラス基板を浮上させる噴出口と、エアを吸引しガラス基板を前記ステージ側に引込む吸引口とを交互にマトリックス状に配置していることを第2の特徴とする。
さらに、本発明は、前記挟込力を発生させる前記エア挟込手段は、前記エアを噴出しガラス基板Pを前記ステージ側に押付ける噴出口と、前記エアを吸引し前記ガラス基板を前記ステージ側から引き離す吸引口とを交互にマトリックス状に配置していることを第3の特徴とする。
Further, according to the present invention, the air levitation means for generating the levitation force includes an ejection port for ejecting the air around the periphery to float the glass substrate, and a suction port for sucking air and drawing the glass substrate to the stage side. The second feature is that they are alternately arranged in a matrix.
Further, according to the present invention, the air clamping means for generating the clamping force ejects the air and presses the glass substrate P against the stage side, and sucks the air to place the glass substrate on the stage. A third feature is that the suction ports that are separated from the side are alternately arranged in a matrix.

さらに、本発明は、前記エア浮上手段の噴出口と吸引口は、前記エア浮上手段の噴出口及び吸引口と同じ位置にならないようにずらして配置されていることを第4の特徴とする。
また、本発明は、前記エア浮上手段と前記エア挟込手段は前記検査をするための検査開口部を有し、前記開口部の形状は、丸形又は楕円或は菱形または角形等の形状を有していることを第5の特徴とする。
Furthermore, the present invention is characterized in that the jet outlet and the suction port of the air levitation means are arranged so as not to be at the same positions as the jet outlet and the suction port of the air levitation means.
Further, according to the present invention, the air levitation means and the air clamping means have an inspection opening for performing the inspection, and the shape of the opening is a round shape, an oval shape, a rhombus shape, a square shape, or the like. It has a fifth feature.

さらに、本発明は、前記挟込力を発生させる前記エア挟込手段は、前記検査をするための検査開口部と、前記ガラス基板の前記浮上手段の反対側面において、前記開口部に向ってあるいは前記開口部から、前記ガラス基板に平行なエアの流れを形成する手段とを有することを第6の特徴とする。
また、本発明は、前記ガラス基板の傷、汚れ、異物、前記ガラス基板表面のクレータ形状及び前記ガラス基板内部の気泡のうち少なくとも一つを検査することを第7の特徴とする。
Further, according to the present invention, the air clamping means for generating the clamping force may be directed to the opening on the opposite side of the inspection opening for performing the inspection and the floating means of the glass substrate, or A sixth feature includes means for forming an air flow parallel to the glass substrate from the opening.
The seventh feature of the present invention is to inspect at least one of the scratch, dirt, foreign matter, crater shape on the surface of the glass substrate, and bubbles inside the glass substrate.

さらに、本発明は、前記検査する検査部を前記搬送する方向にずらして複数設けたことを第8の特徴とする。
また、本発明は、第1乃至第8の特徴のいずれかを有する複数のガラス基板欠陥検査装置と、前記複数のガラス基板欠陥検査装置間を前記ガラス基板を搬送する搬送装置とを有し、前記複数のガラス基板欠陥検査装置のうち少なくとも2台は、前記ガラスにおいて前記搬送する方向にずれた前記検査領域を検査することを特徴とするガラス基板欠陥検査システムであることを第9の特徴とする。
Furthermore, the present invention has an eighth feature that a plurality of inspection units to be inspected are provided by being shifted in the conveying direction.
In addition, the present invention includes a plurality of glass substrate defect inspection devices having any one of the first to eighth features, and a transport device that transports the glass substrate between the plurality of glass substrate defect inspection devices, Ninth feature is that the glass substrate defect inspection system, wherein at least two of the plurality of glass substrate defect inspection devices inspect the inspection area shifted in the transport direction in the glass. To do.

本発明によれば、ガラス基板の全面亘って平坦性を確保し、基板全面を一方向送りにより、精度よく検査できるガラス基板欠陥検査装置またはガラス基板欠陥検査方法あるいはガラス基板欠陥検査システムを提供できる。   According to the present invention, it is possible to provide a glass substrate defect inspection apparatus, a glass substrate defect inspection method, or a glass substrate defect inspection system capable of ensuring flatness over the entire surface of the glass substrate and accurately inspecting the entire surface of the glass substrate by unidirectional feeding. .

本発明の第1の実施形態を示すブロック図である。It is a block diagram which shows the 1st Embodiment of this invention. 本発明の第1の実施形態であるガラス基板欠陥装置の搬送部を上部から見た概略構成を示した図である。It is the figure which showed schematic structure which looked at the conveyance part of the glass substrate defect apparatus which is the 1st Embodiment of this invention from the upper part. 図1に示す検査部を含めた図2におけるA−A断面図である。It is AA sectional drawing in FIG. 2 including the test | inspection part shown in FIG. 図4(a)は精密浮上ステージの構成を、図4(b)は高浮上部ステージ構成をさらに詳細に示した図である。FIG. 4A shows the configuration of the precision levitation stage, and FIG. 4B shows the configuration of the high levitation stage in more detail. 上部精密浮上ステージの第2の実施例を示す図である。It is a figure which shows the 2nd Example of an upper precision floating stage. 1台のガラス基板欠陥装置に検査部を複数個所設けた実施例を示す図である。It is a figure which shows the Example which provided the several test | inspection part in one glass substrate defect apparatus. 本発明の第2の実施形態を示す図である。It is a figure which shows the 2nd Embodiment of this invention. 従来のガラス基板欠陥装置の構成と課題を示す図である。It is a figure which shows the structure and subject of the conventional glass substrate defect apparatus.

