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JP2012073036A - Glass substrate defect checkup device and glass substrate defect checkup method - Google Patents

Glass substrate defect checkup device and glass substrate defect checkup method Download PDF

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JP2012073036A
JP2012073036A JP2010215930A JP2010215930A JP2012073036A JP 2012073036 A JP2012073036 A JP 2012073036A JP 2010215930 A JP2010215930 A JP 2010215930A JP 2010215930 A JP2010215930 A JP 2010215930A JP 2012073036 A JP2012073036 A JP 2012073036A
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glass substrate
inspection
defect inspection
imaging
displacement
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Masaki Araki
正樹 荒木
Shuichi Hiroi
修一 廣井
Kohei Kinugawa
耕平 衣川
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Hitachi High Tech Corp
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Hitachi High Tech Corp
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Priority to KR1020110083274A priority patent/KR20120031872A/en
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • GPHYSICS
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    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
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    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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    • GPHYSICS
    • G01MEASURING; TESTING
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    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306Details
    • G02F1/1309Repairing; Testing

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Abstract

【課題】
本発明は、ガラス基板の搬送方向の平坦性を確保し、精度よく検査できるガラス基板欠陥検査装置またはガラス基板欠陥検査方法を提供することにある。
【解決手段】
本発明は、ガラス基板をエアで浮上力を発生させて浮上させ、前記浮上力のない検査領域に搬送し、前記検査領域において前記ガラス基板を撮像し検査するガラス基板欠陥検査装置または検査方法において、前記検査領域における前記基板ガラスの搬送方向の端部の跳ね上がりによる変位量を低減し、前記検査を行なうことを特徴とする。また、前記低減は前記検査領域における前記ガラス基板の前記変位量を測定し、前記変位量測定結果に基づいて、前記撮像する撮像手段を移動させることを特徴とする。
【選択図】図5
【Task】
An object of the present invention is to provide a glass substrate defect inspection apparatus or a glass substrate defect inspection method capable of ensuring flatness in the conveyance direction of a glass substrate and inspecting with high accuracy.
[Solution]
The present invention relates to a glass substrate defect inspection apparatus or inspection method in which a glass substrate is levitated by generating a levitating force with air, transported to the inspection region without the levitating force, and imaging and inspecting the glass substrate in the inspection region. In the inspection area, the amount of displacement due to the jumping of the end portion of the substrate glass in the transport direction is reduced, and the inspection is performed. Further, the reduction is characterized in that the displacement amount of the glass substrate in the inspection region is measured, and the imaging means for imaging is moved based on the displacement amount measurement result.
[Selection] Figure 5

Description

本発明は、ガラス基板欠陥検査装置及びガラス基板欠陥検査方法に係わり、精度よく検査できるガラス基板欠陥検査装置及びガラス基板欠陥検査方法に関する。   The present invention relates to a glass substrate defect inspection apparatus and a glass substrate defect inspection method, and more particularly to a glass substrate defect inspection apparatus and a glass substrate defect inspection method that can be inspected with high accuracy.

液晶表示パネルや太陽電池パネルの製造は、フォトリソグラフィ技術等によりガラス基板上にパターンを形成して行なわれる。その際に、ガラス基板の表面の傷や異物等の欠陥が存在すると、パターンが良好に形成されず、不良の原因となる。このため、従来から、欠陥検査装置を用いてガラス基板の表面の傷や異物等の欠陥検査が行なわれている。   Manufacture of a liquid crystal display panel and a solar cell panel is performed by forming a pattern on a glass substrate by a photolithography technique or the like. At that time, if there are defects such as scratches or foreign matter on the surface of the glass substrate, the pattern is not formed satisfactorily, causing a defect. For this reason, conventionally, a defect inspection apparatus has been used to inspect defects such as scratches and foreign matter on the surface of a glass substrate.

欠陥検査を実施するためには、ガラス基板を欠陥検査装置に搬送し検査する必要がある。従来は、ロボットやローラコンベアなどが用いられているが、搬送の際にロボットの吸着パット、ローラコンベアのローラに使用されている材料がガラス基板に付着したり、傷や異物の欠陥の要因になる。このために、ガラス基板を非接触にて搬送する技術として、ガラス基板の端部を吸着保持し、エア浮上させてガラス基板を搬送する構成が、特許文献1に記載されている。また、ガラス基板上の傷または異物の検査方法が特許文献2に記載されている。   In order to carry out the defect inspection, it is necessary to transport the glass substrate to a defect inspection apparatus for inspection. Conventionally, robots, roller conveyors, etc. are used, but the materials used for the robot's suction pad and rollers of the roller conveyor adhere to the glass substrate during transport, and cause damage and foreign matter defects. Become. For this purpose, Patent Document 1 discloses a configuration in which an end portion of a glass substrate is sucked and held and air-lifted to convey the glass substrate as a technique for conveying the glass substrate in a non-contact manner. Patent Document 2 describes a method for inspecting scratches or foreign matters on a glass substrate.

