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JP2009175120A - Magnetic sensor and magnetic sensor module - Google Patents

Magnetic sensor and magnetic sensor module Download PDF

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JP2009175120A
JP2009175120A JP2008152721A JP2008152721A JP2009175120A JP 2009175120 A JP2009175120 A JP 2009175120A JP 2008152721 A JP2008152721 A JP 2008152721A JP 2008152721 A JP2008152721 A JP 2008152721A JP 2009175120 A JP2009175120 A JP 2009175120A
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fixed resistance
magnetoresistive effect
soft magnetic
magnetic
magnetic body
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Hiromitsu Sasaki
寛充 佐々木
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Alps Alpine Co Ltd
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Alps Electric Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To especially provide a magnetic sensor and magnetic sensor module which is rationalized in arrangement of fixed resistance provided with a first soft magnetic material and a magnetoresistance effect element. <P>SOLUTION: The fixed resistance elements 4, 5 are approximately serially arranged in a longitudinal direction (Y1-Y2 direction). The fixed resistance elements 4, 5 are composed of an element part 12 provided with a fixed magnetic layer, nonmagnetic layer and free magnetic layer and a first soft magnetic material 23 positioning above the elementary part 12. A fixed resistance element formation region 80 surrounding the fixed resistance elements 4, 5 and the magnetoresistance effective elements 2, 3 are opposing in a lateral direction (X1-X2 direction). In a region between the magnetoresistance effective elements 2, 3 and the fixed resistance element formation regent 80, a third soft magnetic material 71 is provided. The third soft magnetic material 71 is formed long in a longitudinally direction. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

磁気センサには、磁気抵抗効果素子と固定抵抗素子とで構成されたブリッジ回路が設けられている。磁気抵抗効果素子は、磁化方向が一方向に固定された固定磁性層と、固定磁性層に非磁性層を介して形成されたフリー磁性層との積層構造を備える。   The magnetic sensor is provided with a bridge circuit composed of a magnetoresistive effect element and a fixed resistance element. The magnetoresistive effect element has a laminated structure of a pinned magnetic layer whose magnetization direction is fixed in one direction and a free magnetic layer formed on the pinned magnetic layer via a nonmagnetic layer.

例えば、固定抵抗素子を構成する素子部に磁気抵抗効果素子と同様に磁気抵抗効果を発揮する積層体を用い、素子部の上方に、磁気シールド効果を発揮する軟磁性体を配置する構成にすると、固定抵抗化できる。   For example, when a laminated body that exhibits a magnetoresistive effect is used for the element portion that constitutes the fixed resistance element, and a soft magnetic material that exhibits a magnetic shield effect is disposed above the element portion, , Can be fixed resistance.

例えば図25に示すように、ブリッジ回路を構成する4個の素子を配置する。符号100,101が磁気抵抗効果素子で、符号102,103が固定抵抗素子である。図25に示すY方向が磁気抵抗効果素子100,101の感度軸方向でる。符号104は磁気抵抗効果素子100,101を構成するミアンダ形状の磁気抵抗効果を発揮する素子部、符号105は固定抵抗素子102,103を構成する軟磁性体、符号106は固定抵抗素子102,103を構成するミアンダ形状の素子部である。磁気抵抗効果素子100,101は感度軸方向と平行な縦方向からの磁場に対して感度を持つ。すなわち磁気抵抗効果素子100,101は、感度軸方向と平行な方向からの磁場の作用により、固定磁性層とフリー磁性層との磁化関係に基づき抵抗変化する。   For example, as shown in FIG. 25, four elements constituting the bridge circuit are arranged. Reference numerals 100 and 101 are magnetoresistive elements, and reference numerals 102 and 103 are fixed resistance elements. The Y direction shown in FIG. 25 is the sensitivity axis direction of the magnetoresistive effect elements 100 and 101. Reference numeral 104 denotes an element portion that exhibits a meander-shaped magnetoresistive effect constituting the magnetoresistive effect elements 100 and 101, reference numeral 105 denotes a soft magnetic material constituting the fixed resistance elements 102 and 103, and reference numeral 106 denotes the fixed resistance elements 102 and 103. Is a meander-shaped element part. The magnetoresistive elements 100 and 101 are sensitive to a magnetic field from a vertical direction parallel to the sensitivity axis direction. That is, the magnetoresistive effect elements 100 and 101 change in resistance based on the magnetization relationship between the fixed magnetic layer and the free magnetic layer by the action of a magnetic field from a direction parallel to the sensitivity axis direction.

図25に示すように、磁気抵抗効果素子100と固定抵抗素子102、及び磁気抵抗効果素子101と固定抵抗素子103とが夫々感度軸方向(Y方向)に間隔を空けて配列されている。   As shown in FIG. 25, the magnetoresistive effect element 100 and the fixed resistance element 102, and the magnetoresistive effect element 101 and the fixed resistance element 103 are arranged at intervals in the sensitivity axis direction (Y direction).

しかしながら図25に示す素子配置であると、感度軸方向と平行な方向からの磁場が固定抵抗素子102,103を構成する軟磁性体105により増幅されて磁気抵抗効果素子100,101に進入する。このような磁場の増幅効果は、磁気抵抗効果素子100,101に対して磁気飽和を早め磁気感度を低下させる原因となった。
特開2005−183614号公報
However, in the element arrangement shown in FIG. 25, the magnetic field from the direction parallel to the sensitivity axis direction is amplified by the soft magnetic body 105 constituting the fixed resistance elements 102 and 103 and enters the magnetoresistive effect elements 100 and 101. Such an amplification effect of the magnetic field causes the magnetic saturation of the magnetoresistive effect elements 100 and 101 to be accelerated and the magnetic sensitivity to be lowered.
JP 2005-183614 A

そこで本発明は上記従来の課題を解決するためのものであり、特に、第1軟磁性体を備える固定抵抗素子と磁気抵抗効果素子との配置を適正化した磁気センサ及び磁気センサモジュールを提供することを目的とする。   Accordingly, the present invention is to solve the above-described conventional problems, and in particular, provides a magnetic sensor and a magnetic sensor module in which the arrangement of the fixed resistance element and the magnetoresistive effect element including the first soft magnetic material is optimized. For the purpose.

本発明は、磁気抵抗効果素子及び固定抵抗素子を備えた磁気センサであって、
前記磁気抵抗効果素子は、磁化方向が固定される固定磁性層と、前記固定磁性層に非磁性層を介して積層された外部磁場を受けて磁化方向が変動するフリー磁性層とを有する素子部を備え、前記固定磁性層の固定磁化方向は感度軸方向であり、
前記固定抵抗素子は、素子幅W1に比べて素子長さL1が長く形成された細長形状の素子部を備え、前記固定抵抗素子を構成する素子部は、前記固定磁性層と、前記固定磁性層に前記非磁性層を介して積層された前記フリー磁性層とを有しており、
前記固定抵抗素子を構成する素子部と間隔を空けて前記素子部に対して磁気シールド効果を発揮する第1軟磁性体が積層配置されており、
前記固定抵抗素子は、前記磁気抵抗効果素子に対して、前記感度軸方向と平行な縦方向に対向しない位置に配置されていることを特徴とするものである。
The present invention is a magnetic sensor comprising a magnetoresistive effect element and a fixed resistance element,
The magnetoresistive element includes an element part having a pinned magnetic layer whose magnetization direction is fixed, and a free magnetic layer which is laminated on the pinned magnetic layer via a nonmagnetic layer and changes the magnetization direction upon receiving an external magnetic field The fixed magnetization direction of the fixed magnetic layer is a sensitivity axis direction,
The fixed resistance element includes an elongated element portion having an element length L1 longer than an element width W1, and the element portion constituting the fixed resistance element includes the fixed magnetic layer and the fixed magnetic layer. And the free magnetic layer laminated via the non-magnetic layer,
A first soft magnetic body that exhibits a magnetic shielding effect with respect to the element portion with a gap from an element portion that constitutes the fixed resistance element is laminated,
The fixed resistance element is arranged at a position that is not opposed to the magnetoresistive effect element in a longitudinal direction parallel to the sensitivity axis direction.

これにより、磁気抵抗効果素子に作用する感度軸方向と平行な縦方向からの磁場が第1軟磁性体により増幅されるのを抑制でき、磁気抵抗効果素子の磁気飽和を防止でき、磁気センサとしての感度を適切に保つことができる。   As a result, the magnetic field from the longitudinal direction parallel to the sensitivity axis direction acting on the magnetoresistive effect element can be suppressed from being amplified by the first soft magnetic material, and magnetic saturation of the magnetoresistive effect element can be prevented. The sensitivity of can be kept appropriate.

本発明では、前記固定抵抗素子の少なくとも一部は、前記磁気抵抗効果素子に対して、前記縦方向に直交する横方向にて対向して配置されていることが好ましい。これにより、小さい領域内に磁気抵抗効果素子と固定抵抗素子とを、磁気抵抗効果素子に作用する感度軸方向と平行な縦方向からの磁場が第1軟磁性体により増幅されるのを抑制した状態で適切に配置できる。   In the present invention, it is preferable that at least a part of the fixed resistance element is disposed to face the magnetoresistive element in a lateral direction perpendicular to the longitudinal direction. Thereby, the magnetoresistive effect element and the fixed resistance element are suppressed in a small region, and the magnetic field from the longitudinal direction parallel to the sensitivity axis direction acting on the magnetoresistive effect element is suppressed from being amplified by the first soft magnetic body. Can be placed properly in the state.

また本発明では、前記磁気抵抗効果素子及び前記固定抵抗素子が前記横方向に略一列に配置される構成にできる。   In the present invention, the magnetoresistive effect element and the fixed resistance element can be arranged in a substantially line in the lateral direction.

また本発明では、複数の前記固定抵抗素子が前記縦方向に略直列に配置されている構成にできる。これにより固定抵抗素子の素子部に対する磁気シールド範囲を広くできる。   Moreover, in this invention, it can be set as the structure by which the said some fixed resistance element is arrange | positioned substantially serially in the said vertical direction. As a result, the magnetic shield range for the element portion of the fixed resistance element can be widened.

また本発明では、複数の前記固定抵抗素子の固定抵抗素子形成領域と、前記磁気抵抗効果素子とが前記縦方向に直交する横方向にて対向配置されていることが好ましい。これにより、より効果的に、小さい領域内に磁気抵抗効果素子と固定抵抗素子とを、磁気抵抗効果素子に作用する感度軸方向と平行な縦方向からの磁場が第1軟磁性体により増幅されるのを抑制した状態で適切に配置でき、また上記した固定抵抗素子の素子部に対する磁気シールド範囲も広くできる。   In the present invention, it is preferable that the fixed resistance element forming regions of the plurality of fixed resistance elements and the magnetoresistive effect element are arranged to face each other in a horizontal direction orthogonal to the vertical direction. Thereby, the magnetic field from the vertical direction parallel to the sensitivity axis direction acting on the magnetoresistive effect element is more effectively amplified by the first soft magnetic body. In addition, the magnetic shield range can be increased with respect to the element portion of the fixed resistance element.

本発明では、前記磁気抵抗効果素子には、前記磁気抵抗効果素子を構成する前記素子部と非接触であり前記感度軸方向と平行な縦方向に対して直交する横方向からの磁場に対して磁気シールド効果を発揮する第2軟磁性体が設けられていてもよい。   In the present invention, the magnetoresistive effect element is not in contact with the element portion constituting the magnetoresistive effect element, and with respect to a magnetic field from a lateral direction orthogonal to a longitudinal direction parallel to the sensitivity axis direction. A second soft magnetic body that exhibits a magnetic shielding effect may be provided.

また本発明では、前記磁気抵抗効果素子には、前記磁気抵抗効果素子を構成する前記素子部と非接触であり前記感度軸方向と平行な縦方向に対して直交する横方向からの磁場に対して磁気シールド効果を発揮する第2軟磁性体が設けられており、前記第2軟磁性体及び前記固定抵抗素子を構成する前記第1軟磁性体は共に、前記横方向に長い形状で形成されており、
前記磁気抵抗効果素子と前記固定抵抗素子の間の領域に、前記磁気抵抗効果素子及び前記固定抵抗素子の双方に非接触の第3軟磁性体が配置され、前記第3軟磁性体は、前記縦方向に長い形状で形成されるとともに、前記磁気抵抗効果素子及び前記固定抵抗素子の縦方向への全域に対向する長さ寸法以上で形成されていることが好ましい。これにより感度軸方向と直交する横方向からの磁場の増幅効果を抑制できる。
In the present invention, the magnetoresistive effect element is in contact with the magnetic field from the lateral direction orthogonal to the longitudinal direction parallel to the sensitivity axis direction and not in contact with the element portion constituting the magnetoresistive effect element. A second soft magnetic body that exhibits a magnetic shielding effect is provided, and both the second soft magnetic body and the first soft magnetic body constituting the fixed resistance element are formed in a shape that is long in the lateral direction. And
In a region between the magnetoresistive effect element and the fixed resistance element, a non-contact third soft magnetic body is disposed on both the magnetoresistive effect element and the fixed resistance element, and the third soft magnetic body is It is preferable that it is formed in a shape that is long in the vertical direction and has a length that is equal to or greater than the length of the magnetoresistive effect element and the fixed resistance element facing the entire area in the vertical direction. Thereby, the amplification effect of the magnetic field from the lateral direction orthogonal to the sensitivity axis direction can be suppressed.

本発明では、前記磁気抵抗効果素子を構成する前記素子部は、前記縦方向に複数個、間隔を空けて配置され、各素子部の端部間が接続されてミアンダ形状にされており、各素子部の前記縦方向への両側方、真上、あるいは真下のいずれかに前記第2軟磁性体が前記各素子部と非接触で形成されていることが好ましい。   In the present invention, a plurality of the element portions constituting the magnetoresistive effect element are arranged at intervals in the vertical direction, and end portions of each element portion are connected to form a meander shape, It is preferable that the second soft magnetic body is formed in a non-contact manner with each of the element portions on either side of the element portion in the longitudinal direction, directly above, or directly below.

また本発明では、前記固定抵抗素子を構成する前記素子部は、複数個、素子幅方向に間隔を空けて配置され、各素子部の端部間が接続されてミアンダ形状にされており、
前記固定抵抗素子を構成する各素子部に対して個別に前記第1軟磁性体が配置されていることが好ましい。このとき、前記第1軟磁性体は、さらに、素子幅方向の両側に位置する前記素子部の外側面より外側にも配置されていることが好ましい。これにより固定抵抗素子を構成する素子部に対する磁気シールド効果をより効果的に発揮することが出来る。
Further, in the present invention, a plurality of the element portions constituting the fixed resistance element are arranged at intervals in the element width direction, and the end portions of each element portion are connected to form a meander shape,
It is preferable that the first soft magnetic body is individually arranged for each element portion constituting the fixed resistance element. At this time, it is preferable that the first soft magnetic body is further disposed outside the outer surface of the element portion located on both sides in the element width direction. Thereby, the magnetic shielding effect with respect to the element part which comprises a fixed resistance element can be exhibited more effectively.

また、前記固定抵抗素子を構成する前記素子部は、複数個、素子幅方向に間隔を空けて配置され、各素子部の端部間が接続されてミアンダ形状にされており、
一つの前記第1軟磁性体が、前記固定抵抗素子を構成する全ての前記素子部を覆う大きさで形成されている構成でもよい。
Further, a plurality of the element portions constituting the fixed resistance element are arranged at intervals in the element width direction, and the end portions of each element portion are connected to form a meander shape,
One of the first soft magnetic bodies may be formed to have a size that covers all of the element portions constituting the fixed resistance element.

また本発明では、前記第1軟磁性体は、前記素子幅W1と同方向への幅寸法W2が前記素子幅W1よりも大きく前記素子部の素子幅の両側から素子幅方向に延出する延出部を備えるとともに、前記素子長さL1と同方向への長さ寸法L2が前記素子長さL1よりも大きく前記素子部の素子長さ方向の両側から素子長さ方向に延出する延出部を備え、且つ前記長さ寸法L2が前記幅寸法W2よりも大きいことが好ましい。これにより、固定抵抗素子を構成する素子部に対する磁気シールド効果をより効果的に発揮することが出来、適切に固定抵抗化できる。   In the present invention, the first soft magnetic body has a width dimension W2 in the same direction as the element width W1 that is larger than the element width W1 and extends from both sides of the element width of the element portion in the element width direction. An extension that includes a protruding portion and that has a length dimension L2 in the same direction as the element length L1 that is larger than the element length L1 and extends from both sides of the element length direction of the element portion in the element length direction. And the length dimension L2 is preferably larger than the width dimension W2. Thereby, the magnetic shield effect with respect to the element part which comprises a fixed resistance element can be exhibited more effectively, and it can be appropriately fixed resistance.

