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JP2008068155A - エキシマ光照射装置 - Google Patents

エキシマ光照射装置 Download PDF

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Publication number
JP2008068155A
JP2008068155A JP2006246405A JP2006246405A JP2008068155A JP 2008068155 A JP2008068155 A JP 2008068155A JP 2006246405 A JP2006246405 A JP 2006246405A JP 2006246405 A JP2006246405 A JP 2006246405A JP 2008068155 A JP2008068155 A JP 2008068155A
Authority
JP
Japan
Prior art keywords
excimer
replacement space
space
substrate
replacement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006246405A
Other languages
English (en)
Japanese (ja)
Inventor
Shinichi Endo
真一 遠藤
Hiroshi Koyanagi
博 小柳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP2006246405A priority Critical patent/JP2008068155A/ja
Priority to TW096126194A priority patent/TW200814185A/zh
Priority to KR1020070079459A priority patent/KR20080024062A/ko
Priority to CN2007101496663A priority patent/CN101199923B/zh
Publication of JP2008068155A publication Critical patent/JP2008068155A/ja
Pending legal-status Critical Current

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Classifications

    • H10P72/0408—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • H10P72/3202—

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2006246405A 2006-09-12 2006-09-12 エキシマ光照射装置 Pending JP2008068155A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006246405A JP2008068155A (ja) 2006-09-12 2006-09-12 エキシマ光照射装置
TW096126194A TW200814185A (en) 2006-09-12 2007-07-18 Excimer light irradiation apparatus
KR1020070079459A KR20080024062A (ko) 2006-09-12 2007-08-08 엑시머 광 조사 장치
CN2007101496663A CN101199923B (zh) 2006-09-12 2007-09-10 准分子光照射装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006246405A JP2008068155A (ja) 2006-09-12 2006-09-12 エキシマ光照射装置

Publications (1)

Publication Number Publication Date
JP2008068155A true JP2008068155A (ja) 2008-03-27

Family

ID=39290225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006246405A Pending JP2008068155A (ja) 2006-09-12 2006-09-12 エキシマ光照射装置

Country Status (4)

Country Link
JP (1) JP2008068155A (zh)
KR (1) KR20080024062A (zh)
CN (1) CN101199923B (zh)
TW (1) TW200814185A (zh)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010125368A (ja) * 2008-11-26 2010-06-10 Ushio Inc エキシマランプ装置
JP2010214294A (ja) * 2009-03-17 2010-09-30 Ushio Inc 紫外線照射装置
WO2017032804A1 (de) * 2015-08-27 2017-03-02 Süss Microtec Photomask Equipment Gmbh & Co. Kg Vorrichtung zum aufbringen eines mit uv-strahlung beaufschlagten flüssigen mediums auf ein substrat
TWI740052B (zh) * 2017-07-19 2021-09-21 日商牛尾電機股份有限公司 光照射裝置
RU2756470C2 (ru) * 2017-03-01 2021-09-30 Зюсс Микротек Фотомаск Эквипмент Гмбх Унд Ко. Кг Устройство для нанесения нагруженной ультрафиолетовым излучением жидкой среды на подложку

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5195111B2 (ja) * 2008-07-17 2013-05-08 ウシオ電機株式会社 エキシマランプ装置
CN110787978B (zh) * 2019-11-04 2024-01-02 广东瀚秋智能装备股份有限公司 超哑光哑光机
CN117718276A (zh) * 2023-12-15 2024-03-19 西安奕斯伟材料科技股份有限公司 清洗装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001300451A (ja) * 2000-04-25 2001-10-30 Hoya Schott Kk 紫外光照射装置
WO2002036259A1 (en) * 2000-11-01 2002-05-10 Shin-Etsu Engineering Co., Ltd. Excimer uv photo reactor

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1353029A (zh) * 2000-11-09 2002-06-12 财团法人工业技术研究院 用准分子激光制造微球面与非球面高分子结构阵列的方法
CN1290154C (zh) * 2003-07-16 2006-12-13 友达光电股份有限公司 激光结晶系统和控制准分子激光退火制程能量密度的方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001300451A (ja) * 2000-04-25 2001-10-30 Hoya Schott Kk 紫外光照射装置
WO2002036259A1 (en) * 2000-11-01 2002-05-10 Shin-Etsu Engineering Co., Ltd. Excimer uv photo reactor

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010125368A (ja) * 2008-11-26 2010-06-10 Ushio Inc エキシマランプ装置
JP2010214294A (ja) * 2009-03-17 2010-09-30 Ushio Inc 紫外線照射装置
WO2017032804A1 (de) * 2015-08-27 2017-03-02 Süss Microtec Photomask Equipment Gmbh & Co. Kg Vorrichtung zum aufbringen eines mit uv-strahlung beaufschlagten flüssigen mediums auf ein substrat
US10843235B2 (en) 2015-08-27 2020-11-24 Suss Micro Tec Photomask Equipment Gmbh & Co Kg Device for applying a liquid medium which is exposed to UV radiation to a substrate
RU2756470C2 (ru) * 2017-03-01 2021-09-30 Зюсс Микротек Фотомаск Эквипмент Гмбх Унд Ко. Кг Устройство для нанесения нагруженной ультрафиолетовым излучением жидкой среды на подложку
TWI740052B (zh) * 2017-07-19 2021-09-21 日商牛尾電機股份有限公司 光照射裝置

Also Published As

Publication number Publication date
TW200814185A (en) 2008-03-16
CN101199923A (zh) 2008-06-18
CN101199923B (zh) 2011-08-17
KR20080024062A (ko) 2008-03-17

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