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JP1731676S - Gas supply nozzle for substrate processing apparatus - Google Patents

Gas supply nozzle for substrate processing apparatus

Info

Publication number
JP1731676S
JP1731676S JP2022011412F JP2022011412F JP1731676S JP 1731676 S JP1731676 S JP 1731676S JP 2022011412 F JP2022011412 F JP 2022011412F JP 2022011412 F JP2022011412 F JP 2022011412F JP 1731676 S JP1731676 S JP 1731676S
Authority
JP
Japan
Prior art keywords
gas supply
processing apparatus
substrate processing
supply nozzle
vertical direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022011412F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2022011412F priority Critical patent/JP1731676S/en
Priority to TW111305740F priority patent/TWD231991S/en
Priority to US29/861,210 priority patent/USD1042731S1/en
Application granted granted Critical
Publication of JP1731676S publication Critical patent/JP1731676S/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

本願物品は、反応管内部に垂直方向に多段に保持した基板を処理する基板処理装置に用いられるガス供給ノズルである。The present invention relates to a gas supply nozzle used in a substrate processing apparatus for processing substrates held in multiple stages in the vertical direction inside a reaction tube.

JP2022011412F 2022-05-30 2022-05-30 Gas supply nozzle for substrate processing apparatus Active JP1731676S (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2022011412F JP1731676S (en) 2022-05-30 2022-05-30 Gas supply nozzle for substrate processing apparatus
TW111305740F TWD231991S (en) 2022-05-30 2022-11-18 Gas supply nozzle for substrate processing equipment
US29/861,210 USD1042731S1 (en) 2022-05-30 2022-11-28 Gas nozzle for semiconductor manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022011412F JP1731676S (en) 2022-05-30 2022-05-30 Gas supply nozzle for substrate processing apparatus

Publications (1)

Publication Number Publication Date
JP1731676S true JP1731676S (en) 2025-12-15

Family

ID=84322281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022011412F Active JP1731676S (en) 2022-05-30 2022-05-30 Gas supply nozzle for substrate processing apparatus

Country Status (3)

Country Link
US (1) USD1042731S1 (en)
JP (1) JP1731676S (en)
TW (1) TWD231991S (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1746467S (en) * 2023-01-25 2023-06-16
JP1774816S (en) * 2024-03-08 2024-07-05
JP1774817S (en) * 2024-03-08 2024-07-05

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0276796B1 (en) * 1987-01-27 1992-04-08 Asahi Glass Company Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
JP3076809B2 (en) * 1990-09-26 2000-08-14 株式会社パウレック Cleaning nozzle
AU114000S (en) * 1990-11-26 1992-05-13 Electrolux Ab A gas burner
USD641830S1 (en) * 2010-11-17 2011-07-19 Fna Ip Holdings, Inc. Spray nozzle
KR101205436B1 (en) * 2011-01-04 2012-11-28 삼성전자주식회사 Chemical Vapor Deposition Apparatus
JP6320824B2 (en) * 2014-03-31 2018-05-09 株式会社東芝 Gas supply pipe and gas processing apparatus
JP1520999S (en) * 2014-09-02 2015-04-06
JP1534651S (en) 2015-01-28 2015-10-05
JP1547057S (en) * 2015-05-28 2016-04-04
JP1563647S (en) * 2016-01-29 2016-11-21
JP1563524S (en) 2016-03-30 2016-11-21
US10960415B1 (en) * 2016-12-23 2021-03-30 Bete Fog Nozzle, Inc. Spray nozzle and method
JP1589673S (en) * 2017-04-14 2017-10-30
JP1605945S (en) 2017-12-27 2018-06-04
USD888196S1 (en) * 2018-07-05 2020-06-23 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
JP1624354S (en) * 2018-07-19 2019-02-12
JP1644261S (en) 2019-03-20 2019-10-28
JP1684258S (en) * 2020-07-27 2021-04-26
JP1706319S (en) * 2021-06-16 2022-01-31

Also Published As

Publication number Publication date
USD1042731S1 (en) 2024-09-17
TWD231991S (en) 2024-07-01

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