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JP1731672S - Furnace for substrate processing equipment - Google Patents

Furnace for substrate processing equipment

Info

Publication number
JP1731672S
JP1731672S JP2022005266F JP2022005266F JP1731672S JP 1731672 S JP1731672 S JP 1731672S JP 2022005266 F JP2022005266 F JP 2022005266F JP 2022005266 F JP2022005266 F JP 2022005266F JP 1731672 S JP1731672 S JP 1731672S
Authority
JP
Japan
Prior art keywords
furnace
substrate processing
processing equipment
slits
gas supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022005266F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2022005266F priority Critical patent/JP1731672S/en
Priority to TW111303581F priority patent/TWD231015S/en
Priority to US29/849,042 priority patent/USD1053156S1/en
Application granted granted Critical
Publication of JP1731672S publication Critical patent/JP1731672S/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

本願物品は、基板を熱処理する基板処理装置に用いられる炉である。本体の正面側及び背面側には、収容する処理容器に設けられたガス供給部や排出部を避けるためのスリットが形成されている。The present invention relates to a furnace used in a substrate processing apparatus for heat-treating substrates. The furnace body has slits on the front and rear sides to avoid gas supply and exhaust sections provided in a processing vessel.

JP2022005266F 2022-03-15 2022-03-15 Furnace for substrate processing equipment Active JP1731672S (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2022005266F JP1731672S (en) 2022-03-15 2022-03-15 Furnace for substrate processing equipment
TW111303581F TWD231015S (en) 2022-03-15 2022-07-20 Furnace for substrate processing equipment
US29/849,042 USD1053156S1 (en) 2022-03-15 2022-08-08 Furnace for substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022005266F JP1731672S (en) 2022-03-15 2022-03-15 Furnace for substrate processing equipment

Publications (1)

Publication Number Publication Date
JP1731672S true JP1731672S (en) 2025-12-15

Family

ID=84322294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022005266F Active JP1731672S (en) 2022-03-15 2022-03-15 Furnace for substrate processing equipment

Country Status (3)

Country Link
US (1) USD1053156S1 (en)
JP (1) JP1731672S (en)
TW (1) TWD231015S (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1731671S (en) * 2022-03-15 2025-12-15 Furnace for substrate processing equipment

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
NL1005963C2 (en) * 1997-05-02 1998-11-09 Asm Int Vertical oven for treating semiconductor substrates.
TWD127410S1 (en) * 2007-04-20 2009-02-11 東京威力科創股份有限公司 Process tubes for semiconductor manufacturing
TWD143034S1 (en) * 2008-03-28 2011-10-01 東京威力科創股份有限公司 Processing tubes for semiconductor manufacturing
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD725053S1 (en) * 2011-11-18 2015-03-24 Tokyo Electron Limited Outer tube for process tube for manufacturing semiconductor wafers
USD720309S1 (en) * 2011-11-18 2014-12-30 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
TWD167986S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
TWD167987S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
TWD168774S (en) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 part of reaction tube
TWD167985S (en) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 part of reaction tube
JP1535455S (en) * 2015-02-25 2015-10-19
JP1548462S (en) * 2015-09-04 2016-04-25
JP1546345S (en) * 2015-09-04 2016-03-22
JP1546512S (en) * 2015-09-04 2016-03-22
JP1568552S (en) 2016-02-12 2017-02-06
JP1568553S (en) * 2016-02-12 2017-02-06
JP1563524S (en) * 2016-03-30 2016-11-21
JP1582475S (en) * 2016-10-14 2017-07-31
JP1605461S (en) * 2017-08-10 2021-05-31
JP1605462S (en) * 2017-08-10 2021-05-31
JP1605982S (en) * 2017-12-27 2021-05-31
JP1611565S (en) * 2018-02-27 2018-08-20
JP1620676S (en) * 2018-02-27 2018-12-17
JP1644260S (en) * 2019-03-20 2019-10-28
JP1682719S (en) 2020-06-15 2021-04-05
JP7317912B2 (en) * 2021-09-21 2023-07-31 株式会社Kokusai Electric Furnace throat structure, substrate processing apparatus, and semiconductor device manufacturing method

Also Published As

Publication number Publication date
USD1053156S1 (en) 2024-12-03
TWD231015S (en) 2024-05-01

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