以下、図面に基づいて本発明のガラス基板欠陥装置の実施形態を説明する。
図1は、本発明の第1の実施形態を示すブロック図である。本発明の第1の実施形態は1台のガラス基板検査装置100からなる。ガラス基板検査装置100は、大別して、ガラス基板Pを検査する検査部10と、エア浮上ステージ20とガラス基板Pを保持し浮かしながらエア浮上ステージ20上を搬送する駆動部30とを具備する搬送部40と、搬送部40に圧搾エアを供給する圧搾エア供給源51と空気を吸気する真空供給源52とを具備するエア供給吸気部50と、各部の状態を監視し、各部を制御する全体制御部60とを有する。
Hereinafter, an embodiment of a glass substrate defect apparatus of the present invention will be described based on the drawings.
FIG. 1 is a block diagram showing a first embodiment of the present invention. The first embodiment of the present invention includes a single glass substrate inspection apparatus 100. The glass substrate inspection apparatus 100 is broadly divided into an inspection unit 10 that inspects the glass substrate P, and a conveyance unit that includes an air levitation stage 20 and a drive unit 30 that conveys the air levitation stage 20 while holding and floating the glass substrate P. An air supply intake section 50 comprising a section 40, a compressed air supply source 51 that supplies compressed air to the transport section 40, and a vacuum supply source 52 that sucks air, and the whole that controls the state of each section And a control unit 60.

図2は、本発明の第1の実施形態の搬送部40を上部から見た概略構成を示した図である。図3は、図1に示す検査部10を含めた図2におけるA−A断面図である。
図3に示すように、検査部10はガラス基板Pの傷や汚れを検査する第1検査部10Aと、ガラス基板Pの異物や汚れ、ガラス基板表面のクレータ形状、ガラス基板内部の気泡を検査する第2検査部10BとをそれぞれY方向に3組有し、Y方向の検査をこの3組で分担して検査する。基板サイズによって、3組より以下またはそれ以上でもよい。
FIG. 2 is a diagram illustrating a schematic configuration of the transport unit 40 according to the first embodiment of the present invention as viewed from above. 3 is a cross-sectional view taken along the line AA in FIG. 2 including the inspection unit 10 shown in FIG.
As shown in FIG. 3, the inspection unit 10 inspects the first inspection unit 10 </ b> A that inspects scratches and dirt on the glass substrate P, foreign matter and dirt on the glass substrate P, crater shape on the glass substrate surface, and bubbles inside the glass substrate. Three sets of second inspection units 10B are provided in the Y direction, and the inspection in the Y direction is divided and performed by the three sets. Depending on the substrate size, it may be less than or more than three.

第1検査部10Aは、光源ユニット16Aと撮像ユニット11Aとに分かれる。光源ユニット16Aは、10μm程度の傷を検出するために、線状光源を形成できるレーザ光源17Aと、レーザ光を斜方照射するためのミラー18Aと、安定した線状光を形成するシリンドリカルレンズ19Aとを有する。一方、撮像ユニット11Aは、ガラス基板Pの表面または裏面から散乱光を受光する受光レンズ13Aと、受光レンズ13からの散乱光をP偏光光、S偏光光に分離する偏光ビームスプリッタ14Aまたは無偏光ハーフミラーと、ガラス基板Pの搬送に伴いガラス基板の所定幅を撮像するラインCCD12A1、12A2とを有する。   The first inspection unit 10A is divided into a light source unit 16A and an imaging unit 11A. The light source unit 16A includes a laser light source 17A capable of forming a linear light source, a mirror 18A for obliquely irradiating laser light, and a cylindrical lens 19A for forming stable linear light in order to detect a scratch of about 10 μm. And have. On the other hand, the imaging unit 11A includes a light receiving lens 13A that receives scattered light from the front or back surface of the glass substrate P, and a polarization beam splitter 14A that separates the scattered light from the light receiving lens 13 into P-polarized light and S-polarized light, or non-polarized light. A half mirror and line CCDs 12A1 and 12A2 for imaging a predetermined width of the glass substrate as the glass substrate P is conveyed.

一方、第2検査部10Bは撮像手段12Bによる撮像結果の輝度分布又は波高値(パターン)によりクレータ形状、気泡、異物または汚れを検出する。そのために、光源17Bとして広範囲に照射できるLEDや蛍光灯を用い、ガラス基板Pから透過光を検出する。撮像手段12Bは、ガラス基板Pに移動に伴い所定幅を効率よく撮像するために、第1検査部10Aと同様にラインCCD12Bを用いる。   On the other hand, the second inspection unit 10B detects a crater shape, a bubble, a foreign object, or dirt based on a luminance distribution or a crest value (pattern) of an imaging result obtained by the imaging unit 12B. For this purpose, transmitted light is detected from the glass substrate P using an LED or a fluorescent lamp that can irradiate a wide range as the light source 17B. The imaging unit 12B uses the line CCD 12B in the same manner as the first inspection unit 10A in order to efficiently image a predetermined width as the glass substrate P moves.

上記の例では、第1検査部10Aと第2検査部10Bを搬送(X)方向に異なる位置に設けたが、第1の検査部と第2検査部をY方向に隣接して設け、さらに第1検査部10Aと第2検査部10BとをX方向に交互に設けてもよい。   In the above example, the first inspection unit 10A and the second inspection unit 10B are provided at different positions in the transport (X) direction. However, the first inspection unit and the second inspection unit are provided adjacent to each other in the Y direction. The first inspection unit 10A and the second inspection unit 10B may be provided alternately in the X direction.

図2に示すように、駆動部30は、エア浮上ステージ20の搬送(X)方向に沿って設けられたリニアガイド31と、リニアガイド31に沿って走行するリニアアクチュエータ32と、リニアアクチュエータ32に固定されガラス基板Pを保持するグリッパ33と、リニアアクチュエータ32のリニアガイド31上(搬送(X)方向)の位置を検出するリニアスケール34とを有する。
図1に示す全体制御部60は、リニアスケール34の位置情報を読み込み、搬送速度やグリッパ33を制御する。
As shown in FIG. 2, the drive unit 30 includes a linear guide 31 provided along the conveyance (X) direction of the air levitation stage 20, a linear actuator 32 that travels along the linear guide 31, and a linear actuator 32. It has a gripper 33 that is fixed and holds the glass substrate P, and a linear scale 34 that detects the position of the linear actuator 32 on the linear guide 31 (conveyance (X) direction).
The overall control unit 60 shown in FIG. 1 reads the position information of the linear scale 34 and controls the conveyance speed and the gripper 33.