特開2006−188313号公報JP 2006-188313 A 特開平9−257642号公報Japanese Patent Laid-Open No. 9-257642

前述したエア浮上でガラス基板を搬送する方式では、搬送するときの慣性によりガラス基板の先端部の跳ね上がり等の発生により、搬送方向の平坦性が失われ、検査が精度よくできないという課題がある。この課題は、昨今のガラス基板の薄型に伴いさらに顕著になってきている。   In the above-described method of transporting a glass substrate by air levitation, there is a problem that the flatness in the transport direction is lost due to the occurrence of jumping of the front end portion of the glass substrate due to inertia during transport, and inspection cannot be performed with high accuracy. This problem has become more prominent with the recent thinness of glass substrates.

特許文献1には、ガラス基板を搬送し、停止して処理することが開示しているが、搬送中に検査するときの上記課題についての認識はなく、まして課題に対する解決策についての開示もない。また、特許文献2についても、光学式の検査装置を開示されているが、搬送中に検査することの上記課題についての認識もなく、解決策に対する開示もない。   Patent Document 1 discloses that a glass substrate is transported, stopped, and processed, but there is no recognition of the above problems when inspecting during transport, and there is no disclosure of solutions to the problems. . Also, Patent Document 2 discloses an optical inspection device, but there is no recognition of the above-mentioned problem of inspection during conveyance, and there is no disclosure of a solution.

本発明は、上記の課題を鑑みてなされたものであり、ガラス基板の搬送方向の平坦性を確保し、精度よく検査できるガラス基板欠陥検査装置またはガラス基板欠陥検査方法を提供することにある。   This invention is made | formed in view of said subject, and it is providing the glass substrate defect inspection apparatus or the glass substrate defect inspection method which can ensure the flatness of the conveyance direction of a glass substrate, and can test | inspect accurately.

本発明は、上記の目的を達成するために、少なくとも下記の特徴を有する。
本発明は、ガラス基板をエアで浮上力を発生させて浮上させ、前記浮上力のない検査領域に搬送し、前記検査領域において前記ガラス基板を撮像し検査するガラス基板欠陥検査装置または検査方法において、前記検査領域における前記基板ガラスの搬送方向の端部の跳ね上がりによる変位量を低減し、前記検査を行なうことを第1の特徴とする。
In order to achieve the above object, the present invention has at least the following features.
The present invention relates to a glass substrate defect inspection apparatus or inspection method in which a glass substrate is levitated by generating a levitating force with air, transported to the inspection region without the levitating force, and imaging and inspecting the glass substrate in the inspection region. The first feature is that the inspection is performed by reducing the amount of displacement due to the jumping of the end portion in the transport direction of the substrate glass in the inspection region.

また、本発明は、前記低減は前記検査領域における前記ガラス基板の前記変位量を測定し、前記変位量測定結果に基づいて、前記撮像する撮像手段を移動させることを第2の特徴とする。
さらに、本発明は、前記検査領域おける前記ガラス基板の搬送速度の速度パターンを予め定め、前記予め定められた前記加速度に基づいて前記ガラス基板を検査することを第3の特徴とする。
According to a second aspect of the present invention, the reduction is to measure the amount of displacement of the glass substrate in the inspection region and to move the imaging means for imaging based on the displacement amount measurement result.
Furthermore, the present invention has a third feature that a speed pattern of the conveyance speed of the glass substrate in the inspection region is determined in advance, and the glass substrate is inspected based on the predetermined acceleration.

さらに、本発明は、前記ガラス基板内の気泡、前記ガラス基板に表面に存在する傷の少なくとも一方を検査することを第4の特徴とする。
また、本発明は、前記変位量測定手段は非接触式レーザ変位計であることを第5の特徴とする。
Furthermore, the present invention is characterized in that at least one of bubbles in the glass substrate and scratches present on the surface of the glass substrate are inspected.
The fifth feature of the present invention is that the displacement measuring means is a non-contact type laser displacement meter.

さらに、本発明は、前記検査は、前記ガラス基板に照明する照明手段を前記搬送する搬送装置の下部に、前記撮像する撮像手段を前記搬送手段の上部に設けたことを第6の特徴とする。   Furthermore, the present invention is characterized in that the inspection is characterized in that the illumination means for illuminating the glass substrate is provided at a lower part of the conveying device for conveying, and the imaging means for imaging is provided at the upper part of the conveying means. .

本発明によれば、ガラス基板の搬送方向の平坦性を確保し、精度よく検査できるガラス基板欠陥検査装置またはガラス基板欠陥検査方法を提供できる。   ADVANTAGE OF THE INVENTION According to this invention, the glass substrate defect inspection apparatus or the glass substrate defect inspection method which can ensure the flatness of the conveyance direction of a glass substrate and can test | inspect accurately can be provided.

