[go: up one dir, main page]

JP1685215S - 基板処理装置用ガス導入管 - Google Patents

基板処理装置用ガス導入管

Info

Publication number
JP1685215S
JP1685215S JP2020017141F JP2020017141F JP1685215S JP 1685215 S JP1685215 S JP 1685215S JP 2020017141 F JP2020017141 F JP 2020017141F JP 2020017141 F JP2020017141 F JP 2020017141F JP 1685215 S JP1685215 S JP 1685215S
Authority
JP
Japan
Prior art keywords
substrate processing
processing equipment
gas introduction
introduction pipe
supply nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020017141F
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2020017141F priority Critical patent/JP1685215S/ja
Priority to TW110300516F priority patent/TWD215922S/zh
Priority to US29/770,855 priority patent/USD964443S1/en
Application granted granted Critical
Publication of JP1685215S publication Critical patent/JP1685215S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

本願物品は、ウエハを処理する基板処理装置の処理室内で、ガス供給ノズルを直立させて支持するとともに、当該ガス供給ノズルにガスを導入するものである。
JP2020017141F 2020-08-18 2020-08-18 基板処理装置用ガス導入管 Active JP1685215S (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2020017141F JP1685215S (ja) 2020-08-18 2020-08-18 基板処理装置用ガス導入管
TW110300516F TWD215922S (zh) 2020-08-18 2021-01-29 基板處理裝置用氣體導入管
US29/770,855 USD964443S1 (en) 2020-08-18 2021-02-17 Gas inlet attachment for wafer processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020017141F JP1685215S (ja) 2020-08-18 2020-08-18 基板処理装置用ガス導入管

Publications (1)

Publication Number Publication Date
JP1685215S true JP1685215S (ja) 2024-05-10

Family

ID=75900508

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020017141F Active JP1685215S (ja) 2020-08-18 2020-08-18 基板処理装置用ガス導入管

Country Status (3)

Country Link
US (1) USD964443S1 (ja)
JP (1) JP1685215S (ja)
TW (1) TWD215922S (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1700780S (ja) * 2021-03-22 2021-11-29 基板処理装置用ノズルホルダー
JP1746467S (ja) * 2023-01-25 2023-06-16
JP1774816S (ja) * 2024-03-08 2024-07-05
JP1774817S (ja) * 2024-03-08 2024-07-05

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3484122A (en) * 1968-01-12 1969-12-16 Herman J Schellstede Drill pipe protector and method of constructing the same
USD326272S (en) * 1988-07-25 1992-05-19 Tel Sagami Limited Heat insulating cylinder for thermal treatment of semiconductor wafers
CA142623S (en) * 2011-01-20 2012-01-25 Victaulic Co Of America Fitting
WO2013126323A1 (en) * 2012-02-23 2013-08-29 Applied Materials, Inc. Method and apparatus for precursor delivery
JP6578243B2 (ja) * 2015-07-17 2019-09-18 株式会社Kokusai Electric ガス供給ノズル、基板処理装置、半導体装置の製造方法およびプログラム
KR102483924B1 (ko) * 2016-02-18 2023-01-02 삼성전자주식회사 기화기 및 이를 구비하는 박막 증착 장치
JP1573205S (ja) * 2016-08-29 2020-03-23
JP1586728S (ja) * 2017-02-10 2017-09-25
USD873392S1 (en) * 2017-08-31 2020-01-21 Rotary Connections International Ltd. Drill pipe
USD872843S1 (en) * 2017-12-06 2020-01-14 Michael Stoffa, Sr. Valve attachment for a pipe
JP1624354S (ja) * 2018-07-19 2019-02-12
JP1624352S (ja) 2018-07-19 2019-02-12
JP1648531S (ja) 2019-01-28 2019-12-23
JP1651622S (ja) * 2019-07-17 2020-01-27

Also Published As

Publication number Publication date
USD964443S1 (en) 2022-09-20
TWD215922S (zh) 2021-12-11

Similar Documents

Publication Publication Date Title
JP1685215S (ja) 基板処理装置用ガス導入管
TWD203444S (zh) 基板處理裝置用氣體導入管
JP1711119S (ja) サセプタリング
TWD197467S (zh) 基板處理裝置用氣體導入管
JP1711120S (ja) サセプタカバー
TWD193438S (zh) Jet ring for plasma processing unit
JP1700777S (ja) 基板処理装置用ボート
JP2016051864A5 (ja)
MX379465B (es) Proceso y aparato para endurecer termoquímicamente piezas a trabajar.
JP1700780S (ja) 基板処理装置用ノズルホルダー
SG10201808438SA (en) Substrate processing apparatus, substrate processing method, and computer storage medium
SG11201808114VA (en) Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
TWD183003S (zh) 基板處理裝置用氣體供給噴嘴之部分
TWD226182S (zh) 基板處理裝置用氣體供給噴嘴之部分
TWD231991S (zh) 基板處理裝置用氣體供給噴嘴之部分
JP1746406S (ja) サセプタユニット
JP1684468S (ja) 基板処理装置用天井ヒータ
TWD218093S (zh) 基板處理裝置用晶舟之部分
TWD174920S (zh) 基板處理裝置用氣體供給噴嘴
JP1684469S (ja) 基板処理装置用天井ヒータ
JP1737180S (ja) 半導体処理装置用シャワーヘッド
JP1678273S (ja) 反応管
SG11201901034XA (en) Substrate processing apparatus, metal member, and method of manufacturing semiconductor device
WO2009085808A3 (en) Apparatus and method for processing a substrate using inductively coupled plasma technology
JP1731877S (ja) 反応管