次に、本実施形態の特徴であるエア浮上ステージ20の構成及び動作を説明する。エア浮上ステージ20は、図2に示すように、搬送(X)方向と垂直なY方向に複数配列された長方形の分割ステージ21を有する。分割ステージ21は、検査領域R1、R2(図3も参照)を挟んで両側に設けられた精密浮上ステージ部21Sと、精密浮上ステージ部21Sの両側に設けられた高浮上部ステージ21Hとを有する。なお、検査領域R1、Rの幅は分割ステージ21の幅より小さいものとする。   Next, the configuration and operation of the air levitation stage 20, which is a feature of this embodiment, will be described. As shown in FIG. 2, the air levitation stage 20 includes rectangular divided stages 21 arranged in a plurality in the Y direction perpendicular to the transport (X) direction. The split stage 21 has a precision levitation stage portion 21S provided on both sides of the inspection regions R1 and R2 (see also FIG. 3), and a high levitation stage 21H provided on both sides of the precision levitation stage portion 21S. . Note that the widths of the inspection regions R1 and R are smaller than the width of the division stage 21.

高浮上部ステージ21Hは、図4(b)に示すように、ガラス基板Pを浮上させる圧搾エアを噴出す噴出口PAのみを有し、ガラス基板Pを安定して浮上し搬送速度を低下させる負荷とならないようにしている。なお、分割ステージ21は搬送(X)方向に対して長さを有するときは、所定の長さで分割されているものとする。   As shown in FIG. 4 (b), the high floating stage 21H has only a spout PA that ejects compressed air that floats the glass substrate P, stably floats the glass substrate P, and lowers the conveyance speed. I try not to become a load. In addition, when the division | segmentation stage 21 has length with respect to a conveyance (X) direction, it shall be divided | segmented by predetermined length.

一方、精密浮上ステージ部21Sは、図3に示すように、エア浮上ステージ20上に設けられた下部精密浮上ステージ21Sdと、搬送されてきたガラス基板Pを挟んで下部精密浮上ステージ21Sdの上部に設けられた上部精密浮上ステージ21Suとを有する。   On the other hand, as shown in FIG. 3, the precision levitation stage unit 21S is placed above the lower precision levitation stage 21Sd with the lower precision levitation stage 21Sd provided on the air levitation stage 20 and the transported glass substrate P interposed therebetween. And an upper precision levitation stage 21Su provided.

図4(a)は精密浮上ステージ21Sの構成を、図4(b)は高浮上部ステージ21Hの構成をさらに詳細に示した図である。下部精密浮上ステージ21Sdは、検査領域R1、R2に対応した検査開口部K1d、K2dを有し、その検査開口部K1d、K2d以外の領域において、圧搾エアを噴出しガラス基板Pを浮上させる噴出口PAと、エアを吸引しガラス基板Pを浮上ステージ20側に引込む吸引口PVとを交互にマトリックス状に配置している。下部精密浮上ステージ21Sdは全体としてガラス基板Pを浮上ステージ20から浮上させる浮上力を発生させる。   FIG. 4A shows the configuration of the precision levitation stage 21S, and FIG. 4B shows the configuration of the high levitation upper stage 21H in more detail. The lower precision levitation stage 21Sd has inspection openings K1d and K2d corresponding to the inspection areas R1 and R2, and a jet outlet that blows out compressed air and floats the glass substrate P in areas other than the inspection openings K1d and K2d. PA and suction ports PV for sucking air and drawing the glass substrate P toward the floating stage 20 are alternately arranged in a matrix. The lower precision levitating stage 21Sd generates a levitating force that levitates the glass substrate P from the levitating stage 20 as a whole.

一方、上部精密浮上ステージ21Suは、検査領域R1、R2に対応した検査開口部K1u、K2uを有し、その検査開口部K1u、Kud以外の領域において、圧搾エアを噴出しガラス基板Pをエア浮上ステージ20側に押付ける噴出口PAと、エアを吸引しガラス基板Pを浮上ステージ20側から引き離す吸引口PVとを交互にマトリックス状に配置している。上部精密浮上ステージ21Suは全体としてガラス基板Pを浮上ステージ20側に押さえ込み、下部精密浮上ステージ21Sdとの間にガラス基板を挟みこむ挟込力を発生させる。   On the other hand, the upper precision levitation stage 21Su has inspection openings K1u and K2u corresponding to the inspection areas R1 and R2, and squeezes air in areas other than the inspection openings K1u and Kud to float the glass substrate P to air. Jet ports PA that are pressed against the stage 20 side and suction ports PV that suck air and separate the glass substrate P from the floating stage 20 side are alternately arranged in a matrix. The upper precision levitation stage 21Su as a whole presses the glass substrate P toward the levitation stage 20, and generates a clamping force that sandwiches the glass substrate with the lower precision levitation stage 21Sd.