ガラス基板欠陥装置の第1の実施形態を示すブロック図である。It is a block diagram which shows 1st Embodiment of a glass substrate defect apparatus. 本発明のガラス基板欠陥装置の第1の実施形態の搬送部を上部から見た概略構成を示した図である。It is the figure which showed schematic structure which looked at the conveyance part of 1st Embodiment of the glass substrate defect apparatus of this invention from the upper part. 精密浮上ステージと高浮上部ステージの構成を示した図である。It is the figure which showed the structure of the precision levitation stage and the high floating part stage. 精密ステージの端面からの位置おけるガラス基板の先端の変位量の測定結果を示した図である。It is the figure which showed the measurement result of the displacement amount of the front-end | tip of the glass substrate in the position from the end surface of a precision stage. 本発明のガラス基板欠陥装置の第1の実施形態の検査部の構成を示す図である。It is a figure which shows the structure of the test | inspection part of 1st Embodiment of the glass substrate defect apparatus of this invention. 1台のガラス基板検査装置においてガラス基板の平坦性を確保する本発明の第2の実施形態の制御方法を示す図である。It is a figure which shows the control method of the 2nd Embodiment of this invention which ensures the flatness of a glass substrate in one glass substrate test | inspection apparatus.

以下、図面に基づいて本発明のガラス基板欠陥装置の実施形態を説明する。
図1は、ガラス基板欠陥装置100の第1の実施形態を示すブロック図である。ガラス基板検査装置100は、大別して、ガラス基板Pを検査する検査部10と、エア浮上ステージ20とガラス基板Pを保持し浮かしながらエア浮上ステージ20上を搬送する駆動部30とを具備する搬送部40と、搬送部40に圧搾エアを供給する圧搾エア供給源51と空気を吸気する真空供給源52とを具備するエア供給吸気部50と、各部の状態を監視し、各部を制御する全体制御部60とを有する。
Hereinafter, an embodiment of a glass substrate defect apparatus of the present invention will be described based on the drawings.
FIG. 1 is a block diagram showing a first embodiment of a glass substrate defect apparatus 100. The glass substrate inspection apparatus 100 is broadly divided into an inspection unit 10 that inspects the glass substrate P, and a conveyance unit that includes an air levitation stage 20 and a drive unit 30 that conveys the air levitation stage 20 while holding and floating the glass substrate P. An air supply intake section 50 comprising a section 40, a compressed air supply source 51 that supplies compressed air to the transport section 40, and a vacuum supply source 52 that sucks air, and the whole that controls the state of each section And a control unit 60.

図2は、本発明の第1の実施形態の搬送部40を上部から見た概略構成を示した図である。エア浮上ステージ20は、搬送(X)方向と搬送(X)方向に垂直な方向Yに複数配列された長方形の分割ステージ21を有する。分割ステージ21は、両端部に設けられた精密浮上ステージ21Sとその間に設けられた高浮上部ステージ21Hとを有する。搬送(X)方向の分割ステージ21間のRは、後述する検査のための検査領域である。   FIG. 2 is a diagram illustrating a schematic configuration of the transport unit 40 according to the first embodiment of the present invention as viewed from above. The air levitation stage 20 includes a plurality of rectangular divided stages 21 arranged in a transport (X) direction and a direction Y perpendicular to the transport (X) direction. The split stage 21 has a precision levitation stage 21S provided at both ends and a high levitation stage 21H provided therebetween. R between the division stages 21 in the transport (X) direction is an inspection area for inspection described later.

駆動部30は、エア浮上ステージ20の搬送(X)方向に沿ってけられた設けられたリニアガイド31と、リニアガイド31に沿って走行するリニアアクチュエータ32と、リニアアクチュエータ32に固定されガラス基板Pを保持するグリッパ33と、リニアアクチュエータ32のリニアガイド31上(搬送(X)方向)の位置を検出するリニアスケール34とを有する。
図1に示す全体制御部60は、リニアスケール34の位置情報を読み込み、搬送速度やグリッパ33を制御する。
The drive unit 30 includes a linear guide 31 provided along the conveyance (X) direction of the air levitation stage 20, a linear actuator 32 that travels along the linear guide 31, and a glass substrate P that is fixed to the linear actuator 32. And a linear scale 34 for detecting the position of the linear actuator 32 on the linear guide 31 (in the conveyance (X) direction).
The overall control unit 60 shown in FIG. 1 reads the position information of the linear scale 34 and controls the conveyance speed and the gripper 33.