また本発明では、前記磁気抵抗効果素子及び前記固定抵抗素子を構成する各素子部の積層順及び膜厚が等しいことが好ましい。これにより、固定抵抗素子及び磁気抵抗効果素子の抵抗変化温度係数(TCR)が一致するように高精度に調整できる。   In the present invention, it is preferable that the stacking order and the film thicknesses of the element portions constituting the magnetoresistive effect element and the fixed resistance element are equal. Thereby, it can adjust with high precision so that the resistance change temperature coefficient (TCR) of a fixed resistive element and a magnetoresistive effect element may correspond.

また本発明における磁気センサモジュールは、上記のいずれかに記載の磁気センサを複数有し、少なくとも前記複数の磁気センサのうち一組の磁気抵抗効果素子の感度軸が直交するように各磁気センサが配置されていることを特徴とするものである。例えば、本発明の磁気センサモジュールは地磁気センサとして使用できる。   A magnetic sensor module according to the present invention includes a plurality of the magnetic sensors according to any one of the above, and each of the magnetic sensors has a sensitivity axis of a pair of magnetoresistive effect elements orthogonal to each other. It is characterized by being arranged. For example, the magnetic sensor module of the present invention can be used as a geomagnetic sensor.

本発明の磁気センサによれば、磁気抵抗効果素子に作用する感度軸方向と平行な縦方向からの磁場が第1軟磁性体により増幅されるのを抑制でき、磁気抵抗効果素子の磁気飽和を防止でき、磁気センサとしての感度を適切に保つことができる。   According to the magnetic sensor of the present invention, the magnetic field from the longitudinal direction parallel to the sensitivity axis direction acting on the magnetoresistive effect element can be suppressed from being amplified by the first soft magnetic material, and the magnetic saturation of the magnetoresistive effect element can be reduced. The sensitivity as a magnetic sensor can be maintained appropriately.

図1(a)は第1実施形態における磁気センサの磁気抵抗効果素子及び固定抵抗素子の平面図、図1(b)は、図1(a)に示すC−C線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、図2(a)は第2実施形態における磁気センサの磁気抵抗効果素子及び固定抵抗素子の平面図、図2(b)は、図2(a)の素子配置が優れていることを説明するための固定抵抗素子形成領域及び磁気シールド範囲の模式図、図3は図2の形態を改良した磁気抵抗効果素子及び固定抵抗素子の平面図、図4は第3実施形態における磁気センサの磁気抵抗効果素子及び固定抵抗素子の平面図、図5は第4実施形態における磁気センサの磁気抵抗効果素子及び固定抵抗素子の平面図、図6(a)は、磁気抵抗効果素子の平面図、図6(b)は、(a)のA−A線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、図7(a)は、図6とは異なる磁気センサの磁気抵抗効果素子の平面図、図7(b)は、図7(a)のA−A線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、図8(a)は、図6及び図7とは異なる磁気センサの磁気抵抗効果素子の平面図、図8(b)は、図8(a)のA−A線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、図9は図6ないし図8とは異なる磁気抵抗効果素子の平面図、図10(a)は、図6ないし図9とは異なる磁気抵抗効果素子の平面図、図10(b)は、図10(a)のA−A線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、図11は、図6ないし図10とは異なる磁気抵抗効果素子の平面図、図12は、図6ないし図11とは異なる磁気抵抗効果素子の平面図、図13は、図6ないし図12とは異なる磁気抵抗効果素子の部分を示す平面図、図14は、図13に示すD−D線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分拡大断面図、図15は好ましい磁気抵抗効果素子の形態の特に素子部の部分を示す部分拡大平面図、図16(a)は、図6ないし図12とは異なる磁気抵抗効果素子の平面図、図16(b)は図16(a)のA−A線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、図17は、図6ないし図16とは異なる磁気抵抗効果素子の平面図、図18(a)は、固定抵抗素子の平面図、図18(b)は、図18(a)のB−B線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、図19は図18とは異なる固定抵抗素子の平面図、図20は、図18及び図19とは異なる固定抵抗素子の平面図、図21は、磁気抵抗効果素子の固定磁性層の固定磁化方向及びフリー磁性層の磁化方向と、電気抵抗値との関係を説明するための図、図22は、磁気抵抗効果素子を膜厚方向から切断した際の切断面を示す断面図、図23は、本実施形態の磁気センサの回路図、図24は磁気センサモジュールの斜視図、である。   FIG. 1A is a plan view of the magnetoresistive effect element and fixed resistance element of the magnetic sensor according to the first embodiment, and FIG. 1B is a height direction along the line CC shown in FIG. FIG. 2A is a plan view of the magnetoresistive effect element and the fixed resistance element of the magnetic sensor according to the second embodiment, and FIG. 2A is a schematic diagram of a fixed resistance element formation region and a magnetic shield range for explaining that the element arrangement is excellent, and FIG. 3 is a diagram of a magnetoresistive effect element and a fixed resistance element obtained by improving the configuration of FIG. FIG. 4 is a plan view of the magnetoresistive effect element and fixed resistance element of the magnetic sensor in the third embodiment. FIG. 5 is a plan view of the magnetoresistive effect element and fixed resistance element of the magnetic sensor in the fourth embodiment. 6 (a) is a plan view of the magnetoresistive effect element, FIG. ) Is a partial cross-sectional view taken in the height direction (Z direction in the figure) along the AA line of (a) and viewed from the arrow direction, and FIG. 7A is a magnetic sensor of a magnetic sensor different from that in FIG. FIG. 7B is a partial cross-sectional view taken along the line AA in FIG. 7A in the height direction (Z direction in the figure) and viewed from the arrow direction, FIG. FIG. 8A is a plan view of a magnetoresistive element of a magnetic sensor different from those in FIGS. 6 and 7, and FIG. 8B is a height direction (Z direction in the drawing) along the line AA in FIG. FIG. 9 is a plan view of a magnetoresistive effect element different from FIGS. 6 to 8, and FIG. 10A is a magnetoresistive effect different from FIGS. 6 to 9. FIG. 10B is a partial cross-sectional view taken along the line AA in FIG. 10A in the height direction (Z direction in the drawing) and viewed from the arrow direction, and FIG. FIG. 12 is a plan view of a magnetoresistive effect element different from FIGS. 6 to 11, and FIG. 13 is a magnetoresistive effect different from FIGS. 6 to 12. FIG. 14 is a plan view showing a portion of the element, FIG. 14 is a partially enlarged sectional view taken along the DD line shown in FIG. 13 in the height direction (Z direction in the drawing), and seen from the arrow direction, and FIG. FIG. 16 (a) is a plan view of a magnetoresistive effect element different from those shown in FIGS. 6 to 12, and FIG. 16 (b) is a plan view of FIG. 16 (a). ) In FIG. 17 is a partial cross-sectional view taken along the line A-A in the height direction (Z direction in the figure) and viewed from the arrow direction. FIG. 17 is a plan view of a magnetoresistive effect element different from FIGS. 18 (a) is a plan view of the fixed resistance element, and FIG. 18 (b) is a B- FIG. 19 is a partial cross-sectional view taken along the line B in the height direction (Z direction in the drawing) and viewed from the arrow direction, FIG. 19 is a plan view of a fixed resistance element different from FIG. 18, and FIG. 21 is a plan view of different fixed resistance elements, FIG. 21 is a diagram for explaining the relationship between the fixed magnetization direction of the fixed magnetic layer and the magnetization direction of the free magnetic layer of the magnetoresistive effect element, and the electric resistance value, and FIG. FIG. 23 is a sectional view showing a cut surface when the magnetoresistive element is cut from the film thickness direction, FIG. 23 is a circuit diagram of the magnetic sensor of the present embodiment, and FIG. 24 is a perspective view of the magnetic sensor module.

各図においてX1−X2は、横方向、Y1−Y2方向は横方向に直交する縦方向、Z1−Z2方向は高さ(膜厚)方向である。各実施形態において、磁気抵抗効果素子2,3を構成する固定磁性層34の固定磁化方向(P方向)はY1方向であり(図22等参照)、Y1方向が感度軸方向である。   In each figure, X1-X2 is a horizontal direction, Y1-Y2 direction is a vertical direction orthogonal to the horizontal direction, and Z1-Z2 direction is a height (film thickness) direction. In each embodiment, the fixed magnetization direction (P direction) of the fixed magnetic layer 34 constituting the magnetoresistive elements 2 and 3 is the Y1 direction (see FIG. 22 and the like), and the Y1 direction is the sensitivity axis direction.

本実施形態における磁気抵抗効果素子及び固定抵抗素子を備えた磁気センサ1は例えば携帯電話等の携帯機器に搭載される地磁気センサモジュールとして使用される。   The magnetic sensor 1 provided with the magnetoresistive effect element and the fixed resistance element in the present embodiment is used as a geomagnetic sensor module mounted on a portable device such as a mobile phone.

磁気センサ1は、図23に示すように、磁気抵抗効果素子2,3と固定抵抗素子4,5とがブリッジ接続されてなるセンサ部6と、センサ部6と電気接続された入力端子7、グランド端子8、差動増幅器9及び外部出力端子10等を備えた集積回路(IC)11とで構成される。   As shown in FIG. 23, the magnetic sensor 1 includes a sensor unit 6 in which magnetoresistive effect elements 2 and 3 and fixed resistance elements 4 and 5 are bridge-connected, an input terminal 7 electrically connected to the sensor unit 6, The integrated circuit (IC) 11 includes a ground terminal 8, a differential amplifier 9, an external output terminal 10, and the like.

図1に示す実施形態では、磁気抵抗効果素子2,3と固定抵抗素子4,5とが横方向(X1−X2方向)に略一列に間隔T11を空けて配置されている。ここで「略一列」とは製造誤差のみならず縦方向(Y1−Y2方向)への多少のずれを許容するものである。本実施形態では、各磁気抵抗効果素子2,3の中心O1と、固定抵抗素子の中心O2とが縦方向(Y1−Y2方向)に、引き出し電極のデザイン等で発生する数十μm程度のずれは許容される。上記間隔T11は、30〜100μm程度である。なおここでいう間隔T11とは、磁気抵抗効果素子2,3を構成する素子部12及び第2軟磁性体18と、固定抵抗素子4,5を構成する素子部12及び第1軟磁性体23との間の最も狭い間隔を指す。図1に示す実施形態では、第1軟磁性体23と第2軟磁性体18との間の間隔である。   In the embodiment shown in FIG. 1, the magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5 are arranged in the horizontal direction (X1-X2 direction) with a space T11 in a substantially line. Here, “substantially one row” allows not only manufacturing errors but also a slight shift in the vertical direction (Y1-Y2 direction). In the present embodiment, the center O1 of each of the magnetoresistive elements 2 and 3 and the center O2 of the fixed resistance element are shifted in the vertical direction (Y1-Y2 direction) by about several tens of μm due to the design of the extraction electrode. Is acceptable. The interval T11 is about 30 to 100 μm. Here, the interval T11 refers to the element portion 12 and the second soft magnetic body 18 constituting the magnetoresistive effect elements 2 and 3, and the element portion 12 and the first soft magnetic body 23 constituting the fixed resistance elements 4 and 5. Refers to the narrowest distance between. In the embodiment shown in FIG. 1, the distance is between the first soft magnetic body 23 and the second soft magnetic body 18.

図2(a)に示す実施形態では、固定抵抗素子4,5が縦方向(Y1−Y2方向)に間隔T12を空けて略直列に配置されている。図2(a)では、固定抵抗素子4の中心O4と、固定抵抗素子5の中心O5とが縦方向(Y1−Y2方向)にて一致しているが多少横方向(X1−X2方向)にずれて配置されてもよい。具体的には、各固定抵抗素子4,5の中心O4,O5が横方向(X1−X2方向)に、引き出し電極のデザイン等で発生する数十μm程度のずれは許容される。   In the embodiment shown in FIG. 2A, the fixed resistance elements 4 and 5 are arranged substantially in series with a space T12 in the vertical direction (Y1-Y2 direction). In FIG. 2A, the center O4 of the fixed resistance element 4 and the center O5 of the fixed resistance element 5 coincide in the vertical direction (Y1-Y2 direction), but somewhat in the horizontal direction (X1-X2 direction). It may be displaced. Specifically, the center O4 and O5 of each fixed resistance element 4 and 5 is allowed to be displaced by about several tens of μm in the lateral direction (X1-X2 direction) due to the design of the extraction electrode.

そして、2個の固定抵抗素子4,5が囲まれる固定抵抗素子形成領域80と各磁気抵抗効果素子2,3とが横方向(X1−X2方向)に間隔T11を空けて配置されている。ここでいう「固定抵抗素子形成領域80」とは、2個の固定抵抗素子4,5が囲まれる領域であり、図2(a)のように、2個の固定抵抗素子4,5を構成する各第1軟磁性体23の外側端面(隣接する他の第1軟磁性体23と対向しない面)を直線的に結んだ領域を指す。   The fixed resistance element forming region 80 surrounded by the two fixed resistance elements 4 and 5 and the magnetoresistive effect elements 2 and 3 are arranged in the horizontal direction (X1-X2 direction) with an interval T11. The “fixed resistance element forming region 80” here is an area where the two fixed resistance elements 4 and 5 are surrounded, and the two fixed resistance elements 4 and 5 are configured as shown in FIG. The area | region which tied the outer side end surface (surface which does not oppose other adjacent 1st soft-magnetic bodies 23) of each 1st soft-magnetic body 23 to perform linearly.

図2(a)の実施形態では、固定抵抗素子4と固定抵抗素子5との間隔T12は、2μm以上であり、固定抵抗内の磁場分布を良くする為には、図18(a)のT13と等しいことが望ましい。図2(a)では、固定抵抗素子形成領域80の中心O3と、磁気抵抗効果素子2,3の中心O1とが横方向(X1−X2方向)で略一致した位置にあるが、中心O1,O3が縦方向(Y1−Y2方向)にずれている形態も許容するものである。   In the embodiment of FIG. 2A, the interval T12 between the fixed resistance element 4 and the fixed resistance element 5 is 2 μm or more. In order to improve the magnetic field distribution in the fixed resistance, T13 in FIG. Is preferably equal to In FIG. 2A, the center O3 of the fixed resistance element formation region 80 and the center O1 of the magnetoresistive effect elements 2 and 3 are located at substantially the same position in the lateral direction (X1-X2 direction). A configuration in which O3 is displaced in the vertical direction (Y1-Y2 direction) is also allowed.

個々の磁気抵抗効果素子2,3及び固定抵抗素子4,5の構成を以下で詳しく説明する。まず磁気抵抗効果素子2,3の構成について説明する。   The configurations of the individual magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5 will be described in detail below. First, the configuration of the magnetoresistive effect elements 2 and 3 will be described.

磁気抵抗効果素子2,3は、図6に示すように、素子幅W3に比べて素子長さL3が長く形成された図示X方向に細長い形状の複数の素子部12が横方向(X1−X2方向)に直交する縦方向(Y1−Y2方向)に所定の間隔を空けて並設され、各素子部12の端部間が接続電極部13により電気的に接続されてミアンダ形状となっている。ミアンダ形状に形成された両端にある素子部12の一方には入力端子7、グランド端子8、出力取出し部14(図23参照)に接続される電極部15が接続されている。接続電極部13及び電極部15は、Al、Ta、Au等の非磁性導電材料である。接続電極部13及び電極部15はスパッタやメッキで形成される。   As shown in FIG. 6, the magnetoresistive effect elements 2 and 3 have a plurality of element portions 12 that are elongated in the X direction shown in the drawing and are formed in the lateral direction (X1-X2). Are arranged side by side in the vertical direction (Y1-Y2 direction) orthogonal to the direction), and the end portions of each element portion 12 are electrically connected by the connection electrode portion 13 to form a meander shape. . An electrode portion 15 connected to the input terminal 7, the ground terminal 8, and the output extraction portion 14 (see FIG. 23) is connected to one of the element portions 12 at both ends formed in the meander shape. The connection electrode part 13 and the electrode part 15 are nonmagnetic conductive materials, such as Al, Ta, Au. The connection electrode portion 13 and the electrode portion 15 are formed by sputtering or plating.

磁気抵抗効果素子2,3を構成する各素子部12は、全て図22に示す同じ積層構造で構成される。なお図22は、素子幅W3と平行な方向から膜厚方向に切断した切断面を示している。   Each element part 12 which comprises the magnetoresistive effect elements 2 and 3 is comprised by the same laminated structure shown in FIG. FIG. 22 shows a cut surface cut in the film thickness direction from the direction parallel to the element width W3.