この浮上力と挟込力のバランスを取ることによって、図2に示すガラスが板Pの先端部Pt、又は後端部Pbにおいて跳ね上がり(上昇)や垂れ下がり(下降)を防止するガラス基板の矯正力をもたらすことができる。
また、図4(a)に示すように、下部精密浮上ステージ21Sdの噴出口PAと吸引口PVは、上部精密浮上ステージ21Suの噴出口PA及び吸引口PVと同じ位置にならないようにずらして配置されている。さらに、検査開口部K1d、K2d、K1u、K2uの形状としては、検査の障害にならず検査開口部を小さくできガラス基板の矯正力の急激な低下を防止することができる丸形または楕円或いは菱形または角形でもよい。
By balancing this levitation force and clamping force, the glass substrate correction force that prevents the glass shown in FIG. 2 from jumping (raising) or drooping (falling) at the front end portion Pt or the rear end portion Pb of the plate P. Can bring.
Further, as shown in FIG. 4A, the jet outlet PA and the suction port PV of the lower precision levitation stage 21Sd are arranged so as not to be at the same position as the jet outlet PA and the suction port PV of the upper precision levitation stage 21Su. Has been. Furthermore, the shape of the inspection openings K1d, K2d, K1u, and K2u is round, oval, or rhombus that does not become an obstacle to inspection and that can reduce the inspection opening and prevent a rapid decrease in the correction force of the glass substrate. Or it may be square.

このような構成によれば、精密浮上ステージ21Sにガラス基板Pが存在すると、ガラス基板Pの上面及び下面において噴出口項PAから吸引口PVに向かってガラス基板に平行なエア流れが生じ、ガラス基板Pの先端部Ptや後端部Pbも含めて全領域において平坦性(平坦度)を保つことができる。   According to such a configuration, when the glass substrate P is present on the precision levitation stage 21S, an air flow parallel to the glass substrate is generated on the upper surface and the lower surface of the glass substrate P from the outlet term PA toward the suction port PV. Flatness (flatness) can be maintained in the entire region including the front end portion Pt and the rear end portion Pb of the substrate P.

また、本実施形態では、下部精密浮上ステージ21Sdと上部精密浮上ステージ21Suの噴出口PA及び吸引口PVは互いにずらして配置されているので、即ち噴出口PA及び吸引口PVがガラス基板Pの上面、下面で重なることがないので、噴射や吸引がある箇所に偏在することなく一様に行われ、ガラス基板の平坦性をより実現できる。
さらに、高浮上部ステージ21Hから精密浮上ステージ21Sにスムーズにガラス基板Pを移行するために、下部精密浮上ステージ21Sdは上部精密浮上ステージ21Suに比べ長くするほうが望ましい。
Further, in the present embodiment, the jet outlet PA and the suction port PV of the lower precision levitation stage 21Sd and the upper precision levitation stage 21Su are shifted from each other, that is, the jet outlet PA and the suction port PV are arranged on the upper surface of the glass substrate P. Since it does not overlap on the lower surface, it is carried out uniformly without being unevenly distributed at a place where injection or suction is present, and the flatness of the glass substrate can be realized more.
Further, in order to smoothly transfer the glass substrate P from the high floating stage 21H to the precision floating stage 21S, it is desirable that the lower precision floating stage 21Sd is longer than the upper precision floating stage 21Su.

図5は上部精密浮上ステージ21Suの第2の実施例を示す。図5では右から左にガラス基板が搬送されている。第2の実施例では上部精密浮上ステージ21Su´の搬送上流側にガラス基板Pと上部精密浮上ステージ21Su´との間に横方向のエア流れを形成するように圧搾エアを噴出する噴出口PA´を搬送(X)方向と垂直なY方向に複数個設ける。その他の構成は図4に示す第1の実施例を同じである。このエア流れによってガラス基板Pを挟み込む挟込力を発生させることができるので、第1の実施例と同様な効果を奏することができる。図5では噴出口PA´を搬送(X)方向に一つ設けたが複数個設けてもよい。   FIG. 5 shows a second embodiment of the upper precision levitation stage 21Su. In FIG. 5, the glass substrate is conveyed from right to left. In the second embodiment, a jet outlet PA ′ that ejects compressed air so as to form a lateral air flow between the glass substrate P and the upper precision levitation stage 21Su ′ on the upstream side of conveyance of the upper precision levitation stage 21Su ′. Are provided in the Y direction perpendicular to the transport (X) direction. Other configurations are the same as those of the first embodiment shown in FIG. Since the air flow can generate a sandwiching force for sandwiching the glass substrate P, the same effect as in the first embodiment can be obtained. In FIG. 5, one jet port PA ′ is provided in the transport (X) direction, but a plurality of jet ports PA ′ may be provided.

上記の実施形態では、1台のガラス基板欠陥装置に検査部10を1箇所設けたが、ガラス基板のY方向の幅に応じて、図6に示すように検査部10を複数個所(図6では2箇所10−I、10−II)に設け、検査領域R1、R2をY方向にずらしてガラス基板Pの全面を検査してもよい。図6では各破線より紙面上側を検査部10−Iが、各破線より紙面下側を検査部10−IIが検査する。
また、上記実施形態では1箇所の検査部10にY方向の同じ検査をする検査部を3組設けた。そこで、ガラス基板のY方向の幅に応じて検査部を選択し、ガラス基板Pを浮上させる範囲を、例えば、分割ステージ21単位に選択して検査することもできる。
さらに、上記実施形態では、エア浮上ステージ20をY方向に3つの分割ステージ21に分割したが、一つのステージで構成してもよい。
In the above embodiment, one inspection unit 10 is provided in one glass substrate defect device. However, according to the width of the glass substrate in the Y direction, a plurality of inspection units 10 are provided as shown in FIG. In this case, the entire surface of the glass substrate P may be inspected by shifting the inspection regions R1 and R2 in the Y direction. In FIG. 6, the inspection unit 10-I inspects the upper side of the paper from each broken line, and the inspection unit 10-II inspects the lower side of the paper from each broken line.
Moreover, in the said embodiment, 3 sets of test | inspection parts which perform the same test | inspection of the Y direction in one test | inspection part 10 were provided. Therefore, it is also possible to select an inspection unit according to the width of the glass substrate in the Y direction, and select and inspect the range in which the glass substrate P floats, for example, in units of the division stage 21.
Furthermore, in the said embodiment, although the air levitation | floating stage 20 was divided | segmented into the three division stages 21 in the Y direction, you may comprise by one stage.