図3(a)は精密浮上ステージ21Sの構成を、図3(b)は高浮上部ステージ21Hの構成を示した図である。前述したように、検査は隣接する分割ステージ21間の幅40mm程度の検査領域Rで行われる。従って、精密浮上ステージ21は、検査領域Rを挟んでガラス基板Pの平坦度を保つようにガラス基板Pを浮上させる。そのために、精密浮上ステージ21Sは、図3(a)に示すように、ガラス基板Pを浮上させるために圧搾エアを噴出す噴出口PA(白丸)とエアを吸引しガラス基板を吸着させる吸引口PV(黒丸)と交互に配置している。そして、圧搾エア供給源51と真空供給源52とを制御し、ガラス基板Pの平坦度を得るように両者のバランスを取っている。一方、高浮上部ステージ21Hは、図3(b)に示すように、ガラス基板Pを浮上させる圧搾エアを噴出す噴出口PAのみを有し、ガラス基板Pを安定して浮上し搬送速度を低下させる負荷とならないようにしている。   3A shows the configuration of the precision levitation stage 21S, and FIG. 3B shows the configuration of the high levitation upper stage 21H. As described above, the inspection is performed in the inspection region R having a width of about 40 mm between the adjacent divided stages 21. Therefore, the precision levitation stage 21 levitates the glass substrate P so that the flatness of the glass substrate P is maintained across the inspection region R. Therefore, as shown in FIG. 3 (a), the precision levitation stage 21S has a spout PA (white circle) that ejects compressed air to float the glass substrate P and a suction port that sucks the air and adsorbs the glass substrate. Alternating with PV (black circles). And the compressed air supply source 51 and the vacuum supply source 52 are controlled, and both are balanced so that the flatness of the glass substrate P may be obtained. On the other hand, as shown in FIG. 3 (b), the high flying height stage 21H has only a spout PA that ejects compressed air for levitating the glass substrate P, and stably floats the glass substrate P to increase the conveyance speed. The load is not reduced.

しかしながら、図4に示すように、様々な要因によりガラス基板Pの平坦度が崩れてしまう。
図4は、精密ステージ21Sの端面からのガラス基板Pの先端Pt(図2参照)の変位量(1mm/1目盛)の測定結果を示した図である。図4(a)は880mm×680mmの面積、厚さ0.7mmのガラス基板の測定結果を、図(b)は同じ面積で厚さ0.4mmのガラス基板の測定結果を示した図である。縦軸の変位量の一目盛は1mmであり、精密ステージ21Sの端面の位置での測定結果を基準として示している。また、後述するように3箇所の位置での測定結果を示す為にチャート上の位置をずらして示しており、絶対値は意味はない。測定は非接触式レーザ変位計で行い、測定条件はガラス基板の搬送速度が250mm/s、サンプリングタイムが1msである。測定位置は、搬送方向に垂直なY方向のガラス基板の端部Ps(図2参照)から10mm離れた位置Ia、及びその10mmの位置からさらに310mm及び610mm離れたIb,Icの計3k所である。
However, as shown in FIG. 4, the flatness of the glass substrate P collapses due to various factors.
FIG. 4 is a diagram showing the measurement result of the displacement amount (1 mm / 1 scale) of the tip Pt (see FIG. 2) of the glass substrate P from the end face of the precision stage 21S. FIG. 4A shows the measurement result of a glass substrate having an area of 880 mm × 680 mm and a thickness of 0.7 mm, and FIG. 4B shows the measurement result of a glass substrate having the same area and a thickness of 0.4 mm. . The scale of the amount of displacement on the vertical axis is 1 mm, and the measurement result at the position of the end face of the precision stage 21S is shown as a reference. Further, as will be described later, in order to show the measurement results at three positions, the positions on the chart are shifted and the absolute value is meaningless. The measurement is performed with a non-contact laser displacement meter, and the measurement conditions are a glass substrate transport speed of 250 mm / s and a sampling time of 1 ms. The measurement position is a position Ia 10 mm away from the end Ps (see FIG. 2) of the glass substrate in the Y direction perpendicular to the transport direction, and Ib and Ic further 3 mm away from the 10 mm position at a total of 3 k locations. is there.

図4から分るように、一般的な傾向として次の3点が挙げられる。第1に、中央部(Ib)では変位量が大きく、Y方向の端部(Ia、Ic)では比較的小さい。第2に、中央部(1b)で精密ステージ21Sの端面から10mm前後の位置で変位量の変化が大きい。第3に、ガラス基板の厚さが薄いほど変位量が大きい。図4(b)に示す、厚さ0.4mmのガラスでは、最大変位量は100μmである。   As can be seen from FIG. 4, there are the following three points as general trends. First, the amount of displacement is large at the central portion (Ib) and relatively small at the end portions (Ia, Ic) in the Y direction. Second, the change in displacement is large at a position about 10 mm from the end face of the precision stage 21S in the central portion (1b). Third, the thinner the glass substrate, the greater the displacement. In the glass having a thickness of 0.4 mm shown in FIG. 4B, the maximum displacement is 100 μm.

以後、本発明の実施形態として説明する気泡や傷を検査するガラス基板欠陥装置では、許容平坦度は、例えば±50μm程度であり、その範囲に収める必要がある。   Hereinafter, in the glass substrate defect apparatus for inspecting bubbles and scratches described as an embodiment of the present invention, the allowable flatness is, for example, about ± 50 μm and needs to be within that range.

