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HK1126035B - 曝光装置、曝光方法和设备制造方法 - Google Patents

曝光装置、曝光方法和设备制造方法 Download PDF

Info

Publication number
HK1126035B
HK1126035B HK09104287.5A HK09104287A HK1126035B HK 1126035 B HK1126035 B HK 1126035B HK 09104287 A HK09104287 A HK 09104287A HK 1126035 B HK1126035 B HK 1126035B
Authority
HK
Hong Kong
Prior art keywords
wafer
measurement
movable body
position information
axis
Prior art date
Application number
HK09104287.5A
Other languages
German (de)
English (en)
French (fr)
Other versions
HK1126035A1 (zh
Inventor
Yuichi Shibazaki
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority claimed from PCT/JP2007/053230 external-priority patent/WO2007097380A1/ja
Publication of HK1126035A1 publication Critical patent/HK1126035A1/zh
Publication of HK1126035B publication Critical patent/HK1126035B/zh

Links

HK09104287.5A 2006-02-21 2007-02-21 曝光装置、曝光方法和设备制造方法 HK1126035B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006044589 2006-02-21
JP2006044589 2006-02-21
PCT/JP2007/053230 WO2007097380A1 (ja) 2006-02-21 2007-02-21 パターン形成装置及びパターン形成方法、移動体駆動システム及び移動体駆動方法、露光装置及び露光方法、並びにデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
HK13106207.1A Division HK1178613B (zh) 2006-02-21 2009-05-11 曝光装置和曝光方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
HK13106207.1A Addition HK1178613B (zh) 2006-02-21 2009-05-11 曝光装置和曝光方法

Publications (2)

Publication Number Publication Date
HK1126035A1 HK1126035A1 (zh) 2009-08-21
HK1126035B true HK1126035B (zh) 2013-11-15

Family

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