上記の実施形態の効果をより理解するために、従来の構成と再度本発明の課題を詳細に説明する。
図8(a)は第1の実施形態に図2に相当する図で、従来の搬送部40を上部から見た概略構成を示した図である。図8(b)は第1の実施形態の図4(a)に相当する図で、本実施形態の下部精密浮上ステージ21Sdに相当する部分の概略構成図である。図8において、基本的に同じ機能又は構成を有するものは、図2又は図4(a)と同じ符号を付している。
In order to better understand the effects of the above embodiment, the conventional configuration and the problem of the present invention will be described in detail again.
FIG. 8A is a diagram corresponding to FIG. 2 in the first embodiment, and is a diagram showing a schematic configuration of the conventional transport unit 40 as viewed from above. FIG. 8B is a diagram corresponding to FIG. 4A of the first embodiment, and is a schematic configuration diagram of a portion corresponding to the lower precision levitation stage 21Sd of the present embodiment. In FIG. 8, components having basically the same function or configuration are denoted by the same reference numerals as those in FIG. 2 or FIG.

まず、大きく違う点は、従来は、上部精密浮上ステージ21Suがなく下部精密浮上ステージ21Sdのみで構成されている点である。そのために、図8(b)に示すよう、下部精密浮上ステージ21Sd上を圧縮、吸引による周波数的な力を受けて、下部精密浮上ステージ21Sdに端部においてガラス基板の歪が強調されたり弱められたりして、ガラス基板の先端部Ptまたは後端部PBで跳ね上がり(上昇)や垂れ下がり(下降)が発生しやすい。しかしながら、歪の少ないガラス基板では下部精密浮上ステージ21Sdのみで構成してもよい。   First, the major difference is that, conventionally, there is no upper precision levitation stage 21Su and only the lower precision levitation stage 21Sd is configured. Therefore, as shown in FIG. 8 (b), the distortion of the glass substrate is emphasized or weakened at the end of the lower precision levitation stage 21Sd by receiving a frequency force due to compression and suction on the lower precision levitation stage 21Sd. In other words, the glass substrate is likely to jump (rise) or sag (fall) at the front end portion Pt or the rear end portion PB. However, a glass substrate with less distortion may be configured with only the lower precision levitation stage 21Sd.

一方、本実施形態では、図4(b)に示すように、ガラス基板Pを上下から押さえ込む矯正力によって検査領域R1、R2に達してもガラス基板Pの先端部Pt及び後端部Pb跳ね上がり(上昇)や垂れ下がり(下降)が生じることなく、エア浮上ステージ20に安定して平行にガラス基板Pを搬送することができる。特に、部精密浮上ステージ21Sdと上部精密浮上ステージ21Suの噴出口PA及び吸引口PVは互いにずらして配置されているので、矯正力の主因であるガラス基板Pの上下に発生するガラス基板Pに平行な流れをより安定して生じさせることで、ガラス基板Pをより安定して搬送できる。   On the other hand, in the present embodiment, as shown in FIG. 4B, even if the inspection regions R1 and R2 are reached by the correction force for pressing the glass substrate P from above and below, the front end portion Pt and the rear end portion Pb of the glass substrate P jump up ( The glass substrate P can be transported stably and in parallel to the air levitation stage 20 without causing any rise or sag (fall). Particularly, since the jet outlet PA and the suction port PV of the partial precision levitation stage 21Sd and the upper precision levitation stage 21Su are shifted from each other, they are parallel to the glass substrate P generated above and below the glass substrate P, which is the main cause of the correction force. By generating a stable flow more stably, the glass substrate P can be transported more stably.

第2に違う点は、検査領域R1、R2は、従来は両端が開放された長方形であるのに対し、本実施形態では、矯正の範囲を広げる検査開口部を有し、特に矯正力の高い丸形または楕円或いは菱形または角形等の形状にすることにより、より安定してガラス基板Pを平行に搬送できる。   The second difference is that the inspection areas R1 and R2 are conventionally rectangular with both ends open, whereas in the present embodiment, the inspection areas have an inspection opening that widens the correction range, and the correction power is particularly high. The glass substrate P can be more stably transported in parallel by using a round shape, an ellipse shape, a rhombus shape, a square shape, or the like.

以上説明したように、第1の実施形態によれば、ガラス基板Pを検査開口部K1、K2においてガラス基板の端部の跳ね上がり(上昇)や垂れ下がり(下降)が発生することなく、少なくとも気泡や傷などの検査に必要な平坦性、例えば±50μm程度以内に収めることができる。また、ガラス基板Pの中央部においても、図4(a)に示すエアの横方向の流れとガラス基板Pの重量または剛性とのバランスにより確実に平坦性を保つことができる。この結果、ガラス基板の全面亘って平坦性を確保し、精度よく検査できる。   As described above, according to the first embodiment, the glass substrate P is not subjected to jumping (raising) or sagging (falling) at the end of the glass substrate at the inspection openings K1 and K2, and at least air bubbles and Flatness required for inspection of scratches, for example, within ± 50 μm can be achieved. Further, even in the central portion of the glass substrate P, the flatness can be reliably maintained by the balance between the lateral flow of air and the weight or rigidity of the glass substrate P shown in FIG. As a result, it is possible to ensure flatness over the entire surface of the glass substrate and to inspect with high accuracy.

図7は本発明の第2の実施形態を示す図である。第2の実施形態は、第1の実施形態で説明したガラス基板欠陥装置100を複数台(図7では2台100A、100B)直列に設けたガラス基板欠陥システム200を構成している。ガラス基板欠陥システム200は、複数台のガラス基板欠陥装置100A、100Bとそれらの間を接続する搬送部40とを有し、それぞれのガラス基板欠陥装置の検査領域R1、R2をY方向にずらして2台のガラス基板欠陥装置100A、100Bでガラス基板Pの全面を検査する。   FIG. 7 is a diagram showing a second embodiment of the present invention. The second embodiment constitutes a glass substrate defect system 200 in which a plurality of glass substrate defect devices 100 described in the first embodiment (two units 100A and 100B in FIG. 7) are provided in series. The glass substrate defect system 200 includes a plurality of glass substrate defect devices 100A and 100B and a transport unit 40 that connects them, and shifts inspection regions R1 and R2 of the respective glass substrate defect devices in the Y direction. The entire surface of the glass substrate P is inspected by the two glass substrate defect devices 100A and 100B.