図5は、これを実現できる本発明のガラス基板欠陥装置の第1の実施形態の検査部10の構成を示す図である。本実施形態では、検査する撮像手段としてラインセンサを用い、検査位置におけるガラス基板Pの跳ね上がり量(変位量)を測定し、その変位量に基づいて、常に焦点が合うように撮像手段の位置を追従させる追従制御を行い、実際は平坦ではないが、検査からみて距離を一定に保つという意味で平坦度を確保する。   FIG. 5 is a diagram showing the configuration of the inspection unit 10 of the first embodiment of the glass substrate defect apparatus of the present invention that can realize this. In the present embodiment, a line sensor is used as the imaging means to be inspected, the amount of jump (displacement) of the glass substrate P at the inspection position is measured, and the position of the imaging means is always adjusted based on the amount of displacement so as to be in focus. Follow-up control to follow is performed, and although it is not actually flat, flatness is ensured in the sense that the distance is kept constant from the viewpoint of inspection.

検査部10はガラス基板Pの傷を検査する傷検査部10Aと、気泡を検査する気泡検査部10Bとを有する。   The inspection unit 10 includes a flaw inspection unit 10A that inspects a flaw on the glass substrate P and a bubble inspection unit 10B that inspects bubbles.

傷検査部10Aは、撮像ユニット11Aと光源ユニット16Aとに分かれる。撮像ユニット11Aは、ガラス基板Pの表面または裏面から散乱光を受光レンズ13Aを介して検出するラインセンサ12Aと、撮像ユニット11Aの筐体に固定されガラス基板Pとの変位量Gを測定する距離検出センサ14Aと、距離検出センサ14Aの検出結果に基づいてラインセンサ12Aと受光レンズ13Aとを具備する撮像部を昇降する撮像部駆動部15Aとを有する。本実施形態では、所定のライン状の範囲を撮像するラインセンサ12AとしてはラインCCDを用い、距離検出センサ14Aとしては非接触式レーザ変位計を用いる。
また、撮像部駆動部15Aは、撮像ユニット11Aの筐体に固定されモータ15Aaと、駆動モータ15Aaで回転するボールジョイント15Abと、ボールジョイント15Abを撮像ユニット13の筐体に固定する両端に設けられた支持部15Adと、撮像部に固定されボールジョイント15Abの回転により上下に移動するナット15Acとを有する。
The wound inspection unit 10A is divided into an imaging unit 11A and a light source unit 16A. The imaging unit 11A measures the amount of displacement G between the line sensor 12A that detects scattered light from the front or back surface of the glass substrate P via the light receiving lens 13A and the glass substrate P that is fixed to the housing of the imaging unit 11A. 14 A of detection sensors, and the imaging part drive part 15A which raises / lowers the imaging part which comprises the line sensor 12A and the light reception lens 13A based on the detection result of the distance detection sensor 14A. In the present embodiment, a line CCD is used as the line sensor 12A for imaging a predetermined line-shaped range, and a non-contact type laser displacement meter is used as the distance detection sensor 14A.
The imaging unit driving unit 15A is provided at both ends of the motor 15Aa fixed to the housing of the imaging unit 11A, the ball joint 15Ab rotated by the driving motor 15Aa, and the ball joint 15Ab fixed to the housing of the imaging unit 13. And a nut 15Ac that is fixed to the imaging unit and moves up and down by the rotation of the ball joint 15Ab.

一方、光源ユニット16Aは、10μm程度の傷を検出するために、レーザ光源17Aと、レーザ光を斜方照射するためのミラー18Aと集光レンズ19Aとを有する。
これ等の構成によって、少なくとも、ガラス基板Pの先端部Ptb(図2に示す先端Ptから一定の範囲)が検査領域Rに来たときの跳ね(浮き)上がりなどの変位に撮像部を追従させることによって、確実に傷を検出できる。勿論、先端部Ptbだけでなく他の部分において同様に変位量検出し、撮像部を制御してもよい。特に、ガラス基板の後端部Pbb(図2に示すガラスの後端Pbから一定の範囲)示すにおいても平坦性は失われる傾向の為、その効果は高い。
On the other hand, the light source unit 16A includes a laser light source 17A, a mirror 18A for obliquely irradiating laser light, and a condenser lens 19A in order to detect a scratch of about 10 μm.
With these configurations, at least the distal end portion Ptb of the glass substrate P (a certain range from the distal end Pt shown in FIG. 2) causes the imaging unit to follow displacement such as jumping (lifting) when the inspection region R is reached. By doing so, it is possible to reliably detect a flaw. Of course, not only the front end portion Ptb but also other portions may be similarly detected to control the imaging unit. In particular, since the flatness tends to be lost in the rear end portion Pbb of the glass substrate (a certain range from the rear end Pb of the glass shown in FIG. 2), the effect is high.

