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JP1678273S - 反応管 - Google Patents

反応管

Info

Publication number
JP1678273S
JP1678273S JP2020004705F JP2020004705F JP1678273S JP 1678273 S JP1678273 S JP 1678273S JP 2020004705 F JP2020004705 F JP 2020004705F JP 2020004705 F JP2020004705 F JP 2020004705F JP 1678273 S JP1678273 S JP 1678273S
Authority
JP
Japan
Prior art keywords
reaction tube
article
main body
buffer chamber
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020004705F
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2020004705F priority Critical patent/JP1678273S/ja
Priority to TW109304843F priority patent/TWD218087S/zh
Priority to US29/749,808 priority patent/USD986826S1/en
Application granted granted Critical
Publication of JP1678273S publication Critical patent/JP1678273S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

本願物品は、基板処理装置において用いられる反応管で、本体上部の突出した部分には、処理ガスを均一に供給するためのバッファー室が形成されている。
JP2020004705F 2020-03-10 2020-03-10 反応管 Active JP1678273S (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2020004705F JP1678273S (ja) 2020-03-10 2020-03-10 反応管
TW109304843F TWD218087S (zh) 2020-03-10 2020-08-27 反應管
US29/749,808 USD986826S1 (en) 2020-03-10 2020-09-09 Reaction tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020004705F JP1678273S (ja) 2020-03-10 2020-03-10 反応管

Publications (1)

Publication Number Publication Date
JP1678273S true JP1678273S (ja) 2021-02-01

Family

ID=74312489

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020004705F Active JP1678273S (ja) 2020-03-10 2020-03-10 反応管

Country Status (3)

Country Link
US (1) USD986826S1 (ja)
JP (1) JP1678273S (ja)
TW (1) TWD218087S (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1731675S (ja) * 2022-05-30 2025-12-15 半導体製造装置用反応管のインナー管
JP1731674S (ja) * 2022-05-30 2025-12-15 半導体製造装置用反応管のインナー管
JP1731673S (ja) * 2022-05-30 2025-12-15 半導体製造装置用反応管のインナー管

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405062S (en) * 1997-08-20 1999-02-02 Tokyo Electron Ltd. Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
TWD127410S1 (zh) * 2007-04-20 2009-02-11 東京威力科創股份有限公司 半導體製造用製程管
USD629915S1 (en) * 2009-09-10 2010-12-28 Becton, Dickinson And Company Transparent tube holder assembly with internal and external ribs
KR20160070359A (ko) * 2014-12-10 2016-06-20 삼성전자주식회사 가스 인젝터 및 이를 갖는 웨이퍼 처리 장치
JP1534828S (ja) * 2015-02-23 2015-10-13
JP1534829S (ja) * 2015-02-23 2015-10-13
JP1535455S (ja) * 2015-02-25 2015-10-19
JP1605460S (ja) * 2017-08-09 2021-05-31
JP1605461S (ja) * 2017-08-10 2021-05-31
JP1605982S (ja) * 2017-12-27 2021-05-31
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
JP1667378S (ja) * 2020-03-24 2020-08-31
JP1667336S (ja) * 2020-03-24 2020-08-31
JP1667375S (ja) * 2020-03-24 2020-08-31

Also Published As

Publication number Publication date
TWD218087S (zh) 2022-04-11
USD986826S1 (en) 2023-05-23

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