さらに、図7に第2の実施形態の変形として、ガラス基板欠陥装置を偶数台設け、ガラス基板欠陥装置100Aは第1検査部10Aを有し、ガラス基板欠陥装置は第2検査部10Bを有するというように装置単位で検査内容が異なる構成としてしてもよい。   Furthermore, as a modification of the second embodiment in FIG. 7, an even number of glass substrate defect devices are provided, the glass substrate defect device 100A has a first inspection unit 10A, and the glass substrate defect device has a second inspection unit 10B. Thus, the inspection contents may be different for each apparatus.

以上説明した第2の実施形態においても、複数台のガラス基板欠陥装置で検査を分担することにより、第1の実施形態同様に、ガラス基板の全面亘って平坦性を確保し、精度よく検査できる。   Also in the second embodiment described above, by sharing the inspection with a plurality of glass substrate defect devices, the flatness can be ensured over the entire surface of the glass substrate and the inspection can be performed with high accuracy as in the first embodiment. .

10、10−I、10−II:検査部 10A:第1検査部
10B:第2検査部 11A、11B;撮像ユニット
12A1,12A2、12B:ラインCCD(撮像手段)
13A、13B;受光レンズ 14A:偏光ビームスプリッタ
16A、16B:光源ユニット 17A;レーザ光源
18A:ミラー 19A:シリンドリカルレンズ
20:エア浮上ステージ 21:分割ステージ
21S:精密浮上ステージ 21Sd:下部精密浮上ステージ
21Su、21Su´:上部精密浮上ステージ
21H:高浮上部ステージ 30:駆動部
31:リニアガイド 32:リニアアクチュエータ
33:グリッパ 34:リニアスケール
40:搬送部 50:エア供給吸気部
51:圧搾エア供給源 52:真空供給源
60:全体制御部
100、100A、100B:ガラス基板欠陥装置
K1d、K2d、K1u、K2u:検査開口部
P:ガラス基板 PA、PA´:圧搾エアの噴出口
PV:エアの吸引口 Pb:ガラス基板の後端部
Pt:ガラス基板の先端部 R1、R2:検査領域。
10, 10-I, 10-II: Inspection unit 10A: First inspection unit 10B: Second inspection unit 11A, 11B; Imaging units 12A1, 12A2, 12B: Line CCD (imaging means)
13A, 13B; Light receiving lens 14A: Polarizing beam splitter 16A, 16B: Light source unit 17A; Laser light source 18A: Mirror 19A: Cylindrical lens 20: Air levitation stage 21: Split stage 21S: Precision levitation stage 21Sd: Lower precision levitation stage 21Su, 21Su ': Upper precision levitation stage 21H: High levitation upper stage 30: Drive unit 31: Linear guide 32: Linear actuator 33: Gripper 34: Linear scale 40: Conveying unit 50: Air supply intake unit 51: Compressed air supply source 52: Vacuum supply source 60: Overall control unit 100, 100A, 100B: Glass substrate defect device K1d, K2d, K1u, K2u: Inspection opening P: Glass substrate PA, PA ′: Pressurized air outlet PV: Air suction port Pb : Rear end of glass substrate Pt: tip portion of glass substrate R1, R2: inspection region.

Claims (11)