一方、気泡検査部10Bは基本的には傷検査部10Aと同じ構成を有する。気泡検査部10Bは撮像手段12Bによる撮像結果の輝度ムラにより気泡を検出する。そのために、光源17Bとして広範囲に照射できるLEDや蛍光灯を用いる。その他の構成は同じであり、撮像手段もガラス基板Pに移動に伴い効率よく撮像するために、ラインCCDを用いている。   On the other hand, the bubble inspection unit 10B basically has the same configuration as the flaw inspection unit 10A. The bubble inspection unit 10B detects bubbles based on luminance unevenness of the imaging result obtained by the imaging unit 12B. Therefore, an LED or a fluorescent lamp that can irradiate a wide range is used as the light source 17B. Other configurations are the same, and the image pickup means uses a line CCD in order to efficiently take an image as it moves to the glass substrate P.

従って、基本検査部10Bにおいても、ガラス基板Pの先端部Ptbが検査領域Rに来たときの跳ね上がりなどの変位に撮像部を追従させることによって、確実に気泡を検出できる。   Accordingly, even in the basic inspection unit 10B, air bubbles can be reliably detected by causing the imaging unit to follow a displacement such as a jump when the tip portion Ptb of the glass substrate P comes into the inspection region R.

上記の実施形態では、傷検査部10Aと気泡検査部10Bを異なる検査領域に設けたが、同じ検査領域に隣接して設けてもよい。
また、上記に実施形態では、搬送(X)方向と垂直(Y)な方向に、検査部10を1箇所設けたが複数個所に設けてもよい。図4の測定結果によれば、ガラス基板Pの搬送方向に平行な端部においては平坦性の喪失少ないので、平坦性の喪失度合いの大きい中央部側に検査部10を多く配置してもよい。
In the above embodiment, the flaw inspection unit 10A and the bubble inspection unit 10B are provided in different inspection regions, but may be provided adjacent to the same inspection region.
In the above-described embodiment, one inspection unit 10 is provided in the direction perpendicular to the transport (X) direction (Y), but may be provided at a plurality of locations. According to the measurement result of FIG. 4, since there is little loss of flatness at the end portion parallel to the conveyance direction of the glass substrate P, a large number of inspection units 10 may be arranged on the center side where the degree of flatness loss is large. .

上記実施形態では、複数の検査装置または処理装置とラインを構成した場合を例に説明した。勿論、1台の検査装置においても上記の実施形態は有効である。図6は、1台のガラス欠陥検査装置において、ガラス基板の平坦性を確保する本発明の第2の実施形態の制御方法を示す図である。一台のガラス欠陥検査装置では、ガラス基板をステージに載置後、加速して検査して減速する。この加速、減速がガラス基板P、特に先端部Ptb、後端部Pbbでの平坦性を崩す。図6(a)はガラス基板Pの先端Ptが検査領域Rに入る前(時間Tt)に急激に加速して所定の速度にして一定のタイミングで撮像し、ガラス基板Pの後端部Pbbが検査領域Rを通過した後(時間Tb)に、減速する場合を示す。図6(b)は、加速減速時間を緩和して、ガラス基板Pの先端Ptが検査領域Rに入った後、或いは検査領域Rを通過した後までの間で加速し、所定の速度を得、その後、ガラス基板Pの後端部Pbbが検査領域Rに入る前、或いは検査領域Rを通過した後の間で減速しながら検査する場合を示す。図6(b)の場合は検査中に搬送速度が変化することから、図2に示すリニアススケール34により位置を検出して一定の距離間隔で検査する。   In the above embodiment, the case where a line is configured with a plurality of inspection apparatuses or processing apparatuses has been described as an example. Of course, the above-described embodiment is effective even with one inspection apparatus. FIG. 6 is a diagram showing a control method according to the second embodiment of the present invention for ensuring the flatness of the glass substrate in one glass defect inspection apparatus. In one glass defect inspection apparatus, after placing a glass substrate on a stage, it accelerates, inspects, and decelerates. This acceleration and deceleration breaks the flatness of the glass substrate P, particularly the front end portion Ptb and the rear end portion Pbb. FIG. 6A shows that the glass substrate P is accelerated at a predetermined speed before the front end Pt of the glass substrate P enters the inspection region R (time Tt) and is imaged at a predetermined timing, and the rear end portion Pbb of the glass substrate P is detected. A case where the vehicle is decelerated after passing through the inspection region R (time Tb) is shown. In FIG. 6B, the acceleration / deceleration time is relaxed and the glass substrate P is accelerated until the tip Pt of the glass substrate P enters the inspection region R or passes through the inspection region R to obtain a predetermined speed. Then, the case where the inspection is performed while decelerating before the rear end portion Pbb of the glass substrate P enters the inspection region R or after passing through the inspection region R is shown. In the case of FIG. 6B, since the conveyance speed changes during the inspection, the position is detected by the linear scale 34 shown in FIG.

