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HK1228021B - 曝光装置、曝光方法及器件制造方法 - Google Patents

曝光装置、曝光方法及器件制造方法 Download PDF

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Publication number
HK1228021B
HK1228021B HK17101584.1A HK17101584A HK1228021B HK 1228021 B HK1228021 B HK 1228021B HK 17101584 A HK17101584 A HK 17101584A HK 1228021 B HK1228021 B HK 1228021B
Authority
HK
Hong Kong
Prior art keywords
detection
measurement
stage
wafer
exposure apparatus
Prior art date
Application number
HK17101584.1A
Other languages
German (de)
English (en)
French (fr)
Other versions
HK1228021A1 (zh
Inventor
Yuichi Shibazaki
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of HK1228021A1 publication Critical patent/HK1228021A1/zh
Publication of HK1228021B publication Critical patent/HK1228021B/zh

Links

HK17101584.1A 2006-02-21 2009-05-08 曝光装置、曝光方法及器件制造方法 HK1228021B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006044590 2006-02-21

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
HK09104253.5A Addition HK1125742B (zh) 2006-02-21 2007-02-21 曝光装置、曝光方法和设备制造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
HK09104253.5A Division HK1125742B (zh) 2006-02-21 2007-02-21 曝光装置、曝光方法和设备制造方法

Publications (2)

Publication Number Publication Date
HK1228021A1 HK1228021A1 (zh) 2017-10-27
HK1228021B true HK1228021B (zh) 2019-08-23

Family

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