ガラス基板を保持し搬送するステージ上でガラス基板をエアで浮上させるエア浮上手段を有するエア浮上装置と、前記エア浮上手段がない検査領域に前記ガラス基板を搬送する搬送装置と、前記検査領域において前記ガラス基板を撮像し検査する光学式検査装置とを有するガラス基板欠陥検査装置において、
前記エア浮上装置は、前記検査領域の周囲において、前記ガラス基板を挟んで前記エア浮上手段の反対側から前記ガラス基板をエアで挟み込むエア挟込手段を有することを特徴とするガラス基板欠陥検査装置。
In the inspection area, an air levitation apparatus having an air levitation means for levitating the glass substrate with air on a stage for holding and conveying the glass substrate, a conveyance apparatus for conveying the glass substrate to an inspection area without the air levitation means, and In a glass substrate defect inspection apparatus having an optical inspection apparatus that images and inspects the glass substrate,
The air levitation device has air nip means for sandwiching the glass substrate with air from the opposite side of the air levitation means across the glass substrate around the inspection area. .
前記エア浮上手段は、前記検査領域の周囲において前記エアを噴出しガラス基板を浮上させる噴出口と、エアを吸引しガラス基板を前記ステージ側に引込む吸引口とを交互にマトリックス状に配置していることを特徴とする請求項1に記載のガラス基板欠陥検査装置。   The air levitation means alternately arranges a jet port for blowing out the air around the inspection area and floating the glass substrate and a suction port for sucking air and drawing the glass substrate to the stage side in a matrix. The glass substrate defect inspection apparatus according to claim 1, wherein: 前記エア挟込手段は、前記エアを噴出しガラス基板Pを前記ステージ側に押付ける噴出口と、前記エアを吸引し前記ガラス基板を前記ステージ側から引き離す吸引口とを交互にマトリックス状に配置していることを特徴とする請求項2に記載のガラス基板欠陥検査装置。   The air sandwiching means alternately arranges jets for ejecting the air and pressing the glass substrate P against the stage side, and suction ports for sucking the air and pulling the glass substrate away from the stage side in a matrix. The glass substrate defect inspection apparatus according to claim 2, wherein: 前記エア浮上手段の噴出口と吸引口は、前記エア浮上手段の噴出口及び吸引口と同じ位置にならないようにずらして配置されていること特徴とする請求項3に記載のガラス基板欠陥検査装置。   The glass substrate defect inspection apparatus according to claim 3, wherein the air outlet and the suction port of the air levitation means are arranged so as not to be at the same position as the air outlet and the suction port of the air levitation means. . 前記エア浮上手段と前記エア挟込手段は前記検査をするための検査開口部を有し、前記開口部の形状は、丸形又は楕円或は菱形又は角形の形状を有していることを特徴とする請求項1に記載のガラス基板欠陥検査装置。   The air levitation means and the air sandwiching means have an inspection opening for performing the inspection, and the shape of the opening has a round shape, an oval shape, a rhombus shape, or a square shape. The glass substrate defect inspection apparatus according to claim 1. 前記エア挟込手段は、前記検査をするための検査開口部と、前記ガラス基板の前記浮上手段の反対側面において、前記開口部に向ってあるいは前記開口部から、前記ガラス基板に平行なエアの流れを形成する手段とを有することを特徴とする請求項1に記載のガラス基板欠陥検査装置   The air sandwiching means has an inspection opening for performing the inspection and an air flow parallel to the glass substrate toward or from the opening on the opposite side of the floating means of the glass substrate. 2. A glass substrate defect inspection apparatus according to claim 1, further comprising means for forming a flow. 前記光学式検査装置は、前記ガラス基板の傷、汚れ、異物、前記ガラス基板表面のクレータ形状及び前記ガラス基板内部の気泡のうち少なくとも一つを検査する検査部を有することを特徴とする請求項1または2に記載のガラス基板欠陥検査装置。   The optical inspection apparatus includes an inspection unit that inspects at least one of scratches, dirt, foreign matter, a crater shape on the surface of the glass substrate, and bubbles inside the glass substrate. The glass substrate defect inspection apparatus according to 1 or 2. 前記検査部を前記搬送する方向にずらして複数設けたことを特徴とする請求項7に記載のガラス基板欠陥検査装置。   The glass substrate defect inspection apparatus according to claim 7, wherein a plurality of the inspection units are provided while being shifted in the conveying direction. ガラス基板をエアで浮上力を発生させて浮上させ、前記浮上力のない検査領域に搬送し、前記検査領域において前記ガラス基板を撮像し検査するガラス基板欠陥検査方法において、
前記検査領域の周囲において、前記浮上力を発生する前記ガラス基板面と反対側の面に前記ガラス基板をエアで挟み込む挟込力を発生させること特徴とするガラス基板欠陥検査方法。
In the glass substrate defect inspection method in which the glass substrate is lifted by generating a levitation force with air, transported to the inspection area without the levitation force, and imaging and inspecting the glass substrate in the inspection area.
A glass substrate defect inspection method characterized by generating a pinching force that sandwiches the glass substrate with air on a surface opposite to the glass substrate surface that generates the levitation force around the inspection region.
前記検査は前記ガラス基板の傷、汚れ、異物、前記ガラス基板表面のクレータ形状及び前記ガラス基板内部の気泡のうち少なくとも一つを検査すること特徴とする請求項9に記載のガラス基板欠陥検査方法。   10. The glass substrate defect inspection method according to claim 9, wherein the inspection is performed by inspecting at least one of a scratch, a dirt, a foreign matter, a crater shape on the surface of the glass substrate, and a bubble inside the glass substrate. . 請求項1乃至8のいずれかに記載の複数のガラス基板欠陥検査装置と、前記ガラス基板を前記複数のガラス基板欠陥検査装置間を搬送させる搬送装置とを有し、前記複数のガラス基板欠陥検査装置のうち少なくとも2台は、前記ガラス基板において前記搬送する方向と垂直方向に互いにずれた前記検査領域を検査することを特徴とするガラス基板欠陥検査システム。   A plurality of glass substrate defect inspection apparatuses according to any one of claims 1 to 8, and a transfer device that conveys the glass substrate between the plurality of glass substrate defect inspection apparatuses, and the plurality of glass substrate defect inspections. At least two of the apparatuses inspect the inspection areas shifted from each other in the direction perpendicular to the transport direction in the glass substrate.
JP2010248484A 2010-11-05 2010-11-05 Glass substrate defect inspection device and glass substrate defect inspection method and glass substrate defect inspection system Pending JP2012096920A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010248484A JP2012096920A (en) 2010-11-05 2010-11-05 Glass substrate defect inspection device and glass substrate defect inspection method and glass substrate defect inspection system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010248484A JP2012096920A (en) 2010-11-05 2010-11-05 Glass substrate defect inspection device and glass substrate defect inspection method and glass substrate defect inspection system

Publications (1)

Publication Number Publication Date
JP2012096920A true JP2012096920A (en) 2012-05-24

Family

ID=46389293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010248484A Pending JP2012096920A (en) 2010-11-05 2010-11-05 Glass substrate defect inspection device and glass substrate defect inspection method and glass substrate defect inspection system

Country Status (1)

Country Link
JP (1) JP2012096920A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101543882B1 (en) 2013-12-17 2015-08-11 세메스 주식회사 Apparatus for transferring substrate and apparatus for inspecting substrate including the same
JP2015207791A (en) * 2015-08-07 2015-11-19 AvanStrate株式会社 Glass substrate transfer apparatus and glass substrate manufacturing method
JP2016183866A (en) * 2015-03-25 2016-10-20 AvanStrate株式会社 Manufacturing method for glass substrate, and manufacturing apparatus for glass substrate
JP2018108892A (en) * 2016-12-28 2018-07-12 芝浦メカトロニクス株式会社 Floating carrier device and circuit board processing device
KR20240008591A (en) * 2022-07-12 2024-01-19 이만홍 Conveying Plate For Inkjet Jetting Of Display Panel
WO2024134777A1 (en) * 2022-12-20 2024-06-27 Jswアクティナシステム株式会社 Observation device, observation method, and method for manufacturing semiconductor device
CN118992555A (en) * 2024-08-29 2024-11-22 蚌埠中光电科技有限公司 Glass substrate production line and production method