素子部12は、例えば下から反強磁性層33、固定磁性層34、非磁性層35、およびフリー磁性層36の順に積層されて成膜され、フリー磁性層36の表面が保護層37で覆われている。素子部12は例えばスパッタにて形成される。   The element unit 12 is formed by stacking, for example, an antiferromagnetic layer 33, a pinned magnetic layer 34, a nonmagnetic layer 35, and a free magnetic layer 36 in this order from below, and the surface of the free magnetic layer 36 is covered with a protective layer 37. It has been broken. The element part 12 is formed by sputtering, for example.

反強磁性層33は、Ir−Mn合金(イリジウム−マンガン合金)などの反強磁性材料で形成されている。固定磁性層34はCo−Fe合金(コバルト−鉄合金)などの軟磁性材料で形成されている。非磁性層35はCu(銅)などである。フリー磁性層36は、Ni−Fe合金(ニッケル−鉄合金)などの軟磁性材料で形成されている。保護層37はTa(タンタル)などである。上記構成では非磁性層35がCu等の非磁性導電材料で形成された巨大磁気抵抗効果素子(GMR素子)であるが、Al23等の絶縁材料で形成されたトンネル型磁気抵抗効果素子(TMR素子)であってもよい。また図22に示す素子部12の積層構成は一例であって他の積層構成であってもよい。例えば、下からフリー磁性層36、非磁性層35、固定磁性層34、反強磁性層33及び保護層37の順に積層されてもよい。 The antiferromagnetic layer 33 is made of an antiferromagnetic material such as an Ir—Mn alloy (iridium-manganese alloy). The pinned magnetic layer 34 is formed of a soft magnetic material such as a Co—Fe alloy (cobalt-iron alloy). The nonmagnetic layer 35 is made of Cu (copper) or the like. The free magnetic layer 36 is made of a soft magnetic material such as a Ni—Fe alloy (nickel-iron alloy). The protective layer 37 is made of Ta (tantalum) or the like. In the above configuration, the nonmagnetic layer 35 is a giant magnetoresistive effect element (GMR element) formed of a nonmagnetic conductive material such as Cu, but a tunnel type magnetoresistive effect element formed of an insulating material such as Al 2 O 3. (TMR element) may be used. Further, the stacked configuration of the element section 12 shown in FIG. 22 is an example, and another stacked configuration may be used. For example, the free magnetic layer 36, the nonmagnetic layer 35, the pinned magnetic layer 34, the antiferromagnetic layer 33, and the protective layer 37 may be stacked in this order from the bottom.

素子部12では、反強磁性層33と固定磁性層34との反強磁性結合により、固定磁性層34の磁化方向が固定されている。図6及び図22に示すように、固定磁性層34の固定磁化方向(P方向)は、素子幅方向(Y1方向)に向いている。すなわち固定磁性層34の固定磁化方向(P方向)は、素子部12の長手方向と直交している。   In the element unit 12, the magnetization direction of the pinned magnetic layer 34 is fixed by antiferromagnetic coupling between the antiferromagnetic layer 33 and the pinned magnetic layer 34. As shown in FIGS. 6 and 22, the pinned magnetization direction (P direction) of the pinned magnetic layer 34 faces the element width direction (Y1 direction). That is, the fixed magnetization direction (P direction) of the fixed magnetic layer 34 is orthogonal to the longitudinal direction of the element portion 12.

一方、フリー磁性層36の磁化方向(F方向)は、外部磁場により変動する。
図21に示すように、固定磁性層34の固定磁化方向(P方向)と同一方向から外部磁場H1が作用してフリー磁性層36の磁化方向(F方向)が外部磁場H1方向に向くと、固定磁性層34の固定磁化方向(P方向)とフリー磁性層36の磁化方向(F方向)とが平行に近づき電気抵抗値が低下する。
On the other hand, the magnetization direction (F direction) of the free magnetic layer 36 varies depending on the external magnetic field.
As shown in FIG. 21, when the external magnetic field H1 acts from the same direction as the fixed magnetization direction (P direction) of the fixed magnetic layer 34 and the magnetization direction (F direction) of the free magnetic layer 36 faces the external magnetic field H1 direction, The fixed magnetization direction (P direction) of the fixed magnetic layer 34 and the magnetization direction (F direction) of the free magnetic layer 36 approach parallel to each other, and the electric resistance value decreases.

一方、図21に示すように、固定磁性層34の固定磁化方向(P方向)と反対方向から外部磁場H2が作用してフリー磁性層36の磁化方向(F方向)が外部磁場H2方向に向くと、固定磁性層34の固定磁化方向(P方向)とフリー磁性層36の磁化方向(F方向)とが反平行に近づき電気抵抗値が増大する。   On the other hand, as shown in FIG. 21, the external magnetic field H2 acts from the direction opposite to the fixed magnetization direction (P direction) of the fixed magnetic layer 34, and the magnetization direction (F direction) of the free magnetic layer 36 faces the external magnetic field H2. Then, the fixed magnetization direction (P direction) of the fixed magnetic layer 34 and the magnetization direction (F direction) of the free magnetic layer 36 approach antiparallel, and the electrical resistance value increases.

図6(b)に示すように磁気抵抗効果素子2,3は基板16上に形成される。磁気抵抗効果素子2,3上はAl23やSiO2等の絶縁層17に覆われる。また磁気抵抗効果素子2,3を構成する素子部12間も絶縁層17で埋められる。絶縁層17は例えばスパッタにて形成される。 As shown in FIG. 6B, the magnetoresistive elements 2 and 3 are formed on the substrate 16. The magnetoresistive elements 2 and 3 are covered with an insulating layer 17 such as Al 2 O 3 or SiO 2 . Also, the space between the element portions 12 constituting the magnetoresistive effect elements 2 and 3 is filled with the insulating layer 17. The insulating layer 17 is formed by sputtering, for example.

図6(b)のように絶縁層17の上面は、例えばCMP技術を用いて平坦面に形成されている。ただし、絶縁層17の上面は、素子部12と基板16間の段差に倣って、凹凸面で形成されていてもよい。図7(b)、図8(b)、図10(b)、図18(b)についても同様である。   As shown in FIG. 6B, the upper surface of the insulating layer 17 is formed on a flat surface by using, for example, a CMP technique. However, the upper surface of the insulating layer 17 may be formed as an uneven surface following the step between the element portion 12 and the substrate 16. The same applies to FIGS. 7B, 8B, 10B, and 18B.

図6に示すように、磁気抵抗効果素子2,3を構成する各素子部12の間、及び最も外側に位置する素子部12の外側に第2軟磁性体18が設けられている。第2軟磁性体18は例えばスパッタやメッキにて薄膜形成される。第2軟磁性体18は、NiFe、CoFe、CoFeSiBやCoZrNb等で形成される。この形態では第2軟磁性体18の幅寸法W4は素子部12の素子幅W3より小さくなっている。また、第2軟磁性体18の長さ寸法L4は素子部12の素子長さL3よりも長く、図6(a)に示すように、第2軟磁性体18は、素子部12の横方向(X1−X2方向)の両側から長手方向に延出する延出部18aを備える。   As shown in FIG. 6, the 2nd soft magnetic body 18 is provided between the element parts 12 which comprise the magnetoresistive effect elements 2 and 3, and the outer side of the element part 12 located in the outermost side. The second soft magnetic body 18 is formed into a thin film by sputtering or plating, for example. The second soft magnetic body 18 is made of NiFe, CoFe, CoFeSiB, CoZrNb, or the like. In this embodiment, the width dimension W4 of the second soft magnetic body 18 is smaller than the element width W3 of the element portion 12. In addition, the length dimension L4 of the second soft magnetic body 18 is longer than the element length L3 of the element section 12, and the second soft magnetic body 18 has a lateral direction of the element section 12 as shown in FIG. An extending portion 18a extending in the longitudinal direction from both sides (X1-X2 direction) is provided.

図6(b)に示すように、第2軟磁性体18は、素子部12間にある絶縁層17上に形成される。また図示しないが第2軟磁性体18上及び第2軟磁性体18間は絶縁性の保護層にて覆われている。   As shown in FIG. 6B, the second soft magnetic body 18 is formed on the insulating layer 17 between the element portions 12. Although not shown, the second soft magnetic body 18 and the second soft magnetic body 18 are covered with an insulating protective layer.

各寸法について説明する。
磁気抵抗効果素子2,3を構成する素子部12の素子幅W3は、地磁気センサとして使用する場合は形状異方性を利用するため、2〜6μmの範囲内である(図6(a)参照)。また素子部12の素子長さL3は、60〜100μmの範囲内である(図6(a)参照)。また、素子部12の膜厚T1は、200〜300Åの範囲内である(図6(b)参照)。また第2軟磁性体18の幅寸法W4は、この実施形態では、地磁気センサとして使用する場合、1〜6μmの範囲内である(図6(a)参照)。また第2軟磁性体18の長さ寸法L4は、80〜200μmの範囲内である(図6(a)参照)。また、第2軟磁性体18の膜厚T2は、0.2〜1μmの範囲内である(図6(b)参照)。素子部12のアスペクト比(素子長さL3/素子幅W3)は、地磁気センサとして使用する場合は10以上である。また第2軟磁性体18のアスペクト比(長さ寸法L4/幅寸法W4)は、素子部12のアスペクト比以上であると好適である。また第2軟磁性体18の延出部18aの長さ寸法T8は、20μm以上である(図6(a)参照)。
Each dimension will be described.
The element width W3 of the element portion 12 constituting the magnetoresistive effect elements 2 and 3 is in the range of 2 to 6 μm in order to use shape anisotropy when used as a geomagnetic sensor (see FIG. 6A). ). Moreover, the element length L3 of the element part 12 exists in the range of 60-100 micrometers (refer Fig.6 (a)). The film thickness T1 of the element portion 12 is in the range of 200 to 300 mm (see FIG. 6B). In this embodiment, the width dimension W4 of the second soft magnetic body 18 is in the range of 1 to 6 μm when used as a geomagnetic sensor (see FIG. 6A). The length L4 of the second soft magnetic body 18 is in the range of 80 to 200 μm (see FIG. 6A). The film thickness T2 of the second soft magnetic body 18 is in the range of 0.2 to 1 μm (see FIG. 6B). The aspect ratio (element length L3 / element width W3) of the element portion 12 is 10 or more when used as a geomagnetic sensor. The aspect ratio (length dimension L4 / width dimension W4) of the second soft magnetic body 18 is preferably equal to or greater than the aspect ratio of the element portion 12. Moreover, the length dimension T8 of the extending portion 18a of the second soft magnetic body 18 is 20 μm or more (see FIG. 6A).

図6の実施形態における各第2軟磁性体18間の距離(Y1−Y2方向への距離)T3は、第2軟磁性体の幅寸法W4以上で2〜8μmである(図6(b)参照)。また、素子部12と隣接した位置にある第2軟磁性体18とのY1−Y2方向への距離T4は、0<T4<3μmである(図6(b)参照)。また、第2軟磁性体18と素子部12間の高さ方向(Z方向)への距離T5は、0.1〜1μmである(図6(b)参照)。   The distance (distance in the Y1-Y2 direction) T3 between the second soft magnetic bodies 18 in the embodiment of FIG. 6 is 2 to 8 μm in the width dimension W4 or more of the second soft magnetic bodies (FIG. 6B). reference). The distance T4 in the Y1-Y2 direction between the second soft magnetic body 18 located adjacent to the element portion 12 is 0 <T4 <3 μm (see FIG. 6B). The distance T5 in the height direction (Z direction) between the second soft magnetic body 18 and the element portion 12 is 0.1 to 1 μm (see FIG. 6B).

次に、図7に示す実施形態では、図6と異なって、第2軟磁性体18が各素子部12の真上に絶縁層17を介して配置されている。また図8に示す実施形態では、図1と異なって、第2軟磁性体18が各素子部12の真下に絶縁層17を介して配置されている。図8では基板16上に第2軟磁性体18が形成され、第2軟磁性体18上から第2軟磁性体18間の基板16上にかけて絶縁層17が形成され、絶縁層17上に磁気抵抗効果素子2,3が形成された構成である。図8のように素子部12の真下に第2軟磁性体18を配置する形態では、第2軟磁性体18に対して例えばアニール処理を施したいとき素子部12を形成する前に処理を行うことができ素子部12に対する影響を抑制できる。   Next, in the embodiment shown in FIG. 7, unlike FIG. 6, the second soft magnetic body 18 is arranged directly above each element portion 12 via the insulating layer 17. Further, in the embodiment shown in FIG. 8, unlike FIG. 1, the second soft magnetic body 18 is disposed directly below each element portion 12 via the insulating layer 17. In FIG. 8, the second soft magnetic body 18 is formed on the substrate 16, the insulating layer 17 is formed on the substrate 16 between the second soft magnetic body 18 and the second soft magnetic body 18, and the magnetic layer is formed on the insulating layer 17. In this configuration, resistance effect elements 2 and 3 are formed. In the embodiment in which the second soft magnetic body 18 is disposed directly below the element portion 12 as shown in FIG. 8, the second soft magnetic body 18 is processed before forming the element portion 12 when, for example, an annealing process is desired. The influence on the element part 12 can be suppressed.

図7,図8に示す実施形態でも図6と同様に、第2軟磁性体18の幅寸法W4は素子幅W3より小さくなっている。また第2軟磁性体18の長さ寸法L4は素子長さL3より長く第2軟磁性体18には素子部12の長手方向(X方向)の両側から長手方向に延出する延出部18aが形成されている。   In the embodiment shown in FIGS. 7 and 8, the width dimension W4 of the second soft magnetic body 18 is smaller than the element width W3, as in FIG. The length L4 of the second soft magnetic body 18 is longer than the element length L3, and the second soft magnetic body 18 has an extending portion 18a extending in the longitudinal direction from both sides in the longitudinal direction (X direction) of the element portion 12. Is formed.

図7,図8に示す実施形態では、幅寸法W4が素子幅W3より小さい第2軟磁性体18が平面視にて素子部12の素子幅W3内に収まるように(素子幅W3方向にはみ出さないように)配置されている。   In the embodiment shown in FIGS. 7 and 8, the second soft magnetic body 18 whose width dimension W4 is smaller than the element width W3 is within the element width W3 of the element portion 12 in plan view (extrudes in the element width W3 direction). Is arranged).

図7,図8に示す形態における素子幅W3は5〜8μmである。第2軟磁性体18の幅寸法W4は、地磁気センサとして使用する場合、W3より狭くかつ、2〜6μmの範囲内である(図7(a)、図8(a)参照)。   The element width W3 in the embodiment shown in FIGS. 7 and 8 is 5 to 8 μm. When used as a geomagnetic sensor, the width dimension W4 of the second soft magnetic body 18 is narrower than W3 and within a range of 2 to 6 μm (see FIGS. 7A and 8A).

図7(b),図8(b)に示す第2軟磁性体18間の距離(Y1−Y2方向への距離)T6は、6〜10μmである。また第2軟磁性体18と素子部12間の高さ方向(Z方向)への距離T7は、0.1〜1μmである。   The distance (distance in the Y1-Y2 direction) T6 between the second soft magnetic bodies 18 shown in FIGS. 7B and 8B is 6 to 10 μm. A distance T7 in the height direction (Z direction) between the second soft magnetic body 18 and the element portion 12 is 0.1 to 1 μm.

本実施形態における磁気センサ1は、縦方向(Y1−Y2方向;素子幅方向)からの地磁気を検知するためのものである。よって図示Y1−Y2方向が感度軸方向であり、横方向(X1−X2方向)が素子部12の長手方向である。固定磁性層34の固定磁化方向(P方向)は感度軸方向であるY1方向に向けられている。   The magnetic sensor 1 in this embodiment is for detecting geomagnetism from the vertical direction (Y1-Y2 direction; element width direction). Therefore, the Y1-Y2 direction shown in the figure is the sensitivity axis direction, and the lateral direction (X1-X2 direction) is the longitudinal direction of the element portion 12. The fixed magnetization direction (P direction) of the fixed magnetic layer 34 is oriented in the Y1 direction, which is the sensitivity axis direction.

本実施形態では、素子部12と非接触の第2軟磁性体18を設けている。第2軟磁性体18は、素子部12と同様に、横方向(X1−X2方向)に細長い形状で、素子部12及び第2軟磁性体18には磁化容易軸方向が共に同じ方向となる形状異方性が付与される。また第2軟磁性体18の透磁率は素子部12の透磁率よりも大きい。   In the present embodiment, the second soft magnetic body 18 that is not in contact with the element portion 12 is provided. The second soft magnetic body 18 has a shape elongated in the lateral direction (X1-X2 direction), similar to the element section 12, and both the easy magnetization axis directions of the element section 12 and the second soft magnetic body 18 are the same direction. Shape anisotropy is imparted. Further, the magnetic permeability of the second soft magnetic body 18 is larger than the magnetic permeability of the element portion 12.

