[go: up one dir, main page]

JP1731671S - Furnace for substrate processing equipment - Google Patents

Furnace for substrate processing equipment

Info

Publication number
JP1731671S
JP1731671S JP2022005265F JP2022005265F JP1731671S JP 1731671 S JP1731671 S JP 1731671S JP 2022005265 F JP2022005265 F JP 2022005265F JP 2022005265 F JP2022005265 F JP 2022005265F JP 1731671 S JP1731671 S JP 1731671S
Authority
JP
Japan
Prior art keywords
furnace
substrate processing
processing equipment
slits
gas supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022005265F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2022005265F priority Critical patent/JP1731671S/en
Priority to TW111303580F priority patent/TWD231014S/en
Priority to US29/849,023 priority patent/USD1070797S1/en
Application granted granted Critical
Publication of JP1731671S publication Critical patent/JP1731671S/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

本願物品は、基板を熱処理する基板処理装置に用いられる炉である。本体の正面側及び背面側には、収容する処理容器に設けられたガス供給部や排出部を避けるためのスリットが形成されている。The present invention relates to a furnace used in a substrate processing apparatus for heat-treating substrates. The furnace body has slits on the front and rear sides to avoid gas supply and exhaust sections provided in a processing vessel.

JP2022005265F 2022-03-15 2022-03-15 Furnace for substrate processing equipment Active JP1731671S (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2022005265F JP1731671S (en) 2022-03-15 2022-03-15 Furnace for substrate processing equipment
TW111303580F TWD231014S (en) 2022-03-15 2022-07-20 Part of the furnace for substrate processing equipment
US29/849,023 USD1070797S1 (en) 2022-03-15 2022-08-08 Furnace for substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022005265F JP1731671S (en) 2022-03-15 2022-03-15 Furnace for substrate processing equipment

Publications (1)

Publication Number Publication Date
JP1731671S true JP1731671S (en) 2025-12-15

Family

ID=84322296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022005265F Active JP1731671S (en) 2022-03-15 2022-03-15 Furnace for substrate processing equipment

Country Status (3)

Country Link
US (1) USD1070797S1 (en)
JP (1) JP1731671S (en)
TW (1) TWD231014S (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1713190S (en) * 2021-10-01 2022-04-21

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
NL1005963C2 (en) * 1997-05-02 1998-11-09 Asm Int Vertical oven for treating semiconductor substrates.
TWD127410S1 (en) * 2007-04-20 2009-02-11 東京威力科創股份有限公司 Process tubes for semiconductor manufacturing
TWD143034S1 (en) * 2008-03-28 2011-10-01 東京威力科創股份有限公司 Processing tubes for semiconductor manufacturing
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD725053S1 (en) * 2011-11-18 2015-03-24 Tokyo Electron Limited Outer tube for process tube for manufacturing semiconductor wafers
USD720309S1 (en) * 2011-11-18 2014-12-30 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
TWD168774S (en) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 part of reaction tube
TWD167986S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
TWD167987S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
TWD167985S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
JP1535455S (en) * 2015-02-25 2015-10-19
JP1546512S (en) * 2015-09-04 2016-03-22
JP1548462S (en) * 2015-09-04 2016-04-25
JP1546345S (en) * 2015-09-04 2016-03-22
JP1568552S (en) 2016-02-12 2017-02-06
JP1568553S (en) * 2016-02-12 2017-02-06
JP1563524S (en) * 2016-03-30 2016-11-21
JP1582475S (en) * 2016-10-14 2017-07-31
JP1605462S (en) * 2017-08-10 2021-05-31
JP1605461S (en) * 2017-08-10 2021-05-31
JP1605982S (en) * 2017-12-27 2021-05-31
JP1620676S (en) * 2018-02-27 2018-12-17
JP1611565S (en) * 2018-02-27 2018-08-20
JP1644260S (en) * 2019-03-20 2019-10-28
JP1682719S (en) 2020-06-15 2021-04-05
JP7317912B2 (en) * 2021-09-21 2023-07-31 株式会社Kokusai Electric Furnace throat structure, substrate processing apparatus, and semiconductor device manufacturing method
JP1731672S (en) * 2022-03-15 2025-12-15 Furnace for substrate processing equipment

Also Published As

Publication number Publication date
USD1070797S1 (en) 2025-04-15
TWD231014S (en) 2024-05-01

Similar Documents

Publication Publication Date Title
JP1700777S (en) Boat for substrate processing equipment
MX2015014659A (en) Process and apparatus for thermochemically hardening workpieces.
JP2012138500A5 (en)
TW200943455A (en) Apparatus and method for processing substrate
WO2006034130A3 (en) Apparatus and process for surface treatment of substrate using an activated reactive gas
TWD203444S (en) Gas introduction tube for substrate processing device
TW200719412A (en) Substrate processing apparatus and substrate processing method
MY171373A (en) Apparatus for chemically toughening glass and method of chemically toughening glass using the same
JP2014175509A5 (en) Semiconductor device manufacturing method, substrate processing apparatus, and program
UA117374C2 (en) RESTORATION OF IRON TO METAL IRON WITH THE APPLICATION OF COX GAS AND GAS FROM A STEEL FURNITURE WITH OXYGEN SUPPLY
TWD218093S (en) Part of wafer boat for substrate processing equipment
JP1731671S (en) Furnace for substrate processing equipment
JP1731672S (en) Furnace for substrate processing equipment
BR112012025028A2 (en) supersonic nozzle for use in metallurgical installations and process for sizing a supersonic nozzle.
JP1748689S (en) roaster
TW200943412A (en) Method of manufacturing a semiconductor device and a device for treating substrate
TWD197467S (en) Gas introduction tube for substrate processing equipment
JP2007000915A5 (en)
JP1700780S (en) Nozzle holder for substrate processing equipment
JP1678273S (en) reaction tube
JP2012222157A5 (en)
JP1685215S (en) Gas introduction pipe for substrate processing equipment
JP2013256687A (en) Gas carburizing method
JP1731878S (en) Reaction tube
JP1731789S (en) Reaction tube