JP1731671S - 基板処理装置用炉 - Google Patents
基板処理装置用炉Info
- Publication number
- JP1731671S JP1731671S JP2022005265F JP2022005265F JP1731671S JP 1731671 S JP1731671 S JP 1731671S JP 2022005265 F JP2022005265 F JP 2022005265F JP 2022005265 F JP2022005265 F JP 2022005265F JP 1731671 S JP1731671 S JP 1731671S
- Authority
- JP
- Japan
- Prior art keywords
- furnace
- substrate processing
- processing equipment
- slits
- gas supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
本願物品は、基板を熱処理する基板処理装置に用いられる炉である。本体の正面側及び背面側には、収容する処理容器に設けられたガス供給部や排出部を避けるためのスリットが形成されている。
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022005265F JP1731671S (ja) | 2022-03-15 | 2022-03-15 | 基板処理装置用炉 |
| TW111303580F TWD231014S (zh) | 2022-03-15 | 2022-07-20 | 基板處理裝置用爐之部分 |
| US29/849,023 USD1070797S1 (en) | 2022-03-15 | 2022-08-08 | Furnace for substrate processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022005265F JP1731671S (ja) | 2022-03-15 | 2022-03-15 | 基板処理装置用炉 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1731671S true JP1731671S (ja) | 2025-12-15 |
Family
ID=84322296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022005265F Active JP1731671S (ja) | 2022-03-15 | 2022-03-15 | 基板処理装置用炉 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD1070797S1 (ja) |
| JP (1) | JP1731671S (ja) |
| TW (1) | TWD231014S (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP1713190S (ja) * | 2021-10-01 | 2022-04-21 |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD406113S (en) * | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| NL1005963C2 (nl) * | 1997-05-02 | 1998-11-09 | Asm Int | Verticale oven voor het behandelen van halfgeleidersubstraten. |
| TWD127410S1 (zh) * | 2007-04-20 | 2009-02-11 | 東京威力科創股份有限公司 | 半導體製造用製程管 |
| TWD143034S1 (zh) * | 2008-03-28 | 2011-10-01 | 東京威力科創股份有限公司 | 半導體製造用處理管 |
| USD610559S1 (en) * | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD725053S1 (en) * | 2011-11-18 | 2015-03-24 | Tokyo Electron Limited | Outer tube for process tube for manufacturing semiconductor wafers |
| USD720309S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| TWD168774S (zh) * | 2013-06-28 | 2015-07-01 | 日立國際電氣股份有限公司 | 反應管之部分 |
| TWD167986S (zh) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | 反應管之部分 |
| TWD167987S (zh) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | 反應管之部分 |
| TWD167985S (zh) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | 反應管之部分 |
| USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| JP1535455S (ja) * | 2015-02-25 | 2015-10-19 | ||
| JP1546512S (ja) * | 2015-09-04 | 2016-03-22 | ||
| JP1548462S (ja) * | 2015-09-04 | 2016-04-25 | ||
| JP1546345S (ja) * | 2015-09-04 | 2016-03-22 | ||
| JP1568552S (ja) | 2016-02-12 | 2017-02-06 | ||
| JP1568553S (ja) * | 2016-02-12 | 2017-02-06 | ||
| JP1563524S (ja) * | 2016-03-30 | 2016-11-21 | ||
| JP1582475S (ja) * | 2016-10-14 | 2017-07-31 | ||
| JP1605462S (ja) * | 2017-08-10 | 2021-05-31 | ||
| JP1605461S (ja) * | 2017-08-10 | 2021-05-31 | ||
| JP1605982S (ja) * | 2017-12-27 | 2021-05-31 | ||
| JP1620676S (ja) * | 2018-02-27 | 2018-12-17 | ||
| JP1611565S (ja) * | 2018-02-27 | 2018-08-20 | ||
| JP1644260S (ja) * | 2019-03-20 | 2019-10-28 | ||
| JP1682719S (ja) | 2020-06-15 | 2021-04-05 | ||
| JP7317912B2 (ja) * | 2021-09-21 | 2023-07-31 | 株式会社Kokusai Electric | 炉口部構造、基板処理装置、および半導体装置の製造方法 |
| JP1731672S (ja) * | 2022-03-15 | 2025-12-15 | 基板処理装置用炉 |
-
2022
- 2022-03-15 JP JP2022005265F patent/JP1731671S/ja active Active
- 2022-07-20 TW TW111303580F patent/TWD231014S/zh unknown
- 2022-08-08 US US29/849,023 patent/USD1070797S1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| USD1070797S1 (en) | 2025-04-15 |
| TWD231014S (zh) | 2024-05-01 |
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