さらに本実施形態における第2軟磁性体18は、磁気抵抗効果素子2,3を構成する各素子部12の横方向(X方向)の両側から横方向に延出する延出部18aを備える。   Furthermore, the second soft magnetic body 18 in the present embodiment includes an extending portion 18 a extending in the lateral direction from both sides in the lateral direction (X direction) of each element portion 12 constituting the magnetoresistive effect elements 2 and 3.

このため、横方向(X1−X2方向)から外部磁場が作用しても、磁場は、第2軟磁性体18を優先的に通過しやすい。したがって、第2軟磁性体18は、感度軸方向と直交する横方向への磁気シールド効果を発揮する。一方、感度軸方向(Y1−Y2方向)からの外部磁場(地磁気)に対しては磁気センサとしての感度を保つことができ、地磁気の磁界強度に基づいて電気抵抗値の大きさが変動し、Y1−Y2方向からの地磁気を適切に検知することが出来る。   For this reason, even if an external magnetic field acts from the lateral direction (X1-X2 direction), the magnetic field easily passes through the second soft magnetic body 18 with priority. Therefore, the second soft magnetic body 18 exhibits a magnetic shielding effect in the lateral direction orthogonal to the sensitivity axis direction. On the other hand, the sensitivity as a magnetic sensor can be maintained with respect to an external magnetic field (geomagnetism) from the sensitivity axis direction (Y1-Y2 direction), and the magnitude of the electric resistance value varies based on the magnetic field strength of the geomagnetism. The geomagnetism from the Y1-Y2 direction can be detected appropriately.

また本実施形態では、図9のように、第2軟磁性体18の幅寸法W4が素子部12の素子幅W3と同じでも、あるいは、図10のように第2軟磁性体18の幅寸法W4が素子部12の素子幅W3より大きくても、素子部12と第2軟磁性体18との縦方向(Y1−Y2方向)への距離T9(図10(b))や素子部12と第2軟磁性体18との高さ方向への距離T10(図10(b))を併せて適切に調整することで、第2軟磁性体18により、感度軸方向と直交する横方向(X1−X2方向)への磁気シールド効果が適切に発揮され、且つ、感度軸方向(Y1−Y2方向)からの外部磁場(地磁気)に対しては磁気センサとしての感度を保つことが可能である。第2軟磁性体18と素子部12との縦方向(Y1−Y2方向)への距離T9は、0〜3μmの範囲内であることが好ましい。また、素子部12と第2軟磁性体18との高さ方向への距離T10は、0.1〜1μmの範囲内であることが好ましい。第2軟磁性体18間の縦方向(Y1−Y2方向)への距離T12は、2≦T12≦6μmの範囲内であることが好ましい。   In this embodiment, the width dimension W4 of the second soft magnetic body 18 is the same as the element width W3 of the element section 12 as shown in FIG. 9, or the width dimension of the second soft magnetic body 18 as shown in FIG. Even if W4 is larger than the element width W3 of the element part 12, the distance T9 (FIG. 10B) in the longitudinal direction (Y1-Y2 direction) between the element part 12 and the second soft magnetic body 18 and the element part 12 By appropriately adjusting the distance T10 (FIG. 10B) in the height direction from the second soft magnetic body 18 together, the second soft magnetic body 18 causes the lateral direction (X1) orthogonal to the sensitivity axis direction. The magnetic shield effect in the −X2 direction) is appropriately exhibited, and the sensitivity as a magnetic sensor can be maintained with respect to the external magnetic field (geomagnetism) from the sensitivity axis direction (Y1-Y2 direction). The distance T9 in the vertical direction (Y1-Y2 direction) between the second soft magnetic body 18 and the element portion 12 is preferably in the range of 0 to 3 μm. Moreover, it is preferable that the distance T10 of the element part 12 and the 2nd soft magnetic body 18 in the height direction exists in the range of 0.1-1 micrometer. The distance T12 in the longitudinal direction (Y1-Y2 direction) between the second soft magnetic bodies 18 is preferably in the range of 2 ≦ T12 ≦ 6 μm.

また図11に示す実施形態は、図7(a)に示す磁気抵抗効果素子2,3の構成を一部改良したものである。図11では、磁気抵抗効果素子2,3を構成する縦方向(Y1−Y2方向)両側に位置する素子部12の両外側面12aよりもさらに外側に第2軟磁性体24が形成されている。   Further, the embodiment shown in FIG. 11 is obtained by partially improving the configuration of the magnetoresistive effect elements 2 and 3 shown in FIG. In FIG. 11, the second soft magnetic body 24 is formed on the outer side of the outer side surfaces 12 a of the element portion 12 located on both sides of the longitudinal direction (Y1-Y2 direction) constituting the magnetoresistive effect elements 2 and 3. .

図11のように、素子部12のさらに外側に第2軟磁性体24を設けることで、感度軸方向と直交する横方向(X1−X2方向)からの磁場に対する磁気シールド効果をより効果的に向上できる。なお図6(a)、図9、図10の実施形態については、既に、素子部12の外側に第2軟磁性体18が存在するが、図6(a)、図9、図10の実施形態においても、そのさらに両側に第2軟磁性体24を設けることで、より効果的に感度軸方向と直交する横方向(X1−X2方向)からの磁場に対する磁気シールド効果を向上させることができる。   As shown in FIG. 11, by providing the second soft magnetic body 24 on the outer side of the element unit 12, the magnetic shielding effect against the magnetic field from the lateral direction (X1-X2 direction) orthogonal to the sensitivity axis direction is more effectively achieved. Can be improved. 6 (a), FIG. 9, and FIG. 10, the second soft magnetic body 18 already exists outside the element portion 12, but the implementation of FIG. 6 (a), FIG. 9, and FIG. Also in the embodiment, by providing the second soft magnetic body 24 on both sides thereof, the magnetic shielding effect against the magnetic field from the lateral direction (X1-X2 direction) orthogonal to the sensitivity axis direction can be improved more effectively. .

図12に示す実施形態では、複数の素子部12が横方向(X1−X2方向)に間隔を空けて並設され、各素子部12の間に空けられた間隔内に中間永久磁石層60が介在している。これにより各素子部12が中間永久磁石層60を介して連結された横方向(X1−X2方向)に帯状に延びる素子連結体61が構成される。素子連結体61は、縦方向(Y1−Y2方向)に間隔を空けて複数本並設され、各素子連結体61の端部間が接続層62にて接続されてミアンダ形状の磁気抵抗効果素子2,3が構成されている。なお前記接続層62は永久磁石でも非磁性の電極であってもよい。   In the embodiment shown in FIG. 12, a plurality of element parts 12 are arranged in parallel in the lateral direction (X1-X2 direction), and the intermediate permanent magnet layer 60 is formed in the gaps between the element parts 12. Intervene. Thereby, the element coupling body 61 extending in a strip shape in the lateral direction (X1-X2 direction) in which the element portions 12 are coupled via the intermediate permanent magnet layer 60 is configured. A plurality of element coupling bodies 61 are arranged in parallel in the vertical direction (Y1-Y2 direction), and the end portions of each element coupling body 61 are connected by a connection layer 62 to form a meander-shaped magnetoresistive effect element. 2 and 3 are configured. The connection layer 62 may be a permanent magnet or a nonmagnetic electrode.

図12の実施形態では、複数の素子部12を、中間永久磁石層60及び接続層62にて連結してトータルの素子長さが長くなるミアンダ形状としているため、素子抵抗を大きくでき、消費電力の低減を図ることが可能である。   In the embodiment of FIG. 12, since the plurality of element portions 12 are connected by the intermediate permanent magnet layer 60 and the connection layer 62 and have a meander shape that increases the total element length, the element resistance can be increased and the power consumption can be increased. Can be reduced.

また図12の実施形態では、複数の素子部12を中間永久磁石層60を介して連結した素子連結体61を形成し、複数の素子連結体61を素子幅方向に並設して、各素子連結体61の端部間を接続層62により接続している。よって、全ての素子部12を縦方向(Y1−Y2方向)に間隔を空けて並設し、各素子部12の端部間を接続層62で連結した形態に比べて(中間永久磁石層60を設けない形態)、縦方向(Y1−Y2方向)への磁気抵抗効果素子2,3の長さ寸法を小さくできる。   In the embodiment of FIG. 12, an element coupling body 61 in which a plurality of element portions 12 are coupled via the intermediate permanent magnet layer 60 is formed, and the plurality of element coupling bodies 61 are arranged side by side in the element width direction. End portions of the coupling body 61 are connected by a connection layer 62. Therefore, as compared with a configuration in which all the element portions 12 are arranged in parallel in the vertical direction (Y1-Y2 direction) and the end portions of each element portion 12 are connected by the connection layer 62 (intermediate permanent magnet layer 60). In the vertical direction (Y1-Y2 direction), the length of the magnetoresistive effect elements 2 and 3 in the vertical direction (Y1-Y2 direction) can be reduced.

この図12に示す実施形態でも図6等と同様に各素子連結体61間、及び素子幅方向にて最も外側に位置する素子連結体61の外側に第2軟磁性体18が形成されている。なお第2軟磁性体18間の間隔は図10の距離T12と同じで、2≦T12≦6μmである。   In the embodiment shown in FIG. 12, the second soft magnetic body 18 is formed between the element coupling bodies 61 and outside the element coupling body 61 located on the outermost side in the element width direction as in FIG. . The interval between the second soft magnetic bodies 18 is the same as the distance T12 in FIG. 10, and 2 ≦ T12 ≦ 6 μm.

図13は図12の変形例である。図13に示す実施形態では、磁気抵抗効果素子2,3は、素子連結体61の端部間を接続する接続層62が、Y方向に直線状(帯状)で形成され、前記接続層62が、絶縁層を介し前記第2軟磁性体18の下側を通っている。すなわち、接続層62と第2軟磁性体18とが高さ方向(図示Z方向)にて交差している。前記接続層62は、Al、Au、あるいはCu等の良導体で形成される。   FIG. 13 is a modification of FIG. In the embodiment shown in FIG. 13, in the magnetoresistive effect elements 2 and 3, the connection layer 62 that connects between the end portions of the element coupling body 61 is formed in a straight line shape (band shape) in the Y direction. The second soft magnetic body 18 passes through the insulating layer. That is, the connection layer 62 and the second soft magnetic body 18 intersect each other in the height direction (Z direction in the drawing). The connection layer 62 is made of a good conductor such as Al, Au, or Cu.

電極層62は軟磁性体18と電気的に絶縁されていればよく、軟磁性体18の上部に形成されてもよい。   The electrode layer 62 only needs to be electrically insulated from the soft magnetic body 18 and may be formed on the soft magnetic body 18.

図12では、接続層62が平面的に第2軟磁性体18を迂回するように形成されていたが、図13では、接続層62と第2軟磁性体18とを高さ方向(図示Z方向)にて交差させているため、磁気抵抗効果素子2,3の図示X方向への長さ寸法を小さくできるとともに、磁気抵抗効果に関与しない電極層62の配線抵抗も低減でき、センサ特性が向上する。また接続層62と第2軟磁性体18間の絶縁性が低く、仮にショートしたとしても、ミアンダ形状の為電極層19と交差する側と反対側でショートすることが無く、バイパス回路が発生しないため、センサ特性にさほどの影響は無い。また接続層62を非磁性の良導体で形成することで、接続層62を永久磁石層で形成する形態に比べて寄生抵抗を低減できるし、永久磁石層で形成するとバイアス磁界の影響が第2軟磁性体18に影響しシールド効果が低下するが、本実施形態では、そのような問題も生じない。   In FIG. 12, the connection layer 62 is formed so as to bypass the second soft magnetic body 18 in a plane, but in FIG. 13, the connection layer 62 and the second soft magnetic body 18 are arranged in the height direction (Z in the drawing). Direction), the length of the magnetoresistive effect elements 2 and 3 in the X direction shown in the figure can be reduced, and the wiring resistance of the electrode layer 62 not involved in the magnetoresistive effect can be reduced, resulting in sensor characteristics. improves. In addition, the insulation between the connection layer 62 and the second soft magnetic body 18 is low, and even if a short circuit occurs, there is no short circuit on the side opposite to the side intersecting the electrode layer 19 due to the meander shape, and no bypass circuit is generated. Therefore, there is no significant influence on the sensor characteristics. Further, by forming the connection layer 62 with a nonmagnetic good conductor, the parasitic resistance can be reduced as compared with the configuration in which the connection layer 62 is formed with a permanent magnet layer. Although the magnetic body 18 is affected and the shielding effect is lowered, such a problem does not occur in the present embodiment.

図14の断面図に示すように、各素子部12を構成する反強磁性層33、固定磁性層34及び非磁性層35は永久磁石層60の形成位置で分断されておらず一体化している。すなわち、永久磁石層60の形成位置では、素子部12を構成する保護層37及びフリー磁性層36がイオンミリング等で削られて凹部63が形成される。よって凹部63の底面63aには非磁性層35が露出している。なお非磁性層35の一部まで削られて凹部63が形成されてもよい。そして、この凹部63内に永久磁石層60が設けられている。図14の構成により固定磁性層34が分断されないため、固定磁性層34の磁化を図示Y方向に安定化でき、一軸異方性を向上させることができる。また固定磁性層34及び反強磁性層33まで分断して各素子部12間に永久磁石層60を設けた構成では、永久磁石層60と素子部12との電気的コンタクトは各側面となるため寄生抵抗が大きくなりやすいが、本実施形態のように永久磁石層60と素子部12との電気的コンタクトが平面接触となることで寄生抵抗を低減させることが出来る。   As shown in the cross-sectional view of FIG. 14, the antiferromagnetic layer 33, the pinned magnetic layer 34, and the nonmagnetic layer 35 constituting each element unit 12 are not divided at the formation position of the permanent magnet layer 60 and are integrated. . That is, at the position where the permanent magnet layer 60 is formed, the protective layer 37 and the free magnetic layer 36 constituting the element portion 12 are scraped by ion milling or the like to form the recess 63. Therefore, the nonmagnetic layer 35 is exposed on the bottom surface 63 a of the recess 63. Note that the recess 63 may be formed by cutting a part of the nonmagnetic layer 35. A permanent magnet layer 60 is provided in the recess 63. Since the pinned magnetic layer 34 is not divided by the configuration shown in FIG. 14, the magnetization of the pinned magnetic layer 34 can be stabilized in the Y direction in the drawing, and the uniaxial anisotropy can be improved. Further, in the configuration in which the permanent magnet layer 60 is provided between the element portions 12 by dividing the pinned magnetic layer 34 and the antiferromagnetic layer 33, electrical contact between the permanent magnet layer 60 and the element portion 12 is on each side. Although the parasitic resistance tends to increase, the parasitic resistance can be reduced by making the electrical contact between the permanent magnet layer 60 and the element portion 12 planar contact as in the present embodiment.

また図14に示すように永久磁石層60の上面には、永久磁石層60よりも抵抗値が小さい低抵抗層64が重ねて形成されている。低抵抗層64はAu、Al、Cu等の非磁性の良導体で形成されることが好適である。低抵抗層64は、永久磁石層60と同様にスパッタあるいはメッキ等で形成される。図14に示すように永久磁石層60上に低抵抗層64を重ねて形成することで、より効果的に、寄生抵抗を低減できる。   Further, as shown in FIG. 14, a low resistance layer 64 having a resistance value smaller than that of the permanent magnet layer 60 is formed on the upper surface of the permanent magnet layer 60 in an overlapping manner. The low resistance layer 64 is preferably formed of a nonmagnetic good conductor such as Au, Al, or Cu. The low resistance layer 64 is formed by sputtering or plating in the same manner as the permanent magnet layer 60. As shown in FIG. 14, by forming the low resistance layer 64 on the permanent magnet layer 60, the parasitic resistance can be reduced more effectively.

また永久磁石層60間に挟まれた部分の素子部12のアスペクト比(素子長さL11/素子幅W3)(図15参照)が大きくなると、永久磁石層60からのバイアス磁界が素子部12の全体に適切に供給されなくなる。このため感度軸方向に対して直交方向(X方向)から磁界を作用させ、磁界強度を徐々に強くしていったときの抵抗変化領域にヒステリシスが生じやすくなる。よって直交方向からの磁界(外乱磁場)に対する抵抗変化領域が広がることで、外乱磁場耐性が低下しやすくなる。したがって、素子部12の全体に適切にバイアス磁界を供給して外乱磁場耐性を向上させるため素子部12のアスペクト比は小さいことが好ましい。具体的には素子部12のアスペクト比は3以下であることが好ましく、1より小さいことがより好ましい。   Further, when the aspect ratio (element length L11 / element width W3) (see FIG. 15) of the element portion 12 sandwiched between the permanent magnet layers 60 is increased, the bias magnetic field from the permanent magnet layer 60 is reduced. It will not be properly supplied to the whole. For this reason, hysteresis tends to occur in the resistance change region when the magnetic field is applied from the direction orthogonal to the sensitivity axis direction (X direction) and the magnetic field strength is gradually increased. Therefore, the resistance change area with respect to the magnetic field (disturbance magnetic field) from the orthogonal direction is widened, so that the disturbance magnetic field resistance is easily lowered. Therefore, it is preferable that the aspect ratio of the element unit 12 is small in order to appropriately supply a bias magnetic field to the entire element unit 12 to improve disturbance magnetic field resistance. Specifically, the aspect ratio of the element portion 12 is preferably 3 or less, more preferably less than 1.