図6(c)、図6(d)は、それぞれ図6(a)、図6(b)に対する、検査時のガラス基板Pの跳ね上がり量、即ち変位量を示す。加速度が大きいとガラス基板Pの先端部Ptbと後端部Pbbの跳ね上がり大きくなる。ガラス基板Pの厚さにもよるが、図6(c)、図6(d)から分るように、一般的に、加速度が大きいとガラス基板Pの先端部、後端部、特に先端部において、跳ね上がり量が大きくなる。   6 (c) and 6 (d) show the amount of jump, that is, the amount of displacement of the glass substrate P at the time of inspection with respect to FIGS. 6 (a) and 6 (b), respectively. When the acceleration is large, the front end portion Ptb and the rear end portion Pbb of the glass substrate P jump up and become large. Although depending on the thickness of the glass substrate P, as can be seen from FIGS. 6 (c) and 6 (d), generally, when the acceleration is large, the front end portion, the rear end portion, particularly the front end portion of the glass substrate P. In this case, the amount of jumping increases.

そこで、ガラス基板Pに厚さに対して、予め変位量(跳ね上がり量)を測定し、許容範囲の変位量に入る速度パターンを求めて、実際の検査で用いる。許容範囲の変位量に入らなければ、第1の実施形態で示した方法と組み合わせて行い、検査時の補正量を低減し、さらに安定して検査をする。   Therefore, the amount of displacement (the amount of jump) is measured in advance with respect to the thickness of the glass substrate P, and a speed pattern that falls within the allowable amount of displacement is obtained and used in actual inspection. If the displacement does not fall within the allowable range, the method is combined with the method shown in the first embodiment, the correction amount at the time of inspection is reduced, and the inspection is performed more stably.

以上、説明した、第2の実施形態によれば、跳ね上げり現象を低減または除去できるので、搬送方向のガラス基板の平坦性をでき、ガラス基板を精度よく検査できる。   As described above, according to the second embodiment described above, since the flip-up phenomenon can be reduced or eliminated, the flatness of the glass substrate in the transport direction can be achieved, and the glass substrate can be inspected with high accuracy.

以上説明した実施形態では、特にガラス基板の先端部あるいは後端部における検査を主体に述べた。ガラス基板の薄型化に伴いその他の領域においても基板の跳ね(浮き)上がりや浮き沈むが発生することがある。その場合は、全領域に亘って、変位量を測定し、平坦度の維持する為の制御を行ってもよい。   In the embodiment described above, the inspection mainly on the front end portion or the rear end portion of the glass substrate has been mainly described. As the glass substrate is made thinner, the substrate may bounce (lift) or sink in other regions. In that case, the displacement amount may be measured over the entire region, and control for maintaining flatness may be performed.

10:検査部 10A:傷検査部
10B:気泡検査部 11A、11B;撮像ユニット
12A、12B:ラインセンサ(撮像手段) 13A、13B;受光レンズ
14A、14B:距離検出センサ(非接触式レーザ変位計)
15A、15B;撮像部駆動部 16A、16B:光源ユニット
17A;レーザ光源 18A:ミラー
19A:集光レンズ 20:エア浮上ステージ
21:分割ステージ 21S:精密浮上ステージ
21H:高浮上部ステージ 30:駆動部
31:リニアガイド 32:リニアアクチュエータ
33:グリッパ 34:リニアスケール
40:搬送部 50:エア供給吸気部
51:圧搾エア供給源 52:真空供給源
60:全体制御部 100:ガラス基板欠陥装置
P:ガラス基板 PA:圧搾エアの噴出口
PV:エアの吸引口 Pb:ガラス基板の後端
Pbb:ガラス基板の後端部 Pt:ガラス基板の先端
Ptb:ガラス基板の先端部 R:検査領域。
DESCRIPTION OF SYMBOLS 10: Inspection | inspection part 10A: Scratch inspection part 10B: Bubble inspection part 11A, 11B; Imaging unit 12A, 12B: Line sensor (imaging means) 13A, 13B; Light receiving lens 14A, 14B: Distance detection sensor (non-contact type laser displacement meter) )
15A, 15B; imaging unit drive unit 16A, 16B: light source unit 17A; laser light source 18A: mirror 19A: condenser lens 20: air levitation stage 21: split stage 21S: precision levitation stage 21H: high levitation stage 30: drive unit 31: Linear guide 32: Linear actuator 33: Gripper 34: Linear scale 40: Conveying unit 50: Air supply / intake unit 51: Pressurized air supply source 52: Vacuum supply source 60: Overall control unit 100: Glass substrate defect device P: Glass Substrate PA: Pressurized air outlet PV: Air suction port Pb: Rear end of glass substrate Pbb: Rear end of glass substrate Pt: Front end of glass substrate Ptb: Front end of glass substrate R: Inspection region

Claims (10)