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09257642A (en) * 1996-03-18 1997-10-03 Hitachi Electron Eng Co Ltd Glass substrate defect type determination method
JP2005132626A (en) * 2003-10-06 2005-05-26 Sumitomo Heavy Ind Ltd Conveying device, coating system, and inspection system
JP2006188313A (en) * 2005-01-04 2006-07-20 Olympus Corp Substrate conveying device and substrate inspection device
JP2007051001A (en) * 2005-08-19 2007-03-01 Nippon Sekkei Kogyo:Kk Method and apparatus for conveying thin sheet-like material
JP2007256173A (en) * 2006-03-24 2007-10-04 Olympus Corp Appearance inspection device
JP2008076170A (en) * 2006-09-20 2008-04-03 Olympus Corp Substrate inspection device
JP2009051654A (en) * 2007-08-29 2009-03-12 Toppan Printing Co Ltd Substrate transfer device and substrate inspection device
JP2009073646A (en) * 2007-09-21 2009-04-09 Myotoku Ltd Floating method and floating unit
JP2009085865A (en) * 2007-10-02 2009-04-23 Olympus Corp Substrate inspection device
JP2009229301A (en) * 2008-03-24 2009-10-08 Olympus Corp Substrate inspection apparatus

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09257642A (en) * 1996-03-18 1997-10-03 Hitachi Electron Eng Co Ltd Glass substrate defect type determination method
JP2005132626A (en) * 2003-10-06 2005-05-26 Sumitomo Heavy Ind Ltd Conveying device, coating system, and inspection system
JP2006188313A (en) * 2005-01-04 2006-07-20 Olympus Corp Substrate conveying device and substrate inspection device
JP2007051001A (en) * 2005-08-19 2007-03-01 Nippon Sekkei Kogyo:Kk Method and apparatus for conveying thin sheet-like material
JP2007256173A (en) * 2006-03-24 2007-10-04 Olympus Corp Appearance inspection device
JP2008076170A (en) * 2006-09-20 2008-04-03 Olympus Corp Substrate inspection device
JP2009051654A (en) * 2007-08-29 2009-03-12 Toppan Printing Co Ltd Substrate transfer device and substrate inspection device
JP2009073646A (en) * 2007-09-21 2009-04-09 Myotoku Ltd Floating method and floating unit
JP2009085865A (en) * 2007-10-02 2009-04-23 Olympus Corp Substrate inspection device
JP2009229301A (en) * 2008-03-24 2009-10-08 Olympus Corp Substrate inspection apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101543882B1 (en) 2013-12-17 2015-08-11 세메스 주식회사 Apparatus for transferring substrate and apparatus for inspecting substrate including the same
JP2016183866A (en) * 2015-03-25 2016-10-20 AvanStrate株式会社 Manufacturing method for glass substrate, and manufacturing apparatus for glass substrate
JP2015207791A (en) * 2015-08-07 2015-11-19 AvanStrate株式会社 Glass substrate transfer apparatus and glass substrate manufacturing method
JP2018108892A (en) * 2016-12-28 2018-07-12 芝浦メカトロニクス株式会社 Floating carrier device and circuit board processing device
KR20240008591A (en) * 2022-07-12 2024-01-19 이만홍 Conveying Plate For Inkjet Jetting Of Display Panel
WO2024134777A1 (en) * 2022-12-20 2024-06-27 Jswアクティナシステム株式会社 Observation device, observation method, and method for manufacturing semiconductor device
CN118992555A (en) * 2024-08-29 2024-11-22 蚌埠中光电科技有限公司 Glass substrate production line and production method

Similar Documents

Publication Publication Date Title
JP2012096920A (en) Glass substrate defect inspection device and glass substrate defect inspection method and glass substrate defect inspection system
JP6529250B2 (en) Optical display panel manufacturing method and optical display panel manufacturing system
JP4390848B2 (en) Optical member laminating method and apparatus using the same
JP2011242753A5 (en)
JP2012073036A (en) Glass substrate defect checkup device and glass substrate defect checkup method
JP2009208963A (en) Conveyor reversing device, and inspection device using the same
KR102623714B1 (en) Manufacturing method of glass plate
TWI637928B (en) Glass plate manufacturing method and glass plate manufacturing device
KR102189770B1 (en) Bonding apparatus, bonding method, optical-display-device production system, and optical-display-device production method
CN102681242B (en) Method for continuously manufacturing liquid crystal display panel, inspection device and method
TW201625087A (en) Method of separating sheet for circuit substrate and device of separating sheet for circuit substrate
JP2015105832A (en) Transport inspection device and transport inspection method for optical member bonding panel
JP2019109532A (en) Method for manufacturing optical display panel and system for manufacturing optical display panel
JP2014055932A (en) Foreign matter inspection device of interleaving paper for glass substrate
CN110018582B (en) Optical display panel continuous inspection method and apparatus, continuous manufacturing method and system
JP2008063130A5 (en)
JP2010127910A (en) Film inspecting device, translucent film manufacturing apparatus equipped therewith, film inspecting method, and translucent film manufacturing method using the same
KR100920222B1 (en) Film inspection device and film inspection method
JP5618209B2 (en) Glass plate end face imaging device and imaging method thereof
JP2015049350A (en) Method for manufacturing optical member laminate
JP2008076170A (en) Substrate inspection device
JP2012127738A (en) Substrate defect checkup system and substrate defect checkup method, and conveying apparatus
EP2383213A8 (en) Inspection system for inspecting the quality of printed sheets
JP5776940B2 (en) Glass plate edge inspection equipment
CN117341341A (en) Diffusion plate laminating production method and laminating device

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130730

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140311

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140313

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20140701