図16に示す実施形態では、磁気抵抗効果素子2,3は、素子幅W3に比べて素子長さL3が長く形成された縦方向(Y1−Y2方向)に細長い形状の複数の素子部12が横方向(X1−X2方向)に所定の間隔を空けて並設され、各素子部12の端部間が接続電極部13により電気的に接続されてミアンダ形状となっている。本実施形態では素子部12間を連結する電極部13,15を素子部12よりも十分に抵抗の小さい材質で形成できるから、素子部12間を永久磁石層で連結していた従来に比べて寄生抵抗を小さくできる。接続電極部13及び電極部15はスパッタやメッキで形成される。   In the embodiment shown in FIG. 16, the magnetoresistive effect elements 2 and 3 have a plurality of element portions 12 that are elongated in the longitudinal direction (Y1-Y2 direction) in which the element length L3 is formed longer than the element width W3. The elements are arranged side by side in the horizontal direction (X1-X2 direction) with a predetermined interval, and the end portions of the element portions 12 are electrically connected by the connection electrode portion 13 to form a meander shape. In this embodiment, since the electrode parts 13 and 15 which connect between the element parts 12 can be formed with a material whose resistance is sufficiently smaller than that of the element parts 12, compared with the conventional case where the element parts 12 are connected by a permanent magnet layer. Parasitic resistance can be reduced. The connection electrode portion 13 and the electrode portion 15 are formed by sputtering or plating.

図16の実施形態では、固定磁性層34の固定磁化方向(P方向)は、縦方向(Y1−Y2方向)に向いている。すなわち固定磁性層34の固定磁化方向(P方向)は、素子部12の長手方向である。   In the embodiment of FIG. 16, the pinned magnetization direction (P direction) of the pinned magnetic layer 34 is oriented in the longitudinal direction (Y1-Y2 direction). That is, the fixed magnetization direction (P direction) of the fixed magnetic layer 34 is the longitudinal direction of the element portion 12.

図16に示すように、各素子部12の横方向(X1−X2方向)の両側には間隔を空けて永久磁石層19が配置されている。永久磁石層19は、横方向(X1−X2方向)と同方向に向く幅寸法がW10で、縦方向(Y1−Y2方向)に向く長さ寸法がL10で形成されている。長さ寸法L10は幅寸法W10より大きく、永久磁石層19は、縦方向(Y1−Y2方向)に延びる細長形状である。   As shown in FIG. 16, permanent magnet layers 19 are arranged on both sides of each element portion 12 in the lateral direction (X1-X2 direction) with a space therebetween. The permanent magnet layer 19 has a width dimension W10 facing in the same direction as the horizontal direction (X1-X2 direction) and a length dimension L10 facing the vertical direction (Y1-Y2 direction). The length dimension L10 is larger than the width dimension W10, and the permanent magnet layer 19 has an elongated shape extending in the longitudinal direction (Y1-Y2 direction).

永久磁石層19は、CoPtやCoPtCr等の硬磁性材料で形成される。永久磁石層19は例えばスパッタで形成される。   The permanent magnet layer 19 is made of a hard magnetic material such as CoPt or CoPtCr. The permanent magnet layer 19 is formed by sputtering, for example.

図16の実施形態では、永久磁石層19から素子部12に横方向(X1−X2方向)からバイアス磁界が供給される。この結果、フリー磁性層36の磁化方向(F方向)は横方向(X1−X2方向)に向けられる。   In the embodiment of FIG. 16, a bias magnetic field is supplied from the permanent magnet layer 19 to the element unit 12 from the lateral direction (X1-X2 direction). As a result, the magnetization direction (F direction) of the free magnetic layer 36 is directed in the lateral direction (X1-X2 direction).

図16に示す実施形態では、固定磁性層34の固定磁化方向(P方向)が磁化容易軸方向である縦方向(Y1−Y2方向;素子長さ方向)を向いている。一方、素子幅方向(X1−X2方向)が磁化困難軸方向である。   In the embodiment shown in FIG. 16, the fixed magnetization direction (P direction) of the fixed magnetic layer 34 faces the longitudinal direction (Y1-Y2 direction; element length direction) which is the easy axis direction. On the other hand, the element width direction (X1-X2 direction) is the hard axis direction.

図16の構成により感度軸方向への磁場に対する磁気感度を良好に保ちつつ、感度軸方向と直交する横方向からの磁場に対して磁気感度を低下させることができる。   With the configuration of FIG. 16, it is possible to reduce the magnetic sensitivity with respect to the magnetic field from the lateral direction orthogonal to the sensitivity axis direction while maintaining good magnetic sensitivity to the magnetic field in the sensitivity axis direction.

図17の実施形態では図16と異なって、横方向(X1−X2方向)の両側に位置する素子部12の外側にのみ一対の永久磁石層19が配置されている。図16のように各素子部12の両側方に永久磁石層19を配置しなくても、素子部12の全体に大きなバイアス磁界を供給できれば、図17のような配置でもよい。   In the embodiment of FIG. 17, unlike FIG. 16, the pair of permanent magnet layers 19 is disposed only outside the element portion 12 located on both sides in the lateral direction (X1-X2 direction). Even if the permanent magnet layers 19 are not arranged on both sides of each element portion 12 as shown in FIG. 16, the arrangement as shown in FIG. 17 may be used as long as a large bias magnetic field can be supplied to the entire element portion 12.

この図16、図17に示す実施形態でも横方向からの磁場に対して磁気シールド効果を発揮する第2軟磁性体18が、横方向(X1−X2方向)を長手方向として形成されている。第2軟磁性体18は、図16(b)に示す永久磁石層19上や素子部12上を覆う図示しない絶縁層(図6(b)の絶縁層17に相当)上に形成される。   In the embodiment shown in FIGS. 16 and 17, the second soft magnetic body 18 that exhibits a magnetic shielding effect against a magnetic field from the lateral direction is formed with the lateral direction (X1-X2 direction) as the longitudinal direction. The second soft magnetic body 18 is formed on an insulating layer (not shown) (corresponding to the insulating layer 17 in FIG. 6B) that covers the permanent magnet layer 19 and the element portion 12 shown in FIG.

次に、磁気センサ1を構成する固定抵抗素子4,5の構成について説明する。
図18(a)に示すように、本実施形態では、固定抵抗素子4,5も磁気抵抗効果素子2,3と同じ素子部12を備える。すなわち、図22で説明した積層構造を備える。固定抵抗素子4,5の素子幅はW1で、素子長さはL1である。固定抵抗素子4,5の素子部12の素子幅W1及び素子長さL1を、磁気抵抗効果素子2,3の素子部12の素子幅W3及び素子長さL3と同等に出来る(図6等参照)。
Next, the configuration of the fixed resistance elements 4 and 5 constituting the magnetic sensor 1 will be described.
As shown in FIG. 18A, in the present embodiment, the fixed resistance elements 4 and 5 also include the same element portion 12 as the magnetoresistive effect elements 2 and 3. That is, the stacked structure described in FIG. 22 is provided. The fixed resistor elements 4 and 5 have an element width W1 and an element length L1. The element width W1 and the element length L1 of the element portion 12 of the fixed resistance elements 4 and 5 can be made equal to the element width W3 and the element length L3 of the element portion 12 of the magnetoresistive effect elements 2 and 3 (see FIG. 6 and the like). ).

また固定抵抗素子4,5を構成する素子部12も端部どうしが接続電極部13を介して接続されミアンダ形状となっている。   Further, the end portions of the element portion 12 constituting the fixed resistance elements 4 and 5 are connected to each other through the connection electrode portion 13 and have a meander shape.

図18(a)に示すように固定抵抗素子4,5を構成する各素子部12は横方向(X1−X2方向)を長手方向として形成される。   As shown in FIG. 18A, each element portion 12 constituting the fixed resistance elements 4 and 5 is formed with the horizontal direction (X1-X2 direction) as the longitudinal direction.

図1(b)に示すように、固定抵抗素子4,5も磁気抵抗効果素子2,3と同様に基板16上に形成される。そして磁気抵抗効果素子2,3上を覆う絶縁層17にて固定抵抗素子4,5上も覆われ、固定抵抗素子4,5の上方には絶縁層17を介して第1軟磁性体23が配置されている。   As shown in FIG. 1B, the fixed resistance elements 4 and 5 are also formed on the substrate 16 in the same manner as the magnetoresistance effect elements 2 and 3. The fixed resistance elements 4 and 5 are also covered with the insulating layer 17 covering the magnetoresistive effect elements 2 and 3, and the first soft magnetic body 23 is disposed above the fixed resistance elements 4 and 5 via the insulating layer 17. Has been placed.

第1軟磁性体23は例えばスパッタやメッキにて薄膜形成される。第1軟磁性体23は、NiFe、CoFe、CoFeSiBやCoZrNb等で形成される。   The first soft magnetic body 23 is formed as a thin film by sputtering or plating, for example. The first soft magnetic body 23 is made of NiFe, CoFe, CoFeSiB, CoZrNb, or the like.

図18では、固定抵抗素子4,5を構成する素子部12、及び第1軟磁性体23には、磁化容易軸方向が共に同じ方向の形状異方性が付与される。   In FIG. 18, shape anisotropy is imparted to the element portion 12 constituting the fixed resistance elements 4 and 5 and the first soft magnetic body 23 in the same easy axis direction.

第1軟磁性体23は、固定抵抗素子4,5を構成する素子幅W1と同方向(X1−X2方向)に幅寸法W2で、素子長さL1と同方向(Y1−Y2方向)に長さ寸法L2で形成される。幅寸法W2は素子幅W1より大きく、第1軟磁性体23は素子部12の素子幅の両側から素子幅方向に延出する延出部23aを備える。また、長さ寸法L2は素子長さL1よりも大きく、第1軟磁性体23は、素子部12の横方向(X1−X2方向)の両側から横方向に延出する延出部23bを備える。また図1(a)に示すように長さ寸法L4は幅寸法W4より大きい。   The first soft magnetic body 23 has a width dimension W2 in the same direction (X1-X2 direction) as the element width W1 constituting the fixed resistance elements 4 and 5, and is long in the same direction (Y1-Y2 direction) as the element length L1. It is formed with a length L2. The width dimension W2 is larger than the element width W1, and the first soft magnetic body 23 includes extending portions 23a extending in the element width direction from both sides of the element width of the element portion 12. Further, the length dimension L2 is larger than the element length L1, and the first soft magnetic body 23 includes extending portions 23b extending in the lateral direction from both sides of the element portion 12 in the lateral direction (X1-X2 direction). . As shown in FIG. 1A, the length dimension L4 is larger than the width dimension W4.

固定抵抗素子4,5を構成する素子部12の固定磁性層34の固定磁化方向(P方向)は、縦方向(Y1−Y2)に向けられてもよいし、横方向(X1−X2方向)に向けられていてもよい。   The fixed magnetization direction (P direction) of the fixed magnetic layer 34 of the element unit 12 constituting the fixed resistance elements 4 and 5 may be directed in the vertical direction (Y1-Y2) or in the horizontal direction (X1-X2 direction). May be directed to.

素子幅寸法W1は、地磁気センサとして使用する場合は2〜6μm程度、第1軟磁性体23の幅寸法W2は、素子幅W1以上かつ、6〜10μmである(図18(a)参照)。また第1軟磁性体23の長さ寸法L2は、80〜200μmである(図18(a)参照)。第1軟磁性体23のアスペクト比(長さ寸法L2/幅寸法W2)は、10以上である。また各第1軟磁性体23間の距離(X方向への距離)T13は、2μm以上である(図18(b)参照)。   The element width dimension W1 is about 2 to 6 μm when used as a geomagnetic sensor, and the width dimension W2 of the first soft magnetic body 23 is not less than the element width W1 and 6 to 10 μm (see FIG. 18A). The length dimension L2 of the first soft magnetic body 23 is 80 to 200 μm (see FIG. 18A). The aspect ratio (length dimension L2 / width dimension W2) of the first soft magnetic body 23 is 10 or more. The distance between the first soft magnetic bodies 23 (distance in the X direction) T13 is 2 μm or more (see FIG. 18B).

第1軟磁性体23の膜厚は、第2軟磁性体18の膜厚T2と同じであり、第1軟磁性体23と素子部12間の高さ方向(Z方向)への距離T14は、第2軟磁性体18と素子部12間の高さ方向(Z方向)への距離T5と同じである(図6(b)参照)。   The film thickness of the first soft magnetic body 23 is the same as the film thickness T2 of the second soft magnetic body 18, and the distance T14 between the first soft magnetic body 23 and the element portion 12 in the height direction (Z direction) is The distance T5 in the height direction (Z direction) between the second soft magnetic body 18 and the element portion 12 is the same (see FIG. 6B).

磁気抵抗効果素子2,3を構成する素子部12と、固定抵抗素子4,5を構成する素子部12とに異なる積層構成にものを使用してよいが、磁気抵抗効果素子2,3及び固定抵抗素子4,5に同じ素子部12(積層順及び膜厚が等しい)を用いるので、磁気抵抗効果素子2,3と固定抵抗素子4,5の抵抗変化温度係数(TCR)を等しく出来る。また抵抗値も同じであるため、抵抗値を合わせ込むためのパターニング工程が必要ない。   The element portion 12 constituting the magnetoresistive effect elements 2 and 3 and the element portion 12 constituting the fixed resistance elements 4 and 5 may be used in different laminated structures, but the magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5 are fixed. Since the same element portion 12 (with the same stacking order and film thickness) is used for the resistance elements 4 and 5, the resistance change temperature coefficient (TCR) of the magnetoresistance effect elements 2 and 3 and the fixed resistance elements 4 and 5 can be made equal. Moreover, since the resistance value is the same, a patterning process for matching the resistance value is not necessary.

また固定抵抗素子4,5の上方には、固定抵抗素子4,5の素子部12を平面視にて完全に覆うとともに、幅寸法W2より長さ寸法L2を長く形成した細長形状の第1軟磁性体23を対向させることで、固定抵抗素子4,5を構成する素子部12に流入する外部磁場を適切にシールドできる。また第1軟磁性体23の透磁率は素子部12の透磁率よりも大きい。このため、外部磁場のほとんどが第1軟磁性体23側を流れ、素子部12に流入する外部磁場を非常に小さくでき、固定抵抗素子4,5を構成する素子部12での単位磁場あたりの抵抗変化率(MR比)を非常に小さくできる。図1に示す磁気センサ1が地磁気センサの場合、地磁気と機器内部で発生する漏洩磁場とを合わせた外部磁場は5〜10Oe程度であり、このとき、固定抵抗素子4,5の単位磁場あたりの抵抗変化率(MR比)を0.2%以下に抑えることが可能になる。   Also, above the fixed resistance elements 4 and 5, the element portion 12 of the fixed resistance elements 4 and 5 is completely covered in a plan view, and the elongated first softening having a length dimension L2 longer than the width dimension W2 is formed. By facing the magnetic body 23, it is possible to appropriately shield the external magnetic field flowing into the element portion 12 constituting the fixed resistance elements 4 and 5. Further, the magnetic permeability of the first soft magnetic body 23 is larger than the magnetic permeability of the element portion 12. For this reason, most of the external magnetic field flows on the first soft magnetic body 23 side, and the external magnetic field flowing into the element part 12 can be made very small, and the unit magnetic field per unit magnetic field in the element part 12 constituting the fixed resistance elements 4 and 5 can be reduced. The resistance change rate (MR ratio) can be very small. When the magnetic sensor 1 shown in FIG. 1 is a geomagnetic sensor, the external magnetic field combining the geomagnetism and the leakage magnetic field generated inside the device is about 5 to 10 Oe. At this time, the unit magnetic field per unit magnetic field of the fixed resistance elements 4 and 5 The resistance change rate (MR ratio) can be suppressed to 0.2% or less.

なお、第1軟磁性体23を素子部12の下方に対向させて配置しても同様のシールド効果を得ることが出来る。その場合、磁気抵抗効果素子2,3においても同様に第2軟磁性体18を素子部12の下方に配置してもよい。また、第1軟磁性体23を、素子部12の上下双方に配置してもかまわない。   Note that the same shielding effect can be obtained even if the first soft magnetic body 23 is arranged facing the lower portion of the element portion 12. In that case, the second soft magnetic body 18 may be similarly disposed below the element portion 12 in the magnetoresistive effect elements 2 and 3. Further, the first soft magnetic body 23 may be arranged on both the upper and lower sides of the element portion 12.