ガラス基板をエアで浮上させる浮上装置と、前記浮上装置がない検査領域に前記ガラス基板を搬送する搬送装置と、前記検査領域において前記ガラス基板を撮像し検査する光学式検査装置とを有するガラス基板欠陥検査装置において、
前記検査領域における前記基板ガラスの搬送方向の端部の跳ね上がりによる変位量を低減する低減手段を有することを特徴とするガラス基板欠陥検査装置。
A glass substrate having a levitation device for levitating a glass substrate with air, a transport device for conveying the glass substrate to an inspection area without the levitation device, and an optical inspection apparatus for imaging and inspecting the glass substrate in the inspection area In defect inspection equipment,
A glass substrate defect inspection apparatus, comprising: a reduction unit that reduces a displacement amount due to a jump of an end portion of the substrate glass in a conveyance direction in the inspection region.
前記低減手段は前記検査領域における前記ガラス基板の前記変位量を測定する変位量測定手段と、前記変位量測定手段の検出結果に基づいて、前記撮像する撮像手段の移動させる移動手段とを有することを特徴とする請求項1に記載のガラス基板欠陥検査装置。   The reduction means includes a displacement amount measuring means for measuring the displacement amount of the glass substrate in the inspection region, and a moving means for moving the imaging means for imaging based on a detection result of the displacement amount measuring means. The glass substrate defect inspection apparatus according to claim 1. 前記変位量測定手段は非接触式レーザ変位計であることを特徴とする請求項2に記載のガラス基板欠陥検査装置。   The glass substrate defect inspection apparatus according to claim 2, wherein the displacement measuring means is a non-contact type laser displacement meter. 前記検査領域おける前記ガラス基板の搬送速度の速度パターンを予め定め、前記予め定められた前記速度パターンに基づいて前記ガラス基板を検査すること特徴とする請求項1または2に記載のガラス基板欠陥検査装置。   The glass substrate defect inspection according to claim 1, wherein a speed pattern of a conveyance speed of the glass substrate in the inspection area is determined in advance, and the glass substrate is inspected based on the predetermined speed pattern. apparatus. 前記光学式検査装置は、前記ガラス基板内の気泡、前記ガラス基板に表面に存在する傷の少なくとも一方を検査することを特徴とすること請求項1乃至4のいずれかに記載のガラス基板欠陥検査装置。   5. The glass substrate defect inspection according to claim 1, wherein the optical inspection apparatus inspects at least one of bubbles in the glass substrate and scratches existing on a surface of the glass substrate. apparatus. 前記光学式検査装置は、前記ガラス基板に照明する照明手段を前記搬送装置の下部に、前記撮像手段を前記搬送手段の上部に設けたことを特徴とする請求項5に記載のガラス基板欠陥検査装置。   6. The glass substrate defect inspection according to claim 5, wherein the optical inspection apparatus includes an illuminating unit that illuminates the glass substrate at a lower portion of the transfer device and the imaging unit at an upper portion of the transfer unit. apparatus. ガラス基板をエアで浮上力を発生させて浮上させ、前記浮上力のない検査領域に搬送し、前記検査領域において前記ガラス基板を撮像し検査するガラス基板欠陥検査方法において、
前記検査領域における前記基板ガラスの搬送方向の端部の跳ね上がりによる変位量を低減し、前記検査を行なうことを特徴とするガラス基板欠陥検査方法。
In the glass substrate defect inspection method in which the glass substrate is lifted by generating a levitation force with air, transported to the inspection area without the levitation force, and imaging and inspecting the glass substrate in the inspection area.
A glass substrate defect inspection method, wherein the inspection is performed by reducing a displacement amount due to a jump of an end portion in the transport direction of the substrate glass in the inspection region.
前記低減は前記検査領域における前記ガラス基板の前記変位量を測定し、前記変位量測定結果に基づいて、前記撮像する撮像手段を移動させることを特徴とする請求項7に記載のガラス基板欠陥検査方法。   The glass substrate defect inspection according to claim 7, wherein the reduction measures the amount of displacement of the glass substrate in the inspection region, and moves the imaging means for imaging based on the displacement amount measurement result. Method. 前記検査領域おける前記ガラス基板の搬送速度の加速度を予め定め、前記予め定められた前記加速度に基づいて前記ガラス基板を検査すること特徴とする請求項7または8に記載のガラス基板欠陥検査方法。   The glass substrate defect inspection method according to claim 7 or 8, wherein an acceleration of a conveyance speed of the glass substrate in the inspection region is predetermined, and the glass substrate is inspected based on the predetermined acceleration. 前記ガラス基板内の気泡、前記ガラス基板に表面に存在する傷の少なくとも一方を検査することを特徴とすること請求項7乃至9のいずれかに記載のガラス基板欠陥検査方法。   The glass substrate defect inspection method according to any one of claims 7 to 9, wherein at least one of bubbles in the glass substrate and scratches existing on a surface of the glass substrate are inspected.
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