また、図19に示す他の実施形態では、第1軟磁性体23を一体化している。図19に示す第1軟磁性体23は、固定抵抗素子4,5を構成する全ての素子部12の上方を覆う大きさで形成される。ただし図18に示したのと同様に、図19に示す第1軟磁性体23の素子幅W1方向に向く幅寸法W2は、素子長さL1方向に向く長さ寸法L2より小さくなっている。第1軟磁性体23における素子部12からの延出部の長さ寸法は、X1−X2方向、Y1−Y2方向ともに20μm以上であることが好ましい。   In another embodiment shown in FIG. 19, the first soft magnetic body 23 is integrated. The first soft magnetic body 23 shown in FIG. 19 is formed to have a size that covers the top of all the element portions 12 constituting the fixed resistance elements 4 and 5. However, as shown in FIG. 18, the width dimension W2 of the first soft magnetic body 23 shown in FIG. 19 facing in the element width W1 direction is smaller than the length dimension L2 facing in the element length L1 direction. It is preferable that the length dimension of the extension part from the element part 12 in the first soft magnetic body 23 is 20 μm or more in both the X1-X2 direction and the Y1-Y2 direction.

また固定抵抗素子4,5に関しては、図18や図19で説明した構成以外に、例えば図20のように図18の固定抵抗素子4,5を90度回転させ、素子部12及び第1軟磁性体23の長手方向が縦方向(Y1−Y2方向)を向く配置としてもよい。このときの固定磁性層34の固定磁化方向(P方向)は問わないが、素子長手方向であるY1方向とすれば、磁気抵抗効果素子2,3の固定磁性層34の固定磁化方向(P方向)と一致し、磁気抵抗効果素子2,3及び固定抵抗素子4,5の製造を容易化できる。   For the fixed resistance elements 4 and 5, in addition to the configuration described in FIGS. 18 and 19, for example, as shown in FIG. 20, the fixed resistance elements 4 and 5 of FIG. It is good also as arrangement | positioning in which the longitudinal direction of the magnetic body 23 faces a vertical direction (Y1-Y2 direction). The pinned magnetization direction (P direction) of the pinned magnetic layer 34 at this time is not limited, but if the Y1 direction which is the longitudinal direction of the element is used, the pinned magnetization direction (P direction) of the pinned magnetic layer 34 of the magnetoresistive effect elements 2 and 3. ), The manufacture of the magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5 can be facilitated.

図1,図2に示すように本実施形態では、固定抵抗素子4,5は、磁気抵抗効果素子2,3に対して、感度軸方向と平行な縦方向(Y1−Y2方向)に対向しない位置に配置されている。具体的には図1に示す実施形態では、磁気抵抗効果素子2,3と固定抵抗素子4,5とが横方向(X1−X2方向)に略一列で配置されている。また図2に示す実施形態では、2個の固定抵抗素子4,5が縦方向(Y1−Y2方向)に略直列に配置されるとともに、2個の固定抵抗素子4,5を囲む固定抵抗素子形成領域80と磁気抵抗効果素子2,3とが横方向(X1−X2方向)に対向して配置されている。   As shown in FIGS. 1 and 2, in this embodiment, the fixed resistance elements 4 and 5 do not face the magnetoresistive effect elements 2 and 3 in the longitudinal direction (Y1-Y2 direction) parallel to the sensitivity axis direction. Placed in position. Specifically, in the embodiment shown in FIG. 1, the magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5 are arranged in a line in the horizontal direction (X1-X2 direction). In the embodiment shown in FIG. 2, the two fixed resistance elements 4 and 5 are arranged substantially in series in the vertical direction (Y1-Y2 direction), and the fixed resistance elements surrounding the two fixed resistance elements 4 and 5. The formation region 80 and the magnetoresistive effect elements 2 and 3 are arranged to face each other in the lateral direction (X1-X2 direction).

これにより、磁気抵抗効果素子2,3に作用する感度軸方向と平行な縦方向からの磁場が第1軟磁性体23により増幅されるのを抑制できる。磁気センサ1が地磁気センサとして使用されるとき、携帯機器内で発する機器内部の漏洩磁場の量は地磁気量よりも大きくなりやすい。コンマ数Oe程度の地磁気に対して漏洩磁界は数Oe以上(5〜10Oe程度)と想定される。そして本実施形態では、このような漏洩磁場が、感度軸方向から作用しても、上記したように増幅効果を抑制できるので、磁気抵抗効果素子2,3の磁気飽和を防止でき、磁気センサ1としての感度を適切に保つことができる。   Thereby, it is possible to suppress the magnetic field from the longitudinal direction parallel to the sensitivity axis direction acting on the magnetoresistive effect elements 2 and 3 from being amplified by the first soft magnetic body 23. When the magnetic sensor 1 is used as a geomagnetic sensor, the amount of leakage magnetic field inside the device generated in the portable device tends to be larger than the amount of geomagnetism. The leakage magnetic field is assumed to be several Oe or more (about 5 to 10 Oe) with respect to the geomagnetism of the comma number Oe. In this embodiment, even if such a leakage magnetic field acts from the sensitivity axis direction, the amplification effect can be suppressed as described above, so that magnetic saturation of the magnetoresistive effect elements 2 and 3 can be prevented, and the magnetic sensor 1 The sensitivity can be kept appropriate.

また図1,図2に示す実施形態では、固定抵抗素子4,5と磁気抵抗効果素子2,3とが略横方向(X1−X2方向)にて対向して配列されているので、限られた小さい領域内に磁気抵抗効果素子2,3と固定抵抗素子4,5を、磁気抵抗効果素子2,3に作用する感度軸方向と平行な縦方向からの磁場が第1軟磁性体23により増幅されるのを抑制した状態で、適切に配置できる。   In the embodiment shown in FIGS. 1 and 2, the fixed resistance elements 4 and 5 and the magnetoresistive effect elements 2 and 3 are arranged so as to face each other substantially in the lateral direction (X1-X2 direction). The magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5 are placed in a small area, and the magnetic field from the longitudinal direction parallel to the sensitivity axis direction acting on the magnetoresistive effect elements 2 and 3 is caused by the first soft magnetic body 23. Arrangement can be made appropriately in a state where amplification is suppressed.

次に、図2に示す実施形態では、図1に示す実施形態と異なって、固定抵抗素子4,5を縦方向(Y1−Y2方向)に略直列に配置している。このような配置とすることで、固定抵抗素子4,5を構成する素子部12に対する磁気シールド範囲を広くできる。   Next, in the embodiment shown in FIG. 2, unlike the embodiment shown in FIG. 1, the fixed resistance elements 4 and 5 are arranged substantially in series in the vertical direction (Y1-Y2 direction). With such an arrangement, the magnetic shield range for the element portion 12 constituting the fixed resistance elements 4 and 5 can be widened.

磁気シールド範囲を模式図で示したのが図2(b)である。図2(b)の左図には、図1のように固定抵抗素子4,5を横方向に配列したときの各固定抵抗素子4,5の固定抵抗素子形成領域81を示し、図2(b)の右図には、図2(a)の固定抵抗素子形成領域80を示している。図2(b)に示す斜線箇所が磁気シールド範囲である。すなわち図2(b)に示すように、固定抵抗素子形成領域80,81の四隅付近は、外部磁場が比較的大きく磁気シールド効果が小さい箇所である。図2(b)に示すように固定抵抗素子4,5を直列に配置して固定抵抗素子形成領域80を大きくすることで、固定抵抗素子4と固定抵抗素子5との間付近(図2(b)に示す点線領域付近)でも適切に磁気シールド効果が適切に発揮される。このため個々の固定抵抗素子4,5に対する磁気シールド範囲は、図2(a)のように固定抵抗素子4,5を縦方向に略直列に配置することで広くすることが可能になる。   FIG. 2B shows a schematic diagram of the magnetic shield range. 2B shows a fixed resistance element formation region 81 of each fixed resistance element 4 and 5 when the fixed resistance elements 4 and 5 are arranged in the horizontal direction as shown in FIG. The right figure of b) shows the fixed resistive element formation region 80 of FIG. The shaded area shown in FIG. 2B is the magnetic shield range. That is, as shown in FIG. 2B, the vicinity of the four corners of the fixed resistance element forming regions 80 and 81 is a place where the external magnetic field is relatively large and the magnetic shielding effect is small. As shown in FIG. 2B, the fixed resistance elements 4 and 5 are arranged in series and the fixed resistance element forming region 80 is enlarged, so that the area between the fixed resistance element 4 and the fixed resistance element 5 (see FIG. Even in the vicinity of the dotted line area shown in b), the magnetic shielding effect is appropriately exhibited. Therefore, the magnetic shield range for each of the fixed resistance elements 4 and 5 can be widened by arranging the fixed resistance elements 4 and 5 substantially in series in the vertical direction as shown in FIG.

以上説明した図1、図2に示す磁気センサ1は、磁気抵抗効果素子2,3及び固定抵抗素子4,5の配置を特徴的構成とした基本形態であり、磁気抵抗効果素子2,3における第2軟磁性体18の形成の有無や、固定抵抗素子4,5に設けられる第1軟磁性体23の長手方向の向き等に左右されない。   The magnetic sensor 1 shown in FIG. 1 and FIG. 2 described above is a basic form characterized by the arrangement of the magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5. It does not depend on whether or not the second soft magnetic body 18 is formed and the direction of the first soft magnetic body 23 provided in the fixed resistance elements 4 and 5 in the longitudinal direction.

上記のように、図1,図2に示す実施形態の磁気抵抗効果素子2,3の構成を図6以降で説明したが、磁気抵抗効果素子2,3では、感度軸と直交する横方向(X1−X2方向)からの磁場に対して感度を持たないようにできれば、その手段が第2軟磁性体18を設けること以外の手段であってもよい。例えば永久磁石層を用いて、素子部12に対して横方向からバイアス磁界を供給する手段がある。すでにそれを実践しているのが図12、図16、図17である。図12、図16、図17に示した実施形態においては、各素子部12の形状異方性と永久磁石層の作用により、感度軸に直交する横方向(X1−X2方向)からの外部磁場に対する感度が十分に低いため、第2軟磁性体18が形成されなくても十分に機能する。ただし、第2軟磁性体18を形成することによってより横方向への感度を小さくすることができる構成となっている。また図6等の構成においても、第2軟磁性体18を設けず、接続電極部13や電極部15を永久磁石層で形成することで、感度軸に直交する横方向(X1−X2方向)からの外部磁場に対する感度を低くできる。   As described above, the configuration of the magnetoresistive effect elements 2 and 3 of the embodiment shown in FIGS. 1 and 2 has been described with reference to FIG. 6 and subsequent figures. In the magnetoresistive effect elements 2 and 3, the lateral direction ( The means may be means other than providing the second soft magnetic body 18 as long as it is not sensitive to the magnetic field from the (X1-X2 direction). For example, there is means for supplying a bias magnetic field from the lateral direction to the element unit 12 using a permanent magnet layer. This is already practiced in FIGS. 12, 16, and 17. FIG. In the embodiment shown in FIGS. 12, 16, and 17, the external magnetic field from the lateral direction (X1-X2 direction) perpendicular to the sensitivity axis is obtained by the shape anisotropy of each element portion 12 and the action of the permanent magnet layer. Therefore, even if the second soft magnetic body 18 is not formed, it functions sufficiently. However, the second soft magnetic body 18 is formed so that the lateral sensitivity can be further reduced. In the configuration of FIG. 6 and the like, the second soft magnetic body 18 is not provided, and the connection electrode portion 13 and the electrode portion 15 are formed of a permanent magnet layer, so that the transverse direction (X1-X2 direction) perpendicular to the sensitivity axis is obtained. The sensitivity to the external magnetic field from can be lowered.

また、図1、図2に示す磁気抵抗効果素子2,3と固定抵抗素子4,5の配列順は特に限定されない。例えば図1では、配列の真ん中に固定抵抗素子4,5が、その両側に磁気抵抗効果素子2,3が配置されているが、配列の真ん中に磁気抵抗効果素子2,3が、その両側に固定抵抗素子4,5が配置される形態でもよいし、磁気抵抗効果素子2,3と固定抵抗素子4,5とが交互に配列されてもよい。図2では、固定抵抗素子形成領域80が真ん中に位置しているが、磁気抵抗効果素子2,3の外側の側方に配置されてもよい。   The arrangement order of the magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5 shown in FIGS. 1 and 2 is not particularly limited. For example, in FIG. 1, the fixed resistance elements 4 and 5 are arranged in the middle of the array and the magnetoresistive elements 2 and 3 are arranged on both sides thereof. However, the magnetoresistive effect elements 2 and 3 are arranged on both sides of the array. The fixed resistance elements 4 and 5 may be arranged, or the magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5 may be alternately arranged. In FIG. 2, the fixed resistance element forming region 80 is located in the middle, but may be disposed on the outer side of the magnetoresistive effect elements 2 and 3.

また磁気抵抗効果素子及び固定抵抗素子の数は限定されない。図1,図2では図23に示すブリッジ回路を構成すべく磁気抵抗効果素子2,3及び固定抵抗素子4,5を夫々2個ずつ設けたが、磁気抵抗効果素子と固定抵抗素子とが1個ずつでもよいし、磁気抵抗効果素子及び固定抵抗素子が2個より多くてもよい。   Further, the number of magnetoresistive effect elements and fixed resistance elements is not limited. In FIG. 1 and FIG. 2, two magnetoresistive elements 2 and 3 and two fixed resistive elements 4 and 5 are provided to form the bridge circuit shown in FIG. Each may be sufficient, and there may be more than two magnetoresistive effect elements and fixed resistance elements.

図3に示す実施形態は、図2に示す実施形態を改良した構成である。すなわち図3に示す実施形態では固定抵抗素子4,5を構成する素子部12のうち、素子幅方向(縦方向;Y1−Y2方向)の素子部12の外側面12aよりもさらに外側に第1軟磁性体25が設けられている。この結果、固定抵抗素子4,5を構成する素子部12に対する磁気シールド効果をより効果的に発揮することが可能である。図3に示す斜線部分が比較的、外部磁場が大きい箇所である。図3に示すように第1軟磁性体23のさらに両側に第1軟磁性体25を設けることで、より効果的に素子部12に大きな外部磁場が作用しないようにでき、固定抵抗化を効果的に促進できる。   The embodiment shown in FIG. 3 is a configuration obtained by improving the embodiment shown in FIG. That is, in the embodiment shown in FIG. 3, among the element portions 12 constituting the fixed resistance elements 4, 5, the first outside the outer surface 12 a of the element portion 12 in the element width direction (vertical direction; Y1-Y2 direction). A soft magnetic body 25 is provided. As a result, it is possible to more effectively exhibit the magnetic shield effect on the element portion 12 constituting the fixed resistance elements 4 and 5. The hatched portion shown in FIG. 3 is a portion where the external magnetic field is relatively large. As shown in FIG. 3, by providing the first soft magnetic body 25 on both sides of the first soft magnetic body 23, it is possible to prevent a large external magnetic field from acting on the element portion 12 more effectively, and the effect of fixed resistance is achieved. Can be promoted.

図4、図5に示す実施形態は、図1、図2に示した実施形態と下記の点で異なる。
図4に示す実施形態には、各磁気抵抗効果素子2,3と各固定抵抗素子4,5との横方向(X1−X2方向)の間に、磁気抵抗効果素子2,3及び固定抵抗素子4,5に非接触の第3軟磁性体70が設けられている。第3軟磁性体70の幅寸法はW5で幅寸法W5と直交する長さ寸法はL5である。第3軟磁性体70の幅寸法W5は、2〜20μm程度である。図4に示すように第3軟磁性体70の長さ方向が縦方向(Y1−Y2方向)に向くように第3軟磁性体70が配置されている。また第3軟磁性体70の長さ寸法L5は、第3軟磁性体70の横方向(X1−X2方向)に位置する磁気抵抗効果素子2,3及び固定抵抗素子4,5の縦方向への全域に対向する長さ以上で形成される。すなわち磁気抵抗効果素子2,3の縦方向(Y1−Y2方向)の長さ寸法はL6で、固定抵抗素子4,5の縦方向(Y1−Y2方向)の長さ寸法はL7であるが、第3軟磁性体70の長さ寸法L5は磁気抵抗効果素子2,3の長さ寸法L6以上であり且つ固定抵抗素子4,5の長さ寸法L7以上である。
The embodiment shown in FIGS. 4 and 5 differs from the embodiment shown in FIGS. 1 and 2 in the following points.
In the embodiment shown in FIG. 4, the magnetoresistive effect elements 2 and 3 and the fixed resistance element are arranged between the magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5 in the lateral direction (X1-X2 direction). A non-contact third soft magnetic body 70 is provided at 4 and 5. The width dimension of the third soft magnetic body 70 is W5, and the length dimension orthogonal to the width dimension W5 is L5. The width dimension W5 of the third soft magnetic body 70 is about 2 to 20 μm. As shown in FIG. 4, the third soft magnetic body 70 is arranged so that the length direction of the third soft magnetic body 70 is directed in the longitudinal direction (Y1-Y2 direction). The length dimension L5 of the third soft magnetic body 70 extends in the vertical direction of the magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5 positioned in the lateral direction (X1-X2 direction) of the third soft magnetic body 70. It is formed with the length which opposes the whole area of this. That is, the longitudinal dimension (Y1-Y2 direction) of the magnetoresistive elements 2 and 3 is L6, and the longitudinal dimension (Y1-Y2 direction) of the fixed resistive elements 4 and 5 is L7. The length dimension L5 of the third soft magnetic body 70 is not less than the length dimension L6 of the magnetoresistive effect elements 2 and 3, and is not less than the length dimension L7 of the fixed resistance elements 4 and 5.

図4に示す実施形態では、第3軟磁性体70は磁気抵抗効果素子2,3の縦方向(Y1−Y2方向)の両端及び固定抵抗素子4,5の縦方向(Y1−Y2方向)の両端から縦方向に延出する延出部70aを有する。   In the embodiment shown in FIG. 4, the third soft magnetic body 70 has both ends in the longitudinal direction (Y1-Y2 direction) of the magnetoresistive effect elements 2, 3 and the longitudinal direction (Y1-Y2 direction) of the fixed resistance elements 4, 5. It has the extension part 70a extended in the vertical direction from both ends.

また第3軟磁性体70は、磁気抵抗効果素子2,3を構成する第2軟磁性体18や固定抵抗素子4,5を構成する第1軟磁性体23と同じ絶縁層17上(図1(b)参照)に形成される。   The third soft magnetic body 70 is on the same insulating layer 17 as the second soft magnetic body 18 constituting the magnetoresistive effect elements 2 and 3 and the first soft magnetic body 23 constituting the fixed resistance elements 4 and 5 (FIG. 1). (See (b)).

図5に示す実施形態では、各磁気抵抗効果素子2,3と固定抵抗素子形成領域80との横方向(X1−X2方向)の間に、磁気抵抗効果素子2,3及び固定抵抗素子4,5に非接触の第3軟磁性体71が設けられている。第3軟磁性体71の幅寸法はW8で幅寸法W8と直交する長さ寸法はL8である。第3軟磁性体71の幅寸法W8は、2〜20μm程度である。図2に示すように第3軟磁性体71の長さ方向が縦方向(Y1−Y2方向)に向くように第3軟磁性体71が配置されている。また第3軟磁性体71の長さ寸法L8は、第3軟磁性体70の横方向(X1−X2方向)に位置する磁気抵抗効果素子2,3及び固定抵抗素子形成領域80の縦方向の全域に対向する長さ以上で形成される。すなわち磁気抵抗効果素子2,3の縦方向(Y1−Y2方向)の長さ寸法はL6(図23も参照)で、固定抵抗素子形成領域80の縦方向(Y1−Y2方向)の長さ寸法はL9であるが、第3軟磁性体71の長さ寸法L8は磁気抵抗効果素子2,3の長さ寸法L6以上であり且つ固定抵抗素子形成領域80の長さ寸法L9以上である。   In the embodiment shown in FIG. 5, the magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 4 are arranged between the magnetoresistive effect elements 2 and 3 and the fixed resistance element forming region 80 in the lateral direction (X1-X2 direction). 5 is provided with a non-contact third soft magnetic body 71. The width dimension of the third soft magnetic body 71 is W8, and the length dimension orthogonal to the width dimension W8 is L8. The width dimension W8 of the third soft magnetic body 71 is about 2 to 20 μm. As shown in FIG. 2, the third soft magnetic body 71 is arranged so that the length direction of the third soft magnetic body 71 is directed in the longitudinal direction (Y1-Y2 direction). The length dimension L8 of the third soft magnetic body 71 is set in the longitudinal direction of the magnetoresistive effect elements 2 and 3 and the fixed resistance element forming region 80 located in the lateral direction (X1-X2 direction) of the third soft magnetic body 70. It is formed with the length which opposes the whole region. That is, the longitudinal dimension (Y1-Y2 direction) of the magnetoresistive effect elements 2 and 3 is L6 (see also FIG. 23), and the longitudinal dimension (Y1-Y2 direction) of the fixed resistor element formation region 80. Is L9, but the length dimension L8 of the third soft magnetic body 71 is not less than the length dimension L6 of the magnetoresistive effect elements 2 and 3, and is not less than the length dimension L9 of the fixed resistance element forming region 80.

図5に示す実施形態では、第3軟磁性体71は磁気抵抗効果素子2,3の縦方向(Y1−Y2方向)の両端及び固定抵抗素子形成領域80の縦方向(Y1−Y2方向)の両端から縦方向に延出する延出部71aを有する。   In the embodiment shown in FIG. 5, the third soft magnetic body 71 has both ends in the longitudinal direction (Y1-Y2 direction) of the magnetoresistive effect elements 2 and 3 and the longitudinal direction (Y1-Y2 direction) of the fixed resistance element forming region 80. It has the extension part 71a extended in the vertical direction from both ends.

また第3軟磁性体71は、磁気抵抗効果素子2,3を構成する第2軟磁性体18や固定抵抗素子4,5を構成する第1軟磁性体23と同じ絶縁層17上(図1(b)参照)に形成される。   The third soft magnetic body 71 is on the same insulating layer 17 as the second soft magnetic body 18 constituting the magnetoresistive effect elements 2 and 3 and the first soft magnetic body 23 constituting the fixed resistance elements 4 and 5 (FIG. 1). (See (b)).

第3軟磁性体70,71は例えばスパッタやメッキにて薄膜形成される。第3軟磁性体70,71は、NiFe、CoFe、CoFeSiBやCoZrNb等で形成される。   The third soft magnetic bodies 70 and 71 are formed into a thin film by sputtering or plating, for example. The third soft magnetic bodies 70 and 71 are made of NiFe, CoFe, CoFeSiB, CoZrNb, or the like.

本実施形態では、図1、図2に示した実施形態と同様、磁気抵抗効果素子2,3を構成する素子部12と、固定抵抗素子4,5を構成する素子部12とに異なる積層構成のものを使用してよいが、磁気抵抗効果素子2,3及び固定抵抗素子4,5に同じ素子部12(積層順及び膜厚が等しい)を用いるので、磁気抵抗効果素子2,3と固定抵抗素子4,5の抵抗変化温度係数(TCR)を等しく出来る。また抵抗値も同じであるため、抵抗値を合わせ込むためのパターニング工程が必要ない。また、第1軟磁性体23と第2軟磁性体18及び図1,図2に示す第3軟磁性体70を同じ工程で形成できる。   In the present embodiment, as in the embodiment shown in FIGS. 1 and 2, the laminated structure is different between the element portion 12 constituting the magnetoresistive effect elements 2 and 3 and the element portion 12 constituting the fixed resistance elements 4 and 5. However, since the same element portion 12 (the order of lamination and film thickness is equal) is used for the magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5, the magnetoresistive effect elements 2 and 3 are fixed. The resistance change temperature coefficient (TCR) of the resistance elements 4 and 5 can be made equal. Moreover, since the resistance value is the same, a patterning process for matching the resistance value is not necessary. Further, the first soft magnetic body 23, the second soft magnetic body 18, and the third soft magnetic body 70 shown in FIGS. 1 and 2 can be formed in the same process.

図4,図5では、固定抵抗素子4,5と磁気抵抗効果素子2,3とが略横方向(X1−X2方向)にて対向して配列されており、さらに固定抵抗素子4,5を構成する第1軟磁性体23と、磁気抵抗効果素子2,3を構成する第2軟磁性体18とが共に横方向(X1−X2方向)に長い形状で形成されている。   4 and 5, the fixed resistance elements 4 and 5 and the magnetoresistive effect elements 2 and 3 are arranged to face each other in a substantially horizontal direction (X1-X2 direction). The first soft magnetic body 23 and the second soft magnetic body 18 constituting the magnetoresistive effect elements 2 and 3 are both formed in a shape that is long in the lateral direction (X1-X2 direction).

このような形態では、第1軟磁性体23及び第2軟磁性体18による横方向(X1−X2方向)からの外部磁場の増幅効果が大きくなり、磁気抵抗効果素子2,3及び固定抵抗素子4,5が本来、感度を持たない横方向からの外部磁場に対して感度を持つ、すなわち単位磁場あたりの抵抗変化率(MR比)が大きくなる可能性がある。このような横方向からの外部磁場の増大効果が大きい場合、これを抑制すべく、図4に示す実施形態では、磁気抵抗効果素子2,3と固定抵抗素子4,5との間に、図5に示す実施形態では、磁気抵抗効果素子2,3と固定抵抗素子形成領域80の間に、夫々、第3軟磁性体70,71を配置している。   In such a form, the amplification effect of the external magnetic field from the lateral direction (X1-X2 direction) by the first soft magnetic body 23 and the second soft magnetic body 18 is increased, and the magnetoresistance effect elements 2 and 3 and the fixed resistance element 4 and 5 are inherently insensitive to external magnetic fields from the lateral direction, that is, the resistance change rate (MR ratio) per unit magnetic field may increase. In the embodiment shown in FIG. 4, in order to suppress such a large increase effect of the external magnetic field from the lateral direction, the magnetoresistive effect elements 2, 3 and the fixed resistance elements 4, 5 are not illustrated. In the embodiment shown in FIG. 5, third soft magnetic bodies 70 and 71 are disposed between the magnetoresistive effect elements 2 and 3 and the fixed resistance element forming region 80, respectively.

図4,図5に示すように第3軟磁性体70,71は縦方向(Y1−Y2方向)に長い形状で形成される。また第3軟磁性体70,71は、横方向(X1−X2方向)に対向する磁気抵抗効果素子2,3及び固定抵抗素子4,5の双方の縦方向への全域に対向する長さ寸法以上で形成されている。   As shown in FIGS. 4 and 5, the third soft magnetic bodies 70 and 71 are formed in a shape that is long in the longitudinal direction (Y1-Y2 direction). In addition, the third soft magnetic bodies 70 and 71 have length dimensions facing the entire longitudinal direction of both the magnetoresistive effect elements 2 and 3 and the fixed resistance elements 4 and 5 facing in the lateral direction (X1-X2 direction). It is formed as described above.

これにより、第3軟磁性体70,71には、第1軟磁性体23及び第2軟磁性体18と異なって、磁化容易軸方向が縦方向(Y1−Y2方向)となる形状異方性が付与される。この結果、横方向(X1−X2方向)からの外部磁場の増幅効果を第3軟磁性体70,71にて抑制でき、横方向からの外部磁場に対する第1軟磁性体23及び第2軟磁性体18の磁気シールド効果の低減を抑制できる。   Thus, unlike the first soft magnetic body 23 and the second soft magnetic body 18, the third soft magnetic bodies 70 and 71 have a shape anisotropy in which the easy axis direction is the longitudinal direction (Y1-Y2 direction). Is granted. As a result, the amplification effect of the external magnetic field from the lateral direction (X1-X2 direction) can be suppressed by the third soft magnetic bodies 70 and 71, and the first soft magnetic body 23 and the second soft magnetism with respect to the external magnetic field from the lateral direction. Reduction of the magnetic shielding effect of the body 18 can be suppressed.

本実施形態における磁気センサ1は例えば、図24に示す地磁気センサ(磁気センサモジュール)として使用される。X軸磁場検知部50、Y軸磁場検知部51、Z軸磁場検知部52では、いずれも図23に示すブリッジ回路のセンサ部が設けられている。X軸磁場検知部50では磁気抵抗効果素子2,3の素子部12の固定磁性層34の固定磁化方向(P方向)が感度軸であるX方向を向いており、また、Y軸磁場検知部51では磁気抵抗効果素子2,3の素子部12の固定磁性層34の固定磁化方向(P方向)が感度軸であるY方向を向いており、さらに、Z軸磁場検知部52では磁気抵抗効果素子2,3の素子部12の固定磁性層34の固定磁化方向(P方向)が感度軸であるZ方向を向いている。   The magnetic sensor 1 in this embodiment is used as a geomagnetic sensor (magnetic sensor module) shown in FIG. 24, for example. In each of the X-axis magnetic field detection unit 50, the Y-axis magnetic field detection unit 51, and the Z-axis magnetic field detection unit 52, a sensor unit of a bridge circuit shown in FIG. 23 is provided. In the X-axis magnetic field detection unit 50, the fixed magnetization direction (P direction) of the fixed magnetic layer 34 of the element unit 12 of the magnetoresistive effect elements 2 and 3 faces the X direction that is the sensitivity axis, and the Y-axis magnetic field detection unit In 51, the fixed magnetization direction (P direction) of the pinned magnetic layer 34 of the element portion 12 of the magnetoresistive effect elements 2 and 3 faces the Y direction which is the sensitivity axis, and in the Z-axis magnetic field detector 52, the magnetoresistive effect The pinned magnetization direction (P direction) of the pinned magnetic layer 34 of the element portion 12 of the elements 2 and 3 faces the Z direction that is the sensitivity axis.

X軸磁場検知部50、Y軸磁場検知部51、Z軸磁場検知部52、及び集積回路(ASIC)54はいずれも基台53上に設けられる。X軸磁場検知部50、及びY軸磁場検知部51の磁気抵抗効果素子2,3の形成面はいずれもX−Y平面であるが、Z軸磁場検知部52の磁気抵抗効果素子2,3の形成面はX−Z平面であり、Z軸磁場検知部52の磁気抵抗効果素子2,3の形成面は、X軸磁場検知部50、及びY軸磁場検知部51の磁気抵抗効果素子2,3の形成面に対して直交した関係にある。   The X-axis magnetic field detection unit 50, the Y-axis magnetic field detection unit 51, the Z-axis magnetic field detection unit 52, and the integrated circuit (ASIC) 54 are all provided on the base 53. The formation surfaces of the magnetoresistive elements 2 and 3 of the X-axis magnetic field detector 50 and the Y-axis magnetic field detector 51 are both XY planes. Is formed on the X-Z plane, and the formation surface of the magnetoresistive effect elements 2 and 3 of the Z-axis magnetic field detection unit 52 is the magnetoresistive effect element 2 of the X-axis magnetic field detection unit 50 and the Y-axis magnetic field detection unit 51. , 3 are orthogonal to the formation surface.

本実施形態では、X軸磁場検知部50、Y軸磁場検知部51、及びZ軸磁場検知部52のうち2以上の検知部を基台53上に設けることができる。各検知部において、感度軸方向と直交する方向からの磁場を適切に磁気シールドできるとともに、各検知部の感度軸方向からの地磁気を適切に検知できる。   In the present embodiment, two or more detection units among the X-axis magnetic field detection unit 50, the Y-axis magnetic field detection unit 51, and the Z-axis magnetic field detection unit 52 can be provided on the base 53. Each detector can appropriately shield the magnetic field from the direction orthogonal to the sensitivity axis direction, and can appropriately detect the geomagnetism from the sensitivity axis direction of each detector.

図24の構成以外に、地磁気センサと加速度センサ等を組み合わせたモジュールとすることもできる。   In addition to the configuration of FIG. 24, a module in which a geomagnetic sensor and an acceleration sensor are combined can be used.

図1(a)は第1実施形態における磁気センサの磁気抵抗効果素子及び固定抵抗素子の平面図、図1(b)は、図1(a)に示すC−C線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、FIG. 1A is a plan view of the magnetoresistive effect element and fixed resistance element of the magnetic sensor according to the first embodiment, and FIG. 1B is a height direction along the line CC shown in FIG. A partial cross-sectional view cut in the (Z direction in the figure) and seen from the arrow direction, 図2(a)は第2実施形態における磁気センサの磁気抵抗効果素子及び固定抵抗素子の平面図、図2(b)は、図2(a)の素子配置が優れていることを説明するための固定抵抗素子形成領域及び磁気シールド範囲の模式図、2A is a plan view of the magnetoresistive effect element and the fixed resistance element of the magnetic sensor according to the second embodiment, and FIG. 2B is a diagram for explaining that the element arrangement of FIG. 2A is excellent. Schematic diagram of fixed resistance element formation region and magnetic shield range of 図2の形態を改良した磁気抵抗効果素子及び固定抵抗素子の平面図、The top view of the magnetoresistive effect element which improved the form of FIG. 2, and a fixed resistance element, 第3実施形態における磁気センサの磁気抵抗効果素子及び固定抵抗素子の平面図、The top view of the magnetoresistive effect element and fixed resistance element of the magnetic sensor in 3rd Embodiment, 第4実施形態における磁気センサの磁気抵抗効果素子及び固定抵抗素子の平面図、The top view of the magnetoresistive effect element and fixed resistance element of the magnetic sensor in 4th Embodiment, 図6(a)は、磁気抵抗効果素子の平面図、図6(b)は、(a)のA−A線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、FIG. 6A is a plan view of the magnetoresistive effect element, and FIG. 6B is a portion cut in the height direction (Z direction in the drawing) along the line AA in FIG. Sectional view, 図7(a)は、図6とは異なる磁気センサの磁気抵抗効果素子の平面図、図7(b)は、図7(a)のA−A線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、7A is a plan view of a magnetoresistive element of a magnetic sensor different from that in FIG. 6, and FIG. 7B is a height direction (Z direction in the figure) along the line AA in FIG. ) And a partial cross-sectional view as seen from the direction of the arrow, 図8(a)は、図6及び図7とは異なる磁気センサの磁気抵抗効果素子の平面図、図8(b)は、図8(a)のA−A線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、FIG. 8A is a plan view of a magnetoresistive element of a magnetic sensor different from those in FIGS. 6 and 7, and FIG. 8B is a height direction along the line AA in FIG. A partial cross-sectional view as seen from the direction of the arrow cut in the Z direction shown in the figure, 図6ないし図8とは異なる磁気抵抗効果素子の平面図、FIG. 6 is a plan view of a magnetoresistive effect element different from those shown in FIGS. 図10(a)は、図6ないし図9とは異なる磁気抵抗効果素子の平面図、図10(b)は、図10(a)のA−A線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、10A is a plan view of a magnetoresistive effect element different from those shown in FIGS. 6 to 9, and FIG. 10B is a height direction (Z direction shown) along the line AA in FIG. ) And a partial cross-sectional view as seen from the direction of the arrow, 図6ないし図10とは異なる磁気抵抗効果素子の平面図、FIG. 6 is a plan view of a magnetoresistive effect element different from FIG. 図6ないし図11とは異なる磁気抵抗効果素子の平面図、FIG. 6 is a plan view of a magnetoresistive effect element different from those shown in FIGS. 図6ないし図12とは異なる磁気抵抗効果素子の部分を示す平面図、FIG. 13 is a plan view showing a portion of a magnetoresistive effect element different from those shown in FIGS. 図13に示すD−D線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分拡大断面図、The partial expanded sectional view which cut | disconnected in the height direction (Z direction shown in figure) along the DD line | wire shown in FIG. 13, and was seen from the arrow direction, 好ましい磁気抵抗効果素子の形態の特に素子部の部分を示す部分拡大平面図、A partially enlarged plan view showing a part of the element part in the form of a preferable magnetoresistive element, 図16(a)は、図6ないし図12とは異なる磁気抵抗効果素子の平面図、図16(b)は図16(a)のA−A線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、16A is a plan view of a magnetoresistive effect element different from those shown in FIGS. 6 to 12, and FIG. 16B is a height direction (Z direction shown) along the line AA in FIG. 16A. A partial cross-sectional view as seen from the direction of the arrow 図6ないし図16とは異なる磁気抵抗効果素子の平面図、FIG. 6 is a plan view of a magnetoresistive effect element different from FIG. 図18(a)は、固定抵抗素子の平面図、図18(b)は、図18(a)のB−B線に沿って高さ方向(図示Z方向)に切断し矢印方向から見た部分断面図、18A is a plan view of the fixed resistance element, and FIG. 18B is a sectional view taken along the line BB in FIG. 18A in the height direction (Z direction in the drawing) and viewed from the arrow direction. Partial sectional view, 図18とは異なる固定抵抗素子の平面図、The top view of the fixed resistive element different from FIG. 図18及び図19とは異なる固定抵抗素子の平面図、The top view of the fixed resistive element different from FIG.18 and FIG.19, 磁気抵抗効果素子の固定磁性層の固定磁化方向及びフリー磁性層の磁化方向と、電気抵抗値との関係を説明するための図、The figure for demonstrating the relationship between the fixed magnetization direction of the fixed magnetic layer of a magnetoresistive effect element, the magnetization direction of a free magnetic layer, and an electrical resistance value, 磁気抵抗効果素子を膜厚方向から切断した際の切断面を示す断面図、Sectional drawing which shows the cut surface at the time of cut | disconnecting a magnetoresistive effect element from a film thickness direction, 本実施形態の磁気センサの回路図、A circuit diagram of the magnetic sensor of the present embodiment, 磁気センサモジュールの斜視図、A perspective view of the magnetic sensor module, 従来における磁気センサの磁気抵抗効果素子及び固定抵抗素子の平面図、Plan view of magnetoresistive effect element and fixed resistance element of conventional magnetic sensor,

符号の説明Explanation of symbols

1 磁気センサ
2、3 磁気抵抗効果素子
4、5 固定抵抗素子
6 ブリッジ回路
7 入力端子
8 グランド端子
9 差動増幅器
10 外部出力端子
11 集積回路
12 素子部
13 接続電極部
14 出力取出し部
16 基板
17 絶縁層
18、24 第1軟磁性体
23、25 第2軟磁性体
33 反強磁性層
34 固定磁性層
36 フリー磁性層
37 保護層
50 X軸磁場検知部
51 Y軸磁場検知部
52 Z軸磁場検知部
60 永久磁石層
61 素子連結体
62 接続層
63 凹部
64 低抵抗層
70、71 第3軟磁性体
80、81 固定抵抗素子形成領域
L1、L3 素子長さ
L2 (第1軟磁性体の)長さ寸法
L4 (第2軟磁性体の)長さ寸法
W1、W3 素子幅
W2 (第1軟磁性体の)幅寸法
W4 (第2軟磁性体の)幅寸法
DESCRIPTION OF SYMBOLS 1 Magnetic sensor 2, 3 Magnetoresistance effect element 4, 5 Fixed resistance element 6 Bridge circuit 7 Input terminal 8 Ground terminal 9 Differential amplifier 10 External output terminal 11 Integrated circuit 12 Element part 13 Connection electrode part 14 Output extraction part 16 Substrate 17 Insulating layers 18, 24 First soft magnetic body 23, 25 Second soft magnetic body 33 Antiferromagnetic layer 34 Fixed magnetic layer 36 Free magnetic layer 37 Protective layer 50 X-axis magnetic field detector 51 Y-axis magnetic field detector 52 Z-axis magnetic field Sensor 60 Permanent magnet layer 61 Element coupling body 62 Connection layer 63 Recess 64 Low resistance layers 70, 71 Third soft magnetic bodies 80, 81 Fixed resistance element formation regions L1, L3 Element length L2 (of the first soft magnetic body) Length dimension L4 (second soft magnetic body) length dimension W1, W3 Element width W2 (first soft magnetic body) width dimension W4 (second soft magnetic body) width dimension

Claims (15)

磁気抵抗効果素子及び固定抵抗素子を備えた磁気センサであって、
前記磁気抵抗効果素子は、磁化方向が固定される固定磁性層と、前記固定磁性層に非磁性層を介して積層された外部磁場を受けて磁化方向が変動するフリー磁性層とを有する素子部を備え、前記固定磁性層の固定磁化方向は感度軸方向であり、
前記固定抵抗素子は、素子幅W1に比べて素子長さL1が長く形成された細長形状の素子部を備え、前記固定抵抗素子を構成する素子部は、前記固定磁性層と、前記固定磁性層に前記非磁性層を介して積層された前記フリー磁性層とを有しており、
前記固定抵抗素子を構成する素子部と間隔を空けて前記素子部に対して磁気シールド効果を発揮する第1軟磁性体が積層配置されており、
前記固定抵抗素子は、前記磁気抵抗効果素子に対して、前記感度軸方向と平行な縦方向に対向しない位置に配置されていることを特徴とする磁気センサ。
A magnetic sensor comprising a magnetoresistive effect element and a fixed resistance element,
The magnetoresistive element includes an element part having a pinned magnetic layer whose magnetization direction is fixed, and a free magnetic layer which is laminated on the pinned magnetic layer via a nonmagnetic layer and changes the magnetization direction upon receiving an external magnetic field The fixed magnetization direction of the fixed magnetic layer is a sensitivity axis direction,
The fixed resistance element includes an elongated element portion having an element length L1 longer than an element width W1, and the element portion constituting the fixed resistance element includes the fixed magnetic layer and the fixed magnetic layer. And the free magnetic layer laminated via the non-magnetic layer,
A first soft magnetic body that exhibits a magnetic shielding effect with respect to the element portion with a gap from an element portion that constitutes the fixed resistance element is laminated,
The magnetic sensor according to claim 1, wherein the fixed resistance element is disposed at a position that does not face the magnetoresistive effect element in a longitudinal direction parallel to the sensitivity axis direction.
前記固定抵抗素子の少なくとも一部は、前記磁気抵抗効果素子に対して、前記縦方向に直交する横方向に対向して配置されている請求項1記載の磁気センサ。   2. The magnetic sensor according to claim 1, wherein at least a part of the fixed resistance element is disposed opposite to the magnetoresistive element in a lateral direction orthogonal to the longitudinal direction. 前記磁気抵抗効果素子及び前記固定抵抗素子が前記横方向に略一列に配置される請求項2記載の磁気センサ。   The magnetic sensor according to claim 2, wherein the magnetoresistive effect element and the fixed resistance element are arranged in a line in the lateral direction. 複数の前記固定抵抗素子が前記縦方向に略直列に配置されている請求項1又は2記載の磁気センサ。   The magnetic sensor according to claim 1, wherein the plurality of fixed resistance elements are arranged substantially in series in the vertical direction. 複数の前記固定抵抗素子を囲む固定抵抗素子形成領域と、前記磁気抵抗効果素子とが前記縦方向に直交する横方向にて対向配置されている請求項4記載の磁気センサ。   The magnetic sensor according to claim 4, wherein a fixed resistance element forming region surrounding the plurality of fixed resistance elements and the magnetoresistive effect element are arranged to face each other in a horizontal direction orthogonal to the vertical direction. 前記磁気抵抗効果素子には、前記磁気抵抗効果素子を構成する前記素子部と非接触であり前記感度軸方向と平行な縦方向に対して直交する横方向からの磁場に対して磁気シールド効果を発揮する第2軟磁性体が設けられている請求項1ないし5のいずれかに記載の磁気センサ。   The magnetoresistive effect element has a magnetic shielding effect against a magnetic field from a lateral direction that is non-contact with the element portion constituting the magnetoresistive effect element and is orthogonal to a longitudinal direction parallel to the sensitivity axis direction. The magnetic sensor according to claim 1, further comprising a second soft magnetic body to be exhibited. 前記磁気抵抗効果素子には、前記磁気抵抗効果素子を構成する前記素子部と非接触であり前記感度軸方向と平行な縦方向に対して直交する横方向からの磁場に対して磁気シールド効果を発揮する第2軟磁性体が設けられており、前記第2軟磁性体及び前記固定抵抗素子を構成する前記第1軟磁性体は共に、前記横方向に長い形状で形成されており、
前記磁気抵抗効果素子と前記固定抵抗素子の間の領域に、前記磁気抵抗効果素子及び前記固定抵抗素子の双方に非接触の第3軟磁性体が配置され、前記第3軟磁性体は、前記縦方向に長い形状で形成されるとともに、前記磁気抵抗効果素子及び前記固定抵抗素子の縦方向への全域に対向する長さ寸法以上で形成されている請求項2,3又は5に記載の磁気センサ。
The magnetoresistive effect element has a magnetic shielding effect against a magnetic field from a lateral direction that is non-contact with the element portion constituting the magnetoresistive effect element and is orthogonal to a longitudinal direction parallel to the sensitivity axis direction. A second soft magnetic body to be exhibited is provided, and both the second soft magnetic body and the first soft magnetic body constituting the fixed resistance element are formed in a shape that is long in the lateral direction;
In a region between the magnetoresistive effect element and the fixed resistance element, a non-contact third soft magnetic body is disposed on both the magnetoresistive effect element and the fixed resistance element, and the third soft magnetic body is 6. The magnetism according to claim 2, 3 or 5, wherein the magnetism is formed in a shape that is long in the vertical direction and has a length that is equal to or greater than the length of the magnetoresistive effect element and the fixed resistance element facing the entire area in the vertical direction. Sensor.
前記磁気抵抗効果素子を構成する前記素子部は、前記縦方向に複数個、間隔を空けて配置され、各素子部の端部間が接続されてミアンダ形状にされており、各素子部の前記縦方向への両側方、真上、あるいは真下のいずれかに前記第2軟磁性体が前記各素子部と非接触で形成されている請求項6又は7に記載の磁気センサ。   A plurality of the element portions constituting the magnetoresistive effect element are arranged at intervals in the vertical direction, and the end portions of each element portion are connected to form a meander shape. 8. The magnetic sensor according to claim 6, wherein the second soft magnetic body is formed in a non-contact manner with each of the element portions on either side in the vertical direction, directly above, or directly below. 前記固定抵抗素子を構成する前記素子部は、複数個、素子幅方向に間隔を空けて配置され、各素子部の端部間が接続されてミアンダ形状にされており、
前記固定抵抗素子を構成する各素子部に対して個別に前記第1軟磁性体が配置されている請求項1ないし8のいずれかに記載の磁気センサ。
A plurality of the element portions constituting the fixed resistance element are arranged at intervals in the element width direction, and the end portions of each element portion are connected to form a meander shape,
The magnetic sensor according to any one of claims 1 to 8, wherein the first soft magnetic body is individually arranged for each element portion constituting the fixed resistance element.
前記第1軟磁性体は、さらに、素子幅方向の両側に位置する前記素子部の外側面より外側にも配置されている請求項9記載の磁気センサ。   10. The magnetic sensor according to claim 9, wherein the first soft magnetic body is further disposed outside an outer surface of the element portion located on both sides in the element width direction. 前記固定抵抗素子を構成する前記素子部は、複数個、素子幅方向に間隔を空けて配置され、各素子部の端部間が接続されてミアンダ形状にされており、
一つの前記第1軟磁性体が、前記固定抵抗素子を構成する全ての前記素子部を覆う大きさで形成されている請求項1ないし8のいずれかに記載の磁気センサ。
A plurality of the element portions constituting the fixed resistance element are arranged at intervals in the element width direction, and the end portions of each element portion are connected to form a meander shape,
9. The magnetic sensor according to claim 1, wherein one of the first soft magnetic bodies is formed to have a size that covers all of the element portions constituting the fixed resistance element.
前記第1軟磁性体は、前記素子幅W1と同方向への幅寸法W2が前記素子幅W1よりも大きく前記素子部の素子幅の両側から素子幅方向に延出する延出部を備えるとともに、前記素子長さL1と同方向への長さ寸法L2が前記素子長さL1よりも大きく前記素子部の素子長さ方向の両側から素子長さ方向に延出する延出部を備え、且つ前記長さ寸法L2が前記幅寸法W2よりも大きい請求項1ないし11のいずれかに記載の磁気センサ。   The first soft magnetic body includes an extension portion having a width dimension W2 in the same direction as the element width W1 larger than the element width W1 and extending in the element width direction from both sides of the element width of the element portion. A length dimension L2 in the same direction as the element length L1 is larger than the element length L1, and includes an extending part extending in the element length direction from both sides of the element length direction of the element part, and The magnetic sensor according to claim 1, wherein the length dimension L2 is larger than the width dimension W2. 前記磁気抵抗効果素子及び前記固定抵抗素子を構成する各素子部の積層順及び膜厚が等しい請求項1ないし12のいずれかに記載の磁気センサ。   The magnetic sensor according to any one of claims 1 to 12, wherein each element portion constituting the magnetoresistive effect element and the fixed resistance element has the same stacking order and thickness. 前記磁気抵抗効果素子を構成する素子部に対して、前記縦方向に直交する横方向からバイアス磁界を供給するための永久磁石層が設けられる請求項1ないし13のいずれかに記載の磁気センサ。   The magnetic sensor according to any one of claims 1 to 13, wherein a permanent magnet layer for supplying a bias magnetic field from a lateral direction orthogonal to the longitudinal direction is provided to an element portion constituting the magnetoresistive effect element. 請求項1ないし14のいずれかに記載の磁気センサを複数有し、少なくとも前記複数の磁気センサのうち一組の磁気抵抗効果素子の感度軸が直交するように各磁気センサが配置されていることを特徴とする磁気センサモジュール。   15. A plurality of magnetic sensors according to claim 1, wherein each magnetic sensor is arranged so that sensitivity axes of a set of magnetoresistive effect elements are orthogonal to each other among at least the plurality of magnetic sensors. A magnetic sensor module.
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